AU8011394A - Vacuum seal of heating window to housing in wafer heat processing machine - Google Patents
Vacuum seal of heating window to housing in wafer heat processing machineInfo
- Publication number
- AU8011394A AU8011394A AU80113/94A AU8011394A AU8011394A AU 8011394 A AU8011394 A AU 8011394A AU 80113/94 A AU80113/94 A AU 80113/94A AU 8011394 A AU8011394 A AU 8011394A AU 8011394 A AU8011394 A AU 8011394A
- Authority
- AU
- Australia
- Prior art keywords
- housing
- processing machine
- heat processing
- vacuum seal
- wafer heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000010438 heat treatment Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/488—Protection of windows for introduction of radiation into the coating chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/03—Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13588193A | 1993-10-13 | 1993-10-13 | |
| US135881 | 1993-10-13 | ||
| PCT/US1994/010856 WO1995010639A1 (en) | 1993-10-13 | 1994-09-26 | Vacuum seal of heating window to housing in wafer heat processing machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU8011394A true AU8011394A (en) | 1995-05-04 |
Family
ID=22470172
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU80113/94A Abandoned AU8011394A (en) | 1993-10-13 | 1994-09-26 | Vacuum seal of heating window to housing in wafer heat processing machine |
Country Status (2)
| Country | Link |
|---|---|
| AU (1) | AU8011394A (en) |
| WO (1) | WO1995010639A1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8950470B2 (en) | 2010-12-30 | 2015-02-10 | Poole Ventura, Inc. | Thermal diffusion chamber control device and method |
| US8097085B2 (en) | 2011-01-28 | 2012-01-17 | Poole Ventura, Inc. | Thermal diffusion chamber |
| US20110254228A1 (en) * | 2011-01-28 | 2011-10-20 | Poole Ventura, Inc. | Thermal Chamber |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4448000A (en) * | 1982-04-27 | 1984-05-15 | The United States Of America As Represented By The Secretary Of The Navy | High temperature ultra-high vacuum infrared window seal |
| US4545327A (en) * | 1982-08-27 | 1985-10-08 | Anicon, Inc. | Chemical vapor deposition apparatus |
| FR2594529B1 (en) * | 1986-02-19 | 1990-01-26 | Bertin & Cie | APPARATUS FOR HEAT TREATMENT OF THIN PARTS, SUCH AS SILICON WAFERS |
| US4911103A (en) * | 1987-07-17 | 1990-03-27 | Texas Instruments Incorporated | Processing apparatus and method |
-
1994
- 1994-09-26 AU AU80113/94A patent/AU8011394A/en not_active Abandoned
- 1994-09-26 WO PCT/US1994/010856 patent/WO1995010639A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO1995010639A1 (en) | 1995-04-20 |
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