AU648025B2 - Method for producing dual zone materials by catalyzed halosilylation - Google Patents
Method for producing dual zone materials by catalyzed halosilylation Download PDFInfo
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- AU648025B2 AU648025B2 AU57844/90A AU5784490A AU648025B2 AU 648025 B2 AU648025 B2 AU 648025B2 AU 57844/90 A AU57844/90 A AU 57844/90A AU 5784490 A AU5784490 A AU 5784490A AU 648025 B2 AU648025 B2 AU 648025B2
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- porous
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- halosilane
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- 230000009977 dual effect Effects 0.000 title claims description 49
- 239000000463 material Substances 0.000 title description 52
- 238000004519 manufacturing process Methods 0.000 title description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 78
- 239000011148 porous material Substances 0.000 claims description 41
- 239000000377 silicon dioxide Substances 0.000 claims description 36
- 239000000203 mixture Substances 0.000 claims description 27
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 27
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 20
- 239000000725 suspension Substances 0.000 claims description 19
- 239000003054 catalyst Substances 0.000 claims description 18
- 229910052731 fluorine Inorganic materials 0.000 claims description 17
- 239000002904 solvent Substances 0.000 claims description 14
- -1 fluorine halogen Chemical class 0.000 claims description 9
- 229910052736 halogen Inorganic materials 0.000 claims description 8
- 238000002360 preparation method Methods 0.000 claims description 8
- 239000002879 Lewis base Substances 0.000 claims description 5
- 239000011737 fluorine Substances 0.000 claims description 5
- 150000007527 lewis bases Chemical class 0.000 claims description 5
- 229910044991 metal oxide Inorganic materials 0.000 claims description 5
- 150000002367 halogens Chemical class 0.000 claims description 4
- 229910052752 metalloid Inorganic materials 0.000 claims description 4
- 150000002738 metalloids Chemical class 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 4
- 235000009917 Crataegus X brevipes Nutrition 0.000 claims 1
- 235000013204 Crataegus X haemacarpa Nutrition 0.000 claims 1
- 235000009685 Crataegus X maligna Nutrition 0.000 claims 1
- 235000009444 Crataegus X rubrocarnea Nutrition 0.000 claims 1
- 235000009486 Crataegus bullatus Nutrition 0.000 claims 1
- 235000017181 Crataegus chrysocarpa Nutrition 0.000 claims 1
- 235000009682 Crataegus limnophila Nutrition 0.000 claims 1
- 235000004423 Crataegus monogyna Nutrition 0.000 claims 1
- 240000000171 Crataegus monogyna Species 0.000 claims 1
- 235000002313 Crataegus paludosa Nutrition 0.000 claims 1
- 235000009840 Crataegus x incaedua Nutrition 0.000 claims 1
- 210000002837 heart atrium Anatomy 0.000 claims 1
- 229910000077 silane Inorganic materials 0.000 description 27
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 25
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 24
- 238000006243 chemical reaction Methods 0.000 description 20
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 18
- 238000004458 analytical method Methods 0.000 description 14
- 150000004756 silanes Chemical class 0.000 description 13
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 10
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 10
- 239000003795 chemical substances by application Substances 0.000 description 10
- 238000006884 silylation reaction Methods 0.000 description 9
- 238000005211 surface analysis Methods 0.000 description 9
- DCERHCFNWRGHLK-UHFFFAOYSA-N C[Si](C)C Chemical compound C[Si](C)C DCERHCFNWRGHLK-UHFFFAOYSA-N 0.000 description 8
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 6
- 229910020175 SiOH Inorganic materials 0.000 description 5
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 239000005046 Chlorosilane Substances 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 239000000543 intermediate Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000005051 trimethylchlorosilane Substances 0.000 description 4
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 239000012454 non-polar solvent Substances 0.000 description 3
- 150000001282 organosilanes Chemical class 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 2
- GRKUXCWELVWVMZ-UHFFFAOYSA-N amino acetate Chemical compound CC(=O)ON GRKUXCWELVWVMZ-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 239000000010 aprotic solvent Substances 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229960001760 dimethyl sulfoxide Drugs 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 2
- 150000002431 hydrogen Chemical group 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000000269 nucleophilic effect Effects 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 239000011236 particulate material Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 125000005372 silanol group Chemical group 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000003797 solvolysis reaction Methods 0.000 description 2
- MASDFXZJIDNRTR-UHFFFAOYSA-N 1,3-bis(trimethylsilyl)urea Chemical compound C[Si](C)(C)NC(=O)N[Si](C)(C)C MASDFXZJIDNRTR-UHFFFAOYSA-N 0.000 description 1
- NLPBRTBBFUOESW-UHFFFAOYSA-N 1-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)C(CC)OC(=O)C(C)=C NLPBRTBBFUOESW-UHFFFAOYSA-N 0.000 description 1
- LOSLJXKHQKRRFN-UHFFFAOYSA-N 2-trimethoxysilylethanethiol Chemical compound CO[Si](OC)(OC)CCS LOSLJXKHQKRRFN-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- JJOWIQMPCCUIGA-UHFFFAOYSA-N 4-(Trimethylsilyl)morpholine Chemical compound C[Si](C)(C)N1CCOCC1 JJOWIQMPCCUIGA-UHFFFAOYSA-N 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 101000738322 Homo sapiens Prothymosin alpha Proteins 0.000 description 1
- XCOBLONWWXQEBS-KPKJPENVSA-N N,O-bis(trimethylsilyl)trifluoroacetamide Chemical compound C[Si](C)(C)O\C(C(F)(F)F)=N\[Si](C)(C)C XCOBLONWWXQEBS-KPKJPENVSA-N 0.000 description 1
- JOOMLFKONHCLCJ-UHFFFAOYSA-N N-(trimethylsilyl)diethylamine Chemical compound CCN(CC)[Si](C)(C)C JOOMLFKONHCLCJ-UHFFFAOYSA-N 0.000 description 1
- YKFRUJSEPGHZFJ-UHFFFAOYSA-N N-trimethylsilylimidazole Chemical compound C[Si](C)(C)N1C=CN=C1 YKFRUJSEPGHZFJ-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 102100033632 Tropomyosin alpha-1 chain Human genes 0.000 description 1
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 230000000274 adsorptive effect Effects 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- RLECCBFNWDXKPK-UHFFFAOYSA-N bis(trimethylsilyl)sulfide Chemical compound C[Si](C)(C)S[Si](C)(C)C RLECCBFNWDXKPK-UHFFFAOYSA-N 0.000 description 1
- 238000006664 bond formation reaction Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- BJLJNLUARMMMLW-UHFFFAOYSA-N chloro-(3-chloropropyl)-dimethylsilane Chemical compound C[Si](C)(Cl)CCCCl BJLJNLUARMMMLW-UHFFFAOYSA-N 0.000 description 1
- ITKVLPYNJQOCPW-UHFFFAOYSA-N chloro-(chloromethyl)-dimethylsilane Chemical compound C[Si](C)(Cl)CCl ITKVLPYNJQOCPW-UHFFFAOYSA-N 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical compound [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001941 electron spectroscopy Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QHUOBLDKFGCVCG-UHFFFAOYSA-N n-methyl-n-trimethylsilylacetamide Chemical compound CC(=O)N(C)[Si](C)(C)C QHUOBLDKFGCVCG-UHFFFAOYSA-N 0.000 description 1
- KAHVZNKZQFSBFW-UHFFFAOYSA-N n-methyl-n-trimethylsilylmethanamine Chemical compound CN(C)[Si](C)(C)C KAHVZNKZQFSBFW-UHFFFAOYSA-N 0.000 description 1
- KWYYUUZRACJTAG-UHFFFAOYSA-N n-phenyl-n-trimethylsilylacetamide Chemical compound CC(=O)N([Si](C)(C)C)C1=CC=CC=C1 KWYYUUZRACJTAG-UHFFFAOYSA-N 0.000 description 1
- LWFWUJCJKPUZLV-UHFFFAOYSA-N n-trimethylsilylacetamide Chemical compound CC(=O)N[Si](C)(C)C LWFWUJCJKPUZLV-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000005373 porous glass Substances 0.000 description 1
- 239000003586 protic polar solvent Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 210000002966 serum Anatomy 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 150000004819 silanols Chemical class 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- VUENSYJCBOSTCS-UHFFFAOYSA-N tert-butyl-imidazol-1-yl-dimethylsilane Chemical compound CC(C)(C)[Si](C)(C)N1C=CN=C1 VUENSYJCBOSTCS-UHFFFAOYSA-N 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- WLADIVUISABQHN-UHFFFAOYSA-N trimethyl(piperidin-1-yl)silane Chemical compound C[Si](C)(C)N1CCCCC1 WLADIVUISABQHN-UHFFFAOYSA-N 0.000 description 1
- AAPLIUHOKVUFCC-UHFFFAOYSA-N trimethylsilanol Chemical compound C[Si](C)(C)O AAPLIUHOKVUFCC-UHFFFAOYSA-N 0.000 description 1
- SIOVKLKJSOKLIF-HJWRWDBZSA-N trimethylsilyl (1z)-n-trimethylsilylethanimidate Chemical compound C[Si](C)(C)OC(/C)=N\[Si](C)(C)C SIOVKLKJSOKLIF-HJWRWDBZSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- CWMFRHBXRUITQE-UHFFFAOYSA-N trimethylsilylacetylene Chemical compound C[Si](C)(C)C#C CWMFRHBXRUITQE-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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Description
Form COMMONWEALTH OF AUSTRALIA PATENTS ACT 1952-69 COMPLETE SPECIFICATION
(ORIGINAL)
648 02 Class Int. Class Application Number: Lodged: Complete Specification Lodged: Accepted: Published: Priority Related Art Name of Applicant: Address of Applicant: Atcual Inventor: Address for Service DOW CORNING CORPORATION Midland, State of Michigan, United States of America DWIGHT EDWARD WILLIAMS and THOMAS JOHN TANGNEY WATERMARK PATENT TRADEMARK ATTORNEYS.
LOCKED BAG NO. 5, HAWTHORN, VICTORIA 3122, AUSTRALIA Complete Specification for the invention entitlcd: METHOD FOR PRODUCING DUAL ZONE MATERIALS BY CATALYZED HALOSILYLATION The following statement is a full description of this invention, including the best method of performing it knowni to METHOD FOR PRODUCING DUAL ZONE MATERIALS BY CATALYZED HALOSILYLATION The present invention relates to a method for producing dual zone porous materials having an external zone bearing silyl groups of a first type immobilized on the external surfaces of the porous material and internal zone having silyl groups of a second type immobilized on the internal surfaces of the porous material and the dual zone materials so produced. More particularly, it relates to a method for catalyzed halosilylation of predominantly the external surfaces of a porous hydroxyl-bearing support and production of a dual zone material.
In US Patent Nos. 4782040 and 5110784 there are disclosed dual surface (more properly termed dual zone) porous materials made by treating a porous hydroxyl-bearing support, such as porous silica, alumina, zirconia, etc., with substoichiometric amounts of an ultrafast silylating agent. This agent is chosen from those which are so reactive that the resulting surface group is immobilized in the external zone of the porous support before the agent has had time to migrate deeply into the porous internal zone. A subsequent silylation reaction can be employed to convert residual hydroxyl groups, which reside predominantly in the internal zone, to a second immobilized group of another 20 type. See also, Williams Tangney, Silanes. Sur f aces Interfaces. D. E.
Leyden, ed., Gordon Breach Publisher, 1986, P. 471 ff.
In US Patent No. 4782040, the disclosed ultrafast silylating agents are reactive silane intermediates. In Patent No. 5110784 the ultrafast silylating agents are silanes having "leaving groups" such as i) substituted amides, ii) 25 substituted amines or iii) thioethers. It is believed that these facile leaving groups lower the activation energy required for reaction with surface hydroxyl groups se and thus enhance the extent to which the silane can be captured by covalent bond formation in the external zone of the porous material, that is, captured early during its diffusion path into said material.
As stated in US Patent Nos. 4782040 and 5110784, traditional silylation reactions are generally not fast enough to permit preferential silylation of the external surface of the porous support. "Traditional silylation" is described i
I
2 in Plueddemann, Encyclopaedia of Chemical Technology. 3rd ed., Vol. 20, page 962 et seq. Plueddemnn states that silylation is the displacement of active hydrogen from an organic molecule by silyl groups where "The active hydrogen is usually OH, NH or SH and the silylating agent is usually a trimethylsilyl halide or a nitrogen-functional compound. A mixture of silylating agents may be used; a mixture of trimethychlorosilane and hexamethyldisilazane is more reactive than either reagent alone and the by-products combine to form neutral ammonium chloride." Halosilanes, in particular, have been tried, but have been found to be insufficient to produce dual zone porous materials. For example, M. L.
Hunnicutt and J. M. Harris in "Reactivity of Organosilane Reagents on Microparticulate Silica," Anal. Ch.m, Vol. 58, 1986, pp. 748-752 discuss the use of halosilanes in an attempt to demonstrate pore diffusion control of silica silylation. Hunnicutt and Harris discuss the results of competitive surface reactions between binary organosilane mixtures and silica gel. The organosilane mixtures used include mixtures of two haloalkylsilanes such as Ve o
CC
*le *o~ *oo -3- (l-bromomethyl)dimethylmonochlorosilane, (l-chloromethyl)dimethylmonochlorosilane or (3-chloropropyl)dimethylmonochlorosilane, as well as mixtures of a haloalkylsilane with an alkylsilane such as trimethylchlorosilane (TMCS) or hexamethyldisilazane (HMDS). In a number of instances a catalyst such as pyridine was added to the silica slurry prior to silane addition for base catalyzed reactions. Hunnicutt and Harris showed that their reaction did not display pore diffusion control. Thus they could not have produced dual zone materials (DZMs) with respect to differential distribution of their chosen immobilized groups.
This outcome is believed to be due to several factors. Most importantly, mixtures of chlorosilanes of the type used by Hunnicutt and Harris do not react with sufficient speed and o. differentiality even when the reaction is catalyzed with pyridine.
Furthermore, the reaction conditions were not adjusted so as to produce DZMs even from the point of view of selective capture of both chlorosilanes together in the external zone. Firstly, the solvent they used was chloroform which is higly polar and is known to be a proton donor in hydrogen-bonded complexes. Such solvents have been found to reduce pore diffusion control, probably by sequestering the surface reactive sites (silanol) and thus slowing down the reaction rate. Protic solvents such as ethanol are even moi:e deleterious since the halosilane is solvolyzed and transformed into the less reactive ethoxysilane. Secondly, Hunnicutt and Harris used excessive amounts of silane averaging 36 molecules/nM 2 of silica surface, which would saturate the silica and thus afford a uniformly saturated surface treatment rather than a dual zone structure.
Thirdly, the rate of silqne addition to the silica slurry was excessively fast at about 0.3 molecules/nM2/minute.
Accordingly, individual silica particles would be subjected to unusual doses of silane and the resultant particle-toparticle heterogeneity would overcome any intraparticle inhomogeneity (dual zone structure) that might otherwise occur. Accordingly, even though Hunnicutt and Harris conducted what could be described as a catalyzed halosilane reaction, Hunnicutt and Harris do not teach one of ordinary skill in the art how to produce dual zone materials by means of uch reaction mechanisms.
And yet, it is known to be desirable to produce dual zone porous materials having silyl groups of one type predominantly on the external surface and silyl groups of another type predominantly on the internal surface in order to provide on the external and internal surfaces differentially selective adsorbents, for example, for Sspecific chromatographic and catalytic applications. It would also be desirable to do so with halosilane reactants which are relatively inexpensive and readily available. To date, however, it has not been possible to use halosilane reactants for this purpose.
Accordingly, the need remains for a method for halosilylation of predominantly the external surfaces of a porous hydroxyl-bearing support in the production of dual zone porous materials.
The present invention meets that need by providing a method for production of dual zone materials by use of catalyzed halosilanes. The preferred halosilanes used in the present invention have silyl groups of a first type which, following the catalyzed silylation, will form silyl groups of 6* a first type predominantly on the external surfaces of a porous support. Thus the preferred halosilanes bear at least one organic or organofunctional group, such as perfluorobutylethylenedimethylsilyl, chloropropylsilyl, SiC 3
H
6 0(CH CH20)aR wherein is 0-10 and R is alkyl, aryl or acetyl and CH CH-CH 2 0 0
C
Me 2 wherein Me is methyl. Preferred are silyl groups having the formula Me3mC2H 4C X2n+ wherein X is a halogen, n is 1 or more, Me is methyl and m is 1-3.
The halosilane also has a one or more leaving groups attached to the silicon, at least one of the leaving groups being a non-fluorine halogen group, a chloride, bromide or iodide, which when catalyzed reacts with the hydroxyl groups on the external surfaces of the porous support. Mixed leaving groups in which at least one is a oo non-fluorine halogen and the others are slow leaving groups S such as alkoxy or acetoxy are also suitable.
Thus, the preferred halosilane has the formula LmMe 3 -SiC H C Xn wherein L is a non-fluorine halogen, Me is methyl, X is a halogen which may be the same as or different than L, i is 1 or more and m is 1-3. The halosilane may be applied in a solvent based mixture.
The halosilane mixture is added to a porous support suspension formed by mixing the porous support, such as a porous metalloid oxide, a porous metallic oxide or mixtures thereof (preferably in particulate form and most preferably particulate silica) with a solvent. The preferred solvent is an aprotic solvent which will not solvolyze the halosilane.
Most preferred are non-polar solvents such as hexane, octane, decane, toluene or mixtures thereof since such non-polar solvents will not retard the reaction rate due to their minimal interaction with the surface reactive sites. The porous support suspension also preferably contains the catalyst. The catalyst is a lewis base catalyst, preferably a basic amine such as pyridine, imidazole or ammonia.
Nucleophilic agents known to strongly promote silane solvolysis such as hexamethylphosphoramide or dimethylsulfoxide (DMSO) are also effective.
As a result of contacting the hydroxyl bearing porous support suspension containing a catalyst with the halosilane, silyl groups of the first type are formed predominantly on the external surfaces of the porous support.
This alone is sufficient to create a dual zone material if silica is used as the porous support and to the extent that silanol groups remain unreacted in the internal zone.
Preferably, however, the porous support is subsequently contacted with a second silane having silyl groups of a second type (different from those of the first type).
e That silane should be one capable of diffusing into the interior of the porous support and forming covalent bonds by reacting with the hydroxyl groups on the porous support to form silyl groups of the second type on the internal surfaces of the porous support.
Preferred is a second silane having the formula
R
4 -eSiX wherein R is independently selected from hydrogen, alkyl groups having 1 to 20 carbon atoms, phenyl, vinyl and allyl; X is a hydrolyzable radical selected from chlorine, alkoxy having 1 to 4 carbon atoms, acetoxy, amine and amido radicals; and e has a value of 1, 2 or 3. Other organofunctional silanes may also be used. Most preferred is uncatalyzed trimethylchlorosilane.
When a second silane having silyls of a second type is subsequently brought into contact with the porous support, it, then, reacts predominantly with the hydroxyl groups on the internal surfaces of the porous support. This is because the majority of the hydroxyl groups on the external surfaces have already been consumed by the catalyzed halosilylation.
-7- While some reaction with hydroxyl groups which remain on the external surfaces may take place, the catalyzed halosilylation route offers a good quality dual zone material in that the external zone contains predominantly silyl groups of the first type while the internal zone contains predominantly silyl groups of the second type.
Actually, the amount of surface area of the porous support which is considered to be in the external zone versus the amount considered to be in the internal zone may vary.
Preferred for purposes of this invention is the situation where the internal zone approximately comprises the internal percent of the surface area and the external zone approximately comprises the external 10 percent of the 09** surface area of the porous material. Use of a larger amount e of halosilane will result in a greater degree of penetration into the interior of the porous support, will cause reaction with a greater number of hydroxyl groups on the surfaces of the porous support and will create a larger external zone occupying a greater percentage of the surface area of the porous support. Thus, the external zone may range from to 50% of the surface area and the internal zone may range from 50-99.5% of the surface area.
In any event, it is possible to control the degree of catalyzed halosilylation so that the size of the external zone is controlled. This enables one to produce dual zone materials having varying degrees of capacity for separation, such as for use as packing materials in liquid chromatography or otherwise.
Accordingly, it is an object of the present invention to provide an improved method for production of dual zone porous materials by use of catalyzed halosilylation and to provide dual zone materials produced by that method.
Other objects and advantages of the invention will become -8apparent from the following detailed description and the appended claims.
The porous materials found useful in this invention are those materials which are porous solids having hydroxyl groups on their surfaces. Such materials, for example, are silica, silica gel, alumina, stannia, titania, zirconia and the like. Also, these materials can be porous glass, porous ceramic or plastic as long as the material has, or will form, hydroxyl groups on its surface.
The form of the porous material is not overly critical. Particulate porous materials, as well as filaments, slabs, discs, blocks, spheres, films and other such forms can be used in this invention. Also contemplated 0499 within the scope of this invention is the treatment of particulate materials by the process of this invention and the subsequent forming of the treated particulate materials into slabs, discs, blocks, spheres, films, membranes, sheets and the like.
Preferred for this invention are the porous metalloid oxides, metallic oxides and mixtures thereof such as silica, alumina, zirconia and titania in all of their related forms. Most preferred are particulate silicas which may vary in pore diameter from 50 to 2000 angstroms and in particle size from 3 to 1000 micro-meters, for example.
As mentioned, the first step in the production of the dual zone porous material of the present invention is forming a suspension of the porous support in a solvent. The solvent is preferably an aprotic solvent and most preferably a non-polar solvent, for example, hexane, octane, decane, toluene or mixtures thereof. Preferably, porous silica particles having a particle size of from 3 to 1000 micro-meters are mixed with the solvent in the amount of 0.1% to 40 w/v%.
r 9 As also mentioned the lewis base catalyst may be added at this stage. The catalyst may be an amine like pyridine or ammonia; although, imidazole is the preferred catalyst. Nucleophilic agents that are known to form complexes with halosilane under some conditions, such as hexamethylphosphoramide, as well as others that are known to strongly promote silane solvolysis, such as dimethyl-sulfoxide, are also useable.
The amount of catalyst to be used must be at least 0.05 molecules/nM 2 of silica surface. The preferred amount of catalyst used is .2 to 4.8 m/nM2.
To the porous support suspension there is next added a halosilane, which is preferably in a solvent based mixture, preferably using the same solvent as that used in the porous support suspension. The halosilane is one having silyl groups of a first type. The preferred halosilane has the formula LmMe3.mSiC2H4CnX2n+l, wherein L is a non-fluorine halogen, Me is methyl, X is a halogen which may be the same as or different than L, n is 1 or more and m is 1-3. Most preferred is C 4 F9C 2
H
4 SiMe 2 CI, i.e. fluoroalkylsilane containing C 4
H
9 although, CF 3
C
2 Fs, C 3
F
7 etc. could also be used.
Fluoroalkylsilanes are most preferred in that they can be used to produce a dual zone porous material having fluoroalkylsilyl groups in the 20 external zone. The fluoroalkylsilyl groups serve as a lipophobic phase which is less adsorptive to proteinaceous substances when the dual zone porous S material is used as a reverse phase packing material for high-pressure liquid chromatographic blood serum analysis as disclosed in US Patent No. 4778600 :filed June 17, 1987.
25 The halosilane may be used in an amount varying from 0.01 to m/nM2 and preferably the porous support is
CC..
*ee contacted with 0.2 m/nM 2 of halosilane, i.e. 0.2 molecules of halosilane per square nanometer of surface area of the porous support.
The catalyzed halosilylation can be carried out in a period of time of from 1 minute to 24 hou-s. Generally, for purposes of this invention, it is preferred to carry out the catalyzed halosilylation over abuut a 30 minute to 6 hour time period to ensure that the external surface of the porous material is uniformly treated.
The temperature at which the catalyzed halosilylation is carried out is not narrowly critical and can range from 0 C. to 400 0 C. Preferred is a room SI* temperature to 200 0 C. reaction mixture temperature.
Generally, the external zone can be the exterior 0.5% to 50% of the surface area of the porous support.
However, there are often minor differences between the external and the average surface composition due to random scatter in analytical results. Furthermore, real differences between two compositions must be large enough to significantly affect properties of the material. In view of these c-nsiderations, meaningful dual zone character is 's attained only when either of the following conditions are met: o r 1 t 1.5, r 1 0.3 molecules/nM 2 S and r2 0.1 molecules/nM 2 Sr 1 (A) 0 r 1 1.5, ri 15% of saturation of the surface of the porous material; and r2 2 5% of saturation of the r surface of the porous material -11wherein r(E) is the external surface density in Molecules/nM 2 as inferred by Electron Spectroscopy Chemical Analysis and wherei.n rl and r 2 are like measurements of average surface density as measured by bulk analysis and wherein subscripts 1 and 2 refer to the groups immobilized in reaction first with the catalyzed halosilane and, then, with the second silane respectively.
Concentration is expressed in appropriate units such as molecules per square nanometers (m/nM 6 X r 1 106 1 010S "lOS 00 0 R r °o(A) R°o(A) o R 1 A A r o" where X1 is the amount of some group (labeled 1) as measured S.0. in moles per gram of silica by bulk elemental analysis, S is the specific surface area expressed in square meters per gram of silica and R 1 is the ESCA-measured ratio of the surface atomic composition of element j, Aj, to that of element r, Ar. Element j is chosen to be unique to group 1 and element r is chosen to come primarily from the porous substrate.
Silicon was chosen as the reference element, r, since the contribution to ASi by the immobilized silane is relatively small. The analogous quantities, r o 1 and RO 1 are found by measurements on a silica possessing immobilized group #1 th& does not have a compositional gr Aient. Such -12materials are easily prepared by exhaustive treatment with a single silylating agent.
Also included within the scope of this invention are the compositions which are intermediates. These compositions consist of a porous material having reacted to its exterior surface, immobilized silicon containing groups and whose porous interior surface contains hydroxyls. The supra quantitative conditions and are modified in the intermediates by dropping the requirements that r 2 2 0.1 or of saturation.
These intermediates are useful products for the method disclosed supra for providing dual zone materials using reactive silanes to treat the interior pore surfaces.
Thus, while with a silica porous support it is possible to consider the unreacted silanols provided naturally on the internal surfaces as an internal zone, preferably silyl groups of a second type are formed by contacting the porous support having silyl groups of the first type predominantly on the external surfces with a silane which has silyl groups of the second type and which is capable of diffusing into the interior of the porous support.
The object of this preferred step is to permit the diffusion of the second silane into the pores of the porous support and to allow reaction of this silane with the hydroxyl groups that are covalently bonded to the internal surfaces. If water has been added during this reaction step, it may actually be the silanol-bearing hydrolysis product of the silane which reacts with the internal zone hydroxyl groups. Since the accessible external zone hydroxyls of the porous material have been effectively removed by the catalyzed halosilylation the second silane does not have available to it accessible reactive sites on the external surfaces of the porous support. Thus the second silane has only the hydroxyls remaining on the internal surfaces of the porous support available for reaction.
Therefore, this step must be carried out for a sufficient period of time to allow for the diffusion of the second silane having silyl groups of a second type into the pores and reaction of the second silane with the internal zone hydroxyl groups therein (or hydrolysis of the silane and then diffusion of the hydrolyzate into the pore to react).
This step can be carried out for a period of time of from several minutes to several hours. Preferred for this invention is a reaction time for this step of from 10 minutes to 24 hours. Most preferred is a time of 1 to 6 hours.
The temperature at which this step is carried out is not narrowly critical. As one would expect, increased temperatures enhance the rate of reaction. Increasing the temperature does not appear to promote too many undesirable side reactions. Thus, the temperature used in this step can range from 0°C to 4000C. Most preferred is the reflux temperature of the reaction at about 70°C to 1200C.
The amount of second silane having silyl groups of the second type useful in this invention depends on how many of the surface hydroxyls of the pore interior one wishes to treat. An excess of the second silane may be 20 used as this silane does not displace any of the external surface groups obtaiind by the catalyzed halosilylation.
The reactive silanes useful in this step are those kinds of silanes which are recognized as conventional silylation reagents. Thus, the second S silane may be any of the reactive silanes used in step III of US Patent No.
25 5110784. Preferred as a second silane are sitanes such as those having the general formula R 4 .eSiXe wherein R is independently selected from hydrogen, alkyl groups having 1 to 20 carbon atoms, phenyl, -14vinyl and allyl; x is a hydrolyzable radical selected from chlorine, alkoxy having 1 to 4 carbon atoms, acetoxy, amine and amido radicals; and e has a value of 1, 2 or 3. Other organofunctional silanes may also be ised.
Specific silanes which are useful herein include: trimethylchlorosilane; dimethyldichlorosilane; hexamethyldisilazane; N,N'-bis(trimethylsilyl)urea; N-trimethylsilyldiethylamine; N-trimethylsilylimidazole; N,O-bis(trimethylsilyl)acetamide; N,O-bis(trimethylsilyl)trifluoroacetamide); N-methyl-N-trimethylsilyltri-fluoroaceta~ide; t-butyldimethylsilylimidazole; N-trimethylsilylacetamide; N-trimethylsilylpiperidine; hexamethyldisilthiane; 0-trimethylsilylacetate; 0-trimethylsilyltrifluoroacetate; N-trimethylsilyldimethylamine; N-trimethylsilylmorpholine; N-trimethylsilyl- ~.,.pyrrolidine; and N-trimethylsilylacetanilide.
*o Yet another aspect uf this invention is the use in this step of organofunctional silanes to silylate the porous material. Such silanes useful in this invention include, for example, (alpha-methacryloxypropyl)trimethoxysilane; (4-!aiinopropyl)triethoxysilane; gamma-(beta-aminoethylazino)-propylltrimethoxysilane; (gamma-glycidoxypropyl)trimethoxysilane; beta-(3,4-epoxycyclohexyl)-ethylltrimethoxyslane; (beta-mercaptoethyl) trimethoxysilane; (gammamercaptopropyl) trimethoxysilane; (gamma-chioropropyl) trimethoxysilane; *S CH 2 =CHC 6 H 4 CH 2 NH(CH 2 2 N1(CH 2 3 Si(OCH 3 3 'IHCl; *e 0 0:
(CH
3 O0) 3 Si(CH 2 3 N(CH 3 2 C 18 H 37
C
(CH 3 3 Si(CH 2 3
N(CH
3 2 Cl 2
H
25
C'
(CH
3
O)
3 Si( CH 2 3
NCH
3
(C,
2 1 2 2 Cl; OH N 3 Si(CH 2 3 3 Si(CH 2 9
CH
3 (CH30)3Si(CH 2 19
CH
3 and the like. These silanes will impart a variety of useful chemical properties to the internal zone which can be usefully combined with valuable transport properties of the external zone groups.
For example, the external groups may enhance the ion selectively of chelating groups covalently bonded to the interior surface.
When it is determined that the reaction in this step is essentially finished, the product is typically isolated from the restion mixture. Thus, the final step of this process is the isolation of such products from the reaction mixture. This can be accomplished in a number of ways. For example, the liquid can be decanted, the porous material washed and the liquid decanted successively, or the reaction mixture can be filtered to remove the liquid from the solid product. The final product can be used in this form or it can be dried. If the final product is other than e. ~particulate in form it can be used as is or it can be further shaped and formed without losing beneficial properties. If the material is in a particulate form it can be used as is or it can be compressed, sintered or otherwise formed.
So that those skilled in the art may appreciate and understand the invention described herein, the following examples are offered for illustration purposes only. The examples should not be costrued as limiting the invention as defined in the claims.
Six examples of this new route to dual zone materials are given. Three examples of the failure of "uncatalyzed" chlotosilanes to afford dual zone materials are given. Two different porous silicas were used: 1) Daker #3405-1 chromatographic grade, 60-200 mesh, 60 oA pore -16diameter, 300 M 2 /g specific surface area and 2) Amicon #84224, 20 micrometer particles, 250 °A pore diameter, 320
M
2 /g specific surface area.
Example 1: Preparation of C 4 F C 2
H
4 Me 2 Si/SiOH dual zone material 1.00g (1.2 x 10 3 eq. OH 2.4 OH/nM 2 of dried Baker silica (vacuum oven/180°C./16 hours) and 1000cc octane along with 0.017g (2.5 x 104 eq. or 0.5 molecules/nanometer m/nM2) of imidazole were added to a 500 cc indented roundbottomed flask equipped with an air-motor driven paddle, an addition funnel and a condenser topped with a N 2 sweep. This mixture was stirred 10 minutes and heated to solvent reflux w'e at 1250C. to produce a silica suspension. Then a freshly prepared solution of 0.034g (1.0 x 10 eq. or 0.20 m/nM 2 of S. C 4
FC
2
H
4 Me 2 SiCl (PFBCl) in 30cc octane was added over minutes with vigorous stirring. The reaction mixture was then refluxed 45 minutes without stirring. After cooling, the silica was isolated by filtration and washed three times with octane and three times with diethyl ether. Finally, the treated silica was dried in a vaccum oven at 800C. for 3 hours prior to analysis or further work.
Bulk analysis gave a value of 1.04 wt% F, corresponding to an average surface concentration of 0.12 m/nM of PFB. External surface analysis by ESCA gave a value of 0.54F/Si, corresponding to a, concentration at the external S surface of 0.75 m/nM 2 of PFB. Thus this material meets modified condition for a dual zone material, Bulk analytical values were converted to average surface concentrations using a value of 300 M2/g for the specific surface area of the silica. Calculation of the external surface concentration was made using reference values of 1.11 F/Si (ESCA) and 10.74 wt.% F. These reference values were obtained for Baker silica that had been thoroughly treated with an excess of the N-methylacetamide -17derivative of the above chlorosilane to ensure that no compositional gradient was present.
Example 2: Preparation of a PFB/TMS dual zone material 0.35g of the silica treated as in Example 1 and 100 cc octane were added to a 200cc round-bottomed flask equipped with a condenser topped with a N 2 sweep. The slurry was swirled 1 minute and 0.13cc (8.4 x 10 4 eq. or twice eq. OH) of N-methyl-N-trimethylsilylacetamide (TMSA) was added and the flask was heated to reflux for 2 hours. After cooling, the treated silica was isolated, washed and dried as above.
Bulk analysis gave values of 1.04 wt% F and 4.26 wt% C, corresponding to average surface concentrations of &to 2 2 0.13 m/nM of PFB and 2.25 m/nM of TMS (trimethylsilyl).
External surface analysis by ESCA gave a value of 0.49 F/Si, corresponding to 0.69 m/nM of PFB. Thus this material meets condition for a dual zone material.
Example 3: Preparation of PFB/SiOH dual zone material The same procedure as in Example 1 was used with one exception: 20.3 mR of pyridine (0.5 m/ni replaced the imidazole.
Bulk analysis gave a value of 1.38 wt% F, corresponding to an average surface concen' n of 0.17 m/nM of PFB. External surface analysis g. value of 0.23 2 F/Si, corresponding to 0.32 m/nM 2 Thus the material met modified condition for a dual zone material.
Example 4: Failure to prepare PFB/SiOH dual zone material The same procedure as in Example 1 was used but the imidazole catalyst was omitted.
Bulk analysis gave a value of 0.29 wt% F, corresponding to an average surface concentration of 0.035 m/nM2 of PFB. External surface analysis gave a value of 0.057 F/Si, corresponding to 0.08 m/nM 2 Thus, this material -18met none of the conditions or modified conditions or (b) and should not be considered a dual zone material.
Example 5: Preparation of PFB/SiOH dual zone material The same procedure as in Example 1 was used with the following exceptions: 1.00g (1.3 x 10 3 eq. OH 2.4 OH/nM 2 of similarly dried Amicon silica was used which had been twice-refluxed in dilute nitric acid followed by exhaustive washings with distilled water to remove initial catalytic activity of this particular silica. (The activity was relative to disiloxane formation from trimethylsilanol and may have had no effect on -4 surface silylation kinetics). 0.018g (2.7 x 10 eq. or m/nM 2 of imidazole and 0.036g (1.1 x 10 4 eq. or 0.2 n/nM 2 of PFBC1 was used.
Bulk analysis gave a value of 1.58 wt% F, corresponding to 0.18 m/nM average surface concentration of PFB. External surface analysis by ESCA gave a value of 0.39 F/Si, corresponding to 0.60 m/nm 2 of PFB. Thus this material meets modified condition for a dual zone material.
Bulk analytical values were converted to average surface concentrations using a value of 320 m /g for the specific surface area of this particular silica. Calculation ee* of the external surface concentration was made using reference values of 1.21 F/Si (ESCA) and 12.86 wt% F. The.e reference values were obtained for Amicon silica that had been thoroughly treated with excess of N-methylacetamide derivative of the above chlorosilane to ensure that no compositional gradient was present. Conversions in Examples 6 and 7 were done in the same way.
Example 6: Preparation of PFB/TMS dual zone material 0.35 g of the above treated silica of Example 5 was treated with 0.14cc of TLSA (8.9 x 10 4 eq.or twice eq. OH), -19isolated, washed and dried as in the procedure given for Example 2.
Bulk analysis gave values of 1.47 wt% F and 4.69 wt% C, corresponding to average surface concentrations of 0.17 m/nM 2 of PFB and 2.28 n/nM 2 of TMS. External surface analysis by ESCA gave a value of 0.37 F/Si, corresponding to 0.56 m/nM 2 of PFB. Thus the material met modified condition for a dual zone material.
Example 7: Failure to prepare a PFB/SiOH dual zone material The procedure of Example 5 was repeated in the absence of aii intentionally added catalyst.
Bulk analysis gave a value of 0.56 wt% F, Scorresponding to an average surface concentration of 0.06 2 m/nM of PFB. External surface analysis by ESCA gave a value of 0.07 F/Si, corresponding to 0.11 m/nM of PFB. Thus the material met none of the conditions or modified conditions and and should not be considered a dual zone material.
Example 8: Preparation of a CF 3 CH2CH 2 Me 2 SI/TMS dual zone material 1.00g (1.2 x 10 eq. OH 2.4 OH/nM 2 of Baker silica dried at 180 0 C./16 hours under vacuum and 100cc of hexane along with 0.017g (2.5 x 10 4 eq. or 0.5 m/nM 2 of imidazole were added to a 500cc indented round-bottomed flask equipped with an air motor-driven paddle, an addition funnel and a condenser topped with a N 2 sweep. This mixture was stirred 10 minutes and heated to reflux at 69 0 C. During *0 reflux, a freshly prepared solution of 16.9 ul (or 0.2 m/nM of CF 3
CH
2
CH
2 Me 2 SiCl denoted TFSC1 in 15cc of hexane was added over 5 minutes and subsequently stirred for 1 minute.
Then 0.18cc (2.6 m/nM 2 of TMSC1 in 15cc of hexane was added to the mixture and refluxed for two hours without stirring.
Solids were removed from the cooled mixture via filtration, washed twice with hexane, 50/50 acetonitrile/water to remove salts, acetonitrile and finally diethyl ether. Treated silica was vacuum-oven dried for 3 hours 80 0 C. and submitted for analysis.
Bulk analysis gave values of 0.30 wt% F and 2.66 wt% C, corresponding to average surface concentrations of 0.11 m/nM 2 of TFS and 1.38 m/nM 2 of TMS. External surface analysis by ESCA gave a value of 0.161 F/Si, corresponding to 0.64 m/nM 2 of TFS. Thus this material met condition for a dual zone material.
Bulk analytical values were converted to average surface concentrations using a value of 300 M /g for the specific surface area of the Baker silica. Calculation of the external surface concentration was made using reference S values of 0.412 F/Si (ESCA) and 4.10 wt% F. These reference values were obtained for Baker silica which had been thoroughly treated three times with an excess of TFSA at room temperature to ensure that no compositional gradient was present. Conversion in Example 9 was done in this same way.
Example 9: Failure to prepare a TFS/TMS dual zone material The attempted preparation followed the procedure given in Example 8, with the exception that no catalyst (imidazole) was added.
Bulk analysis gave 0.11 wt% F and 0.60 wt% C, corresponding to average surface concentrations of 0.039 m/nM 2 of TFS and 0.27 m/nM 2 of TMS. External surface analysis by ESCA gave a value of 0.016 F/Si, corresponding to 0.064 m/nM 2 of TFS. Thus this material failed to meet conditions or modified conditions or and should not be considered to be a dual zone material.
Having described the invention in detail and by reference to the preferred embodiment thereof, it will be apparent that modifications and variations are possible -21without departing from the scope of the invention defined in the appended claims.
0 5 04
Claims (6)
1. A method of preparing a dual zone porous material having an external zone which comprises the external surfaces of the porous material and having an internal zone which comprises the internal surfaces of the porous material, comprising: a) providing a hydroxyl-bearing porous support selected from the group consisting of porous metalloid oxides, porous metallic oxides and mixtures thereof, b) forming a porous support suspension by mixing said porous support with a solvent, said suspension also containing a lewis base catalyst, in an amount of at least 0.05 molecules/nM 2 of surface area of the porous support in said suspension, c) adding to said suspension a halosilane comprising at least one leaving group wherein at least one of the leaving groups is a non-fluorine halogen, said halosilane being added in an amount varying from 0.01 to 2.00 molecules/nM2 of surface area of the porous support in said suspension and which has silyl groups of a first type and which is catalyzed by said catalyst so as to form silyl groups of the first type predominantly on the external surfaces of said porous support, d) providing silyl groups of a second type predominantly on the internal surfaces of said porous support, and e) subsequently isolating the so-treated porous support and S" thereby providing said dual zone porous material. S*ft
2. The method of claim 1 wherein said porous support is particulate silica. 9
3. The method of claim 1 in which the rate of addition of said halosilane does not exceed 0.2 molecules/minute/nM 2 of silica in said suspension.
4. A method of preparing an intermediate useful in the preparation of dual zone porous materials having an external zone which comprises the external surfaces of the porous materiel and having an internal zone which comprises the internal surfaces of the porous material, comprising: a) providing a hydroxyl-bearing porouc support selected from the group consisting of porous metalloid oxides, porous metallic oxides and mixtures thereof, b) forming a porous support suspension by mixing said porous support with a solvent, said suspension also containing a lewis base catalyst in an amount of at least 0.05 molecules/nM2 of surface area of the porous support in said suspension, c) adding to said suspension a halosilane comprising at least one leaving group wherein at least one of the leaving groups is a nornfluorine halogen, said halosilane being added in an amount varying from 0.01 to molecules/nM2 of surface area of the porous support in said suspension, which has silyl groups of a first type and which is catalyzed by sair, catalyst so as to form silyl groups of the first type predominantly on the external surfaces of said porous support, and d) providing silyl groups of a second type predominantly on the internal surfaces of said porous support, and e) subsequently isolating the so-treated porous support and thereby providing said intermediate. 0 S The method of claim 4 wherein said porous support is particulate silica. *1 e*l*i** e «e I I -24- porous material and having an internal Zone -whieh mpris-7 the internal surfaces of the porous material, comprising: a) providing a hydroxyl-bearing porous suppor selected from the group consisting of porous metalloi oxides, porous metallic oxides and mixtures thereoF, b) forming a porous support suspensio by mixing scid porous support with a solvent, said susp nsion also containing a lewis base catalyst, c) adding to said suspension halosilane in an amount which does not exceed 2.0 mole ules/nM 2 of the silica 0, in said supension, which has silyl roups of a first type and 0 which is catalyzed by said cata st so as to form silyl groups of the first type pred minantly on the external S surfaces of said porous su ort, and d) subsequen y isolating the so-treated porous S' support and thereby p oviding said intermediate.
6. he method of claim 5 wherein said porous support is particulate silica. S*
7. The method of claim 5 in which the rate of /ddition of said halosilane 0.2 molecules/minute/nM 2 of -ilica in paid ouepenoion. P DATED this 26th day of June 1990. DOW CORNING CORPORATION WATERMARK PATENT TRADEMARK ATTORNEYS "THE ATRIUM" 290 BURWOOD ROAD HAWTHORN. VIC. 3122. 0'- .i r p v v
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AU57844/90A AU648025B2 (en) | 1990-06-27 | 1990-06-27 | Method for producing dual zone materials by catalyzed halosilylation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AU57844/90A AU648025B2 (en) | 1990-06-27 | 1990-06-27 | Method for producing dual zone materials by catalyzed halosilylation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| AU5784490A AU5784490A (en) | 1992-04-16 |
| AU648025B2 true AU648025B2 (en) | 1994-04-14 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU57844/90A Ceased AU648025B2 (en) | 1990-06-27 | 1990-06-27 | Method for producing dual zone materials by catalyzed halosilylation |
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| Country | Link |
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| AU (1) | AU648025B2 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0161058A1 (en) * | 1984-04-09 | 1985-11-13 | Dow Corning Corporation | Dual surface materials |
| US4705725A (en) * | 1986-11-28 | 1987-11-10 | E. I. Du Pont De Nemours And Company | Substrates with sterically-protected, stable, covalently-bonded organo-silane films |
| US4778600A (en) * | 1987-06-17 | 1988-10-18 | Dow Corning Corporation | Liquid chromatography dual zone packing materials |
-
1990
- 1990-06-27 AU AU57844/90A patent/AU648025B2/en not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0161058A1 (en) * | 1984-04-09 | 1985-11-13 | Dow Corning Corporation | Dual surface materials |
| US4705725A (en) * | 1986-11-28 | 1987-11-10 | E. I. Du Pont De Nemours And Company | Substrates with sterically-protected, stable, covalently-bonded organo-silane films |
| US4778600A (en) * | 1987-06-17 | 1988-10-18 | Dow Corning Corporation | Liquid chromatography dual zone packing materials |
Also Published As
| Publication number | Publication date |
|---|---|
| AU5784490A (en) | 1992-04-16 |
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