JP2505518B2 - Continuous vacuum vapor deposition plating method for strip steel - Google Patents
Continuous vacuum vapor deposition plating method for strip steelInfo
- Publication number
- JP2505518B2 JP2505518B2 JP63032620A JP3262088A JP2505518B2 JP 2505518 B2 JP2505518 B2 JP 2505518B2 JP 63032620 A JP63032620 A JP 63032620A JP 3262088 A JP3262088 A JP 3262088A JP 2505518 B2 JP2505518 B2 JP 2505518B2
- Authority
- JP
- Japan
- Prior art keywords
- zone
- cooling
- reduction
- gas
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910000831 Steel Inorganic materials 0.000 title claims description 64
- 239000010959 steel Substances 0.000 title claims description 61
- 238000007747 plating Methods 0.000 title claims description 45
- 238000007740 vapor deposition Methods 0.000 title claims description 33
- 238000000034 method Methods 0.000 title claims description 19
- 238000001816 cooling Methods 0.000 claims description 111
- 238000000137 annealing Methods 0.000 claims description 49
- 239000007789 gas Substances 0.000 claims description 43
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 40
- 238000007789 sealing Methods 0.000 claims description 35
- 239000001257 hydrogen Substances 0.000 claims description 31
- 229910052739 hydrogen Inorganic materials 0.000 claims description 31
- 238000010438 heat treatment Methods 0.000 claims description 27
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 26
- 238000004880 explosion Methods 0.000 claims description 16
- 239000011261 inert gas Substances 0.000 claims description 16
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 8
- 238000007865 diluting Methods 0.000 claims 1
- 238000007738 vacuum evaporation Methods 0.000 claims 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 22
- 229910052725 zinc Inorganic materials 0.000 description 22
- 239000011701 zinc Substances 0.000 description 22
- 238000001771 vacuum deposition Methods 0.000 description 13
- 229910052757 nitrogen Inorganic materials 0.000 description 11
- 238000006467 substitution reaction Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 4
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- 238000010791 quenching Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000005275 alloying Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 230000004913 activation Effects 0.000 description 1
- 238000005097 cold rolling Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、帯鋼の連続真空蒸着めつき方法に関し、特
に帯鋼の連続焼鈍炉に接続される上記装置に関し、亜
鉛、アルミニウム、セラミツクス等を焼鈍直後の帯鋼に
連続真空蒸着めつきするのに適した方法に関する。TECHNICAL FIELD The present invention relates to a continuous vacuum vapor deposition plating method for strip steel, and more particularly to the above apparatus connected to a continuous annealing furnace for strip steel, such as zinc, aluminum, and ceramics. The present invention relates to a method suitable for continuously vacuum-depositing a steel strip on a strip immediately after annealing.
従来の亜鉛めつきラインは、冷間圧延機で冷間圧延さ
れたコイルを、巻き戻し機にて巻き戻し、ルーパを通
し、焼鈍還元炉を介して溶融亜鉛めつきするラインにな
つていた。A conventional zinc plating line has been a line in which a coil cold-rolled by a cold rolling mill is unwound by a rewinding machine, passed through a looper, and then an annealed reduction furnace is used for galvanizing.
また、この溶融亜鉛めつきラインを改良し、溶融亜鉛
めつきラインの上記焼鈍還元炉の後面に不活性ガス置換
室を介して真空シール装置及び蒸着装置を設けた真空蒸
着亜鉛めつきラインも工業化されている。Further, by improving this molten zinc plating line, a vacuum deposition zinc plating line in which a vacuum sealing device and a vapor deposition device are provided on the rear surface of the annealing reduction furnace of the molten zinc plating line via an inert gas replacement chamber is industrialized. Has been done.
このように、従来は、連続焼鈍炉から直接真空蒸着亜
鉛めつき装置に導く設備はなく、溶融亜鉛めつきライン
の焼鈍還元炉(H2=15%〜75%,N2=85〜25%,帯鋼温
度500℃〜800℃)を通板させるのが一般的であつた。As described above, conventionally, there is no facility for directly introducing a vacuum deposition zinc plating device from a continuous annealing furnace, and an annealing reduction furnace (H 2 = 15% to 75%, N 2 = 85 to 25%) in a molten zinc plating line. , Steel strip temperature was 500 ℃ to 800 ℃).
しかし、上記の焼鈍還元炉を通板させる真空蒸着亜鉛
めつきラインは通板速度が遅く、一方、帯鋼はこの通板
速度の遅い焼鈍還元炉を通板させないと、真空蒸着亜鉛
めつきに適した帯鋼表面性状が得られないため、生産性
が低く、コスト高となつていた。However, the above-mentioned vacuum deposition zinc plating line that passes the annealing reduction furnace has a slow stripping speed, while the strip steel does not pass through the annealing reduction furnace with a slow stripping speed, which causes vacuum deposition zinc plating. Since suitable steel strip surface properties could not be obtained, productivity was low and cost was high.
これを解決するためには、通板速度の速い連続焼鈍ラ
インに真空蒸着めつきラインを接続すればよいように考
えられるが、この接続技術には次のような問題がある。In order to solve this, it is considered that the vacuum deposition plating line should be connected to the continuous annealing line having a high sheet passing speed, but this connection technique has the following problems.
(1)最近、極低炭素鋼が生産されるようになり、連続
焼鈍炉は加熱帯と冷却帯のみで構成可能となり、均熱
帯、徐冷帯、急冷帯が不要で、帯鋼の焼鈍温度及び処理
時間に制約がなくなつて来ている。しかし、極低炭素鋼
の加熱帯及び冷却帯も、水素濃度が2〜3%、窒素濃度
が98〜97%、露点が約−20℃であるため、該炉の雰囲気
中で焼鈍された帯鋼の表面の鉄酸化物は水素ガスで十分
還元されておらず、真空蒸着めつきを施した場合、めつ
き金属と帯鋼の密着性は十分でなく、めつき金属の剥離
の問題があつた。(1) Recently, ultra-low carbon steel has been produced, and the continuous annealing furnace can be composed of only heating zone and cooling zone, so there is no need for soaking zone, slow cooling zone and quenching zone. And the processing time is becoming unlimited. However, the heating zone and the cooling zone of the ultra-low carbon steel also have a hydrogen concentration of 2 to 3%, a nitrogen concentration of 98 to 97%, and a dew point of about -20 ° C, so that they have been annealed in the atmosphere of the furnace. Iron oxide on the surface of steel is not sufficiently reduced by hydrogen gas, and when vacuum deposition plating is applied, the adhesion between the plating metal and the strip steel is not sufficient, and there is a problem of peeling of the plating metal. It was
(2)帯鋼の連続焼鈍炉は炉の容量が莫大であり、雰囲
気ガスとしての水素ガスの消費量が多く、水素ガス濃度
を10%以上に上げようとすると、水素ガスの原単位が増
大し、コストアップとなる。また、水素ガスの爆発防止
を考慮し、炉の雰囲気ガスは水素がスの爆発限界以内の
濃度2〜3%で操業されているのが通常である。爆発限
界を超えた水素ガス濃度で操業し、万一空気(酸素)が
浸入し爆発した場合、炉の容量が大きいので、設備の被
害は甚大なものになる。従つて、水素ガス濃度を爆発限
界以上に高めることはできない。(2) The continuous annealing furnace for strip steel has an enormous capacity and consumes a large amount of hydrogen gas as an atmospheric gas. When the hydrogen gas concentration is increased to 10% or more, the basic unit of hydrogen gas increases. However, the cost will increase. Further, in consideration of prevention of explosion of hydrogen gas, the atmosphere gas in the furnace is usually operated at a concentration of 2-3% of hydrogen within the explosion limit of hydrogen. When operating at a hydrogen gas concentration that exceeds the explosion limit, and if air (oxygen) intrudes and explodes, the capacity of the furnace will be large and the damage to the equipment will be enormous. Therefore, the hydrogen gas concentration cannot be increased above the explosion limit.
本発明者らは、以上の問題を解決し、生産性が高く、
かつ低コストで亜鉛めつき等を行うことのできる連続真
空蒸着めつき装置として、先に、従来の焼鈍還元炉の出
口に真空蒸着亜鉛めつき設備を接続していた技術に替
え、帯鋼の連続焼鈍炉の出口に帯鋼表面を還元する還元
帯を追設して連続焼鈍炉に真空蒸着亜鉛めつき設備を接
続させた装置を提案した{特願昭62−300069号(特開平
1−142082号)参照}。The present inventors have solved the above problems and have high productivity,
In addition, as a continuous vacuum vapor deposition plating device that can perform zinc plating etc. at low cost, we replaced the technology that previously connected the vacuum deposition zinc plating equipment to the exit of the conventional annealing reduction furnace. We proposed a device in which a reduction zone for reducing the surface of the strip is additionally provided at the exit of the continuous annealing furnace and a vacuum deposition zinc plating equipment is connected to the continuous annealing furnace (Japanese Patent Application No. 62-300069 (Japanese Patent Application Laid-Open No. 1-300069). 142082)}.
本発明は、従来の帯鋼の連続真空蒸着めっき方法にお
ける欠点を解消し、還元室からの水素の漏出を抑制する
とともに、隣接する室における水素濃度が爆発限界を超
えないように希釈制御することにより、水素高濃度還元
を可能とし、その結果、帯鋼の通板速度の高速化を可能
にした高生産性の帯鋼連続真空蒸着めっき方法を提供し
ようとするものである。The present invention eliminates the drawbacks of the conventional continuous vapor deposition method for strip steel, suppresses leakage of hydrogen from the reducing chamber, and controls dilution so that the hydrogen concentration in the adjacent chamber does not exceed the explosion limit. Thus, it is intended to provide a highly productive strip vacuum vapor deposition plating method that enables high concentration reduction of hydrogen and, as a result, makes it possible to increase the strip-passing speed of the strip.
本発明は、(1)帯鋼を、焼鈍用の加熱帯、第1冷却
帯、還元帯、第2冷却帯、不活性ガス置換室、シール手
段及び真空蒸着装置に順次通して連続真空蒸着めっきを
行う方法において、前記還元帯に15%以上の高濃度の水
素を保有させ、前記還元帯の前後に帯鋼のシール手段を
設け、第1及び第2冷却帯内の圧力を前記還元帯の圧力
より常時高く保持し、かつ、第1及び第2冷却帯内の水
素濃度がいずれか一方でも爆発限界を超えるときには、
窒素ガスを供給して第1及び/又は第2冷却帯内のガス
を希釈することを特徴とする帯鋼の連続真空蒸着めっき
方法、及び、(2)帯鋼を、焼鈍用の加熱帯、第1冷却
還元帯、第2冷却帯、不活性ガス置換室、シール手段及
び真空蒸着装置に順次通して連続真空蒸着めっきを行う
方法において、第1冷却還元帯に15%以上の高濃度の水
素を保有させ、第1冷却還元帯の前後に帯鋼のシール手
段を設け、前記加熱帯及び第2冷却帯内の圧力を第1冷
却還元帯の圧力より常時高く保持し、かつ、前記加熱帯
及び第2冷却帯内の水素濃度がいずれか一方でも爆発限
界を超えるときには、窒素ガスを供給して前記加熱帯及
び/又は第2冷却帯内のガスを希釈することを特徴とす
る帯鋼の連続真空蒸着めっき方法である。The present invention provides (1) continuous vacuum vapor deposition plating by sequentially passing (1) a strip steel through a heating zone for annealing, a first cooling zone, a reduction zone, a second cooling zone, an inert gas replacement chamber, a sealing means and a vacuum vapor deposition apparatus. In the above method, the reduction zone is allowed to contain a high concentration of hydrogen of 15% or more, and sealing means for strip steel is provided before and after the reduction zone, and the pressure in the first and second cooling zones is set to When the pressure is always kept higher than the pressure and the hydrogen concentration in the first and second cooling zones exceeds the explosion limit in either case,
Nitrogen gas is supplied to dilute the gas in the first and / or second cooling zones, and a continuous vacuum vapor deposition plating method for strip steel, and (2) heating strip for annealing a strip steel, In a method of performing continuous vacuum deposition plating by sequentially passing through a first cooling reduction zone, a second cooling zone, an inert gas displacement chamber, a sealing means and a vacuum vapor deposition device, a high concentration hydrogen of 15% or more in the first cooling reduction zone. And a means for sealing the steel strip before and after the first cooling / reduction zone to keep the pressures in the heating zone and the second cooling zone higher than the pressures in the first cooling / reduction zone, and And the hydrogen concentration in the second cooling zone exceeds the explosion limit in either case, nitrogen gas is supplied to dilute the gas in the heating zone and / or the second cooling zone. It is a continuous vacuum deposition plating method.
なお、本発明方法は、亜鉛めつきに限らず、アルミニ
ウム、セラミツクス等を真空蒸着する場合にも適用する
ことができる。The method of the present invention can be applied not only to zinc plating but also to vacuum deposition of aluminum, ceramics or the like.
帯鋼を蒸着めつきに適した表面性状に還元するには、
500℃以上の帯鋼温度が必要であり、この帯鋼温度は前
述した連続焼鈍炉の冷却帯で確保できる。また、この冷
却過程の途中の保持帯を還元帯とすれば、帯鋼は連続焼
鈍炉の中で例えば600℃前後の温度で水素濃度の高い雰
囲気で還元処理され、蒸着めつきに適した表面性状とな
る。To reduce the strip steel to a surface texture suitable for deposition plating,
A strip steel temperature of 500 ° C or higher is required, and this strip steel temperature can be secured in the cooling zone of the continuous annealing furnace described above. If the holding zone in the middle of this cooling process is used as a reduction zone, the strip steel is subjected to a reduction treatment in a continuous annealing furnace at a temperature of about 600 ° C. in a high hydrogen concentration atmosphere, and a surface suitable for vapor deposition plating. It becomes a property.
従つて、本発明では、帯鋼の連続焼鈍炉に必須の冷却
帯を第1冷却帯とし、該第1冷却帯出口であつて連続焼
鈍炉の内部に位置するように還元帯を設けるか、上記の
連続焼鈍炉に必須の冷却帯に還元機能を持たせて第1冷
却還元帯とするのである。Therefore, in the present invention, the cooling zone essential to the continuous annealing furnace for the strip steel is the first cooling zone, and the reduction zone is provided so as to be located inside the continuous annealing furnace at the first cooling zone outlet, or The cooling zone essential to the above continuous annealing furnace is provided with a reducing function to form the first cooling reduction zone.
このような構成の本発明では、連続焼鈍炉内におい
て、該炉の加熱帯で加熱され高温となつている帯鋼は、
上記の第1冷却帯で例えば約500〜550℃に冷却され、次
いで上記の還元帯で約10〜7秒間保持されるか、上記の
第1冷却還元帯で例えば約500〜550℃に冷却されつつ還
元ガスで約10〜7秒間処理されて、帯鋼表面の酸化膜が
還元される。In the present invention having such a configuration, in the continuous annealing furnace, the steel strip heated to a high temperature in the heating zone of the furnace,
In the above-mentioned first cooling zone, it is cooled to, for example, about 500 to 550 ° C, and then it is held in the above-mentioned reduction zone for about 10 to 7 seconds, or in the above-mentioned first cooling and reduction zone, for example, to about 500-550 ° C. Meanwhile, the oxide film on the surface of the steel strip is reduced by being treated with a reducing gas for about 10 to 7 seconds.
このように、本発明では、帯鋼の還元を連続焼鈍炉の
中で行うため、先提案の連続焼鈍炉の出口に還元帯を設
ける装置よりも熱効率が良好となるのみならず、還元帯
を短くすることができる(還元帯が焼鈍炉の外にある先
提案の装置では、帯鋼を還元に必要な温度に維持するた
めに、還元用高水素濃度ガスの加熱や、該加熱ガスによ
る帯鋼の加熱帯の確保が必要となることがある)。As described above, in the present invention, since the reduction of the strip steel is performed in the continuous annealing furnace, not only the thermal efficiency is better than that of the device provided with the reduction zone at the outlet of the previously proposed continuous annealing furnace, but also the reduction zone is reduced. It can be shortened (In the previously proposed device where the reduction zone is outside the annealing furnace, in order to maintain the strip steel at the temperature required for reduction, heating of the reducing high hydrogen concentration gas and the zone by the heating gas It may be necessary to secure a heating zone for steel).
そして、この短くできることとも関連して、連続焼鈍
炉に必須の冷却帯に還元機能をも保持させることができ
るのである。Also, in connection with this shortening, it is possible to maintain the reducing function in the cooling zone essential for the continuous annealing furnace.
また、還元帯、あるいは第1冷却還元帯までを連続焼
鈍炉の内部に設ける本発明は、該炉を新設する場合、或
いは既設の炉で出口側にスペースがある場合に、好まし
く適用できる。Further, the present invention in which the reduction zone or the first cooling reduction zone is provided inside the continuous annealing furnace can be preferably applied when the furnace is newly installed or when the existing furnace has a space on the outlet side.
以上のようにして表面の酸化膜が還元除去された帯鋼
は、上記の連続焼鈍炉の出口に設けられた第2冷却帯
で、ガスジエツトにより冷却される。しかる後、不活性
ガス置換室と、複数の真空シール装置を経て、1または
2以上の真空蒸着装置に導かれ、表面の酸化膜が還元さ
れ真空蒸着めつきに適した表面状態で、帯鋼の片面又は
両面に蒸着めつきされる。The strip steel from which the oxide film on the surface is reduced and removed as described above is cooled by the gas jet in the second cooling zone provided at the exit of the continuous annealing furnace. Then, after passing through an inert gas substitution chamber and a plurality of vacuum sealing devices, it is guided to one or more vacuum vapor deposition devices, the surface oxide film is reduced, and the surface state suitable for vacuum vapor deposition is applied to the strip steel. Is vapor-deposited on one side or both sides.
第1冷却帯と還元帯とを設ける本発明装置の一実施例
を第1図に従つて説明する。An embodiment of the device of the present invention in which a first cooling zone and a reduction zone are provided will be described with reference to FIG.
本発明装置は、第1図に示すように、連続焼鈍炉に必
須の加熱帯1の後面の冷却帯2を第1冷却帯とし、該第
1冷却帯2の後面であつて、かつ連続焼鈍炉内に還元帯
3を設ける。該還元帯3の入口にはガスタイトのシール
装置4を設ける。そして、連続焼鈍炉の出口、すなわち
上記の還元帯3の出口にもガスタイトのシール装置4を
設け、上記の入口側のシール装置4と合わせて、水素濃
度の高い還元帯3の雰囲気ガスが、上記の第1冷却帯2
及び連続焼鈍炉の出口後面に設けられた第2冷却帯5へ
大量に流出しないように配慮している。In the apparatus of the present invention, as shown in FIG. 1, the cooling zone 2 on the rear surface of the heating zone 1 essential to the continuous annealing furnace is used as the first cooling zone, and the rear surface of the first cooling zone 2 is also the continuous annealing. A reduction zone 3 is provided in the furnace. A gas-tight seal device 4 is provided at the inlet of the reduction zone 3. A gas-tight sealing device 4 is also provided at the outlet of the continuous annealing furnace, that is, at the outlet of the reduction zone 3 described above. Together with the sealing device 4 on the inlet side, the atmosphere gas of the reduction zone 3 having a high hydrogen concentration is First cooling zone 2 above
Also, consideration is given so that a large amount does not flow into the second cooling zone 5 provided on the rear surface of the outlet of the continuous annealing furnace.
この第2冷却帯5の上方に出口を設け、炉雰囲気ガス
シール装置4′、ブライドル6を接続し、シール装置7
を介して不活性ガス置換室8を設け、さらにシール装置
7、センタリングロール9を介して真空シール装置10に
接続し、その後面に第1蒸着装置11、第2蒸着装置12を
接続する。An outlet is provided above the second cooling zone 5, a furnace atmosphere gas sealing device 4 ′ and a bridle 6 are connected, and a sealing device 7
The inert gas replacement chamber 8 is provided via the above, and further connected to the vacuum sealing device 10 via the sealing device 7 and the centering roll 9, and the first vapor deposition device 11 and the second vapor deposition device 12 are connected to the rear surface thereof.
あとは真空シール装置10、冷却装置13、合金化処理炉
14、クーリングタワー15を経て、公知の手段の巻取機を
接続する。すなわち、ウオータクエンチ17、絞りロール
18、ドライヤ19、ルーパ23、スキンパスミル25等を介し
て巻取機27を接続する。After that, vacuum seal device 10, cooling device 13, alloying treatment furnace
A winding device of a known means is connected via 14 and the cooling tower 15. That is, water quench 17, squeeze roll
A winder 27 is connected via 18, a dryer 19, a looper 23, a skin pass mill 25, and the like.
なお、20はセンタリングロール、21及び28はデフレク
タロール、22及び24はブライドル、26はシヤーを示す。20 is a centering roll, 21 and 28 are deflector rolls, 22 and 24 are bridles, and 26 is a shear.
次に、上記のように構成される本発明装置の作用を説
明する。Next, the operation of the device of the present invention configured as described above will be described.
焼鈍に必須の加熱帯1と第1冷却帯2を通過後の還元
帯3で水素濃度の高い雰囲気ガス中を通すことにより、
帯鋼表面の鉄酸化物を還元し、蒸着めつきに適した活性
な表面性状に調整する。次いで、第2冷却帯5の最終パ
スの上部から帯鋼16′をシール装置4′へ導き、ブライ
ドル6、シール装置7、不活性ガス置換室8、シール装
置7、センタリングロール9、真空シール装置10を経
て、第1蒸着装置11で帯鋼16′の片面に蒸着めつきを施
し、第2蒸着装置12で残りの面に蒸着めつきを施した
後、真空シール装置10、冷却装置13、デフレクタロール
28、合金化処理炉14、クーリングタワー15、デフレクタ
ロール28を経て、ウオータクエンチ17へ導く。その後、
公知の手段の絞りロール18〜シャー26を経て巻取機27で
巻取る。By passing through the atmosphere gas having a high hydrogen concentration in the reduction zone 3 after passing through the heating zone 1 and the first cooling zone 2 which are essential for annealing,
The iron oxide on the surface of the steel strip is reduced and adjusted to an active surface texture suitable for deposition plating. Next, the strip steel 16 'is guided to the sealing device 4'from the upper part of the final pass of the second cooling zone 5, and the bridle 6, the sealing device 7, the inert gas replacement chamber 8, the sealing device 7, the centering roll 9, the vacuum sealing device are provided. After passing through 10, the first vapor deposition device 11 performs vapor deposition plating on one surface of the strip steel 16 ′, and the second vapor deposition device 12 performs vapor deposition plating on the remaining surface, and then the vacuum sealing device 10, the cooling device 13, Deflector roll
28, through the alloying treatment furnace 14, the cooling tower 15, and the deflector roll 28, it is led to the water quench 17. afterwards,
It is wound by a winder 27 through a squeezing roll 18 to a shear 26 of a known means.
なお、蒸着めつきを施さず、帯鋼を連続的に焼鈍のみ
する場合は、焼鈍炉としての加熱帯1、第1冷却帯2、
シール装置4、還元帯3(この場合、還元帯3の雰囲気
ガスは水素濃度が2〜3%以下で使用)、シール装置
4、第2冷却帯5を通板されて来た帯鋼16を、シール装
置4″、ウオータクエンチ17、絞りロール18、ドライヤ
19、センタリングロール20、デフレクタロール21、ブラ
イドル22,24、ルーパ23、スキンパスミル25、シヤー26
を経て巻取機27が巻取ればよい。When the strip steel is only annealed continuously without vapor deposition plating, the heating zone 1 as the annealing furnace, the first cooling zone 2,
The sealing device 4, the reduction zone 3 (in this case, the atmosphere gas in the reduction zone 3 is used at a hydrogen concentration of 2 to 3% or less), the sealing device 4, and the strip steel 16 passed through the second cooling zone 5 , Sealing device 4 ″, water quench 17, squeeze roll 18, dryer
19, centering roll 20, deflector roll 21, bridle 22,24, looper 23, skin pass mill 25, shear 26
After that, the winder 27 may wind up.
また、第1図に示す本発明装置の各部について具体的
に説明する。Further, each part of the device of the present invention shown in FIG. 1 will be specifically described.
(1)還元帯3 還元帯3の雰囲気が水素ガスH2=15%以上、帯鋼温度
550℃以上の場合は10秒以上、H2=30%以上、帯鋼温度5
00℃以上の場合は7秒以上の還元処理を行うと、帯鋼表
面が良好に還元され、蒸着めつきに適した活性は表面性
状に仕上る。この程度の保持時間を確保するためには、
ライン速度が400m/minの場合、還元帯3の長さは45〜70
m程度あれば充分である。(1) Reduction zone 3 Atmosphere of reduction zone 3 is hydrogen gas H 2 = 15% or more, strip steel temperature
10 seconds or more at 550 ° C or more, H 2 = 30% or more, strip steel temperature 5
When the temperature is 00 ° C. or higher, a reduction treatment for 7 seconds or more reduces the surface of the steel strip satisfactorily, and the activity suitable for vapor deposition plating is finished in the surface texture. To secure this kind of holding time,
When the line speed is 400m / min, the length of reduction zone 3 is 45-70
About m is enough.
また、還元帯3へ供給される雰囲気ガスの露点は−60
℃以下、酸素濃度は10ppm以下が好ましい。The dew point of the atmospheric gas supplied to the reduction zone 3 is -60.
C. or less and the oxygen concentration is preferably 10 ppm or less.
更に、還元帯3の雰囲気ガスは、ブロア(図示しな
い)を介して循環させてもよいし、ノズル(図示しな
い)から帯鋼へ噴射させてもよい。この場合、循環ガス
を冷却する必要はない。更に、雰囲気ガスの露点を管理
するため、ドライヤ(図示しない)を介して循環させて
もさしつかえないが、ドライヤ効率を上げるためドライ
ヤ入口で循環ガスを約100℃以下に冷却することが好ま
しい。Further, the atmosphere gas in the reduction zone 3 may be circulated through a blower (not shown) or may be injected from a nozzle (not shown) onto the strip steel. In this case, it is not necessary to cool the circulating gas. Further, in order to control the dew point of the atmospheric gas, it may be circulated through a drier (not shown), but it is preferable to cool the circulated gas to about 100 ° C. or less at the drier inlet in order to improve the drier efficiency.
(2)ガスシール機能 還元帯3の水素ガスの濃度は爆発限界の3%を超えて
いるので、還元帯3の入口および出口にシール装置4を
設けて還元帯3を他の部から分離し、かつ第1冷却帯
2、還元帯3、第2冷却帯5の炉圧を 第1冷却帯2の炉圧 P1 還元帯3の炉圧 P2 第2冷却帯5の炉圧 P3 とすると、0<P1>P2<P3>0の関係が維持できるよう
各炉の圧力を制御する。(2) Gas sealing function Since the hydrogen gas concentration in the reduction zone 3 exceeds the explosion limit of 3%, a sealing device 4 is provided at the inlet and outlet of the reduction zone 3 to separate the reduction zone 3 from other parts. and the first cooling zone 2, the furnace pressure P 3 of the reducing zone 3, furnace pressure P 2 of the furnace pressure P 1 reduction zone 3 of the furnace pressure in the second cooling zone 5 first cooling zone 2 second cooling zone 5 Then, the pressure of each furnace is controlled so that the relationship of 0 <P 1 > P 2 <P 3 > 0 can be maintained.
すなわち本発明装置は、還元帯3の濃度の高い水素ガ
スが第1冷却帯2及び第2冷却帯5へ流入しないように
設計されており、第1冷却帯2及び第2冷却帯5の水素
濃度は3%以下となるよう濃度制御されるようになつて
いる。また、水素濃度が万一3%を超え爆発の危険が発
生した場合は、窒素ガスを投入して希釈し、炉圧が上昇
した場合は、雰囲気ガスを大気へ放出する自動弁(図示
しない)が設けてある。That is, the device of the present invention is designed so that the hydrogen gas having a high concentration in the reduction zone 3 does not flow into the first cooling zone 2 and the second cooling zone 5, and the hydrogen in the first cooling zone 2 and the second cooling zone 5 is hydrogenated. The concentration is controlled to be 3% or less. In addition, if the hydrogen concentration exceeds 3% and there is a danger of explosion, nitrogen gas is added to dilute it, and when the furnace pressure rises, an atmospheric valve that releases atmospheric gas to the atmosphere (not shown) Is provided.
しかも、連続焼鈍炉自体をもガスタイト構造としてい
る。Moreover, the continuous annealing furnace itself has a gas tight structure.
(3)第2冷却帯5 第2冷却帯5は、帯鋼温度を蒸着めつきを施すのに適
した温度に調整するためのものである。すなわち帯鋼温
度は、めつき金属の種類により真空蒸着可能な範囲があ
り(例えば、亜鉛では190〜420℃程度、好ましくは190
〜350程度、アルミニウムでは200〜600℃程度、好まし
くは200〜400℃程度、セラミツクスでは200〜1000℃程
度、好ましくは200〜500℃程度)、この範囲を超える
と、めつき金属が密着不良を起し剥離する。この冷却装
置はこれを防止するために設けられている。(3) Second cooling zone 5 The second cooling zone 5 is for adjusting the strip steel temperature to a temperature suitable for vapor deposition plating. That is, the strip steel temperature has a range in which vacuum deposition is possible depending on the kind of the plated metal (for example, zinc is about 190 to 420 ° C., preferably 190 to 420 ° C.).
~ 350, about 200-600 ° C for aluminum, preferably about 200-400 ° C, about 200-1000 ° C for ceramics, preferably about 200-500 ° C). Raise and peel. This cooling device is provided to prevent this.
(4)不活性ガス置換室8 不活性ガス置換室8は、還元帯3で還元され活性にな
り、めつきに適した表面性状となつた帯鋼表面を、この
ままの表面性状に維持するために弱還元性の雰囲気とす
るのが好ましく、水素濃度2%以下に維持されている。(4) Inert gas substitution chamber 8 The inert gas substitution chamber 8 is reduced and activated in the reduction zone 3 to maintain the strip steel surface having a surface texture suitable for plating to the surface texture as it is. A weakly reducing atmosphere is preferable, and the hydrogen concentration is maintained at 2% or less.
また、不活性ガス置換室8の圧力は、該圧力をP4とす
ると、 P3≧P4>0 になるよう制御されている。The pressure of the inert gas substitution chamber 8, when the pressure to P 4, and is controlled to be P 3 ≧ P 4> 0.
更に、不活性ガス置換室8の水素濃度が2%を超える
と窒素ガスを投入して希釈し、不活性ガス置換室8の圧
力がP3≦P4になれば雰囲気ガスを大気へ放出する、その
ための自動弁(図示しない)が設けてある。Further, when the hydrogen concentration in the inert gas substitution chamber 8 exceeds 2%, nitrogen gas is added to dilute it, and when the pressure in the inert gas substitution chamber 8 becomes P 3 ≦ P 4 , atmospheric gas is released to the atmosphere. An automatic valve (not shown) for that purpose is provided.
なお、不活性ガス置換室8はシール装置7及び10を介
して真空室11,12に接続されており、万一真空室11,12側
に問題が発生した場合、大量の水素ガスが真空室11,12
側に流入する一方、真空室11,12側は圧力が大気圧より
低く、空気の侵入のチヤンスは第1冷却帯2及び第2冷
却帯5より多く、爆発の危険は高いこともあり、不活性
ガス置換室8の水素濃度は上記のように2%以下になる
よう制御することが不可欠である。The inert gas replacement chamber 8 is connected to the vacuum chambers 11 and 12 via the sealing devices 7 and 10, and if a problem should occur on the vacuum chambers 11 and 12 side, a large amount of hydrogen gas will be generated in the vacuum chambers. 11,12
On the other hand, the pressure in the vacuum chambers 11 and 12 is lower than the atmospheric pressure, the air intrusion rate is higher than in the first cooling zone 2 and the second cooling zone 5, and the explosion risk may be high. It is essential to control the hydrogen concentration in the active gas substitution chamber 8 to be 2% or less as described above.
次に、連続焼鈍炉の冷却帯を第1冷却還元帯とする本
発明装置の一実施例を第2図に従つて説明する。Next, an embodiment of the device of the present invention in which the cooling zone of the continuous annealing furnace is the first cooling reduction zone will be described with reference to FIG.
この装置は、第2図に示すように、連続焼鈍炉に必須
の加熱帯1の後面の冷却帯2′を第1冷却還元帯とし、
該第1冷却還元帯2′の入口にはガスタイトのシール装
置4を設ける。そして、連続焼鈍炉の出口、すなわち上
記の第1冷却還元帯2′の出口にもガスタイトのシール
装置4を設け、上記の入口側のシール装置4と合わせ
て、水素濃度の高い第1冷却還元帯2′の雰囲気ガス
が、上記の連続焼鈍炉に必須の加熱帯1及び連続焼鈍炉
の出口後面に設けられた第2冷却帯5へ大量に流出しな
いように配慮している。As shown in FIG. 2, this apparatus uses a cooling zone 2 ′ on the rear surface of the heating zone 1 essential for a continuous annealing furnace as a first cooling reduction zone,
A gas-tight sealing device 4 is provided at the inlet of the first cooling reduction zone 2 '. A gas-tight sealing device 4 is also provided at the outlet of the continuous annealing furnace, that is, the outlet of the first cooling / reduction zone 2 ', and together with the sealing device 4 on the inlet side, the first cooling / reduction having a high hydrogen concentration is provided. Care is taken to prevent large amounts of the atmosphere gas in the zone 2'from flowing into the heating zone 1 essential to the continuous annealing furnace and the second cooling zone 5 provided on the rear surface of the outlet of the continuous annealing furnace.
この第2冷却帯5以降の装置構成は、第1図に示す装
置と同一であるので説明を省略する。Since the device configuration after the second cooling zone 5 is the same as that of the device shown in FIG. 1, the description thereof will be omitted.
但し、第1冷却還元帯2′とガスシール機能について
は、第1図のものと若干異なるため、具体的に説明す
る。However, the first cooling reduction zone 2'and the gas sealing function are slightly different from those in FIG. 1, and thus will be specifically described.
(1a)第1冷却還元帯2′ 第1冷却還元帯2′の雰囲気ガス組成はH2ガス濃度15
%以上のN2−H2の混合ガスで、この雰囲気ガスをジエツ
トクーラを介して循環させ、ノズル(図示しない)から
帯鋼へ噴射させて、第1冷却還元帯2′の出口の帯鋼温
度を500〜550℃に制御する。この第1冷却還元帯2′で
の処理時間を7〜10秒以上とれば、帯鋼の表面は蒸着め
つきに適した活性な表面性状に仕上る。(1a) First cooling reduction zone 2'The atmosphere gas composition of the first cooling reduction zone 2'is H 2 gas concentration 15
% N 2 -H 2 mixed gas, this atmosphere gas is circulated through a jet cooler, injected from a nozzle (not shown) to the steel strip, and the temperature of the steel strip at the outlet of the first cooling reduction zone 2 ′ is increased. Is controlled at 500 to 550 ° C. If the treatment time in the first cooling / reduction zone 2'is 7 to 10 seconds or more, the surface of the strip steel is finished to have an active surface texture suitable for deposition plating.
また、第1冷却還元帯2′に雰囲気ガスとして供給さ
れる上記のN2−H2混合ガスは、露点−60℃以下、酸素濃
度10ppm以下が好ましい。Further, the above N 2 —H 2 mixed gas supplied as an atmospheric gas to the first cooling / reduction zone 2 ′ preferably has a dew point of −60 ° C. or lower and an oxygen concentration of 10 ppm or lower.
(2a)ガスシール機能 第1冷却還元帯2′の水素ガスの濃度は爆発限界の3
%を超えているので、第1冷却還元帯2′の入口および
出口にシール装置4を設けて第1冷却還元帯2′を他の
部から分離し、かつ加熱帯1、第1冷却還元帯2′、第
2冷却帯5の炉圧を 加熱帯1の炉圧 P1a 第1冷却還元帯2′の炉圧 P2a 第2冷却帯5の炉圧 P3a とすると、0<P1a>P2a<P3a>0の関係が維持できる
よう各炉の圧力を制御する。(2a) Gas sealing function The hydrogen gas concentration in the first cooling reduction zone 2'is at the explosion limit of 3
%, The sealing device 4 is provided at the inlet and the outlet of the first cooling / reduction zone 2'to separate the first cooling / reduction zone 2'from the other parts, and the heating zone 1 and the first cooling / reduction zone are provided. 2 When the furnace pressure P 3a of the furnace pressure P 2a second cooling zone 5 ', second the furnace pressure of the cooling zone 5 furnace pressure P 1a first cooling reduction zone 2 of the heating zone 1', 0 <P 1a> The pressure of each furnace is controlled so that the relationship of P 2a <P 3a > 0 can be maintained.
このように、第2図の第1冷却還元帯2′を設ける場
合にあつても、第1図の場合と同様に、第1冷却すなわ
ち本発明装置は、還元帯2′の濃度の高い水素ガスが加
熱帯1及び第2冷却帯5へ流入しないように設計されて
おり、加熱帯1及び第2冷却帯5の水素濃度は3%以下
となるよう濃度制御されるようになつている。また、水
素濃度が万一3%を超え爆発の危険が発生した場合は、
窒素ガスを投入して希釈し、炉圧が上昇した場合は、雰
囲気ガスを大気へ放出する自動弁(図示しない)が設け
てある。As described above, even when the first cooling / reduction zone 2'of FIG. 2 is provided, as in the case of FIG. The gas is designed not to flow into the heating zone 1 and the second cooling zone 5, and the concentration of hydrogen in the heating zone 1 and the second cooling zone 5 is controlled to be 3% or less. If the hydrogen concentration exceeds 3% and there is a danger of explosion,
An automatic valve (not shown) is provided to release nitrogen gas into the atmosphere when nitrogen gas is introduced to dilute it and the furnace pressure rises.
しかも、連続焼鈍炉自体をもガスタイト構造としてい
る。Moreover, the continuous annealing furnace itself has a gas tight structure.
以下に、本発明による効果を実証するための実験例を
挙げる。Hereinafter, experimental examples for demonstrating the effect of the present invention will be described.
実験例1 第1図に示す装置により、0.8mm厚さ×100mm角の脱脂
後の鋼板(極低炭素鋼)を、雰囲気ガス(水素3%、窒
素97%、露点−20℃)中で約750℃に90秒間加熱し、次
いで雰囲気ガス(水素3%、窒素97%、露点−20℃)中
で550℃まで冷却後、雰囲気ガス(水素15%、窒素85
%、露点−40℃)中で約10秒間550℃に維持した。Experimental Example 1 Using the apparatus shown in FIG. 1, a degreased steel plate (extremely low carbon steel) of 0.8 mm thickness and 100 mm square was exposed to atmospheric gas (hydrogen 3%, nitrogen 97%, dew point -20 ° C) After heating to 750 ℃ for 90 seconds, and then cooling to 550 ℃ in atmosphere gas (hydrogen 3%, nitrogen 97%, dew point -20 ℃), atmosphere gas (hydrogen 15%, nitrogen 85
%, Dew point −40 ° C.) for about 10 seconds at 550 ° C.
しかる後、雰囲気ガス(水素3%、窒素97%、露点−
25℃)中で250℃まで冷却し、次いで真空圧力0.05Torr
で亜鉛を真空蒸着させて、亜鉛の付着量30g/m2のサンプ
ルを得た。After that, the atmosphere gas (hydrogen 3%, nitrogen 97%, dew point-
25 ℃) to 250 ℃, then vacuum pressure 0.05 Torr
Then, zinc was vacuum-deposited on the above to obtain a sample having an adhesion amount of zinc of 30 g / m 2 .
このサンプルについて180°Ot密着曲げ(サンプルを
2つ折りにして密着させる)を行い、曲げ部にスコツチ
テープを張り、密着性テストを行つた。密着性テスト結
果は良好で、めつきの剥離は全く見られなかつた。This sample was subjected to 180 ° Ot contact bending (the sample was folded in two for close contact), and a Scottish tape was attached to the bent portion to perform an adhesion test. The results of the adhesion test were good, and no peeling of the plating was observed.
実験例2 第1図に示す装置により、実験例1と同一条件の加
熱、冷却を行つた後、雰囲気ガス(水素30%、窒素70
%、露点−40℃)中で560℃の温度に鋼板を7秒間維持
した。しかる後、実験例1と同一条件で250℃まで冷却
し、次いで真空圧力0.05Torrで亜鉛を真空蒸着させて、
亜鉛の付着量60g/m2のサンプルを得た。Experimental Example 2 After heating and cooling under the same conditions as in Experimental Example 1 using the apparatus shown in FIG. 1, atmospheric gas (30% hydrogen, 70% nitrogen)
%, Dew point −40 ° C.) and the steel plate was kept at a temperature of 560 ° C. for 7 seconds. Then, it was cooled to 250 ° C. under the same conditions as in Experimental Example 1, and zinc was vacuum-deposited at a vacuum pressure of 0.05 Torr.
A sample having a deposited amount of zinc of 60 g / m 2 was obtained.
このサンプルについて実験例1と同様の180°Ot密着
曲げ後の剥離テストの結果、良好な密着性を得た。As a result of a peeling test on this sample after 180 ° Ot contact bending as in Experimental Example 1, good adhesion was obtained.
実験例3 第2図に示す装置により、0.8mm厚さ×100mm角の極低
炭素鋼を脱脂後、雰囲気ガス(水素3%、窒素97%、露
点−20℃)中で約720℃に90秒間加熱し、次いで雰囲気
ガス(水素15%、窒素85%、露点−45℃)中で約10秒間
で550℃まで冷却した。Experimental Example 3 After degreasing 0.8 mm thick x 100 mm square ultra-low carbon steel using the apparatus shown in Fig. 2, the temperature was raised to 90 ° C at about 720 ° C in atmospheric gas (3% hydrogen, 97% nitrogen, -20 ° C dew point). It was heated for 2 seconds and then cooled to 550 ° C. in an atmosphere gas (hydrogen 15%, nitrogen 85%, dew point −45 ° C.) for about 10 seconds.
しかる後、雰囲気ガス(水素3%、窒素97%、露点−
25℃)中で250℃まで冷却し、次いで真空圧力0.05Torr
で亜鉛を真空蒸着させて、亜鉛の付着量20g/m2のサンプ
ルを得た。After that, the atmosphere gas (hydrogen 3%, nitrogen 97%, dew point-
25 ℃) to 250 ℃, then vacuum pressure 0.05 Torr
Then, zinc was vacuum-deposited on the above to obtain a sample with an attached amount of zinc of 20 g / m 2 .
このサンプルについて実験例1と同様の180°Ot密着
曲げ後の剥離テストの結果、めつき層の剥離は全く見ら
れず良好であつた。As a result of a peeling test on this sample after 180 ° Ot contact bending as in Experimental Example 1, peeling of the plating layer was not observed at all and it was good.
以上詳述したように、本発明の方法によれば、従来の
焼鈍還元炉の後面に不活性ガス置換室を介して真空シー
ル装置及び蒸着装置を設けた真空蒸着亜鉛めつきライン
に比し、通板速度を2〜4倍速くすることができる。As described above in detail, according to the method of the present invention, as compared with the vacuum deposition zinc plating line in which the vacuum sealing device and the vapor deposition device are provided through the inert gas replacement chamber on the rear surface of the conventional annealing reduction furnace, The threading speed can be increased 2 to 4 times.
従つて、本発明の方法では、上記した従来の亜鉛めつ
きラインに比し、生産性も2〜4倍向上し、めつき鋼板
の製造コストを大巾に低減できる効果がある。Therefore, in the method of the present invention, the productivity is improved by 2 to 4 times as compared with the above-mentioned conventional zinc plating line, and there is an effect that the manufacturing cost of the plated steel plate can be greatly reduced.
また、連続焼鈍に必須の冷却帯を第1冷却帯とする本
発明装置の場合、帯鋼を蒸着めつきに適した活性な表面
性状に還元するのに必要な温度の500℃以上に、この第
1冷却帯で冷却するだけで容易に調整できる。Further, in the case of the device of the present invention in which the cooling zone essential for continuous annealing is the first cooling zone, the temperature required for reducing the strip steel to an active surface texture suitable for vapor deposition plating is 500 ° C. or higher. It can be easily adjusted simply by cooling in the first cooling zone.
しかも、この第1冷却帯に続く還元帯が連続焼鈍炉内
に位置されているため、帯鋼を上記の500℃以上の温度
に保持することが容易であり、この結果、帯鋼の表面性
状を蒸着めつきを施すのに適した状態に確実に維持でき
る。Moreover, since the reduction zone following the first cooling zone is located in the continuous annealing furnace, it is easy to keep the strip steel at the temperature of 500 ° C. or higher, and as a result, the surface properties of the strip steel are increased. Can be reliably maintained in a state suitable for vapor deposition plating.
このように連続焼鈍に必須の冷却帯を第1冷却帯と
し、かつ還元帯を連続焼鈍炉内に位置させる本発明装置
の場合、帯鋼温度を上記の還元温度に保持させることが
容易であり、熱効率が良好で、しかも還元帯の長さも余
り長くする必要がなく、設置スペースと設備コストが低
減する。Thus, in the case of the device of the present invention in which the cooling zone essential for continuous annealing is the first cooling zone and the reduction zone is located in the continuous annealing furnace, it is easy to maintain the strip steel temperature at the above reduction temperature. The thermal efficiency is good, and the reduction zone does not need to be too long, which reduces the installation space and equipment cost.
更に、連続焼鈍炉に必須の冷却帯に還元機能を持た
せ、この冷却帯を第1冷却還元帯とする本発明装置にお
いても、上記と同様、還元に必要な帯鋼温度への調整が
容易であり、従つて確実に蒸着めつきを施すのに適した
帯鋼表面状態にすることができ、しかもこの第1冷却還
元帯の長さも余り長くする必要がなく、設置スペースと
設備コストが低減する。Further, in the apparatus of the present invention in which the cooling zone essential to the continuous annealing furnace is provided with a reducing function, and this cooling zone is used as the first cooling / reduction zone, it is easy to adjust to the strip steel temperature necessary for the reduction as in the above. Therefore, it is possible to surely make the surface of the strip steel suitable for vapor deposition plating, and it is not necessary to make the length of the first cooling reduction zone too long, and the installation space and the equipment cost are reduced. To do.
加えて、本発明では、万一爆発が生じても設備の被害
が小さいため還元帯あるいは第1冷却還元帯を爆発限界
以上の高精度の水素ガス雰囲気とすることができ、これ
により帯鋼表面の活性化効果を向上させることができ、
密着性に優れためつき帯鋼を得ることができる。In addition, in the present invention, even if an explosion should occur, the damage to the equipment is small, so that the reduction zone or the first cooling reduction zone can be made a highly accurate hydrogen gas atmosphere above the explosion limit. Can improve the activation effect of
Due to its excellent adhesion, a steel strip can be obtained.
なお、本発明の方法では、冷却鋼板とめつき鋼板とを
唯一のラインで製り分けることができる。In addition, in the method of the present invention, the cooling steel plate and the plated steel plate can be separately manufactured on a single line.
第1図及び第2図は本発明の一実施例を示す概略図であ
る。 1……連続焼鈍炉の加熱帯、2……第1冷却帯、3……
還元帯、2′……第1冷却還元帯、4……シール装置、
5……第2冷却帯、8……不活性ガス置換室、10……真
空シール装置、11……第1蒸着室、12……第2蒸着室1 and 2 are schematic views showing an embodiment of the present invention. 1 ... Heating zone of continuous annealing furnace, 2 ... First cooling zone, 3 ...
Reduction zone, 2 '... 1st cooling reduction zone, 4 ... Sealing device,
5 ... Second cooling zone, 8 ... Inert gas replacement chamber, 10 ... Vacuum seal device, 11 ... First vapor deposition chamber, 12 ... Second vapor deposition chamber
───────────────────────────────────────────────────── フロントページの続き (72)発明者 中村 和生 大阪府堺市石津西町5番地 日新製鋼株 式会社堺製造所内 (72)発明者 伊藤 武彦 東京都千代田区丸の内3丁目4番1号 日新製鋼株式会社内 (72)発明者 愛甲 琢哉 大阪府堺市石津西町5番地 日新製鋼株 式会社堺製造所内 (56)参考文献 特開 昭62−270770(JP,A) 特開 昭50−39208(JP,A) 特開 昭61−250117(JP,A) 特開 昭54−121242(JP,A) 特開 昭63−145773(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kazuo Nakamura 5 Ishizu Nishi-machi, Sakai City, Osaka Prefecture Nisshin Steel Co., Ltd. Sakai Works (72) Inventor Takehiko Ito 3-4-1, Marunouchi, Chiyoda-ku, Tokyo Nisshin Steel Co., Ltd. (72) Inventor Takuya Aiko 5th Ishizu Nishimachi, Sakai City, Osaka Prefecture Nisshin Steel Co., Ltd. Sakai Works (56) References JP 62-270770 (JP, A) JP 50 -39208 (JP, A) JP 61-250117 (JP, A) JP 54-121242 (JP, A) JP 63-145773 (JP, A)
Claims (2)
元帯、第2冷却帯、不活性ガス置換室、シール手段及び
真空蒸着装置に順次通して連続真空蒸着めっきを行う方
法において、前記還元帯に15%以上の高濃度の水素を保
有させ、前記還元帯の前後に帯鋼のシール手段を設け、
第1及び第2冷却帯内の圧力を前記還元帯の圧力より常
時高く保持し、かつ、第1及び第2冷却帯内の水素濃度
がいずれか一方でも爆発限界を超えるときには、窒素ガ
スを供給して第1及び/又は第2冷却帯内のガスを希釈
することを特徴とする帯鋼の連続真空蒸着めっき方法。1. Continuous vacuum vapor deposition plating is performed by sequentially passing the strip steel through a heating zone for annealing, a first cooling zone, a reduction zone, a second cooling zone, an inert gas replacement chamber, a sealing means and a vacuum vapor deposition apparatus. In the method, the reduction zone contains a high concentration of hydrogen of 15% or more, and a strip steel sealing means is provided before and after the reduction zone,
Nitrogen gas is supplied when the pressure in the first and second cooling zones is always kept higher than the pressure in the reduction zone, and when the hydrogen concentration in the first and second cooling zones exceeds the explosion limit in any one of them. Then, the gas in the 1st and / or 2nd cooling zone is diluted, The continuous vacuum evaporation plating method of the strip steel characterized by the above-mentioned.
帯、第2冷却帯、不活性ガス置換室、シール手段及び真
空蒸着装置に順次通して連続真空蒸着めっきを行う方法
において、第1冷却還元帯に15%以上の高濃度の水素を
保有させ、第1冷却還元帯の前後に帯鋼のシール手段を
設け、前記加熱帯及び第2冷却帯内の圧力を第1冷却還
元帯の圧力より常時高く保持し、かつ、前記加熱帯及び
第2冷却帯内の水素濃度がいずれか一方でも爆発限界を
超えるときには、窒素ガスを供給して前記加熱帯及び/
又は第2冷却帯内のガスを希釈することを特徴とする帯
鋼の連続真空蒸着めっき方法。2. A method of performing continuous vacuum vapor deposition plating by sequentially passing a strip steel through a heating zone for annealing, a first cooling reduction zone, a second cooling zone, an inert gas replacement chamber, a sealing means and a vacuum vapor deposition apparatus. , Having a high concentration of 15% or more of hydrogen in the first cooling / reduction zone, and providing steel strip sealing means before and after the first cooling / reduction zone to cool the pressure in the heating zone and the second cooling zone to the first cooling When the pressure in the reduction zone is always kept higher and the hydrogen concentration in either the heating zone or the second cooling zone exceeds the explosion limit, nitrogen gas is supplied to supply the heating zone and / or
Alternatively, a continuous vacuum vapor deposition plating method for a strip steel, which comprises diluting a gas in the second cooling zone.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63032620A JP2505518B2 (en) | 1988-02-17 | 1988-02-17 | Continuous vacuum vapor deposition plating method for strip steel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63032620A JP2505518B2 (en) | 1988-02-17 | 1988-02-17 | Continuous vacuum vapor deposition plating method for strip steel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01208467A JPH01208467A (en) | 1989-08-22 |
| JP2505518B2 true JP2505518B2 (en) | 1996-06-12 |
Family
ID=12363894
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63032620A Expired - Lifetime JP2505518B2 (en) | 1988-02-17 | 1988-02-17 | Continuous vacuum vapor deposition plating method for strip steel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2505518B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116024529A (en) * | 2021-10-27 | 2023-04-28 | 宝山钢铁股份有限公司 | A kind of production method and production line of galvanized sheet |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5039208A (en) * | 1973-08-10 | 1975-04-11 | ||
| JPS61250117A (en) * | 1985-04-26 | 1986-11-07 | Nisshin Steel Co Ltd | Vertical type continuous annealing device for metallic strip |
| JPS62270770A (en) * | 1986-05-16 | 1987-11-25 | Mitsubishi Heavy Ind Ltd | On-line learning control method for band steel cooler in vacuum deposition device |
-
1988
- 1988-02-17 JP JP63032620A patent/JP2505518B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01208467A (en) | 1989-08-22 |
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