annihilation processとは 意味・読み方・使い方

To provide a heat treatment method for a silicon wafer which can suppress deterioration of surface roughness even when rapid thermal process (RTP) is performed under high temperature at which annihilation force of void defects is high, and can also suppress occurrence of a concave-shaped pit.例文帳に追加

ボイド欠陥の消滅力が高い高温下でＲＴＰを行っても、表面粗さの悪化を抑制することができ、更に、凹形状のピットの発生も抑制することができるシリコンウェーハの熱処理方法を提供する。 - 特許庁

To provide novel, easy to use and low cost magnetic abrasive grains for magnetic grinding grains capable of participating all the abrasive grains for the grinding with magnetic field without attraction to another magnetic material under annihilation of the magnetic field and their production process.例文帳に追加

磁気研磨用砥粒において個々の砥粒全てが磁場により研磨に寄与し、かつ磁場を消去したときには他の磁性材料に引き寄せられることのない取り扱いの容易で、安価な新規磁性砥粒及びその製造方法を提供する。 - 特許庁

In the manufacturing method of a SOI wafer, before the oxide film forming process, a reactive ion etching (RIE) defect annihilation process is performed in which a defect is annihilated that exists in a region having at least up to 5 μm depth from a surface being a bonding surface of a prepared silicon substrate and that is detected by an RIE method by applying a rapid thermal treatment to the prepared silicon substrate.例文帳に追加

酸化膜形成工程の前に、前記準備したシリコン基板に急速熱処理を施すことによって、少なくとも前記シリコン基板の貼り合わせ面となる表面から５μｍの深さまでの領域に存在するＲＩＥ法により検出される欠陥を消滅させるＲＩＥ欠陥消滅工程を行うＳＯＩウェーハの製造方法。 - 特許庁