CN204881959U - MEMS pressure sensing component - Google Patents
MEMS pressure sensing component Download PDFInfo
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- CN204881959U CN204881959U CN201520456295.3U CN201520456295U CN204881959U CN 204881959 U CN204881959 U CN 204881959U CN 201520456295 U CN201520456295 U CN 201520456295U CN 204881959 U CN204881959 U CN 204881959U
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Abstract
The utility model discloses a MEMS pressure sensing component, include: if notched basement, set up in the sensitive membrane of pressure of basement top, the opening of the sealed recess of the sensitive membrane of pressure is in order to form seal chamber, be located the movable polar plate and the fixed polar plate of seal chamber's constitution electric capacity structure, wherein, fixed polar plate is fixed in basic bottom groove's diapire, and movable polar plate suspension is in the top of fixed polar plate and relative with fixed polar plate, the sensitive membrane of pressure is connected with movable polar plate to drive the motion of movable polar plate under the ambient pressure effect. The utility model discloses a MEMS pressure sensing component opens pressure sensitive the branch with electrical testing, expose the sensitive membrane of pressure in the air, with the setting of electric capacity structure in the sealed chamber that sensitive membrane encloses with the basement by pressure, the movable polar plate of electric capacity structure is moved by the sensitive pellicular zone of pressure, has so both accomplished the function of pressure sensitivity, has shielded the electromagnetic interference of the external world to the electric capacity structure again.
Description
Technical field
The utility model relates to sensor field, more specifically, relates to a kind of MEMS pressure sensor.
Background technology
No matter current MEMS pressure sensor, be pressure resistance type or capacitive, all need pressure-sensitive films to expose in atmosphere, otherwise pressure sensitive film cannot make responsive reaction by air pressure to external world.This pressure sensitive film is usually used as electricity capacitor plate or resistance application, and can not be arranged in the electricity cavity closed because it must expose in atmosphere, extraneous electromagnetic interference (EMI) can impact the output of MEMS pressure sensor.
The mode that existing capacitive MEMS pressure transducer many employings single capacitor detects: form sealed vacuum chamber by pressure sensitive film and substrate, when the air pressure change in the external world, the pressure sensitive film be in above vacuum chamber can bend, thus the electric capacity causing pressure sensitive film and substrate to be formed can change, detect this capacitance variations and can obtain ambient pressure.
Above-mentioned capacitive MEMS pressure transducer detects ambient pressure change by single electric capacity, and in general, the capacitance change caused by ambient pressure change is all very little, and the error adopting single electric capacity to carry out detecting is very large.In addition, except the pressure change in the external world can cause capacitance variations, other undesired signal also can cause the change of electric capacity, as stress, temperature and other common-mode signal, all can affect the changing value of electric capacity.Single capacitor detects undesired signal to external world cannot filtering, can affect the noise level of output signal, reduce signal to noise ratio (S/N ratio).
Utility model content
The purpose of this utility model is to provide a kind of MEMS pressure sensor that outside electromagnetic interference can be shielded in electric capacity outside.
According to first aspect of the present utility model, provide a kind of MEMS pressure sensor, comprising: establish reeded substrate; Be arranged at the pressure sensitive film above described substrate, described pressure sensitive film seals the opening of described groove to form seal chamber; Be positioned at movable plate and the fixed polar plate of the formation capacitance structure of described seal chamber; Wherein, described fixed polar plate is fixed on the diapire of base groove, and described movable plate is suspended in the top of described fixed polar plate and relative with described fixed polar plate; Described pressure sensitive film is connected with described movable plate, moves to drive described movable plate under ambient pressure effect.
Preferably, described movable plate comprise be set up in parallel successively first reverses mass, mass is reversed in pressure conduction portion and second, described first reverses mass and described second, and to reverse mass symmetrical about described pressure conduction portion; Described pressure conduction portion reverses mass by the first elastic joint part and described first and is connected, and reverses mass be connected by the second elastic joint part and described second; The core in described pressure conduction portion is fixedly connected with by the core of the first anchor point with described pressure sensitive film; Described first core reversing mass is fixedly connected with the diapire of base groove by the second anchor point; The described second central part office reversing mass is fixedly connected with the diapire of base groove by the 3rd anchor point.
Preferably, described first elastic joint part comprises the first elastic beam, the first linking arm and the second linking arm; Described second elastic joint part comprises the second elastic beam, the 3rd linking arm and the 4th linking arm; Described first elastic beam and the second elastic beam are parallel to described pressure conduction portion; The two ends of described first elastic beam are connected with described pressure conduction portion respectively by first linking arm, and the centre of described first elastic beam is reversed mass by the second linking arm and described first and is connected; The two ends of described second elastic beam are connected with described pressure conduction portion respectively by one article of the 3rd linking arm, and the centre of described second elastic beam is reversed mass by the 4th linking arm and described second and is connected.
Preferably, described first torsion mass comprises the first rectangular frame structure and the 3rd elastic beam; Described first rectangular frame structure comprises the first movable plate and the second movable plate that are parallel to pressure conduction portion, and two articles of the 5th linking arms perpendicular to pressure conduction portion; Described 3rd elastic beam connects the mid point of two articles of described 5th linking arms, and its center is fixedly connected with the diapire of base groove by described second anchor point; Described second reverses mass comprises the second rectangular frame structure and the 4th elastic beam; Described second rectangular frame structure comprises the 3rd movable plate and the 4th movable plate that are parallel to pressure conduction portion, and two articles of the 6th linking arms perpendicular to pressure conduction portion; Described 4th elastic beam connects the mid point of two articles of described 6th linking arms, and its center is fixedly connected with the diapire of base groove by described 3rd anchor point; Described fixed polar plate comprises first, second, third, fourth fixed polar plate, and described first, second, third, fourth fixed polar plate and described first, second, third, fourth movable plate one_to_one corresponding form first, second, third, fourth capacitance structure.
Preferably, described first capacitance structure and the 4th capacitance structure, by metal lead wire parallel connection, form first group of electric capacity; Described second capacitance structure and the 3rd capacitance structure, by metal lead wire parallel connection, form second group of electric capacity; Described first group of electric capacity and described second group of electric capacity form a pair differential capacitance.
Preferably, described first torsion mass comprises the first rectangular frame structure, the 3rd elastic beam and the 7th linking arm; Described first rectangular frame structure is provided with the first opening away from the centre position on the one side in pressure conduction portion; It is inner that described 3rd elastic beam is positioned at the first rectangular frame, and two ends connect the opposite side of the first rectangular frame structure perpendicular to pressure conduction portion respectively; One end of described 7th linking arm connects the mid point of the 3rd elastic beam, and the other end stretches out the first rectangular frame from the first opening part and is connected to the second anchor point; The upper end Bonding pressure sensitive membrane of described second anchor point, lower end connects the diapire of base groove; Described second reverses mass comprises the second rectangular frame structure, the 4th elastic beam and the 8th linking arm; Described second rectangular frame structure is provided with the second opening away from the centre position on the one side in pressure conduction portion; It is inner that described 4th elastic beam is positioned at the second rectangular frame, and two ends connect the opposite side of the second rectangular frame structure perpendicular to pressure conduction portion respectively; One end of described 8th linking arm connects the mid point of the 4th elastic beam, and the other end stretches out the second rectangular frame from the second opening part and is connected to the 3rd anchor point; The upper end Bonding pressure sensitive membrane of described 3rd anchor point, lower end connects the diapire of base groove.
Preferably, described fixed polar plate comprises first, second, third, fourth fixed polar plate of the below at four angles laying respectively at the first rectangular frame, first, second fixed polar plate described is relatively away from pressure conduction portion, and described 3rd, the 4th fixed polar plate is relatively close to pressure conduction portion; Described fixed polar plate also comprises the 5th, the 6th, the 7th, the 8th fixed polar plate of the below at four angles laying respectively at the second rectangular frame, described 5th, the 6th fixed polar plate is relatively close to pressure conduction portion, and described 7th, the 8th fixed polar plate is relatively away from pressure conduction portion; First to the 8th fixed polar plate and above it torsion mass of corresponding part form the first to the 8th capacitance structure, wherein first, second, the 7th and the 8th capacitance structure is in parallel by lead-in wire, form first group of electric capacity, three, the 4th, the 5th and the 6th capacitance structure is in parallel by lead-in wire, forms second group of electric capacity; Described first group of electric capacity and described second group of electric capacity form a pair differential capacitance.
Preferably, also arrange stop bosses in described seal chamber, described spacing preiection portion is arranged at the diapire of base groove and is positioned at the below in described pressure conduction portion.
Preferably, described pressure sensitive film is monocrystalline silicon material.
Preferably, the thickness of described pressure sensitive film is 10um-30um.
MEMS pressure sensor of the present utility model, presser sensor and electrical detection are separated, pressure sensitive film is exposed in atmosphere, capacitance structure is arranged in the annular seal space surrounded by pressure sensitive film and substrate, the movable plate of capacitance structure is driven by pressure sensitive film, so both complete pressure-sensitive function, shield again the electromagnetic interference (EMI) of outer bound pair capacitance structure.
Inventor of the present utility model finds, in the prior art, does not also have a kind of MEMS pressure sensor that outside electromagnetic interference can be shielded in electric capacity outside.Therefore, the technical assignment that the utility model will realize or technical matters to be solved are that those skilled in the art never expect or do not anticipate, therefore the utility model is a kind of new technical scheme.
By referring to the detailed description of accompanying drawing to exemplary embodiment of the present utility model, further feature of the present utility model and advantage thereof will become clear.
Accompanying drawing explanation
In the description combined and the accompanying drawing forming a part for instructions shows embodiment of the present utility model, and illustrate that one is used from and explains principle of the present utility model together with it.
Fig. 1 is the structural representation of the utility model MEMS pressure sensor first embodiment.
Fig. 2 is the floor map of the capacitance structure of the utility model MEMS pressure sensor first embodiment.
Fig. 3-4 is that the MEMS pressure sensor of the utility model first embodiment is by the constitutional diagram under ambient pressure change.
Fig. 5-18 is manufacture process schematic diagram of the MEMS pressure sensor of the utility model first embodiment.
Figure 19 is the floor map of the capacitance structure of the utility model MEMS pressure sensor second embodiment.
Embodiment
Various exemplary embodiment of the present utility model is described in detail now with reference to accompanying drawing.It should be noted that: unless specifically stated otherwise, otherwise positioned opposite, the numerical expression of the parts of setting forth in these embodiments and step and numerical value do not limit scope of the present utility model.
Illustrative to the description only actually of at least one exemplary embodiment below, never as any restriction to the utility model and application or use.
May not discuss in detail for the known technology of person of ordinary skill in the relevant, method and apparatus, but in the appropriate case, described technology, method and apparatus should be regarded as a part for instructions.
In all examples with discussing shown here, any occurrence should be construed as merely exemplary, instead of as restriction.Therefore, other example of exemplary embodiment can have different values.
It should be noted that: represent similar terms in similar label and letter accompanying drawing below, therefore, once be defined in an a certain Xiang Yi accompanying drawing, then do not need to be further discussed it in accompanying drawing subsequently.
Introduce the first embodiment of the utility model MEMS pressure sensor with reference to figure 1-4, comprising:
If reeded substrate 1, be arranged at the pressure sensitive film 5 above substrate 1, the opening of pressure sensitive film 5 sealed groove is to form seal chamber 500.
Be positioned at movable plate and the fixed polar plate of the formation capacitance structure of seal chamber 500; Wherein, fixed polar plate is fixed on the diapire of substrate 1 groove, and movable plate is suspended in the top of fixed polar plate and relative with fixed polar plate; Pressure sensitive film 5 is connected with movable plate, to drive movable plate to move under ambient pressure effect.
The capacitance structure of the utility model MEMS pressure sensor is introduced with reference to Fig. 1 and 2:
Fixed polar plate comprises the first fixed polar plate 601, second fixed polar plate 602 of laid out in parallel successively, the 3rd fixed polar plate 603 and the 4th fixed polar plate 604.
Movable plate comprises first of laid out in parallel successively and reverses mass, pressure conduction portion 350 and the second torsion mass, and first reverses mass and second reverses mass about pressure conduction portion 350 symmetry.
Pressure conduction portion 350 is strip, is fixedly connected with by the first anchor point 100 at core with the core of pressure sensitive film 5; Pressure conduction portion 350 reverses mass by the first elastic joint part and first and is connected, and reverses mass be connected by the second elastic joint part and second; Arrange through above, movable plate wherein heart part is connected with pressure sensitive film 5 by the first anchor point 100, can first, second be made to reverse mass by the first elastic joint part and the second elastic joint part under the drive of pressure sensitive film 5 and to twist motion.
First reverses mass comprises the first rectangular frame structure and the 3rd elastic beam 312; First rectangular frame structure comprises the first movable plate 301 and the second movable plate 302 being parallel to pressure conduction portion 350, and two articles of the 5th linking arms 311 perpendicular to pressure conduction portion 350; 3rd elastic beam 312 connects the mid point of two article of the 5th linking arm 311, and its center is fixedly connected with by the diapire of the second anchor point 200 with substrate 1 groove.
Second reverses mass comprises the second rectangular frame structure and the 4th elastic beam 322; Second rectangular frame structure comprises the 3rd movable plate 303 and the 4th movable plate 304 that are parallel to pressure conduction portion 350, and two articles of the 6th linking arms 321 perpendicular to pressure conduction portion 350; 4th elastic beam 322 connects the mid point of two article of the 6th linking arm 321, and its center is fixedly connected with by the diapire of the 3rd anchor point 300 with substrate 1 groove.
First elastic joint part comprises the first elastic beam 313, first linking arm 314 and the second linking arm 315; First elastic beam 313 is parallel to pressure conduction portion 350; The two ends of the first elastic beam 313 are connected with pressure conduction portion 350 respectively by first linking arm 314, and the second movable plate 302 that mass is reversed by the second linking arm 315 and first in the centre of the first elastic beam 313 is connected.
Second elastic joint part comprises the second elastic beam 323, the 3rd linking arm 324 and the 4th linking arm 325; Second elastic beam 323 is parallel to pressure conduction portion 350; The two ends of the second elastic beam 323 are connected with pressure conduction portion 350 respectively by one article of the 3rd linking arm 324, and the 3rd movable plate 303 that mass is reversed by the 4th linking arm 325 and second in the centre of the second elastic beam 323 is connected.
First movable plate 301 and the first fixed polar plate 601 form the first capacitance structure C1-1, second movable plate 302 and the second fixed polar plate 602 form the first capacitance structure C1-2,3rd movable plate 303 and the 3rd fixed polar plate 603 form the 3rd capacitance structure C2-1, and the 4th movable plate 304 and the 4th fixed polar plate 604 form the first capacitance structure C2-2.
First capacitance structure C1-1 and the 4th capacitance structure C2-2 is in parallel by metal lead wire, forms first group of electric capacity C1; Second capacitance structure C1-2 and the 3rd capacitance structure C2-1 is in parallel by metal lead wire, forms second group of electric capacity C2; First group of electric capacity C1 and second group of electric capacity C2 forms a pair differential capacitance.
Wherein, also arrange stop bosses 122 in seal chamber 500, spacing preiection portion 122 is arranged at the diapire of substrate 1 groove and is positioned at the below in pressure conduction portion 350.Spacing preiection portion 122, for limiting the displacement in pressure conduction portion 350, avoids movable plate to contact fixed polar plate and causes component wear disabler.
Wherein, first, second, third anchor point 100,200,300 is preferably oxide.Pressure sensitive film 5 is preferably monocrystalline silicon material, and thickness is preferably 10um-30um.
When ambient pressure acts on pressure sensitive film 5, pressure sensitive film 5 can drive movable plate to move, cause the change of the spacing of movable plate and fixed electorde, thus cause capacitance variations, just can be realized the detection of pressure to external world by the change of Detection capacitance.Pressure sensitive film 5 is received earth potential, has both achieved the detection of pressure to external world, again outside electromagnetic interference is shielded outside electric department divides, reach the object improving MEMS pressure sensor precision.
The Differential Detection principle of the utility model MEMS sensing element is introduced with reference to figure 3 and Fig. 4:
Shown in figure 3, when ambient pressure reduces, pressure sensitive film 5 epirelief, pressure conduction portion 350 is driven to move upward, distance between second movable plate 302 and the second fixed polar plate 602 increases, distance between 3rd movable plate 303 and the 3rd fixed polar plate 603 increases, and causes the second capacitance structure C1-2 and the 3rd to hold structure C 2-1 and reduces simultaneously; Distance between first movable plate 301 and the first fixed polar plate 601 reduces, and the distance between the 4th movable plate 304 and the 4th fixed polar plate 604 reduces, and causes the first capacitance structure C1-1 and the 4th capacitance structure C2-2 to increase simultaneously.
Shown in figure 4, when ambient pressure increases, pressure sensitive film 5 is recessed, pressure conduction portion 350 is driven to move downward, distance between second movable plate 302 and the second fixed polar plate 602 reduces, distance between 3rd movable plate 303 and the 3rd fixed polar plate 603 reduces, and causes the second capacitance structure C1-2 and the 3rd to hold structure C 2-1 and increases simultaneously; Distance between first movable plate 301 and the first fixed polar plate 601 increases, and the distance between the 4th movable plate 304 and the 4th fixed polar plate 604 increases, and causes the first capacitance structure C1-1 and the 4th capacitance structure C2-2 to reduce simultaneously.
Visible first capacitance structure C1-1 and the 4th capacitance structure C2-2 increases simultaneously or reduces, second capacitance structure C1-2 and the 3rd holds structure C 2-1 and reduces simultaneously or increase, first group of electric capacity C1 is formed by the first capacitance structure C1-1 and the 4th capacitance structure C2-2, second group of electric capacity C2 is formed by the second capacitance structure C1-2 and the 3rd capacitance structure C2-1, first group of electric capacity C1 and second group of electric capacity C2 partners differential capacitance, carry out signal transacting by differential capacitance detection circuit, just can test out ambient pressure.
The manufacture process of the MEMS pressure sensor of above-mentioned first embodiment is introduced with reference to figure 5-18:
S101, with reference to shown in figure 5, provide the first wafer 11; Shown in figure 6, on the first wafer 11, deposition oxide is as separation layer 17; Shown in figure 7, depositing metal layers on separation layer 17; Composition and etching are carried out to metal level, to form fixed polar plate;
S102, with reference to shown in figure 8, on separation layer 17 and fixed polar plate, deposition oxide is as the first oxide layer 12; Shown in figure 9, composition and etching are carried out to the first oxide layer 12, to expose fixed polar plate, and form the 3rd outer shroud support portion 121, bonding step 200 and 300 and spacing preiection portion 122; Bonding step 200 and 300 is respectively the first torsion mass and second and reverses mass at suprabasil fixed anchor point;
Shown in S103, reference Figure 10, provide the second wafer 13; With reference to shown in Figure 11, composition and etching are carried out to the second wafer 13, to form the first connecting portion 132 being positioned at center in the front of the second wafer 13, and the first outer shroud support portion 131;
Shown in S104, reference Figure 12, provide wafer 15; With reference to shown in Figure 13, wafer 15 deposits the second oxide layer 14; With reference to shown in Figure 14, composition and etching are carried out to the second oxide layer 14, to form the second connecting portion 100 being positioned at center, and the second outer shroud support portion 141; Second connecting portion 100 is the fixed anchor point of pressure conduction portion on pressure sensitive film 5;
Shown in S105, reference Figure 15, overturn the second wafer 13, by the first connecting portion 132 and the second connecting portion 100 bonding, and by the first outer shroud support portion 131 and the second outer shroud support portion 141 bonding;
Shown in S106, reference Figure 16, the second wafer 13 is thinned to design thickness, composition and etching are carried out, to form the movable plate corresponding to fixed polar plate to the second wafer 13; Movable plate comprises the first torsion mass, mass is reversed in pressure conduction portion and second; Here etching can be deep reaction ion etching (DRIE, DeepReactiveIonEtching);
S107, with reference to shown in Figure 17, by the back side bonding of the 3rd outer shroud support portion 121 and the second wafer 13, make that movable plate is relative with fixed polar plate forms capacitance structure; After this step bonding completes, the first wafer 11, wafer 15, and each layer between the first wafer 11 and wafer 15, surround seal chamber jointly, in fixed polar plate and movable plate being encapsulated in;
Shown in S108, reference Figure 18, wafer 15 is carried out thinning with mineralization pressure sensitive membrane 5.
The second embodiment of the utility model MEMS pressure sensor is introduced, as can be seen from the figure: first reverses mass comprises the first rectangular frame structure, the 3rd elastic beam 312 and the 7th linking arm 3001 with reference to Figure 19; First rectangular frame structure is provided with the first opening away from the centre position on the one side in pressure conduction portion 350; It is inner that 3rd elastic beam 312 is positioned at the first rectangular frame, and two ends connect the opposite side of the first rectangular frame structure perpendicular to pressure conduction portion 350 respectively; One end of 7th linking arm 3001 connects the mid point of the 3rd elastic beam 312, and the other end stretches out the first rectangular frame from the first opening part and is connected to the second anchor point (200); Upper end Bonding pressure sensitive membrane (5) of the second anchor point (200), lower end connects the diapire of substrate (1) groove.
Second reverses mass comprises the second rectangular frame structure, the 4th elastic beam 322 and the 8th linking arm 3002; Second rectangular frame structure is provided with the second opening away from the centre position on the one side in pressure conduction portion 350; It is inner that 4th elastic beam 322 is positioned at the second rectangular frame, and two ends connect the opposite side of the second rectangular frame structure perpendicular to pressure conduction portion 350 respectively; One end of 8th linking arm 3002 connects the mid point of the 4th elastic beam 322, and the other end stretches out the second rectangular frame from the second opening part and is connected to the 3rd anchor point (300); Upper end Bonding pressure sensitive membrane (5) of the 3rd anchor point (300), lower end connects the diapire of substrate (1) groove.
Fixed polar plate comprises first, second, third, fourth fixed polar plate 601A, 602A, 603A, 604A of the below at four angles laying respectively at the first rectangular frame, first, second fixed polar plate 601A, 602A relatively away from pressure conduction portion the 350, three, the 4th fixed polar plate 603A, 604A relatively close to pressure conduction portion 350.
Fixed polar plate also comprises the 5th, the 6th, the 7th, the 8th fixed polar plate 605A, 606A, 607A, 608A of the below at four angles laying respectively at the second rectangular frame, five, the 6th fixed polar plate 605A, 606A relatively close to pressure conduction portion the 350, seven, the 8th fixed polar plate 607A, 608A relatively away from pressure conduction portion 350.
First to the 8th fixed polar plate (601A-608A) with its above the torsion mass of corresponding part form the first to the 8th capacitance structure, wherein first, second, the 7th and the 8th capacitance structure is in parallel by lead-in wire, form first group of electric capacity, three, the 4th, the 5th and the 6th capacitance structure is in parallel by lead-in wire, forms second group of electric capacity; First group of electric capacity and second group of electric capacity form a pair differential capacitance.
Second embodiment reverses mass by first and the second support anchor point reversing mass is moved to outside mass, and make two ends Bonding pressure sensitive membrane and the substrate respectively of anchor point, anchor point is made to be non-suspended state, quality and the strength of joint of bonding can be ensured when reversing mass and substrate bonding, thus make the second embodiment more easy on technique realizes, and do not affect the motor pattern of pressure sensitive film.
The utility model makes metal electrode as fixed polar plate on substrate, then etching oxidation layer is protruding, for the bonding of movable plate layer reserves space.The top layer of element is pressure sensitive film, the motion that extraneous pressure can cause pressure sensitive film upper and lower, is movable plate layer, together with the center section of movable plate and the center section of pressure sensitive film are anchored on by bonding below pressure sensitive film.When pressure acts on pressure sensitive film, pressure sensitive film can drive movable plate to move, and then causes the capacitance variations between the metal electrode on movable plate and substrate, realizes the detection of pressure to external world.
Be described in detail specific embodiments more of the present utility model by example, but it should be appreciated by those skilled in the art, above example is only to be described, instead of in order to limit scope of the present utility model.It should be appreciated by those skilled in the art, when not departing from scope and spirit of the present utility model, above embodiment can be modified.Scope of the present utility model is limited by claims.
Claims (10)
1. a MEMS pressure sensor, is characterized in that, comprising:
If reeded substrate (1);
Be arranged at the pressure sensitive film (5) of described substrate (1) top, described pressure sensitive film (5) seals the opening of described groove to form seal chamber (500);
Be positioned at movable plate and the fixed polar plate of the formation capacitance structure of described seal chamber (500);
Wherein, described fixed polar plate is fixed on the diapire of substrate (1) groove, and described movable plate is suspended in the top of described fixed polar plate and relative with described fixed polar plate; Described pressure sensitive film (5) is connected with described movable plate, moves to drive described movable plate under ambient pressure effect.
2. element according to claim 1, is characterized in that,
Described movable plate comprise be set up in parallel successively first reverses mass, pressure conduction portion (350) and second reverse mass, described first reverses mass and described second, and to reverse mass symmetrical about described pressure conduction portion (350);
Described pressure conduction portion (350) is reversed mass by the first elastic joint part and described first and is connected, and reverses mass be connected by the second elastic joint part and described second;
The core of described pressure conduction portion (350) is fixedly connected with by the core of the first anchor point (100) with described pressure sensitive film (5); Described first core reversing mass is fixedly connected with by the diapire of the second anchor point (200) with substrate (1) groove; The described second central part office reversing mass is fixedly connected with the diapire of substrate (1) groove by the 3rd anchor point (300).
3. element according to claim 2, is characterized in that,
Described first elastic joint part comprises the first elastic beam (313), the first linking arm (314) and the second linking arm (315); Described second elastic joint part comprises the second elastic beam (323), the 3rd linking arm (324) and the 4th linking arm (325); Described first elastic beam (313) and the second elastic beam (323) are parallel to described pressure conduction portion (350);
The two ends of described first elastic beam (313) are connected with described pressure conduction portion (350) respectively by first linking arm (314), and the centre of described first elastic beam (313) is reversed mass by the second linking arm (315) and described first and is connected;
The two ends of described second elastic beam (323) are connected with described pressure conduction portion (350) respectively by one article of the 3rd linking arm (324), and the centre of described second elastic beam (323) is reversed mass by the 4th linking arm (325) and described second and is connected.
4. element according to claim 2, is characterized in that,
Described first reverses mass comprises the first rectangular frame structure and the 3rd elastic beam (312); Described first rectangular frame structure comprises the first movable plate (301) and the second movable plate (302) that are parallel to pressure conduction portion (350), and two articles of the 5th linking arms (311) perpendicular to pressure conduction portion (350); Described 3rd elastic beam (312) connects the mid point of two articles of described 5th linking arms (311), and its center is fixedly connected with the diapire of substrate (1) groove by described second anchor point (200);
Described second reverses mass comprises the second rectangular frame structure and the 4th elastic beam (322); Described second rectangular frame structure comprises the 3rd movable plate (303) and the 4th movable plate (304) that are parallel to pressure conduction portion (350), and two articles of the 6th linking arms (321) perpendicular to pressure conduction portion (350); Described 4th elastic beam (322) connects the mid point of two articles of described 6th linking arms (321), and its center is fixedly connected with the diapire of substrate (1) groove by described 3rd anchor point (300);
Described fixed polar plate comprises first, second, third, fourth fixed polar plate (601,602,603,604), and described first, second, third, fourth fixed polar plate (601,602,603,604) and described first, second, third, fourth movable plate (301,302,303,304) one_to_one corresponding form first, second, third, fourth capacitance structure (C1-1, C1-2, C2-1, C2-2).
5. element according to claim 4, is characterized in that,
Described first capacitance structure (C1-1) and the 4th capacitance structure (C2-2), by lead-in wire parallel connection, form first group of electric capacity (C1); Described second capacitance structure (C1-2) and the 3rd capacitance structure (C2-1), by lead-in wire parallel connection, form second group of electric capacity (C2); Described first group of electric capacity (C1) and described second group of electric capacity (C2) form a pair differential capacitance.
6. element according to claim 2, is characterized in that,
Described first reverses mass comprises the first rectangular frame structure, the 3rd elastic beam (312) and the 7th linking arm (3001); Described first rectangular frame structure is provided with the first opening away from the centre position on the one side of pressure conduction portion (350); It is inner that described 3rd elastic beam (312) is positioned at the first rectangular frame, and two ends connect the opposite side of the first rectangular frame structure perpendicular to pressure conduction portion (350) respectively; One end of described 7th linking arm (3001) connects the mid point of the 3rd elastic beam (312), and the other end stretches out the first rectangular frame from the first opening part and is connected to the second anchor point (200); Upper end Bonding pressure sensitive membrane (5) of described second anchor point (200), lower end connects the diapire of substrate (1) groove;
Described second reverses mass comprises the second rectangular frame structure, the 4th elastic beam (322) and the 8th linking arm (3002); Described second rectangular frame structure is provided with the second opening away from the centre position on the one side of pressure conduction portion (350); It is inner that described 4th elastic beam (322) is positioned at the second rectangular frame, and two ends connect the opposite side of the second rectangular frame structure perpendicular to pressure conduction portion (350) respectively; One end of described 8th linking arm (3002) connects the mid point of the 4th elastic beam (322), and the other end stretches out the second rectangular frame from the second opening part and is connected to the 3rd anchor point (300); Upper end Bonding pressure sensitive membrane (5) of described 3rd anchor point (300), lower end connects the diapire of substrate (1) groove.
7. element according to claim 6, is characterized in that,
Described fixed polar plate comprises first, second, third, fourth fixed polar plate (601A, 602A, 603A, 604A) of the below at four angles laying respectively at the first rectangular frame, described first, second fixed polar plate (601A, 602A) is relatively away from pressure conduction portion (350), and described 3rd, the 4th fixed polar plate (603A, 604A) is relatively close to pressure conduction portion (350);
Described fixed polar plate also comprises the 5th, the 6th, the 7th, the 8th fixed polar plate (605A, 606A, 607A, 608A) of the below at four angles laying respectively at the second rectangular frame, described 5th, the 6th fixed polar plate (605A, 606A) is relatively close to pressure conduction portion (350), and described 7th, the 8th fixed polar plate (607A, 608A) is relatively away from pressure conduction portion (350);
First to the 8th fixed polar plate and above it torsion mass of corresponding part form the first to the 8th capacitance structure, wherein first, second, the 7th and the 8th capacitance structure is in parallel by lead-in wire, form first group of electric capacity, three, the 4th, the 5th and the 6th capacitance structure is in parallel by lead-in wire, forms second group of electric capacity; Described first group of electric capacity and described second group of electric capacity form a pair differential capacitance.
8. the element according to any one of claim 2-7, it is characterized in that, also arrange stop bosses (122) in described seal chamber (500), described spacing preiection portion (122) is arranged at the diapire of substrate (1) groove and is positioned at the below of described pressure conduction portion (350).
9. the element according to any one of claim 1-7, is characterized in that, described pressure sensitive film (5) is monocrystalline silicon material.
10. the element according to any one of claim 1-7, is characterized in that, the thickness of described pressure sensitive film (5) is 10um-30um.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520456295.3U CN204881959U (en) | 2015-06-29 | 2015-06-29 | MEMS pressure sensing component |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104897334A (en) * | 2015-06-29 | 2015-09-09 | 歌尔声学股份有限公司 | MEMS (Micro-electromechanical Systems) pressure sensing element |
| TWI623733B (en) * | 2016-08-25 | 2018-05-11 | 蘇州明皜傳感科技有限公司 | Pressure sensor and manufacture method thereof |
| CN111704104A (en) * | 2016-03-31 | 2020-09-25 | 意法半导体股份有限公司 | Method for manufacturing a MEMS pressure sensor and corresponding MEMS pressure sensor |
| CN112125275A (en) * | 2020-11-26 | 2020-12-25 | 南京高华科技股份有限公司 | MEMS capacitive sensor and preparation method thereof |
| CN112583227A (en) * | 2020-11-26 | 2021-03-30 | 南京高华科技股份有限公司 | MEMS inductive vibration energy collector and preparation method thereof |
| CN115259069A (en) * | 2022-06-24 | 2022-11-01 | 无锡韦感半导体有限公司 | Micro-mechanical capacitance compensation structure and preparation method thereof |
-
2015
- 2015-06-29 CN CN201520456295.3U patent/CN204881959U/en not_active Withdrawn - After Issue
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104897334A (en) * | 2015-06-29 | 2015-09-09 | 歌尔声学股份有限公司 | MEMS (Micro-electromechanical Systems) pressure sensing element |
| WO2017000501A1 (en) * | 2015-06-29 | 2017-01-05 | 歌尔声学股份有限公司 | Mems pressure sensing element |
| CN111704104A (en) * | 2016-03-31 | 2020-09-25 | 意法半导体股份有限公司 | Method for manufacturing a MEMS pressure sensor and corresponding MEMS pressure sensor |
| TWI623733B (en) * | 2016-08-25 | 2018-05-11 | 蘇州明皜傳感科技有限公司 | Pressure sensor and manufacture method thereof |
| CN112125275A (en) * | 2020-11-26 | 2020-12-25 | 南京高华科技股份有限公司 | MEMS capacitive sensor and preparation method thereof |
| CN112583227A (en) * | 2020-11-26 | 2021-03-30 | 南京高华科技股份有限公司 | MEMS inductive vibration energy collector and preparation method thereof |
| CN112125275B (en) * | 2020-11-26 | 2021-04-06 | 南京高华科技股份有限公司 | MEMS capacitive sensor and preparation method thereof |
| CN115259069A (en) * | 2022-06-24 | 2022-11-01 | 无锡韦感半导体有限公司 | Micro-mechanical capacitance compensation structure and preparation method thereof |
| CN115259069B (en) * | 2022-06-24 | 2025-11-07 | 无锡韦感半导体有限公司 | Micromechanical capacitance compensation structure and preparation method thereof |
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Address after: 261031 Dongfang Road, Weifang high tech Development Zone, Shandong, China, No. 268 Patentee after: Goertek Inc. Address before: 261031 Dongfang Road, Weifang high tech Development Zone, Shandong, China, No. 268 Patentee before: Goertek Inc. |
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Granted publication date: 20151216 Effective date of abandoning: 20170721 |