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JP2547408B2 - Strip magnetic thin film - Google Patents
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JP2547408B2 - Strip magnetic thin film - Google Patents

Strip magnetic thin film

Info

Publication number
JP2547408B2
JP2547408B2 JP62050149A JP5014987A JP2547408B2 JP 2547408 B2 JP2547408 B2 JP 2547408B2 JP 62050149 A JP62050149 A JP 62050149A JP 5014987 A JP5014987 A JP 5014987A JP 2547408 B2 JP2547408 B2 JP 2547408B2
Authority
JP
Japan
Prior art keywords
magnetic
thin film
strip
head
yokes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62050149A
Other languages
Japanese (ja)
Other versions
JPS63217609A (en
Inventor
久範 林
修三 安彦
博一 後藤
秀人 佐野
毅 大里
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Electronics Inc
Original Assignee
Canon Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Electronics Inc filed Critical Canon Electronics Inc
Priority to JP62050149A priority Critical patent/JP2547408B2/en
Publication of JPS63217609A publication Critical patent/JPS63217609A/en
Application granted granted Critical
Publication of JP2547408B2 publication Critical patent/JP2547408B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906Details related to the use of magnetic thin film layers or to their effects
    • G11B5/3916Arrangements in which the active read-out elements are coupled to the magnetic flux of the track by at least one magnetic thin film flux guide
    • G11B5/3919Arrangements in which the active read-out elements are coupled to the magnetic flux of the track by at least one magnetic thin film flux guide the guide being interposed in the flux path
    • G11B5/3922Arrangements in which the active read-out elements are coupled to the magnetic flux of the track by at least one magnetic thin film flux guide the guide being interposed in the flux path the read-out elements being disposed in magnetic shunt relative to at least two parts of the flux guide structure
    • G11B5/3925Arrangements in which the active read-out elements are coupled to the magnetic flux of the track by at least one magnetic thin film flux guide the guide being interposed in the flux path the read-out elements being disposed in magnetic shunt relative to at least two parts of the flux guide structure the two parts being thin films

Landscapes

  • Magnetic Heads (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Magnetic Films (AREA)
  • Hall/Mr Elements (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は帯状磁性薄膜に関し、例えば磁気抵抗効果素
子に信号磁界を導くヨークとして、または誘導型の磁気
コアとして用いられるほぼ帯状の磁性薄膜に関するもの
である。
Description: TECHNICAL FIELD The present invention relates to a strip-shaped magnetic thin film, for example, a substantially strip-shaped magnetic thin film used as a yoke for guiding a signal magnetic field to a magnetoresistive effect element or as an induction type magnetic core. It is a thing.

[従来の技術] 第5図(A),(B)はこの種の帯状磁性薄膜を用い
る薄膜磁気ヘッドとして、磁気抵抗効果型磁気ヘッド
(以下MRヘッドと呼ぶ)の従来構造を説明するものであ
る。
[Prior Art] FIGS. 5 (A) and 5 (B) explain a conventional structure of a magnetoresistive effect type magnetic head (hereinafter referred to as an MR head) as a thin film magnetic head using a band-shaped magnetic thin film of this kind. is there.

図示のように、MRヘッドは全体を支持する非磁性基板
5上に磁気抵抗効果素子(以下MR素子と呼ぶ)2と、こ
れに外部の信号磁界を導き印加するためのリードヨーク
1とテールヨーク3と、MR素子2からの信号を取り出す
るための2つの電極4を設けて構成される。MRヘッドの
図中上端面が不図示の磁気記録媒体に摺動される摺動面
6として形成される。MR素子2とリードヨーク1および
テールヨーク3は帯状磁性薄膜からなる。ヨーク1,3は
不図示の絶縁層を介し、MR素子2上にまたがって設けら
れる。また電極4は良導体の薄膜からなる。
As shown in the figure, the MR head includes a magnetoresistive effect element (hereinafter referred to as an MR element) 2 on a non-magnetic substrate 5 that supports the entire MR head, a lead yoke 1 and a tail yoke for guiding and applying an external signal magnetic field thereto. 3 and two electrodes 4 for extracting a signal from the MR element 2 are provided. The upper end surface of the MR head in the figure is formed as a sliding surface 6 that slides on a magnetic recording medium (not shown). The MR element 2, the lead yoke 1 and the tail yoke 3 are made of a strip-shaped magnetic thin film. The yokes 1 and 3 are provided over the MR element 2 via an insulating layer (not shown). The electrode 4 is made of a thin film of good conductor.

MRヘッドの製造工程では、まず非磁性基板5上にMR素
子2を成膜、パターニングし、続いて電極4を成膜、パ
ターニングし、不図示の絶縁層を介してヨーク1、3を
成膜、パターニングし、さらに全体の上に不図示の絶縁
性保護層を形成してMRヘッドが構成される。
In the manufacturing process of the MR head, first, the MR element 2 is formed and patterned on the non-magnetic substrate 5, then the electrode 4 is formed and patterned, and the yokes 1 and 3 are formed through an insulating layer (not shown). The MR head is formed by patterning and further forming an insulating protective layer (not shown) on the entire surface.

このようなMRヘッドにおいて、摺動面6に摺動する不
図示の磁気記録媒体からの信号磁界が帯状磁性薄膜であ
るヨーク1,3を介してMR素子2に導かれ、印加され、信
号磁界Hの強さによりMR素子2の抵抗値Rが変化し、MR
素子2の入出力特性が良好の場合は、基本的に第6図に
示すようなカーブを描く。このカーブはR−Hカーブと
呼ばれる。そして、この抵抗値Rの変化が電極4,4を介
し、出力信号として取り出される。
In such an MR head, the signal magnetic field from the magnetic recording medium (not shown) sliding on the sliding surface 6 is guided to and applied to the MR element 2 via the yokes 1 and 3 which are strip-shaped magnetic thin films, and the signal magnetic field is applied. The resistance value R of the MR element 2 changes depending on the strength of H,
When the input / output characteristics of the element 2 are good, basically a curve as shown in FIG. 6 is drawn. This curve is called the RH curve. Then, the change in the resistance value R is taken out as an output signal via the electrodes 4, 4.

なお、ヨーク1,3は一軸磁気異方性を与えられてい
る。高周波領域のおける信号磁界伝達の主モードは磁化
回転となっており、ヨーク1,3の磁化容易軸方向は信号
磁界の磁束の流れる方向に対して垂直にするのが一般的
である。
The yokes 1 and 3 are given uniaxial magnetic anisotropy. The main mode of signal magnetic field transmission in the high-frequency region is magnetization rotation, and the easy axis of magnetization of the yokes 1 and 3 is generally perpendicular to the direction in which the magnetic flux of the signal magnetic field flows.

[発明が解決しようとする問題点] ところで、このようなMRヘッドにより磁界を検出する
場合には、ヨーク1,3に発生する磁区の形態がMRヘッド
の入出力特性に大きく影響することが知られている。
[Problems to be Solved by the Invention] When detecting a magnetic field with such an MR head, it has been known that the form of magnetic domains generated in the yokes 1 and 3 greatly affects the input / output characteristics of the MR head. Has been.

ヨーク1,3に不規則な環境磁区が発生したりして、磁
区の大きさや方向などの磁区形態に乱れがあるとヘッド
効率や磁気抵抗が悪化し、MR素子2のR−Hカーブが第
7図に示すようにヒステリシスを持ったり、ノイズ含み
で不規則な変化をすることがある。これらのヒステリシ
スやノイズは、MRヘッドの出力波形の不揃いや出力変動
をもたらす。
If an irregular environmental magnetic domain is generated in the yokes 1 and 3, and the magnetic domain shape such as the size and direction of the magnetic domain is disturbed, the head efficiency and the magnetic resistance deteriorate, and the RH curve of the MR element 2 becomes As shown in FIG. 7, it may have a hysteresis or may change irregularly including noise. These hysteresis and noise cause irregularity in the output waveform of the MR head and output fluctuation.

これを防ぐため、従来ではヨーク1,3の薄膜の成膜時
に磁場中で成膜したり磁性焼鈍を施したりするなどの方
法により、ヨーク1,3に強い一軸磁気異方性を付与して
磁区の発生を明確にして乱れを抑えるという方法が取ら
れている。
In order to prevent this, conventionally, a strong uniaxial magnetic anisotropy is given to the yokes 1 and 3 by a method such as film formation in a magnetic field or magnetic annealing when forming the thin films of the yokes 1 and 3. A method of clarifying the generation of magnetic domains to suppress disorder is adopted.

また、磁区の発生数はヨーク1,3の一軸異方性の強
弱、つまり誘導磁気異方性磁界Hkの値の大小に関係して
おり、Hkが小さく、一軸異方性が弱い時は磁区の発生数
は少なく、Hkが大きく異方性が強いと磁区の発生数は増
えるということが確かめられる。
The number of magnetic domains is related to the strength of the uniaxial anisotropy of the yokes 1 and 3, that is, the magnitude of the value of the induced magnetic anisotropy magnetic field Hk. It is confirmed that the number of magnetic domains is small, and the number of magnetic domains is large when Hk is large and anisotropy is strong.

ヨーク1,3の薄膜を通常のスパッタで成膜すると、Hk
=1〜20e程度と異方性が少なく、磁区の発生は明確で
ないのに対し、磁場中スパッタによりHk=30e程度の薄
膜を成膜すると、例えば第8図に示すようにヨーク1な
いし3の薄膜1′には一軸異方性を与えられ、印加磁界
方向に平行な3本の磁壁(以下180゜磁壁と呼ぶ)Wが
発生する。
When the thin films of the yokes 1 and 3 are formed by normal sputtering, Hk
= 1 to 20e, there is little anisotropy, and the generation of magnetic domains is not clear. However, when a thin film of Hk = 30e is formed by sputtering in a magnetic field, for example, as shown in FIG. Uniaxial anisotropy is given to the thin film 1 ', and three domain walls (hereinafter referred to as 180 ° domain walls) W parallel to the applied magnetic field direction are generated.

しかし、磁場中スパッタの場合には、スパッタ装置内
のマグネットの影響や薄膜を形成する磁性体粒子の成膜
面への入射方向(結晶成長方向)などの条件により思わ
ぬ異方性の乱れを生ずる場合がある。この場合、第8図
に点線で示すように、180゜磁壁Wがはっきり現われ
ず、磁壁が乱れてしまうことさえある。
However, in the case of sputtering in a magnetic field, unexpected anisotropy is disturbed depending on conditions such as the influence of the magnet in the sputtering apparatus and the incident direction (crystal growth direction) of the magnetic particles forming the thin film on the film formation surface. It may occur. In this case, as shown by the dotted line in FIG. 8, the 180 ° domain wall W does not appear clearly, and the domain wall may even be disturbed.

このように、磁場中スパッタなどの方法では極めて限
られた成膜条件下でなければ、異方性のコントロールと
磁区の発生形態の制御は不可能であるという問題があっ
た。
As described above, the method such as the sputtering in the magnetic field has a problem that the anisotropy control and the magnetic domain generation mode cannot be controlled unless the film formation conditions are extremely limited.

[問題点を解決するための手段] このような問題点を解決するため、本発明の帯電磁性
薄膜によれば、長手方向に沿った両側縁に対向して互い
の間に磁壁を発生させる、少なくとも一対の切り欠きを
設けた構造を採用した。
[Means for Solving the Problems] In order to solve such problems, according to the charged magnetic thin film of the present invention, domain walls are generated between each other while facing both side edges along the longitudinal direction. A structure having at least a pair of notches is adopted.

[作 用] このような構造によれば、切り欠き対の間に磁区を区
切る磁壁が発生するので、切り欠き対の配置によって磁
区の発生形態を制御できる。切り欠き対を適当に配置す
ることで、好ましい規則的な磁区を明確に発生させて磁
区の乱れを抑えることができ、この乱れによる磁気特性
に対する悪影響を防止し、良好な特性が得られる。
[Operation] According to such a structure, since the domain wall that separates the magnetic domain is generated between the notch pair, the generation mode of the magnetic domain can be controlled by the arrangement of the notch pair. By appropriately arranging the notch pairs, it is possible to clearly generate preferable regular magnetic domains to suppress disturbance of the magnetic domains, prevent adverse effects on the magnetic characteristics due to the disturbance, and obtain good characteristics.

[実施例] 以下、第1図〜第4図を参照して本発明の実施例の詳
細を説明する。
Embodiment An embodiment of the present invention will be described below in detail with reference to FIGS.

第1図は本発明の実施例による帯状磁性薄膜を用いた
MRヘッドの構造を示している。同図において、従来例の
第5図(A),(B)中と同一符号を付した各部分は従
来例と共通、もしくは相当するものであり、その説明は
省略する。
FIG. 1 uses a strip-shaped magnetic thin film according to an embodiment of the present invention.
The structure of the MR head is shown. In the same figure, the respective parts denoted by the same reference numerals in FIGS. 5 (A) and 5 (B) of the conventional example are common to or correspond to the conventional example, and the description thereof will be omitted.

第1図に示すように、本実施例では、帯状強磁性薄膜
であるヨーク1,3の摺動面6に直交する両側縁、すなわ
ちヨーク1,3の信号磁界の磁束が流れる図中上下方向に
沿った両側縁において対向し合う切り欠き1aないし3aの
対が、この場合1対と2対形成されている。
As shown in FIG. 1, in this embodiment, both side edges of the yokes 1 and 3, which are strip-shaped ferromagnetic thin films, are orthogonal to the sliding surface 6, that is, the vertical direction in the drawing in which the magnetic flux of the signal magnetic field of the yokes 1 and 3 flows. A pair of opposite notches 1a to 3a are formed in this case on each side edge, along with one pair and two pairs.

切り欠き1aないし3aは詳細にはヨーク1,3の内側へ向
かって尖ったほぼ二等辺三角形に形成されており、対向
する切り欠き1aないし3aの対の頂点を結ぶ直線が摺動面
6と平行になるように、すなわち信号磁界の磁束が流れ
る方向にほぼ垂直になるように配置されている。
Specifically, the notches 1a to 3a are formed in a substantially isosceles triangle that is pointed toward the inside of the yokes 1 and 3, and the straight line connecting the apexes of the pair of opposing notches 1a to 3a is the sliding surface 6. They are arranged so as to be parallel, that is, substantially perpendicular to the direction in which the magnetic flux of the signal magnetic field flows.

なお、このような切り欠きを有するヨーク1,3は磁性
体薄膜のマスタパターンを要求される形状にしてパター
ニングしエッチングするという、通常のフォトリソエッ
チングにより形成することができる。なお、エッチング
の前の成膜は、前述した磁場中のスパッタによりHkが30
e程度の薄膜を成膜する。
The yokes 1 and 3 having such cutouts can be formed by ordinary photolithographic etching, in which a master pattern of a magnetic thin film is patterned into a required shape and then etched. Note that the film formation before etching has a Hk of 30 by sputtering in the magnetic field described above.
Form a thin film of about e.

このように、切り欠き1aないし3aをヨーク1,3の帯状
磁性薄膜に設けることにより切り欠き1aないし3aの頂点
から磁壁が発生する。この作用の因果関係はまだ明らか
にされていないが、このように切り欠きの頂点から磁壁
の発生することが実験により確かめられている。
In this way, by providing the cutouts 1a to 3a on the strip-shaped magnetic thin films of the yokes 1 and 3, a magnetic domain wall is generated from the apexes of the cutouts 1a to 3a. Although the causal relationship of this action has not been clarified yet, it has been confirmed by experiments that the domain wall is generated from the notch apex.

そして、切り欠き1aないし3aの対向する頂点どうしの
間に直線状の180゜の磁壁が発生し、これを区切りとし
て磁区が発生する。すなわち、切り欠き1aないし3aの配
置によりヨーク1ないし3に発生する磁区の大きさ、方
向などを適当に制御でき、磁区の発生形態を適当に制御
できる。
Then, a linear 180 ° domain wall is generated between the facing vertices of the notches 1a to 3a, and a magnetic domain is generated by using this as a partition. That is, by arranging the notches 1a to 3a, the size and direction of the magnetic domains generated in the yokes 1 to 3 can be appropriately controlled, and the generation mode of the magnetic domains can be appropriately controlled.

先述のように、ヨーク1,3の薄膜を磁場中のスパッタ
でHk=3Oe程度に成膜しただけでは、第8図で点線で示
すように180゜磁壁Wははっきり現われず、乱れてしま
うことさえある。
As described above, if the thin films of the yokes 1 and 3 are sputtered in a magnetic field to a film thickness of about Hk = 3 Oe, the 180 ° domain wall W does not appear clearly and is disturbed as shown by the dotted line in FIG. Even there.

そこで、第2図に示すように、ヨーク1(ないし3)
に対応する薄膜1′の180゜磁壁Wが発生すべき位置に
三角形の切り欠き1a′を入れることにより、180゜磁壁
Wの発生を明確にできる。ここで、180゜磁壁の発生べ
きピッチ、すなわち磁区のピッチは薄膜1′のHkとトラ
ック幅bに関係し、トラック幅bをHkで割った値とな
る。そこで、切り欠き1a′の対のピッチ寸法aはこの値
とし、例えばHk=3Oeの時にトラック幅寸法bが60μm
ならばaは20μmとする。このようにして、上記のよう
に180゜磁壁の発生を明確にでき、規則的な磁区を発生
させ、磁区の乱れを抑えることができる。
Therefore, as shown in FIG. 2, the yoke 1 (or 3)
By forming a triangular notch 1a 'at a position where the 180 ° domain wall W of the thin film 1'corresponding to 1 is formed, the generation of the 180 ° domain wall W can be clarified. Here, the pitch at which the 180 ° domain wall should be generated, that is, the pitch of the magnetic domain is related to Hk of the thin film 1'and the track width b, and is a value obtained by dividing the track width b by Hk. Therefore, the pitch dimension a of the pair of notches 1a 'is set to this value, and for example, when Hk = 3Oe, the track width dimension b is 60 μm.
Then, a is 20 μm. In this way, the generation of the 180 ° domain wall can be clarified as described above, regular magnetic domains can be generated, and disorder of the magnetic domains can be suppressed.

ただし、第2図に示したように、薄膜1′の信号磁界
の磁束が流れる方向に沿った両側縁における切り欠き1
a′の幅cを切り欠き1a′の対のピッチaに対応して取
ると、MRヘッドの製造工程において、摺動面6の研削の
深さ寸法によってリードヨーク1の薄膜1′のトラック
幅bが変化してしまうという不都合がある。
However, as shown in FIG. 2, the notches 1 on both side edges along the direction in which the magnetic flux of the signal magnetic field of the thin film 1 ′ flows.
When the width c of a'is taken corresponding to the pitch a of the pair of notches 1a ', the track width of the thin film 1'of the lead yoke 1 depends on the grinding depth of the sliding surface 6 in the MR head manufacturing process. There is an inconvenience that b changes.

そこで、第3図に示すように、リードヨーク1の切り
欠き1aの幅cは切り欠き1aのピッチaより小さくする。
幅cは大きくともピッチaの9/10以下の幅とする。
Therefore, as shown in FIG. 3, the width c of the notch 1a of the lead yoke 1 is made smaller than the pitch a of the notch 1a.
The width c is at most 9/10 of the pitch a.

このようにしておき、MRヘッドの製造工程において、
第4図に示す摺動面研削前のヘッドを点線で示す摺動面
の仕上げ面6′まで研削、研磨する場合に、仕上げ面
6′を同図と第3図に示すように上下の切り欠き1aの間
の垂直な部分で止めれば、トラック幅bは一定に得られ
る。
In this way, in the MR head manufacturing process,
When the head before grinding the sliding surface shown in FIG. 4 is ground and polished to the finishing surface 6'of the sliding surface shown by the dotted line, the finishing surface 6'is cut into upper and lower parts as shown in FIG. 3 and FIG. By stopping at the vertical portion between the cutouts 1a, the track width b can be kept constant.

以上のように、切り欠き1a,3aをヨーク1,3に設けるこ
とにより、本実施例によれば切り欠き1aないし3aを介し
て磁壁を発生させ、ヨーク1,3のそれぞれを等分する規
則的な磁区を安定して明確に発生させることができ、環
流磁区などによる磁区の乱れを抑えることができる。従
って、MR素子2のR−Hカーブにノイズやヒステリシス
などの乱れが発生するのを抑えることができ、MRヘッド
の入出力特性として良好な特性が得られる。
As described above, by providing the cutouts 1a and 3a in the yokes 1 and 3, according to the present embodiment, a domain wall is generated through the cutouts 1a to 3a, and each of the yokes 1 and 3 is ruled equally. Magnetic domains can be stably and clearly generated, and disturbance of magnetic domains due to a reflux magnetic domain can be suppressed. Therefore, it is possible to suppress the occurrence of disturbance such as noise and hysteresis in the RH curve of the MR element 2, and it is possible to obtain good input / output characteristics of the MR head.

なお、本実施例においてヨーク1,3はほぼ帯状であれ
ばよく、両側縁が全体として湾曲したり非平行であった
りしてもよい。
In the present embodiment, the yokes 1 and 3 need only have a substantially strip shape, and both side edges may be curved or non-parallel as a whole.

また、本発明の帯状磁性薄膜はMRヘッドに限らず誘導
型の磁気ヘッドで磁気コアが磁性薄膜からなる薄膜磁気
ヘッドについても、その薄膜に上述と同様に切り欠きを
設けることにより、明確で安定した磁区発生によりヘッ
ドの入出力特性が安定し、良好な特性が得られ、ヘッド
の磁気的な効率が向上するという効果が得られる。
Further, the strip-shaped magnetic thin film of the present invention is not limited to the MR head, but it is clear and stable not only in the induction type magnetic head but also in the thin film magnetic head whose magnetic core is composed of the magnetic thin film, by providing the thin film with the notch as described above. The generation of the magnetic domains stabilizes the input / output characteristics of the head, obtains good characteristics, and improves the magnetic efficiency of the head.

[発明の効果] 以上の説明から明らかなように、本発明の帯状磁性薄
膜によれば、長手方向に沿った両側縁に対向して互いの
間に磁壁を発生させる、少なくとも一対の切り欠きを設
けた構造を採用したので、前記の切り欠きを介して磁区
の発生形態を制御でき、磁区の乱れを抑えて磁気特性の
向上および安定化、効率の向上などが図れるという優れ
た効果が得られる。
[Effects of the Invention] As is apparent from the above description, according to the strip-shaped magnetic thin film of the present invention, at least a pair of notches that face both side edges along the longitudinal direction and generate domain walls between each other are provided. Since the structure provided is adopted, it is possible to control the generation mode of the magnetic domain through the notch, and it is possible to obtain the excellent effect that the disorder of the magnetic domain is suppressed and the magnetic characteristics are improved and stabilized, and the efficiency is improved. .

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の実施例として帯状磁性薄膜を用いたMR
ヘッドの構造を示す平面図、第2図は本実施例の帯状磁
性薄膜における磁壁発生状態の説明図、第3図は切り欠
きの幅を小さくしたヨークの薄膜の説明図、第4図は本
実施例の帯状磁性薄膜を用いたMRヘッドの摺動面研削前
の平面図、第5図(A)は従来のMRヘッドの平面図、第
5図(B)は同ヘッド縦断側面図、第6図はMR素子の良
好なR−Hカーブを示す線図、第7図は乱れたR−Hカ
ーブを示す線図、第8図は従来の帯状磁性薄膜における
磁壁発生状態の説明図である。 1……リードヨーク、1a,3a……切り欠き 2……MR素子、3……テールヨーク 4……電極、5……非磁性基板 6……摺動面
FIG. 1 shows an MR using a strip-shaped magnetic thin film as an embodiment of the present invention.
FIG. 2 is a plan view showing the structure of the head, FIG. 2 is an explanatory view of a magnetic domain wall generation state in the strip-shaped magnetic thin film of the present embodiment, FIG. 3 is an explanatory view of a yoke thin film having a narrow cutout width, and FIG. FIG. 5A is a plan view of a conventional MR head, and FIG. 5B is a vertical side view of the same. FIG. 6 is a diagram showing a favorable RH curve of the MR element, FIG. 7 is a diagram showing a disordered RH curve, and FIG. 8 is an explanatory diagram of a domain wall generation state in a conventional strip magnetic thin film. . 1 ... Lead yoke, 1a, 3a ... Notch 2 ... MR element, 3 ... Tail yoke 4 ... Electrode, 5 ... Non-magnetic substrate 6 ... Sliding surface

───────────────────────────────────────────────────── フロントページの続き (72)発明者 佐野 秀人 秩父市大字下影森1248番地 キヤノン電 子株式会社内 (72)発明者 大里 毅 秩父市大字下影森1248番地 キヤノン電 子株式会社内 (56)参考文献 特開 昭61−295606(JP,A) 特開 昭60−55602(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Hideto Sano Hideo Sano 1248 Shimokagemori, Chichibu City, Canon Electronics Co., Ltd. (72) Takeshi Osato 1248 Shimokagemori Shimokage, Chichibu, Canon Inc. (56) ) Reference JP 61-295606 (JP, A) JP 60-55602 (JP, A)

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】長手方向に沿った両側縁に対向して互いの
間に磁壁を発生させる、少なくとも一対の切り欠きを設
けたことを特徴とする帯状磁性薄膜。
1. A strip-shaped magnetic thin film which is provided with at least a pair of notches facing both side edges along a longitudinal direction and generating domain walls between them.
【請求項2】前記切り欠きは前記薄膜の内側へ向かって
尖ったほぼ三角形状に形成し、対向する切り欠きの対の
頂点を結ぶ直線が長手方向にほぼ垂直になるように配置
したことを特徴とする特許請求の範囲第1項に記載の帯
状磁性薄膜。
2. The notch is formed in a substantially triangular shape that is pointed toward the inside of the thin film, and the straight line connecting the vertices of a pair of opposite notches is arranged so as to be substantially perpendicular to the longitudinal direction. The strip-shaped magnetic thin film according to claim 1, which is characterized.
【請求項3】前記切り欠きを所定ピッチで複数対設け、
前記薄膜の長手方向に沿った両側縁における前記切り欠
きの幅を前記ピッチより小さくしたことを特徴とする特
許請求の範囲第2項に記載の帯状磁性薄膜。
3. A plurality of pairs of the cutouts are provided at a predetermined pitch,
The strip-shaped magnetic thin film according to claim 2, wherein the width of the cutouts on both side edges along the longitudinal direction of the thin film is smaller than the pitch.
JP62050149A 1987-03-06 1987-03-06 Strip magnetic thin film Expired - Lifetime JP2547408B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62050149A JP2547408B2 (en) 1987-03-06 1987-03-06 Strip magnetic thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62050149A JP2547408B2 (en) 1987-03-06 1987-03-06 Strip magnetic thin film

Publications (2)

Publication Number Publication Date
JPS63217609A JPS63217609A (en) 1988-09-09
JP2547408B2 true JP2547408B2 (en) 1996-10-23

Family

ID=12851126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62050149A Expired - Lifetime JP2547408B2 (en) 1987-03-06 1987-03-06 Strip magnetic thin film

Country Status (1)

Country Link
JP (1) JP2547408B2 (en)

Also Published As

Publication number Publication date
JPS63217609A (en) 1988-09-09

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