GB2145284B - Processes for applying a semiconductor material to a substrate - Google Patents
Processes for applying a semiconductor material to a substrateInfo
- Publication number
- GB2145284B GB2145284B GB08420903A GB8420903A GB2145284B GB 2145284 B GB2145284 B GB 2145284B GB 08420903 A GB08420903 A GB 08420903A GB 8420903 A GB8420903 A GB 8420903A GB 2145284 B GB2145284 B GB 2145284B
- Authority
- GB
- United Kingdom
- Prior art keywords
- processes
- applying
- substrate
- semiconductor material
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
- H10P14/2901—Materials
- H10P14/2902—Materials being Group IVA materials
- H10P14/2905—Silicon, silicon germanium or germanium
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/24—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using chemical vapour deposition [CVD]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/27—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using selective deposition, e.g. simultaneous growth of monocrystalline and non-monocrystalline semiconductor materials
- H10P14/271—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using selective deposition, e.g. simultaneous growth of monocrystalline and non-monocrystalline semiconductor materials characterised by the preparation of substrate for selective deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
- H10P14/2901—Materials
- H10P14/2923—Materials being conductive materials, e.g. metallic silicides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/34—Deposited materials, e.g. layers
- H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
- H10P14/3404—Deposited materials, e.g. layers characterised by the chemical composition being Group IVA materials
- H10P14/3411—Silicon, silicon germanium or germanium
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB838322273A GB8322273D0 (en) | 1983-08-18 | 1983-08-18 | Applying semiconductor material to substrate |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB8420903D0 GB8420903D0 (en) | 1984-09-19 |
| GB2145284A GB2145284A (en) | 1985-03-20 |
| GB2145284B true GB2145284B (en) | 1987-05-28 |
Family
ID=10547502
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB838322273A Pending GB8322273D0 (en) | 1983-08-18 | 1983-08-18 | Applying semiconductor material to substrate |
| GB08420903A Expired GB2145284B (en) | 1983-08-18 | 1984-08-17 | Processes for applying a semiconductor material to a substrate |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB838322273A Pending GB8322273D0 (en) | 1983-08-18 | 1983-08-18 | Applying semiconductor material to substrate |
Country Status (5)
| Country | Link |
|---|---|
| DE (1) | DE3430379A1 (en) |
| FR (1) | FR2550885A1 (en) |
| GB (2) | GB8322273D0 (en) |
| IT (1) | IT1175603B (en) |
| NL (1) | NL8402533A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19645083C2 (en) * | 1996-11-01 | 2000-01-27 | Austria Card Gmbh Wien | Contactless chip card with transponder coil |
| US8044472B2 (en) | 2003-03-25 | 2011-10-25 | Kulite Semiconductor Products, Inc. | Nanotube and graphene semiconductor structures with varying electrical properties |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1465112A1 (en) * | 1963-10-04 | 1969-01-23 | Anritsu Electric Company Ltd | Semiconductor layers deposited in a vacuum for elasto resistance elements |
| GB1244551A (en) * | 1969-02-28 | 1971-09-02 | British Aircraft Corp Ltd | Improvements relating to acoustic detector arrays |
| US3673354A (en) * | 1969-05-08 | 1972-06-27 | Matsushita Electric Industrial Co Ltd | Semiconductor stress transducer |
| JPS5438491B1 (en) * | 1969-09-22 | 1979-11-21 | ||
| US3805601A (en) * | 1972-07-28 | 1974-04-23 | Bell & Howell Co | High sensitivity semiconductor strain gauge |
-
1983
- 1983-08-18 GB GB838322273A patent/GB8322273D0/en active Pending
-
1984
- 1984-08-17 FR FR8412936A patent/FR2550885A1/en active Pending
- 1984-08-17 DE DE3430379A patent/DE3430379A1/en not_active Withdrawn
- 1984-08-17 NL NL8402533A patent/NL8402533A/en not_active Application Discontinuation
- 1984-08-17 IT IT22345/84A patent/IT1175603B/en active
- 1984-08-17 GB GB08420903A patent/GB2145284B/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| IT1175603B (en) | 1987-07-15 |
| FR2550885A1 (en) | 1985-02-22 |
| GB8322273D0 (en) | 1983-09-21 |
| DE3430379A1 (en) | 1985-03-07 |
| GB8420903D0 (en) | 1984-09-19 |
| IT8422345A0 (en) | 1984-08-17 |
| NL8402533A (en) | 1985-03-18 |
| GB2145284A (en) | 1985-03-20 |
| IT8422345A1 (en) | 1986-02-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PCNP | Patent ceased through non-payment of renewal fee |