NZ763665B2 - Configuring optical layers in imprint lithography processes - Google Patents
Configuring optical layers in imprint lithography processesInfo
- Publication number
- NZ763665B2 NZ763665B2 NZ763665A NZ76366518A NZ763665B2 NZ 763665 B2 NZ763665 B2 NZ 763665B2 NZ 763665 A NZ763665 A NZ 763665A NZ 76366518 A NZ76366518 A NZ 76366518A NZ 763665 B2 NZ763665 B2 NZ 763665B2
- Authority
- NZ
- New Zealand
- Prior art keywords
- substrate
- reflective
- nanolayers
- nanolayer
- disposed
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
Abstract
Disclosed is an optical layer. The optical layer includes a substrate having a first side and a second side opposite the first side. The optical layer includes one or more functional patterns disposed on the first side of the substrate. The optical layer includes one or more anti-reflective nanolayers disposed on and abutting at least one of the first side of the substrate or the second side of the substrate. The one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers effect a relative amount of light transmittable through the substrate. The one or more anti-reflective nanolayers comprises a first anti-reflective nanolayer disposed on and abutting the first side of the substrate. The first anti-reflective nanolayer at least partially surrounds at least some of the one or more functional patterns along the first side of the substrate without overlapping the one or more functional layers.
Claims (13)
1. A optical layer comprising: a substrate having a first side and a second side opposite the first side; one or more functional patterns disposed on the first side of the substrate; 5 one or more anti-reflective nanolayers disposed on and abutting at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers effect a relative amount of light transmittable through the substrate, wherein the one or more anti-reflective nanolayers comprises a first anti-reflective 10 nanolayer disposed on and abutting the first side of the substrate, wherein the first anti-reflective nanolayer at least partially surrounds at least some of the one or more functional patterns along the first side of the substrate without overlapping the one or more functional layers. 15
2. The optical layer of claim 1, wherein the first anti-reflective nanolayer at least partially surrounds a subset of the one or more functional patterns along the first side of the substrate.
3. The optical layer of claim 1 or 2, wherein the first anti-reflective nanolayer at least 20 partially surrounds each of the one or more functional patterns along the first side of the substrate.
4. The optical layer of any one of claims 1 to 3, wherein the one or more anti-reflective nanolayers comprises a second anti-reflective nanolayer disposed on the second side of the 25 substrate.
5. The optical layer of any one of claims 1 to 4, wherein there is an absence of an antireflective nanolayer on the second side of the substrate. 30
6. The optical layer of claim 4, wherein the second anti-reflective nanolayer abuts the second side of the substrate.
7. A optical layer comprising: a substrate having a first side and a second side opposite the first side; one or more functional patterns disposed on the first side of the substrate; one or more anti-reflective nanolayers disposed on at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine 5 an effective refractive index of the substrate such that the one or more nanolayers effect a relative amount of light transmittable through the substrate, wherein the one or more anti-reflective nanolayers comprises a first anti-reflective nanolayer disposed on the second side of the substrate; and a film coating disposed between the second side of the substrate and the first anti- 10 reflective nanolayer.
8. A optical layer comprising: a substrate having a first side and a second side opposite the first side; one or more functional patterns disposed on the first side of the substrate; 15 one or more anti-reflective nanolayers disposed on at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers effect a relative amount of light transmittable through the substrate, wherein the one or more anti-reflective nanolayers comprises a first anti-reflective 20 nanolayer disposed on the second side of the substrate; and wherein the one or more functional patterns comprise a plurality of diffraction gratings disposed on the first side of the substrate, and wherein the first anti-reflective nanolayer comprises a plurality of nanoimprint gratings disposed on the second side of the substrate.
9. The optical layer of claim 8, wherein each of the plurality of diffraction gratings and the first anti-reflective nanolayer extends along a common direction.
10. The optical layer of claim 8 or 9, wherein each of the plurality of diffraction gratings 30 extends along a first direction, and wherein the first anti-reflective nanolayer extends along a second direction different from the first direction.
11. A optical layer comprising: a substrate having a first side and a second side opposite the first side; one or more functional patterns disposed on the first side of the substrate; one or more anti-reflective nanolayers disposed on at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers effect a 5 relative amount of light transmittable through the substrate, wherein the one or more functional patterns comprises a first functional pattern, a second function pattern, and a third functional pattern, and wherein the one or more anti-reflective nanolayers comprises a first anti-reflective nanolayer disposed on the first side of the substrate, and 10 wherein the first anti-reflective nanolayer at least partially surrounds each of the first functional pattern, the second function pattern, and the third functional pattern along the first side of the substrate.
12. A optical layer comprising: 15 a substrate having a first side and a second side opposite the first side; one or more functional patterns disposed on the first side of the substrate; one or more anti-reflective nanolayers disposed on at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers effect a 20 relative amount of light transmittable through the substrate, wherein the one or more functional patterns comprises a first functional pattern, a second function pattern, and a third functional pattern, and wherein the one or more anti-reflective nanolayers comprises a first anti-reflective nanolayer and a second anti-reflective nanolayer disposed on the first side of the substrate, 25 wherein the first anti-reflective nanolayer at least partially surrounds the first functional pattern along the first side of the substrate, and wherein the second anti-reflective nanolayer at least partially surrounds the second functional pattern along the first side of the substrate. 30
13. A optical layer comprising: a substrate having a first side and a second side opposite the first side; one or more functional patterns disposed on the first side of the substrate; one or more anti-reflective nanolayers disposed on and abutting at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers effect a relative amount of light transmittable through the substrate, wherein the one or more anti-reflective nanolayers comprises: a first anti-reflective nanolayer abutting the first side of the substrate, and 5 a second anti-reflective nanolayer abutting the first anti-reflective nanolayer, wherein the first anti-reflective nanolayer comprises a first material having a first refractive index, wherein the second anti-reflective nanolayer comprises a second material having a second refractive index, wherein the substrate comprises a third material having a third refractive index, 10 wherein the first refractive index is greater than the second refractive index, and wherein the third refractive index is greater than the first refractive index.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762574826P | 2017-10-20 | 2017-10-20 | |
| PCT/US2018/056644 WO2019079679A1 (en) | 2017-10-20 | 2018-10-19 | Configuring optical layers in imprint lithography processes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NZ763665A NZ763665A (en) | 2025-05-02 |
| NZ763665B2 true NZ763665B2 (en) | 2025-08-05 |
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