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TW202609809A - Micro-pore optics, associated manufacturing methods and x-ray imaging system - Google Patents
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TW202609809A - Micro-pore optics, associated manufacturing methods and x-ray imaging system - Google Patents

Micro-pore optics, associated manufacturing methods and x-ray imaging system

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TW202609809A
TW202609809A TW114125196A TW114125196A TW202609809A TW 202609809 A TW202609809 A TW 202609809A TW 114125196 A TW114125196 A TW 114125196A TW 114125196 A TW114125196 A TW 114125196A TW 202609809 A TW202609809 A TW 202609809A
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Taiwan
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mpo
optical element
microporous
ray
shielding
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TW114125196A
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Chinese (zh)
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文森 里加爾
朱利安 塞居伊
塞吉 杜亞特品托
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法商佛托尼斯法國簡易股份有限公司
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Publication of TW202609809A publication Critical patent/TW202609809A/en

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Abstract

The invention concerns micro pore optics (MPO) for X-ray focusing on an image plane positioned at a predetermined distance or for the creation of a parallel X-ray beam. The micro pore optics (MPO) comprising an array (23) integrates: a plurality of channels (10) through which X-rays can be transmitted and reflected; and a blocking zone in which the array (23) is opaque to X-rays, said blocking zone being arranged at least in a central zone of said micro pore optics (MPO).

Description

微孔光學元件、其相關製造方法及X射線成像系統Microporous optical elements, their manufacturing methods and X-ray imaging systems

本發明涉及X射線成像領域,更具體地涉及用於X射線聚焦或用於產生平行X射線束的微孔光學元件(也稱為MPO)。此外,本發明還涉及製造MPO的方法。This invention relates to the field of X-ray imaging, and more specifically to micro-aperture optical elements (also known as MPOs) for X-ray focusing or for generating parallel X-ray beams. Furthermore, this invention relates to a method for manufacturing an MPO.

雖然MPO傳統上用於X射線望遠鏡,但本發明不僅可用於太空成像領域,還可用於X射線成像和分析應用,例如X射線繞射(X-ray diffraction,XRD)或X射線螢光(X-ray fluorescence,XRF)光譜。Although MPOs are traditionally used in X-ray telescopes, this invention can be used not only in the field of space imaging, but also in X-ray imaging and analysis applications, such as X-ray diffraction (XRD) or X-ray fluorescence (XRF) spectroscopy.

因此,本發明具有多種潛在的應用。Therefore, this invention has a variety of potential applications.

在太空成像領域,人們希望在整個電磁波譜中觀測宇宙。為此,天文學家利用望遠鏡、拋物面天線、微波天線等來記錄來自宇宙的電磁波。In the field of space imaging, the goal is to observe the universe across the entire electromagnetic spectrum. To this end, astronomers use telescopes, parabolic antennas, microwave antennas, and other instruments to record electromagnetic waves from the universe.

然而,X射線觀測是一項重大挑戰,因為這些電磁波會被地球大氣層強烈吸收,無法到達地球表面。此外,製造用於捕獲和聚焦X射線的光學系統也特別複雜,而X射線的能量極高,難以用傳統的光學技術進行操控。為了解決這些技術難題,衛星被設計成採用掠入射光學元件的技術來觀測X射線。However, X-ray observation is a major challenge because these electromagnetic waves are strongly absorbed by the Earth's atmosphere and cannot reach the Earth's surface. Furthermore, creating the optical systems used to capture and focus X-rays is extremely complex, and the extremely high energy of X-rays makes them difficult to manipulate using traditional optical techniques. To overcome these technical difficulties, satellites are designed to use grazing-incidence optical elements to observe X-rays.

與使用折射來偏轉和聚焦光線的光學望遠鏡不同,掠入射光學元件使用反射。Unlike optical telescopes that use refraction to deflect and focus light, grazing-incident optical elements use reflection.

確實,X射線傾向於穿透物質,而不是被物質折射。然而,如果它們以非常小的角度(幾乎平行於表面)撞擊到表面,就會被反射。這個角度非常小,通常以角分或角秒為單位,這反映了射線必須幾乎平行於反射表面。Indeed, X-rays tend to penetrate matter rather than be refracted by it. However, if they strike a surface at a very small angle (almost parallel to the surface), they will be reflected. This angle is so small, usually measured in arcminutes or arcseconds, that it reflects the fact that the rays must be almost parallel to the reflecting surface.

為了在掠入射光學元件中捕獲和聚焦X射線,人們開發了微孔光學元件(micro pore optics,MPO)。由於這些MPO的結構與龍蝦眼相似,因此也被稱為「龍蝦眼」。To capture and focus X-rays in grazing-incidence optical elements, micropore optics (MPOs) have been developed. Because these MPOs have a structure similar to a lobster eye, they are also called "lobster eyes".

MPO傳統上由數千個彼此平行的直而窄的通道陣列組成,通常具有方形結構。這種配置能夠將來自不同方向的X射線反射並聚焦到偵測器或焦點,從而提高X射線捕獲效率。MPOs traditionally consist of thousands of straight, narrow channels arranged parallel to each other, typically with a square structure. This configuration can reflect and focus X-rays from different directions onto the detector or focal point, thereby improving X-ray capture efficiency.

現有技術的圖1中繪示了一種具有通道(10)的MPO,通道(10)具有方形剖面。每個通道(10)的邊長為20微米,且它們也呈正方形排列,每個通道(10)之間的壁(11)厚度為6微米。例如,每個通道(10)的長度實質上等於1毫米。Figure 1 of the prior art illustrates an MPO with channels (10) having a square cross-section. Each channel (10) has a side length of 20 micrometers and is also arranged in a square, with the wall (11) between each channel (10) having a thickness of 6 micrometers. For example, the length of each channel (10) is substantially equal to 1 millimeter.

MPO通常由拉製的玻璃塊製成。更具體地說,第一纖維由可溶於酸的纖芯(例如純玻璃)和一層圍繞於纖芯不溶於相同酸的包層(例如耐多種酸的鉛玻璃)組成。這些第一纖維被稱為一次纖維,透過拉製到第一所需直徑來獲得,然後組裝成由大量一次纖維組成的預製件。MPO is typically made from drawn glass blocks. More specifically, the first fiber consists of an acid-soluble core (e.g., pure glass) and a cladding layer (e.g., leaded glass resistant to multiple acids) surrounding the core. These first fibers, called primary fibers, are obtained by drawing them to a first desired diameter and then assembling them into a preform composed of a large number of primary fibers.

然後,將預製件拉製成第二所需直徑,可獲得源自第一基材的二次纖維,從而形成第二細長基材。然後,沿著給定的切割平面橫向切割第二細長基材。Then, the preform is drawn to a second desired diameter to obtain secondary fibers from the first substrate, thereby forming a second slender substrate. Then, the second slender substrate is transversely cut along a given cutting plane.

此切割步驟能夠形成複數個基板。然後將這些基板浸入酸中,使纖芯溶解,從而暴露出微通道。因此,在纖芯溶解後,基板形成微通道板,其本體由製造方法中每根纖維的包層融合形成。This cutting step can form multiple substrates. These substrates are then immersed in acid to dissolve the fiber core, thereby exposing the microchannels. Thus, after the fiber core is dissolved, the substrate forms a microchannel plate, the body of which is formed by the fusion of the cladding of each fiber in the manufacturing process.

MPO可以是平面的,但也可以形成非平面的MPO,即根據曲率半徑彎曲,但也可以是橢圓形或圓柱形。通道也可以略微變形,同時保持其方形外觀。MPOs can be planar, but they can also be non-planar, meaning they are curved according to the radius of curvature, but they can also be elliptical or cylindrical. The channel can also be slightly deformed while maintaining its square appearance.

為了使用MPO實現聚焦,需要使光子在兩個垂直方向上反射兩次。在影像平面上,來自同一源點的光子,或來自無窮遠處同一方向的光子,然後會聚集在一個點周圍,這個點稱為光斑,從而產生聚焦現象。In order to achieve focusing using MPO, photons need to be reflected twice in two perpendicular directions. On the image plane, photons from the same source point, or from the same direction at infinite distance, will converge around a point called the spot, thus producing the focusing phenomenon.

如現有技術的圖3所繪示,來自相同來源的光子穿透通道(10)的入口段的不同位置:這些位置分別是圖3的區域0、1和2。入口點的差異會導致通道(10)內反射次數的改變。影像平面Pi的方框0、1和2排列於以距離F距通道(10)長度L的中心的位置上,分別繪示在零次、一次或兩次反射後接觸到影像平面Pi的部分。這些反射次數取決於光子在通道(10)入口段Se的穿透點以及通道的寬度d。在影像平面Pi上捕獲的強度也取決於影像平面Pi相對於通道(10)的距離F。As illustrated in Figure 3 of the prior art, photons from the same source penetrate different positions of the entrance segment of the channel (10): these positions are regions 0, 1, and 2 in Figure 3, respectively. The difference in the entrance point leads to a change in the number of reflections within the channel (10). Boxes 0, 1, and 2 of the image plane Pi are arranged at a distance F from the center of the channel (10) length L, respectively illustrating the portion that contacts the image plane Pi after zero, one, or two reflections. These numbers of reflections depend on the penetration point of the photon in the entrance segment Se of the channel (10) and the width d of the channel. The intensity captured on the image plane Pi also depends on the distance F of the image plane Pi relative to the channel (10).

現在,無法確定每個穿過通道(10)的光子是否確實會發生兩次反射,因為光子能夠穿過通道(10)入口段Se處的區域0和區域1,從而導致零次反射或單次反射。除了圖3所示的情況外,還可以觀測到三次、四次等反射。It is not possible to determine whether each photon passing through the channel (10) actually undergoes two reflections, because the photon can pass through regions 0 and 1 at the entrance segment Se of the channel (10), resulting in zero or single reflections. In addition to the case shown in Figure 3, triple, quadruple, and other reflections can also be observed.

不經過任何方式反射或聚焦而直接穿過通道(10)的射線以漫射分佈到達影像平面Pi。Rays that pass directly through channel (10) without being reflected or focused in any way are diffusely distributed to the image plane Pi.

如圖2所繪示,某些射線擦過通道(10)的上表面,並向下反射至偵測器(12)。同樣地,某些光線擦過通道(10)的下表面,並向上反射至偵測器(12)。這兩個反射鏡的射線會匯聚到偵測器(12)的相同高度,但如果它們未在橫向聚焦,則會水平擴散。因此,這類射線在偵測器(12)上呈現為中等強度的水平條。同樣地,某些射線僅被垂直表面反射,而沒有被水平表面反射,並在影像平面Pi上形成垂直條。As illustrated in Figure 2, some rays glide across the upper surface of the channel (10) and are reflected downwards to the detector (12). Similarly, some rays glide across the lower surface of the channel (10) and are reflected upwards to the detector (12). The rays from these two reflectors converge at the same height of the detector (12), but if they are not laterally focused, they will diffuse horizontally. Therefore, these rays appear as horizontal stripes of medium intensity on the detector (12). Likewise, some rays are reflected only by the vertical surface and not by the horizontal surface, forming vertical stripes on the image plane Pi.

最後,某些射線到達角落,先被垂直表面反射,再被水平表面反射,反之亦然。這些雙重反射的射線沿著對角線方向射向偵測器的中心,形成一個非常強烈的中心焦點。Finally, some rays reach the corners, are first reflected by the vertical surface, then by the horizontal surface, and vice versa. These double-reflected rays travel diagonally toward the center of the detector, forming a very strong central focal point.

更具體地說,如圖4所繪示,穿過MPO的通道(10)的源點(13)的光子可能會衝擊影像平面Pi,而不會發生反射(根據衝擊R0),可能會發生一次反射(根據形成十字的衝擊R1),或者會發生兩次反射(從而造成光斑R2)。源點(13)、MPO和影像平面Pi之間的位似比保持不變。因此,存在比率M,它對應於源點(13)與影像平面(Pi)之間的距離L除以源點(13)與MPO之間的距離Ls。此比率M適用於MPO與影像平面Pi之間的空間差異,因此在圖4中,X=M*x和Y=M*y,其中X、Y為影像平面Pi的參考座標,x、y為MPO的參考座標。More specifically, as illustrated in Figure 4, a photon from the source point (13) passing through the channel (10) of the MPO may strike the image plane Pi without reflection (according to the impact R0), may undergo one reflection (according to the impact R1 forming a cross), or may undergo two reflections (resulting in a spot R2). The isosimilarity ratio between the source point (13), the MPO, and the image plane Pi remains constant. Therefore, there exists a ratio M corresponding to the distance L between the source point (13) and the image plane (Pi) divided by the distance Ls between the source point (13) and the MPO. This ratio M applies to the spatial difference between the MPO and the image plane Pi, and thus in Figure 4, X = M*x and Y = M*y, where X and Y are the reference coordinates of the image plane Pi, and x and y are the reference coordinates of the MPO.

因此,如圖5所繪示,沒有集中到焦點的射線會造成十字形雜訊和影像平面中的漫射背景。Therefore, as illustrated in Figure 5, rays that are not focused will cause cross-shaped noise and diffuse background in the image plane.

十字形雜訊問題在現有技術中被廣泛討論,並且多年來一直未能真正解決。The cross-shaped noise problem has been widely discussed in existing technologies and has not been truly solved for many years.

在H. N. Chapman、K. A. Nugent和S. W. Wilkins的公開文獻「使用方形通道毛細管陣列進行 X 射線聚焦(X‐ray focusing using square channel‐capillary arrays)」,Rev. Sci. Instrum.(1991年6月1日);62 (6): 1542–1561中,作者建議透過調整像是通道的縱橫比、表面反射率和幾何形狀的參數來限制十字形雜訊效應,以最佳化MPO的設計。In the publication "X-ray focusing using square channel-capillary arrays" by H. N. Chapman, K. A. Nugent, and S. W. Wilkins, Rev. Sci. Instrum. (June 1, 1991); 62 (6): 1542–1561, the authors suggest optimizing the design of the MPO by limiting the cross-shaped noise effect by adjusting parameters such as the aspect ratio of the channel, surface reflectivity, and geometry.

也提供了圓形排列,例如在G.J. Price、A.N. Brunton、M.W. Beijersbergen、G.W. Fraser、M. Bavdaz、J.-P. Boutot、R. Fairbend、S.-O. Flyckt、A. Peacock、E. Tomaselli的公開文獻:利用Wolter微通道板光學元件進行X射線聚焦(X-ray focusing with Wolter microchannel plate optics),物理研究區段A中的核儀器和方法:加速器、光譜儀、偵測器和相關設備,第490卷,第1-2期,2002年,第276-289頁,ISSN 0168-9002。Circular arrangements are also provided, for example, in the publications of G.J. Price, A.N. Brunton, M.W. Beijersbergen, G.W. Fraser, M. Bavdaz, J.-P. Boutot, R. Fairbend, S.-O. Flyckt, A. Peacock, and E. Tomaselli: X-ray focusing with Wolter microchannel plate optics, Nuclear Instruments and Methods in Physics Section A: Accelerators, Spectrometers, Detectors and Related Equipment, Vol. 490, No. 1-2, 2002, pp. 276-289, ISSN 0168-9002.

在這種類型的排列中,人們力求在形成圓形元件的通道壁上實現單一反射。然而,某些光子可能會不經任何反射就穿過這樣的MPO。這些光子隨後在影像平面中進入漫射背景。In this type of arrangement, the aim is to achieve single reflection on the channel walls that form the circular element. However, some photons may pass through such an MPO without any reflection. These photons then enter the diffuse background in the image plane.

即使強度不如方形配置的情況,但這種漫射背景對於大多數光學應用來說仍然太強烈了。Even though the intensity is not as high as in a square configuration, this diffuse background is still too strong for most optical applications.

在R. Willingale、G. W. Fraser和J. F. Pearson的公開文獻「用於貝皮-可倫坡號上X射線光譜儀的方孔光學元件最佳化(Optimization of square pore optics for the x-ray spectrometer on Bepi-Columbo)」中,Proc. SPIE 5900,EUV、X射線和伽馬射線天文學光學II,590012(2005年9月8日),提出了多種通道排列結構,以限制十字形雜訊的影響。In the publication "Optimization of square pore optics for the x-ray spectrometer on Bepi-Columbo" by R. Willingale, G. W. Fraser, and J. F. Pearson, Proc. SPIE 5900, EUV, X-ray and Gamma-ray Astronomical Optics II, 590012 (September 8, 2005), several channel arrangement structures were proposed to limit the influence of cross-shaped noise.

R. Willingale、J. F. Pearson、A. Martindale、C. H. Feldman、R. Fairbend、E. Schyns、S. Petit、J. P. Osborne 和 P. T. O’ Brien的公開文獻「用於X射線龍蝦眼望遠鏡的方孔微通道光學元件中的像差(Aberrations in square pore micro-channel optics used for x-ray lobster eye telescopes)」,Proc. SPIE 9905,太空望遠鏡和儀器2016:紫外線到伽瑪射線,99051Y(2016年7月18日)描述了使用軟體模型來管理偵測器上的雜訊或模糊概念。The publication "Aberrations in square pore micro-channel optics used for x-ray lobster eye telescopes" by R. Willingale, J. F. Pearson, A. Martindale, C. H. Feldman, R. Fairbend, E. Schyns, S. Petit, J. P. Osborne, and P. T. O’ Brien, Proc. SPIE 9905, Space Telescopes and Instruments 2016: Ultraviolet to Gamma Rays, 99051Y (July 18, 2016) describes the use of software models to manage noise or fuzzy concepts on a detector.

M. Gailhanou、P. Sarrazin和D. Blake的公開文獻「利用平面方孔微通道板光學元件進行X射線螢光全場成像建模(Modeling of x-ray fluorescence full field imaging using planar square pore micro-channel plate optics)」,Appl. Opt. 57, 6795-6807(2018),提供了兩種原始解決方案來限制十字形雜訊的影響。一種是捕獲X射線的同時以隨機角度旋轉通道,另一種是透過旋轉MPO進行連續成像操作來擴展十字形,即將其轉換為均勻的雜訊。這些解決方案不會改變雜訊的總強度,更重要的是,它們不會在光斑附近消除雜訊。The publication by M. Gailhanou, P. Sarrazin, and D. Blake, "Modeling of x-ray fluorescence full field imaging using planar square pore micro-channel plate optics," Appl. Opt. 57, 6795-6807 (2018), provides two original solutions to limit the influence of cross-shaped noise. One is to capture X-rays while rotating the channel at a random angle, and the other is to extend the cross shape through continuous imaging operations by rotating the MPO, i.e., converting it into uniform noise. These solutions do not change the overall intensity of the noise, and more importantly, they do not eliminate noise near the spot.

Songwu Peng、Yizhong Ye、Fei Wei、Zuhua Yang、Yihong Guo和Tianran Sun的公開文獻「利用SMILE衛星上的龍蝦眼型軟X射線成像儀模擬地球磁層頂的數值模型建立(Numerical model built for the simulation of the earth magnetopause by lobster-eye-type soft X-ray imager onboard SMILE satellite)」,Opt. Express 26,15138-15152 (2018)描述了一種包含通道製造誤差的模擬方法,以更具體地表徵影像的品質。The publication by Songwu Peng, Yizhong Ye, Fei Wei, Zuhua Yang, Yihong Guo, and Tianran Sun, “Numerical model built for the simulation of the earth magnetopause by lobster-eye-type soft X-ray imager onboard SMILE satellite”, Opt. Express 26, 15138-15152 (2018), describes a simulation method that incorporates channel manufacturing errors to more concretely characterize image quality.

Songwu Peng、Yizhong Ye、Fei Wei、Yihong Guo和Yizhong Ye的公開文獻「龍蝦眼型寬視野軟X射線成像儀的幾何參數初步最佳化(Preliminary geometric parameters optimization of lobster-eye-type wide field of view soft x-ray imager)」,Opt. Eng. 58(9),093101 (2019)分析了通道曲率半徑的誤差,以限制十字形雜訊的影響。The publication "Preliminary geometric parameters optimization of lobster-eye-type wide field of view soft x-ray imager" by Songwu Peng, Yizhong Ye, Fei Wei, Yihong Guo and Yizhong Ye, Opt. Eng. 58(9), 093101 (2019), analyzes the error of the channel curvature radius to limit the influence of cross-shaped noise.

Jin Li、Takanori Sakamoto、Motoko Serino、Daisuke Yonetoku、Tatsuya Sawano、Ikuyuki Mitsuish和Tatehiro Mihara的公開文獻「龍蝦眼光學元件的X射線性能和模擬研究(X-ray performance and simulation study of lobster eye optics)」,Proc. SPIE 11444,太空望遠鏡和儀器2020:紫外線到伽馬射線,114447C(2020年12月13日)描述了使用軟體模型來管理偵測器上的雜訊或模糊概念,同時積分通道曲率的不均勻性。The published paper "X-ray performance and simulation study of lobster eye optics" by Jin Li, Takanori Sakamoto, Motoko Serino, Daisuke Yonetoku, Tatsuya Sawano, Ikuyuki Mitsuish, and Tatehiro Mihara, Proc. SPIE 11444, Space Telescopes and Instruments 2020: Ultraviolet to Gamma Rays, 114447C (December 13, 2020), describes the use of software models to manage noise or fuzzy concepts on a detector while simultaneously addressing inhomogeneities in the curvature of the integral channel.

An, Siwen & Krapohl, David & Thörnberg, B & Roudot, R & Schyns, E & Norlin, Börje. (2023)的公開文獻.用於全場X射線螢光成像的微孔光學元件特性。儀器期刊。18. C1017. 10.1088/1748-0221/18/01/C01017提供了一種透過快速傅立葉轉換進行影像處理以限制十字形雜訊的影響。The publication of An, Siwen & Krapohl, David & Thörnberg, B & Roudot, R & Schyns, E & Norlin, Börje. (2023). Characteristics of micro-aperture optical elements for full-field X-ray fluorescence imaging. Instrumentation Journal. 18. C1017. 10.1088/1748-0221/18/01/C01017 provides a method for image processing via Fast Fourier Transform to limit the influence of crosshair noise.

總而言之,儘管現有技術提供了多種解決方案來衰減或擴散這種十字形雜訊問題,例如以隨機角度旋轉通道或透過旋轉MPO進行連續成像,但這些解決方案只會將雜訊光子隨機擴散到光斑周圍,而不會顯著減少雜訊光子。In summary, although existing technologies offer various solutions to attenuate or diffuse this cross-shaped noise problem, such as rotating the channel at random angles or performing continuous imaging via a rotating MPO, these solutions only randomly diffuse the noise photons around the spot without significantly reducing the number of noise photons.

這些解決方案可能適用於焦距較大的太空應用,因為雜訊相對較低。然而,當焦距相對較短時,現有技術的解決方案不足,通常用於X射線成像和分析應用,例如X射線繞射或X射線螢光光譜。These solutions may be suitable for space applications with longer focal lengths due to relatively low noise. However, existing solutions are insufficient for shorter focal lengths, typically used for X-ray imaging and analysis applications such as X-ray diffraction or X-ray fluorescence spectroscopy.

因此,本發明的技術問題在於找到如何顯著減少源自MPO的雜訊,以讓MPO能夠用於焦距相對較短的應用。Therefore, the technical problem of this invention is to find a way to significantly reduce noise from the MPO so that the MPO can be used in applications with relatively short focal lengths.

為了解決這個技術問題,本發明提供了對MPO的陣列的中心區域進行不透明處理,使其對X射線不透明。即使存在多次可能的反射會影響MPO的影像平面,此解決方案似乎也能去除影像平面的雜訊最強區域(即光斑周圍的區域)中產生雜訊的光子,該區域的表面積由雜訊區域的表面積決定,並在影像平面上減少。To address this technical problem, the present invention provides an opaque treatment of the central region of the MPO array, making it opaque to X-rays. Even if multiple possible reflections affect the image plane of the MPO, this solution appears to remove noise-generating photons from the area of strongest noise in the image plane (i.e., the area around the spot), the surface area of which is determined by the surface area of the noise region, and thus reduced on the image plane.

此外,在產生平行光束的應用中,例如X射線繞射,該解決方案會去除靠近光軸的光子,從而改善光束的發散性。Furthermore, in applications that generate parallel beams, such as X-ray diffraction, this solution removes photons close to the optical axis, thereby improving the beam's divergence.

因此,根據第一態樣,本發明涉及用於將X射線聚焦在位於預定距離的影像平面上,或用於產生平行X射線束的微孔光學元件,所述微孔光學元件包括整合以下元件的陣列: 複數個通道,X射線能夠透過這些通道透射和反射;以及 一遮擋區域,其中陣列對X射線不透明,所述遮擋區域至少排列在所述微孔光學元件的一中心區域。Therefore, according to the first embodiment, the present invention relates to a microaperture optical element for focusing X-rays onto an image plane located at a predetermined distance, or for generating a parallel X-ray beam, said microaperture optical element comprising an array integrating: a plurality of channels through which X-rays can be transmitted and reflected; and a shielding region, wherein the array is opaque to X-rays, said shielding region being arranged at least in a central region of said microaperture optical element.

因此,中心區域的遮擋可以減少光斑周圍的雜訊。Therefore, blocking the central area can reduce noise around the light spot.

所述中心區域的表面積能夠根據影像平面中待減少的雜訊區域的表面積以及影像平面和所述微孔光學元件之間的距離來確定。The surface area of the central region can be determined based on the surface area of the noise region to be reduced in the image plane and the distance between the image plane and the micro-aperture optical element.

當所述陣列採用圓形排列時,遮擋效果尤其有效。在本實施例中,所述陣列的不同像素依照同心圓圖案規則排列。不同的像素可以是圓形的。在圓形排列中,構成遮擋區域的像素包括至少一個以陣列中心為中心的圓形區域。The occlusion effect is particularly effective when the array is arranged in a circular pattern. In this embodiment, the different pixels of the array are arranged according to a concentric circle pattern. The different pixels can be circular. In a circular arrangement, the pixels constituting the occlusion area include at least one circular area centered on the center of the array.

當微孔光學元件具有方形排列時,遮擋區域較佳地排列在兩個正交的帶中,這些帶位於所述陣列的寬度和長度的中心。When the micro-aperture optical elements are arranged in a square pattern, the shading areas are preferably arranged in two orthogonal bands located at the center of the width and length of the array.

在本實施例中,垂直帶能夠限制對十字的水平分支產生貢獻的光子,而水平帶能夠限制對十字垂直分支產生貢獻的光子。為了定義每個帶的寬度,可以測量影像平面上待減少雜訊區域的大小,然後基於比率M確定每個帶的寬度,該比率M至少由待減少雜訊區域的大小以及影像平面與微孔光學元件MPO之間的距離確定(例如,現有技術中圖4中描述的比率M)。此外,遮擋區域的兩個正交帶限制了對光斑周圍造成漫射背景雜訊的光子。In this embodiment, the vertical band limits photons contributing to the horizontal branches of the crosshair, while the horizontal band limits photons contributing to the vertical branches of the crosshair. To define the width of each band, the size of the noise-to-reduced region on the image plane can be measured, and then the width of each band can be determined based on a ratio M, which is determined at least by the size of the noise-to-reduced region and the distance between the image plane and the microaperture optical element (MPO) (e.g., the ratio M described in Figure 4 in the prior art). Furthermore, the two orthogonal bands of the shading region limit photons that cause diffuse background noise around the spot.

作為變形或補充,對兩個垂直和水平帶進行不透明處理可能更有利,即對由雙曲線輪廓定義的區域進行遮擋,從而與雙曲線輪廓形成十字。這些雙曲線輪廓的數學定義可以使用通道定位座標的乘積x*y,如現有技術圖4所示。因此,乘積x*y小於常數的每個通道都可以被遮擋。實際上,光子到達MPO的點(x, y)並反射至光斑的機率與乘積x*y成正比。因此,這種遮擋限制了光斑周圍區域中的雜訊光子,並進一步減少了該區域以外的雜訊水平,同時對到達光斑的通量影響非常有限。As a variation or supplement, it may be more advantageous to apply opacity to both the vertical and horizontal bands, i.e., to occlude the region defined by the hyperbolic contour, thereby forming a cross with the hyperbolic contour. The mathematical definition of these hyperbolic contours can be achieved using the product of the channel positioning coordinates, x*y, as shown in Figure 4 of the prior art. Therefore, each channel whose product x*y is less than a constant can be occluded. In fact, the probability of a photon reaching the point (x, y) of the MPO and reflecting back to the spot is proportional to the product x*y. Therefore, this occlusion restricts noisy photons in the region surrounding the spot and further reduces the noise level outside that region, while having a very limited effect on the flux reaching the spot.

此外,所述源可以定位在所述微孔光學元件的焦平面上,以傳送準直光束。Furthermore, the source can be positioned on the focal plane of the microporous optical element to transmit a collimated beam.

在準直應用中,通常用於X射線成像和分析應用,以所述微孔光學元件的寬度和長度為中心的帶的存在去除了在垂直平面和水平平面上的發散度小於1/2*Δ/Ls的雜訊光子,其中Ls對應於源和MPO之間的距離,如現有技術的圖4所示,其中Δ是遮擋區域的尺寸。In collimation applications, commonly used in X-ray imaging and analysis, the presence of a band centered on the width and length of the microaperture optical element removes noise photons with a divergence of less than 1/2*Δ/Ls in the vertical and horizontal planes, where Ls corresponds to the distance between the source and the MPO, as shown in Figure 4 of the prior art, where Δ is the size of the obscured area.

作為變型,可以以產生聚焦光束的方式選擇所述源相對於所述微孔光學元件及其焦平面的位置。As a variation, the position of the source phase relative to the microporous optical element and its focal plane can be selected in a manner that generates a focused beam.

對於某些應用,微孔光學元件沿光軸的曲率半徑也可以為正或負。For some applications, the radius of curvature of a micro-aperture optical element along its optical axis can be positive or negative.

根據第一實施例,所述遮擋區域由位於複數個通道之間的遮擋板形成。在本實施例中,複數個傳統的微型MPO圍繞不透明結構組裝。這樣,可以獲得一個僅覆蓋陣列一部分的MPO,並且所有通道在四個角落處均開放,遮擋板形成中心十字。在這種情況下,可以在陣列的每個角落放置單一微型MPO,也可以在每個角落放置複數個微型MPO,因此需要使用4個、16個或36個微型MPO。在本實施例中,陣列的行和列由遮擋板和不同的微型MPO共同構成。According to the first embodiment, the shielding area is formed by shielding plates located between a plurality of channels. In this embodiment, a plurality of conventional micro MPOs are assembled around an opaque structure. This results in an MPO that covers only a portion of the array, with all channels open at the four corners and the shielding plates forming a central cross. In this case, a single micro MPO can be placed at each corner of the array, or a plurality of micro MPOs can be placed at each corner, thus requiring the use of 4, 16, or 36 micro MPOs. In this embodiment, the rows and columns of the array are formed by shielding plates and different micro MPOs.

根據第二實施例,遮擋區域由附接至所述複數個通道之一部分的遮擋板形成。在本實施例中,MPO陣列是以第一步驟形成,其中所有通道均處於開放狀態,且遮擋區域是在第二步驟中藉由安裝遮擋板形成。According to the second embodiment, the shielding area is formed by a shield attached to a portion of one of the plurality of channels. In this embodiment, the MPO array is formed in the first step, in which all channels are in an open state, and the shielding area is formed in the second step by installing the shield.

在這兩個實施例中,遮擋板可以由鉛或其他任何對X射線不透明的材料製成。In both embodiments, the shield can be made of lead or any other material that is opaque to X-rays.

在第二實施例中,遮擋板可以印刷在沉積在所述微孔光學元件上的薄膜上或直接印刷在所述微孔光學元件上。In the second embodiment, the shield can be printed on a thin film deposited on the microporous optical element or directly printed on the microporous optical element.

在第三實施例中,遮擋區域是透過對所述複數個通道之一部分進行切趾處理而形成。在本實施例中,陣列中的某些通道因此經由切趾處理而被遮擋,即在陣列形成之前或之後對遮擋區域中的通道進行結構修改,使得切趾後的通道對X射線不透明。In the third embodiment, the obscuring region is formed by apodizing a portion of one of the plurality of channels. In this embodiment, certain channels in the array are thus obscuring by apodizing, i.e., the channels in the obscuring region are structurally modified before or after the array is formed, so that the apodized channels are opaque to X-rays.

為了執行這種切趾,可以使用多種不同的方法。例如,可以使用三維列印技術,利用配置好的列印模板來獲得切趾通道,該列印模板配置為形成所述通道,所述通道形成陣列的所述遮擋區域。To perform this apodization, a variety of different methods can be used. For example, three-dimensional printing technology can be used to obtain the apodization channel using a configured printing template, which is configured to form the channel, which forms the array of the occlusion areas.

也可以修改形成遮擋通道的傳統製造方法。為此,該方法可以包括以下步驟: 形成具有可溶於酸的一纖芯以及圍繞該纖芯不溶於相同酸的一包層的傳輸纖維; 形成具有一纖芯和圍繞該纖芯不溶於所述酸的一包層的遮擋纖維; 將該傳輸纖維與該遮擋纖維組裝在一起,使得所述遮擋纖維至少排列在所述微孔光學元件(MPO)的一中心區域中; 根據一所需厚度橫向切割該組件以形成一基板;以及 對該基板進行化學蝕刻,以僅打開該傳輸纖維的通道。The conventional manufacturing method for forming the shielding channels can also be modified. To this end, the method may include the following steps: forming a core soluble in an acid and a cladding surrounding the core insoluble in the same acid; forming a shielding fiber having a core and a cladding surrounding the core insoluble in the acid; assembling the transport fiber and the shielding fiber together such that the shielding fiber is arranged at least in a central region of the microporous optical element (MPO); transversely dicing the assembly to a desired thickness to form a substrate; and chemically etching the substrate to open only the channels of the transport fibers.

在通道形成方法中,可以使用傳輸和遮擋纖維的複數個圖紙和連續組裝,或者也可以對MPO應用特定處理,例如旨在控制開放通道粗糙度的處理。In the channel forming method, multiple drawings and continuous assemblies of transport and shielding fibers can be used, or specific treatments can be applied to the MPO, such as treatments designed to control the roughness of the open channel.

為此,可以在通道內部沉積金屬化層,或使用玻璃成型技術,該技術在於加熱通道,直到它們變得足夠軟以形成模具的形狀,該技術也稱為「塌陷(slumping)」。To this end, a metallization layer can be deposited inside the channel, or a glass-forming technique can be used, which involves heating the channel until it becomes soft enough to form the shape of the mold. This technique is also known as "slumping".

根據另一態樣,本發明還涉及一種樣品的X射線成像系統,包括: 一X射線源,配置為透過如本發明第一態樣之微孔光學元件照射所述樣品;以及 一偵測器,放置在源自所述樣品的射線的一反射平面上。According to another embodiment, the present invention also relates to an X-ray imaging system for a sample, comprising: an X-ray source configured to irradiate the sample through a microporous optical element as described in the first embodiment of the present invention; and a detector placed on a reflective plane of the radiation originating from the sample.

作為變型,樣品的X射線成像系統,包括: 一X射線源,配置為照射所述樣品; 如本發明第一態樣之微孔光學元件;以及 一偵測器,放置在所述微孔光學元件的影像平面上,所述微孔光學元件配置為收集來自樣品的光子以將其傳輸到偵測器。As a variation, the X-ray imaging system for the sample includes: an X-ray source configured to irradiate the sample; a microporous optical element as in the first state of the present invention; and a detector placed on the image plane of the microporous optical element, the microporous optical element being configured to collect photons from the sample for transmission to the detector.

為了提高微孔光學元件的性能,可以使用排列在其後方的遮罩。這樣,此遮罩就可以完全遮擋影像平面中「十字形雜訊」光子到達的區域(即未透過通道遮擋保護而免受雜訊影響的區域)。To improve the performance of micro-aperture optical elements, a mask can be used behind them. In this way, the mask can completely block the area in the image plane where "cross-shaped noise" photons reach (i.e., the area that is not protected from noise by the channel shield).

較佳地,微孔光學元件放置在第一X射線發射元件與第二X射線接收元件之間,第一X射線發射元件例如是所述X射線源或所述樣品,第二X射線接收元件例如是所述樣品或所述偵測器; 所述第一元件放置在以距離L1距所述微孔光學元件的位置,並且具有由第一尺寸A1和第二尺寸B1形成的表面積; 所述第二元件放置在以距離L2距所述微孔光學元件的位置,並且具有由第三尺寸A2和第四尺寸B2形成的表面積; 所述微孔光學元件的遮擋區域排列在兩個正交的帶中,一第一帶沿第一軸具有一最小尺寸d1,一第二帶沿第二軸具有一最小尺寸d2; 第一最小尺寸等於d1,大於(L1A1+L2A2)/(5*(L1+L2)),特別是大於(L1A1+L2A2)/(3*(L1+L2)),且較佳大於(L1A1+L2A2)/(L1+L2); 第二最小尺寸等於d2,大於(L1B1+L2B2)/(5*(L1+L2)),特別是大於(L1B1+L2B2)/(3*(L1+L2)),且較佳大於(L1B1+L2B2)/(L1+L2)。Preferably, the microporous optical element is placed between a first X-ray emitting element and a second X-ray receiving element, the first X-ray emitting element being, for example, the X-ray source or the sample, and the second X-ray receiving element being, for example, the sample or the detector; the first element is placed at a distance L1 from the microporous optical element and has a surface area formed by a first dimension A1 and a second dimension B1; the second element is placed at a distance L2 from the microporous optical element and has a surface area formed by a third dimension A2 and a fourth dimension B2; the shielding areas of the microporous optical element are arranged in two orthogonal bands, a first band having a minimum dimension d1 along a first axis and a second band having a minimum dimension d2 along a second axis; The first minimum dimension is equal to d1, which is greater than (L1A1+L2A2)/(5*(L1+L2)), especially greater than (L1A1+L2A2)/(3*(L1+L2)), and preferably greater than (L1A1+L2A2)/(L1+L2); the second minimum dimension is equal to d2, which is greater than (L1B1+L2B2)/(5*(L1+L2)), especially greater than (L1B1+L2B2)/(3*(L1+L2)), and preferably greater than (L1B1+L2B2)/(L1+L2).

如圖7至10所繪示,本發明因此提供了微孔光學元件MPO,用於將X射線聚焦在影像平面Pi上或產生平行X射線束。如現有技術的圖3和圖4中所繪示,此微孔光學元件旨在相對於影像平面Pi以預定距離F放置。與傳統的微孔光學元件不同,本發明的微孔光學元件包括具有遮擋區域的陣列(23),該陣列在遮擋區域內對X射線不透明。此遮擋區域可僅是微孔光學元件MPO的中心區域,尤其是在微孔光學元件具有圓形排列時。除了遮擋區域之外,陣列還整合了複數個通道(10),X射線能夠透過這些通道透射和反射,就像傳統的微孔光學元件的通道一樣。As illustrated in Figures 7 to 10, the present invention therefore provides a microaperture optical element (MPO) for focusing X-rays onto an image plane Pi or generating a parallel X-ray beam. As illustrated in Figures 3 and 4 of the prior art, this microaperture optical element is intended to be positioned relative to the image plane Pi at a predetermined distance F. Unlike conventional microaperture optical elements, the microaperture optical element of the present invention comprises an array (23) having a shielding region that is opaque to X-rays within the shielding region. This shielding region may be simply the central region of the microaperture optical element (MPO), especially when the microaperture optical element has a circular arrangement. In addition to the shielding region, the array also integrates a plurality of channels (10) through which X-rays can be transmitted and reflected, just like the channels of conventional microaperture optical elements.

為了確定中心區域的表面積,只需在微孔光學元件不包括遮擋區域的情況下,確定影像平面Pi上待減少的雜訊區域,然後應用關於影像平面Pi和微孔光學元件MPO之間距離F的位似原理即可。如圖7至圖10所示,在方形排列中,十字形雜訊較佳需要使用兩個正交帶形式的遮擋區域。這些正交帶在圖7中繪示為兩個通道被遮擋的帶。作為變形或補充,除了這兩個帶之外,還可以使用具有雙曲線輪廓的十字,如圖8所示。To determine the surface area of the central region, simply identify the noise area to be reduced on the image plane Pi, excluding the obstruction area of the microaperture optical element (MPO), and then apply the similarity principle regarding the distance F between the image plane Pi and the MPO. As shown in Figures 7 to 10, in a square arrangement, cross-shaped noise is better achieved by using two orthogonal band obstruction areas. These orthogonal bands are illustrated in Figure 7 as bands that obstruct two channels. As a variation or supplement, in addition to these two bands, a cross with a hyperbolic profile can also be used, as shown in Figure 8.

具有直線或雙曲線輪廓的十字可以透過切趾通道(21)獲得。這些通道的切趾相當於一種遮擋,使得這些通道對X射線不透明。為此,可以透過3D列印技術形成微孔光學元件陣列,其中列印模板僅在不應進行切趾的區域整合開放通道(10)。Crosses with straight or hyperbolic contours can be obtained through apodized channels (21). The apodization of these channels acts as a shield, making them opaque to X-rays. For this purpose, microporous optical element arrays can be formed using 3D printing technology, where the printing template integrates open channels (10) only in areas where apodization should not be performed.

作為一種變形,可以在微孔光學元件形成之後進行切趾,例如,將鉛遮擋板放置在所需的遮擋區域上方。As a variation, apodization can be performed after the microporous optical element has been formed, for example, by placing a lead shield over the desired shielding area.

此外,還可以透過修改傳統的製造方法,將切趾通道(21)排列在所需位置,從而形成微孔光學元件。為此目的,微孔光學元件的纖維形成傳統上包括以下步驟:形成傳輸纖維,該傳輸纖維具有可溶於酸的纖芯和不溶於相同酸的包層;然後對這些纖維進行組裝和拉製,以獲得具有預定直徑的傳輸纖維。Furthermore, the apodized channels (21) can be arranged in the desired positions by modifying the traditional manufacturing method, thereby forming a microporous optical element. For this purpose, the fiber formation of the microporous optical element traditionally includes the following steps: forming transport fibers having an acid-soluble core and an acid-insoluble cladding; and then assembling and drawing these fibers to obtain transport fibers with a predetermined diameter.

此外,在形成這些傳輸纖維的同時,可以用相同的方法形成遮擋纖維,前提是包層和纖芯不溶於酸。然後,如圖7或8的實施例所繪示,可以將傳輸纖維和遮擋纖維按照所需的圖案組裝在一起,形成陣列(23)。Furthermore, shielding fibers can be formed in the same way as these transport fibers, provided that the cladding and core are insoluble in acid. Then, as illustrated in the embodiments of Figure 7 or 8, the transport fibers and shielding fibers can be assembled together in the desired pattern to form an array (23).

在組裝階段結束時,可以根據所需厚度對組件進行橫向切割,以形成基板,然後執行傳統步驟,其中對基板進行化學蝕刻以打開傳輸纖維的通道。如圖7或8所繪示,在這個化學蝕刻方法結束時,由此形成的MPO可以是具有遮擋纖維的MPO,該遮擋纖維形成了切趾通道(21)。At the end of the assembly phase, the component can be transversely cut to form a substrate according to the required thickness, and then a conventional step is performed in which the substrate is chemically etched to open channels for the transport fibers. As illustrated in Figure 7 or 8, at the end of this chemical etching process, the resulting MPO can be an MPO with shielding fibers that form atodial channels (21).

如圖9或10所繪示,作為此方法的變形,也可以將微型MPO(25)放置在形成遮擋區域的遮擋板(24)周圍。在這些實施例中,十字形遮擋板(24)設置在陣列(23)的中心,陣列的四個角落由覆蓋陣列其餘部分的微型MPO構成。在圖9的示例中,陣列(23)的每個角落都排列了一個微型MPO,而在圖10的實施例中,陣列(23)的每個角落都排列了4個微型MPO(25)。作為變形,陣列的每個角落也可以整合9個或更多微型MPO(25)。As illustrated in Figures 9 or 10, as a variation of this method, micro MPOs (25) can also be placed around the shielding plate (24) that forms the shielding area. In these embodiments, the cross-shaped shielding plate (24) is positioned at the center of the array (23), and the four corners of the array are formed by micro MPOs covering the rest of the array. In the example of Figure 9, one micro MPO is arranged at each corner of the array (23), while in the embodiment of Figure 10, four micro MPOs (25) are arranged at each corner of the array (23). As a variation, nine or more micro MPOs (25) can also be integrated at each corner of the array.

此外,遮擋板(24)可以具有與圖9和圖10中所繪示的形狀不同的其他形狀,例如具有雙曲線輪廓或僅排列在MPO的中心區域上,例如當MPO具有圓形排列時。In addition, the baffle (24) may have other shapes that are different from those shown in Figures 9 and 10, such as having a hyperbolic profile or being arranged only in the central area of the MPO, for example when the MPO has a circular arrangement.

如圖11和圖12所繪示,除了對MPO的陣列(23)的某些部分進行切趾或遮擋之外,還可以沿著MPO的光軸Ao列印特定的曲率半徑。特別地,在圖11中,MPO沿光軸Ao具有正曲率半徑,以便在影像平面Pi上傳送準直束(14)。作為變形,在圖12所繪示的實施例中,微孔光學元件MPO沿光軸Ao具有負曲率半徑,以便傳送聚焦於影像平面Pi上某點或至少縮小空間的束(15)。As illustrated in Figures 11 and 12, in addition to apodizing or occluding certain portions of the MPO array (23), a specific radius of curvature can be printed along the optical axis Ao of the MPO. In particular, in Figure 11, the MPO has a positive radius of curvature along the optical axis Ao to transmit a collimated beam (14) on the image plane Pi. As a variation, in the embodiment illustrated in Figure 12, the microaperture optical element MPO has a negative radius of curvature along the optical axis Ao to transmit a beam (15) focused on a point on the image plane Pi or at least a reduced space.

因此,本發明尤其適用於限制使用MPO的系統中所產生的雜訊。事實上,如圖6所繪示,相對於現有技術的MPO,本發明方形排列的MPO所產生的十字形雜訊得到了限制。Therefore, the present invention is particularly applicable to limiting the noise generated in systems using MPOs. In fact, as illustrated in Figure 6, the cross-shaped noise generated by the square-arranged MPOs of the present invention is limited compared to prior art MPOs.

目前雜訊是MPO的關鍵因素,所以這種雜訊限制使得我們能夠設想MPO的新應用。例如,現在可以設計高效率的X射線成像系統來檢測樣品(16)的特性。如圖13所繪示,可以將X射線源(17)放置在樣品(16)的對面,使得樣品(16)上的X射線繞射在到達偵測器(12)之前穿過MPO。Currently, noise is a key factor in MPO, so this noise limitation allows us to envision new applications for MPO. For example, it is now possible to design a highly efficient X-ray imaging system to detect the characteristics of a sample (16). As illustrated in Figure 13, an X-ray source (17) can be placed opposite the sample (16) so that the X-rays on the sample (16) diffract through the MPO before reaching the detector (12).

作為圖13所繪示的X射線成像系統的變形,如圖14所示,也可以將MPO放置在X射線源(17)和樣品(16)之間,偵測器(12)直接捕獲樣品(16)反射點的強度。As a variation of the X-ray imaging system illustrated in Figure 13, as shown in Figure 14, the MPO can also be placed between the X-ray source (17) and the sample (16), and the detector (12) directly captures the intensity of the reflection point of the sample (16).

另外,還可以在微孔光學元件MPO和偵測器之間設置一個遮罩,以遮擋部分影像平面,進一步限制其上測量的雜訊。Additionally, a mask can be placed between the micro-aperture optical element (MPO) and the detector to partially block the image plane, further limiting the noise measured on it.

總而言之,本發明透過對微孔光學元件陣列的某些部分進行切趾或不透明處理,以限制其影像平面上的雜訊,尤其是在光斑周圍,或改善平行光束的品質(尤其是在光束主方向周圍)。因此,影像平面雜訊的減少提高了微孔光學元件的整體性能,並有望實現大量新的應用,尤其是樣品的X射線分析。 [遮擋區域尺寸]In summary, this invention limits noise on the image plane, particularly around the spot, or improves the quality of parallel beams (especially around the main beam direction) by apodizing or opaque portions of the microaperture optical element array. Therefore, the reduction of image plane noise improves the overall performance of the microaperture optical element and holds promise for numerous new applications, especially X-ray analysis of samples. [Obscured Area Size]

參考圖15,本發明的一個態樣是一種X射線成像系統,其包括光軸(18)。此X射線成像系統沿著光軸(18)連續地包括第一X射線發射元件(19)、微孔光學元件(MPO)和第二X射線接收元件(20)。Referring to Figure 15, one embodiment of the present invention is an X-ray imaging system, which includes an optical axis (18). This X-ray imaging system includes a first X-ray emitting element (19), a micro-aperture optical element (MPO), and a second X-ray receiving element (20) continuously along the optical axis (18).

參考圖13,第一X射線發射元件(19)可以是待成像的樣品(16)。第二X射線接收元件(20)可以是偵測器(12)。Referring to Figure 13, the first X-ray emitting element (19) can be the sample (16) to be imaged. The second X-ray receiving element (20) can be a detector (12).

參考圖14,第一X射線發射元件(19)可以是X射線源(17)。第二X射線接收元件(20)可以是待成像的樣品(16)。Referring to Figure 14, the first X-ray emitting element (19) can be an X-ray source (17). The second X-ray receiving element (20) can be the sample (16) to be imaged.

參考圖15,第一元件(19)在垂直於光軸(18)並沿第一軸的平面上可具有等於A1的第一尺寸,在垂直於光軸(18)並沿第二軸的平面上可具有等於B1的第二尺寸,該第二軸與第一軸垂直。第一尺寸和第二尺寸例如是第一元件(19)的可用尺寸。Referring to Figure 15, the first element (19) may have a first dimension equal to A1 on a plane perpendicular to the optical axis (18) and along the first axis, and a second dimension equal to B1 on a plane perpendicular to the optical axis (18) and along the second axis, which is perpendicular to the first axis. The first and second dimensions are, for example, the available dimensions of the first element (19).

第二元件(20)在垂直於光軸(18)並沿第一軸的平面上可具有等於A2的第三尺寸,在垂直於光軸(18)並沿第二軸的平面上可具有等於B2的第四尺寸,該第二軸與第一軸垂直。第三尺寸和第四尺寸例如是第二元件(20)的可用尺寸。The second element (20) may have a third dimension equal to A2 in a plane perpendicular to the optical axis (18) and along the first axis, and a fourth dimension equal to B2 in a plane perpendicular to the optical axis (18) and along the second axis, which is perpendicular to the first axis. The third and fourth dimensions are, for example, the available dimensions of the second element (20).

第一元件(19)放置在沿光軸(18)以等於L1的距離距微孔光學元件MPO的位置。第二元件(20)放置在沿光軸(18)以等於L2的距離距微孔光學元件MPO的位置。The first element (19) is placed along the optical axis (18) at a distance equal to L1 from the microporous optical element MPO. The second element (20) is placed along the optical axis (18) at a distance equal to L2 from the microporous optical element MPO.

如圖15所繪示,微孔光學元件MPO可包括具有兩個正交帶的遮擋區域,這兩個帶分別位於微孔光學元件MPO的陣列(23)的寬度和長度的中心。因此,圖15中的微孔光學元件MPO在垂直於光軸(18)的平面內包括沿第一軸具有最小尺寸d1的第一帶,以及沿第二軸具有最小尺寸d2的第二帶。As illustrated in Figure 15, a microporous optical element (MPO) may include a shielding region having two orthogonal bands located at the center of the width and length of the MPO array (23), respectively. Therefore, the MPO in Figure 15 includes a first band with a minimum dimension d1 along the first axis and a second band with a minimum dimension d2 along the second axis in a plane perpendicular to the optical axis (18).

第一最小尺寸等於d1,可大於(L1A1+L2A2)/(5*(L1+L2)),特別是大於(L1A1+L2A2)/(3*(L1+L2)),且較佳大於(L1A1+L2A2)/(L1+L2)。因此,沿著第一軸造成漫射背景影像雜訊的大部分光子會被微孔光學元件MPO濾除。The first minimum dimension is equal to d1, which can be greater than (L1A1+L2A2)/(5*(L1+L2)), especially greater than (L1A1+L2A2)/(3*(L1+L2)), and preferably greater than (L1A1+L2A2)/(L1+L2). Therefore, most of the photons that cause diffuse background noise along the first axis will be filtered out by the microporous optical element MPO.

第二最小尺寸等於d2,可以大於(L1B1+L2B2)/(5*(L1+L2)),特別是大於(L1B1+L2B2)/(3*(L1+L2)),且較佳大於(L1B1+L2B2)/(L1+L2)。因此,沿著第二軸造成漫射背景影像雜訊的大部分光子會被微孔光學元件MPO濾除。The second minimum size is equal to d2, which can be greater than (L1B1+L2B2)/(5*(L1+L2)), especially greater than (L1B1+L2B2)/(3*(L1+L2)), and preferably greater than (L1B1+L2B2)/(L1+L2). Therefore, most of the photons that cause diffuse background noise along the second axis will be filtered out by the microporous optical element MPO.

0~2:區域 10:通道 11:壁 12:偵測器 13:源點 14:準直束 15:束 16:樣品 17:X射線源 18:光軸 19:第一X射線發射元件 20:第二X射線接收元件 21:切趾通道 23陣列: 24:遮擋板 25:微型MPO Ao:光軸 A1:第一尺寸 A2:第三尺寸 B1:第二尺寸 B2:第四尺寸 d:寬度 d1,d2:最小尺寸 F,L1,L2:距離 L:長度 MPO:微孔光學元件 Pi:影像平面 R0,R1:衝擊 R2:光斑 Se:入口段0~2: Region 10: Channel 11: Wall 12: Detector 13: Source 14: Collimating Beam 15: Beam 16: Sample 17: X-ray Source 18: Optical Axis 19: First X-ray Emitting Element 20: Second X-ray Receiving Element 21: Apodized Channel 23: Array 24: Baffle 25: Miniature MPO Ao: Optical Axis A1: First Dimension A2: Third Dimension B1: Second Dimension B2: Fourth Dimension d: Width d1, d2: Minimum Dimension F, L1, L2: Distance L: Length MPO: Micro-aperture Optical Element Pi: Image Plane R0, R1: Impact R2: Spot Se: Entrance Section

透過以下結合附圖所給出的作為非限制性指示的實施例的示例,可以更好地了解本發明的實施方式以及由此產生的優點。 圖1是現有技術的微孔光學元件的通道的立體圖; 圖2繪示了圖1的微孔光學元件的通道的剖視圖,其造成部分十字形雜訊; 圖3繪示了現有技術的微孔光學元件內部可能出現的反射的立體圖; 圖4繪示了根據現有技術的源、微孔光學元件和影像平面之間的色散; 圖5繪示了現有技術的微孔光學元件的影像平面; 圖6繪示了根據本發明的實施例的利用微孔光學元件所獲得的影像平面; 圖7繪示了根據本發明第一實施例的微孔光學元件的俯視圖; 圖8繪示了根據本發明第二實施例的微孔光學元件的俯視圖; 圖9繪示了根據本發明第三實施例的微孔光學元件的俯視圖; 圖10繪示了根據本發明第四實施例的微孔光學元件的俯視圖; 圖11繪示了根據本發明實施例的具有第一曲率半徑的微孔光學元件的剖視圖; 圖12繪示了根據本發明實施例的具有第二曲率半徑的微孔光學元件的剖視圖; 圖13繪示了根據本發明的整合微孔光學元件的樣品的第一X射線成像系統的簡化表示; 圖14繪示了根據本發明的整合微孔光學元件的樣品的第二X射線成像系統的簡化表示;以及 圖15示意性地繪示了根據本發明實施例的X射線成像系統,該系統包括根據本發明實施例的微孔光學元件。The embodiments of the present invention and the advantages thereof can be better understood through the following examples of non-limiting instructions given in conjunction with the accompanying drawings. Figure 1 is a perspective view of the channel of a prior art micro-aperture optical element; Figure 2 shows a cross-sectional view of the channel of the micro-aperture optical element of Figure 1, which causes partial cross-shaped noise; Figure 3 shows a perspective view of possible reflections inside a prior art micro-aperture optical element; Figure 4 shows the dispersion between the source, the micro-aperture optical element, and the image plane according to the prior art; Figure 5 shows the image plane of a prior art micro-aperture optical element; Figure 6 shows the image plane obtained using a micro-aperture optical element according to an embodiment of the present invention; Figure 7 shows a top view of a micro-aperture optical element according to a first embodiment of the present invention; Figure 8 shows a top view of a micro-aperture optical element according to a second embodiment of the present invention; Figure 9 shows a top view of a micro-aperture optical element according to a third embodiment of the present invention. Figure 10 illustrates a top view of a micro-aperture optical element according to a fourth embodiment of the present invention; Figure 11 illustrates a cross-sectional view of a micro-aperture optical element having a first radius of curvature according to an embodiment of the present invention; Figure 12 illustrates a cross-sectional view of a micro-aperture optical element having a second radius of curvature according to an embodiment of the present invention; Figure 13 illustrates a simplified representation of a first X-ray imaging system of a sample integrating a micro-aperture optical element according to the present invention; Figure 14 illustrates a simplified representation of a second X-ray imaging system of a sample integrating a micro-aperture optical element according to the present invention; and Figure 15 schematically illustrates an X-ray imaging system according to an embodiment of the present invention, the system including a micro-aperture optical element according to an embodiment of the present invention.

10:通道 10: Channel

23:陣列 23: Formation

24:遮擋板 24: Visor

25:微型MPO 25: Miniature MPO

MPO:微孔光學元件 MPO: Microporous Optical Components

Claims (15)

一種微孔光學元件(MPO),用於將X射線聚焦在位於一預定距離(F)處的一影像平面(Pi)上或用於產生一平行X射線束,所述微孔光學元件(MPO)包括一陣列(23),該陣列整合了: 複數個通道(10),X射線可透過該等通道透射和反射;以及 一遮擋區域,其中該陣列(23)對X射線不透明,所述遮擋區域至少排列在所述微孔光學元件(micro pore optics,MPO)的一中心區域。A micropore optics (MPO) for focusing X-rays onto an image plane (Pi) at a predetermined distance (F) or for generating a parallel X-ray beam, the MPO comprising an array (23) integrating: a plurality of channels (10) through which X-rays can be transmitted and reflected; and a shielding region, wherein the array (23) is opaque to X-rays, the shielding region being arranged at least in a central region of the micropore optics (MPO). 如請求項1之微孔光學元件(MPO),其中該陣列(23)具有一方形排列。For example, the microporous optical element (MPO) of claim 1, wherein the array (23) has a square arrangement. 如請求項2之微孔光學元件(MPO),其中該遮擋區域排列在兩個正交的帶中,該等帶位於所述陣列(23)的寬度和長度的中心。For example, the microporous optical element (MPO) of claim 2, wherein the shading region is arranged in two orthogonal bands located at the center of the width and length of the array (23). 如請求項2或3之微孔光學元件(MPO),其中該遮擋區域排列成具有雙曲線輪廓的一十字。For example, the microporous optical element (MPO) of claim 2 or 3, wherein the shielding regions are arranged in a cross shape with a hyperbolic profile. 如請求項1之微孔光學元件(MPO),其中該陣列(23)具有一圓形排列。For example, the microporous optical element (MPO) of claim 1, wherein the array (23) has a circular arrangement. 如請求項1至5中任一項之微孔光學元件(MPO),其中該遮擋區域由介於該複數個通道(10)之間的一遮擋板(24)形成。For example, a microporous optical element (MPO) of any of claims 1 to 5, wherein the shielding area is formed by a shielding plate (24) between the plurality of channels (10). 如請求項1至5中任一項之微孔光學元件(MPO),其中該遮擋區域由附接到所述複數個通道之一部分(10)的一遮擋板形成。Microporous optical element (MPO) of any of claims 1 to 5, wherein the shielding area is formed by a shielding plate attached to a portion (10) of one of the plurality of channels. 如請求項1至5中任一項之微孔光學元件(MPO),其中該遮擋區域由所述複數個通道(10)之一部分的一切趾形成。Microporous optical element (MPO) of any of claims 1 to 5, wherein the shielding area is formed by a portion of one of the plurality of channels (10). 如請求項1至8中任一項之微孔光學元件(MPO),其中該微孔光學元件(MPO)沿一光軸(Ao)具有一正或負的曲率半徑。The microporous optical element (MPO) of any of claims 1 to 8, wherein the microporous optical element (MPO) has a positive or negative radius of curvature along an optical axis (Ao). 一種製造如請求項8之微孔光學元件(MPO)的方法,其中該方法包括以下步驟: 形成具有可溶於酸的一纖芯以及圍繞該纖芯不溶於相同酸的一包層的傳輸纖維; 形成具有一纖芯和圍繞該纖芯不溶於所述酸的一包層的遮擋纖維; 將該傳輸纖維與該遮擋纖維組裝在一起,使得所述遮擋纖維至少排列在所述微孔光學元件(MPO)的一中心區域中; 根據一所需厚度橫向切割該組件以形成一基板;以及 對該基板進行化學蝕刻,以僅打開該傳輸纖維的通道。A method for manufacturing a microporous optical element (MPO) as claimed in claim 8, wherein the method comprises the following steps: forming a core having an acid-soluble core and a cladding around the core that is insoluble in the same acid; forming a shielding fiber having a core and a cladding around the core that is insoluble in the acid; assembling the transport fiber and the shielding fiber together such that the shielding fiber is arranged at least in a central region of the microporous optical element (MPO); transversely dicing the assembly to a desired thickness to form a substrate; and chemically etching the substrate to open only the channels of the transport fiber. 一種製造如請求項8之微孔光學元件(MPO)的方法,其中該微孔光學元件(MPO)透過利用一列印模板進行三維列印來形成,該列印模板配置為形成遮擋通道(21),該等遮擋通道(21)形成該陣列(23)的所述遮擋區域。A method for manufacturing a microporous optical element (MPO) as claimed in claim 8, wherein the microporous optical element (MPO) is formed by three-dimensional printing using a printing template configured to form blocking channels (21) that form the blocking regions of the array (23). 一種一樣品(16)的X射線成像系統,包括: 一X射線源(13、17),配置為透過如請求項1至9中任一項之微孔光學元件(MPO)照射所述樣品(16);以及 一偵測器(12),放置在源自所述樣品(16)的該射線的一反射平面上。An X-ray imaging system for a sample (16) includes: an X-ray source (13, 17) configured to irradiate the sample (16) through a micro-aperture optical element (MPO) as claimed in any of claims 1 to 9; and a detector (12) placed on a reflective plane of the radiation originating from the sample (16). 一種一樣品(16)的X射線成像系統,包括: 一X射線源(13、17),配置為照射所述樣品(16); 一如請求項1至9中任一項之微孔光學元件(MPO);以及 一偵測器(12),放置在所述微孔光學元件(MPO)的該影像平面(Pi)上,所述微孔光學元件(MPO)配置為收集源自該樣品(16)的光子以將其傳輸到該偵測器(12)。An X-ray imaging system for a sample (16) includes: an X-ray source (13, 17) configured to irradiate the sample (16); a microaperture optical element (MPO) as claimed in any one of claims 1 to 9; and a detector (12) placed on the image plane (Pi) of the microaperture optical element (MPO), the microaperture optical element (MPO) being configured to collect photons originating from the sample (16) for transmission to the detector (12). 如請求項12或13之一樣品的X射線成像系統,其中所述成像系統包括排列在該微孔光學元件(MPO)與該偵測器(12)之間的一遮罩,以遮擋所述偵測器(12)處的該影像平面(Pi)的一部分。An X-ray imaging system of one of claims 12 or 13, wherein the imaging system includes a mask arranged between the microporous optical element (MPO) and the detector (12) to block a portion of the image plane (Pi) at the detector (12). 如請求項12至14中任一項之一樣品的X射線成像系統,其中所述微孔光學元件(MPO)放置在一第一X射線發射元件(19)與一第二X射線接收元件(20)之間,該第一X射線發射元件(19)例如是所述X射線源(17)或所述樣品(16),該第二X射線接收元件(20)例如是所述樣品(16)或所述偵測器(12); 所述第一元件(19)放置在以距離L1距所述微孔光學元件(MPO)的位置,並且具有由一第一尺寸A1和一第二尺寸B1形成的一表面積; 所述第二元件(20)放置在以距離L2距所述微孔光學元件(MPO)的位置,並且具有由一第三尺寸A2和一第四尺寸B2形成的一表面積; 所述微孔光學元件(MPO)的該遮擋區域排列在兩個正交的帶中,一第一帶沿該第一軸具有一最小尺寸d1,一第二帶沿該第二軸具有一最小尺寸d2; 第一最小尺寸等於d1,大於(L1A1+L2A2)/(5*(L1+L2)),特別是大於(L1A1+L2A2)/(3*(L1+L2)),且較佳大於(L1A1+L2A2)/(L1+L2); 第二最小尺寸等於d2,大於(L1B1+L2B2)/(5*(L1+L2)),特別是大於(L1B1+L2B2)/(3*(L1+L2)),且較佳大於(L1B1+L2B2)/(L1+L2)。An X-ray imaging system for a sample of any one of claims 12 to 14, wherein the microaperture optical element (MPO) is disposed between a first X-ray emitting element (19) and a second X-ray receiving element (20), the first X-ray emitting element (19) being, for example, the X-ray source (17) or the sample (16), and the second X-ray receiving element (20) being, for example, the sample (16) or the detector (12); the first element (19) is disposed at a distance L1 from the microaperture optical element (MPO) and has a surface area formed by a first dimension A1 and a second dimension B1; the second element (20) is disposed at a distance L2 from the microaperture optical element (MPO) and has a surface area formed by a third dimension A2 and a fourth dimension B2; The shielding region of the microporous optical element (MPO) is arranged in two orthogonal bands, a first band having a minimum dimension d1 along the first axis and a second band having a minimum dimension d2 along the second axis; the first minimum dimension is equal to d1, greater than (L1A1+L2A2)/(5*(L1+L2)), especially greater than (L1A1+L2A2)/(3*(L1+L2)), and preferably greater than (L1A1+L2A2)/(L1+L2); the second minimum dimension is equal to d2, greater than (L1B1+L2B2)/(5*(L1+L2)), especially greater than (L1B1+L2B2)/(3*(L1+L2)), and preferably greater than (L1B1+L2B2)/(L1+L2).
TW114125196A 2024-07-09 2025-07-03 Micro-pore optics, associated manufacturing methods and x-ray imaging system TW202609809A (en)

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