JP2522964B2 - Substrate loading / unloading mechanism of substrate baking device - Google Patents

Description

The present invention relates to a substrate loading / unloading mechanism for a substrate baking apparatus.

[Prior Art] For example, a glass substrate used for a liquid crystal display is coated with a photoresist for the purpose of forming a pattern of a transparent electrode on the substrate. To bake and dry the photoresist, a baking treatment is further performed. Need to give. Conventionally, this baking process has been executed by the following substrate baking apparatus.

6 and 7 are a plan view and a front view of a conventional substrate baking apparatus, respectively.

The two wire rails 90, 90 circulate around two upper rollers 91a, 91a arranged horizontally at the same height and two lower rollers 91b, 91b arranged horizontally at the same height. And the rollers are tensioned. The two surface heaters 92a and 92b are arranged immediately below the upper portions of the two wire rails 90 and 90 so as to be surrounded by these rails.

This baking device is usually installed in a clean room. The substrate 93 to be baked is placed so as to straddle the two wire rails 90, 90, is moved by the rotation of four rollers, and is stopped immediately above each surface heater 92a, 92b. The surface heaters 92a and 92b are set to different temperatures, and the substrate 93 is heated by radiant heat from the surface heater immediately below and convection of air at each stop position. When the baking is completed in this way, the substrate 93 is rotated by the roller and the surface heater 92a,
It is carried away from above 92b to the next processing step.

However, the conventional substrate baking apparatus described above has the following problems.

First, since the substrate 93 was heated by the non-contact surface heaters 92a and 92b, the thermal efficiency of baking was poor. Secondly, since the wire rails 90, 90 traveled directly above the surface heaters 92a, 92b, the thermal expansion of these wire rails lowers the tension of the rails, and when this device is used for a long period of time, Could be thermally deteriorated. Third, these wire rails 90, 90
When passing under 1a, 91a and lower rollers 91b, 91b,
The dust generated from the rotating mechanism such as the bearings of these rollers may adhere to the wire rails 90, 90 and contaminate these rails. When the wire rails 90, 90 further rotate, the dust may migrate from the rails to the back surface of the substrate 93 and adhere to the dust, thus contaminating the substrate. Further, since the substrate 93 is only placed so as to straddle the two wire rails 90, 90, the upper rollers 91a, 91a and the lower rollers 91a and 91a and the lower rollers 91 are intended to move the substrate at high speed.
When b and 91b are rotated at a high speed, there is a problem that the substrate is displaced and falls from the wire rails 90 and 90.

It is also possible to use the conveyor itself for mounting the substrate as a surface heater, but in this case, a slip ring for supplying a current to this heater is required, which not only complicates the structure but also Dust may be generated from the slip ring, or contact failure may occur in this part. Further, the point that the substrate cannot be moved at high speed was the same as above.

In order to solve the above problems, the inventors of the present invention have proposed a substrate baking apparatus having a heater moving type substrate baking mechanism as described below.

That is, this heater moving type substrate baking mechanism is
By moving the surface heater on which the substrate is placed, baking and transfer of the substrate are simultaneously performed,
More specifically, a surface heater array in which surface heaters capable of mounting a substrate on the upper surface are arranged in parallel in the horizontal direction at a predetermined interval, and each surface heater in a direction perpendicular to the arrangement direction of these surface heaters. And a distance between the substrate mounting members is the same as the predetermined interval, and the surface heater array is arranged on each substrate mounting member pair. It was possible to move in the vertical direction so as to be higher and lower than the installation height, and to be able to move forward and backward in the parallel installation direction of the surface heaters by the same distance as the predetermined interval.

In this substrate baking mechanism, baking and carrying of the substrate are simultaneously executed as follows.

The substrate to be baked is placed on the substrate placing member pair while the surface heater array is located at a position lower than the arrangement height of each substrate placing member pair. Next, when the surface heater array is lifted higher than the arrangement height of each substrate mounting member pair, the substrate is mounted on the surface heater. While the substrate is placed on the surface heater, the surface heater bakes the substrate. Next, the surface heater array advances the substrates in the parallel direction by the same distance as the parallel spacing of the surface heaters while baking the substrates, whereby the substrates are simultaneously baked and transported. . After that, the surface heater array is lowered until it becomes lower than the arrangement height of each substrate mounting member pair. At the time of this descent, the substrate is placed on another substrate mounting member pair adjacent to the previous substrate mounting member pair, apart from the surface heater. Then, when the surface heater row is further retracted by the same distance as the forward distance and then raised again, this substrate is placed on another surface heater adjacent to the previous surface heater and baked by this surface heater. While being conveyed, it is conveyed further forward.

[Problems to be Solved by the Invention] According to the substrate baking apparatus having the heater moving type substrate baking mechanism described above, the above-mentioned problems of the conventional substrate baking apparatus can be solved. Since there is no substrate loading / unloading mechanism for automatically loading / unloading a substrate into / from the heater moving type substrate baking mechanism, it is possible to simultaneously perform baking and transportation automatically. While using the baking mechanism, there was no other way to load and unload the substrate than to manually carry it out.

The present invention automatically transfers a substrate to a heater moving type substrate baking mechanism that simultaneously performs baking and transfer of a substrate by moving a surface heater on which the substrate is placed, or automatically transfers the substrate from this mechanism. It is an object of the present invention to provide a substrate loading / unloading mechanism of a substrate baking apparatus that can be loaded and unloaded.

[Means for Solving Problems] In order to achieve the above object, the present invention arranges a lift fork having a claw capable of mounting a substrate above a heater movable substrate baking mechanism, and opposes each other. A pair of mounting rollers composed of mounting rollers provided in parallel with each other above the heater movable substrate baking mechanism are arranged in parallel and horizontally, and the lift fork and the pair of mounting rollers are: Each of them can move vertically and horizontally as follows.

That is, the lift fork is vertically movable so that the pawl of the lift fork is higher or lower than the height of the placement rollers arranged side by side between the pair of placement rollers.
On the other hand, the mounting roller pair is movable in the horizontal direction so as to reduce the facing interval so that the substrate can be mounted, and when the lift fork is moved in the vertical direction,
The substrates placed on the claws of the lift fork are movable so as to increase the facing distance so that the substrates can pass between the placement rollers provided so as to face each other. When the claw moves between the pair of placing rollers and moves so as to be lower than the juxtaposed height, the substrate placed on the claw approaches the heater moving type substrate baking mechanism and further moves. Is placed on the heater moving type substrate baking mechanism.

[Operation] Loading the substrate into the heater moving type substrate baking mechanism
It is executed as follows.

That is, in this case, the lift fork is lowered so that its claw is lower than the juxtaposed height of the placing rollers between the placing roller pairs, and the placing roller pair can place the substrate. So that the facing interval is reduced so that In this state, the substrate is loaded on the placement roller by the rotation of the loading roller to the position where the lift fork is arranged. Next, the lift fork is lifted so that its pawl is higher than the juxtaposed height of the mounting roller, and the substrate is placed on the pawl of the lift fork and separated from the mounting roller. After that, the pair of placing rollers are moved in the horizontal direction so as to increase the facing interval, and the lift fork passes between the placing rollers provided so that the substrates placed on the claws face each other. It can be lowered. Therefore, the substrate is placed on the heater moving type substrate baking mechanism provided below the loading / unloading mechanism, and is loaded into the baking mechanism.

The substrate, which has been baked and moved by the movement of the surface heater, is carried out from the heater moving type substrate baking mechanism as follows.

That is, in this case, the lift fork is lowered so that the claws of the lift fork are lower than the height of the placement rollers arranged side by side, and the placement roller pair is mounted on the claws of the lift fork. The substrates to be placed are moved in the horizontal direction so as to increase the facing distance so that the substrates can pass between the placement rollers. In the heater moving type substrate baking mechanism, the substrate moves to the position where the lift fork is arranged. At this time, the lift fork is lifted so that its pawl is higher than the juxtaposed height of the placing rollers, and the substrate is placed on the pawl of the lift fork and separated from the baking mechanism, and further, between the placing rollers. Pass and rise. After that, the mounting roller pair is moved in the horizontal direction so as to reduce the facing interval so that the substrate can be mounted, and the lift fork again has its pawl lower than the juxtaposed height of the mounting rollers. To be lowered. As a result, the substrate is placed on the placement roller away from the claws of the lift fork, and is carried out by the rotation of this roller.

[Embodiment] FIG. 1 is a plan view of a substrate loading / unloading mechanism of a substrate baking apparatus according to an embodiment of the present invention, showing a case where a substrate is loaded into a heater movable substrate baking mechanism.

A drive roller 42 is attached to the tip of a horizontal shaft 41 that is rotated by a motor (not shown).

On the other hand, four shafts 44 are arranged parallel to the shaft 41 and rotatable at the same height as each other between the two fixed walls 43, 43 standing upright in parallel with each other. Of these shafts 44, the shaft closest to the shaft 41 penetrates one fixed wall 43, and a driven roller 45 is attached to the tip of the fixed wall 43.
A belt 46 is hung between the belt 42 and the belt 42. In addition, each shaft 44 has two
Two transport rollers 47 are attached, and between each shaft 44,
Belt 48 is hung. In addition, four shafts 44
Above the shaft farthest from the shaft 41, a sensor 49 for detecting the position of the substrate is attached at the central position of the member arranged so as to bridge both the fixed walls 43, 43. .

The other fixed walls 50, 51 are erected parallel to the fixed walls 43, 43 so that the shaft 41 is sandwiched between the fixed walls 43, 43. Two movable walls 54, 54 are arranged inside these other fixed walls 50, 51. The fixed walls 50, 51 are provided with linear bearings 52 so as to penetrate through the fixed walls 50, 51, respectively, and a shaft that is swingable so as to penetrate through the linear bearings 52.
The tip of 53 is fixed to each movable wall 54, 54. Also,
An air cylinder 55 is fixed to each of the fixed walls 50 and 51, and a tip of a piston rod portion 55a of the air cylinder 55 is fixed to each of the movable walls 54. Furthermore, one fixed wall
50 and both movable walls 54, 54, a shaft 56 is rotatably arranged on the side closer to the shaft 41 at a position higher than the shaft 44 so as to penetrate through these walls together. A driven roller 57 is attached between the fixed wall 50 and one movable wall 54. A belt 58 is stretched between the driven roller and the driving roller 42.

Inside the respective movable walls 54, 54, six mounting rollers 59a, 59b are rotatably provided at the same height as that of the conveying rollers 47, respectively. That is, six pairs of mounting rollers 59, which are mounting rollers 59a and 59b provided facing each other, are arranged in parallel and horizontally.
A belt 60 is stretched between the mounting rollers 59a and 59b closest to the shaft 56 among the pair of mounting rollers 59 and the shaft 56. Further, a belt 61a is hung between the mounting rollers 59a provided on the one movable wall 54,
Also between the mounting rollers 59b provided on the other movable wall 54,
Another belt 61b is hung.

Motors 62 and 62 are attached to the fixed walls 50 and 51, respectively, and the shafts of the motors are connected to each other by a shaft 63. Reference numerals 64 and 64 denote gate-shaped support members, which can be moved up and down by the rotation of the both motors 62 and 62, and are fixed walls 50 and 51.
Is attached to. Reference numeral 65 denotes a lift fork whose shape will be described in detail later, and the lift fork 65 is fixed to the upper ends of the support members 64 so as to bridge them. Further, a projecting piece 66 is fixed to one of the support members 64, and the projecting piece 66 is mounted on the lift fork 65.
Can pass through the recess of the immobile sensor 67 provided to detect the height of the. Further, above the roller pair farthest from the shaft 56 among the six pairs of placement rollers 59, the position of the substrate is set at the central position of the member arranged so as to bridge both the fixed walls 50 and 51. Sensor for detecting 68
Is attached.

Reference numeral 69 denotes a heater moving type substrate baking mechanism, which is arranged between the movable walls 54, 54 and below the mounting roller pair 59 and the lift fork 65.

 FIG. 2 is a perspective view of the lift fork 65.

Both ends of this lift fork 65 are the support members 64, 6
Horizontally arranged elongated plate-shaped connecting piece 72 fixed to the upper end of 4, and two mounting pieces 73, 73 fixed to this connecting piece 72
Consists of The center of the horizontal portion 74 of each mounting piece 73 is fixed to the connecting piece 72 so as to be orthogonal to the connecting piece 72. Horizontal part 74
At both ends of the hanging part 75 hanging vertically from this part.
Is formed. At the lower end of each hanging part 75, a claw 76 that horizontally protrudes toward the other mounting piece 73 is formed.
The substrate can be placed by the two claws 76.

The lift fork 65 makes a translational motion in the vertical direction, that is, the Z direction, as the two support members 64, 64 that similarly move up and down by the rotation of the motors 62, 62 move. Therefore, the claw 76 is vertically movable between the mounting roller pair 59 so as to be higher or lower than the height of the mounting rollers arranged side by side.

On the other hand, both movable walls 54, 54 are movable in the longitudinal direction of the shaft 56, that is, in the Y direction, while the shaft 53 slides on the linear bearing 52 due to the expansion and contraction of the piston rod portion 55a of each air cylinder 55. The facing distance can be changed. Then, by moving both movable walls 54, 54, the placement roller pair 59 can be moved in the horizontal direction so as to reduce the facing interval so that the substrate can be placed, and the lift fork 65 can be moved vertically. When moving in the direction, the substrate placed on the claw 76 is moved to increase the facing distance so that the substrate can pass between the placing rollers 59a and 59b provided so as to face each other. It is possible.

The substrate is carried into the heater moving type substrate baking mechanism 69 as follows.

That is, in this case, the support members 64, 64 are lowered by the rotation of the motors 62, 62, and the lift fork 65 has the pawls 76 of the placement rollers 59a, 59b arranged side by side with the pawls 76 thereof. On the other hand, the mounting roller pair 59 is arranged such that the facing interval between the mounting roller pair 59 and the transport roller 47 is such that the piston rod portion 55a of the air cylinder 55 extends and the substrate can be mounted. It is about the same size.

In this state, the shaft 41 is rotated in a fixed direction, and the transport roller 47 is rotated in a fixed direction as the shaft 44 driven by the belts 46 and 48 rotates. On the other hand, the placement rollers 59a and 59b are driven via the belts 58, 60, 61a and 61b, and are rotated in the same direction as the transport roller 47. The position of the substrate loaded from below the sensor 49 is detected by this sensor, and the substrate is placed on the transport roller 47. Then, this substrate is rotated by the conveyance roller 47,
A direction perpendicular to both the Z direction and the Y direction, that is, X
In the X direction, then placed on the placement rollers 59a, 59b, and further advanced in the X direction by the rotation of the placement rollers. When this substrate reaches above the claw 76 of the lift fork 65 and its front edge reaches the position of the sensor 68, the rotation of the shaft 41 is stopped, and the transport roller 47 and the mounting roller are placed.
The rotation of 59a and 59b is stopped.

Next, the pawl 76 of the lift fork 65 has the mounting roller 59.
The substrate is lifted to a height higher than the apposition height of a and 59b, and the substrate is placed on the claw 76 and separated from the placement rollers 59a and 59b. At this time, the height of the lift fork 65 is detected by the protruding piece 66 and the sensor 67. After this, the air cylinder
The piston rod 55a of 55 is contracted, and the mounting roller pair 59
Are moved in the horizontal direction to increase the facing distance. When the placement roller pair 59 is fully opened, the motors 62, 6
By the rotation of 2, the lift fork 65 is lowered so that the substrates placed on the claws 76 pass between the placement rollers 59a and 59b provided so as to face each other. Therefore, the substrate is placed on the heater moving type substrate baking mechanism 69 provided below the loading / unloading mechanism. As a result, the substrate is carried into the baking mechanism 69, and the substrate is carried in the X direction while being baked by this baking mechanism.

The substrate is unloaded from the heater moving type substrate baking mechanism by the same mechanism as the substrate unloading mechanism of the substrate baking apparatus according to the embodiment of the present invention described above.

That is, in this case, for convenience sake, in FIG. 1, the substrate is moved by the heater moving type substrate baking mechanism 69.
It can be seen as being transported in the opposite direction.

In this case, the lift fork 65 is lowered so that the pawl 76 thereof is lower than the juxtaposed height of the placing rollers 59a and 50b between the placing roller pair 59, and the placing roller pair 59 is lowered.
Is moved in the horizontal direction so as to increase the facing interval so that the substrate placed on the claw 76 can pass between the placing rollers 59a and 59b. In the movable heater type substrate baking mechanism 69, the substrate is lifted by the lift fork 65.
Move to the position where was placed. At this time, the lift fork 65 is lifted so that its claw 76 is higher than the height at which the placement rollers 59a and 59b are arranged side by side, and the substrate is moved to the baking mechanism.
It is placed on this claw 76 apart from 69, and the placement roller 59
Passes between a and 59b and rises. After this, the placement roller pair 59
Is moved in the horizontal direction to reduce the facing interval so that the substrate can be placed.
Is again lowered so that its claw 76 becomes lower than the juxtaposed height of the placing rollers 59a, 59b. As a result, the substrate is placed on the placement rollers 59a and 59b apart from the claw 76, but in this case, the transport roller 47 and the placement rollers 59a and 59b are placed.
b is rotated in the opposite direction and the substrate is conveyed by the rotation of these rollers.

FIG. 3 and FIG. 4 are a plan view and a longitudinal sectional view of a heater moving type substrate baking mechanism 29 in which the substrate loading / unloading mechanism of the substrate baking apparatus according to the embodiment of the present invention is preferably used.

Reference numerals 2a to 2f are surface heaters capable of mounting a substrate on a rectangular upper surface, and 3 is a water-cooling type cooling plate capable of mounting a substrate on a rectangular upper surface. . These six surface heaters 2a to 2f and the cooling plate 3 are both arranged and fixed in parallel in the X direction at equal intervals L on the horizontal upper surface of the underframe 4, and these surface heaters are arranged in the surface heater array 5 Is formed. Further, the substrate mounting members 6a, 6a and the other substrate mounting members 7a, 7a facing the substrate mounting members 6a, 6a are arranged so as to sandwich one surface heater 2a in the direction perpendicular to the X direction. The mounting members 6a, 6a, 7a, 7a of the above constitute a substrate mounting member pair 8a. The surface heater 2a is the lift fork.
It is arranged so that it is located directly under 65. Other surface heater 2b ~
Similarly for the 2f and the cooling plate 3, the substrate mounting members 6b to 6f and 6g and the other substrate mounting members 7b to 7f and 7g facing these are disposed, and the substrate mounting members 8b to 8f are arranged. , 8g is composed. The distance between each substrate mounting member pair 8a to 8g is the same as the distance L.

On the lower surface of the underframe 4, air cylinders 9 and 10 each having an advancing and retracting axis in the vertical direction are arranged at intervals along the X direction. The tips of the piston rods of the air cylinders 9 and 10 are attached to the lower surface of the underframe 4, and the cylinders of the air cylinders are attached to both ends of a horizontally arranged plate-shaped carriage 11. . That is, due to the expansion and contraction of the piston rod portions of these air cylinders 9 and 10, the underframe 4 moves up and down with respect to the bogie 11, whereby the surface heater array 5
The cooling plate 3 is vertically movable so as to be higher or lower than the mounting height of each substrate mounting member pair 8a to 8g.

On the underside of the truck 11, two rear wheels are provided along the X direction.
12a, 12a and two front wheels 12b, 12b are mounted at appropriate intervals from each other. Grooves are formed on the peripheral surface of each wheel.In this groove, the rear wheels 12a, 12a rotate on the rear guide rails 13a, 13a, and the front wheels 12b, 12b rotate on the front guide rails 13b, 13b, respectively. It is placed as possible. The rear guide rails 13a, 13a and the front guide rails 13b, 13b are the frame 1 arranged below the carriage 11.
It is fixed in the X direction on the 4th.

Further, a cylinder portion of an air cylinder 15 having an advancing / retreating axis in the X direction is fixed on the frame 14, and a tip of a piston rod portion of the air cylinder is connected to a lower surface of the carriage 11 via a connecting piece 16. Has been done. Therefore, the dolly
Reference numeral 11 denotes an underframe 4 and a surface heater array 5 arranged on the underframe by expansion and contraction of the piston rod portion of the air cylinder 15.
And the cooling plate 3 together with the distance L equal to X.
It is possible to move forward and backward in the direction. The substrate mounting member pairs 8a to 8g are fixed to the frame 14.

FIGS. 3 and 4 show a state in which the piston rod portions of the air cylinders 9 and 10 and the piston rod portion of the air cylinder 15 are both contracted. In this state, the substrate 93 to be baked is lifted by the lift fork 65. Substrate mounting member
6a, 6a and the substrate mounting members 7a, 7a arranged so as to face this
It is mounted on the substrate mounting member pair 8a so as to bridge between and.

The temperatures of the surface heaters 2a to 2f are set so as to sequentially increase from 2a to 2d, and to decrease sequentially from 2d to 2f.

FIG. 5 is a view similar to FIG. 4 showing the operation of the substrate baking apparatus according to the embodiment of the present invention described above.

First, as shown in FIG. 5 (a), the air cylinders 9, 10
Extend the piston rod of and raise the underframe 4. As a result, the surface heater array 5 and the cooling plate 3 are lifted higher than the arrangement height of the substrate mounting member pairs 8a to 8g, and the substrate 93 mounted on the substrate mounting member pair 8a is separated from this. It is placed on the upper surface of the surface heater 2a. In this state, the substrate
93 is heated by heat conduction from this surface heater.

When the piston rod portion of the air cylinder 15 is extended while performing heating in this way, the rear wheels 12a, 12a and the front wheels 12b, 12b attached to the carriage 11 have rear groove guide rails 13a, 13a, respectively. And front guide rails 13b, 1
Rotate while engaging 3b. As a result, the carriage 10 and the underframe 4 integrally move forward in the X direction, and the surface heater array 5 and the cooling plate 3 move forward in the X direction by the same distance as the interval L and stop. FIG. 2B shows this state,
93 is heated by the surface heater 2a even during this movement.

Next, as shown in FIG. 7C, the underframe 4 is lowered by retracting the piston rod portions of the air cylinders 9 and 10 to their original positions. At this time, the surface heater array 5 and the cooling plate 3
Is lower than the mounting height of the substrate mounting members 6a to 6g, and the substrate 93 heated by the surface heater 2a is separated from the surface heater and other substrate mounting members adjacent to the substrate mounting members 6a and 6a. The substrate mounting member pair 8b formed by the mounting members 6b, 6b is mounted.

Further, when the piston rod portion of the air cylinder 15 is contracted back to its original position, the surface heater array 5 and the cooling plate 3 are retracted and stopped by the same distance as the previous advance distance, as shown in FIG. Returns However, at this time, the substrate 93
Are placed not on the substrate placing member pair 8a but on 8b. Therefore, when the piston rod portions of the air cylinders 9 and 10 are extended again, the substrate 93 is placed on the upper surface of another surface heater 2b adjacent to the previous surface heater 2a and having a higher temperature, and is heated to a higher temperature. To be done.

Substrate 93 is sequentially placed on each upper surface of surface heaters 2c, 2d, 2e, 2f and cooling plate 3 in the same manner. Therefore,
After the substrate 93 is heated to the maximum temperature at the position of the surface heater 2d, when it reaches the position of the cooling plate 3, it is cooled to almost room temperature and baking is completed. The substrate 93 is gradually heated and cooled by the two heater rows 5 and the cooling plate 3 having such a temperature distribution, so that the substrate is not cracked by thermal shock, and the substrate temperature is kept at the completion of baking. It can be lowered to almost room temperature. Then, after the baking is completed, the substrate mounting member
Substrate mounting member pair consisting of 6g and 6g The substrate 93 mounted on 8g
Are carried out by the lift fork 65.

As described above, according to the present embodiment, it is possible to change the transfer mode from the continuous transfer of the substrate by the transfer roller 47 to the intermittent transfer of the substrate by the heater moving type substrate baking mechanism 69. This inverse transformation can be performed.

In the above-described embodiment, the vertical movements and the forward and backward movements of the surface heater array 5 and the cooling plate 3 are realized by the air cylinders 9, 10 and the air cylinder 15, respectively. A rack and pinion mechanism may be used instead of the cylinder.

[Effects of the Invention] As described above, in the present invention, a lift fork having a claw capable of placing a substrate is disposed above the heater moving type substrate baking mechanism, and the loading forks provided facing each other. According to the present invention, since the pair of placing rollers, which are placing rollers, are arranged parallel to each other and horizontally, and the lift fork and the pair of placing rollers are movable in the vertical direction and the horizontal direction, respectively, the heater is moved. It is possible to provide a substrate loading / unloading mechanism of a substrate baking apparatus capable of automatically loading / unloading a substrate to / from a type substrate baking mechanism.

Moreover, since the substrate is placed on the placing roller or the claw of the lift fork, the substrate can be carried in and out without contacting, for example, the upper surface of the substrate on which the photoresist is applied.

In addition, near and above the part where the substrate passes,
Since there is no dust generation mechanism, there is no risk of dust contaminating the substrate, and the substrate is carried in and out while always maintaining a clean state.

[Brief description of drawings]

FIG. 1 is a plan view of a substrate loading / unloading mechanism of a substrate baking apparatus according to an embodiment of the present invention, FIG. 2 is a perspective view of a lift fork in the previous figure, and FIG.
1 is a plan view of a heater movable substrate baking mechanism in which the substrate loading / unloading mechanism of the substrate baking apparatus of FIG. 1 is preferably used, FIG. 4 is a longitudinal sectional view of the previous figure, and FIG. 5 is a heater shown in the previous 2 figures. FIG. 6 is a plan view of the conventional substrate baking apparatus showing the operation of the movable substrate baking mechanism, FIG. 6 is a plan view of the conventional substrate baking apparatus, and FIG. Explanation of reference numerals 2a to 2f ... Surface heater, 3 ... Cooling plate, 4 ... Underframe, 5 ... Surface heater array, 6a-6g, 7a-7g ... Substrate mounting member, 8a-8g ... Substrate mounting member pair, 9 , 10 ... Air cylinder, 11 ... Bogie, 12a, 12b ...
Wheels, 13a, 13b ... Guide rails, 14 ... Frame, 15 ... Air cylinders, 16 ... Connecting pieces, 47 ... Conveying rollers, 50, 51 ... Fixed walls, 52 ... Linear bearings, 54 ... Movable walls, 55 ... Air cylinders, 59a, 59b ... Placement roller, 59 ... Placement roller pair, 62
... Motor, 64 ... Support member, 65 ... Lift fork, 69 ... Heater moving type substrate baking mechanism, 72 ... Connecting piece, 73 ... Placing piece, 76 ... Claw, 90 ... Wire rail, 91a, 91b ... Roller, 92
a, 92b: surface heater, 93: substrate.

Claims (1)

(57) [Claims] A lift fork (65) having a claw (76) on which a substrate (93) can be placed is disposed above a heater movable substrate baking mechanism (69), and the loading fork is provided so as to face each other. Placement roller pair (59) consisting of placement rollers (59a) (59b)
Is a substrate loading / unloading mechanism arranged parallel to each other and horizontally above the heater movable substrate baking mechanism (69), wherein the lift fork (65) includes the claw (7).
6) is movable between the placing roller pair (59) so as to be higher or lower than the juxtaposed height, and the placing roller pair (59) can place the substrate (93). The placement roller (59a) is configured such that the facing interval is made smaller so that the substrate (93) placed on the claw (76) faces each other when the lift fork (65) moves. ) (59b) so that the facing distance can be increased so that the facing interval is increased, and the pawl (76) of the lift fork (65) passes between the placement roller pair (59). The substrate (93) placed on the claw (76) moves closer to the heater moving type substrate baking mechanism (69) by moving so as to be lower than the juxtaposed height, and further moves to move the heater. Type substrate baking mechanism (69), which is placed on a substrate Substrate loading and unloading mechanism of the baking unit.