AU754212B2

AU754212B2 - Epothilone derivatives, a method for the production thereof, and their use

Info

Publication number: AU754212B2
Application number: AU43611/99A
Authority: AU
Inventors: Gerhard Hoefle; Thomas Leibold
Original assignee: Helmholtz Zentrum fuer Infektionsforschung HZI GmbH
Current assignee: Helmholtz Zentrum fuer Infektionsforschung HZI GmbH
Priority date: 1998-05-08
Filing date: 1999-05-07
Publication date: 2002-11-07
Anticipated expiration: 2019-05-07
Also published as: US6982280B1; US20040259922A1; DE59904632D1; ES2195577T3; HUP0102283A3; WO1999058534A2; JP2002514649A; HUP0102283A2; ATE234842T1; CA2330812A1; KR20010052325A; AU4361199A; EP1077980B1; IL139480A0; TW568910B; AR018344A1; DE19820599A1; EP1077980A2; WO1999058534A3

Description

1 4th May 1999/pl Our ref: 9926 GBF New International Patent Application Gesellschaft fur Biotechnologische Forschung mbH (GBF) Epothilon derivatives, processes for their production and their use The present invention relates generally to epothilon derivatives, to processes for their production and to their use in the manufacture of medicaments and plant protection agents.

The invention relates especially to epothilon derivatives of the general formulae 2 to 6 shown below and to their use as medicaments and plant protection agents.

B

ii Ir -2 In the above formulae:

R

1 a H atom or a C 1 to C 8 -alkyl group, preferably a C 1 to C 6 -alkyl group, especially preferably a C1- to C 4 -alkyl group, especially a methyl, ethyl, propyl or butyl group, Hal a halogen atom, such as Br or I, X-Y a group of the formula -CH 2 CH-OP or -CH=CH-, and P a protecting group, such as TMS, and X-Y is excluded as a group of formula -CH 2 CH-OP if R 1 means a hydrogen atom or a Cj- to C 4 -alkyl group.

a a.

a a.* oooo a. oo oooo °o oo* 6 wherein the residues R 1 X-Y and P are defined above, and R 2 is a :yclic aromatic which can be substituted by a halogen atoms and/or OR 4 and/or NR 5

R

6 and/or alkyl, alkenyl and/or alkinyl groups in ortho- and/or metaand/or para-position, or a monocyclic 5- or 6-membered hetero aromatic, which can be provided with one or several 0- and/or N- and/or S-atoms in the ring and/or which can be provided with OR 4 and/or NR 5

R

6 and/or alkyl, alkenyl and/or alkinyl groups as substituents, wherein the residues R 4

R

5 and R 6 independently are defined as R 1 above, but are independent of R 1 wherein XY is excluded as group of formula -CH=CH- if R 1 is a hydrogen atom or a C1--alkyl group and R 2 is a monocyclic hetero aromatic having a N atom and a S atom in its ring and a C 1 -alkyl substituent and (ii) X-Y is excluded as group of formula -CH 2 -CH-OP if R 1 is a hydrogen atom or a C1-4-alkyl group and R 2 is a monocyclic hetero aromatic having a N atom and a S atom in its ring and a C 1 -alkyl substituent; and if X-Y means a group of formula -CH 2 CH-OP, the protective group P has been removed, wherein XY is excluded as group of formula -CH=CH- if R 1 is a hydrogen atom or a C1-4-alkyl group and R 2 is a monocyclic hetero aromatic having a N atom and a S atom in its ring and a Ci-alkyl substituent and X-Y is excluded as group of formula -CH 2 -CH-OP if R 1 is a hydrogen atom or a C14-alkyl group and R 2 is a monocyclic hetero aromatic having a N S. 20 atom and a S atom in its ring and a C 1 -alkyl substituent.

5 The compounds according to the invention may be produced as follows: Compounds of the formula may be produced by reacting compounds of the formula (1)

S

R

N H l ,,OH 0 OH 0 as described in DE 195 42 986, the radicals being as defined above. In that reaction, especially the following conditions (iii) and optionally (after also (ii) may be used: 03 in a solvent, such as CH 2 C1 2 and reductive working-up, for example with Me 2

S;

(ii) (CH 3

CO)

2 0, HCO 2 H, NEt 3

DMAP;

DBU; and MeOH, NH 3 and (iii) Me 3 SiC1, NEt 3 Compounds of the formula are obtainable by reacting a compound of the formula with a compound of the formula

HC[B(OR)

2 3 such as tris(ethylenedioxyboryl)methane; R may be an alkyl or alkenyl group as defined above.

In the reaction there is optionally used a strong base, such as a C 1

-C

4 -alkyl-Li compound (such as butyllithium) or a di-Ci-C 4 -alkylamine-Li compound (such as a dimethylaminelithium compound). The reaction is generally carried out at low temperatures, such as, for example, at temperatures of 6 less than -30 0 C, preferably at temperatures of less than 0 C, especially preferably at temperatures of at least -78 0 C. Further reaction conditions may be found in D. Schummer, G. Hofle in Tetrahedron 1995, 51, 11219.

For example, a compound of the formula is reacted with tris(ethylenedioxyboryl)methane and butyllithium at -78 0 C to form a compound of the formula A compound of the formula may be produced from a compound of the formula by reaction with N-iodo- or Nbromo-succinimide, optionally in a polar solvent, such as acetonitrile. Further reaction conditions may be found in the following literature reference: N.A. Petasis, I.A.

Zavialor, Tetrahedron Lett. 1996, 37, 567.

For the production of a compound of the formula a compound of the formula may be reacted within the framework of a Suzuki coupling with a compound of the formula R2-Z, wherein R 2 has the meanings given above and Z may be a halogen atom or a group of the formula -OSO 2

CF

3

-CH=CHI,

-CH=CHOSO

2

CF

3 The group R2-Z may especially have the following structures: C-Subst. C-Subst. A C-Subst. C-Subst.

AC Z C,-C 6 -Alkyl Z Z A1 Z A' Z wherein A' represents O, S, N or C atoms and the substituents N- and C- correspond to the above-described groups

OR

4

NRR

6 and alkyl, alkenyl and/or alkynyl groups.

7 Especially preferred as substituents are C 1

-C

6 -alkyl or

C

2

-C

6 -alkenyl and/or -alkynyl groups, especially Ci-C 4 -alkyl or C 2

-C

4 -alkenyl and/or -alkynyl groups. As alkyl groups there are especially preferred methyl, ethyl, propyl and butyl groups.

Alternatively, a compound of the formula may be produced by reacting a compound of the formula by means of a Stille coupling with R 2 -SnR 3 3 wherein R 2 is as defined above and R 3 is a Ci- to C 6 -alkyl group, preferably a Ci- to C4alkyl group and especially preferably a methyl, ethyl, propyl or butyl group. In addition, the compound R 2 -SnR 3 3 may have one of the following structures: C-Subst. C-Subst. C-Subst.

A A'

A

A'

SA S3 A 3 SnR3 A' SnR 3 A SnR3 wherein the radicals and substituents are as defined above.

Furthermore, according to the invention, a compound of the formula may be produced by removing the protecting group from the compound of the formula for example with a weak acid, such as citric acid, or compounds such as TBAF, pyridine x HF. Optionally an alcohol, such as methanol, may be used as solvent, the temperature preferably being adjusted to values of, for example, from 40 to 600C, preferably about 500C.

8 In summary, the compound of the formula may be produced by the above-described steps (epothilon A or B (3) or epothilon A or B According to the invention there are also disclosed medicaments that contain at least one of the compounds or and optionally customary carriers, diluents and adjuvants.

Such compounds may especially be used also as cytostatic agents and for plant protection in agriculture and/or forestry and/or in horticulture, the compounds optionally being used together with one or more customary carriers, adjuvants and/or diluents.

Examples Synthesis of the ketone derivatives 2 For a detailed description see DE 195 42 986 Al.

Synthesis of the alkenylboronic acid derivatives 3 (see also D. Schummer, G. Hofle, Tetrahedron 1995, 51, 11219) Typical Example H, X-Y CH 2

CHOTMS):

A solution of tris(ethylenedioxyboryl)methane (0.30 g, mmol) in CH 2 C12/THF 4 ml) was prepared and cooled under inert gas to -78 0 C. At that temperature, butyllithium (1.6M solution in hexane; 0.73 ml, 1.2 mmol) was added drop- -9 wise in the course of 10 minutes. After 2 hours, ketone 2 (81 mg, 0.15 mmol) in CH 2 C12/THF 2 ml) was added, heated to room temperature and stirred for 17 hours. After the addition of MeOH (2 ml), the clear reaction solution was purified by means of preparative HPLC (Lichroprep RP-18,

CH

3

CN/H

2 0 75 25). 57 mg (65 of alkenylboronic acid 3 were obtained in the form of an E/Z-isomeric mixture (6 4).

Selected typical data: LC-MS (ESI-MS): 585 1

H-NMR:

(300 MHz, CD30D) E-isomer: 1.91 3H), 5.16 1H, Hz), 5.49 1H), Z-isomer; 1.85 3H, 1.1 Hz), 4.93 1H), 5.26 1H, 9.6 Hz).

Synthesis of the iodovinyl derivatives 4 (see also N.A. Petasis, I.A. Zavialor, Tetrahedron Lett.

1996, 37, 567) Typical Example (R 1 H, X-Y CH 2

CHOTMS):

At room temperature, N-iodosuccinimide (6.0 mg, 27 [tmol) was added under inert gas and with the exclusion of light to a solution of alkenylboronic acid 3 (12 mg, 21 pmol; E/Z 9:1) in CH 3 CN (150 pl) and stirred for 3 hours. After concentration, the residue was purified by means of preparative thinlayer chromatography (SiO 2

CH

2 C1 2 /MeOH 95 9 mg (66 of the iodovinyl derivative 4 were isolated in the form of an E/Z-isomeric mixture Selected typical data: LC-MS (ESI-MS): 667 (M H-NMR: (300 MHz, CDCl 3 E-isomer: 1.82 3H, 1.1 Hz), 5.36 (d, 1H, 11 Hz), 6.43 1H), Z-isomer: 1.84 3H, 1.1 Hz), 5.54 1H, 10.5 Hz), 6.09 1H).

Suzuki coupling of the alkenylboronic acid 3 (see also A. Suzuki, Acc. Chem. Res. 1982, 15, 178; A. Torrado, S. Lopez, R.

Alvarez, A.R. De Lera Synthesis, 1995, 285) Typical Example H, X-Y CH 2 CHOTMS, R 2 Ph): A solution of alkenylboronic acid 3 (12 mg, 21 pmol; E/Z 2 8) and thallium ethanolate (2M solution in EtOH; 12 pl, 24 pmol) in THF (150 Ll) was stirred at room temperature for 15 minutes, then a solution of phenyl iodide (4.0 pl, 6.0 mg, 29 [imol) and tetrakis(triphenylphosphino)-palladium (7.1 mg, 6.2 iimol) in THF (150 pl) was added drop-wise in 30 minutes and again stirred for 30 minutes.

After purification by means of preparative thin-layer chromatography (SiO 2

CH

2

CI

2 /Et 2 0 95 5) the phenyl-analogous epothilon 5 (10 mg, 79 E/Z 2 8) was obtained in the form of a colourless solid.

Selected typical data LC-MS (ESI-MS) 617 1H-NMR (300 MHz, CDCI3) E-isomer 1.87 3H, 1.4 Hz), 5.35 1H, 10.7 Hz), 6.54 1H), z-isomer: 1.80 3H, 1.5 Hz), 5.61 1H, 10.2 Hz), 6.41 1H).

20 Stille coupling of the iodovinyl derivatives 4 (see also K.C. Nicolaou, Y. He, F. Roschangar, N.P. King, D. Vourloumis, T. Li Angew. Chem. 1998, 100, 89) The term "comprises", and grammatical variations thereof such as "comprising" when used in the description and claims does not preclude the S. presence of additional features, integers, steps or components; or groups thereof.

*~oo

Claims

1. Epothilone derivative of formula (2) wherein R 1 is a hydrogen atom or a C14--alkyl group, X-Y is a group of formula -CH 2 CH-OP or -CH=CH-, and P is a protective group, wherein X-Y is excluded as group of formula -CH 2 CH-OP if R 1 means a hydrogen atom or a C 1 -4-alkyl group.

2. Epothilone derivative of formula (3) R H (HO)2B I wherein the residues are as defined in claim 1.

3. Epothilone derivative of formula (4) wherein the residues R 1 X-Y and P are defined as in claim 1, and Hal is a halogen atom such as Br or I.

4. Epothilone derivative of formula 555S S 5 5 0 0 wherein the residues R 1 X-Y and P are defined as in claim 1, and R 2 is a monocyclic aromatic which can be substituted by a halogen atoms and/or OR 4 and/or NR

5 R 6 and/or alkyl, alkenyl and/or alkinyl groups in ortho- and/or meta- and/or para-position, or a monocyclic 5- or 6-membered hetero aromatic, which can be provided with one or several 0- and/or N- and/or S-atoms in the ring and/or which can be provided with OR 4 and/or NR 5 R 6 and/or alkyl, alkenyl and/or alkinyl groups as substituents, wherein the residues R 4 R 5 and R 6 independently are defined as R 1 in claim 1, but are independent of wherein 13 XY is excluded as group of formula -CH=CH- if R 1 is a hydrogen atom or a C14-alkyl group and R 2 is a monocyclic hetero aromatic having a N atom and a S atom in its ring and a Cl-alkyl substituent and (ii) X-Y is excluded as group of formula -CH 2 -CH-OP if R' is a hydrogen atom or a C 1 -4-alkyl group and R 2 is a monocyclic hetero aromatic having a N atom and a S atom in its ring and a Ci-alkyl substituent. Epothilone derivative of formula (6) R 1 H R o o wherein the residues are defined as in claim 4, and if X-Y means a group of formula -CH 2 CH-OP, the protective group P has been removed, wherein XY is excluded as group of formula -CH=CH- if R 1 is a hydrogen atom or a C1--alkyl group and R 2 is a monocyclic hetero aromatic having a N atom and a S atom in its ring and a Ci-alkyl substituent and (ii) X-Y is excluded as group of formula -CH 2 -CH-OP if R 1 is a hydrogen atom or a C1-4-alkyl group and R 2 is a monocyclic hetero aromatic having a N atom and a S atom in its ring and a Ci-alkyl substituent.

6. Epothilone derivative according to any one of the preceding claims, characterised in that R 1 R 4 R 5 and R 6 are a hydrogen atom or a Cis6-alkyl group. 9

7. Epothilone derivative according to claim 6, characterised in that R 1 R 4 R and R 6 are a C1i-alkyl group. 14

8. Epothilone derivative according to any one of claims 4 to 7, characterised in that the substituents of the monocyclic aromatic and/or hetero aromatic are C1-6-alkyl, C2-6-alkenyl and C2-6-alkinyl groups, respectively, and the halogen atoms fluoro, chloro, bromo or iodo atoms.

9. Epothilone derivative according to claim 8, characterised in that the substituents of the monocyclic aromatic and/or hetero aromatic are C 1 alkyl, C 2 -4-alkenyl and C2-4-alkinyl groups, respectively.

Epothilone derivatives according to any one of claims 4 to 9, characterised in that the aromatic and hetero aromatic, respectively, is provided with 1, 2 or 3 substituents and the hetero aromatic is provided with 1, 2 or more.

11. Epothilone derivatives according to claim 8, characterised in that the hetero aromatic is provided with 1, 2, 3 or 4 substituents.

12. Process for the production of a compound of formula characterised in that a compound of formula is reacted with the compound of formula HC[B(OR) 2 3 if wanted in the presence of a base, wherein the residues are defined as in any one of the preceding claims and R is defined as R 1 but is independent of R 1

13. Process for the production of a compound of formula characterised in that a compound of formula is reacted with N-iodo- or N-bromo succinimide and that the residues are defined as in any one of the preceding claims.

14. Process for the production of a compound of formula characterised in that a compound of formula is reacted by a Suzuki coupling with a compound of formula R 2 wherein R 2 is defined as in any one of the preceding claims and Z can be a halogen atom or a group of formula -OS0 2 CF 3 -CH=CHI, -CH=CHOSO 2 CF 3

15. Process for the production of a compound of formula characterised in that a compound of formula is reacted by a silent coupling (stille Kupplung) with R 2 -SNR 3 3 wherein R 2 is defined as in any one of the preceding claims and ;T R 3 is a C 1 -6-alkyl group.

16. Process for the production of a compound of formula as claimed in claim 15, characterised in that R 3 is a C1--alkyl group.

17. Process for the production of a compound of formula as claimed in claim 16, characterised in that R 3 is a methyl, ethyl, propyl or butyl group.

18. Process for the production of a compound of formula characterised in that the protective group is removed from a compound of formula

19. Process for the production of a compound of formula characterised in that it comprises the process steps as disclosed in claims 12, 13, 14 or 15 and 18, wherein the residues are defined as in any one of the preceding claims.

Therapeutical agent, containing at least one of the compounds described in claims 1 to 11 and optionally the usual carriers, diluents and/or auxiliary agents.

21. Therapeutical agent according to claim 20, characterised in that it is a cytostaticum.

22. Plant protecting agent for use in agriculture and/or forest culture and/or horticulture, containing at least one compound described in claims 1 to 11 and optionally the usual carriers, diluents and/or auxiliary agents. DATED this 5 th day of September 2002 GESELLSCHAFT FUER BIOTECHNOLOGISCHE FORSCHUNG MBH (GBF) WATERMARK PATENT TRADE MARK ATTORNEYS 290 BURWOOD ROAD HAWTHORN VICTORIA 3122 SAUSTRALIA *P18681AU P18681AU00 KJS/KMH/RES i