JP2541278B2 - Electronic beam exposure system - Google Patents

Description

DETAILED DESCRIPTION [Overview] Regarding an aperture support mechanism in an electron beam exposure apparatus, a part of an electron beam emitted from an electron gun is transmitted for the purpose of simplifying the maintenance of the aperture and improving the operation rate of the apparatus. A first aperture having a first slit formed therein, a second aperture having a second slit formed to transmit a part of the electron beam transmitted through the first slit, and the electron Rotating means for rotating the second aperture in a plane orthogonal to the axis of the beam, the rotating means comprising a base plate for mounting the second aperture at a central portion of an upper surface and an upper flange for mounting the second aperture. The base plate is fixed and the second
A part of the electron beam that has passed through the aperture of the hollow shaft, the lower part and the lower end of the upper flange being rotatably supported, and the outer side of the middle part in the longitudinal direction of the hollow shaft. And a worm for rotating the worm wheel which is operated from the outside of the column accommodating the second aperture.

[Industrial applications]

The present invention relates to an electron beam exposure apparatus, and more particularly to a configuration that facilitates maintenance of a pair of apertures through which an electron beam emitted from an electron gun passes.

[Conventional technology]

FIG. 3 is a perspective view showing an aperture of a conventional electron beam exposure apparatus.

In FIG. 3, a first aperture 2 provided with a first rectangular slit 1 faces an electron gun (not shown), and a second aperture 2
The second aperture 4 having the rectangular slit 3 formed therein faces the electron gun with the aperture 2 interposed therebetween.

The electron beam 5 emitted from the electron gun irradiates the aperture 2. Part 51 of the electron beam 5 transmitted through the slit 1
Irradiates one corner of the slit 3 formed in the aperture 4. An electron beam 52, which passes through the slit 3 and is thinner than the electron beam 51, irradiates the surface of a sample (not shown).

Apertures 2 and 4 in the conventional electron beam exposure apparatus
Are fixed in a column containing the lens system of the device. Then, the corner portions of the slits 1 and 3 are deformed by the irradiation of the electron beam 5 or 51 and are charged up. Then, the electron beam 52 for irradiating the sample
Since the shape of the spot is deformed and accurate exposure is not performed, the apertures 2 and 4 in which the deformation is detected are
It is necessary to move (rotate) to replace the corners of the slits 1 and 3 for forming the electron beam 52 with other corners, or to replace them with new apertures 2 and 4.

[Problems to be Solved by the Invention]

Generally, the life of the used corner of the slit is about 7 to 10 days, and the time required to move (rotate) the aperture or replace it with a new aperture is used because the new corner is used to form the irradiation spot of the electron beam. However, it takes about two days including the time required to clean the inside of the column that is polluted by the air, which causes a problem that the operating rate of the device cannot be increased.

An object of the present invention is to simplify maintenance for moving or replacing the aperture and increase the operating rate of the device.

[Means for solving the problem]

FIG. 1 is an illustration of an electron beam in the device of the present invention, and FIG. 2 is an illustration of aperture rotating means according to an embodiment of the present invention.

In FIG. 1 and FIG. 2, the electron beam exposure apparatus of the present invention includes a part 51 of an electron beam 5 emitted from an electron gun.
A first aperture 2 having a first slit 1 formed therethrough and a second slit 3 having a second slit 3 through which a part 52 of the electron beam 51 transmitted through the first slit 1 penetrates. And rotating means 10 for rotating the second aperture 4 in a plane orthogonal to the axis of the electron beam 52. The rotating means 10 mounts the second aperture 4 at the center of the upper surface. 19 and the electron beam 52 which is obtained by fixing the base plate 19 to the upper flange 24 and passing through the slit 3 of the second aperture 4.
Is a hollow shaft 14 which is rotatably supported by the lower portion and the lower end portion of the upper flange 24 through the shaft center portion, a worm wheel 16 fixed to the outside of the middle portion of the hollow shaft 14 in the longitudinal direction, Two
And a worm 17 for rotating the worm wheel 16 which is operated by the outside of the column accommodating the aperture 4 of FIG.

[Action]

According to the present invention, by providing the rotating means for rotating the second aperture by the operation from the outside of the column, each corner of the slit formed in the second aperture introduces the atmosphere into the column. Without being able to use it sequentially, the dust generated from the mechanical sliding part of the rotating means
Since the second aperture is located above the mechanical sliding portion, it does not adhere to the second aperture. Therefore, in the conventional device that is continuously used, an operation stop date of about 6 to 8 days / month is required for aperture maintenance, whereas the operation stop date of the device according to the present invention is about 2 days / month. Is shortened to.

〔Example〕

An electron beam exposure apparatus according to an embodiment of the present invention will be described below with reference to the drawings.

FIG. 2 is a plan view (a) and a sectional view (b) of the aperture rotating means according to an embodiment of the present invention.

In FIG. 2, the rotating means 10 of the aperture 4 is supported by the cylinders 11 and 12 which form the apparatus column.
A support plate 13 fixed inside, a rotatable hollow shaft 14, a collar 15 and a worm wheel 16 fixed to the hollow shaft 14.
And a rotary shaft 18 to which a worm 17 meshing with the worm wheel 16 is fixed.

The support plate 13 is fixed to the flange-like projection 23 protruding inside the tubular body 11 by a plurality of screws 22.

The hollow shaft 14 is provided with a flange 24 at the upper end, the support plate 13 is rotatably sandwiched between the lower surface of the flange 24 and the upper surface of the collar 15, and the lower part of the hollow shaft 14 is at the center of the flange 25 projecting inside the tubular body 12. It is rotatable and fits loosely with the through hole.

The rotary shaft 18 has a micrometer type knob 26 which penetrates the tubular body 11 and allows the rotary shaft 18 to be manually rotated from outside the column.

The rotating means 10 configured as described above is configured such that the base plate 19 for mounting the aperture is fixed on the upper surface of the flange 24 of the hollow shaft 14,
Positioning projections 20 and 21 for the aperture 4 are provided on the upper surface of the aperture 4, and the aperture 4 mounted in contact with the projections 20 and 21 is mounted.
Is fixed so that the center of the slit 3 coincides with the rotation center of the hollow shaft 14, and the hollow shaft 14 is rotated by the knob 26 to
It can be rotated 0 °. And a part 52 of the electron beam 51
Illuminates the sample through the hollow shaft 14.

Therefore, when one of the corners of the slit 3 in use is deformed and an accurate electron beam 52 cannot be obtained, the aperture 4 is rotated by 90 ° by operating the knob 26 without introducing the atmosphere into the column. An electron beam 52 is obtained using a corner. After that, four corners will be available in the same way.

Although the rotating means 10 is provided on the aperture 4 in the above-described embodiment, the similar rotating means is provided on the aperture 2 so that the maintenance of the aperture of the electron beam exposure apparatus is further simplified and the operating rate of the apparatus is increased. Will improve.

〔The invention's effect〕

As described above, according to the present invention, each corner of the slit formed in the aperture can be sequentially used without introducing air into the column, and dust generated from the aperture rotating mechanism adheres to the aperture. Will not do. Then, it becomes necessary to introduce the atmosphere into the column when the aperture using 4 corners is replaced with a new aperture, that is, about once every 30 days.
This has the effect of improving the operating days of the electron beam exposure apparatus by about 5 days / month.

[Brief description of drawings]

1 is an explanatory view of an electron beam in the apparatus of the present invention, FIG. 2 is an explanatory view of an aperture rotating means according to an embodiment of the present invention, and FIG. 3 is an explanatory view of a conventional aperture. 1 is the first slit, 2 is the first aperture, 3 is the second slit, 4 is the second aperture, 5,51,52 are electron beams, 11,12 are cylinders for column configuration, 10 is Rotating means, 14 is a hollow rotating shaft, 16 is a worm wheel, 17 is a worm, and 26 is a knob for rotating the aperture.

Claims (1)

(57) [Claims] 1. A first aperture having a first slit, through which a part of an electron beam emitted from an electron gun is transmitted, and a part of the electron beam, which is transmitted through the first slit. A second aperture having a second slit formed therein and rotating means for rotating the second aperture in a plane orthogonal to the axis of the electron beam. A base plate on which the second aperture is mounted, and a part of the electron beam which is fixed to the upper flange and which is transmitted through the second aperture is transmitted through the axial center portion and is below the upper flange. A hollow shaft whose lower end is rotatably supported, a worm wheel fixed to the outer side of the middle of the hollow shaft in the longitudinal direction, and a worm wheel that is operated from the outside of the column accommodating the second aperture With a worm that rotates a worm wheel When an electron beam exposure apparatus according to claim.