incident processとは 意味・読み方・使い方

Thereafter, the drilling is performed by sequentially making the pulse laser beam incident, under a condition that only one shot is made incident on every machining spot, on a plurality of machining spots on which the pulse laser beam is made incident in the first irradiation process.例文帳に追加

次に、１つの加工点当たり１ショットのみが入射する条件で、第１の照射工程でパルスレーザビームが入射した複数の加工点に、順次パルスレーザビームを入射させて穴あけ加工を行う。 - 特許庁

The images made incident on the light incident and exit surfaces of the first and second light guides are expanded in one direction and the direction orthogonal with the one direction in the process of being made incident on the light reflection surface by refraction and being emitted from the light reflection surface through the light incident and exit surface 61A.例文帳に追加

第１および第２導光体の光入出射面に入射した画像は、屈折して光反射面に入射し、光反射面から光入出射面６１Ａを介して射出される過程で、一方向および当該方向の直交方向に拡大される。 - 特許庁

Thus, the photoelectric conversion layer 3 separately formed in each solar cell block 6 in the block manufacturing process can be arranged on the incident side for the incident light, and on the rear face side in the organic solar cell according to the bonding process.例文帳に追加

これにより、ブロック作製工程において各太陽電池ブロック６に別個に形成された光電変換層３を、接合工程により有機太陽電池における入射光の入射側と背面側とに配置することができる。 - 特許庁

To obtain process works for efficiently collecting light incident on an optical waveguide, according to the position of pixels, at low cost.例文帳に追加

画素の位置に応じて、光導波路に入射した光を効率よく集光する工程を低コストで実現すること。 - 特許庁

For instance, an R chamfering process (a process of rounding corners so as a cross section to be a given radius) is applied to a connection part of the open end part 27 and the second incident face 21.例文帳に追加

例えば、開口端部２７と第２の入射面２１との連接部分にＲ面取加工（断面が所定の半径となるように角を取る加工）を行う。 - 特許庁

To provide a semiconductor device which can suppress variation of forming voltage incident to scaling-down, and to provide its fabrication process.例文帳に追加

微細化に伴うフォーミング電圧の変動を抑制することができる半導体装置及びその製造方法を提供する。 - 特許庁

The polygon mirror 16 turns in the direction denoted by an arrow R and the light beam LB is made incident from the direction in which the incident angle θ of the light beam LB in one scanning process decreases as the polygon mirror 16 turns.例文帳に追加

ポリゴンミラー１６は矢印Ｒ方向へ回転され、１走査中で光ビームＬＢの入射角θは、ポリゴンミラー１６の回転にしたがって小さくなる方向から入射されている。 - 特許庁

A method of manufacturing the thin-film magnetic head is characterized in that etching of the sensor film is carried out by switching the incident angle of an etching beam, and when an incident angle in a normal direction with respect to a sensor film surface is 0 degree, etching is carried out under the condition that the incident angle of the etching beam is smaller toward the latter process.例文帳に追加

センサ膜のエッチングはエッチングビームの入射角度を切り替えながら行い、センサ膜面に対する法線方向を入射角度０とすると、そのエッチングビームの入射角度は後になるほど小さくなる条件にてエッチングを行う。 - 特許庁