WO2025197747A1 - Silver fine particles and method for producing silver fine particles - Google Patents
Silver fine particles and method for producing silver fine particlesInfo
- Publication number
- WO2025197747A1 WO2025197747A1 PCT/JP2025/009612 JP2025009612W WO2025197747A1 WO 2025197747 A1 WO2025197747 A1 WO 2025197747A1 JP 2025009612 W JP2025009612 W JP 2025009612W WO 2025197747 A1 WO2025197747 A1 WO 2025197747A1
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- WO
- WIPO (PCT)
- Prior art keywords
- gas
- silver
- fine particles
- particles
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/10—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
- B22F1/102—Metallic powder coated with organic material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/14—Treatment of metallic powder
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/14—Making metallic powder or suspensions thereof using physical processes using electric discharge
Definitions
- the present invention relates to silver microparticles and a method for manufacturing silver microparticles that can be used in conductive pastes, electrodes for electronic components such as multilayer ceramic capacitors, wiring for printed circuit boards, wiring for touch panels, flexible electronic paper, and various devices such as solar cells and light-emitting elements, and in particular to silver microparticles and a method for manufacturing silver microparticles that can be used to form conductive wiring, etc.
- silver fine particles can be used in conductive pastes, electrodes for electronic components such as multilayer ceramic capacitors, wiring for printed circuit boards, wiring for touch panels, flexible electronic paper, and various devices such as solar cells and light-emitting elements.
- Silver electrodes and silver wiring can be obtained by firing the silver fine particles.
- Silver fine particles and their manufacturing method are described, for example, in Patent Document 1.
- Patent Document 1 describes silver particles having a surface coating, the surface coating containing at least a carboxyl group. Furthermore, Patent Document 1 describes a method for producing silver fine particles by a vapor phase method using silver powder, which method includes a step of supplying an organic acid to the silver fine particles.
- Patent Document 1 describes silver microparticles and a method for producing silver microparticles.
- current requirements require that the particle size be small, granular, and uniform in size.
- the object of the present invention is to resolve the problems associated with the prior art described above and to provide silver microparticles that are small in particle size, have a granular particle shape, and are uniform in particle size, as well as a method for producing silver microparticles.
- the above-mentioned object can be achieved by the following configuration.
- the invention [1] is fine silver particles having a BET specific surface area of 10 m 2 /g or more and a specular reflection value of 10 or more.
- Invention [2] is the fine silver particles according to invention [1], which have an exothermic peak temperature of 250°C or less in differential thermal analysis.
- Invention [3] is the fine silver particles according to invention [1] or [2], in which the weight loss per unit area is 0.5 ⁇ 10 ⁇ 3 g/m 2 or more.
- Invention [4] is a method for producing silver microparticles by a thermal plasma method using silver powder, which includes the steps of supplying the silver powder into a thermal plasma flame and supplying a cooling gas to the thermal plasma flame, wherein the cooling gas contains methane gas and oxygen gas, and the ratio of oxygen gas to methane gas, oxygen gas/methane gas, is 1 to 50 volume %.
- the present invention provides silver microparticles with small particle diameters, granular particle shapes, and uniform particle diameters, as well as a method for producing silver microparticles.
- FIG. 1 is a schematic diagram showing an example of a fine particle manufacturing apparatus used in a method for manufacturing fine silver particles according to an embodiment of the present invention.
- FIG. 1 is a schematic diagram showing a silver fine particle according to an embodiment of the present invention.
- FIG. 10 is a schematic diagram illustrating a specular reflection value.
- FIG. 10 is a schematic diagram illustrating a specular reflection value.
- FIG. 1 is a schematic diagram showing an SEM image of the silver fine particles of Example 5.
- FIG. 10 is a schematic diagram showing an SEM image of silver fine particles of Comparative Example 3.
- the silver fine particles and the method for producing the silver fine particles of the present invention will be described in detail based on preferred embodiments shown in the accompanying drawings. It should be noted that the drawings described below are illustrative for explaining the present invention, and the present invention is not limited to the drawings shown below.
- the term "to" indicating a range of values includes the values written on both sides. For example, if ⁇ is a value ⁇ to a value ⁇ , the range of ⁇ includes the values ⁇ and ⁇ , and expressed in mathematical notation as ⁇ ⁇ ⁇ .
- various numerical values include error ranges generally accepted in the relevant technical field.
- FIG. 1 is a schematic diagram showing an example of a fine particle manufacturing apparatus used in a method for manufacturing fine silver particles according to an embodiment of the present invention. 1 (hereinafter simply referred to as the manufacturing apparatus 10) is used for manufacturing silver fine particles.
- the manufacturing apparatus 10 is used in a manufacturing method for manufacturing silver fine particles by a thermal plasma method.
- the manufacturing apparatus 10 includes a plasma torch 12 that generates a thermal plasma flame, a material supply device 14 that supplies raw material powder of silver microparticles into the plasma torch 12, a chamber 16 that functions as a cooling tank for generating primary silver microparticles 15, a cyclone 19 that removes coarse silver particles having a particle size equal to or larger than an arbitrarily specified particle size from the primary silver microparticles 15, and a recovery section 20 that recovers secondary silver microparticles 18 having a desired particle size that have been classified by the cyclone 19. Furthermore, the manufacturing apparatus 10 has a plasma gas supply unit 22 , a plasma generation unit 24 , and a gas supply unit 26 .
- the secondary silver particles are obtained by classifying the primary silver particles 15.
- various devices disclosed in Japanese Patent Application Laid-Open No. 2007-138287 can be used for the material supply device 14, chamber 16, cyclone 19, and recovery section 20.
- the primary fine particles 15 of silver are also simply referred to as primary fine particles 15.
- silver powder is used to produce the silver microparticles.
- the average particle size of the silver powder is appropriately set so that it evaporates easily in the thermal plasma flame.
- the average particle size is, for example, 100 ⁇ m or less, preferably 10 ⁇ m or less, and more preferably 5 ⁇ m or less.
- the plasma torch 12 is composed of, for example, a quartz tube 12a and a high-frequency oscillation coil 12b surrounding the outside of the quartz tube 12a.
- a supply pipe 14a (described below) is provided in the center of the upper part of the plasma torch 12 for supplying raw material powder of silver microparticles into the plasma torch 12.
- a plasma gas supply port 12c is formed around the periphery of the supply pipe 14a (on the same circumference), and the plasma gas supply port 12c is ring-shaped.
- the plasma gas supply unit 22 supplies plasma gas into the plasma torch 12 and is connected to the plasma gas supply port 12c via a pipe 22c.
- the plasma gas is supplied from the plasma gas supply unit 22 through the ring-shaped plasma gas supply port 12c into the plasma torch 12, for example, in the directions indicated by arrows P and S.
- the plasma gas supply unit 22 has a gas supply unit corresponding to the gas species that constitute the plasma.
- the plasma gas is, for example, a mixed gas of hydrogen gas and argon gas
- hydrogen gas is stored in a first gas supply unit (not shown)
- argon gas is stored in a second gas supply unit (not shown).
- the first gas supply unit and the second gas supply unit are each provided with a regulator (pressure adjuster) and an adjustment valve for controlling the gas supply amount, although not shown.
- Hydrogen gas is supplied from the first gas supply section of the plasma gas supply unit 22, and argon gas is supplied from the second gas supply section via pipe 22c and plasma gas supply port 12c, and then into the plasma torch 12 in the directions indicated by arrows P and S. Note that only argon gas may be supplied in the direction indicated by arrow P.
- the plasma generating unit 24 has a high-frequency power supply (not shown), which is connected to the high-frequency oscillation coil 12 b.
- the plasma generating unit 24 has a function of supplying a high-frequency voltage to the high-frequency oscillation coil 12 b.
- a thermal plasma flame 28 is generated inside the plasma torch 12.
- the temperature of the thermal plasma flame 28 must be higher than the boiling point of the raw material powder.
- a higher temperature of the thermal plasma flame 28 is preferable because it makes it easier for the raw material powder to become gaseous, but the temperature is not particularly limited.
- the temperature of the thermal plasma flame 28 can be set to 6000°C, and theoretically it is thought to reach approximately 10000°C.
- the pressure atmosphere inside the plasma torch 12 is preferably equal to or lower than atmospheric pressure.
- the pressure atmosphere is not particularly limited, but is, for example, 0.5 to 100 kPa.
- the outside of the quartz tube 12a is surrounded by a concentric tube (not shown), and cooling water is circulated between this tube and the quartz tube 12a to water-cool the quartz tube 12a and prevent the quartz tube 12a from becoming too hot due to the thermal plasma flame 28 generated within the plasma torch 12.
- the material supply device 14 is connected to the upper part of the plasma torch 12 via a supply pipe 14a.
- the material supply device 14 supplies raw material powder, for example, in the form of powder, into the thermal plasma flame 28 in the plasma torch 12.
- the material supply device 14 that supplies silver powder in powder form can be that disclosed in Japanese Patent Application Laid-Open No. 2007-138287.
- the material supply device 14 has, for example, a storage tank (not shown) that stores the silver powder, a screw feeder (not shown) that transports a fixed amount of the silver powder, a dispersing section (not shown) that disperses the silver powder transported by the screw feeder into primary particles before it is finally dispersed, and a carrier gas supply source (not shown).
- the silver powder is supplied together with carrier gas under extrusion pressure from a carrier gas supply source through the supply pipe 14a into the thermal plasma flame 28 in the plasma torch 12.
- the configuration of the material supply device 14 is not particularly limited as long as it can prevent aggregation of the silver powder and spray the silver powder into the plasma torch 12 while maintaining the dispersion state.
- An inert gas such as argon gas is used as the carrier gas.
- the flow rate of the carrier gas can be controlled using a flow meter such as a float flow meter.
- the flow rate value of the carrier gas refers to the scale value of the flow meter.
- the chamber 16 is located adjacent to and below the plasma torch 12, and is connected to a gas supply unit 26. Primary silver particles 15 are generated within the chamber 16.
- the chamber 16 also functions as a cooling tank.
- the gas supply unit 26 supplies cooling gas into the chamber 16.
- the gas supply unit 26 has a pipe 26c.
- the gas supply unit 26 further has a gas supply source (not shown) in which gas is stored, and a pressure applying unit (not shown) such as a compressor or blower that applies extrusion pressure to the quenching gas supplied into the chamber 16.
- the gas supply unit 26 is also provided with an adjustment valve (not shown) that controls the amount of gas supplied from the gas supply source.
- a gas supply source appropriate for the components of the cooling gas is used, and the cooling gas is a mixed gas of argon gas, methane gas, and oxygen gas.
- argon gas is stored in a first gas supply source (not shown)
- methane gas ( CH4 gas) is stored in a second gas supply source (not shown)
- oxygen gas ( O2 gas) is stored in a third gas supply source (not shown).
- the gas supply unit 26 supplies a mixture of argon gas, methane gas, and oxygen gas as cooling gas in the direction of arrow Q, at an angle of, for example, 45°, toward the tail 28b of the thermal plasma flame 28, i.e., the end of the thermal plasma flame 28 opposite the plasma gas supply port 12c, i.e., the terminal end (tail 28b) of the thermal plasma flame 28, and also supplies the above-mentioned cooling gas from top to bottom along the inner wall 16a of the chamber 16, i.e., in the direction of arrow R shown in Figure 1.
- the silver powder that has been put into a gaseous state by the thermal plasma flame 28 is rapidly cooled by the cooling gas supplied into the chamber 16 from the gas supply unit 26, thereby obtaining the silver primary particles 15.
- the cooling gas has an additional function of contributing to the classification of the primary particles 15 in the cyclone 19.
- the cooling gas is, for example, a mixed gas of argon gas, methane gas, and oxygen gas.
- the cooling gas contains methane gas and oxygen gas, and the ratio (volume ratio) of oxygen gas to methane gas, oxygen gas/methane gas, is 1 to 50% by volume, preferably 10 to 40% by volume.
- the oxygen gas/methane gas ratio is 1 to 50% by volume, fine silver particles having a BET specific surface area of 10 m 2 /g or more and a specular reflection value of 10 or more can be obtained. Furthermore, when the oxygen gas/methane gas ratio is 10 to 40% by volume, the specular reflection value of the silver microparticles produced will be higher, i.e., the granularity of the silver microparticles will be higher, the particle size will be more uniform, and the particle size variation will be smaller, which is preferable. If the oxygen gas/methane gas ratio exceeds 50% by volume, the mixture will not form particles but will instead form a foil, and silver microparticles will not be obtained.
- the cooling gas is a mixed gas containing argon gas, methane gas, and oxygen gas, but may be configured to contain only two types of gases, methane gas and oxygen gas.
- the oxygen gas/methane gas ratio (volume ratio) of oxygen gas to methane gas uses the flow rate of oxygen gas under standard conditions (temperature 0°C, 1 atmosphere) and the flow rate of methane gas under standard conditions.
- the flow rates of oxygen gas and methane gas are measured using a flow meter. For example, a float type flow meter is used as the flow meter.
- the mixed gas supplied as a cooling gas in the direction of arrow Q toward the tail 28b (terminal end) of the thermal plasma flame 28 dilutes the primary fine particles 15, thereby preventing the silver fine particles from colliding with each other and agglomerating.
- the mixed gas supplied as a cooling gas in the direction of arrow R prevents the primary particles 15 from adhering to the inner wall 16a of the chamber 16 during the recovery process of the primary particles 15, thereby improving the yield of the generated primary particles 15.
- the chamber 16 is connected to a cyclone 19 for classifying the primary silver particles 15 into particles of the desired particle size.
- the cyclone 19 is equipped with an inlet pipe 19a that supplies the primary silver particles 15 from the chamber 16, a cylindrical outer tube 19b connected to the inlet pipe 19a and located at the top of the cyclone 19, a truncated cone section 19c that continues downward from the bottom of the outer tube 19b and has a gradually decreasing diameter, a coarse particle recovery chamber 19d connected to the bottom of the truncated cone section 19c and recovering coarse particles with particle sizes equal to or larger than the desired particle size, and an inner tube 19e that protrudes from the outer tube 19b and is connected to the recovery section 20, which will be described in detail later.
- negative pressure is generated through the inner tube 19e from the recovery section 20, which will be described in detail later.
- This negative pressure causes the silver microparticles separated from the swirling airflow to be sucked in as indicated by the symbol U, and are sent to the recovery section 20 through the inner tube 19e.
- a collection unit 20 for collecting secondary fine particles (fine silver particles) 18 having a desired nanometer-order particle size is provided on the extension of inner tube 19e, which is the outlet of the airflow within cyclone 19.
- Collection unit 20 includes a collection chamber 20a, a filter 20b provided within collection chamber 20a, and a vacuum pump 30 connected via a tube provided below collection chamber 20a. The fine particles sent from cyclone 19 are sucked by vacuum pump 30 and drawn into collection chamber 20a, where they remain on the surface of filter 20b and are collected.
- the number of cyclones used is not limited to one, but may be two or more.
- the method for producing silver particles is to use silver powder and produce silver particles by a thermal plasma method.
- the method for producing silver microparticles first, as raw material powder for the silver microparticles, for example, silver powder having an average particle size of 5 ⁇ m or less is fed into the material supply device 14.
- the material supply device 14 supplies the silver powder to the thermal plasma flame 28 as described below.
- a high frequency voltage is applied from the plasma generating unit 24 to the high frequency oscillation coil 12b to generate a thermal plasma flame 28 within the plasma torch 12.
- argon gas and hydrogen gas are used as the plasma gas.
- a cooling gas for example, a mixed gas of argon gas, methane gas, and oxygen gas
- a cooling gas is supplied from the gas supply unit 26 to the tail 28b of the thermal plasma flame 28, i.e., the terminal end of the thermal plasma flame 28, in the direction of arrow Q (a step of supplying a cooling gas).
- the oxygen/methane ratio in the cooling gas is 1 to 50% by volume.
- a mixed gas of argon gas, methane gas, and oxygen gas is also supplied as a cooling gas in the direction of arrow R.
- the silver powder is gaseously transported using, for example, argon gas as a carrier gas, and the silver powder is supplied via the supply pipe 14a into the thermal plasma flame 28 in the plasma torch 12.
- the method for producing silver particles includes the steps of supplying silver powder into the thermal plasma flame and supplying a cooling gas to the thermal plasma flame.
- the primary silver particles 15 obtained in the chamber 16 are then blown together with the airflow from the inlet pipe 19a of the cyclone 19 along the inner wall of the outer cylinder 19b.
- this airflow flows along the inner wall of the outer cylinder 19b as indicated by arrow T in Figure 1, forming a swirling flow and descending.
- the balance between centrifugal force and drag forces prevents coarse particles from joining the ascending flow, and they descend along the side of the truncated cone portion 19c and are collected in the coarse particle collection chamber 19d.
- fine particles that are more affected by drag than centrifugal force are expelled from the system along with the ascending flow on the inner wall of the truncated cone portion 19c.
- the discharged secondary fine particles (silver fine particles) 18 are sucked in the direction indicated by the symbol U in Figure 1 by the negative pressure (suction force) from the recovery section 20 by the vacuum pump 30, sent to the recovery section 20 through the inner tube 19e, and recovered by the filter 20b of the recovery section 20.
- the internal pressure within the cyclone 19 is preferably below atmospheric pressure.
- the particle size of the secondary fine particles (silver fine particles) 18 is specified to any particle size on the order of nanometers depending on the purpose.
- FIG. 2 is a schematic diagram showing silver fine particles according to an embodiment of the present invention. 2, silver fine particle 40 has surface coating 41 on its surface 40a.
- the silver fine particles of the present invention have a BET specific surface area of 10 m 2 /g or more and a specular reflection value of 10 or more. If the BET specific surface area is 10 m 2 /g or more and the specular reflection value is 10 or more, the silver fine particles have a small and uniform particle size.
- the BET specific surface area is a value measured using the BET method. If the BET specific surface area is 10 m 2 /g or more, the particle size of the silver particles is small.
- the BET specific surface area is preferably 10 to 25 m 2 /g.
- the fine silver particles of the present invention are called nanoparticles, and have a particle size of 1 to 57 nm.
- the particle size is a value converted from the BET specific surface area and represents the average particle size.
- the specular reflection value is an index showing the granularity of particle shape and the variation in particle size, with the upper limit of the specular reflection value being 100. The larger the specular reflection value, the more granular the particle shape and the more uniform the particle size. If the specular reflection value is 10 or more, the silver microparticles have a granular particle shape with little variation in particle size and a uniform particle size. It is preferable that the silver microparticles have a specular reflection value of 15 to 40.
- the silver fine particles have a specular reflection value of 10 or more, preferably 15 to 40.
- the specular reflection value can be used to evaluate whether the silver microparticles have a granular shape and uniform particle size. This is based on the fact that the specular reflection value can evaluate the uniformity of a film. Specifically, if the silver microparticles have a granular shape and uniform particle size, the film will have high uniformity, resulting in more specular reflection from the film. On the other hand, if the silver microparticles have a non-granular shape and irregular particle size, the film will have low uniformity, resulting in more diffuse reflection from the film. This can be used to evaluate whether the silver microparticles have a granular shape and uniform particle size.
- the film 50 shown in Fig. 3 is formed on a substrate 52 and has a plurality of silver microparticles 40 disposed therein.
- the plurality of silver microparticles 40 have a granular particle shape, uniform particle size, and a good dispersion state.
- the film 51 shown in Fig. 4 is formed on a substrate 52 and has a plurality of silver microparticles 40 disposed therein, but the plurality of silver microparticles 40 have a non-granular particle shape, non-uniform particle size, and the dispersion state of the silver microparticles 40 within the film 51 is poor.
- Incident light Li incident on the surface 50a of the film 50 shown in Fig. 3 generates specularly reflected light Lr.
- Incident light Li incident on the surface 51a of the film 51 shown in Fig. 4 also generates specularly reflected light Lr.
- the silver microparticles 40 have a granular particle shape, a uniform particle size, a good dispersion state, and a uniform film with few voids, so the internal scattered light Ls and diffuse reflected light Ld are small, and the amount of specular reflected light Lr is large.
- the silver microparticles 40 have a granular particle shape and a uniform particle size, the specular reflected light value is large.
- the silver microparticles 40 have a non-granular particle shape and irregular particle sizes, are poorly dispersed, and are non-uniform with many voids, resulting in an increase in internal scattered light Ls and diffuse reflected light Ld and a decrease in the amount of specular reflected light Lr.
- the specular reflected light value is small.
- the specular reflection value can be used to evaluate the granularity of the particle shape of the silver fine particles and the variation in particle size.
- the specular reflection value can be measured using, for example, a spectrophotometer.
- the silver particles preferably have an exothermic peak temperature of 250°C or less, more preferably 170 to 200°C, in differential thermal analysis. If the exothermic peak temperature in differential thermal analysis is 250°C or less, sintering of the silver particles occurs at the exothermic peak temperature of 250°C or less, and electrical conductivity can be exhibited.
- the hydrocarbons (CnHm) that constitute the surface coating that coats the surfaces of the silver microparticles react with oxygen in the atmosphere, combusting and decomposing with heat.
- the exothermic peak temperature (°C) in differential thermal analysis is measured using a TG-DTA (thermogravimetric differential thermal analyzer) to measure the degree of heat generation, and indicates the temperature at which the heat generation is greatest.
- TG-DTA thermogravimetric differential thermal analyzer
- the exothermic peak temperature in the differential thermal analysis is measured in air using a TG-DTA (thermogravimetric and differential thermal analyzer), such as the STA7200 (trade name) manufactured by Hitachi High-Tech Science Corporation.
- the weight loss of the fine silver particles per unit area is preferably 0.5 ⁇ 10 ⁇ 3 g/m 2 or more, and more preferably 0.9 to 2 ⁇ 10 ⁇ 3 g/m 2 .
- the weight loss per unit area is 0.5 ⁇ 10 ⁇ 3 g/m 2 or more, the granularity of the resulting fine silver particles is high and the variation in particle size is small.
- the present invention is basically configured as described above.
- the silver microparticles and method for producing silver microparticles of the present invention have been described in detail above, but the present invention is not limited to the above-described embodiments, and various improvements and modifications may of course be made without departing from the spirit of the present invention.
- the BET specific surface area (m 2 /g) of the prepared silver particles was measured using Macsorb HM-1208 manufactured by Mountech Co., Ltd.
- the BET diameters shown in Table 2 below are particle sizes of the silver particles converted from the measured BET specific surface area (m 2 /g).
- the specular reflection value was measured as follows. First, silver particles were dispersed in a solution consisting of a solvent and a dispersant. This dispersion was then applied to a glass slide to form a coating film, and the specular reflection value of the coating film was measured using a spectrophotometer. The specular reflection value of the coating film was taken as the specular reflection value of the silver particles.
- the dispersant used was BYK-112 (manufactured by BYK Japan KK).
- the silver fine particles of Examples 1 to 6 and Comparative Examples 1 to 8 will be described below.
- the silver fine particles of Examples 1 to 6 and Comparative Examples 1 to 8 were produced using the fine particle production apparatus 10 described above.
- Silver powder having an average particle size of 15 ⁇ m was used as the raw material powder to produce the silver microparticles of Examples 1 to 6 and Comparative Examples 1 to 8.
- the conditions for producing the silver microparticles of Examples 1 to 6 and Comparative Examples 1 to 8 were as follows: the input power to the plasma was constant at 15 kW, and the pressure inside the plasma torch (internal pressure of the device) was 40 kPa.
- Argon gas was used as the carrier gas, and a mixed gas of argon gas and hydrogen gas was used as the plasma gas.
- Examples 1 to 6 a mixed gas of argon gas, methane gas, and oxygen gas was used as the cooling gas.
- a mixed gas of argon gas and methane gas was used as the cooling gas.
- a mixed gas of argon gas, methane gas, and hydrogen gas was used as the cooling gas.
- a mixed gas of argon gas, methane gas, and oxygen gas was used as the cooling gas.
- the flow rate of the plasma gas and the components and flow rate of the cooling gas were changed. The flow rate of the cooling gas was measured under standard conditions (temperature of 0°C, 1 atmosphere). The flow rate of the cooling gas was measured using a float-type flow meter for each component of the cooling gas, such as argon gas.
- Example 1 the flow rates of the argon gas and hydrogen gas were set to 170 L/min and 5 L/min, respectively, for the plasma gas.
- the cooling gases were argon gas at a flow rate of 50 L/min, methane gas at a flow rate of 15 L/min, and oxygen gas at a flow rate of 0.15 L/min.
- the oxygen gas/methane gas ratio was 1% by volume.
- Example 2 was the same as Example 1 except that the cooling gases were argon gas at a flow rate of 100 L/min, methane gas at a flow rate of 15 L/min, and oxygen gas at a flow rate of 1.5 L/min.
- Example 2 had an oxygen gas/methane gas ratio of 10% by volume.
- Example 3 was the same as Example 1 except that the cooling gas flow rates of argon gas, methane gas, and oxygen gas were set to 450 L/min, 15 L/min, and 1.5 L/min, respectively.
- Example 3 had an oxygen/methane ratio of 10% by volume.
- Example 4 was the same as Example 1 except that the plasma gas flow rates of argon gas were 200 L/min and hydrogen gas were 5 L/min.
- the cooling gas flow rates of argon gas were 900 L/min, methane gas 10 L/min, and oxygen gas 5 L/min.
- Example 4 had an oxygen/methane gas ratio of 50% by volume.
- Example 5 was the same as Example 1 except that the plasma gas flow rates of argon gas were 200 L/min and hydrogen gas were 5 L/min.
- the cooling gas flow rates of argon gas were 900 L/min, methane gas 15 L/min, and oxygen gas 5 L/min.
- Example 5 had an oxygen/methane ratio of 33.3% by volume.
- Example 6 was the same as Example 1 except that the plasma gas flow rates of argon gas were 200 L/min and hydrogen gas were 5 L/min, and the cooling gas flow rates were 900 L/min, 25 L/min, and 5 L/min, respectively.
- Example 6 had an oxygen/methane gas ratio of 20% by volume.
- Comparative Examples 1 to 8 In Comparative Example 1, the flow rates of the argon gas and the hydrogen gas were set to 200 L/min and 5 L/min, respectively, compared to Example 1.
- the cooling gas was a mixed gas of argon gas and methane gas, and the flow rates of the argon gas and the methane gas were set to 150 L/min and 15 L/min, respectively.
- the flow rates of the argon gas and the hydrogen gas were set to 200 L/min and 5 L/min, respectively, compared to Example 1.
- the cooling gas was a mixed gas of argon gas and methane gas, and the flow rates of the argon gas and the methane gas were set to 450 L/min and 15 L/min, respectively.
- Example 3 the flow rates of the argon gas and the hydrogen gas were set to 160 L/min and 5 L/min, respectively, compared to Example 1.
- the cooling gas was a mixed gas of argon gas and methane gas, and the flow rates of the argon gas and the methane gas were set to 900 L/min and 6 L/min, respectively.
- Comparative Example 4 the flow rates of the argon gas and the hydrogen gas were set to 200 L/min and 5 L/min, respectively, compared to Example 1.
- the cooling gas was a mixed gas of argon gas and methane gas, and the flow rates of the argon gas and the methane gas were set to 900 L/min and 10 L/min, respectively.
- Comparative Example 5 the plasma gas flow rates were set to 210 L/min for argon gas and 5 L/min for hydrogen gas, as compared with Example 1.
- the cooling gas was a mixed gas of argon gas, methane gas, and hydrogen gas, and the flow rates of argon gas, methane gas, and hydrogen gas were set to 600 L/min, 10 L/min, and 5 L/min, respectively, except for the other conditions.
- the plasma gas flow rates were set to 210 L/min for argon gas and 5 L/min for hydrogen gas, as compared with Example 1.
- the cooling gas was a mixed gas of argon gas, methane gas, and hydrogen gas, and the flow rates of argon gas, methane gas, and hydrogen gas were set to 600 L/min, 10 L/min, and 10 L/min, respectively, except for the other conditions.
- the plasma gas flow rates were the same as in Example 1 except that the argon gas flow rate was 200 L/min and the hydrogen gas flow rate was 5 L/min.
- the cooling gas flow rates were the same as in Example 1 except that the argon gas flow rate was 900 L/min, the methane gas flow rate was 1 L/min, and the oxygen gas flow rate was 5 L/min.
- the oxygen gas/methane gas ratio was 500% by volume.
- the plasma gas flow rates were the same as in Example 1 except that the argon gas flow rate was 200 L/min and the hydrogen gas flow rate was 5 L/min.
- the cooling gas flow rates were the same as in Example 1 except that the argon gas flow rate was 900 L/min, the methane gas flow rate was 1 L/min, and the oxygen gas flow rate was 1 L/min.
- the oxygen gas/methane gas ratio was 100% by volume.
- the powders were not in a particulate form but in a foil form, and therefore the BET specific surface area and BET diameter could not be measured. Therefore, "-" is entered in the BET specific surface area and BET diameter columns in Table 2 below. Since Comparative Examples 7 and 8 were in a foil form, the specular reflection value, exothermic peak temperature, weight loss rate, and weight loss amount per unit area were not measured. Therefore, "-" is entered in the columns for specular reflection value, exothermic peak temperature, weight loss rate, and weight loss amount per unit area in Table 2 below.
- Examples 1 to 6 produced fine silver particles having a BET specific surface area of 10 m 2 /g or more and a specular reflection value of 10 or more.
- the BET specific surface area was 10 m 2 /g or more, indicating that the particle size was small.
- the specular reflection value was 10 or more, indicating that the particle shape was granular and the particle size was uniform.
- none of the particles obtained had a BET specific surface area of 10 m 2 /g or more and a specular reflection value of 10 or more.
- Fig. 5 is a schematic diagram showing an SEM (Scanning Electron Microscope) image of the silver fine particles of Example 5
- Fig. 6 is a schematic diagram showing an SEM image of the silver fine particles of Comparative Example 3.
- the SEM images were obtained using a JSM-6700F manufactured by JEOL Ltd.
- the silver microparticles of Example 5 had a granular particle shape, small particle diameters, and were uniform in particle size with no coarse particles.
- the silver microparticles of Comparative Example 3 had a non-granular particle shape, contained 100 coarse particles, and were non-uniform in particle size. Furthermore, from Examples 1 to 6, when the oxygen gas/methane gas (volume ratio) is 10 to 40% by volume, the specular reflection value is high.
- Fine particle manufacturing equipment 12 Plasma torch 12a Quartz tube 12b High frequency oscillation coil 12c Plasma gas supply port 14 Material supply device 14a Supply pipe 15 Primary particles 16 Chamber 16a Inner wall 18 Secondary particles 19 Cyclone 19a Inlet pipe 19b Outer cylinder 19c Circular truncated cone portion 19d Coarse particle collection chamber 19e Inner pipe 20 Collection portion 20a Collection chamber 20b Filter 22 Plasma gas supply portion 22c Piping 24 Plasma generation portion 26 Gas supply portion 26c Piping 28 Thermal plasma flame 28b Tail portion 30 Vacuum pump 40 Silver particles 40a, 51a Surface 41 Surface coating 50, 51 Film 52 Substrate 100 Coarse particles Ld Diffuse reflected light Li Incident light Lr Specular reflected light Ls Internally scattered light
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Abstract
Description
本発明は、導電ペースト、積層セラミックコンデンサ等の電子部品の電極、プリント配線基板の配線、タッチパネルの配線、フレキシブルな電子ペーパー、並びに太陽電池及び発光素子等の各種デバイスに利用可能な銀微粒子及び銀微粒子の製造方法に関し、特に、導電配線等の形成に利用される銀微粒子及び銀微粒子の製造方法に関する。 The present invention relates to silver microparticles and a method for manufacturing silver microparticles that can be used in conductive pastes, electrodes for electronic components such as multilayer ceramic capacitors, wiring for printed circuit boards, wiring for touch panels, flexible electronic paper, and various devices such as solar cells and light-emitting elements, and in particular to silver microparticles and a method for manufacturing silver microparticles that can be used to form conductive wiring, etc.
現在、金属微粒子、酸化物微粒子、窒化物微粒子、及び炭化物微粒子等の各種の微粒子が種々の用途に用いられている。微粒子のうち、銀微粒子は、導電ペースト、積層セラミックコンデンサ等の電子部品の電極、プリント配線基板の配線、タッチパネルの配線、フレキシブルな電子ペーパー、並びに太陽電池及び発光素子等の各種デバイスに利用可能である。銀微粒子を焼成することで銀の電極、及び銀の配線を得ることができる。銀微粒子及びその製造方法が、例えば、特許文献1に記載されている。 Currently, various types of fine particles, such as metal fine particles, oxide fine particles, nitride fine particles, and carbide fine particles, are used for a variety of purposes. Among these fine particles, silver fine particles can be used in conductive pastes, electrodes for electronic components such as multilayer ceramic capacitors, wiring for printed circuit boards, wiring for touch panels, flexible electronic paper, and various devices such as solar cells and light-emitting elements. Silver electrodes and silver wiring can be obtained by firing the silver fine particles. Silver fine particles and their manufacturing method are described, for example, in Patent Document 1.
特許文献1には、表面被覆物を有し、表面被覆物は、少なくともカルボキシル基を含む銀微粒子が記載されている。
また、特許文献1には、銀の粉末を用いて、気相法により銀微粒子を製造する製造方法であって、銀微粒子に有機酸を供給する工程を有する銀微粒子の製造方法が記載されている。
Patent Document 1 describes silver particles having a surface coating, the surface coating containing at least a carboxyl group.
Furthermore, Patent Document 1 describes a method for producing silver fine particles by a vapor phase method using silver powder, which method includes a step of supplying an organic acid to the silver fine particles.
上述のように特許文献1には銀微粒子及び銀微粒子の製造方法が記載されている。しかしながら、現状では、粒径が小さく、かつ粒子形状が粒状で粒径が揃っていることが要求されている。 As mentioned above, Patent Document 1 describes silver microparticles and a method for producing silver microparticles. However, current requirements require that the particle size be small, granular, and uniform in size.
本発明の目的は、前述の従来技術に基づく問題点を解消し、粒径が小さく、かつ粒子形状が粒状で粒径が揃った銀微粒子及び銀微粒子の製造方法を提供することにある。 The object of the present invention is to resolve the problems associated with the prior art described above and to provide silver microparticles that are small in particle size, have a granular particle shape, and are uniform in particle size, as well as a method for producing silver microparticles.
以下の構成により、上述の目的を達成することができる。
発明[1]は、BET比表面積が10m2/g以上であり、正反射光値が10以上である、銀微粒子である。
発明[2]は、示差熱分析における発熱ピーク温度が250℃以下である、発明[1]に記載の銀微粒子である。
発明[3]は、単位面積当たりの重量減少量が0.5×10-3g/m2以上である、発明[1]又は[2]に記載の銀微粒子である。
発明[4]は、銀の粉末を用いて、熱プラズマ法により銀微粒子を製造する製造方法であって、銀の粉末を、熱プラズマ炎中に供給し、熱プラズマ炎に冷却ガスを供給する工程を有し、冷却ガスは、メタンガスと酸素ガスとを含み、メタンガスに対する酸素ガスの割合である酸素ガス/メタンガスが1~50体積%である、銀微粒子の製造方法である。
The above-mentioned object can be achieved by the following configuration.
The invention [1] is fine silver particles having a BET specific surface area of 10 m 2 /g or more and a specular reflection value of 10 or more.
Invention [2] is the fine silver particles according to invention [1], which have an exothermic peak temperature of 250°C or less in differential thermal analysis.
Invention [3] is the fine silver particles according to invention [1] or [2], in which the weight loss per unit area is 0.5×10 −3 g/m 2 or more.
Invention [4] is a method for producing silver microparticles by a thermal plasma method using silver powder, which includes the steps of supplying the silver powder into a thermal plasma flame and supplying a cooling gas to the thermal plasma flame, wherein the cooling gas contains methane gas and oxygen gas, and the ratio of oxygen gas to methane gas, oxygen gas/methane gas, is 1 to 50 volume %.
本発明によれば、粒径が小さく、かつ粒子形状が粒状で粒径が揃った銀微粒子及び銀微粒子の製造方法を提供できる。 The present invention provides silver microparticles with small particle diameters, granular particle shapes, and uniform particle diameters, as well as a method for producing silver microparticles.
以下に、添付の図面に示す好適実施形態に基づいて、本発明の銀微粒子及び銀微粒子の製造方法を詳細に説明する。
なお、以下に説明する図は、本発明を説明するための例示的なものであり、以下に示す図に本発明が限定されるものではない。
なお、以下において数値範囲を示す「~」とは両側に記載された数値を含む。例えば、εが数値εα~数値εβとは、εの範囲は数値εαと数値εβを含む範囲であり、数学記号で示せばεα≦ε≦εβである。
また、各種の数値については、特に記載がなければ、該当する技術分野で一般的に許容される誤差範囲を含む。
Hereinafter, the silver fine particles and the method for producing the silver fine particles of the present invention will be described in detail based on preferred embodiments shown in the accompanying drawings.
It should be noted that the drawings described below are illustrative for explaining the present invention, and the present invention is not limited to the drawings shown below.
In the following, the term "to" indicating a range of values includes the values written on both sides. For example, if ε is a value εα to a value εβ , the range of ε includes the values εα and εβ , and expressed in mathematical notation as εα ≦ε≦ εβ .
Furthermore, unless otherwise specified, various numerical values include error ranges generally accepted in the relevant technical field.
[銀微粒子の製造方法]
以下、本発明の銀微粒子の製造方法の一例について説明する。
図1は本発明の実施形態の銀微粒子の製造方法に用いられる微粒子製造装置の一例を示す模式図である。
図1に示す微粒子製造装置10(以下、単に製造装置10という)は、銀微粒子の製造に用いられるものである。製造装置10は、熱プラズマ法により銀微粒子を製造する製造方法に用いられるものである。
[Method of manufacturing silver fine particles]
An example of the method for producing fine silver particles of the present invention will be described below.
FIG. 1 is a schematic diagram showing an example of a fine particle manufacturing apparatus used in a method for manufacturing fine silver particles according to an embodiment of the present invention.
1 (hereinafter simply referred to as the manufacturing apparatus 10) is used for manufacturing silver fine particles. The manufacturing apparatus 10 is used in a manufacturing method for manufacturing silver fine particles by a thermal plasma method.
製造装置10は、熱プラズマ炎を発生させるプラズマトーチ12と、銀微粒子の原料粉末をプラズマトーチ12内へ供給する材料供給装置14と、銀の1次微粒子15を生成させるための冷却槽としての機能を有するチャンバ16と、銀の1次微粒子15から任意に規定された粒径以上の粒径を有する銀の粗大粒子を除去するサイクロン19と、サイクロン19により分級された所望の粒径を有する銀の2次微粒子18を回収する回収部20とを有する。
さらに、製造装置10は、プラズマガス供給部22と、プラズマ発生部24と、気体供給部26とを有する。
The manufacturing apparatus 10 includes a plasma torch 12 that generates a thermal plasma flame, a material supply device 14 that supplies raw material powder of silver microparticles into the plasma torch 12, a chamber 16 that functions as a cooling tank for generating primary silver microparticles 15, a cyclone 19 that removes coarse silver particles having a particle size equal to or larger than an arbitrarily specified particle size from the primary silver microparticles 15, and a recovery section 20 that recovers secondary silver microparticles 18 having a desired particle size that have been classified by the cyclone 19.
Furthermore, the manufacturing apparatus 10 has a plasma gas supply unit 22 , a plasma generation unit 24 , and a gas supply unit 26 .
銀の1次微粒子15及び銀の2次微粒子18は、いずれも本発明の銀微粒子に相当する。銀の2次微粒子は、銀の1次微粒子15が分級されたものである。
材料供給装置14、チャンバ16、サイクロン19、回収部20については、例えば、特開2007-138287号公報の各種装置を用いることができる。なお、銀の1次微粒子15のことを単に1次微粒子15ともいう。
The primary silver particles 15 and the secondary silver particles 18 both correspond to the silver particles of the present invention. The secondary silver particles are obtained by classifying the primary silver particles 15.
For example, various devices disclosed in Japanese Patent Application Laid-Open No. 2007-138287 can be used for the material supply device 14, chamber 16, cyclone 19, and recovery section 20. The primary fine particles 15 of silver are also simply referred to as primary fine particles 15.
本実施形態において、銀微粒子の製造には、銀の粉末が用いられる。銀の粉末は、熱プラズマ炎中で容易に蒸発するように、その平均粒径が適宜設定されるが、平均粒径は、例えば、100μm以下であり、好ましくは10μm以下、さらに好ましくは5μm以下である。 In this embodiment, silver powder is used to produce the silver microparticles. The average particle size of the silver powder is appropriately set so that it evaporates easily in the thermal plasma flame. The average particle size is, for example, 100 μm or less, preferably 10 μm or less, and more preferably 5 μm or less.
プラズマトーチ12は、例えば、石英管12aと、その外側を取り巻く高周波発振用コイル12bとで構成されている。プラズマトーチ12の上部には銀微粒子の原料粉末をプラズマトーチ12内に供給するための後述する供給管14aがその中央部に設けられている。プラズマガス供給口12cが、供給管14aの周辺部(同一円周上)に形成されており、プラズマガス供給口12cはリング状である。 The plasma torch 12 is composed of, for example, a quartz tube 12a and a high-frequency oscillation coil 12b surrounding the outside of the quartz tube 12a. A supply pipe 14a (described below) is provided in the center of the upper part of the plasma torch 12 for supplying raw material powder of silver microparticles into the plasma torch 12. A plasma gas supply port 12c is formed around the periphery of the supply pipe 14a (on the same circumference), and the plasma gas supply port 12c is ring-shaped.
プラズマガス供給部22は、プラズマガスをプラズマトーチ12内に供給するものであり、配管22cを介してプラズマガス供給口12cに接続されている。プラズマガス供給部22からリング状のプラズマガス供給口12cを経て、例えば、矢印Pで示す方向と矢印Sで示す方向からプラズマトーチ12内にプラズマガスが供給される。
プラズマガス供給部22は、プラズマを構成するガス種に応じた気体供給部を有する。プラズマガスが、例えば、水素ガスとアルゴンガスの混合ガスである場合、第1の気体供給部(図示せず)に水素ガスが貯蔵され、第2の気体供給部(図示せず)にアルゴンガスが貯蔵される。第1の気体供給部と第2の気体供給部とには、それぞれ図示はしないがレギュレータ(圧力調整器)と、ガス供給量を制御する調整弁等が設けられている。
The plasma gas supply unit 22 supplies plasma gas into the plasma torch 12 and is connected to the plasma gas supply port 12c via a pipe 22c. The plasma gas is supplied from the plasma gas supply unit 22 through the ring-shaped plasma gas supply port 12c into the plasma torch 12, for example, in the directions indicated by arrows P and S.
The plasma gas supply unit 22 has a gas supply unit corresponding to the gas species that constitute the plasma. When the plasma gas is, for example, a mixed gas of hydrogen gas and argon gas, hydrogen gas is stored in a first gas supply unit (not shown), and argon gas is stored in a second gas supply unit (not shown). The first gas supply unit and the second gas supply unit are each provided with a regulator (pressure adjuster) and an adjustment valve for controlling the gas supply amount, although not shown.
プラズマガス供給部22の第1の気体供給部から水素ガスが、第2の気体供給部からアルゴンガスが配管22cを介してプラズマガス供給口12cを経て、矢印Pで示す方向と矢印Sで示す方向からプラズマトーチ12内に供給される。なお、矢印Pで示す方向にはアルゴンガスだけを供給してもよい。 Hydrogen gas is supplied from the first gas supply section of the plasma gas supply unit 22, and argon gas is supplied from the second gas supply section via pipe 22c and plasma gas supply port 12c, and then into the plasma torch 12 in the directions indicated by arrows P and S. Note that only argon gas may be supplied in the direction indicated by arrow P.
プラズマ発生部24は、高周波電源(図示せず)を有し、高周波電源が高周波発振用コイル12bに接続されている。プラズマ発生部24は、高周波発振用コイル12bに高周波電圧を供給する機能を有する。プラズマ発生部24から、高周波発振用コイル12bに高周波電圧が印加されると、プラズマトーチ12の内部に熱プラズマ炎28が発生する。
熱プラズマ炎28の温度は、原料粉末の沸点よりも高い必要がある。一方、熱プラズマ炎28の温度が高い程、容易に原料粉末が気相状態となるので好ましいが、特に温度は限定されるものではない。例えば、熱プラズマ炎28の温度を6000℃とすることもできるし、理論上は10000℃程度に達するものと考えられる。
また、プラズマトーチ12の内部における圧力雰囲気は、大気圧以下であることが好ましい。ここで、大気圧以下の雰囲気については、特に限定されないが、例えば、0.5~100kPaである。
The plasma generating unit 24 has a high-frequency power supply (not shown), which is connected to the high-frequency oscillation coil 12 b. The plasma generating unit 24 has a function of supplying a high-frequency voltage to the high-frequency oscillation coil 12 b. When the high-frequency voltage is applied from the plasma generating unit 24 to the high-frequency oscillation coil 12 b, a thermal plasma flame 28 is generated inside the plasma torch 12.
The temperature of the thermal plasma flame 28 must be higher than the boiling point of the raw material powder. On the other hand, a higher temperature of the thermal plasma flame 28 is preferable because it makes it easier for the raw material powder to become gaseous, but the temperature is not particularly limited. For example, the temperature of the thermal plasma flame 28 can be set to 6000°C, and theoretically it is thought to reach approximately 10000°C.
The pressure atmosphere inside the plasma torch 12 is preferably equal to or lower than atmospheric pressure. The pressure atmosphere is not particularly limited, but is, for example, 0.5 to 100 kPa.
なお、石英管12aの外側は、同心円状に形成された管(図示されていない)で囲まれており、この管と石英管12aとの間に冷却水を循環させて石英管12aを水冷し、プラズマトーチ12内で発生した熱プラズマ炎28により石英管12aが高温になりすぎるのを防止している。 The outside of the quartz tube 12a is surrounded by a concentric tube (not shown), and cooling water is circulated between this tube and the quartz tube 12a to water-cool the quartz tube 12a and prevent the quartz tube 12a from becoming too hot due to the thermal plasma flame 28 generated within the plasma torch 12.
材料供給装置14は、供給管14aを介してプラズマトーチ12の上部に接続されている。材料供給装置14は、例えば、粉末の形態で原料粉末をプラズマトーチ12内の熱プラズマ炎28中に供給するものである。
銀の粉末を粉末の形態で供給する材料供給装置14としては、上述のように、例えば、特開2007-138287号公報に開示されているものを用いることができる。この場合、材料供給装置14は、例えば、銀の粉末を貯蔵する貯蔵槽(図示せず)と、銀の粉末を定量搬送するスクリューフィーダ(図示せず)と、スクリューフィーダで搬送された銀の粉末が最終的に散布される前に、これを一次粒子の状態に分散させる分散部(図示せず)と、キャリアガス供給源(図示せず)とを有する。
The material supply device 14 is connected to the upper part of the plasma torch 12 via a supply pipe 14a. The material supply device 14 supplies raw material powder, for example, in the form of powder, into the thermal plasma flame 28 in the plasma torch 12.
As described above, for example, the material supply device 14 that supplies silver powder in powder form can be that disclosed in Japanese Patent Application Laid-Open No. 2007-138287. In this case, the material supply device 14 has, for example, a storage tank (not shown) that stores the silver powder, a screw feeder (not shown) that transports a fixed amount of the silver powder, a dispersing section (not shown) that disperses the silver powder transported by the screw feeder into primary particles before it is finally dispersed, and a carrier gas supply source (not shown).
キャリアガス供給源から押出し圧力がかけられたキャリアガスとともに銀の粉末は供給管14aを介してプラズマトーチ12内の熱プラズマ炎28中へ供給される。
材料供給装置14は、銀の粉末の凝集を防止し、分散状態を維持したまま、銀の粉末をプラズマトーチ12内に散布することができるものであれば、その構成は特に限定されるものではない。キャリアガスには、例えば、アルゴンガス等の不活性ガスが用いられる。キャリアガス流量は、例えば、フロート式流量計等の流量計を用いて制御することができる。また、キャリアガスの流量値とは、流量計の目盛り値のことである。
The silver powder is supplied together with carrier gas under extrusion pressure from a carrier gas supply source through the supply pipe 14a into the thermal plasma flame 28 in the plasma torch 12.
The configuration of the material supply device 14 is not particularly limited as long as it can prevent aggregation of the silver powder and spray the silver powder into the plasma torch 12 while maintaining the dispersion state. An inert gas such as argon gas is used as the carrier gas. The flow rate of the carrier gas can be controlled using a flow meter such as a float flow meter. The flow rate value of the carrier gas refers to the scale value of the flow meter.
チャンバ16は、プラズマトーチ12の下方に隣接して設けられており、気体供給部26が接続されている。チャンバ16内で銀の1次微粒子15が生成される。また、チャンバ16は冷却槽として機能するものである。 The chamber 16 is located adjacent to and below the plasma torch 12, and is connected to a gas supply unit 26. Primary silver particles 15 are generated within the chamber 16. The chamber 16 also functions as a cooling tank.
気体供給部26は、チャンバ16内に冷却ガスを供給するものである。気体供給部26は、配管26cを有する。さらに、気体供給部26は、気体が貯留される気体供給源(図示せず)と、チャンバ16内に供給する急冷ガスに押出し圧力をかけるコンプレッサ、ブロア等の圧力付与部(図示せず)とを有する。また、気体供給源からのガス供給量を制御する調整弁(図示せず)が設けられている。気体供給源は、冷却ガスの成分に応じたものが用いられ、冷却ガスは、アルゴンガスとメタンガスと酸素ガスとの混合ガスである。
気体供給部26では、例えば、第1の気体供給源(図示せず)にアルゴンガスが貯蔵され、第2の気体供給源(図示せず)にメタンガス(CH4ガス)が貯蔵され、第3の気体供給源(図示せず)に酸素ガス(O2ガス)が貯蔵されている。
The gas supply unit 26 supplies cooling gas into the chamber 16. The gas supply unit 26 has a pipe 26c. The gas supply unit 26 further has a gas supply source (not shown) in which gas is stored, and a pressure applying unit (not shown) such as a compressor or blower that applies extrusion pressure to the quenching gas supplied into the chamber 16. The gas supply unit 26 is also provided with an adjustment valve (not shown) that controls the amount of gas supplied from the gas supply source. A gas supply source appropriate for the components of the cooling gas is used, and the cooling gas is a mixed gas of argon gas, methane gas, and oxygen gas.
In the gas supply unit 26, for example, argon gas is stored in a first gas supply source (not shown), methane gas ( CH4 gas) is stored in a second gas supply source (not shown), and oxygen gas ( O2 gas) is stored in a third gas supply source (not shown).
気体供給部26は、熱プラズマ炎28の尾部28b、すなわち、プラズマガス供給口12cと反対側の熱プラズマ炎28の端、すなわち、熱プラズマ炎28の終端部(尾部28b)に向かって、例えば、45°の角度で、矢印Qの方向に、冷却ガスとしてアルゴンガスとメタンガスと酸素ガスとの混合ガスを供給し、かつチャンバ16の内側壁16aに沿って上方から下方に向かって、すなわち、図1に示す矢印Rの方向に上述の冷却ガスを供給する。 The gas supply unit 26 supplies a mixture of argon gas, methane gas, and oxygen gas as cooling gas in the direction of arrow Q, at an angle of, for example, 45°, toward the tail 28b of the thermal plasma flame 28, i.e., the end of the thermal plasma flame 28 opposite the plasma gas supply port 12c, i.e., the terminal end (tail 28b) of the thermal plasma flame 28, and also supplies the above-mentioned cooling gas from top to bottom along the inner wall 16a of the chamber 16, i.e., in the direction of arrow R shown in Figure 1.
気体供給部26からチャンバ16内に供給される冷却ガスにより、熱プラズマ炎28で気相状態にされた銀の粉末が急冷されて、銀の1次微粒子15が得られる。これ以外にも上述の冷却ガスはサイクロン19における1次微粒子15の分級に寄与する等の付加的作用を有する。冷却ガスは、例えば、アルゴンガスとメタンガスと酸素ガスとの混合ガスである。
冷却ガスは、メタンガスと酸素ガスとを含み、メタンガスに対する酸素ガスの割合(体積比)である酸素ガス/メタンガスが1~50体積%であり、10~40体積%であることが好ましい。
酸素ガス/メタンガスが1~50体積%であると、BET比表面積が10m2/g以上であり、正反射光値が10以上である銀微粒子が得られる。
また、酸素ガス/メタンガスが10~40体積%であると、作製される銀微粒子の正反射光値がより高くなる、すなわち、銀微粒子の粒状度が高くなり、粒径がより揃い、粒径のばらつきがより小さくなるため好ましい。
酸素ガス/メタンガスが50体積%を超えると、粒子状にならず箔状になり、銀微粒子が得られない。これは、酸素ガス量の増大によってメタンガスは熱分解ではなく燃焼してしまうために、メタンガスの熱分解で生じる銀微粒子の表面を被覆する炭化水素量が少なくなり、その結果、銀微粒子の表面被覆が不十分となり、融着が促進されるためである。
冷却ガスは、アルゴンガスとメタンガスと酸素ガスとを含む混合ガスであるが、メタンガスと酸素ガスとの2種のガスだけを含む構成でもよい。
上述のメタンガスに対する酸素ガスの割合(体積比)である酸素ガス/メタンガスには、標準状態(温度0℃、1気圧)における酸素ガスの流量と、標準状態におけるメタンガスの流量とを用いる。酸素ガスの流量とメタンガスの流量は、流量計を用いて測定される。流量計には、例えば、フロート式流量計が用いられる。
The silver powder that has been put into a gaseous state by the thermal plasma flame 28 is rapidly cooled by the cooling gas supplied into the chamber 16 from the gas supply unit 26, thereby obtaining the silver primary particles 15. In addition to this, the cooling gas has an additional function of contributing to the classification of the primary particles 15 in the cyclone 19. The cooling gas is, for example, a mixed gas of argon gas, methane gas, and oxygen gas.
The cooling gas contains methane gas and oxygen gas, and the ratio (volume ratio) of oxygen gas to methane gas, oxygen gas/methane gas, is 1 to 50% by volume, preferably 10 to 40% by volume.
When the oxygen gas/methane gas ratio is 1 to 50% by volume, fine silver particles having a BET specific surface area of 10 m 2 /g or more and a specular reflection value of 10 or more can be obtained.
Furthermore, when the oxygen gas/methane gas ratio is 10 to 40% by volume, the specular reflection value of the silver microparticles produced will be higher, i.e., the granularity of the silver microparticles will be higher, the particle size will be more uniform, and the particle size variation will be smaller, which is preferable.
If the oxygen gas/methane gas ratio exceeds 50% by volume, the mixture will not form particles but will instead form a foil, and silver microparticles will not be obtained. This is because, as the amount of oxygen gas increases, methane gas will burn rather than be thermally decomposed, and the amount of hydrocarbons that cover the surfaces of the silver microparticles produced by the thermal decomposition of methane gas will decrease, resulting in insufficient surface coverage of the silver microparticles and promoting fusion.
The cooling gas is a mixed gas containing argon gas, methane gas, and oxygen gas, but may be configured to contain only two types of gases, methane gas and oxygen gas.
The oxygen gas/methane gas ratio (volume ratio) of oxygen gas to methane gas uses the flow rate of oxygen gas under standard conditions (temperature 0°C, 1 atmosphere) and the flow rate of methane gas under standard conditions. The flow rates of oxygen gas and methane gas are measured using a flow meter. For example, a float type flow meter is used as the flow meter.
生成直後の銀の1次微粒子15同士が衝突し、凝集体を形成することで粒径の不均一が生じると、品質低下の要因となる。しかしながら、熱プラズマ炎28の尾部28b(終端部)に向かって矢印Qの方向に冷却ガスとして供給される混合ガスが1次微粒子15を希釈することで、銀微粒子同士が衝突して凝集することが防止される。
また、矢印R方向に冷却ガスとして供給される混合ガスにより、1次微粒子15の回収の過程において、1次微粒子15のチャンバ16の内側壁16aへの付着が防止され、生成した1次微粒子15の収率が向上する。
If the primary fine particles 15 of silver collide with each other immediately after generation and form aggregates, which cause uneven particle size, this will be a cause of quality degradation. However, the mixed gas supplied as a cooling gas in the direction of arrow Q toward the tail 28b (terminal end) of the thermal plasma flame 28 dilutes the primary fine particles 15, thereby preventing the silver fine particles from colliding with each other and agglomerating.
In addition, the mixed gas supplied as a cooling gas in the direction of arrow R prevents the primary particles 15 from adhering to the inner wall 16a of the chamber 16 during the recovery process of the primary particles 15, thereby improving the yield of the generated primary particles 15.
図1に示すように、チャンバ16は、銀の1次微粒子15を所望の粒径で分級するためのサイクロン19に接続されている。サイクロン19は、チャンバ16から1次微粒子15を供給する入口管19aと、この入口管19aと接続され、サイクロン19の上部に位置する円筒形状の外筒19bと、この外筒19b下部から下側に向かって連続し、かつ、径が漸減する円錐台部19cと、この円錐台部19c下側に接続され、上述の所望の粒径以上の粒径を有する粗大粒子を回収する粗大粒子回収チャンバ19dと、後に詳述する回収部20に接続され、外筒19bに突設される内管19eとを備えている。 As shown in Figure 1, the chamber 16 is connected to a cyclone 19 for classifying the primary silver particles 15 into particles of the desired particle size. The cyclone 19 is equipped with an inlet pipe 19a that supplies the primary silver particles 15 from the chamber 16, a cylindrical outer tube 19b connected to the inlet pipe 19a and located at the top of the cyclone 19, a truncated cone section 19c that continues downward from the bottom of the outer tube 19b and has a gradually decreasing diameter, a coarse particle recovery chamber 19d connected to the bottom of the truncated cone section 19c and recovering coarse particles with particle sizes equal to or larger than the desired particle size, and an inner tube 19e that protrudes from the outer tube 19b and is connected to the recovery section 20, which will be described in detail later.
サイクロン19の入口管19aから、1次微粒子15を含んだ気流が、外筒19b内周壁に沿って吹き込まれ、これにより、この気流が図1中に矢印Tで示すように外筒19bの内周壁から円錐台部19c方向に向かって流れることで下降する旋回流が形成される。
そして、上述の下降する旋回流が反転し、上昇流になったとき、遠心力と抗力のバランスにより、粗大粒子は、上昇流にのることができず、円錐台部19c側面に沿って下降し、粗大粒子回収チャンバ19dで回収される。また、遠心力よりも抗力の影響をより受けた微粒子は、円錐台部19c内壁での上昇流とともに内管19eから系外に排出される。
An airflow containing primary fine particles 15 is blown from the inlet pipe 19a of the cyclone 19 along the inner peripheral wall of the outer cylinder 19b, and as a result, this airflow flows from the inner peripheral wall of the outer cylinder 19b toward the truncated cone portion 19c as shown by the arrow T in Figure 1, forming a downward swirling flow.
When the downward swirling flow reverses and becomes an upward flow, the balance between centrifugal force and drag prevents the coarse particles from joining the upward flow, and they descend along the side surface of the truncated cone portion 19c and are collected in the coarse particle collection chamber 19d. Furthermore, fine particles, which are more affected by drag than centrifugal force, are discharged from the inner pipe 19e to the outside of the system along with the upward flow on the inner wall of the truncated cone portion 19c.
また、内管19eを通して、後に詳述する回収部20から負圧(吸引力)が生じるようになっている。そして、この負圧(吸引力)によって、上述の旋回する気流から分離した銀微粒子が、符号Uで示すように吸引され、内管19eを通して回収部20に送られるようになっている。 In addition, negative pressure (suction force) is generated through the inner tube 19e from the recovery section 20, which will be described in detail later. This negative pressure (suction force) causes the silver microparticles separated from the swirling airflow to be sucked in as indicated by the symbol U, and are sent to the recovery section 20 through the inner tube 19e.
サイクロン19内の気流の出口である内管19eの延長上には、所望のナノメートルオーダの粒径を有する2次微粒子(銀微粒子)18を回収する回収部20が設けられている。回収部20は、回収室20aと、回収室20a内に設けられたフィルター20bと、回収室20a内下方に設けられた管を介して接続された真空ポンプ30とを備える。サイクロン19から送られた微粒子は、真空ポンプ30で吸引されることにより、回収室20a内に引き込まれ、フィルター20bの表面で留まった状態にされて回収される。
なお、上述の製造装置10において、使用するサイクロンの個数は、1つに限定されず、2つ以上でもよい。
A collection unit 20 for collecting secondary fine particles (fine silver particles) 18 having a desired nanometer-order particle size is provided on the extension of inner tube 19e, which is the outlet of the airflow within cyclone 19. Collection unit 20 includes a collection chamber 20a, a filter 20b provided within collection chamber 20a, and a vacuum pump 30 connected via a tube provided below collection chamber 20a. The fine particles sent from cyclone 19 are sucked by vacuum pump 30 and drawn into collection chamber 20a, where they remain on the surface of filter 20b and are collected.
In the above-described manufacturing apparatus 10, the number of cyclones used is not limited to one, but may be two or more.
次に、上述の製造装置10を用いた銀微粒子の製造方法の一例について説明する。
銀微粒子の製造方法は、銀の粉末を用いて、熱プラズマ法により銀微粒子を製造する。
銀微粒子の製造方法においては、まず、銀微粒子の原料粉末として、例えば、平均粒径が5μm以下の銀の粉末を材料供給装置14に投入する。材料供給装置14は、後述のように銀の粉末を熱プラズマ炎28に供給する。
プラズマ発生部24から高周波発振用コイル12bに高周波電圧を印加し、プラズマトーチ12内に熱プラズマ炎28を発生させる。プラズマガスには、例えば、アルゴンガス及び水素ガスを用いる。
また、気体供給部26から熱プラズマ炎28の尾部28b、すなわち、熱プラズマ炎28の終端部に、矢印Qの方向に、冷却ガスとして、例えば、アルゴンガスとメタンガスと酸素ガスとの混合ガスを供給する(冷却ガスを供給する工程)。冷却ガスにおいて、酸素ガス/メタンガスは1~50体積%である。このとき、矢印Rの方向にも、冷却ガスとして、アルゴンガスとメタンガスと酸素ガスとの混合ガスを供給する。
次に、材料供給装置14において、キャリアガスとして、例えば、アルゴンガスを用いて銀の粉末を気体搬送し、供給管14aを介してプラズマトーチ12内の熱プラズマ炎28中に銀の粉末を供給する。供給された銀の粉末は、熱プラズマ炎28中で蒸発して気相状態となり、冷却ガスにより急冷されて銀の1次微粒子15(銀微粒子)が生成される。このように、銀微粒子の製造方法では、銀の粉末を、熱プラズマ炎中に供給し、熱プラズマ炎に冷却ガスを供給する工程を有する。
Next, an example of a method for producing silver fine particles using the above-described production apparatus 10 will be described.
The method for producing silver particles is to use silver powder and produce silver particles by a thermal plasma method.
In the method for producing silver microparticles, first, as raw material powder for the silver microparticles, for example, silver powder having an average particle size of 5 μm or less is fed into the material supply device 14. The material supply device 14 supplies the silver powder to the thermal plasma flame 28 as described below.
A high frequency voltage is applied from the plasma generating unit 24 to the high frequency oscillation coil 12b to generate a thermal plasma flame 28 within the plasma torch 12. For example, argon gas and hydrogen gas are used as the plasma gas.
Furthermore, a cooling gas, for example, a mixed gas of argon gas, methane gas, and oxygen gas, is supplied from the gas supply unit 26 to the tail 28b of the thermal plasma flame 28, i.e., the terminal end of the thermal plasma flame 28, in the direction of arrow Q (a step of supplying a cooling gas). The oxygen/methane ratio in the cooling gas is 1 to 50% by volume. At this time, a mixed gas of argon gas, methane gas, and oxygen gas is also supplied as a cooling gas in the direction of arrow R.
Next, in the material supply device 14, the silver powder is gaseously transported using, for example, argon gas as a carrier gas, and the silver powder is supplied via the supply pipe 14a into the thermal plasma flame 28 in the plasma torch 12. The supplied silver powder evaporates into a gaseous state in the thermal plasma flame 28 and is rapidly cooled by a cooling gas to generate primary silver particles 15 (silver particles). Thus, the method for producing silver particles includes the steps of supplying silver powder into the thermal plasma flame and supplying a cooling gas to the thermal plasma flame.
そして、チャンバ16内で得られた銀の1次微粒子15は、サイクロン19の入口管19aから、気流とともに外筒19bの内周壁に沿って吹き込まれ、これにより、この気流が図1の矢印Tに示すように外筒19bの内周壁に沿って流れることにより、旋回流を形成して下降する。そして、上述の下降する旋回流が反転し、上昇流になったとき、遠心力と抗力のバランスにより、粗大粒子は、上昇流にのることができず、円錐台部19c側面に沿って下降し、粗大粒子回収チャンバ19dで回収される。また、遠心力よりも抗力の影響をより受けた微粒子は、円錐台部19c内壁での上昇流とともに内壁から系外に排出される。 The primary silver particles 15 obtained in the chamber 16 are then blown together with the airflow from the inlet pipe 19a of the cyclone 19 along the inner wall of the outer cylinder 19b. As a result, this airflow flows along the inner wall of the outer cylinder 19b as indicated by arrow T in Figure 1, forming a swirling flow and descending. When the descending swirling flow reverses and becomes an ascending flow, the balance between centrifugal force and drag forces prevents coarse particles from joining the ascending flow, and they descend along the side of the truncated cone portion 19c and are collected in the coarse particle collection chamber 19d. Furthermore, fine particles that are more affected by drag than centrifugal force are expelled from the system along with the ascending flow on the inner wall of the truncated cone portion 19c.
排出された2次微粒子(銀微粒子)18は、真空ポンプ30による回収部20からの負圧(吸引力)によって、図1中、符号Uに示す方向に吸引され、内管19eを通して回収部20に送られ、回収部20のフィルター20bで回収される。このときのサイクロン19内の内圧は、大気圧以下であることが好ましい。また、2次微粒子(銀微粒子)18の粒径は、目的に応じて、ナノメートルオーダの任意の粒径が規定される。 The discharged secondary fine particles (silver fine particles) 18 are sucked in the direction indicated by the symbol U in Figure 1 by the negative pressure (suction force) from the recovery section 20 by the vacuum pump 30, sent to the recovery section 20 through the inner tube 19e, and recovered by the filter 20b of the recovery section 20. At this time, the internal pressure within the cyclone 19 is preferably below atmospheric pressure. Furthermore, the particle size of the secondary fine particles (silver fine particles) 18 is specified to any particle size on the order of nanometers depending on the purpose.
次に、銀微粒子について説明する。
本発明の銀微粒子は、例えば、上述の製造方法で製造され、粒子状態で得られる。このように本発明の銀微粒子は、溶媒内等に分散されている状態ではなく、銀微粒子単独で存在する。このため、溶媒との組合せ等も特に限定されるものではなく、溶媒の選択の自由度は高い。
ここで、図2は本発明の実施形態の銀微粒子を示す模式図である。
図2に示すように銀微粒子40は、その表面40aに表面被覆物41がある。表面40aの表面被覆物41を含め、銀微粒子40の表面状態を調べたところ、炭化水素(CnHm)が表面に存在しているため、表面被覆物41は炭化水素(CnHm)で構成されている。
炭化水素(CnHm)は、冷却ガスに含まれるメタンガスが熱プラズマ炎により熱分解されて生成されたものである。
なお、銀微粒子40の表面状態は、例えば、FT-IR(フーリエ変換赤外分光光度計)を用いて調べることができる。
Next, the silver particles will be described.
The silver fine particles of the present invention are produced, for example, by the above-mentioned production method and obtained in a particle state. As such, the silver fine particles of the present invention are not dispersed in a solvent or the like, but exist as silver fine particles alone. Therefore, there are no particular limitations on the combination with a solvent, and there is a high degree of freedom in the selection of the solvent.
Here, FIG. 2 is a schematic diagram showing silver fine particles according to an embodiment of the present invention.
2, silver fine particle 40 has surface coating 41 on its surface 40a. When the surface condition of silver fine particle 40, including surface coating 41 on surface 40a, was examined, it was found that hydrocarbons (CnHm) were present on the surface, and therefore surface coating 41 was composed of hydrocarbons (CnHm).
The hydrocarbons (CnHm) are produced by the thermal decomposition of methane gas contained in the cooling gas by the thermal plasma flame.
The surface state of the silver particles 40 can be examined using, for example, an FT-IR (Fourier transform infrared spectrophotometer).
本発明の銀微粒子は、BET比表面積が10m2/g以上であり、正反射光値が10以上である。BET比表面積が10m2/g以上であり、正反射光値が10以上であれば、銀微粒子は、粒径が小さく、かつ粒径が揃っている。
BET比表面積は、BET法を用いて測定された値である。BET比表面積が10m2/g以上であれば、銀微粒子の粒径が小さい。BET比表面積は10~25m2/gであることが好ましい。
本発明の銀微粒子は、ナノ粒子と呼ばれるものであり、粒径が1~57nmである。粒径はBET比表面積から換算された値であり、平均粒径を表す。
正反射光値は、粒子形状の粒状度や粒径のばらつきを示す指標であり、正反射光値の上限値は100である。正反射光値が大きい程、粒子形状が粒状で粒径が揃っていることを示す。正反射光値が10以上であれば、銀微粒子の粒子形状は粒状で粒径のばらつきが小さく、粒径が揃っている。銀微粒子は、正反射光値が15~40であることが好ましい。
The silver fine particles of the present invention have a BET specific surface area of 10 m 2 /g or more and a specular reflection value of 10 or more. If the BET specific surface area is 10 m 2 /g or more and the specular reflection value is 10 or more, the silver fine particles have a small and uniform particle size.
The BET specific surface area is a value measured using the BET method. If the BET specific surface area is 10 m 2 /g or more, the particle size of the silver particles is small. The BET specific surface area is preferably 10 to 25 m 2 /g.
The fine silver particles of the present invention are called nanoparticles, and have a particle size of 1 to 57 nm. The particle size is a value converted from the BET specific surface area and represents the average particle size.
The specular reflection value is an index showing the granularity of particle shape and the variation in particle size, with the upper limit of the specular reflection value being 100. The larger the specular reflection value, the more granular the particle shape and the more uniform the particle size. If the specular reflection value is 10 or more, the silver microparticles have a granular particle shape with little variation in particle size and a uniform particle size. It is preferable that the silver microparticles have a specular reflection value of 15 to 40.
上述のように銀微粒子は、正反射光値が10以上であり、15~40が好ましい。
正反射光値を用いて、銀微粒子の粒子形状が粒状か粒径が揃っているか否かを評価することができる。これは、正反射光値が膜の均一性を評価できることに基づくものである。具体的には、銀微粒子の粒子形状が粒状で粒径が揃っている場合、膜の均一性が高くなり、その結果、膜の正反射光が多くなる。一方、銀微粒子の粒子形状が非粒状で粒径が不揃いの場合、膜の均一性が低くなり、その結果、膜の拡散反射光が多くなる。このことを利用して、銀微粒子の粒子形状が粒状か粒径が揃っているか否かを評価する。
ここで、図3及び図4は正反射光値を説明する模式図である。物体に入射した入射光は、以下のように表される。
入射光=正反射光+拡散反射光+内部散乱光+透過光+吸収光
銀微粒子40の粒子形状が粒状で粒径が揃っていると、膜は均一で緻密で、平滑になり正反射光値が高くなる。このことから、正反射光値は、銀微粒子の粒子形状が粒状で粒径が揃っていること、膜の均一さ、緻密さ、及び平滑さの指標となる。
図3に示す膜50は、基板52に形成されており、内部に複数の銀微粒子40が配置されている。複数の銀微粒子40は粒子形状が粒状で粒径が揃っており、分散状態もよい。図4に示す膜51は、基板52に形成されており、内部に複数の銀微粒子40が配置されているが、複数の銀微粒子40は粒子形状が非粒状で粒径が不揃いであり、膜51内において銀微粒子40の分散状態も悪い。
As described above, the silver fine particles have a specular reflection value of 10 or more, preferably 15 to 40.
The specular reflection value can be used to evaluate whether the silver microparticles have a granular shape and uniform particle size. This is based on the fact that the specular reflection value can evaluate the uniformity of a film. Specifically, if the silver microparticles have a granular shape and uniform particle size, the film will have high uniformity, resulting in more specular reflection from the film. On the other hand, if the silver microparticles have a non-granular shape and irregular particle size, the film will have low uniformity, resulting in more diffuse reflection from the film. This can be used to evaluate whether the silver microparticles have a granular shape and uniform particle size.
3 and 4 are schematic diagrams for explaining the specular reflection value. The incident light incident on an object is expressed as follows:
Incident light = specularly reflected light + diffusely reflected light + internally scattered light + transmitted light + absorbed light If the silver microparticles 40 have a granular particle shape and a uniform particle size, the film will be uniform, dense, and smooth, and the specular reflected light value will be high. Therefore, the specular reflected light value is an indicator of whether the silver microparticles have a granular particle shape and a uniform particle size, and the uniformity, density, and smoothness of the film.
The film 50 shown in Fig. 3 is formed on a substrate 52 and has a plurality of silver microparticles 40 disposed therein. The plurality of silver microparticles 40 have a granular particle shape, uniform particle size, and a good dispersion state. The film 51 shown in Fig. 4 is formed on a substrate 52 and has a plurality of silver microparticles 40 disposed therein, but the plurality of silver microparticles 40 have a non-granular particle shape, non-uniform particle size, and the dispersion state of the silver microparticles 40 within the film 51 is poor.
図3に示す膜50の表面50aに入射した入射光Liは、正反射光Lrを生じる。図4に示す膜51でも表面51aに入射した入射光Liは、正反射光Lrが生じる。
図3に示す膜50は銀微粒子40の粒子形状が粒状で、粒径が揃っており、分散状態もよく、空隙が少なく均一な膜であるため、内部散乱光Ls及び拡散反射光Ldが少なく正反射光Lrの光量が多くなる。すなわち、銀微粒子40の粒子形状が粒状で粒径が揃っていると正反射光値が大きい。
図4に示す膜51は銀微粒子40の粒子形状が非粒状で粒径が不揃いであり、分散状態も悪く、空隙が多く不均一な膜であるため、内部散乱光Ls及び拡散反射光Ldが増加し正反射光Lrの光量が少なくなる。すなわち、銀微粒子40の粒子形状が非粒状で粒径が不揃いであると正反射光値が小さい。
このように正反射光値を用いて、銀微粒子の粒子形状の粒状度や粒径のばらつきを評価できる。正反射光値は、例えば、分光測色計を用いて測定することができる。
Incident light Li incident on the surface 50a of the film 50 shown in Fig. 3 generates specularly reflected light Lr. Incident light Li incident on the surface 51a of the film 51 shown in Fig. 4 also generates specularly reflected light Lr.
3, the silver microparticles 40 have a granular particle shape, a uniform particle size, a good dispersion state, and a uniform film with few voids, so the internal scattered light Ls and diffuse reflected light Ld are small, and the amount of specular reflected light Lr is large. In other words, when the silver microparticles 40 have a granular particle shape and a uniform particle size, the specular reflected light value is large.
4, the silver microparticles 40 have a non-granular particle shape and irregular particle sizes, are poorly dispersed, and are non-uniform with many voids, resulting in an increase in internal scattered light Ls and diffuse reflected light Ld and a decrease in the amount of specular reflected light Lr. In other words, when the silver microparticles 40 have a non-granular particle shape and irregular particle sizes, the specular reflected light value is small.
In this way, the specular reflection value can be used to evaluate the granularity of the particle shape of the silver fine particles and the variation in particle size. The specular reflection value can be measured using, for example, a spectrophotometer.
銀微粒子は、示差熱分析における発熱ピーク温度が250℃以下であることが好ましく、170~200℃がより好ましい。
示差熱分析における発熱ピーク温度が250℃以下であれば、250℃以下で生じる発熱ピーク温度で銀微粒子同士の焼結が生じ、導電性を発現させることができる。
大気中にて本発明の銀微粒子を加熱すると、銀微粒子の表面を被覆している表面被覆物を構成する炭化水素(CnHm)が大気中の酸素と反応し、発熱を伴い燃焼し、分解する。示差熱分析における発熱ピーク温度(℃)は、TG-DTA(示差熱熱重量同時測定装置)を用いて、この発熱の度合いを測定し、最も発熱した際の温度を示すものである。すなわち、この発熱ピーク温度が低い程、表面を被覆している薄膜の炭化水素化合物が分解されやすく、薄膜のなくなった銀微粒子同士が接触しやすくなるため、より低い温度で銀微粒子の焼成が可能であることを示す。
示差熱分析における発熱ピーク温度は、TG-DTA(示差熱熱重量同時測定装置)を用い、大気中にて測定する。TG-DTA(示差熱熱重量同時測定装置)には、例えば、株式会社日立ハイテクサイエンスのSTA7200(商品名)が用いられる。
The silver particles preferably have an exothermic peak temperature of 250°C or less, more preferably 170 to 200°C, in differential thermal analysis.
If the exothermic peak temperature in differential thermal analysis is 250°C or less, sintering of the silver particles occurs at the exothermic peak temperature of 250°C or less, and electrical conductivity can be exhibited.
When the silver microparticles of the present invention are heated in the atmosphere, the hydrocarbons (CnHm) that constitute the surface coating that coats the surfaces of the silver microparticles react with oxygen in the atmosphere, combusting and decomposing with heat. The exothermic peak temperature (°C) in differential thermal analysis is measured using a TG-DTA (thermogravimetric differential thermal analyzer) to measure the degree of heat generation, and indicates the temperature at which the heat generation is greatest. In other words, the lower this exothermic peak temperature, the more easily the hydrocarbon compounds in the thin film coating the surface are decomposed, and the more easily the silver microparticles that no longer have the thin film come into contact with each other, indicating that the silver microparticles can be fired at a lower temperature.
The exothermic peak temperature in the differential thermal analysis is measured in air using a TG-DTA (thermogravimetric and differential thermal analyzer), such as the STA7200 (trade name) manufactured by Hitachi High-Tech Science Corporation.
銀微粒子は、単位面積当たりの重量減少量が0.5×10-3g/m2以上であることが好ましく、0.9~2×10-3g/m2がより好ましい。
単位面積当たりの重量減少量(g/m2)は、TG-DTA(示差熱熱重量同時測定装置)を用い、大気中における重量減少割合(質量%)を測定し、この重量減少割合(質量%)を、BET比表面積(m2/g)で除することで算出する。すなわち、単位面積当たりの重量減少量(g/m2)=(重量減少割合(質量%))/(BET比表面積(m2/g))である。
単位面積当たりの重量減少量が0.5×10-3g/m2以上であると、得られる銀微粒子の粒状度が高く、粒径のばらつきが小さくなる。
The weight loss of the fine silver particles per unit area is preferably 0.5×10 −3 g/m 2 or more, and more preferably 0.9 to 2×10 −3 g/m 2 .
The weight loss per unit area (g/m 2 ) is calculated by measuring the weight loss rate (mass %) in air using a TG-DTA (thermogravimetric differential thermal analyzer) and dividing this weight loss rate (mass %) by the BET specific surface area (m 2 /g). That is, weight loss per unit area (g/m 2 ) = (weight loss rate (mass %)) / (BET specific surface area (m 2 /g)).
When the weight loss per unit area is 0.5×10 −3 g/m 2 or more, the granularity of the resulting fine silver particles is high and the variation in particle size is small.
本発明は、基本的に以上のように構成されるものである。以上、本発明の銀微粒子及び銀微粒子の製造方法について詳細に説明したが、本発明は上述の実施形態に限定されず、本発明の主旨を逸脱しない範囲において、種々の改良又は変更をしてもよいのはもちろんである。 The present invention is basically configured as described above. The silver microparticles and method for producing silver microparticles of the present invention have been described in detail above, but the present invention is not limited to the above-described embodiments, and various improvements and modifications may of course be made without departing from the spirit of the present invention.
以下に実施例を挙げて本発明の特徴をさらに具体的に説明する。以下の実施例に示す処理内容、処理手順等は、本発明の趣旨を逸脱しない限り適宜変更することができる。従って、本発明の範囲は以下に示す具体例により限定的に解釈されるべきものではない。
本実施例における、実施例1~6及び比較例1~8の銀微粒子について、製造条件を下記表1に示す。また、実施例1~6及び比較例1~3の銀微粒子について、BET比表面積と、正反射光値と、発熱ピーク温度と、単位面積当たりの重量減少量とを測定した。その結果を下記表2に示す。比較例4~8において、正反射光値、発熱ピーク温度、重量減少割合及び単位面積当たりの重量減少量のうち、測定しなかったものについては下記表2の正反射光値、発熱ピーク温度、重量減少割合及び単位面積当たりの重量減少量の該当する欄に「-」と記した。
また、下記表1に製造条件として、実施例1~6及び比較例1~8の銀微粒子を製造する際のプラズマガス流量と、冷却ガス流量を示す。
以下、BET比表面積と、正反射光値と、示差熱分析における発熱ピーク温度と、単位面積当たりの重量減少量とについて説明する。
The features of the present invention will be explained in more detail below with reference to examples. The process contents, process procedures, etc. shown in the following examples can be appropriately modified without departing from the spirit of the present invention. Therefore, the scope of the present invention should not be construed as being limited by the specific examples shown below.
The manufacturing conditions for the silver microparticles of Examples 1 to 6 and Comparative Examples 1 to 8 in this example are shown in Table 1 below. Furthermore, the BET specific surface area, specular reflection value, exothermic peak temperature, and weight loss per unit area were measured for the silver microparticles of Examples 1 to 6 and Comparative Examples 1 to 3. The results are shown in Table 2 below. For Comparative Examples 4 to 8, the specular reflection value, exothermic peak temperature, weight loss rate, and weight loss per unit area that were not measured are marked with "-" in the corresponding columns for specular reflection value, exothermic peak temperature, weight loss rate, and weight loss per unit area in Table 2 below.
Table 1 below shows the production conditions, ie, the plasma gas flow rate and the cooling gas flow rate when producing the silver microparticles of Examples 1 to 6 and Comparative Examples 1 to 8.
The BET specific surface area, the specular reflection value, the exothermic peak temperature in differential thermal analysis, and the weight loss per unit area will be explained below.
<BET比表面積>
作製した銀微粒子について、株式会社マウンテック製Macsorb HM-1208を用いてBET比表面積(m2/g)を測定した。
なお、下記表2に示すBET径は、測定したBET比表面積(m2/g)から換算した銀微粒子の粒径である。
<BET specific surface area>
The BET specific surface area (m 2 /g) of the prepared silver particles was measured using Macsorb HM-1208 manufactured by Mountech Co., Ltd.
The BET diameters shown in Table 2 below are particle sizes of the silver particles converted from the measured BET specific surface area (m 2 /g).
<正反射光値>
正反射光値は、以下のようにして測定した。
まず、溶媒と分散剤からなる溶液に銀微粒子を分散させた。その後、この分散液をスライドガラス上に塗布して塗膜を形成した後、分光測色計を用いて塗膜の正反射光値を測定した。塗膜の正反射光値を銀微粒子の正反射光値とした。
なお、分散剤には、BYK-112(ビックケミー・ジャパン株式会社製)を用いた。
<Specular reflection value>
The specular reflection value was measured as follows.
First, silver particles were dispersed in a solution consisting of a solvent and a dispersant. This dispersion was then applied to a glass slide to form a coating film, and the specular reflection value of the coating film was measured using a spectrophotometer. The specular reflection value of the coating film was taken as the specular reflection value of the silver particles.
The dispersant used was BYK-112 (manufactured by BYK Japan KK).
<示差熱分析における発熱ピーク温度>
示差熱分析における発熱ピーク温度は、株式会社日立ハイテクサイエンスのSTA7200(商品名)を用いて測定した。
<Exothermic peak temperature in differential thermal analysis>
The exothermic peak temperature in the differential thermal analysis was measured using STA7200 (trade name) manufactured by Hitachi High-Tech Science Corporation.
<単位面積当たりの重量減少量>
株式会社日立ハイテクサイエンスのSTA7200(商品名)を用いて重量減少割合(質量%)を測定した。
上述のようにして測定したBET比表面積と重量減少割合を用いて、下記式により、単位面積当たりの重量減少量(g/m2)を算出した。
単位面積当たりの重量減少量(g/m2)=(重量減少割合(質量%))/(BET比表面積(m2/g))
<Weight reduction per unit area>
The weight loss rate (mass %) was measured using STA7200 (trade name) manufactured by Hitachi High-Tech Science Corporation.
Using the BET specific surface area and the weight loss rate measured as described above, the weight loss amount per unit area (g/m 2 ) was calculated according to the following formula.
Weight reduction amount per unit area (g/m 2 )=(weight reduction rate (mass %))/(BET specific surface area (m 2 /g))
以下、実施例1~6及び比較例1~8の銀微粒子について説明する。
実施例1~6及び比較例1~8の銀微粒子は、上述の微粒子製造装置10を用いて作製した。
実施例1~6及び比較例1~8の銀微粒子の作製には、原料粉末に、平均粒径15μmの銀の粉末を用いた。また、実施例1~6及び比較例1~8の銀微粒子の製造条件として、プラズマへの入力電力を15kW一定とし、プラズマトーチ内の圧力(装置内圧)を40kPaとした。
キャリアガスにアルゴンガスを用い、プラズマガスにアルゴンガスと水素ガスの混合ガスを用いた。実施例1~6は、冷却ガスに、アルゴンガスとメタンガスと酸素ガスとの混合ガスを用いた。比較例1~4は、冷却ガスに、アルゴンガスとメタンガスとの混合ガスを用いた。比較例5及び6は、冷却ガスに、アルゴンガスとメタンガスと水素ガスの混合ガスを用いた。比較例7及び8は、冷却ガスに、アルゴンガスとメタンガスと酸素ガスの混合ガスを用いた。
実施例1~6及び比較例1~8においては、プラズマガスの流量、並びに冷却ガスの成分及び流量を変えた。冷却ガスの流量は、標準状態(温度0℃、1気圧)における流量である。冷却ガスの流量は、それぞれアルゴンガス等の冷却ガスを構成するガスの成分毎にフロート式流量計を用いて測定した。
The silver fine particles of Examples 1 to 6 and Comparative Examples 1 to 8 will be described below.
The silver fine particles of Examples 1 to 6 and Comparative Examples 1 to 8 were produced using the fine particle production apparatus 10 described above.
Silver powder having an average particle size of 15 μm was used as the raw material powder to produce the silver microparticles of Examples 1 to 6 and Comparative Examples 1 to 8. The conditions for producing the silver microparticles of Examples 1 to 6 and Comparative Examples 1 to 8 were as follows: the input power to the plasma was constant at 15 kW, and the pressure inside the plasma torch (internal pressure of the device) was 40 kPa.
Argon gas was used as the carrier gas, and a mixed gas of argon gas and hydrogen gas was used as the plasma gas. In Examples 1 to 6, a mixed gas of argon gas, methane gas, and oxygen gas was used as the cooling gas. In Comparative Examples 1 to 4, a mixed gas of argon gas and methane gas was used as the cooling gas. In Comparative Examples 5 and 6, a mixed gas of argon gas, methane gas, and hydrogen gas was used as the cooling gas. In Comparative Examples 7 and 8, a mixed gas of argon gas, methane gas, and oxygen gas was used as the cooling gas.
In Examples 1 to 6 and Comparative Examples 1 to 8, the flow rate of the plasma gas and the components and flow rate of the cooling gas were changed. The flow rate of the cooling gas was measured under standard conditions (temperature of 0°C, 1 atmosphere). The flow rate of the cooling gas was measured using a float-type flow meter for each component of the cooling gas, such as argon gas.
(実施例1~6)
実施例1は、プラズマガスについて、アルゴンガスの流量を170L/分とし、水素ガスの流量を5L/分とした。
冷却ガスについて、アルゴンガスの流量を50L/分とし、メタンガスの流量を15L/分とし、酸素ガスの流量を0.15L/分とした。実施例1は酸素ガス/メタンガスが1体積%である。
実施例2は、実施例1に比して、冷却ガスについて、アルゴンガスの流量を100L/分とし、メタンガスの流量を15L/分とし、酸素ガスの流量を1.5L/分とした以外は、実施例1と同じとした。実施例2は酸素ガス/メタンガスが10体積%である。
実施例3は、実施例1に比して、冷却ガスについて、アルゴンガスの流量を450L/分とし、メタンガスの流量を15L/分とし、酸素ガスの流量を1.5L/分とした以外は、実施例1と同じとした。実施例3は酸素ガス/メタンガスが10体積%である。
Examples 1 to 6
In Example 1, the flow rates of the argon gas and hydrogen gas were set to 170 L/min and 5 L/min, respectively, for the plasma gas.
The cooling gases were argon gas at a flow rate of 50 L/min, methane gas at a flow rate of 15 L/min, and oxygen gas at a flow rate of 0.15 L/min. In Example 1, the oxygen gas/methane gas ratio was 1% by volume.
Example 2 was the same as Example 1 except that the cooling gases were argon gas at a flow rate of 100 L/min, methane gas at a flow rate of 15 L/min, and oxygen gas at a flow rate of 1.5 L/min. Example 2 had an oxygen gas/methane gas ratio of 10% by volume.
Example 3 was the same as Example 1 except that the cooling gas flow rates of argon gas, methane gas, and oxygen gas were set to 450 L/min, 15 L/min, and 1.5 L/min, respectively. Example 3 had an oxygen/methane ratio of 10% by volume.
実施例4は、実施例1に比して、プラズマガスについて、アルゴンガスの流量を200L/分とし、水素ガスの流量を5L/分とした。また、冷却ガスについて、アルゴンガスの流量を900L/分とし、メタンガスの流量を10L/分とし、酸素ガスの流量を5L/分とした以外は、実施例1と同じとした。実施例4は酸素ガス/メタンガスが50体積%である。
実施例5は、実施例1に比して、プラズマガスについて、アルゴンガスの流量を200L/分とし、水素ガスの流量を5L/分とした。また、冷却ガスについて、アルゴンガスの流量を900L/分とし、メタンガスの流量を15L/分とし、酸素ガスの流量を5L/分とした以外は、実施例1と同じとした。実施例5は酸素ガス/メタンガスが33.3体積%である。
実施例6は、実施例1に比して、プラズマガスについて、アルゴンガスの流量を200L/分とし、水素ガスの流量を5L/分とした。また、冷却ガスについて、アルゴンガスの流量を900L/分とし、メタンガスの流量を25L/分とし、酸素ガスの流量を5L/分とした以外は、実施例1と同じとした。実施例6は酸素ガス/メタンガスが20体積%である。
Example 4 was the same as Example 1 except that the plasma gas flow rates of argon gas were 200 L/min and hydrogen gas were 5 L/min. The cooling gas flow rates of argon gas were 900 L/min, methane gas 10 L/min, and oxygen gas 5 L/min. Example 4 had an oxygen/methane gas ratio of 50% by volume.
Example 5 was the same as Example 1 except that the plasma gas flow rates of argon gas were 200 L/min and hydrogen gas were 5 L/min. The cooling gas flow rates of argon gas were 900 L/min, methane gas 15 L/min, and oxygen gas 5 L/min. Example 5 had an oxygen/methane ratio of 33.3% by volume.
Example 6 was the same as Example 1 except that the plasma gas flow rates of argon gas were 200 L/min and hydrogen gas were 5 L/min, and the cooling gas flow rates were 900 L/min, 25 L/min, and 5 L/min, respectively. Example 6 had an oxygen/methane gas ratio of 20% by volume.
(比較例1~8)
比較例1は、実施例1に比して、プラズマガスについて、アルゴンガスの流量を200L/分とし、水素ガスの流量を5L/分とした。また、冷却ガスをアルゴンガスとメタンガスの混合ガスとし、アルゴンガスの流量を150L/分とし、メタンガスの流量を15L/分とした以外は、実施例1と同じとした。
比較例2は、実施例1に比して、プラズマガスについて、アルゴンガスの流量を200L/分とし、水素ガスの流量を5L/分とした。また、冷却ガスをアルゴンガスとメタンガスの混合ガスとし、アルゴンガスの流量を450L/分とし、メタンガスの流量を15L/分とした以外は、実施例1と同じとした。
比較例3は、実施例1に比して、プラズマガスについて、アルゴンガスの流量を160L/分とし、水素ガスの流量を5L/分とした。また、冷却ガスをアルゴンガスとメタンガスの混合ガスとし、アルゴンガスの流量を900L/分とし、メタンガスの流量を6L/分とした以外は、実施例1と同じとした。
(Comparative Examples 1 to 8)
In Comparative Example 1, the flow rates of the argon gas and the hydrogen gas were set to 200 L/min and 5 L/min, respectively, compared to Example 1. The cooling gas was a mixed gas of argon gas and methane gas, and the flow rates of the argon gas and the methane gas were set to 150 L/min and 15 L/min, respectively.
In Comparative Example 2, the flow rates of the argon gas and the hydrogen gas were set to 200 L/min and 5 L/min, respectively, compared to Example 1. The cooling gas was a mixed gas of argon gas and methane gas, and the flow rates of the argon gas and the methane gas were set to 450 L/min and 15 L/min, respectively.
In Comparative Example 3, the flow rates of the argon gas and the hydrogen gas were set to 160 L/min and 5 L/min, respectively, compared to Example 1. The cooling gas was a mixed gas of argon gas and methane gas, and the flow rates of the argon gas and the methane gas were set to 900 L/min and 6 L/min, respectively.
比較例4は、実施例1に比して、プラズマガスについて、アルゴンガスの流量を200L/分とし、水素ガスの流量を5L/分とした。また、冷却ガスをアルゴンガスとメタンガスの混合ガスとし、アルゴンガスの流量を900L/分とし、メタンガスの流量を10L/分とした以外は、実施例1と同じとした。
比較例5は、実施例1に比して、プラズマガスについて、アルゴンガスの流量を210L/分とし、水素ガスの流量を5L/分とした。また、冷却ガスをアルゴンガスとメタンガスと水素ガスの混合ガスとし、アルゴンガスの流量を600L/分とし、メタンガスの流量を10L/分とし、水素ガスの流量を5L/分とした以外は、実施例1と同じとした。
比較例6は、実施例1に比して、プラズマガスについて、アルゴンガスの流量を210L/分とし、水素ガスの流量を5L/分とした。また、冷却ガスをアルゴンガスとメタンガスと水素ガスの混合ガスとし、アルゴンガスの流量を600L/分とし、メタンガスの流量を10L/分とし、水素ガスの流量を10L/分とした以外は、実施例1と同じとした。
In Comparative Example 4, the flow rates of the argon gas and the hydrogen gas were set to 200 L/min and 5 L/min, respectively, compared to Example 1. The cooling gas was a mixed gas of argon gas and methane gas, and the flow rates of the argon gas and the methane gas were set to 900 L/min and 10 L/min, respectively.
In Comparative Example 5, the plasma gas flow rates were set to 210 L/min for argon gas and 5 L/min for hydrogen gas, as compared with Example 1. The cooling gas was a mixed gas of argon gas, methane gas, and hydrogen gas, and the flow rates of argon gas, methane gas, and hydrogen gas were set to 600 L/min, 10 L/min, and 5 L/min, respectively, except for the other conditions.
In Comparative Example 6, the plasma gas flow rates were set to 210 L/min for argon gas and 5 L/min for hydrogen gas, as compared with Example 1. The cooling gas was a mixed gas of argon gas, methane gas, and hydrogen gas, and the flow rates of argon gas, methane gas, and hydrogen gas were set to 600 L/min, 10 L/min, and 10 L/min, respectively, except for the other conditions.
比較例7は、実施例1に比して、プラズマガスについて、アルゴンガスの流量を200L/分とし、水素ガスの流量を5L/分とした。また、冷却ガスについて、アルゴンガスの流量を900L/分とし、メタンガスの流量を1L/分とし、酸素ガスの流量を5L/分とした以外は、実施例1と同じとした。比較例7は酸素ガス/メタンガスが500体積%である。
比較例8は、実施例1に比して、プラズマガスについて、アルゴンガスの流量を200L/分とし、水素ガスの流量を5L/分とした。また、冷却ガスについて、アルゴンガスの流量を900L/分とし、メタンガスの流量を1L/分とし、酸素ガスの流量を1L/分とした以外は、実施例1と同じとした。比較例8は酸素ガス/メタンガスが100体積%である。
なお、比較例7及び8は、粒子状にならず箔状になったため、BET比表面積及びBET径の測定ができなかった。このため、下記表2のBET比表面積の欄及びBET径の欄に「-」と記した。比較例7及び8は、箔状であるため、正反射光値、発熱ピーク温度、重量減少割合及び単位面積当たりの重量減少量を測定しなかった。このため、下記表2の正反射光値、発熱ピーク温度、重量減少割合及び単位面積当たりの重量減少量の各欄に「-」と記した。
In Comparative Example 7, the plasma gas flow rates were the same as in Example 1 except that the argon gas flow rate was 200 L/min and the hydrogen gas flow rate was 5 L/min. The cooling gas flow rates were the same as in Example 1 except that the argon gas flow rate was 900 L/min, the methane gas flow rate was 1 L/min, and the oxygen gas flow rate was 5 L/min. In Comparative Example 7, the oxygen gas/methane gas ratio was 500% by volume.
In Comparative Example 8, the plasma gas flow rates were the same as in Example 1 except that the argon gas flow rate was 200 L/min and the hydrogen gas flow rate was 5 L/min. The cooling gas flow rates were the same as in Example 1 except that the argon gas flow rate was 900 L/min, the methane gas flow rate was 1 L/min, and the oxygen gas flow rate was 1 L/min. In Comparative Example 8, the oxygen gas/methane gas ratio was 100% by volume.
In Comparative Examples 7 and 8, the powders were not in a particulate form but in a foil form, and therefore the BET specific surface area and BET diameter could not be measured. Therefore, "-" is entered in the BET specific surface area and BET diameter columns in Table 2 below. Since Comparative Examples 7 and 8 were in a foil form, the specular reflection value, exothermic peak temperature, weight loss rate, and weight loss amount per unit area were not measured. Therefore, "-" is entered in the columns for specular reflection value, exothermic peak temperature, weight loss rate, and weight loss amount per unit area in Table 2 below.
表2に示すように、実施例1~6は比較例1~8に比して、BET比表面積が10m2/g以上であり、正反射光値が10以上である銀微粒子を製造できた。
実施例1~6は、BET比表面積が10m2/g以上であることから、粒径が小さい。また、実施例1~6は、正反射光値が10以上であることから、粒子形状が粒状で粒径が揃っていた。
一方、比較例1~6においては、いずれの粒子においてもBET比表面積10m2/g以上かつ、正反射光値が10以上を満たす粒子が得られなかった。これは、冷却ガスに酸素ガスが含まれていないと、銀微粒子の表面を被覆するのに十分な炭化水素が発生するレベルのメタンガスの熱分解が生じず、その結果、銀微粒子の成長を抑制できず非粒状粒子の生成や粗大粒子が生成したためと考えられる。
また、比較例7及び8は、いずれも粒子状にならず箔状になった。これについては、比較例7及び8は酸素ガス量が多く、メタンガスが熱分解ではなく燃焼してしまうために、メタンガスの熱分解で生じる銀微粒子の表面を被覆する炭化水素量が少なくなり、その結果、銀微粒子の表面被覆が不十分となり、融着が促進されるためである。比較例7及び8は箔状であったため、BET比表面積及びBET径の測定をできなかった。
ここで、図5は実施例5の銀微粒子のSEM(Scanning Electron Microscope)像を示す模式図であり、図6は比較例3の銀微粒子のSEM像を示す模式図である。SEM像は日本電子株式会社製JSM-6700Fを用いて取得した。
図5に示すように実施例5の銀微粒子は、粒子形状が粒状で、粒径が小さく、かつ粗大粒子がなく粒径が揃っていた。一方、図6に示すように比較例3の銀微粒子は、粒子形状が非粒状で、粗大粒子100があり、粒径が不揃いであった。
また、実施例1~6から、酸素ガス/メタンガス(体積比)が10~40体積%であると、正反射光値が高くなる。
As shown in Table 2, in comparison with Comparative Examples 1 to 8, Examples 1 to 6 produced fine silver particles having a BET specific surface area of 10 m 2 /g or more and a specular reflection value of 10 or more.
In Examples 1 to 6, the BET specific surface area was 10 m 2 /g or more, indicating that the particle size was small. In addition, in Examples 1 to 6, the specular reflection value was 10 or more, indicating that the particle shape was granular and the particle size was uniform.
On the other hand, in Comparative Examples 1 to 6, none of the particles obtained had a BET specific surface area of 10 m 2 /g or more and a specular reflection value of 10 or more. This is thought to be because, if the cooling gas did not contain oxygen gas, the thermal decomposition of methane gas did not occur to a level that would generate hydrocarbons sufficient to coat the surface of the silver particles, and as a result, the growth of the silver particles could not be suppressed, resulting in the generation of non-granular particles and coarse particles.
In addition, in Comparative Examples 7 and 8, the particles were not in a granular form but in a foil form. This is because the amount of oxygen gas was large in Comparative Examples 7 and 8, and methane gas was burned rather than thermally decomposed, resulting in a small amount of hydrocarbons covering the surface of the silver particles produced by thermal decomposition of methane gas. As a result, the surface coating of the silver particles was insufficient, and fusion was promoted. Since Comparative Examples 7 and 8 were in a foil form, it was not possible to measure the BET specific surface area and BET diameter.
Here, Fig. 5 is a schematic diagram showing an SEM (Scanning Electron Microscope) image of the silver fine particles of Example 5, and Fig. 6 is a schematic diagram showing an SEM image of the silver fine particles of Comparative Example 3. The SEM images were obtained using a JSM-6700F manufactured by JEOL Ltd.
As shown in Figure 5, the silver microparticles of Example 5 had a granular particle shape, small particle diameters, and were uniform in particle size with no coarse particles. On the other hand, as shown in Figure 6, the silver microparticles of Comparative Example 3 had a non-granular particle shape, contained 100 coarse particles, and were non-uniform in particle size.
Furthermore, from Examples 1 to 6, when the oxygen gas/methane gas (volume ratio) is 10 to 40% by volume, the specular reflection value is high.
10 微粒子製造装置(製造装置)
12 プラズマトーチ
12a 石英管
12b 高周波発振用コイル
12c プラズマガス供給口
14 材料供給装置
14a 供給管
15 1次微粒子
16 チャンバ
16a 内側壁
18 2次微粒子
19 サイクロン
19a 入口管
19b 外筒
19c 円錐台部
19d 粗大粒子回収チャンバ
19e 内管
20 回収部
20a 回収室
20b フィルター
22 プラズマガス供給部
22c 配管
24 プラズマ発生部
26 気体供給部
26c 配管
28 熱プラズマ炎
28b 尾部
30 真空ポンプ
40 銀微粒子
40a、51a 表面
41 表面被覆物
50、51 膜
52 基板
100 粗大粒子
Ld 拡散反射光
Li 入射光
Lr 正反射光
Ls 内部散乱光
10 Fine particle manufacturing equipment (manufacturing equipment)
12 Plasma torch 12a Quartz tube 12b High frequency oscillation coil 12c Plasma gas supply port 14 Material supply device 14a Supply pipe 15 Primary particles 16 Chamber 16a Inner wall 18 Secondary particles 19 Cyclone 19a Inlet pipe 19b Outer cylinder 19c Circular truncated cone portion 19d Coarse particle collection chamber 19e Inner pipe 20 Collection portion 20a Collection chamber 20b Filter 22 Plasma gas supply portion 22c Piping 24 Plasma generation portion 26 Gas supply portion 26c Piping 28 Thermal plasma flame 28b Tail portion 30 Vacuum pump 40 Silver particles 40a, 51a Surface 41 Surface coating 50, 51 Film 52 Substrate 100 Coarse particles Ld Diffuse reflected light Li Incident light Lr Specular reflected light Ls Internally scattered light
Claims (4)
正反射光値が10以上である、銀微粒子。 The BET specific surface area is 10 m 2 /g or more,
Silver particles having a specular reflection value of 10 or more.
前記銀の粉末を、熱プラズマ炎中に供給し、前記熱プラズマ炎に冷却ガスを供給する工程を有し、
前記冷却ガスは、メタンガスと酸素ガスとを含み、前記メタンガスに対する前記酸素ガスの割合である酸素ガス/メタンガスが1~50体積%である、銀微粒子の製造方法。 A method for producing silver microparticles by a thermal plasma method using silver powder, comprising the steps of:
supplying the silver powder into a thermal plasma flame and supplying a cooling gas to the thermal plasma flame;
A method for producing silver microparticles, wherein the cooling gas contains methane gas and oxygen gas, and the ratio of the oxygen gas to the methane gas, oxygen gas/methane gas, is 1 to 50 volume %.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007138287A (en) * | 2005-10-17 | 2007-06-07 | Nisshin Seifun Group Inc | Method for producing ultrafine particles |
| JP2008517147A (en) * | 2004-08-04 | 2008-05-22 | ノバセントリックス コーポレイション | Nanomaterial composition and synthesis of carbon and metal |
| JP2011162842A (en) * | 2010-02-09 | 2011-08-25 | Institute Of Physical & Chemical Research | Apparatus for manufacturing particle, and method for manufacturing the same |
| JP2015078437A (en) * | 2008-12-26 | 2015-04-23 | Dowaエレクトロニクス株式会社 | Fine silver particle powder and method for producing silver paste using the powder |
| WO2019142633A1 (en) * | 2018-01-22 | 2019-07-25 | バンドー化学株式会社 | Composition for bonding |
| WO2019146412A1 (en) * | 2018-01-26 | 2019-08-01 | 日清エンジニアリング株式会社 | Silver fine particle production method and silver fine particles |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008517147A (en) * | 2004-08-04 | 2008-05-22 | ノバセントリックス コーポレイション | Nanomaterial composition and synthesis of carbon and metal |
| JP2007138287A (en) * | 2005-10-17 | 2007-06-07 | Nisshin Seifun Group Inc | Method for producing ultrafine particles |
| JP2015078437A (en) * | 2008-12-26 | 2015-04-23 | Dowaエレクトロニクス株式会社 | Fine silver particle powder and method for producing silver paste using the powder |
| JP2011162842A (en) * | 2010-02-09 | 2011-08-25 | Institute Of Physical & Chemical Research | Apparatus for manufacturing particle, and method for manufacturing the same |
| WO2019142633A1 (en) * | 2018-01-22 | 2019-07-25 | バンドー化学株式会社 | Composition for bonding |
| WO2019146412A1 (en) * | 2018-01-26 | 2019-08-01 | 日清エンジニアリング株式会社 | Silver fine particle production method and silver fine particles |
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