CN110764372A - Calibration method of immersion lithography machine polarization aberration detection system - Google Patents
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Abstract
本发明提供了一种浸没光刻机偏振像差检测系统的标定方法，属于光学检测领域。该检测系统中的PSG由偏振片和宽角四分之一波片构成，该设计适用于大角度入射。本征值标定过程中，标定样品采用宽角四分之一波片满足大角度入射时本征值标定方法运行的条件，可以实现高数值孔径偏振成像系统的标定。此外，该标定方法中，在各步骤中的标定样品联合使用的传统四分之一波片和宽角四分之一波片进行标定的策略；不仅实现了偏振态产生器和偏振态分析器的标定，还完成了准直镜的标定，该策略适用于任意高数值空孔径成像系统偏振像差的标定，扩大了适用范围，操作简单、可行性强、标定精度高。
The invention provides a calibration method for a polarization aberration detection system of an immersion lithography machine, which belongs to the field of optical detection. The PSG in this detection system consists of a polarizer and a wide-angle quarter-wave plate, and the design is suitable for large-angle incidence. In the process of eigenvalue calibration, a wide-angle quarter-wave plate is used for the calibration sample to meet the conditions of the eigenvalue calibration method operating at a large angle of incidence, which can realize the calibration of a high numerical aperture polarization imaging system. In addition, in this calibration method, the traditional quarter-wave plate and the wide-angle quarter-wave plate are used in conjunction with the calibration samples in each step for calibration; not only the polarization state generator and polarization state analyzer are realized The calibration of the collimating mirror is also completed. This strategy is suitable for the calibration of polarization aberrations of any high numerical air-aperture imaging system, which expands the scope of application. It has simple operation, strong feasibility and high calibration accuracy.
Description
技术领域technical field
本发明属于光学检测技术领域，特别涉及浸没光刻机偏振像差检测系统的标定方法。The invention belongs to the technical field of optical detection, and particularly relates to a calibration method of a polarization aberration detection system of an immersion lithography machine.
背景技术Background technique
用于制造大规模集成电路的核心设备是光刻机，光刻机的核心部件是投影光刻物镜。集成电路节点的推进促使光刻物镜数值孔径(NA)不断增大，当NA增大到一定程度时，成像光束的偏振态对成像质量的影响变得不可忽略，需要对投影物镜偏振像差进行精确测量，进而对其进行合理控制，提高其成像性能。The core equipment used to manufacture large-scale integrated circuits is a lithography machine, and the core component of the lithography machine is a projection lithography objective lens. The advancement of integrated circuit nodes promotes the continuous increase of the numerical aperture (NA) of the lithography objective lens. When the NA increases to a certain extent, the influence of the polarization state of the imaging beam on the imaging quality becomes non-negligible. Accurate measurement, and then rational control of it, improve its imaging performance.
相关专利(中国专利CN103197512A)和(CN104281011A)公开了获取光刻投影系统偏振像差的方法，但是这些方法只能检测出投影系统偏振像差的部分信息，不能用于实际光刻投影物镜偏振像差的测量。文献(Nomura,H.,and Higashikawa,I.,“Mueller matrixpolarimetry for immersion lithography tools with a polarization monitoringsystem at the wafer plane,”Proc.SPIE 7520,752012,(2009).)提出了利用穆勒矩阵偏振仪对投影物镜偏振像差进行在线测量，该穆勒矩阵偏振仪由偏振掩模，准直镜，四分之一波片，偏振分束棱镜和CCD构成，其中，偏振掩模作为偏振态产生器PSG，由四片式偏振片和四片式宽角四分之一波片共同构成，且偏振片在前，波片再后；准直镜将投影物镜的光瞳耦合到CCD光敏面上，并将高NA成像光束准直成平行光束；四分之一波片和偏振分束棱镜构成偏振态分析器PSA，其通过傅里叶分析法分析准直镜后平行光束的Stokes参量。测量过程中，PSG总共产生16中已知偏振态的入射光束，并以用PSA和CCD相机测量每种入射光束从准直镜出射后的Stokes参量，对入射和出射Stokes参量进行数学运算便可获得投影物镜的穆勒矩阵。Related patents (Chinese patent CN103197512A) and (CN104281011A) disclose methods for obtaining polarization aberrations of lithography projection systems, but these methods can only detect partial information of polarization aberrations of projection systems, and cannot be used for actual lithography projection objective lens polarization images poor measurement. Literature (Nomura, H., and Higashikawa, I., "Mueller matrix polarimetry for immersion lithography tools with a polarization monitoring system at the wafer plane," Proc. SPIE 7520, 752012, (2009).) proposed the use of a Mueller matrix polarimeter On-line measurement of polarization aberration of projection objective, the Mueller matrix polarizer is composed of polarization mask, collimator, quarter-wave plate, polarization beam splitter prism and CCD, wherein the polarization mask acts as polarization state generator PSG is composed of four polarizers and four wide-angle quarter-wave plates, with the polarizer in the front and the wave plate in the back; the collimator couples the pupil of the projection objective to the CCD photosensitive surface, The high NA imaging beam is collimated into a parallel beam; the quarter-wave plate and the polarization beam splitting prism constitute a polarization state analyzer PSA, which analyzes the Stokes parameter of the parallel beam after the collimating mirror by Fourier analysis. During the measurement process, PSG generates a total of 16 incident beams with known polarization states, and uses PSA and CCD cameras to measure the Stokes parameters of each incident beam after exiting the collimating mirror, and mathematical operations can be performed on the incident and outgoing Stokes parameters. Obtain the Mueller matrix of the projection objective.
然而，该测量方法没有考虑仪器的标定，且测量得到的穆勒矩阵包含了准直镜的影响，目前，没有成熟可行的方法进行准直镜的标定。However, this measurement method does not consider the calibration of the instrument, and the Mueller matrix obtained by the measurement includes the influence of the collimating mirror. At present, there is no mature and feasible method for the calibration of the collimating mirror.
发明内容SUMMARY OF THE INVENTION
为了解决上述技术问题，本发明提供了一种浸没光刻机偏振像差检测系统的标定方法，不仅实现了偏振态产生器和偏振态分析器的标定，还完成了准直镜的标定，并且该标定方法中，在各步骤中的标定样品联合使用的传统四分之一波片和宽角四分之一波片进行标定的策略。In order to solve the above technical problems, the present invention provides a calibration method for a polarization aberration detection system of an immersion lithography machine, which not only realizes the calibration of the polarization state generator and the polarization state analyzer, but also completes the calibration of the collimating mirror, and In this calibration method, the calibration samples in each step are calibrated using a combination of traditional quarter-wave plates and wide-angle quarter-wave plates.
实现本发明的技术方案如下：The technical scheme that realizes the present invention is as follows:
一种浸没光刻机偏振像差检测系统，所述浸没光刻机偏振像差检测系统主要包括照明装置、偏振态产生器PSG、投影物镜、与投影物镜耦合的准直镜、偏振态分析器PSA及CCD探测器；其中，偏振态产生器PSG由偏振片和宽角四分之一波片组成,这是因为投影物镜物方数值孔径较大，掩模处照明光束的入射角非正入射，传统四分之一波片会产生的相位延迟误差；偏振态分析器PSA由传统四分之一波片和偏振棱镜组成。A polarization aberration detection system for an immersion lithography machine, the polarization aberration detection system for an immersion lithography machine mainly includes an illumination device, a polarization state generator PSG, a projection objective lens, a collimator lens coupled with the projection objective lens, and a polarization state analyzer PSA and CCD detectors; among them, the polarization state generator PSG is composed of a polarizer and a wide-angle quarter-wave plate. This is because the numerical aperture of the projection objective lens is large, and the incident angle of the illumination beam at the mask is not normal incidence. , the phase retardation error produced by the traditional quarter-wave plate; the polarization state analyzer PSA is composed of a traditional quarter-wave plate and a polarizing prism.
设偏振态产生器PSG和偏振态分析器PSA的仪器矩阵分别为G和A，投影物镜与投影物镜耦合的准直镜的Mueller矩阵分别为为Mp和Mc。Let the instrument matrices of the polarization state generator PSG and the polarization state analyzer PSA be G and A, respectively, and the Mueller matrices of the projection objective and the collimator coupled to the projection objective are M p and Mc , respectively.
浸没光刻机偏振像差检测系统的标定方法，其特征在于：The calibration method of the polarization aberration detection system of the immersion lithography machine is characterized in that:
步骤一：利用复合标定法是将傅里叶分析法和本征值标定方法结合起来对浸没光刻机偏振像差检测系统进行标定；Step 1: Use the composite calibration method to calibrate the polarization aberration detection system of the immersion lithography machine by combining the Fourier analysis method and the eigenvalue calibration method;
1.1、傅里叶分析法用于标定偏振态产生器PSG和偏振态分析器PSA，并得到仪器矩阵G和A，通过求得偏振态产生器PSG和偏振态分析器PSA中的波片和的快轴方位角误差ε1和ε2，延迟量误差ε4和ε5，及偏振态分析器PSA中偏振棱镜的透光轴方位角误差ε3；用来求解偏振态产生器PSG和偏振态分析器PSA的仪器矩阵G和A；1.1. The Fourier analysis method is used to calibrate the polarization state generator PSG and the polarization state analyzer PSA, and obtain the instrument matrix G and A, by obtaining the sum of the wave plates in the polarization state generator PSG and the polarization state analyzer PSA. Fast axis azimuth errors ε 1 and ε 2 , retardation errors ε 4 and ε 5 , and transmission axis azimuth errors ε 3 of the polarizing prism in the polarization state analyzer PSA; used to solve the polarization state generator PSG and polarization state Instrument matrices G and A of the analyzer PSA;
具体步骤如下：Specific steps are as follows:
1.1.1、旋转偏振态产生器PSG和偏振态分析器PSA中波片对空气进行测量，其中偏振态产生器PSG中宽角四分之一波片的旋转角度与偏振态分析器PSA中四分之一波片的旋转角度比为1：5；1.1.1. Rotate the wave plate in the polarization state generator PSG and the polarization state analyzer PSA to measure the air, wherein the rotation angle of the wide-angle quarter-wave plate in the polarization state generator PSG is the same as the four in the polarization state analyzer PSA. The rotation angle ratio of the one-wave plate is 1:5;
设，其中偏振态产生器PSG中宽角四分之一波片的延迟量为δ1，偏振态分析器PSA中四分之一波片的延迟量为δ2，如下式：Suppose, the retardation of the wide-angle quarter-wave plate in the polarization state generator PSG is δ 1 , and the retardation of the quarter-wave plate in the polarization state analyzer PSA is δ 2 , as follows:
根据式(2)，可以求得偏振态产生器PSG和偏振态分析器PSA中器件的误差，即偏振态产生器PSG和偏振态分析器PSA中的波片的快轴方位角误差ε1和ε2，延迟量误差ε4和ε5，及偏振态分析器PSA中偏振棱镜的透光轴方位角误差ε3。According to formula (2), the errors of the devices in the polarization state generator PSG and the polarization state analyzer PSA can be obtained, that is, the fast axis azimuth angle errors ε 1 and 1 of the wave plates in the polarization state generator PSG and the polarization state analyzer PSA ε 2 , retardation errors ε 4 and ε 5 , and transmission axis azimuth error ε 3 of the polarizing prism in the polarization state analyzer PSA.
其次，将求出的以上误差带入到求偏振态产生器PSG与偏振态分析器PSA的仪器矩阵G和A中，便完成了偏振态产生器PSG与偏振态分析器PSA的标定，即得到偏振态产生器PSG与偏振态分析器PSA的仪器矩阵G和A中。Secondly, the above errors are brought into the instrument matrix G and A of the polarization state generator PSG and the polarization state analyzer PSA, and the calibration of the polarization state generator PSG and the polarization state analyzer PSA is completed, that is, we get The polarization state generator PSG and the polarization state analyzer PSA are in the instrument matrix G and A.
步骤二，运用与步骤一不同的方法，求得偏振态产生器PSG与偏振态分析器PSA的仪器矩阵G和A，即利用多步本征值标定法对浸没光刻机偏振像差检测系统进行标定，得到仪器矩阵G和A；The second step is to use a method different from that of the first step to obtain the instrument matrices G and A of the polarization state generator PSG and the polarization state analyzer PSA. Perform calibration to obtain instrument matrices G and A;
将标定样品S分别放置在偏振态产生器PSG和投影物镜之间，准直镜和偏振态分析器PSA之间，各进行一次本征值标定方法，然后根据矩阵运算，求解出仪器矩阵G和A。The calibration sample S is placed between the polarization state generator PSG and the projection objective lens, and between the collimator lens and the polarization state analyzer PSA, respectively, and the eigenvalue calibration method is performed once. Then, according to the matrix operation, the instrument matrix G and A.
具体步骤如下：Specific steps are as follows:
2.1：将标定样品S放置在偏振态产生器PSG和投影物镜之间，其中，偏振态产生器PSG作为一组，其仪器矩阵为M21；投影物镜，准直镜和偏振态分析器PSA作为一组,其仪器矩阵为M22，其中，M21和M22可以表示为：2.1: The calibration sample S is placed between the polarization state generator PSG and the projection objective lens, wherein the polarization state generator PSG is used as a group, and its instrument matrix is M21; the projection objective lens, the collimator lens and the polarization state analyzer PSA are used as a group, whose instrument matrix is M22, where M21 and M22 can be expressed as:
M21＝G, (7)M21=G, (7)
M22＝A·Mc·Mp. (8)M22 = A· Mc ·Mp. (8)
进行一次本征值标定，获得M21和M22。Perform an eigenvalue calibration to obtain M21 and M22.
2.2：将标定样品S放置在准直镜和偏振态分析器PSA之间，其中，偏振态产生器PSG和投影物镜和准直镜作为一组，其仪器矩阵为M23；将偏振态分析器PSA作为一组,其仪器矩阵为M24，其中，M23和M24表示为：2.2: The calibration sample S is placed between the collimating mirror and the polarization state analyzer PSA, wherein the polarization state generator PSG, the projection objective lens and the collimating lens are as a group, and the instrument matrix is M23; the polarization state analyzer PSA is As a group, its instrument matrix is M24, where M23 and M24 are expressed as:
M23＝Mc·Mp·G, (9)M23=M c · M p · G, (9)
M24＝A. (10)M24=A. (10)
再进行一次本征值标定，从公式(7)和(10)中通过矩阵M21和M24，得到偏振态产生器PSG和偏振态分析器的仪器矩阵G和A。The eigenvalue calibration is performed again, and the instrument matrices G and A of the polarization state generator PSG and the polarization state analyzer are obtained through the matrices M21 and M24 from equations (7) and (10).
将步骤一或步骤二的结果带入步骤三，完成准直镜的标定，即获得准直镜的Mueller矩阵Mc，最终精确获得投影物镜偏振相差即Mp。The result of step 1 or step 2 is brought into step 3 to complete the calibration of the collimating lens, that is, the Mueller matrix M c of the collimating lens is obtained, and finally the polarization phase difference of the projection objective lens, ie M p , is accurately obtained.
步骤三的具体步骤为：The specific steps of step three are:
3.1将标定样品S放置在投影物镜和准直镜之间进行本征值标定，在此过程中，将偏振态产生器PSG和投影物镜作为一组，设其仪器矩阵为M11，将准直镜和偏振态分析器PSA作为另一组，设其仪器矩阵为M12。则M11和M12可以表示为：3.1 The calibration sample S is placed between the projection objective lens and the collimating lens for eigenvalue calibration. In this process, the polarization state generator PSG and the projection objective lens are used as a group, and the instrument matrix is set to M11, and the collimating lens is set as a group. And the polarization state analyzer PSA as another group, let its instrument matrix be M12. Then M11 and M12 can be expressed as:
M11＝Mp·G, (3)M11=M p ·G, (3)
M12＝A·Mc. (4)M12=A·M c . (4)
用本征值标定方法，求得M11和M12。Use the eigenvalue calibration method to obtain M11 and M12.
3.2结合步骤一或步骤二中求得的偏振态产生器PSG和偏振态分析器PSA的仪器矩阵G和A，再通过矩阵运算可以获得Mp和Mc，如下式所示：3.2 Combining the instrument matrices G and A of the polarization state generator PSG and the polarization state analyzer PSA obtained in step 1 or step 2, M p and M c can be obtained by matrix operation, as shown in the following formula:
Mp＝M11·G-1, (5)M p =M11·G -1 , (5)
Mc＝A-1·M12. (6)M c =A -1 ·M12. (6)
在此，完成浸没光刻机偏振像差检测系统的标定，即获得了偏振态产生器PSG和偏振态分析器PSA的仪器矩阵G和A，准直镜的Mueller矩阵Mc，最终精确获得投影物镜的偏振相差即Mp。Here, the calibration of the polarization aberration detection system of the immersion lithography machine is completed, that is, the instrument matrices G and A of the polarization state generator PSG and polarization state analyzer PSA, and the Mueller matrix M c of the collimating mirror are obtained, and finally the projection is accurately obtained. The polarization difference of the objective lens is M p .
一般而言，标定样品S选择已有公开文献给出的最优参考样品：空气、透光轴方向为水平方向的偏振片、透光轴方向为垂直方向的偏振片和快轴方位角为30°的四分之一波片；但在本发明中值得注意的是：步骤三中的标定样品为空气、偏振片和宽角四分之一波片；而步骤二中的2.1中标定样品为空气、偏振片和宽角四分之一波片，2.2中的标定样品为空气、偏振片和常规四分之一波片。Generally speaking, the calibration sample S selects the optimal reference sample given in the published literature: air, a polarizer with the transmittance axis in the horizontal direction, a polarizer with the transmittance axis in the vertical direction, and the fast axis azimuth angle of 30 ° quarter-wave plate; but it is worth noting in the present invention that: the calibration samples in step 3 are air, polarizer and wide-angle quarter-wave plate; and the calibration samples in step 2.1 are: Air, polarizer and wide-angle quarter-wave plate, the calibration samples in 2.2 are air, polarizer and conventional quarter-wave plate.
有益效果：Beneficial effects:
1、本发明提供了浸没光刻机偏振像差检测系统的标定方法，不仅实现了偏振态产生器和偏振态分析器的标定，还完成了准直镜的标定，最终可精确获取投影物镜偏振像差的全部信息。1. The present invention provides a calibration method for the polarization aberration detection system of an immersion lithography machine, which not only realizes the calibration of the polarization state generator and the polarization state analyzer, but also completes the calibration of the collimating mirror, and finally can accurately obtain the polarization of the projection objective lens. Full information on aberrations.
2、本发明的浸没光刻机偏振像差检测系统本征值标定中，标定样品中的波片采用宽角四分之一波片，适用于大角度入射，满足大角度入射时本征值标定方法运行的条件，可以实现高数值孔径偏振成像系统的标定。并且该标定方法中，在各步骤中的标定样品联合使用的传统四分之一波片和宽角四分之一波片进行标定的策略，该策略适用于任意高数值空孔径成像系统偏振像差的标定，扩大了适用范围，可操作性增强。2. In the eigenvalue calibration of the polarization aberration detection system of the immersion lithography machine of the present invention, the wave plate in the calibration sample adopts a wide-angle quarter-wave plate, which is suitable for large-angle incidence and meets the eigenvalues when large-angle incidence occurs. The operating conditions of the calibration method can realize the calibration of the polarization imaging system with high numerical aperture. And in this calibration method, the traditional quarter-wave plate and the wide-angle quarter-wave plate are used for the calibration of the calibration sample in each step. This strategy is applicable to the polarization image of any high numerical air aperture imaging system. Poor calibration expands the scope of application and enhances operability.
附图说明Description of drawings
图1为浸没光刻机投影物镜偏振像差检测系统示意图；Fig. 1 is the schematic diagram of the polarization aberration detection system of the projection objective lens of the immersion lithography machine;
具体实施方式Detailed ways
下面结合附图对本发明进行详细说明。The present invention will be described in detail below with reference to the accompanying drawings.
浸没光刻机偏振像差检测系统，其特征在于：The polarization aberration detection system of immersion lithography machine is characterized by:
图1中所述浸没光刻机偏振像差检测系统主要包括照明装置101、偏振态产生器PSG102、投影物镜103、与投影物镜耦合的准直镜104、偏振态分析器PSA105及CCD探测器106；其中，偏振态产生器PSG102由偏振片221和宽角四分之一波片222组成,这是因为投影物镜103物方数值孔径较大，掩模处照明光束的入射角非正入射，传统四分之一波片会产生的相位延迟误差；偏振态分析器PSA105由传统四分之一波片321和偏振棱镜322组成。The polarization aberration detection system of the immersion lithography machine shown in FIG. 1 mainly includes an
设偏振态产生器PSG102和偏振态分析器PSA105的仪器矩阵分别为G和A，投影物镜103与投影物镜耦合的准直镜104的Mueller矩阵分别为为Mp和Mc。Assume that the instrument matrices of the polarization state generator PSG102 and the polarization state analyzer PSA105 are G and A, respectively, and the Mueller matrices of the
浸没光刻机偏振像差检测系统的标定方法，其特征在于：The calibration method of the polarization aberration detection system of the immersion lithography machine is characterized in that:
步骤一：利用复合标定法是将傅里叶分析法和本征值标定方法结合起来对浸没光刻机偏振像差检测系统进行标定；Step 1: Use the composite calibration method to calibrate the polarization aberration detection system of the immersion lithography machine by combining the Fourier analysis method and the eigenvalue calibration method;
其中，傅里叶分析法用于标定偏振态产生器PSG和偏振态分析器PSA，并得到其仪器矩阵G和A，然后再结合本征值标定法与矩阵运算可以标定出与投影物镜耦合的准直镜的偏振像差即Mc，同时，也可以精确获得投影物镜的偏振像差即Mp。Among them, the Fourier analysis method is used to calibrate the polarization state generator PSG and the polarization state analyzer PSA, and obtain their instrument matrices G and A, and then combine the eigenvalue calibration method and matrix operation to calibrate the coupled projection objective lens. The polarization aberration of the collimating lens is M c , and at the same time, the polarization aberration of the projection objective lens, that is, M p can also be accurately obtained.
1.1、傅里叶分析法用于标定偏振态产生器PSG和偏振态分析器PSA，并得到仪器矩阵G和A。具体步骤如下：1.1. Fourier analysis method is used to calibrate the polarization state generator PSG and polarization state analyzer PSA, and obtain the instrument matrix G and A. Specific steps are as follows:
1.1.1旋转偏振态产生器PSG和偏振态分析器PSA中波片对空气进行测量，其中偏振态产生器PSG中宽角四分之一波片的旋转角度与偏振态分析器PSA中四分之一波片的旋转角度比为1：5；1.1.1 Rotate the wave plate in the polarization state generator PSG and the polarization state analyzer PSA to measure the air, where the rotation angle of the wide-angle quarter-wave plate in the polarization state generator PSG is the same as that in the polarization state analyzer PSA. The rotation angle ratio of one wave plate is 1:5;
首先，求得偏振态产生器PSG和偏振态分析器PSA中的波片和的快轴方位角误差ε1和ε2，延迟量误差ε4和ε5，及偏振态分析器PSA中偏振棱镜的透光轴方位角误差ε3；用来求解偏振态产生器PSG和偏振态分析器PSA的仪器矩阵G和A；First, obtain the fast axis azimuth errors ε 1 and ε 2 , the retardation errors ε 4 and ε 5 of the sum of the wave plates in the polarization state generator PSG and the polarization state analyzer PSA, and the polarization prism in the polarization state analyzer PSA The azimuth error ε 3 of the transmittance axis; the instrument matrices G and A used to solve the polarization state generator PSG and polarization state analyzer PSA;
设，其中偏振态产生器PSG中宽角四分之一波片的延迟量为δ1，偏振态分析器PSA中四分之一波片的延迟量为δ2，如下式：Suppose, the retardation of the wide-angle quarter-wave plate in the polarization state generator PSG is δ 1 , and the retardation of the quarter-wave plate in the polarization state analyzer PSA is δ 2 , as follows:
根据式(2)，可以求得偏振态产生器PSG和偏振态分析器PSA中器件的误差，即偏振态产生器PSG和偏振态分析器PSA中的波片的快轴方位角误差ε1和ε2，延迟量误差ε4和ε5，及偏振态分析器PSA中偏振棱镜的透光轴方位角误差ε3。According to formula (2), the errors of the devices in the polarization state generator PSG and the polarization state analyzer PSA can be obtained, that is, the fast axis azimuth angle errors ε 1 and 1 of the wave plates in the polarization state generator PSG and the polarization state analyzer PSA ε 2 , retardation errors ε 4 and ε 5 , and transmission axis azimuth error ε 3 of the polarizing prism in the polarization state analyzer PSA.
其次，将求出的以上误差带入到求偏振态产生器PSG与偏振态分析器PSA的仪器矩阵G和A中，便完成了偏振态产生器PSG与偏振态分析器PSA的标定，即得到偏振态产生器PSG与偏振态分析器PSA的仪器矩阵G和A中。Secondly, the above errors are brought into the instrument matrix G and A of the polarization state generator PSG and the polarization state analyzer PSA, and the calibration of the polarization state generator PSG and the polarization state analyzer PSA is completed, that is, we get The polarization state generator PSG and the polarization state analyzer PSA are in the instrument matrix G and A.
步骤二，运用与步骤一不同的方法，求得偏振态产生器PSG与偏振态分析器PSA的仪器矩阵G和A，即利用多步本征值标定法对浸没光刻机偏振像差检测系统进行标定，得到仪器矩阵G和A；The second step is to use a method different from that of the first step to obtain the instrument matrices G and A of the polarization state generator PSG and the polarization state analyzer PSA. Perform calibration to obtain instrument matrices G and A;
将标定样品S分别放置在偏振态产生器PSG和投影物镜之间，准直镜和偏振态分析器PSA之间，各进行一次本征值标定方法，然后根据矩阵运算，求解出仪器矩阵G和A。The calibration sample S is placed between the polarization state generator PSG and the projection objective lens, and between the collimator lens and the polarization state analyzer PSA, respectively, and the eigenvalue calibration method is performed once. Then, according to the matrix operation, the instrument matrix G and A.
具体步骤如下：Specific steps are as follows:
2.1：将标定样品S放置在偏振态产生器PSG和投影物镜之间，其中，偏振态产生器PSG作为一组，其仪器矩阵为M21；投影物镜，准直镜和偏振态分析器PSA作为一组,其仪器矩阵为M22，其中，M21和M22可以表示为：2.1: The calibration sample S is placed between the polarization state generator PSG and the projection objective lens, wherein the polarization state generator PSG is used as a group, and its instrument matrix is M21; the projection objective lens, the collimator lens and the polarization state analyzer PSA are used as a group, whose instrument matrix is M22, where M21 and M22 can be expressed as:
M21＝G, (7)M21=G, (7)
M22＝A·Mc·Mp. (8)M22 = A· Mc ·Mp. (8)
进行一次本征值标定，可以获得M21和M22。Perform an eigenvalue calibration to obtain M21 and M22.
2.2：将标定样品S放置在准直镜和偏振态分析器PSA之间，其中，偏振态产生器PSG和投影物镜和准直镜作为一组，其仪器矩阵为M23；将偏振态分析器PSA作为一组,其仪器矩阵为M24，其中，M23和M24可以表示为：2.2: The calibration sample S is placed between the collimating mirror and the polarization state analyzer PSA, wherein the polarization state generator PSG, the projection objective lens and the collimating lens are as a group, and the instrument matrix is M23; the polarization state analyzer PSA is As a group, its instrument matrix is M24, where M23 and M24 can be expressed as:
M23＝Mc·Mp·G, (9)M23=M c · M p · G, (9)
M24＝A. (10)M24=A. (10)
再进行一次本征值标定，从公式(7)和(10)中可以通过矩阵M21和M24，得到偏振态产生器PSG和偏振态分析器的仪器矩阵G和A。Perform eigenvalue calibration again, from formulas (7) and (10), the instrument matrices G and A of the polarization state generator PSG and the polarization state analyzer can be obtained through the matrices M21 and M24.
将步骤一或步骤二的结果带入步骤三，完成准直镜的标定，即获得准直镜的Mueller矩阵Mc，最终精确获得投影物镜偏振相差即Mp。The result of step 1 or step 2 is brought into step 3 to complete the calibration of the collimating lens, that is, the Mueller matrix M c of the collimating lens is obtained, and finally the polarization phase difference of the projection objective lens, ie M p , is accurately obtained.
步骤三的具体步骤为：The specific steps of step three are:
3.1将标定样品S放置在投影物镜和准直镜之间进行本征值标定，在此过程中，将偏振态产生器PSG和投影物镜作为一组，设其仪器矩阵为M11，将准直镜和偏振态分析器PSA作为另一组，设其仪器矩阵为M12。则M11和M12可以表示为：3.1 The calibration sample S is placed between the projection objective lens and the collimating lens for eigenvalue calibration. In this process, the polarization state generator PSG and the projection objective lens are used as a group, and the instrument matrix is set to M11, and the collimating lens is set as a group. And the polarization state analyzer PSA as another group, let its instrument matrix be M12. Then M11 and M12 can be expressed as:
M11＝Mp·G, (3)M11=M p ·G, (3)
M12＝A·Mc. (4)M12=A·M c . (4)
用本征值标定方法，可以求得M11和M12。Using the eigenvalue calibration method, M11 and M12 can be obtained.
3.2结合步骤一或步骤二中求得的偏振态产生器PSG和偏振态分析器PSA的仪器矩阵G和A，再通过矩阵运算可以获得Mp和Mc，如下式所示：3.2 Combining the instrument matrices G and A of the polarization state generator PSG and the polarization state analyzer PSA obtained in step 1 or step 2, M p and M c can be obtained by matrix operation, as shown in the following formula:
Mp＝M11·G-1, (5)M p =M11·G -1 , (5)
Mc＝A-1·M12. (6)M c =A -1 ·M12. (6)
在此，完成浸没光刻机偏振像差检测系统的标定，即获得了偏振态产生器PSG和偏振态分析器PSA的仪器矩阵G和A，准直镜的Mueller矩阵Mc，最终精确获得投影物镜的偏振相差即Mp。Here, the calibration of the polarization aberration detection system of the immersion lithography machine is completed, that is, the instrument matrices G and A of the polarization state generator PSG and polarization state analyzer PSA, and the Mueller matrix M c of the collimating mirror are obtained, and finally the projection is accurately obtained. The polarization difference of the objective lens is M p .
一般而言，标定样品S选择已有公开文献给出的最优的参考样品：空气、透光轴方向为水平方向的偏振片、透光轴方向为垂直方向的偏振片和快轴方位角为30°的四分之一波片；但在本发明中值得注意的是：步骤三中的标定样品为空气、偏振片和宽角四分之一波片；而步骤二中的2.1中标定样品为空气、偏振片和宽角四分之一波片，2.2中的标定样品为空气、偏振片和常规四分之一波片。In general, the calibration sample S selects the optimal reference sample given in the published literature: air, a polarizer with the transmittance axis in the horizontal direction, a polarizer with the transmittance axis in the vertical direction, and the azimuth angle of the fast axis is 30° quarter-wave plate; but it is worth noting in the present invention that the calibration samples in step 3 are air, polarizer and wide-angle quarter-wave plate; while the calibration samples in step 2.1 in step 2 For air, polarizer and wide-angle quarter-wave plate, the calibration samples in 2.2 are air, polarizer and conventional quarter-wave plate.
综上所示，以上仅为本发明的较佳实施例而已，并非用于限定本发明的保护范围。凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。To sum up, the above are only preferred embodiments of the present invention, and are not intended to limit the protection scope of the present invention. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090066925A1 (en) * | 2007-09-11 | 2009-03-12 | Canon Kabushiki Kaisha | Measurement apparatus, exposure apparatus, and device fabrication method |
| CN101949734A (en) * | 2010-08-20 | 2011-01-19 | 中国科学院上海光学精密机械研究所 | Method for improving measurement precision of light beam polarization degree |
| JP2012033661A (en) * | 2010-07-29 | 2012-02-16 | Nikon Corp | Polarization characteristic calculation method of optical system and device, polarization characteristic calculation program for optical system, and exposure method and device |
| CN104535192A (en) * | 2015-01-09 | 2015-04-22 | 北京理工大学 | Stokes polarization meter error calibration and compensation method based on wave plate rotating method |
| CN108871579A (en) * | 2018-04-27 | 2018-11-23 | 北京理工大学 | A kind of scaling method of polarized imaging system |
-
2019
- 2019-11-11 CN CN201911094589.5A patent/CN110764372B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090066925A1 (en) * | 2007-09-11 | 2009-03-12 | Canon Kabushiki Kaisha | Measurement apparatus, exposure apparatus, and device fabrication method |
| JP2012033661A (en) * | 2010-07-29 | 2012-02-16 | Nikon Corp | Polarization characteristic calculation method of optical system and device, polarization characteristic calculation program for optical system, and exposure method and device |
| CN101949734A (en) * | 2010-08-20 | 2011-01-19 | 中国科学院上海光学精密机械研究所 | Method for improving measurement precision of light beam polarization degree |
| CN104535192A (en) * | 2015-01-09 | 2015-04-22 | 北京理工大学 | Stokes polarization meter error calibration and compensation method based on wave plate rotating method |
| CN108871579A (en) * | 2018-04-27 | 2018-11-23 | 北京理工大学 | A kind of scaling method of polarized imaging system |
Non-Patent Citations (1)
| Title |
|---|
| HIROSHI NOMURA AND IWAO HIGASHIKAWA: "In-situ Mueller matrixpolarimetryof projection lenses for 193-nm lithography", 《PROC.OF SPIE》 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12523566B2 (en) | 2023-02-16 | 2026-01-13 | Samsung Electronics Co., Ltd. | Optical measurement apparatus |
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