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AU572005B2 - Semiconductor device with npn and pnp transistors - Google Patents
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AU572005B2 - Semiconductor device with npn and pnp transistors - Google Patents

Semiconductor device with npn and pnp transistors

Info

Publication number
AU572005B2
AU572005B2 AU49315/85A AU4931585A AU572005B2 AU 572005 B2 AU572005 B2 AU 572005B2 AU 49315/85 A AU49315/85 A AU 49315/85A AU 4931585 A AU4931585 A AU 4931585A AU 572005 B2 AU572005 B2 AU 572005B2
Authority
AU
Australia
Prior art keywords
npn
semiconductor device
pnp transistors
pnp
transistors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU49315/85A
Other versions
AU4931585A (en
Inventor
Yoshio Ueki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of AU4931585A publication Critical patent/AU4931585A/en
Application granted granted Critical
Publication of AU572005B2 publication Critical patent/AU572005B2/en
Anticipated expiration legal-status Critical
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/0112Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs
    • H10D84/0114Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs the components including vertical BJTs and lateral BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/02Manufacture or treatment characterised by using material-based technologies
    • H10D84/03Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/63Combinations of vertical and lateral BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/67Complementary BJTs
    • H10D84/673Vertical complementary BJTs
AU49315/85A 1984-11-05 1985-11-04 Semiconductor device with npn and pnp transistors Expired AU572005B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59232870A JPH0638476B2 (en) 1984-11-05 1984-11-05 Semiconductor device
JP59-232870 1984-11-05

Publications (2)

Publication Number Publication Date
AU4931585A AU4931585A (en) 1986-05-15
AU572005B2 true AU572005B2 (en) 1988-04-28

Family

ID=16946115

Family Applications (1)

Application Number Title Priority Date Filing Date
AU49315/85A Expired AU572005B2 (en) 1984-11-05 1985-11-04 Semiconductor device with npn and pnp transistors

Country Status (10)

Country Link
JP (1) JPH0638476B2 (en)
KR (1) KR940005447B1 (en)
CN (1) CN1004845B (en)
AT (1) AT395272B (en)
AU (1) AU572005B2 (en)
CA (1) CA1254671A (en)
DE (1) DE3539208C2 (en)
FR (1) FR2572850B1 (en)
GB (1) GB2167231B (en)
NL (1) NL194711C (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6768183B2 (en) * 2001-04-20 2004-07-27 Denso Corporation Semiconductor device having bipolar transistors

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1520515A (en) * 1967-02-07 1968-04-12 Radiotechnique Coprim Rtc Integrated circuits incorporating transistors of opposite types and methods of making them
JPS5710964A (en) * 1980-06-25 1982-01-20 Fujitsu Ltd Manufacture of semiconductor device
EP0093304B1 (en) * 1982-04-19 1986-01-15 Matsushita Electric Industrial Co., Ltd. Semiconductor ic and method of making the same
JPS58212159A (en) * 1982-06-02 1983-12-09 Matsushita Electric Ind Co Ltd Semiconductor integrated circuit device

Also Published As

Publication number Publication date
FR2572850B1 (en) 1988-09-09
KR940005447B1 (en) 1994-06-18
CN85108134A (en) 1986-07-02
JPS61111575A (en) 1986-05-29
JPH0638476B2 (en) 1994-05-18
DE3539208C2 (en) 1998-04-09
AU4931585A (en) 1986-05-15
GB2167231A (en) 1986-05-21
ATA318985A (en) 1992-03-15
NL194711C (en) 2002-12-03
FR2572850A1 (en) 1986-05-09
GB2167231B (en) 1988-03-02
GB8526749D0 (en) 1985-12-04
CN1004845B (en) 1989-07-19
DE3539208A1 (en) 1986-05-15
NL8503033A (en) 1986-06-02
AT395272B (en) 1992-11-10
KR860004472A (en) 1986-06-23
CA1254671A (en) 1989-05-23
NL194711B (en) 2002-08-01

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