GB2198736B - Photopolymerisable material - Google Patents

Photopolymerisable material

Info

Publication number: GB2198736B
Authority: GB; United Kingdom
Prior art keywords: photopolymerisable material; photopolymerisable
Prior art date: 1986-12-19
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

GB8630357A

Other versions

GB2198736A (en

GB8630357D0 (en

Inventor

Dr Wolfgang Haubold

Norbert Kraus

Dr Gunter Israel

Dr Uwe Muller

Dr Thomas Taplick

Prof Dr Hans-Joachim Timpe

Prof Dr Manfred Ratzsch

Reingard Knopel

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Filmfabrik Wolfen VEB

Original Assignee

Filmfabrik Wolfen VEB

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-12-19

Filing date

1986-12-19

Publication date

1990-04-04

1986-12-01 Priority to DE19863641014 priority Critical patent/DE3641014A1/en

1986-12-03 Priority to CH482786A priority patent/CH669052A5/en

1986-12-19 Application filed by Filmfabrik Wolfen VEB filed Critical Filmfabrik Wolfen VEB

1986-12-19 Priority to GB8630357A priority patent/GB2198736B/en

1986-12-24 Priority to FR8618176A priority patent/FR2609187A1/en

1987-01-28 Publication of GB8630357D0 publication Critical patent/GB8630357D0/en

1988-06-22 Publication of GB2198736A publication Critical patent/GB2198736A/en

1990-04-04 Application granted granted Critical

1990-04-04 Publication of GB2198736B publication Critical patent/GB2198736B/en

2006-12-19 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

Classifications

- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/32—Compounds containing nitrogen bound to oxygen
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Spectroscopy & Molecular Physics (AREA)
Medicinal Chemistry (AREA)
Health & Medical Sciences (AREA)
Polymers & Plastics (AREA)
Organic Chemistry (AREA)
Engineering & Computer Science (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Materials For Photolithography (AREA)
Polymerisation Methods In General (AREA)

GB8630357A 1986-12-19 1986-12-19 Photopolymerisable material Expired - Fee Related GB2198736B (en)

Priority Applications (4)

Application Number	Priority Date	Filing Date	Title
DE19863641014 DE3641014A1 (en)	1986-12-19	1986-12-01	PHOTOPOLYMERIZABLE MATERIAL
CH482786A CH669052A5 (en)	1986-12-19	1986-12-03	PHOTOPOLYMERIZABLE MATERIAL.
GB8630357A GB2198736B (en)	1986-12-19	1986-12-19	Photopolymerisable material
FR8618176A FR2609187A1 (en)	1986-12-19	1986-12-24	PHOTOPOLYMERIZABLE MATERIAL, WHICH MAY SUPPORT MODERATE HEAT

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
GB8630357A GB2198736B (en)	1986-12-19	1986-12-19	Photopolymerisable material

Publications (3)

Publication Number	Publication Date
GB8630357D0 GB8630357D0 (en)	1987-01-28
GB2198736A GB2198736A (en)	1988-06-22
GB2198736B true GB2198736B (en)	1990-04-04

Family

ID=10609272

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
GB8630357A Expired - Fee Related GB2198736B (en)	1986-12-19	1986-12-19	Photopolymerisable material

Country Status (4)

Country	Link
CH (1)	CH669052A5 (en)
DE (1)	DE3641014A1 (en)
FR (1)	FR2609187A1 (en)
GB (1)	GB2198736B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2653458B2 (en) *	1988-03-26	1997-09-17	旭化成工業株式会社	Photosensitive resin composition for letterpress printing plates
DE3834299A1 (en)	1988-10-08	1990-04-12	Hoechst Ag	METHOD FOR STABILIZING A LEUKO DYE SOLUTION AND RADIATION-POLYMERIZABLE MIXTURE CONTAINING A LEUKO DYE
US5599650A (en) *	1995-04-28	1997-02-04	Polaroid Corporation	Photoreaction quenchers in on-press developable lithographic printing plates
US5912106A (en) *	1996-09-10	1999-06-15	Ciba Specialty Chemicals Corporation	Method for improving photoimage quality
US6296984B1 (en) *	1999-03-12	2001-10-02	Agere Systems Guardian Corp.	Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
DE10255667B4 (en) *	2002-11-28	2006-05-11	Kodak Polychrome Graphics Gmbh	Radiation-sensitive elements with excellent storage stability
EP1783548B1 (en)	2005-11-08	2017-03-08	Rohm and Haas Electronic Materials LLC	Method of forming a patterned layer on a substrate
CN101558110B (en)	2006-10-24	2012-06-13	西巴控股有限公司	Thermally stable cationic photocurable compositions

Citations (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB1127127A (en) *	1966-04-26	1968-09-11	Bp Chem Int Ltd	Stabilization of acrylic acid
GB1127495A (en) *	1966-04-26	1968-09-18	Bp Chem Int Ltd	Stabilization of chloroprene monomer
GB1218456A (en) *	1968-09-06	1971-01-06	Bp Chem Int Ltd	Process for the stabilisation of butadiene
GB1346774A (en) *	1970-10-05	1974-02-13	Bp Chem Int Ltd	Stabilisation of acrylonitrile
EP0178168A2 (en) *	1984-10-10	1986-04-16	Amoco Corporation	Process for purification of methacrylic acid

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4180403A (en) *	1973-01-18	1979-12-25	E. I. Du Pont De Nemours And Company	Photohardenable films having high resolution containing nitroso dimers
US4369274A (en) *	1981-07-20	1983-01-18	American Cyanamid Company	Hindered amine light stabilizers for polymers
EP0082817B1 (en) *	1981-12-17	1987-03-04	Ciba-Geigy Ag	Colour-photographic recording material

1986
- 1986-12-01 DE DE19863641014 patent/DE3641014A1/en not_active Withdrawn
- 1986-12-03 CH CH482786A patent/CH669052A5/en not_active IP Right Cessation
- 1986-12-19 GB GB8630357A patent/GB2198736B/en not_active Expired - Fee Related
- 1986-12-24 FR FR8618176A patent/FR2609187A1/en not_active Withdrawn

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB1127127A (en) *	1966-04-26	1968-09-11	Bp Chem Int Ltd	Stabilization of acrylic acid
GB1127495A (en) *	1966-04-26	1968-09-18	Bp Chem Int Ltd	Stabilization of chloroprene monomer
GB1218456A (en) *	1968-09-06	1971-01-06	Bp Chem Int Ltd	Process for the stabilisation of butadiene
GB1346774A (en) *	1970-10-05	1974-02-13	Bp Chem Int Ltd	Stabilisation of acrylonitrile
EP0178168A2 (en) *	1984-10-10	1986-04-16	Amoco Corporation	Process for purification of methacrylic acid

Also Published As

Publication number	Publication date
DE3641014A1 (en)	1988-06-16
CH669052A5 (en)	1989-02-15
FR2609187A1 (en)	1988-07-01
GB2198736A (en)	1988-06-22
GB8630357D0 (en)	1987-01-28

Legal Events

Date	Code	Title	Description
1991-08-14	PCNP	Patent ceased through non-payment of renewal fee

Publication	Publication Date	Title
GB8700511D0 (en)	1987-02-11	Photosensitive material
EP0239052A3 (en)	1989-05-10	Magnetic-shielding material
GB2193333B (en)	1989-12-20	Photosensitive material
EP0352630A3 (en)	1990-08-01	Photopolymerisable registration material
GB8724897D0 (en)	1987-11-25	Material
GB8717840D0 (en)	1987-09-03	Construction material
GB2196975B (en)	1990-09-12	Photoresist materials
GB2196639B (en)	1990-07-25	Radiation-curable material
EP0358071A3 (en)	1990-12-27	Photographic-recording material
GB8727146D0 (en)	1987-12-23	Light-sensitive material
GB2198736B (en)	1990-04-04	Photopolymerisable material
GB2217725B (en)	1991-09-04	Brake-friction material
GB8723304D0 (en)	1987-11-11	Light-sensitive material
GB2223030B (en)	1992-12-09	Lead-aluminum material
GB8609310D0 (en)	1986-05-21	Material dispenser
EP0237887A3 (en)	1990-02-07	Photographic-recording material
GB8707561D0 (en)	1987-05-07	Material removal
EP0315833A3 (en)	1990-06-20	Colour-photographic material
GB8630358D0 (en)	1987-01-28	Photopolymerisable materials
GB8630359D0 (en)	1987-01-28	Photopolymerisable materials
GB2198735B (en)	1990-04-04	Photopolymerisable material
GB2187798B (en)	1989-11-22	Material dispenser
CS445486A1 (en)	1987-11-12	Kovokeramicky treci material
CS415686A1 (en)	1987-05-14	Navijatelny elektroizolacny vrstveny material
CS300086A1 (en)	1987-09-17	Diamantovy kompozitni material