JP2500664B2 - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JP2500664B2 JP2500664B2 JP5315932A JP31593293A JP2500664B2 JP 2500664 B2 JP2500664 B2 JP 2500664B2 JP 5315932 A JP5315932 A JP 5315932A JP 31593293 A JP31593293 A JP 31593293A JP 2500664 B2 JP2500664 B2 JP 2500664B2
- Authority
- JP
- Japan
- Prior art keywords
- base substrate
- chip
- circuit board
- film circuit
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/075—Connecting or disconnecting of bond wires
- H10W72/07551—Connecting or disconnecting of bond wires characterised by changes in properties of the bond wires during the connecting
- H10W72/07554—Connecting or disconnecting of bond wires characterised by changes in properties of the bond wires during the connecting changes in dispositions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/541—Dispositions of bond wires
- H10W72/547—Dispositions of multiple bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/851—Dispositions of multiple connectors or interconnections
- H10W72/874—On different surfaces
- H10W72/884—Die-attach connectors and bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
- H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/754—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL
Landscapes
- Wire Bonding (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は半導体装置に関し、特に
リードピンを格子状に配列したピングリッドアレイ(P
GA)型のパッケージ構造を有する半導体装置に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, and more particularly to a pin grid array (P) in which lead pins are arranged in a grid pattern.
The present invention relates to a semiconductor device having a GA) type package structure.
【0002】[0002]
【従来の技術】PGAパッケージ構造の半導体装置とし
て、例えば図5に示すように、セラミック基板21のキ
ャビティ21aにICチップ22を搭載した上で、セラ
ミック基板21に設けた配線回路23にICチップ22
をワイヤ24で接続し、この配線回路23を介してセラ
ミック基板21に格子配列されたリードピン25に対し
て電気接続を行い、かつICチップ22をキャップ26
で封止した構成のものが提案されている。このセラミッ
クPGAは、高信頼性で放熱性が良く多ピン化には適し
ているが、セラミック基板に形成する配線回路を多層に
形成する際にはその製造工程が複雑化されるため、高コ
ストになるという問題がある。2. Description of the Related Art As a semiconductor device having a PGA package structure, for example, as shown in FIG. 5, an IC chip 22 is mounted on a cavity 21a of a ceramic substrate 21, and then an IC chip 22 is mounted on a wiring circuit 23 provided on the ceramic substrate 21.
Are connected by wires 24 to electrically connect to the lead pins 25 arranged in a grid on the ceramic substrate 21 via the wiring circuit 23, and the IC chip 22 is capped by the cap 26.
A structure sealed by is proposed. This ceramic PGA has high reliability and good heat dissipation and is suitable for increasing the number of pins. However, when the wiring circuit to be formed on the ceramic substrate is formed in multiple layers, the manufacturing process is complicated, resulting in high cost. There is a problem that becomes.
【0003】このため、配線回路の形成を簡略化したパ
ッケージが提案されており、その1つに特開平3−45
649号公報に記載されたものがある。図6はその断面
図であり、プラスチックPGA(以下、PPGAと称す
る)として構成されたものである。このPPGAは、絶
縁基板31上に1層の配線回路32を形成した上で、上
面に配線回路34を形成した絶縁テープ33を絶縁性樹
脂35で接着することで多層の配線回路を形成する。そ
して、絶縁基板31及び絶縁テープ33等を貫通するよ
うに形成したスルーホール36にリードピン37を挿入
し、半田等のろう材38で電気的、機械的接続をする。
また、ICチップ39は絶縁基板31に設けたキャビテ
ィ31a内に搭載し、前記配線回路34等にワイヤ40
で接続する。その上で、図外のキャップで封止を行うこ
とでPPGAパッケージを構成している。Therefore, a package in which the formation of a wiring circuit is simplified has been proposed, one of which is Japanese Patent Laid-Open No. 3-45.
There is one described in Japanese Patent No. 649. FIG. 6 is a sectional view thereof, which is configured as a plastic PGA (hereinafter referred to as PPGA). In this PPGA, a wiring circuit 32 of one layer is formed on an insulating substrate 31, and then an insulating tape 33 having a wiring circuit 34 formed on the upper surface is adhered with an insulating resin 35 to form a multilayer wiring circuit. Then, the lead pin 37 is inserted into the through hole 36 formed so as to penetrate the insulating substrate 31, the insulating tape 33, etc., and the brazing material 38 such as solder is used for electrical and mechanical connection.
Further, the IC chip 39 is mounted in the cavity 31a provided in the insulating substrate 31, and the wire 40 is attached to the wiring circuit 34 and the like.
Connect with. Then, a PPGA package is constructed by sealing with a cap (not shown).
【0004】[0004]
【発明が解決しようとする課題】この公知のPPGAで
は、絶縁テープ33を絶縁基板31に絶縁性樹脂35で
接着して絶縁基板31上に多層の配線回路を形成してい
るため、配線回路の製造工程が簡略化でき、セラミック
PGAに比較して低コスト化が実現できる。しかしなが
ら、ICチップ39はセラミックPGAの場合と同様に
ワイヤ40により配線回路に接続しているため、そのた
めの工数がかかるという問題がある。また、絶縁テープ
33に設けた配線回路34に対してワイヤボンディング
を行う際に絶縁テープ33と絶縁性樹脂35がボンディ
ング時の圧力で変形して凹み易く、高信頼性のワイヤ接
続ができないという問題もある。本発明の目的は、製造
工数を削減するとともに、信頼性の高い電気接続を可能
にした半導体装置を提供することにある。In this known PPGA, since the insulating tape 33 is adhered to the insulating substrate 31 with the insulating resin 35 to form a multilayer wiring circuit on the insulating substrate 31, the wiring circuit of the wiring circuit is formed. The manufacturing process can be simplified and the cost can be reduced as compared with the ceramic PGA. However, since the IC chip 39 is connected to the wiring circuit by the wire 40 as in the case of the ceramic PGA, there is a problem that the number of steps for that is increased. In addition, when wire bonding is performed on the wiring circuit 34 provided on the insulating tape 33, the insulating tape 33 and the insulating resin 35 are easily deformed due to pressure during bonding to be dented, and highly reliable wire connection cannot be performed. There is also. An object of the present invention is to provide a semiconductor device that reduces the number of manufacturing steps and enables highly reliable electrical connection.
【0005】[0005]
【課題を解決するための手段】本発明の半導体装置は、
複数本のリードピンが貫通状態で支持されたベース基板
上にフィルム回路基板を搭載し、かつこのフィルム回路
基板にICチップを搭載し、キャップで封止した構成と
され、かつフィルム回路基板はその表面においてICチ
ップに電気接続され、その裏面においてリードピンに電
気接続される構成とする。即ち、フィルム回路基板は、
絶縁性フィルムの表裏面にそれぞれ導体箔で配線回路が
形成され、各面の配線回路はスルーホールで相互に電気
接続されるとともに、その表面の配線回路の一部でIC
チップの電極パッドに対応したパッド接続部が形成さ
れ、その裏面の配線回路の一部でリードピンに対応した
ピン接続部が形成される。この場合、フィルム回路基板
の表面のパッド接続部にはバンプが形成され、このバン
プによりICチップの電極パッドに直接接続される。ま
た、フィルム回路基板の裏面のピン接続部は、ベース基
板の上面に突出されたリードピンの端部に衝接され、か
つ半田接続される。なお、ベース基板はガラスエポキシ
基板で形成され、このベース基板に開設された貫通穴に
リードピンを挿入し接着材で接着し、キャップはその周
囲においてベース基板に接着される。或いは、ベース基
板は金属基板で形成され、このベース基板に開設された
貫通穴にリードピンを挿入しガラス接着し、キャップは
その周囲においてベース基板に溶接される。According to the present invention, there is provided a semiconductor device comprising:
A film circuit board is mounted on a base substrate on which a plurality of lead pins are supported in a penetrating state, an IC chip is mounted on the film circuit board, and the film circuit board is sealed with a cap. In this configuration, the IC chip is electrically connected to the IC chip and the back surface thereof is electrically connected to the lead pin. That is, the film circuit board
Wiring circuits are formed on the front and back surfaces of the insulating film with conductor foils, respectively, and the wiring circuits on each surface are electrically connected to each other through the through-holes.
A pad connection portion corresponding to the electrode pad of the chip is formed, and a pin connection portion corresponding to the lead pin is formed in a part of the wiring circuit on the back surface thereof. In this case, bumps are formed on the pad connection portions on the surface of the film circuit board, and the bumps are directly connected to the electrode pads of the IC chip. Further, the pin connection portion on the back surface of the film circuit board is in contact with the end portion of the lead pin protruding on the upper surface of the base board and is soldered. The base substrate is formed of a glass epoxy substrate, a lead pin is inserted into a through hole formed in the base substrate and bonded with an adhesive material, and the cap is bonded to the base substrate around it. Alternatively, the base substrate is formed of a metal substrate, a lead pin is inserted into a through hole formed in the base substrate and glass-bonded, and the cap is welded to the base substrate around the periphery.
【0006】[0006]
【作用】ICチップはフィルム回路基板にフリップチッ
プ法により搭載されて電気接続されるため、ワイヤボン
ディングによる電気接続が不要となる。また、フィルム
回路基板は配線回路が多層に構成され、かつその一部に
おいてリードピンにそれぞれ接続されることで、ICチ
ップとリードピンとの接続を可能とする。Since the IC chip is mounted on the film circuit board by the flip chip method and electrically connected, the electric connection by wire bonding becomes unnecessary. Further, the film circuit board has a multilayered wiring circuit, and a part of the wiring circuit is connected to the lead pins respectively, so that the IC chip and the lead pins can be connected.
【0007】[0007]
【実施例】次に、本発明について図面を参照して説明す
る。図1は本発明の1実施例の一部を破断した平面図、
図2はその断面図、図3は要部の拡大断面図である。こ
れらの図において、ガラスエポキシ樹脂からなるベース
基板1には、格子状に多数の孔2が開設され、各孔3に
はリードピン3の一端部が挿入され、接着剤4によりベ
ース基板1に固定される。このとき、各リードピン3の
一端部はベース基板1の表面上に僅かに突出されるよう
に形成される。また、前記ベース基板1上にはフィルム
回路基板5が搭載される。このフィルム回路基板5は、
例えば25μm程度の厚さのポリイミドテープ6の表面
及び裏面のそれぞれにCu箔からなる配線回路7a,7
bを形成しており、かつこのテープの所要位置に0.1
mφ程度の貫通孔8を設け、この貫通孔8の内面にCu
メッキを30〜40μmの厚さに形成することでスルー
ホール9を形成し、前記表裏面の各配線回路7a,7b
を相互に電気接続する。Next, the present invention will be described with reference to the drawings. FIG. 1 is a partially cutaway plan view of one embodiment of the present invention,
2 is a sectional view thereof, and FIG. 3 is an enlarged sectional view of a main part. In these figures, a large number of holes 2 are formed in a grid pattern in a base substrate 1 made of glass epoxy resin, one end of a lead pin 3 is inserted into each hole 3 and fixed to the base substrate 1 with an adhesive 4. To be done. At this time, one end of each lead pin 3 is formed so as to slightly project above the surface of the base substrate 1. A film circuit board 5 is mounted on the base board 1. This film circuit board 5
For example, wiring circuits 7a, 7 made of Cu foil are formed on the front surface and the back surface of the polyimide tape 6 having a thickness of about 25 μm.
b is formed, and 0.1 is provided at the required position of this tape.
A through hole 8 of about mφ is provided, and Cu is formed on the inner surface of the through hole 8.
The through holes 9 are formed by forming the plating to a thickness of 30 to 40 μm, and the wiring circuits 7a and 7b on the front and back surfaces are formed.
Electrically connect to each other.
【0008】また、貫通孔8の一部は0.3×0.5m
mの大きさに形成し、その内面にCuメッキを十分に厚
く形成し、ICチップの電極パッドに接続されるパッド
接続部としてテープの表面上に5〜15μm程度突出す
るバンプ10を形成する。このバンプ10の表面には、
Niメッキ2〜3μmを施した後、Auメッキを10〜
20μmの厚さに形成する。或いは、Auメッキの代わ
りに半田メッキを20〜30μmの厚さに形成する。な
お、フィルム回路基板5の表面に突出形成される前記バ
ンプ10、搭載するICチップの電極パッドに対応する
位置にそれぞれ形成される。また、フィルム回路基板5
の裏面には、前記ベース基板1に支持されている多数本
のリードピン3に対応するように格子状に配列されたピ
ン接続部11が前記配線回路7bにより形成されてい
る。A part of the through hole 8 has a size of 0.3 × 0.5 m.
The size of the bumps 10 is formed to a size of m, Cu plating is formed sufficiently thick on the inner surface thereof, and bumps 10 projecting from about 5 to 15 μm on the surface of the tape are formed as pad connection portions connected to the electrode pads of the IC chip. On the surface of this bump 10,
After Ni plating 2-3 μm, Au plating 10-
It is formed to a thickness of 20 μm. Alternatively, instead of Au plating, solder plating is formed to a thickness of 20 to 30 μm. The bumps 10 formed on the surface of the film circuit board 5 are formed at positions corresponding to the electrode pads of the IC chip to be mounted. Also, the film circuit board 5
On the back surface of the wiring board 7b, there are formed pin connection portions 11 arranged in a grid pattern so as to correspond to the large number of lead pins 3 supported by the base substrate 1.
【0009】そして、前記フィルム回路基板5の表面に
は、ICチップ(この実施例では4個のICチップ)1
2の電極パッド13をバンプ10に対してアライメント
した上で、電極パッド13を下方に向けてフィルム回路
基板5上に載置し、かつ窒素雰囲気中で加圧加熱するこ
とにより、各電極パッド13は半田等のろう材14によ
り対応するバンプ10にそれぞれ接続され、これにより
ICチップ12は機械的かつ電気的にフィルム回路基板
5に搭載される。また、このICチップ12を搭載した
フィルム回路基板5は、前記ベース基板1上に搭載さ
れ、その裏面に設けた配線回路で形成されたピン接続部
11が、ベース基板1に支持したリードピン3の一端部
に衝接され、かつ半田等のろう材15により接続され
る。この接続は前記電極パッド13とバンプ10の接続
と同様に行うことができる。しかる上で、表面をアルマ
イト処理したアルミニウム製、または熱膨張率がフィル
ム回路基板に近い材料からなるキャップ16をICチッ
プ12を覆うようにベース基板1上に被せ、かつキャッ
プ16の周辺をベース基板1の周辺部において接着する
ことで、内部を封止し、PPGAが完成される。Then, an IC chip (four IC chips in this embodiment) 1 is provided on the surface of the film circuit board 5.
After the second electrode pad 13 is aligned with the bump 10, the electrode pad 13 is placed downward on the film circuit board 5 and is heated under pressure in a nitrogen atmosphere, so that each electrode pad 13 Are respectively connected to the corresponding bumps 10 by a brazing material 14 such as solder, whereby the IC chip 12 is mechanically and electrically mounted on the film circuit board 5. Further, the film circuit board 5 on which the IC chip 12 is mounted is mounted on the base substrate 1, and the pin connection portion 11 formed by the wiring circuit provided on the back surface of the lead circuit board 3 supported by the base substrate 1. It is abutted against one end and connected by a brazing material 15 such as solder. This connection can be made similarly to the connection between the electrode pad 13 and the bump 10. Then, a cap 16 made of aluminum whose surface is anodized or having a coefficient of thermal expansion close to that of the film circuit board is covered on the base substrate 1 so as to cover the IC chip 12, and the periphery of the cap 16 is covered by the base substrate. By adhering in the peripheral portion of 1, the inside is sealed and the PPGA is completed.
【0010】したがって、この構成のPPGAでは、I
Cチップ12をフィルム回路基板5にフリップチップ法
で搭載しているため、ICチップ12をワイヤボンディ
ングする工程が不要となり、製造工程を削減することが
できる。また、このICチップ12を搭載する際にボン
ディング圧力がフィルム回路基板5に加えられることが
なく、ワイヤボンディングの信頼性が低下されることも
ない。更に、ICチップ12と配線回路7aとをワイヤ
ボンディングで接続していないため、フィルム回路基板
5における静電容量とインダクタンスが低減され、半導
体装置における高速動作が可能となり、かつ一方ではワ
イヤループを収納させるための空隙をパッケージ内に確
保する必要がなく、パッケージの薄型化も可能となる。Therefore, in the PPGA having this configuration, I
Since the C chip 12 is mounted on the film circuit board 5 by the flip chip method, the step of wire bonding the IC chip 12 is not necessary, and the manufacturing steps can be reduced. Further, no bonding pressure is applied to the film circuit board 5 when the IC chip 12 is mounted, and the reliability of wire bonding is not deteriorated. Further, since the IC chip 12 and the wiring circuit 7a are not connected by wire bonding, the capacitance and the inductance in the film circuit board 5 are reduced, the semiconductor device can operate at high speed, and the wire loop is accommodated. It is not necessary to secure a space for making the inside of the package, and the package can be thinned.
【0011】ここで、ICチップ12の電極パッド13
にバンプを形成しておけば、フィルム回路基板5にはバ
ンプを設ける必要がなく、単に配線回路7aの一部でボ
ンディング部を形成するだけでよい。また、リードピン
3とピン接続部11をそれぞれ直接に接続しているた
め、ベース基板1に配線回路を形成する必要がなく、ベ
ース基板の構造の簡略化と製造の容易化が可能となる。Here, the electrode pad 13 of the IC chip 12
If the bumps are formed on the film circuit board 5, it is not necessary to provide the bumps on the film circuit board 5, and only the bonding portion may be formed on a part of the wiring circuit 7a. Further, since the lead pins 3 and the pin connecting portions 11 are directly connected to each other, there is no need to form a wiring circuit on the base substrate 1, and the structure of the base substrate can be simplified and the manufacturing can be facilitated.
【0012】図4は本発明の第2実施例の要部の拡大断
面図である。この実施例ではベース基板1Aを金属板で
形成し、このベース基板格子状に穴2を開けて、そこに
リードピン3を挿入してガラス4Aで加熱融着してい
る。そして、フィルム回路基板5にICチップ12を搭
載し、かつこのフィルム回路基板5の裏面に形成したピ
ン接続部11を前記各リードピン3の一端部に対して位
置決めしたた上でそれぞれ加熱接続する。なお、この実
施例ではフィルム回路基板5にはバンプを形成しておら
ず、配線回路7aの一部で電極パッドを形成し、ICチ
ップ12に設けたバンプ10Aをろう材14で接続して
いる。しかる上で、Cu板から成形され、または熱膨張
率がフィルム回路基板に近い材料をキャップ16として
ICチップを覆うようにベース基板1A上に被せ、かつ
キャップ16の周辺をベース基板1Aの周辺にプロジェ
クション溶接して封止を行っている。FIG. 4 is an enlarged sectional view of the essential parts of the second embodiment of the present invention. In this embodiment, the base substrate 1A is formed of a metal plate, the holes 2 are formed in a lattice shape of the base substrate, the lead pins 3 are inserted therein, and the glass 4A is heat-sealed. Then, the IC chip 12 is mounted on the film circuit board 5, and the pin connection portion 11 formed on the back surface of the film circuit board 5 is positioned with respect to one end portion of each lead pin 3 and then heat-connected. In this embodiment, bumps are not formed on the film circuit board 5, electrode pads are formed on a part of the wiring circuit 7a, and the bumps 10A provided on the IC chip 12 are connected by the brazing material 14. . Then, a material formed of a Cu plate or having a coefficient of thermal expansion close to that of a film circuit board is used as the cap 16 to cover the base substrate 1A so as to cover the IC chip, and the periphery of the cap 16 is covered with the periphery of the base substrate 1A. It is sealed by projection welding.
【0013】この実施例の構成においても、前記第1実
施例と同様の効果を得ることができる。また、これに加
えてこの実施例では、ベース基板1Aを金属で形成して
いるため、ICチップ12で発生した熱がフィルム回路
基板5を介してベース基板1Aの裏面側からも放熱され
るため、PPGAの放熱性を高めることができる。Also in the structure of this embodiment, the same effect as that of the first embodiment can be obtained. In addition to this, in this embodiment, since the base substrate 1A is made of metal, the heat generated in the IC chip 12 is also radiated from the back surface side of the base substrate 1A via the film circuit board 5. , PPGA can be improved in heat dissipation.
【0014】なお、前記各実施例は1枚のフィルム回路
基板に4個のICチップを搭載した場合を示している
が、これと異なる数のICチップを搭載する場合でも本
発明が適用できることは言うまでもない。また、第1実
施例ではベース基板が絶縁材で形成されているため、そ
の表面にリードピンに接続される配線回路を設けてお
き、この配線回路にフィルム回路基板の裏面のピン接続
部を接続するように構成すれば、ピン接続部をリードピ
ンの配列に制約されることなく任意の位置に設置でき、
配線回路のパターン設計の自由度を高めることも可能で
ある。Although each of the above embodiments shows the case where four IC chips are mounted on one film circuit board, the present invention can be applied to the case where a different number of IC chips are mounted. Needless to say. Further, in the first embodiment, since the base substrate is formed of an insulating material, a wiring circuit connected to the lead pins is provided on the surface thereof, and the pin connection portion on the back surface of the film circuit substrate is connected to this wiring circuit. With this configuration, the pin connection part can be installed at any position without being restricted by the arrangement of the lead pins,
It is also possible to increase the degree of freedom in the pattern design of the wiring circuit.
【0015】[0015]
【発明の効果】以上説明したように本発明は、複数本の
リードピンが貫通状態で支持されたベース基板上にフィ
ルム回路基板を介してICチップを搭載しており、かつ
フィルム回路基板はその表面においてICチップに直接
に電気接続され、その裏面においてリードピンに電気接
続されているので、ICチップをワイヤボンディングに
より接続する必要がなく、製造工程の簡略化を図り、低
コスト化が実現できる。また、ICチップをフィルム回
路基板に対してフリップチップ法で搭載することで、ワ
イヤボンディングにより生じる信頼性の低下がなく、高
信頼性の接続が実現できる。更に、ベース基板のリード
に対してフィルム回路基板を直接電気接続することで、
ベース基板に配線回路を形成する必要がなく、ベース基
板の構造の簡略化及び製造工数の削減が実現できる。ま
た、ベース基板を金属で形成することも可能となり、こ
れによりベース基板からの放熱性を高めることもでき
る。更に、ICチップをバンプ接続することで、フィル
タ回路基板における静電容量とインダクタンスの低減が
図れるため、半導体装置の高速動作が可能となる。As described above, according to the present invention, an IC chip is mounted via a film circuit board on a base substrate on which a plurality of lead pins are supported in a penetrating state, and the film circuit board has a surface thereof. Since it is electrically connected directly to the IC chip and is electrically connected to the lead pin on the back surface thereof, it is not necessary to connect the IC chip by wire bonding, the manufacturing process can be simplified, and the cost can be reduced. Further, by mounting the IC chip on the film circuit board by the flip chip method, it is possible to realize a highly reliable connection without deterioration in reliability caused by wire bonding. Furthermore, by electrically connecting the film circuit board directly to the leads of the base board,
Since it is not necessary to form a wiring circuit on the base substrate, the structure of the base substrate can be simplified and the number of manufacturing steps can be reduced. In addition, the base substrate can be made of metal, so that the heat dissipation from the base substrate can be improved. Furthermore, by bump-connecting the IC chip, the capacitance and the inductance in the filter circuit board can be reduced, so that the semiconductor device can operate at high speed.
【図1】本発明の第1実施例の一部を破断した平面図で
ある。FIG. 1 is a partially cutaway plan view of a first embodiment of the present invention.
【図2】図1の縦断面図である。FIG. 2 is a longitudinal sectional view of FIG.
【図3】図2の要部の拡大断面図である。3 is an enlarged cross-sectional view of a main part of FIG.
【図4】本発明の第2実施例の要部の拡大断面図であ
る。FIG. 4 is an enlarged sectional view of a main part of the second embodiment of the present invention.
【図5】従来のセラミックPGAの一例の断面図であ
る。FIG. 5 is a sectional view of an example of a conventional ceramic PGA.
【図6】従来のPPGAの一例の断面図である。FIG. 6 is a sectional view of an example of a conventional PPGA.
1,1A ベース基板 3 リードピン 5 フィルム回路基板 7a,7b 配線回路 10 バンプ 11 ピン接続部 12 ICチップ 13 電極パッド 14,15 ろう材 16 キャップ 1, 1A Base substrate 3 Lead pin 5 Film circuit board 7a, 7b Wiring circuit 10 Bump 11 Pin connection part 12 IC chip 13 Electrode pad 14, 15 Brazing material 16 Cap
Claims (6)
れたベース基板と、このベース基板上に搭載されたフィ
ルム回路基板と、このフィルム回路基板に搭載されたI
Cチップと、前記ベース基板に取着されて前記フィルム
回路基板やICチップを封止するキャップとで構成さ
れ、前記フィルム回路基板にその表面において前記IC
チップに直接に電気接続され、その裏面において前記リ
ードピンに電気接続されることを特徴とする半導体装
置。1. A base substrate on which a plurality of lead pins are supported in a penetrating state, a film circuit substrate mounted on the base substrate, and an I mounted on the film circuit substrate.
A C chip and a cap that is attached to the base substrate and seals the film circuit board or the IC chip. The film circuit board has the IC on the surface thereof.
A semiconductor device, which is directly electrically connected to a chip and electrically connected to the lead pin on the back surface thereof.
表裏面にそれぞれ導体箔で配線回路が形成され、各面の
配線回路はスルーホールで相互に電気接続されるととも
に、その表面の配線回路の一部で前記ICチップの電極
パッドに対応したパッド接続部が形成され、その裏面の
配線回路の一部で前記リードピンに対応したピン接続部
が形成されてなる請求項1の半導体装置。2. The film circuit board has wiring circuits formed on the front and back surfaces of an insulating film with conductor foils, respectively, and the wiring circuits on each surface are electrically connected to each other by through holes, and the wiring circuits on the surface are 2. The semiconductor device according to claim 1, wherein a pad connection portion corresponding to an electrode pad of the IC chip is partially formed, and a pin connection portion corresponding to the lead pin is formed in a part of a wiring circuit on the back surface thereof.
にはバンプが形成され、このバンプによりICチップの
電極パッドに直接接続される請求項2の半導体装置。3. The semiconductor device according to claim 2, wherein bumps are formed on the pad connection portions on the surface of the film circuit board, and the bumps are directly connected to the electrode pads of the IC chip.
は、ベース基板の上面に突出されたリードピンの端部に
衝接され、かつ半田接続されてなる請求項2の半導体装
置。4. The semiconductor device according to claim 2, wherein the pin connection portion on the back surface of the film circuit board is abutted against and soldered to the end portion of the lead pin protruding on the upper surface of the base substrate.
され、このベース基板に開設された貫通穴にリードピン
を挿入し接着材で接着し、キャップはその周囲において
ベース基板に接着されてなる請求項1ないし4のいずれ
かの半導体装置。5. The base substrate is formed of a glass epoxy substrate, a lead pin is inserted into a through hole formed in the base substrate and bonded with an adhesive material, and the cap is bonded to the base substrate around the periphery. The semiconductor device according to any one of 1 to 4.
ベース基板に開設された貫通穴にリードピンを挿入しガ
ラス接着し、キャップはその周囲においてベース基板に
溶接されてなる請求項1ないし4のいずれかの半導体装
置。6. The base substrate is formed of a metal substrate, a lead pin is inserted into a through hole formed in the base substrate and is glass-bonded, and the cap is welded to the base substrate at the periphery thereof. Any semiconductor device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5315932A JP2500664B2 (en) | 1993-11-22 | 1993-11-22 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5315932A JP2500664B2 (en) | 1993-11-22 | 1993-11-22 | Semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07142638A JPH07142638A (en) | 1995-06-02 |
| JP2500664B2 true JP2500664B2 (en) | 1996-05-29 |
Family
ID=18071341
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5315932A Expired - Lifetime JP2500664B2 (en) | 1993-11-22 | 1993-11-22 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2500664B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113644183A (en) * | 2021-09-03 | 2021-11-12 | 昆山兴协和科技股份有限公司 | Light emitting diode and manufacturing method thereof |
-
1993
- 1993-11-22 JP JP5315932A patent/JP2500664B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07142638A (en) | 1995-06-02 |
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