AU616776B2 - Non-chrome cleaner/deoxidizer system - Google Patents
Non-chrome cleaner/deoxidizer system Download PDFInfo
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- AU616776B2 AU616776B2 AU38230/89A AU3823089A AU616776B2 AU 616776 B2 AU616776 B2 AU 616776B2 AU 38230/89 A AU38230/89 A AU 38230/89A AU 3823089 A AU3823089 A AU 3823089A AU 616776 B2 AU616776 B2 AU 616776B2
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- Prior art keywords
- solution
- acidic
- hydrogen peroxide
- aluminum
- cleaning solution
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- Ceased
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- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 48
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 48
- 238000004140 cleaning Methods 0.000 claims abstract description 46
- 238000000034 method Methods 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 6
- 239000000243 solution Substances 0.000 claims description 83
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 51
- 230000002378 acidificating effect Effects 0.000 claims description 24
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 22
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 21
- 238000005530 etching Methods 0.000 claims description 18
- 239000003381 stabilizer Substances 0.000 claims description 15
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 12
- 229910017604 nitric acid Inorganic materials 0.000 claims description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 10
- 239000004094 surface-active agent Substances 0.000 claims description 10
- 239000003929 acidic solution Substances 0.000 claims description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 5
- WQEVDHBJGNOKKO-UHFFFAOYSA-K vanadic acid Chemical compound O[V](O)(O)=O WQEVDHBJGNOKKO-UHFFFAOYSA-K 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 2
- 238000007739 conversion coating Methods 0.000 claims description 2
- DGSDBJMBHCQYGN-UHFFFAOYSA-M sodium;2-ethylhexyl sulfate Chemical compound [Na+].CCCCC(CC)COS([O-])(=O)=O DGSDBJMBHCQYGN-UHFFFAOYSA-M 0.000 claims description 2
- 230000000087 stabilizing effect Effects 0.000 claims 2
- 235000009917 Crataegus X brevipes Nutrition 0.000 claims 1
- 235000013204 Crataegus X haemacarpa Nutrition 0.000 claims 1
- 235000009685 Crataegus X maligna Nutrition 0.000 claims 1
- 235000009444 Crataegus X rubrocarnea Nutrition 0.000 claims 1
- 235000009486 Crataegus bullatus Nutrition 0.000 claims 1
- 235000017181 Crataegus chrysocarpa Nutrition 0.000 claims 1
- 235000009682 Crataegus limnophila Nutrition 0.000 claims 1
- 235000004423 Crataegus monogyna Nutrition 0.000 claims 1
- 240000000171 Crataegus monogyna Species 0.000 claims 1
- 235000002313 Crataegus paludosa Nutrition 0.000 claims 1
- 235000009840 Crataegus x incaedua Nutrition 0.000 claims 1
- GRYLNZFGIOXLOG-DYCDLGHISA-N deuterio nitrate Chemical compound [2H]O[N+]([O-])=O GRYLNZFGIOXLOG-DYCDLGHISA-N 0.000 claims 1
- 210000002837 heart atrium Anatomy 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 10
- 239000002184 metal Substances 0.000 abstract description 10
- 239000002253 acid Substances 0.000 description 15
- 239000000203 mixture Substances 0.000 description 12
- 239000012141 concentrate Substances 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 8
- 238000011282 treatment Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000004532 chromating Methods 0.000 description 7
- 150000002978 peroxides Chemical class 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 150000007513 acids Chemical class 0.000 description 6
- 229910001868 water Inorganic materials 0.000 description 6
- 239000004411 aluminium Substances 0.000 description 5
- 238000007865 diluting Methods 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- 230000007935 neutral effect Effects 0.000 description 5
- 239000007921 spray Substances 0.000 description 5
- 229910000838 Al alloy Inorganic materials 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 2
- -1 aluminum ions Chemical class 0.000 description 2
- 239000002280 amphoteric surfactant Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 description 2
- 235000011180 diphosphates Nutrition 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- AZFNGPAYDKGCRB-XCPIVNJJSA-M [(1s,2s)-2-amino-1,2-diphenylethyl]-(4-methylphenyl)sulfonylazanide;chlororuthenium(1+);1-methyl-4-propan-2-ylbenzene Chemical compound [Ru+]Cl.CC(C)C1=CC=C(C)C=C1.C1=CC(C)=CC=C1S(=O)(=O)[N-][C@@H](C=1C=CC=CC=1)[C@@H](N)C1=CC=CC=C1 AZFNGPAYDKGCRB-XCPIVNJJSA-M 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- FDENMIUNZYEPDD-UHFFFAOYSA-L disodium [2-[4-(10-methylundecyl)-2-sulfonatooxyphenoxy]phenyl] sulfate Chemical compound [Na+].[Na+].CC(C)CCCCCCCCCc1ccc(Oc2ccccc2OS([O-])(=O)=O)c(OS([O-])(=O)=O)c1 FDENMIUNZYEPDD-UHFFFAOYSA-L 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- DWYMPOCYEZONEA-UHFFFAOYSA-N fluorophosphoric acid Chemical compound OP(O)(F)=O DWYMPOCYEZONEA-UHFFFAOYSA-N 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 229960004275 glycolic acid Drugs 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 description 1
- 229910000360 iron(III) sulfate Inorganic materials 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910001463 metal phosphate Inorganic materials 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- UYDLBVPAAFVANX-UHFFFAOYSA-N octylphenoxy polyethoxyethanol Chemical compound CC(C)(C)CC(C)(C)C1=CC=C(OCCOCCOCCOCCO)C=C1 UYDLBVPAAFVANX-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 239000004304 potassium nitrite Substances 0.000 description 1
- 235000010289 potassium nitrite Nutrition 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 1
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Substances [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- SOBHUZYZLFQYFK-UHFFFAOYSA-K trisodium;hydroxy-[[phosphonatomethyl(phosphonomethyl)amino]methyl]phosphinate Chemical compound [Na+].[Na+].[Na+].OP(O)(=O)CN(CP(O)([O-])=O)CP([O-])([O-])=O SOBHUZYZLFQYFK-UHFFFAOYSA-K 0.000 description 1
- GPRLSGONYQIRFK-MNYXATJNSA-N triton Chemical compound [3H+] GPRLSGONYQIRFK-MNYXATJNSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/12—Light metals
- C23G1/125—Light metals aluminium
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Detergent Compositions (AREA)
- Chemical Treatment Of Metals (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Processing Of Solid Wastes (AREA)
- Photoreceptors In Electrophotography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
The invention is a metal treating process which uses a chrome-free deoxidizing bath. The process is useful for cleaning and deoxidizing aluminum substrates.
Description
67 id Form COMMONWEALTH OF AUSTRALIA PATENTS ACT 1952.69 COMPLETE SPECIFICATION
(ORIGINAL)
Class Application Number: Lodged: Int. Class 0.
Complete Specification Lodged: 0 Accepted: o Published: Prio;ity 0 Related Art: 0 0 4 Napie of Applicant: ,.ddress of Applicant 'ActualI nventor: Address for Service: HENKEL CORPORATION 300 Brookside Avenue, Ambler, Pennsylvania 19002, United States of America MARK W. McMILLEN -Watermark Patent Trademark Attorneys 50 QUEEN STREET, MELBOURNE, AUSTRALIA, 3000.
Complete Specification for the invention entitled: NON-CHROME CLEANER/DEOXIDIZER SYSTEM The following statement is a full description of this invention, including the best method of performing it known to US 1.
I
NON-CHROME CLEANER/DEOXIDIZER SYSTEM Field of the Invention This invention relates to a novel process for cleaning and deoxidizing aluminum prior to conversion treatment. The process is based on an acid or alkaline cleaning system and a chromate-free deoxidizer system.
01 0 0 0 0* 00 airr rr, a os c a 0 0 0 0 -1A- *Q T. P 1it? :e Background of the Invention Traditionally, chromated deoxidizers have been used to enable aluminum samples to pass designated corrosion tests, as for example, MIL-C-5541C. The aluminum is first cleaned in a relatively non-etching alkaline soak cleaner, deoxidized in an acidic chromate solution and subsequently chromated.
Alternatively, if etching was desired, an alkaline etch or alkaline chemical milling solution was used. This step was followed by a deoxidation step which usually employed a chromated deoxidizer, to remove "smut" produced by etching.
The aluminum was then chromated. In the past, attempts to replace chromate in the deoxidizing step have generally involved the use of iron salts such as ferric sulfate.
o0 0 However, iron based deoxidizers have never provided results equal to the chromate containing deoxidizer systems.
o 0O U.S. Patent 4,451,304 to Batiuk provides a treatment for S aluminum which employs an alkaline cleaning step and a deoxidizer step. The deoxidizer step employs a non-chromate deoxidizer which is an equeous solution of sodium or potassium nitrite. This patent, which is incorporated herein by reference, includes a detailed discussion of the prior art in this area.
o* Other than in the operating examples and claims, or where oo otherwise indicated, all numbers expressing quantities of 2 ingredients or reaction conditions used herein are to be understood as modified in all instances by the term "about".
o DESCRIPTION OF THE INVENTION 0 The present invention is advantageous in that it S eliminates the use of hexavalent chromium in the cleaning and deoxidizing r and further provides enhanced performance 2 1 over previously disclosed non-chromium processes for the cleaning and deoxidizing of aluminum prior to chemical conversion treatments.
In its broadest aspect the invention provides a process for treating an aluminium article which comprises: cleaning the aluminium article; and deoxidizing the cleaned aluminium article by contact with an acidic deoxidizing solution selected from the group consisting of an acidic, stabilized hydrogen peroxide containing solution; an acidic heteropoly vanadic acid containing solution, and an acidic heteropoly vanadic acid salt containing solution, and conversion coating the deoxidized aluminium article.
In accordance with the present invention, aluminium is cleaned in an aqueous acidic or alkaline solution. The preferred acidulants are acids such as sulfuric acid, nitric acid, hydrofluoric acid, phosphoric acid, citric acid, oxalic acid, acetic acid, gluconic acid, hydroxyacetic acid and the like or mixtures of two or more such acids.
Preferably the acidic solution i' a dilute solution which provides low etching.
p. r 2he alkaline cleaning solutions useful in the present invention generally contain alkali metal hydroxides or other water soluble alkaline materials such as trisodium phosphate, alkali silicates, tetrasodium pyrophosphate and the like.
o 0"0°00 The etchants can also comprise acidic solutions of fluoride compositions such as hydrogen fluoride and fluoride salts, fluoride complexes and the like, such as ammonium bifluoride, fluorosilicic acid, fluorophosphonic acid, its salts, and the like.
3 0 6 0 t 0 *i Following the cleaning step, the aluminum is then immersed in an aqueous acidic deoxidizing solution containing at least one of the following deoxidizing compositions hydrogen peroxide or heteropoly vanadic acids or its salts. Optionally, the aluminum can be rinsed before contact with the deoxidizing solution. The use of a rinse is preferred.
In another embodiment of the invention the aluminum article can be cleaned and deoxidized in a single step by including a deoxidizing agent such as hydrogen peroxide in the acid cleaning solution.
0 0o 0 0 00 0 o a0 a o C 0 o o o a o o 0o0 0 0O 0 1 0 0 0I 0 6 Q0 a QtD« j i i,
I;;
ir
;I
ii
I
IDETAILED DESCRIPTION OF THE INVENTION SIn the description of the invention, the term "aluminum" used in connection with the substrate metal to be treated, includes aluminum metal per se and also those aluminum alloys i 5 which are generally subjected to a cleaning and deoxidizing 'S treatment prior to chromating or other chemical or Selectrochemical conversion treatment.
SAluminum metal per se invariably contains trace impurities of other metals. Exemplary of such impurity metals are 4 10 copper, manganese, nickel, zinc, titanium, vanadium, sodium and gallium.
Aluminum alloys generally contain larger amounts of other metals. Such alloying metals include silicon, chromium, lead, S0o" o iron, copper, magnesium, manganese, zinc and the like.
Such metals in the form of ions as well as aluminum ions invariably are present in the deoxidizer solutions by virtue Booo of the action of such solutions on the metal and smut. It is one aspect of the present invention that the deoxidizer solutions containing stabilizers can continue to function in the presence of such other metal ions, particularly iron, copper and manganese. The multivalent metal ions tend to catalyze the decomposition of the hydrogen peroxide component.
o This is especially true with copper and manganese.
0 In respect to the first step of this invention the 04° aluminum substrate is subjected to cleaning and/or etching preferably with a dilute aqueous acidic solution at a pH of less than 2.
Preferably the pH is below 2 and most preferably below 0o0 1.5. The cleaning solutions generally contain from 0.005% to 5% by volume or 10% by weight of the acids but can contain up 4 to about 50% by weight, and preferably from about .2 to about 8% by weight and more preferably from about 0.4% to about by volume. It is also preferred to employ a mixture of acids such as sulfuric acid and hydrofluoric acid.
While optional, suitable surfactants can be included in the cleaning solutions. They can be used in ar'mnts of from 0% to 5% by weight, and preferably up to about 2% and most preferably up to about 0.5% by weight. Any suitable surfactants which are compatible with the cleaning solution and do not leave an undesirable film on the aluminum's surface can be used. Such surfactants include the cationic, anionic, amphoteric and nonionic surfactants.
"to The cleaning and/or etching step can be done in an Salkaline cleaner etching solution. Known alkaline cleaning solutions which contain alkali metal hydroxide, alkali metal S carbonate, trialkali metal phosphate (such as trisodium o oo phosphate) tetralkali metal pyrophosphate (tetrasodium 0 o° pyrophosphate) alkali metal silicates and the like, alone or in combination can also be used in the cleaning step of the present invention. Alkaline cleaning compositious such as Ridolineg 53, P3 Almecd 18 and Ridoline 322 can be used in 4004 0 the cleaning step.
oo In an alternate embodyment of the invention, an acid cleaning-etching step can be combined with the deoxidizer step 250 ooo by including hydrogen peroxide and a hydrogen peroxide stabilizer with an acid cleaning solution. The combined cleaning and deoxidizing steps can be carried out at a o temperature of from about ambient to about 170 0 F and preferably from about 90°F to about 150 0 F. The pH of the 0 0
F'
I C I- l~ LI l( lll solution is preferably below about 3 and more preferably below about 1.5 and most preferably below about It will be appreciated that the cleaning-etching step can be conducted in a short period of time with substantially little etching or can be continued for a longer period of time if a deeply etched surface is desired.
It will also be appreciated that the cleaning-etching step can be conducted at ambient temperatures but it is preferred to conduct the cleaning step at elevated solution temperatures. Higher temperatures increase the rate of cleaning and/or etch.ng action of the cleaner solution and a certain degree of care must be exercised to ensure that the 0*.o desired degree of cleaning or etch is obtained. The oo ,0 temperature of the cleaning/etching solution is preferably 0 from about 900F to about 1750F and most preferably from about o 100°F to about 150 0
F.
o. In respect to the deoxidizing step, it is preferred that S° the deoxidizer bath be acidic and preferably be below a pH of 4, and more preferably at or below 2. When the heteroploy ions are employed in the deoxidizer bath, they can be added to the bath as such or can be generated in situ from their 0.0' components.
o o* When heteropoly vanadic acid or its salts are used, the deoxidizer comprises from 0.1 gram/liter to the solubility limit of the material and an acid to form a composition having a pH below 3. Generally, mineral acids are used and nitric acid is preferred.
0 When the deoxidizer is hydrogen peroxide, it is preferred *4ooo that the solutions contain from 0.03 to 30% by weight hydrogen peroxide and it is further preferred that one or more
I
P.,
A:-
stabilizers for hydrogen peroxide also be employed in the solution. With respect to hydrogen peroxide deoxidizer solutions, it is also preferable to adjust the pH to about 3 or less and preferably with nitric acid. The pH is preferably not greater than 1.5 and most preferably 0.5 or below. The deoxidizer solution is preferably maintained at a temperature from about ambient to about 150 0 F depending on the time the aluminum article is in contact with the solution.
The aluminum article preferably is in contact with the deoxidizer solution from about 1 to about 25 minutes. The contact time is generally shorter at higher temperatures.
Stabilizers for peroxides are well known and are exemplified in U.S. Patent 4,509,678. This patent is incorporated herein by reference. Other suitable stabilizers for hydrogen peroxide are well known in the art and any of a 00 0 these can be conveniently used provided they are compatible with acidic solutions. A preferred group of stabilizers is Auvstrian Pcrfer A pplica-i- %S'2Z 's o disclosed inU.. tnt Appiction Scrial 5P. 07/221, 06 filed- o July 19, 190 in the name of Mark McMillen and entitled "Stabilization of Peroxide Solutions.
After the deoxidation treatment, the treated aluminum 00 substrate is then chromated by chromating treatments for 00 0 'o0 aluminum, which are well known in the art. Chromating with chromating compositions such Alodine® 1200S or Alodin& 600 2 °Oo product of Parker Amchem a division of Henkel Corporation are useful. The aluminum substrates are preferably rinsed before being treated with the chromating compositions.
o°S° Rinsing is preferred to reduce contaminatin of the chromating 0 composition with the components of the deoxidizing treatment composition.
7 0 P6 'i The examples which follow are intended to illustrate this invention and are not to be considered limiting.
EXAMPLE 1 A cleaning solution was prepared as follows: A. 70 mis of a solution prepared by diluting 323 mis of 96% sulfuric acid with water to one liter.
B: 70 mis of hydrofluoric acid concentrate solution prepared by diluting 214 grams of 70% hydrofluoric acid to one liter. 70 mis A and 70 mis B were mixed and diluted to 7 liters with a mixture of 25% Ambler Borough tap water and 75% deionized water. The mixture of tap water and deionized water had a conductance of 250 micromhos.
&000 S A deoxidizer solution was prepared as follows: 1o o A concentrate was first prepared by blending 3800 mis of 0 0 hydrogen peroxide and 200 mis of Dowfa> 241 (sodium dodecyl 0° 0 diphenyl oxide disulfonate).
1610 mis of the hydrogen peroxide concentrate as prepared above and 475 mis of 70% nitric acid were diluted to 18.9 liters.
Panels of aluminum alloy 2024-T3 were immersed in the S cleaning solution at a temperature of 120 0 F for a period of 4:i ten minutes. The panels were then removed, rinsed with deionized water and immersed in the deoxidizer solution at 2f ambient temperature for 15 minutes. The panels were rinsed and subsequently chromated. The chromated panels successfully passed MIL-C-5541C test for neutral salt spray specifications.
o° The MIL-C-5541C specification and test methods are incorprated herein by reference.
8
I
-EXAMPLE 2 A cleaner solution concentrate was prepared by blending 100 mls of 96% sulfuric acid and 416 m1s of 75% phosphoric acid and diluting to one liter.
A cleaner solution was prepared by mixing 140 mis of cleaner solution and 70 mis of hydrfluoric acid solution concentrate as prepared in Example 1 and diluting to 7 liters.
The deoxidizer solution used in this example was identical to that used in Example 1.
Panels of aluminum alloy, 2024-T3, were immersed in the above cleaning solution at a temperature of 120 0 F for a period of 10 minutes. Thereafter the panels were removed rinsed with water and immersed in the deoxidizer solution at ambient temperatures for a period of 15 minutes. Thereafter, the 1o panels were rinsed and chromated. These panels passed the o 0 0 MIL-C-5541C neutral salt spray specifications.
EXAMPLE 3 00 S° o A cleaner concentrate solution was prepared by blending 256 mis of 96% sulfuric acid, 90 grams of Mirawet B (amphoteric surfactant), 90 grams of Surfonick LF-17 (ethoxylated alcohol) and diluting to one liter with water.
S
0 4 liter cleaning baths were prepared containing 50 mis of S the cleaner concentrate to which varying amounts of hydrofluoric acid were added as shown in Tables I and II.
The amount of hydrofluoric acid added in the baths set forth in Tables I and II and based on the hydrofluoric acid concentrate as prepared in Example 1. In respect to the .17% 0" solutions, 40 milliliters of the hydrofluoric concentrate were o0o0* added. In respect to the .09% solutions, 21 milliliters of the hydrofluoric concentrate were added, and in respect to the 9 }i 0.009%, 2 milliliters of the hydrofluoric acid concentrate were added.
A 4 liter deoxidizer bath was prepared in a manner similar to that of Examples 1 above. The ingredients employed in the deoxidizer baths are set forth in Tables I and II below.
In respect to the baths exemplified in Table 1, it should be noted that reagent grade 70% nitric acid was used and the stabilizer of Table I was Dowfax 2A1 (sodium dodecyl diphenyl oxide disulfonate). Further in respect to the baths of Table I, 10.2 milliliters of the stabilizer were added to obtain the .255% stabilizer concentration and 0.4 milliliters of the stabilizer were added to get the 0.01% stabilizer concentration.
0 In respect to the peroxide, 400 milliliters of 9 0 hydrogen peroxide diluted to one liter with water, were used for the 10% concentrations and 240 milliliters were used for 0 the 6% concentrations.
In respect to the deoxidizer baths of Table II, commercial grade nitric acid at 67.5% was employed and the stabilizer was Monofa 1214 (alkyl phosphate ester). In respect to the o nitric acid, 400 milliliters of the nitric acid were used for the 10% solution, 240 milliliters ofr 6% solutions and milliliters for the 2% solutions. Furthermore in respect to the peroxide, 400 milliliters were used for the 10% solution, 240 milliliters for the 6% solution and 80 milliliters for the 2% solution were employed.
o 04 0 a.
TABLE I CLEANER DEOXIDIZER 96% Sulfuric Acid 0.3% 0.3% 0.3% 0.3% 70% HF 0.17% 0.09% 0.09% 0.09% Surfactant 0.2% 0.2% 0.2% 0.2% pH 35% Stabil- Adj.
Peroxide izer w/HNO Time 6% 0.255% 0.5 10 Min 6% 0.01% 1.0 5 Min 6% 0.255% 0.5 15 Min 10% 0.255% 0.5 10 Min TABLE II a a 0 0a El* f S4 4 ~14 4 0 a @4 a 2ao o a a a a a a 0*0 o a a Ia« 4 S 0
I
96% Sulfuric Acid 0.3% 0.3% 0.3% 0.3% 0.3% 0. 3% 0.3% C. 3%
CLEANER
70% HF 0.17% 0 .09% 0.09% 0.09% 0.09% 0.009% 0.17% 0.17%
DEOXIDIZER
Surfactant 0 .2% 0.2% 0 .2% 0 .2% 0 .2% 0 .2% 0.2% 0 .2% 35% Stabil- 42°Be Peroxide izer HNO Time 6% 0.lg/l 6% 15 Min 10% 2.55g/l 6% 15 Min 10% 2.55g/l 6% 15 Min 10% 2.55g/l 6% 5 Min 6% 2.55g/l 6% 10 Min 2% 5g/l 6% 10 Min 6% 2.55g/l 10% 10 Min 6% 2.55g/l 2% 10 Min Aluminum panels of alloy, 2024-T3, were cleaned in a specified cleaner bath set forth in Table I and Table II above. The panels were then rinsed and immersed in the deoxidizer bath as indicated in Tables I and II above, each o for a specified period of time listed. After the deoxidizing o, step, the panels were removed, rinsed and chromated. The chromated panels were then tested in neutral salt spray for
I,;
336 hours (twice as long as MIL-C-5541C requires). All panels showed no pitting and no corrosion after testing.
It has been found that preferred systems are those wherein the cleaning solution contains 0.3% by volume sulfuric acid I5 0.17% by volume hydrofluoric acid and up to 0.2% by volume sodium 2-ethyl hexyl sulfate surfactant for a strong etch cleea?:r. This cleaner should be used for 5-10 minutes ii at temoe ':ures of from about 110 0 F to about 130 0
F.
I' preferred to then subject the aluminum panels to a deox." ang step for about 10-15 minutes by immersion in a :1 deoxidizing bath of preferrably 8% by volume hydrogen peroxide i 3% by volume (42Be) nitric acid and up to 0.5% of a stabilizer for the peroxide (preferrably MIRATAINE CBS (cocoamidopropyl hydroxy sultaine).
When it is desired to have an etching cleaner with lower etching properties, it is preferred to employ a cleaning I a solution of 0.5% by volume sulfuric acid 1.7% Sphosphoric acid by volume and up to 0.2% of a surfactant combination which is a mixture of Triton N-100 and Surfonic LF-17. This is used at a temperature of from about 110 0 F to about 1400F for 5 to 10 minutes followed by the same deoxidizer step as established above for from about 5 to S minutes.
EXAMPLE 4 5 .A cleaner-etching-deoxidizer bath was prepared containing 8% H 2 0 2.5% HNO 3 1.5% phosphoric acid and 2 ml/liter of Tritorn X-102 surfactant (octylphenoxy polyethoxy ethanol).
Aluminum panels were immersed in the cleaning-etching deoxidizer solution for 10 minutes at 120 0 F. The panels were 0 rinsed and then chromated in an Alodine 1200S chromating 12 1 t i! J i3 solution according to manufacturer's recommendations. The chromated panels were then tested in neutral salt spray for 4 I336 hours. There was no pitting or corrosion of the aluminum panels.
EXAMPLE A cleaner-etching-deoxidizer bath was prepared containing 8% H20, 2.5% HNO3, 1 ml/liter of 79% HBF 4 and 2 ml/liter Triton- X-102 surfactant. Aluminum panels were immersed in the cleaner-etching-deoxidizer solution for 10 minutes at 120OF. The panels were rinsed and then chromated in an AlodindE 1200S solution according to manufacturer's recommendations. The chromated panels were then tested in neutral salt spray for 336 hours. There was no pitting or corrosion of the aluminum panels.
e 0 The combining of the acid cleaning-etch step with the e o deoxidizer step into one treating step is an advance in the 0 art. The combining of two steps into a single step reduces S0* 0 the equipment necessary to provide a commerical process and in addition reduces the processing time for each aluminum piece.
1 0 0 So o 0 00 o oo 0 0 0o 0000 13 w x 1
Claims (15)
1. A process for treating an aluminum article which comprises: cleaning the aluminum article and deoxidizing the cleaned aluminum article by contact with an acidic deoxidizing solution selected from the group consisting of an acidic, stabilized hydrogen peroxide containing solution, an acidic heteropoly vanadic acid containing solution and an acidic heteropoly vanadic acid salt containing solution; and conversion coating the deoxidized aluminum article.
2. A process of Claim 1 wherein the pH of the acidic stabilized hydrogen peroxide solution is at a pH below 3.
3. A process of Claim 1 wherein the aluminum article is cleaned by contact with an alkaline cleaning solution, the aluminum article rinsed and then o contacted with the acidic deoxidizing solution. o 00 o o
4. A process of Claim 3 wherein the cleaning solution is at a temperature of from 90 0 F to 175 0 F.
5. A process of Claim 3 wherein the deoxidizing solution is a stabilized hydrogen peroxide solution 000 'at a temperature of from ambient to 150 0 F and at a o pH below 3. S6. A process of Claim 5 wherein the pH is below 14 "W :I I
8.
9. So 0 o o0 O 00 o*00 B0 0 0 0 o oa 0 o 1 Q o a o e o 0
11. o o a 0 Q C O 0 0 0 0 0 90 0 00aJ0 9 o e :12. 6 e So a A process of Claim 1 wherein the aluminum article is cleaned by contact with an aqueous acidic solution at a pH below 2. A process of Claim 7 wherein the aluminum article, after contact with the acidic cleaning solution, is contacted with a stabilized hydrogen peroxide solution at a pH below A process of Claim 8 wherein the pH of the stabilized hydrogen peroxide deoxidizing solution is below A process of Claim 7 which comprises: a. Contacting an aluminum article with an acidic solution at a temperature of from 90 0 F to 175 0 F, at a pH below 2 for from 1 to minutes to clean the aluminum article; and b. Contacting the cleaned aluminum article with an acidic stabilized hydrogen peroxide solution at a temperature from ambient to 150 0 F for from 1 to 25 minutes. A process of Claim 1 which comprises: Contacting an aluminum article with an acidic cleaning solution containing a deoxidising agent and an etching agent at a temperature of from 90 0 F to 175 0 F for from 2 to 25 minutes, wherein the pH of the solution is below 2. A process of Claim 11 wherein the pH is below
13. A process of Claim 11 wherein the acidic cleaning solution comprises: a. a deoxidizing effective amount of hydrogen peroxide b. a stabilizing amount of stabilizer for the hydrogen peroxide c. a pH adjusting amount of nitric acid d. an etching effective amount of a source of .1 fluoride ion.
14. A process of Claim 11 wherein the acidic cleaning solution comprises: a. a d-oxidizing effective amount of hydrogen peroxide b. a stabilizing amount of a stabilizer for the hydrogen peroxide c. an etching effective amount of phosphoric acid d. a pH adjusting amount of nitric acid.
15. Process of Claim 13 whereip the acidic cleaning solution 0 contains as the deoxidizing agent hydrogen peroxide in a o 0 S; S an amount from 0.03% to 30% by weight hydrogen peroxide.
16. A process of Claim 1 wherein the aluminum is cleaned by contacting with a cleaning solution comprising 0.3% sulfuric acid 0.17% hydrofluoric acid and 0.2% sodium 2-ethyl hexyl sulfate, and wherein the *aluminum substrate is cleaned in this solution for a period of 5 to 10 minutes at a temperature of from 110°F to 130 0 F. J S 16 I L 'A
17. A process of claim 13, wherein the acidic cleaning solution comprises 8% by volume hydrogen peroxide 3% by volume 42 0 Be nitric acid, and wherein the aluminum is immersed in the acidic cleaning solution for a period of from 10 to minutes at ambient temperatures.
18. A process of claim 1, wherein the aluminum is cleaned by contact with a cleaning solution which comprises 0.5% sulfuric acid 1.7% phosphoric acid and up to 0.2% of a surfactant, and the aluminum is treated in this solution for a period of from 5 to 10 minutes at a temperature of 110°F to 140 0 F. '19. An acidic cleaning solution as used in the process of claim 13.
20. An acidic cleaning solution as used in the process of claim 14. DATED this 14th day of August, 1991. ~HENKEL CORPORATION WATERMARK PATENT TRADEMARK ATTORNEYS a e THE ATRIUM a 290 BURWOOD ROAD HAWTHORN VICTORIA 3122 AUSTRALIA it- 17- 0-i (M °J 07;
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US22106588A | 1988-07-19 | 1988-07-19 | |
| US221065 | 1988-07-19 | ||
| US37499289A | 1989-07-07 | 1989-07-07 | |
| US374992 | 1989-07-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| AU3823089A AU3823089A (en) | 1990-01-25 |
| AU616776B2 true AU616776B2 (en) | 1991-11-07 |
Family
ID=26915464
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU38230/89A Ceased AU616776B2 (en) | 1988-07-19 | 1989-07-19 | Non-chrome cleaner/deoxidizer system |
Country Status (9)
| Country | Link |
|---|---|
| EP (1) | EP0351771B1 (en) |
| JP (1) | JPH0277581A (en) |
| AT (1) | ATE127167T1 (en) |
| AU (1) | AU616776B2 (en) |
| BR (1) | BR8903578A (en) |
| CA (1) | CA1319591C (en) |
| DE (1) | DE68924012T2 (en) |
| MX (1) | MX170063B (en) |
| TR (1) | TR28132A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5209816A (en) * | 1992-06-04 | 1993-05-11 | Micron Technology, Inc. | Method of chemical mechanical polishing aluminum containing metal layers and slurry for chemical mechanical polishing |
| US5637252A (en) * | 1996-01-29 | 1997-06-10 | Henkel Corporation | Inhibitor for aqueous liquid deoxidizing composition and process for aluminum, with reduced etching of titanium |
| US7846349B2 (en) | 2004-12-22 | 2010-12-07 | Applied Materials, Inc. | Solution for the selective removal of metal from aluminum substrates |
| US8398779B2 (en) | 2009-03-02 | 2013-03-19 | Applied Materials, Inc. | Non destructive selective deposition removal of non-metallic deposits from aluminum containing substrates |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2100757A (en) * | 1981-06-24 | 1983-01-06 | Amchem Prod | Fluoride-free, low-temperature aluminium-cleaning concentrates and solutions |
| US4459216A (en) * | 1982-05-08 | 1984-07-10 | Mitsubishi Gas Chemical Company, Inc. | Chemical dissolving solution for metals |
| GB2186292A (en) * | 1986-01-21 | 1987-08-12 | Parker Chemical Co | Process for cleaning aluminium |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4451304A (en) * | 1981-05-04 | 1984-05-29 | Walter Batiuk | Method of improving the corrosion resistance of chemical conversion coated aluminum |
-
1989
- 1989-07-18 AT AT89113143T patent/ATE127167T1/en not_active IP Right Cessation
- 1989-07-18 EP EP89113143A patent/EP0351771B1/en not_active Expired - Lifetime
- 1989-07-18 DE DE68924012T patent/DE68924012T2/en not_active Expired - Fee Related
- 1989-07-18 CA CA000605932A patent/CA1319591C/en not_active Expired - Fee Related
- 1989-07-19 JP JP1187239A patent/JPH0277581A/en active Pending
- 1989-07-19 AU AU38230/89A patent/AU616776B2/en not_active Ceased
- 1989-07-19 MX MX016855A patent/MX170063B/en unknown
- 1989-07-19 BR BR898903578A patent/BR8903578A/en not_active IP Right Cessation
- 1989-07-19 TR TR00788/89A patent/TR28132A/en unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2100757A (en) * | 1981-06-24 | 1983-01-06 | Amchem Prod | Fluoride-free, low-temperature aluminium-cleaning concentrates and solutions |
| US4459216A (en) * | 1982-05-08 | 1984-07-10 | Mitsubishi Gas Chemical Company, Inc. | Chemical dissolving solution for metals |
| GB2186292A (en) * | 1986-01-21 | 1987-08-12 | Parker Chemical Co | Process for cleaning aluminium |
Also Published As
| Publication number | Publication date |
|---|---|
| BR8903578A (en) | 1990-04-17 |
| DE68924012D1 (en) | 1995-10-05 |
| JPH0277581A (en) | 1990-03-16 |
| EP0351771B1 (en) | 1995-08-30 |
| AU3823089A (en) | 1990-01-25 |
| MX170063B (en) | 1993-08-05 |
| CA1319591C (en) | 1993-06-29 |
| ATE127167T1 (en) | 1995-09-15 |
| EP0351771A1 (en) | 1990-01-24 |
| TR28132A (en) | 1996-03-01 |
| DE68924012T2 (en) | 1996-05-02 |
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