JP2541508B2 - Bump bonding method - Google Patents
Bump bonding methodInfo
- Publication number
- JP2541508B2 JP2541508B2 JP6189539A JP18953994A JP2541508B2 JP 2541508 B2 JP2541508 B2 JP 2541508B2 JP 6189539 A JP6189539 A JP 6189539A JP 18953994 A JP18953994 A JP 18953994A JP 2541508 B2 JP2541508 B2 JP 2541508B2
- Authority
- JP
- Japan
- Prior art keywords
- chips
- bonding
- sample table
- sample
- bump
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title description 30
- 238000001179 sorption measurement Methods 0.000 claims description 2
- 239000000523 sample Substances 0.000 description 54
- 230000003287 optical effect Effects 0.000 description 13
- 238000010586 diagram Methods 0.000 description 8
- 238000005304 joining Methods 0.000 description 5
- 238000002788 crimping Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000003491 array Methods 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
Landscapes
- Wire Bonding (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明はバンプの接合方法に係わ
り、特に加熱状態で行われるバンプ接合工程に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a bump bonding method, and more particularly to a bump bonding process performed in a heated state.
【0002】[0002]
【従来の技術】LSIの実装、ハイブリッド型2次元配
列画像センサなど、二つのチップあるいは基板を電気的
および機械的に接合する素子の接合方法としてバンプ接
合の方法がある。この方法は二つのチップあるいは基板
上にあらかじめバンプを設け、バンプを構成する金属原
子が活性化する程度に加熱した状態で両側のバンプを接
触させ、さらに圧力を印加し接合する方法である。この
時、二つのチップの目合わせ方法としては光学プローブ
を試料テーブル間に挿入し可視光で観察する方法が、汎
用性が広く、鮮明なモニター画像が得られるために広く
用いられている。ここでは、バンプ接合の例としてこの
光学プローブを用いて二つのチップを接合する方法を図
2を用いて述べる。2. Description of the Related Art There is a bump bonding method as a bonding method of elements for electrically and mechanically bonding two chips or substrates such as LSI mounting and a hybrid type two-dimensional array image sensor. This method is a method in which bumps are provided in advance on two chips or a substrate, the bumps on both sides are brought into contact with each other in a state of being heated to the extent that metal atoms forming the bumps are activated, and further pressure is applied to join them. At this time, as a method for aligning the two chips, a method of inserting an optical probe between the sample tables and observing with visible light is widely used because of its versatility and obtaining a clear monitor image. Here, as an example of bump bonding, a method of bonding two chips using this optical probe will be described with reference to FIG.
【0003】図2(a)は目合わせ工程を示す図であ
る。この工程は後述する理由により室温で行う。チップ
3、4は表面に設けたバンプが向き合うように、試料テ
ーブル1、2に真空吸着されている。チップ3、4の間
に光学プローブ5を挿入し、チップ3、4上に設けた目
合わせマークをモニターしながら試料テーブル1、2を
移動させ、チップ3、4上のバンプの位置が互いに一致
するように調節する。FIG. 2 (a) is a diagram showing an alignment process. This step is performed at room temperature for the reason described below. The chips 3 and 4 are vacuum-sucked to the sample tables 1 and 2 so that the bumps provided on the surfaces face each other. Insert the optical probe 5 between the chips 3 and 4 and move the sample tables 1 and 2 while monitoring the alignment marks provided on the chips 3 and 4 so that the bump positions on the chips 3 and 4 match each other. Adjust to
【0004】後述する圧着工程では加熱状態でバンプど
うしを接触させるにもかかわらず、目合わせ工程を室温
で行う理由は二つある。第一に加熱状態で目合わせを行
った場合、チップに極めて近い位置にある光学プローブ
が、チップおよび試料テーブルの放射する熱によって熱
膨張を起こすために光学的な狂いが発生するためであ
る。加熱状態におけるこのような光学的な狂いは、光学
的に目合わせを行う方法で一般的に問題となる。第二に
バンプを構成する金属では多くの場合、昇温に伴いバン
プ表面に酸化膜を形成しバンプ接合の接合強度を低下さ
せるので、酸化膜の生成を防ぐためバンプを高温にする
時間を可能な限り短くする必要があるためである。これ
らの問題を室温で目合わせを行うことにより解決してい
る。There are two reasons for carrying out the aligning step at room temperature even though the bumps are brought into contact with each other in a heated state in the pressure-bonding step to be described later. First, when the alignment is performed in a heated state, the optical probe located extremely close to the chip causes thermal expansion due to the heat radiated from the chip and the sample table, which causes an optical deviation. Such an optical deviation in the heated state is generally a problem in the optical alignment method. Secondly, in many cases, the metal forming the bumps forms an oxide film on the bump surface as the temperature rises and reduces the bonding strength of the bump bonding, so it is possible to increase the temperature of the bumps to prevent oxide film formation. This is because it needs to be as short as possible. These problems are solved by performing alignment at room temperature.
【0005】図2(b)は昇温工程を示す図である。挿
入された光学プローブ5を引き抜き、チップ3、4の間
に隙間の開いた状態で試料テーブル1、2およびチップ
3、4を所定の温度まで上げる。FIG. 2B is a diagram showing the temperature raising step. The inserted optical probe 5 is pulled out, and the sample tables 1 and 2 and the chips 3 and 4 are heated to a predetermined temperature while leaving a gap between the chips 3 and 4.
【0006】図2(c)は圧着工程を示す図である。温
度を維持したまま、試料テーブル1、2を垂直に移動さ
せチップ3、4上のバンプどうしを接触させ所定の圧力
を印加する。所定時間圧力を印加した後、試料テーブル
1の真空吸着の解除、試料テーブル1、2の引き離し、
試料テーブル1、2および接合されたチップ3、4の降
温、チップ3、4の取り外しを行う。FIG. 2C is a diagram showing a pressure bonding step. While maintaining the temperature, the sample tables 1 and 2 are vertically moved to bring the bumps on the chips 3 and 4 into contact with each other and apply a predetermined pressure. After applying pressure for a predetermined time, the vacuum suction of the sample table 1 is released, the sample tables 1 and 2 are separated,
The sample tables 1 and 2 and the joined chips 3 and 4 are cooled, and the chips 3 and 4 are removed.
【0007】なお、このような圧着工程の代わりに、室
温でバンプどうしを接触させ圧力を印加しながら昇温す
る別の圧着工程も用いられている。Instead of such a pressure-bonding step, another pressure-bonding step in which bumps are brought into contact with each other at room temperature and the temperature is raised while applying pressure is also used.
【0008】[0008]
【発明が解決しようとする課題】前述したように従来の
接合方法では目合わせ工程は室温で行い、圧着工程はチ
ップおよび試料テーブルを昇温して行う。この時、昇温
に伴い上下の試料テーブルが別々に熱膨張することによ
り、室温で目合わせされた二つのチップの位置が互いに
ずれた状態でバンプが接合されるという問題が生じてい
た。二つのチップの間に光学プローブを挿入し目合わせ
を行う方法を用いた場合、このずれは±5μm 以上とな
る。一例として、この方法を用いて1cm□のホトダイオ
ードを256×256アレイ状に形成したチップと信号
読み出し電極を256×256アレイ状に形成したSi
−ICチップを、ホトダイオードと信号読み出し電極上
にそれぞれ直径16μm のInバンプを形成し、接合す
る場合を考える。この時、±5μm 以上のずれはバンプ
どうしの接触面積の40%以上の減少に相当し接合強度
の著しい低下の原因となる。さらに、はみでた反対側の
バンプがホトダイオードに直接圧力をかけることにより
ダイオード特性劣化の原因にもなる。As described above, in the conventional joining method, the aligning step is performed at room temperature, and the crimping step is performed by raising the temperature of the chip and the sample table. At this time, the upper and lower sample tables are thermally expanded separately as the temperature rises, which causes a problem that the bumps are bonded in a state in which the positions of the two chips aligned at room temperature are displaced from each other. When the method of inserting the optical probe between the two chips and performing the alignment is used, this deviation is ± 5 μm or more. As an example, using this method, a chip in which photodiodes of 1 cm square are formed in a 256 × 256 array and a signal reading electrode are formed in a 256 × 256 array are formed.
Consider a case where an IC chip is formed with In bumps each having a diameter of 16 μm on the photodiode and the signal readout electrode and bonded. At this time, a deviation of ± 5 μm or more corresponds to a 40% or more reduction in the contact area between the bumps, which causes a significant decrease in the bonding strength. Further, the bump on the opposite side directly applies pressure to the photodiode, which causes deterioration of diode characteristics.
【0009】また前項最後に述べた室温で二つのチップ
を接触させ圧力を印加しながら昇温する方法では、試料
テーブルが熱膨張したときにバンプの接触はすでに完了
しており目合わせずれは回避できるが、バンプどうしが
接触したまま二つのチップが互いに位置ずれを起こすた
めにバンプに傾きが発生する。Further, in the method described in the last paragraph, in which the two chips are brought into contact with each other at room temperature and the temperature is raised while applying pressure, the bump contact is already completed when the sample table is thermally expanded, and misalignment is avoided. Although it is possible, the two chips are displaced with respect to each other while the bumps are still in contact with each other, so that the bumps are tilted.
【0010】このように従来の接合方法では、試料テー
ブルの熱膨張に起因するバンプの目合わせずれあるいは
傾きが発生し、接合工程終了後、二つのチップ間におけ
るバンプ接合の機械的接合強度が不十分となるという問
題が生じていた。As described above, in the conventional bonding method, the bumps are misaligned or tilted due to the thermal expansion of the sample table, and the mechanical bonding strength of the bump bonding between the two chips becomes unsatisfactory after the bonding process is completed. There was a problem of being sufficient.
【0011】本発明の目的は、加熱状態で行うバンプ接
合工程において、試料テーブルの熱膨張に起因するバン
プの目合わせずれあるいは傾きを起こさない、バンプ接
合方法を提供するものである。An object of the present invention is to provide a bump bonding method which does not cause misalignment or inclination of bumps due to thermal expansion of a sample table in a bump bonding process performed in a heated state.
【0012】[0012]
【課題を解決するための手段】本発明のバンプ接合方法
は、バンプ接合を行う二つのチップを各々上下二つの試
料テーブルに吸着させ前記二つのチップどうしの目合わ
せを室温で行う工程と、前記試料テーブルを移動し室温
で低圧力を印加する第一の圧着工程と、前記試料テーブ
ルのうち上側試料テーブルの吸着を解除し、前記チップ
を接合したまま前記上側チップと前記上側試料テーブル
を離し、前記チップおよび前記試料テーブルの温度を所
定の値まで上げる工程と、温度維持したまま前記試料テ
ーブルを再度移動し前記チップに高圧力を印加する第二
の圧着工程を備えていることを特徴とする、バンプ接合
方法である。The bump bonding method of the present invention comprises the steps of adsorbing two chips for bump bonding on two upper and lower sample tables, respectively, and aligning the two chips at room temperature, A first crimping step of moving a sample table and applying a low pressure at room temperature, releasing the adsorption of the upper sample table of the sample table, separating the upper chip and the upper sample table while the chips are joined, It is characterized by including a step of raising the temperature of the chip and the sample table to a predetermined value, and a second pressure bonding step of moving the sample table again while maintaining the temperature and applying a high pressure to the chip. , A bump bonding method.
【0013】[0013]
【作用】本発明の接合方法では室温で目合わせを行った
後、室温での第一の圧着工程、加熱状態での第二の圧着
工程の二段階に分けて接合を行い、その間の昇温工程は
片側の試料テーブルからチップを離して行う。このた
め、試料テーブルの熱膨張の影響を受けることなく、目
合わせ精度を室温のレベルに維持し、かつ加熱状態で接
合を行うため十分な強度を備えたバンプ接合を実現する
ことができる。According to the joining method of the present invention, after the alignment is performed at room temperature, the joining is performed in two steps, that is, the first crimping step at room temperature and the second crimping step in the heated state, and the temperature is raised during the joining. The process is performed with the tip separated from the sample table on one side. Therefore, it is possible to realize bump bonding with sufficient strength because the alignment accuracy is maintained at the room temperature level and the bonding is performed in a heated state without being affected by the thermal expansion of the sample table.
【0014】[0014]
【実施例】本発明の実施例を図1を用いて詳細に説明す
る。ここでは二つのチップの間に光学プローブを挿入し
目合わせを行う方法を用いて、二つの1cm□の基板上に
設けた直径16μm のInバンプの256×256アレ
イを接合する場合について述べる。Embodiments of the present invention will be described in detail with reference to FIG. Here, a case will be described in which a 256 × 256 array of In bumps with a diameter of 16 μm provided on two 1 cm square substrates is bonded using a method of inserting an optical probe between two chips and performing alignment.
【0015】図1(a)は二つのチップの目合わせ工程
を示す図である。この工程は室温で行う。チップ3、4
を、表面に設けたInバンプアレイが互いに向き合うよ
うに、試料テーブル1、2にそれぞれ真空吸着させる。
チップ3、4間に光学プローブ5を挿入し、チップ3、
4上に設けた目合わせマークをモニターしながら試料テ
ーブル1、2を移動させ、チップ3、4上のInバンプ
アレイの位置が互いに一致するように調節する。FIG. 1A is a diagram showing a step of aligning two chips. This step is performed at room temperature. Chips 3, 4
Are vacuum-sucked to the sample tables 1 and 2 so that the In bump arrays provided on the surfaces face each other.
Insert the optical probe 5 between the chips 3 and 4,
The sample tables 1 and 2 are moved while monitoring the alignment marks provided on the chip 4, and the positions of the In bump arrays on the chips 3 and 4 are adjusted so as to match each other.
【0016】図1(b)は第一の圧着工程を示す図であ
る。この工程は室温で行う。挿入された光学プローブ5
を引き抜き、試料テーブル1、2を縦方向に移動しチッ
プ3、4上のInバンプアレイどうしを接触させ、1×
106 N/m2 の小さい圧力を10秒間印加する。この
とき、二つのチップは次に示す昇温工程において試料テ
ーブル1、2を移動しても、その振動のために互いにず
れない程度に接合されている。FIG. 1B is a diagram showing the first pressure bonding step. This step is performed at room temperature. Optical probe 5 inserted
Is pulled out, the sample tables 1 and 2 are moved in the vertical direction to bring the In bump arrays on the chips 3 and 4 into contact with each other, and 1 ×
A small pressure of 10 6 N / m 2 is applied for 10 seconds. At this time, the two chips are bonded to each other to such an extent that they will not be displaced from each other due to the vibration even if the sample tables 1 and 2 are moved in the temperature raising step described below.
【0017】図1(c)は昇温工程を示す図である。試
料テーブル1の真空吸着を解除し、試料テーブル1、2
を縦方向に移動しチップ3と試料テーブル1を離す。試
料テーブル1、2およびチップ3、4の周囲の空間を窒
素などの不活性ガスで酸素をパージした後、試料テーブ
ル1、2を80〜100℃に昇温する。この時チップ
3、4は熱伝導により試料テーブル2と同じ温度にな
る。FIG. 1C is a diagram showing a temperature raising step. The vacuum suction of the sample table 1 is released and the sample tables 1 and 2 are released.
Is moved in the vertical direction to separate the chip 3 from the sample table 1. After purging oxygen in the space around the sample tables 1 and 2 and the chips 3 and 4 with an inert gas such as nitrogen, the sample tables 1 and 2 are heated to 80 to 100 ° C. At this time, the chips 3 and 4 reach the same temperature as the sample table 2 due to heat conduction.
【0018】図1(d)は第2の圧着工程を示す図であ
る。試料テーブル1、2およびチップ3、4の温度を保
ちながら試料テーブル1、2を縦方向に移動し、1×1
07N/m2 の圧力を5分間印加する。このとき試料テ
ーブル1の真空吸着は解除したままである。接合終了後
は試料テーブル1、2を縦方向に移動して試料テーブル
1、2および基板のチップ3、4の温度を下げ、試料テ
ーブル2の真空吸着を解除し、接合されたチップ3、4
を取り外す。FIG. 1D is a diagram showing the second pressure bonding step. While maintaining the temperatures of the sample tables 1 and 2 and the chips 3 and 4, the sample tables 1 and 2 are moved in the vertical direction, and 1 × 1
A pressure of 0 7 N / m 2 is applied for 5 minutes. At this time, the vacuum suction of the sample table 1 is still released. After the bonding is completed, the sample tables 1 and 2 are moved in the vertical direction to lower the temperatures of the sample tables 1 and 2 and the chips 3 and 4 of the substrate, the vacuum suction of the sample table 2 is released, and the bonded chips 3 and 4 are released.
Remove.
【0019】本発明による接合方法では目合わせ、およ
び試料テーブルを介して行う圧力の印加が試料テーブル
の熱膨張の影響を受けないため、バンプどうしのずれは
機械的な誤差の範囲内である±2μm 以内に再現性よく
収まり、また圧力印加時のバンプの傾きも発生しない。In the joining method according to the present invention, since the alignment and the application of pressure through the sample table are not affected by the thermal expansion of the sample table, the deviation between the bumps is within the range of mechanical error. It is reproducible within 2 μm and the bump does not tilt when pressure is applied.
【0020】なお、本発明においてはInバンプアレイ
の接合について詳細に述べたが、他のバンプによる接合
の場合でも、接合温度、接合圧力、接合時間を適宜設定
することにより同様な効果の得られることは言うまでも
ない。Although the bonding of the In bump array has been described in detail in the present invention, similar effects can be obtained even when bonding with other bumps by appropriately setting the bonding temperature, bonding pressure and bonding time. Needless to say.
【0021】[0021]
【発明の効果】以上詳細に説明したように本発明のバン
プ接合の方法を用いれば、試料テーブルの熱膨張に伴う
目合わせずれあるいはバンプの傾きを回避できるため、
高い目合わせ精度を実現し、接合工程の歩留まりおよび
バンプ接合の信頼性を大きく向上させることができる。As described in detail above, when the bump bonding method of the present invention is used, misalignment or bump inclination due to thermal expansion of the sample table can be avoided.
High alignment accuracy can be realized, and the yield of the bonding process and the reliability of bump bonding can be greatly improved.
【図1】本発明によるバンプ接合の方法の一実施例を示
す模式図である。FIG. 1 is a schematic view showing an embodiment of a bump bonding method according to the present invention.
【図2】従来のバンプ接合の方法を示す模式図である。FIG. 2 is a schematic diagram showing a conventional bump bonding method.
1 試料テーブル 2 試料テーブル 3 チップ 4 チップ 5 光学プローブ 1 sample table 2 sample table 3 tip 4 tip 5 optical probe
Claims (1)
二つの試料テーブルに吸着させ前記二つのチップどうし
の目合わせを室温で行う工程と、前記試料テーブルを移
動し室温で低圧力を印加する第一の圧着工程と、前記試
料テーブルのうち上側試料テーブルの吸着を解除し、前
記チップを接合したまま前記上側チップと前記上側試料
テーブルを離し、前記チップおよび前記試料テーブルの
温度を所定の値まで上げる工程と、温度維持したまま前
記試料テーブルを再度移動し前記チップに高圧力を印加
する第二の圧着工程を備えていることを特徴とするバン
プ接合方法。1. A step of adsorbing two chips for bump bonding to upper and lower two sample tables and aligning the two chips at room temperature, and moving the sample table to apply a low pressure at room temperature. The first press-bonding step, the adsorption of the upper sample table of the sample table is released, the upper chip and the upper sample table are separated while the chips are bonded, and the temperature of the chip and the sample table is set to a predetermined value. And a second pressure bonding step of moving the sample table again while applying temperature and applying a high pressure to the chip while maintaining the temperature.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6189539A JP2541508B2 (en) | 1994-08-11 | 1994-08-11 | Bump bonding method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6189539A JP2541508B2 (en) | 1994-08-11 | 1994-08-11 | Bump bonding method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0855882A JPH0855882A (en) | 1996-02-27 |
| JP2541508B2 true JP2541508B2 (en) | 1996-10-09 |
Family
ID=16243007
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6189539A Expired - Lifetime JP2541508B2 (en) | 1994-08-11 | 1994-08-11 | Bump bonding method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2541508B2 (en) |
-
1994
- 1994-08-11 JP JP6189539A patent/JP2541508B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0855882A (en) | 1996-02-27 |
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