JP2507203B2 - Drainage system cleaning device - Google Patents
Drainage system cleaning deviceInfo
- Publication number
- JP2507203B2 JP2507203B2 JP3213217A JP21321791A JP2507203B2 JP 2507203 B2 JP2507203 B2 JP 2507203B2 JP 3213217 A JP3213217 A JP 3213217A JP 21321791 A JP21321791 A JP 21321791A JP 2507203 B2 JP2507203 B2 JP 2507203B2
- Authority
- JP
- Japan
- Prior art keywords
- storage tank
- cleaning device
- drainage system
- drainage
- discharge pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Sewage (AREA)
Description
【０００１】[0001]
【産業上の利用分野】この発明は、下水や雑排水の如き
排水を処理設備その他へ導く排水系の清掃装置に関する
ものであり、詳しくはサイフォンの原理を応用して排水
の流れを制御し、排水そのものを利用して排水系の内部
を効率良く清掃することができると共に、清掃装置自体
の保守・整備も容易とした清掃装置に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a drainage system cleaning device for guiding wastewater such as sewage or miscellaneous wastewater to a treatment facility or the like. More specifically, it applies the siphon principle to control the flow of wastewater. The present invention relates to a cleaning device capable of efficiently cleaning the inside of a drainage system by using the drainage itself and facilitating maintenance and maintenance of the cleaning device itself.
【０００２】[0002]
【従来の技術および発明が解決しようとする課題】下水
や雑排水の如き排水を処理設備その他の目的地へ導くた
めには、従来、下水管等の排水系に排水を流入させ、そ
の内部を流送させて目的地に到達させるようにしている
のが一般的である。しかし、この下水管等の排水系にお
いては排水に含まれる塵芥等が内部に沈滞したり、ある
いはし尿等の粘着物が内壁に付着して目詰まりを起こす
虞があることから、本願出願人は図６および図７に示す
ような「排水系の清掃方法及びその装置」を本願に先立
ち提案した（特願平２−９２９９４号参照）。この方法
及び装置はサイフォンの原理を応用したものであり、流
入口２から流入し貯槽室３内に一時的に貯留された排水
が一定量を超えると、サイフォン管４により一度に下水
管５等の排水系へ流出させられ、その勢いと水量によっ
て下水管５の内部を洗い流して清掃することが可能とな
るのである。2. Description of the Related Art In order to guide wastewater such as sewage or sewage to a treatment facility or other destination, the wastewater is conventionally made to flow into a drainage system such as a sewer pipe, Generally, it is sent to reach the destination. However, in the drainage system such as the sewer pipe, dust and the like contained in the drainage may be stagnate inside, or sticky substances such as human waste may adhere to the inner wall and cause clogging, so the applicant of the present application Prior to the present application, a “drainage system cleaning method and apparatus” as shown in FIGS. 6 and 7 was proposed (see Japanese Patent Application No. 2-92994). This method and apparatus apply the principle of siphon, and when the drainage that flows in from the inflow port 2 and is temporarily stored in the storage chamber 3 exceeds a certain amount, the siphon pipe 4 causes the sewer pipe 5 and the like at a time. It is possible to wash out the inside of the sewer pipe 5 and clean it by the flow and the amount of water.
【０００３】しかしながら、このような排水系の清掃装
置１においては、サイフォン管４の形状がパイプ状であ
るため、その内部を通過させることのできる排水の流量
には自ずと限界があった。即ち、逆Ｕ字形状としたパイ
プ状のサイフォン管４を用いてサイフォンの原理を応用
するには、サイフォン管４内の頂上部空間６において排
水の水位上昇がある程度急激であることが必要とされる
ことから、頂上部空間６の内径Ｄは排水の流入量に見合
った適切な大きさ以下としなければならないという条件
がある。そして、この内径Ｄはサイフォン管４全体にお
ける内径そのものとなってしまうことから、サイフォン
管４の内部を通過させることのできる排水の流量には限
界が生じてしまうということである。このように通過可
能な排水の流量に限界があるということは、清掃能力に
限界があるということであり、この現状について更に多
くの流量の排水を通過させることができ、清掃効果を高
めた排水系の清掃装置が切望されていた。However, in such a drainage system cleaning device 1, since the siphon pipe 4 has a pipe-like shape, the flow rate of the drainage that can pass through the inside is naturally limited. That is, in order to apply the siphon principle using the inverted U-shaped pipe-shaped siphon pipe 4, it is necessary that the water level rise of the drainage in the top space 6 inside the siphon pipe 4 is somewhat rapid. Therefore, there is a condition that the inner diameter D of the top space 6 has to be equal to or smaller than an appropriate size corresponding to the inflow amount of drainage. This inner diameter D becomes the inner diameter itself of the entire siphon pipe 4, so that the flow rate of the waste water that can pass through the inside of the siphon pipe 4 is limited. The fact that there is a limit to the flow rate of drainage that can be passed in this way means that there is a limit to the cleaning capacity, and under this current situation, it is possible to pass a larger amount of drainage and to improve the cleaning effect. There was a long-awaited need for a system cleaning device.
【０００４】また、サイフォン管４はその形状がまさし
くパイプ状であり、更には逆Ｕ字形状となっているた
め、異物などがその内部に入り込んで目詰まりを起こし
た場合や、何らかの支障を生じた場合には保守・整備が
相当に困難であることから、清掃装置自体の保守・整備
も容易なものとした清掃装置が切望されていた。Further, since the siphon pipe 4 is exactly pipe-shaped and further has an inverted U-shape, foreign matter or the like may enter the inside thereof to cause clogging or some trouble. In such a case, the maintenance / maintenance of the cleaning device is extremely difficult. Therefore, there has been a strong demand for a cleaning device that is easy to maintain / maintain.
【０００５】本発明はこのような従来の技術や現状に着
目してなされたものであり、サイフォンの原理を応用し
た排水系の清掃装置において、サイフォン現象が起こり
やすく、その通過可能な排水の流量を増大させて清掃効
果をより高め、且つ清掃装置自体の保守・整備も容易な
ものとした排水系の清掃装置を提供せんとするものであ
る。The present invention has been made by paying attention to such a conventional technique and the present situation, and in a drainage system cleaning device to which the siphon principle is applied, a siphon phenomenon easily occurs and the flow rate of the drainage that can pass therethrough. It is an object of the present invention to provide a cleaning device for a drainage system in which the cleaning effect is further increased, and the cleaning device itself is easily maintained and maintained.
【０００６】[0006]
【課題を解決するための手段】この発明に係る排水系の
清掃装置は上記のような課題を解決するために、流入水
を受入れ、底部に貫通立設した排出管から排水する貯槽
と、前記排出管を取り囲んで貯槽内部を流入側貯槽部と
排出側貯槽部とに区画し、且つ双方の貯槽部を連通する
流通孔を下部に設けた円筒状の案内隔壁と、流入側貯槽
部と貯槽外部とを連通する通気孔を備え、前記流入側貯
槽部と排出側貯槽部の天板部を兼ねた貯槽の蓋と、から
なり、上記排出管と案内隔壁および蓋とにより貯槽内部
にサイフォン構造を形成し、一定量の流入水を貯槽内部
に一時貯留しては一度に排水系へ排出させるようにした
排水系の清掃装置であって、排出側貯槽部の天板部に案
内隔壁の内径よりも小径且つ排出管より大径の窪み部を
凹設し、排出管への排水流入を急峻化させることを特徴
とするものである。In order to solve the above-mentioned problems, a drainage system cleaning device according to the present invention is provided with a storage tank which receives inflowing water and drains it from a discharge pipe which is erected upright at the bottom. A cylindrical guide partition wall that surrounds the discharge pipe and divides the inside of the storage tank into an inflow-side storage tank portion and a discharge-side storage tank portion, and a communication hole that connects both storage tank portions at the bottom, and an inflow-side storage tank portion and a storage tank. A storage tank lid having a vent hole communicating with the outside and also serving as a top plate portion of the inflow side storage tank portion and the discharge side storage tank portion, and a siphon structure inside the storage tank by the discharge pipe, the guide partition wall and the lid. A drainage system cleaning device that temporarily stores a certain amount of inflow water inside the storage tank and discharges it to the drainage system at once. Smaller than that of the discharge pipe and larger in diameter than the discharge pipe. It is characterized in that for sharpening the drainage inlet.
【０００７】尚、以上及び以下の記述において「取り囲
む」とは、所定の間隔を置いて包囲すること、あるいは
囲繞することを意味する用語として用いるものである。In the above description and the following description, the term "enclose" is used as a term that means to surround or surround at a predetermined interval.
【０００８】本発明の排水系の清掃装置においては、サ
イフォンの原理を応用するに当たって従来のようなパイ
プ状のサイフォン管を用いず、貯槽の底部に貫通立設し
た排出管と、この排出管を取り囲む案内隔壁と、排出側
貯槽部の天板部に凹設された窪み部を持つ蓋と、により
サイフォン構造を形成している。そのため、単なる逆Ｕ
字形のパイプ状のサイフォン管とは異なり、排出管の上
端部周縁の全周から排水が流入することになるので、上
述した従来の頂上空間６に比べその高さを抑えつつも通
過可能な排水の流量を増大させることができるうえ、窪
み部の存在によって、排出側貯槽部の頂上部空間内の水
位上昇が排水の流入量に対して急激となり、サイフォン
現象が起こり易くなるので排水系の清掃装置としてより
好適である。In the drainage system cleaning device of the present invention, when the principle of the siphon is applied, a conventional pipe-shaped siphon pipe is not used, and a discharge pipe penetratingly erected at the bottom of the storage tank and this discharge pipe are installed. A siphon structure is formed by a surrounding guide partition wall and a lid having a recessed portion formed in the top plate portion of the discharge side storage tank portion. Therefore, just reverse U
Unlike the siphon pipe in the shape of a V-shaped pipe, since the drainage flows in from the entire circumference of the upper edge of the discharge pipe, it is possible to pass the drainage while suppressing its height as compared with the conventional top space 6 described above. In addition to increasing the flow rate of the drainage system, the presence of the depression causes the water level in the top space of the discharge side storage tank to rise sharply with respect to the inflow of wastewater, and siphoning is likely to occur. It is more suitable as a device.
【０００９】 なお、案内隔壁の内表面を窪み部に向かって滑らかに連
続するように形成して傾斜部とすることによって、排出
側貯槽部を上方に向かって徐々に縮径する形状とする
と、流入側貯槽部に排水が流入した場合、排出側貯槽部
の水位上昇が徐々に急峻化するので、排水の勢いがさら
に増すと共にその流れがスムーズになるのでいっそう望
ましい。When the inner wall of the guide partition wall is formed so as to be smoothly continuous toward the recessed portion to form an inclined portion, the discharge-side storage tank portion is gradually reduced in diameter upward. When the drainage flows into the inflow side storage tank part, the water level rise in the discharge side storage tank part becomes steep gradually, so that the momentum of the drainage is further increased and the flow becomes smoother, which is more desirable.
【００１０】更に、本発明の排水系の清掃装置において
は、サイフォン構造がパイプ状ではなく、蓋を取り払え
ば貯槽の上部開口から清掃装置の内部が全て整備可能と
なることから、清掃装置自体の保守・整備も容易なもの
とすることができる。Furthermore, in the drainage system cleaning device of the present invention, the siphon structure is not pipe-shaped, and if the lid is removed, the entire interior of the cleaning device can be serviced from the upper opening of the storage tank. The maintenance and maintenance of can be made easy.
【００１１】[0011]
【実施例】以下、本発明の好適な実施例を図に基づいて
説明する。尚、各実施例に共通する部分には同一の符号
を付し、重複する説明は省略する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT A preferred embodiment of the present invention will be described below with reference to the drawings. The parts common to the respective embodiments are designated by the same reference numerals, and the duplicated description will be omitted.
【００１２】図１及び図２は本発明の排水系の清掃装置
７を示すものであり、主として貯槽８と排出管９および
案内隔壁１０、そして蓋１１とからなっている。貯槽８
はその上部を開口とし、側壁１２に流入口１３を備える
と共に、排出管９は貯槽８の底部１４に貫通させた状態
で立設され、排出管９の上端部２０までの流入水を貯留
しつつ、上端部２０を越える分については排出するよう
になっている。案内隔壁１０は排出管９を一定の間隔で
取り囲んで貯槽８の内部を流入側貯槽部１５と排出側貯
槽部１６とに区画するように円筒状に形成されており、
且つ流入側貯槽部１５と排出側貯槽部１６を連通する流
通孔１７が下部に設けられている。そして、蓋１１は流
入側貯槽部１５の内部と貯槽８の外部とを連通する通気
孔兼用の落とし口１８を備え、流入側貯槽部１５と排出
側貯槽部１６の天板部を兼ねて貯槽８の上部開口を覆う
ものである。さらに、蓋１１の下面１９の排出側貯槽部
１６の天板部には、排出管９の上端部２０を越えて排出
側貯槽部１６の上部空間と排出管９の上部空間とを接続
しサイフォン構造の頂上部空間２１を形成する窪み部２
８を備えている。すなわち、この窪み部２８は排出管９
の上端部２０を所定間隔Ｓ1 で取り囲むように形成され
ており、且つその平面積が蓋１１の下面１９全体の平面
積に対して十分小さく、案内隔壁１０の内径より小径で
排出管９の径より大径となるように設けられている。1 and 2 show a drainage system cleaning device 7 of the present invention, which mainly comprises a storage tank 8, a discharge pipe 9, a guide partition wall 10, and a lid 11. Storage tank 8
Has an opening at its upper part, is provided with an inflow port 13 on the side wall 12, and the discharge pipe 9 is erected in a state of penetrating the bottom portion 14 of the storage tank 8 and stores inflow water to the upper end portion 20 of the discharge pipe 9. Meanwhile, the portion exceeding the upper end portion 20 is discharged. The guide partition wall 10 is formed in a cylindrical shape so as to surround the discharge pipe 9 at regular intervals and divide the inside of the storage tank 8 into an inflow-side storage tank portion 15 and a discharge-side storage tank portion 16.
In addition, a flow hole 17 that connects the inflow-side storage tank portion 15 and the discharge-side storage tank portion 16 is provided in the lower portion. The lid 11 is provided with a vent 18 that also serves as a ventilation hole that communicates the inside of the inflow side storage tank portion 15 with the outside of the storage tank 8, and also serves as the top plate portion of the inflow side storage tank portion 15 and the discharge side storage tank portion 16. 8 covers the upper opening. Further, the top plate portion of the discharge-side storage tank portion 16 on the lower surface 19 of the lid 11 connects the upper space of the discharge-side storage tank portion 16 and the upper space of the discharge pipe 9 beyond the upper end portion 20 of the discharge pipe 9 and siphons. Recess 2 that forms the top space 21 of the structure
8 is provided. That is, the recess 28 is formed in the discharge pipe 9
Is formed so as to surround the upper end portion 20 of the discharge pipe 9 at a predetermined interval S 1 , and the plane area thereof is sufficiently smaller than the plane area of the entire lower surface 19 of the lid 11, and the diameter of the discharge pipe 9 is smaller than the inner diameter of the guide partition wall 10. The diameter is larger than the diameter.
【００１３】尚、排出管９の下方部は図示せぬ下水管な
どの排水系に接続されている。また、この実施例では案
内隔壁１０と蓋１１とが一体となっているが、この例に
限らず貯槽８の底部１４に立設しても良いし、あるいは
単独で貯槽８の内部に設置しても良い。The lower portion of the discharge pipe 9 is connected to a drainage system such as a sewer pipe (not shown). Further, although the guide partition wall 10 and the lid 11 are integrated in this embodiment, the present invention is not limited to this example, and may be erected on the bottom portion 14 of the storage tank 8 or may be independently installed inside the storage tank 8. May be.
【００１４】このような構成とすることにより、貯槽８
内においては排出管９と案内隔壁１０および蓋１１とに
よりサイフォン構造が形成され、流入口１３から流入す
る排水を貯槽８内部に一定量、つまり一定の水位となる
分だけ一時貯留しては一度に排水系へ排出させ、その勢
いと流量により排水系の内部を洗い流して清掃すること
が可能となると共に、窪み部２８を設けたことによっ
て、頂上部空間２１内における水位の上昇、即ちサイフ
ォン現象が起こる直前の水位の上昇が急激となるから、
サイフォン現象が起こり易くなる。従って更に太い寸法
の排出管２５を用いることができるため、通過可能な排
水の流量を更に増大させることができ、清掃効果を一層
高めることができる。With such a structure, the storage tank 8
In the inside, a siphon structure is formed by the discharge pipe 9, the guide partition wall 10 and the lid 11, and the wastewater flowing from the inflow port 13 is temporarily stored in the storage tank 8 by a fixed amount, that is, by a constant water level. To the drainage system, and it becomes possible to wash and clean the inside of the drainage system by its force and flow rate, and by providing the depression 28, the water level rises in the top space 21, that is, the siphon phenomenon. Just before the occurrence of the water level rises sharply,
Siphon phenomenon is likely to occur. Therefore, since the discharge pipe 25 having a larger thickness can be used, the flow rate of the waste water that can pass through can be further increased and the cleaning effect can be further enhanced.
【００１５】そして、上記のような構成とした排水系の
清掃装置７においては、排水の流入量に対して適切な高
さとしなければならないサイフォン構造内の頂上部空間
２１の高さは、即ち排出管９の上端部２０と窪み部との
間の距離Ｓ1 となる。この距離Ｓ1 は排出管９の太さに
は直接関係がないことから、距離Ｓ1 を適切な高さとし
つつ排出管９を可能な限り太い寸法のものとすることが
できる。また、頂上部空間２１において排水は排出管９
の上端部２０の周縁全周から排出管９内に流入すること
になる。従って、これらのことにより通過可能な排水の
流量を増大させることができ、清掃効果をより高めるこ
とができる。In the drainage system cleaning device 7 having the above-described structure, the height of the top space 21 in the siphon structure, which must be an appropriate height for the inflow of drainage, is the drainage. It is the distance S 1 between the upper end 20 of the tube 9 and the depression. Since this distance S 1 is not directly related to the thickness of the discharge pipe 9, the discharge pipe 9 can be made as thick as possible while maintaining the distance S 1 at an appropriate height. Further, in the top space 21, the drainage pipe 9
It will flow into the discharge pipe 9 from the entire periphery of the upper end portion 20 of the. Therefore, the flow rate of the waste water that can pass through the above can be increased, and the cleaning effect can be further enhanced.
【００１６】更に、このような構成とすることにより、
蓋１１を取り払えば貯槽８の上部開口から清掃装置７の
内部が全て整備可能となるものであり、例えば内部に異
物が詰まった場合の除去作業や、その他何らかの支障が
生じた場合の内部の点検作業が容易となり、清掃装置７
自体の保守・整備も容易なものとすることができる。Further, by having such a structure,
If the lid 11 is removed, the entire interior of the cleaning device 7 can be serviced from the upper opening of the storage tank 8. For example, the removal work when foreign matter is clogged inside or the interior of the cleaning device 7 when some other trouble occurs Inspection work becomes easy and cleaning device 7
Maintenance and maintenance of itself can be made easy.
【００１７】図３に示すのは本発明の他の実施例である
排水系の清掃装置２２を示すものであり、蓋２３の下面
２４の排出側貯槽部１６の天板部には、上記実施例同様
に、排出管２５の上端部２６を所定間隔Ｓ2 で取り囲む
ように形成された窪み部２８を備えると共に、この窪み
部２８と案内隔壁１０との段差をなくして内表面が滑ら
かに連続するように傾斜部２４ａを設けたものである。
このようにすることにより排水が排出される際の流れが
円滑になり、勢いが衰え難くなることから清掃効果をよ
り高めることができるものである。FIG. 3 shows a drainage system cleaning device 22 according to another embodiment of the present invention, in which the above-mentioned embodiment is provided on the top plate portion of the discharge side storage tank portion 16 on the lower surface 24 of the lid 23. Similarly to the example, the upper end portion 26 of the discharge pipe 25 is provided with a recess 28 formed so as to surround the discharge pipe 25 at a predetermined interval S 2 , and the inner surface is smoothly continuous by eliminating the step between the recess 28 and the guide partition wall 10. The inclined portion 24a is provided so as to do so.
By doing so, the flow of drainage becomes smoother and the momentum is less likely to decline, so the cleaning effect can be further enhanced.
【００１８】また、この例では貯槽２９の底部３０に谷
部３１を設けており、排水の流れを円滑にさせると共に
底部３０および谷部３１に溜まった塵芥などを取り除き
易いようにしている。Further, in this example, the bottom portion 30 of the storage tank 29 is provided with the valley portion 31, so that the flow of the drainage is made smooth and the dust and the like accumulated in the bottom portion 30 and the valley portion 31 can be easily removed.
【００１９】図４に示すのは窪み部についての他の実施
例を示すものであり、蓋３２の下面３３の排出側貯槽部
１６の天板部に設けた窪み部３４には、排出管３５の上
端部３６の中心に入り込むように臨ませた突起部３７が
備えられている。このような構成とすることにより、サ
イフォン構造の頂上部空間３８における排水の水位上昇
が更に急激となると共に、頂上部空間３８内部の空気が
排水によって排出管３５内に押し流され、サイフォン現
象が起こり易くなる他、排水の流れが円滑となりること
から、通過可能な排水の流量を更に増大させることが可
能となるものである。FIG. 4 shows another embodiment of the hollow portion, in which the drain pipe 35 is provided in the hollow portion 34 provided in the top plate portion of the discharge side storage tank portion 16 of the lower surface 33 of the lid 32. The projection 37 is provided so as to enter the center of the upper end 36 of the. With such a configuration, the water level in the top space 38 of the siphon structure rises more rapidly, and the air inside the top space 38 is swept into the discharge pipe 35 by the waste water, causing a siphon phenomenon. In addition to facilitating the flow, the flow of the drainage becomes smooth, so that the flow rate of the drainage that can be passed can be further increased.
【００２０】[0020]
【発明の効果】本発明に係る排水系の清掃装置は以上説
明してきた如き内容のものであり、サイフォンの原理を
応用した排水系の清掃装置において、サイフォン現象が
起こりやすく、その通過可能な排水の流量を増大させて
清掃効果をより高めると共に、清掃装置自体の保守・整
備も容易なものとすることができる。The drainage system cleaning device according to the present invention has the contents as described above, and in the drainage system cleaning device applying the siphon principle, siphon phenomenon easily occurs and the drainage that can pass therethrough is used. The cleaning effect can be increased by increasing the flow rate of the cleaning device, and the cleaning device itself can be easily maintained and maintained.
【図１】本発明に係る排水系の清掃装置の実施例を示す
一部断面の斜視図である。FIG. 1 is a perspective view of a partial cross section showing an embodiment of a drainage system cleaning device according to the present invention.
【図２】図１に示す実施例の矢示Ａ−Ａ線に沿う端面図
である。2 is an end view of the embodiment shown in FIG. 1 taken along the line AA.
【図３】本発明の他の実施例を示す図２相当の端面図で
ある。FIG. 3 is an end view corresponding to FIG. 2 showing another embodiment of the present invention.
【図４】窪み部についての他の例を示す拡大端面図であ
る。FIG. 4 is an enlarged end view showing another example of a recess.
【図５】従来の排水系の清掃装置を示す斜視図である。FIG. 5 is a perspective view showing a conventional drainage system cleaning device.
【図６】図５中のサイフォン管の頂上部付近を示す拡大
断面図である。FIG. 6 is an enlarged cross-sectional view showing the vicinity of the top of the siphon tube in FIG.
【符号の説明】 ７、２２ … 排水系の清掃装置 ８、２９ … 貯槽 ９、２５、３５ … 排出管 １０ … 案内隔壁 １１、２３、３２ … 蓋 １２ … 側壁 １３ … 流入口 １４、３０ … 底部 １５ … 流入側貯槽 １６ … 排出側貯槽 １７ … 流通孔 １８ … 落とし口（通気孔） １９、２４、３３ … 下面 ２０、２６、３６ … 排出管の上端部 ２１、２７、３８ … 頂上部空間 ２８、３４ … 窪み部 ３７ … 突起部[Explanation of symbols] 7, 22 ... Drainage system cleaning device 8, 29 ... Storage tank 9, 25, 35 ... Discharge pipe 10 ... Guide partition wall 11, 23, 32 ... Lid 12 ... Side wall 13 ... Inflow port 14, 30 ... Bottom part 15 ... Inflow side storage tank 16 ... Discharge side storage tank 17 ... Flow hole 18 ... Drop port (ventilation hole) 19, 24, 33 ... Lower surface 20, 26, 36 ... Discharge pipe upper end portion 21, 27, 38 ... Top space 28 , 34 ... Dimple 37 ... Projection
Claims (2)
出管から排水する貯槽と、 前記排出管を取り囲んで貯槽内部を流入側貯槽部と排出
側貯槽部とに区画し、且つ双方の貯槽部を連通する流通
孔を下部に設けた円筒状の案内隔壁と、 流入側貯槽部と貯槽外部とを連通する通気孔を備え、前
記流入側貯槽部と排出側貯槽部の天板部を兼ねた貯槽の
蓋と、からなり、 上記排出管と案内隔壁および蓋とにより貯槽内部にサイ
フォン構造を形成し、一定量の流入水を貯槽内部に一時
貯留しては一度に排水系へ排出させるようにした排水系
の清掃装置であって、排出側貯槽部の天板部に案内隔壁の内径よりも小径且つ
排出管より大径の窪み部を凹設し、排出管への排水流入
を急峻化させることを特徴とする排水系の清掃装置。 1. A drainage that receives inflowing water and stands up through at the bottom.
A reservoir for draining decane, said reservoir interior surrounds the discharge pipe is divided into an inflow-side tank portion and the discharge-side tank portion, and a cylindrical guide of the through-holes for communicating the reservoir unit both provided at the lower portion The discharge pipe and the guide bulkhead, which include a partition wall, and a storage tank lid having a vent hole communicating the inflow side storage tank portion with the outside of the storage tank and also serving as a top plate portion of the inflow side storage tank portion and the discharge side storage tank portion. A drainage system cleaning device in which a siphon structure is formed inside the storage tank by a lid and a lid, and a certain amount of inflow water is temporarily stored inside the storage tank and discharged to the drainage system at once, and the discharge side storage tank section On the top plate of the
A recess with a larger diameter than the discharge pipe is recessed to allow drainage to flow into the discharge pipe.
A drainage system cleaning device characterized by sharpening.
々に縮径し窪み部へ連続する傾斜部が形成されている請
求項１に記載の排水系の清掃装置。 2. The inner surface of the guide partition wall gradually moves upward.
Contracts where the diameter is gradually reduced and a continuous slope is formed to the recess.
The drainage system cleaning device according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3213217A JP2507203B2 (en) | 1991-07-31 | 1991-07-31 | Drainage system cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3213217A JP2507203B2 (en) | 1991-07-31 | 1991-07-31 | Drainage system cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0533383A JPH0533383A (en) | 1993-02-09 |
| JP2507203B2 true JP2507203B2 (en) | 1996-06-12 |
Family
ID=16635473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3213217A Expired - Lifetime JP2507203B2 (en) | 1991-07-31 | 1991-07-31 | Drainage system cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2507203B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61143755A (en) * | 1984-12-17 | 1986-07-01 | Fuji Photo Film Co Ltd | Treatment of color photographic sensitive material |
| CN114259972B (en) * | 2022-01-07 | 2024-05-10 | 宝生集团有限公司 | Liquid-liquid two-phase mixing device of chlorine dioxide strengthening reactor |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL8200186A (en) * | 1982-01-19 | 1983-08-16 | Viplex Plastics | DRAINAGE WELL WITH WATER LOCK. |
| JPS6226492A (en) * | 1985-07-25 | 1987-02-04 | Matsushita Electric Works Ltd | Heat pipe |
| JPS63241391A (en) * | 1987-03-28 | 1988-10-06 | 株式会社東芝 | Exhaust port device |
-
1991
- 1991-07-31 JP JP3213217A patent/JP2507203B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0533383A (en) | 1993-02-09 |
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