JP2551223B2 - Organic resin multilayer wiring board - Google Patents
Organic resin multilayer wiring boardInfo
- Publication number
- JP2551223B2 JP2551223B2 JP27810890A JP27810890A JP2551223B2 JP 2551223 B2 JP2551223 B2 JP 2551223B2 JP 27810890 A JP27810890 A JP 27810890A JP 27810890 A JP27810890 A JP 27810890A JP 2551223 B2 JP2551223 B2 JP 2551223B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- wiring board
- resin
- layers
- multilayer wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
Description
【発明の詳細な説明】 技術分野 本発明は有機樹脂多層配線基板に関し、特に電子機器
で用いられる多層配線基板に関する。TECHNICAL FIELD The present invention relates to an organic resin multilayer wiring board, and more particularly to a multilayer wiring board used in electronic equipment.
従来技術 従来、ポリイミド樹脂多層配線基板においては、第2
図に示すように、セラミック(またはガラスセラミッ
ク)多層配線基板11上に電源層12やグランド層16a,16
b、あるいは信号配線層17a,17bや電源・信号乗換え層18
の導体配線層と、ポリイミド樹脂絶縁層15a〜15fとが交
互に積層されて構成されていた。Conventional technology Conventionally, in the polyimide resin multilayer wiring board, the second
As shown in the figure, the power supply layer 12 and the ground layers 16a, 16a are provided on the ceramic (or glass ceramic) multilayer wiring board 11.
b, or the signal wiring layers 17a and 17b and the power / signal transfer layer 18
The conductor wiring layers and the polyimide resin insulating layers 15a to 15f were alternately laminated.
導体配線層の間はヴィアホール14により電気的に接続
されており、セラミック多層配線基板11上の最上層には
電気部品搭載層10が設けられていた。The conductor wiring layers are electrically connected by via holes 14, and the electric component mounting layer 10 is provided on the uppermost layer on the ceramic multilayer wiring substrate 11.
電子材料として好材料といわれている一般的なポリイ
ミド樹脂では、多層配線基板の配線の信号の伝播速度に
影響する誘電率が3.4〜3.8程度であり、さらに誘電率を
下げることにより高速の伝播速度を実現しようとする
と、さらに低誘電率のポリイミドを使用することにな
る。現在、誘電率が2.9〜3.0程度のポリイミド樹脂も出
されている。In general polyimide resin, which is said to be a good material for electronic materials, the dielectric constant that affects the signal propagation speed of the wiring of the multilayer wiring board is about 3.4 to 3.8. In order to realize the above, a polyimide having a lower dielectric constant will be used. Currently, polyimide resins with a dielectric constant of about 2.9 to 3.0 are also available.
また、ベンゾシクロブテン樹脂(以下BCB樹脂とす
る)を用いた多層配線基板としては、配線層4層と絶縁
層4層とからなり、総絶縁膜厚が約30ミクロンの多層配
線基板が開発されている。As a multilayer wiring board using benzocyclobutene resin (hereinafter referred to as BCB resin), a multilayer wiring board having four wiring layers and four insulating layers and a total insulating film thickness of about 30 microns was developed. ing.
このような従来のポリイミド樹脂多層配線基板では、
誘電率が3.4〜3.8程度のポリイミドを使用しているが、
高速の伝播速度を実現するためにポリイミドの誘電率を
それ以上下げると、ポリイミドの膜強度が低下してしま
い、実用化することが難しいという問題がある。In such a conventional polyimide resin multilayer wiring board,
I use polyimide with a dielectric constant of about 3.4 to 3.8,
If the dielectric constant of polyimide is further lowered to realize a high propagation speed, the film strength of the polyimide will be reduced, and there is a problem that it is difficult to put it into practical use.
また、BCB樹脂を用いた場合、BCB樹脂は誘導率が2.6
とポリイミドより低く、電気的に優れた特性を有してい
るが、熱膨張率がポリイミド樹脂と同程度の4.0×10-5
(1/℃)でありながら、伸び率が2.2%と低いために、B
CB樹脂のみで多層配線基板の高多層化を行うと、上層に
いくにしたがって応力が大きくなり、導体配線の応力が
集中する配線の角部にクラックが発生したり、あるいは
絶縁膜自身の応力が絶縁膜の膜強度を上回って最終的に
絶縁層にクラックが発生してしまうという問題がある。When BCB resin is used, BCB resin has an induction rate of 2.6.
It has lower electrical properties than polyimide and is electrically superior, but its coefficient of thermal expansion is 4.0 × 10 -5, which is similar to that of polyimide resin.
Although it is (1 / ° C), the elongation rate is as low as 2.2%, so B
When the multilayer wiring board is made to have a high multilayer structure only with CB resin, the stress increases as it goes up, and cracks occur at the corners of the wiring where the stress of the conductor wiring concentrates, or the stress of the insulating film itself increases. There is a problem that the strength of the insulating film is exceeded and finally the insulating layer is cracked.
発明の目的 本発明は上記のような従来のものの問題点を除去すべ
くなされたもので、配線の角部や絶縁層にクラックが発
生することなく、高速の信号伝播速度を実現することが
できる有機樹脂多層配線基板の提供を目的とする。The object of the present invention is to eliminate the above-mentioned problems of the conventional one, and it is possible to realize a high signal propagation speed without causing a crack in a corner portion of a wiring or an insulating layer. An object is to provide an organic resin multilayer wiring board.
発明の構成 本発明による有機樹脂多層配線基板は、導体配線層と
有機樹脂の絶縁層とが交互に積層された有機樹脂多層配
線基板であって、前記導体配線層のうち信号層とグラン
ド層との間の前記絶縁層をベンゾシクロブテン樹脂で構
成し、他の前記絶縁層をポリイミド樹脂で構成したこと
を特徴とする。Configuration of the invention The organic resin multilayer wiring board according to the present invention is an organic resin multilayer wiring board in which conductor wiring layers and organic resin insulating layers are alternately laminated, and a signal layer and a ground layer among the conductor wiring layers. It is characterized in that the insulating layer between them is made of benzocyclobutene resin, and the other insulating layers are made of polyimide resin.
実施例 次に、本発明の一実施例について図面を参照して説明
する。Embodiment Next, an embodiment of the present invention will be described with reference to the drawings.
第1図は本発明の一実施例を示す断面図である。図に
おいて、セラミック(またはガラスセラミック)多層配
線基板1には銅または金などの導体がメッキ法で厚さ10
ミクロン、線幅25ミクロンで電源層2が形成されてい
る。FIG. 1 is a sectional view showing an embodiment of the present invention. In the figure, a ceramic (or glass ceramic) multilayer wiring board 1 is coated with a conductor such as copper or gold to a thickness of 10 by plating.
The power supply layer 2 is formed with a line width of 25 microns.
このセラミック多層配線基板1上に、400℃以下でキ
ュアできるタイプのポリイミド樹脂で、ヴィアホール9a
を有するポリイミド樹脂絶縁層5aが20ミクロン厚で形成
されている。On this ceramic multilayer wiring board 1, a via hole 9a made of a polyimide resin that can be cured at 400 ° C or lower.
And a polyimide resin insulating layer 5a having a thickness of 20 μm is formed.
ここで、キュア温度が400℃以下のポリイミドを使用
する理由は、ベンゾシクロブテン樹脂(以下BCB樹脂と
する)の重量減少開始温度が430℃であるため、キュア
温度を430℃以下にする必要があるためである。Here, the reason for using a polyimide having a curing temperature of 400 ° C. or lower is that the weight reduction starting temperature of the benzocyclobutene resin (hereinafter referred to as BCB resin) is 430 ° C. Therefore, it is necessary to set the curing temperature to 430 ° C. or lower. Because there is.
このポリイミド樹脂絶縁層5aの上にグランド層3aと信
号配線層4aとがメッキ法で形成されるのであるが、これ
らグランド層3aと信号配線層4aとの間にBCB樹脂で、ヴ
ィアホール9bを有するBCB樹脂絶縁層6aが20ミクロン厚
で形成されている。The ground layer 3a and the signal wiring layer 4a are formed on the polyimide resin insulating layer 5a by a plating method, and the via hole 9b is formed between the ground layer 3a and the signal wiring layer 4a with the BCB resin. The BCB resin insulating layer 6a that it has is formed with a thickness of 20 microns.
信号配線層4aの上には400℃以下でキュアできるタイ
プのポリイミド樹脂で、ヴィアホール9cを有するポリイ
ミド樹脂絶縁層5bが20ミクロン厚で形成されている。On the signal wiring layer 4a, a polyimide resin insulating layer 5b of a type that can be cured at 400 ° C. or lower and has a via hole 9c is formed with a thickness of 20 μm.
ポリイミド樹脂絶縁層5bの上には信号配線層4bがメッ
キ法で形成され、信号配線層4bの上にヴィアホール9dを
有するBCB樹脂絶縁層6bが20ミクロン厚で形成され、そ
の上にグランド層3bがメッキ法で形成されている。A signal wiring layer 4b is formed on the polyimide resin insulating layer 5b by a plating method, a BCB resin insulating layer 6b having a via hole 9d is formed on the signal wiring layer 4b with a thickness of 20 μm, and a ground layer is formed thereon. 3b is formed by the plating method.
さらに、グランド層3bの上にはヴィアホール9eを有す
るポリイミド樹脂絶縁層5cが20ミクロン厚で形成され、
ポリイミド樹脂絶縁層5cの上に電源・信号乗換え層7が
メッキ法で形成され、電源・信号乗換え層7の上にヴィ
アホール9fを有するポリイミド樹脂絶縁層5dが20ミクロ
ン厚で形成され、その上に電気部品搭載層8がメッキ法
で形成されている。Furthermore, a polyimide resin insulating layer 5c having a via hole 9e is formed on the ground layer 3b with a thickness of 20 microns,
The power supply / signal transfer layer 7 is formed on the polyimide resin insulation layer 5c by a plating method, and the polyimide resin insulation layer 5d having a via hole 9f is formed on the power supply / signal transfer layer 7 with a thickness of 20 μm. The electric component mounting layer 8 is formed by plating.
ここで、本実施例ではBCB樹脂をグランド層3a,3bと信
号配線層4a,4bとの間にのみ使用しているので、従来のB
CB樹脂のみで多層配線基板の高多層化を行う場合のよう
に、配線の角部や絶縁層にクラックが発生することがな
くなる。Here, in this embodiment, since BCB resin is used only between the ground layers 3a and 3b and the signal wiring layers 4a and 4b, the conventional BB resin is used.
As in the case of increasing the number of layers in a multilayer wiring board using only CB resin, cracks will not occur at the corners of the wiring or the insulating layer.
また、信号の配線遅延がグランド層3a,3bと信号配線
層4a,4bとの間の絶縁層の誘電率で決まるため、この部
分に誘電率が低いBCB樹脂を使用することによって、配
線基板材料としての電気特性を改善することができ、高
速の信号伝播速度を実現することができる。Further, since the signal wiring delay is determined by the dielectric constant of the insulating layer between the ground layers 3a, 3b and the signal wiring layers 4a, 4b, by using a BCB resin having a low dielectric constant in this portion, the wiring board material It is possible to improve the electric characteristics as described above, and it is possible to realize a high signal propagation speed.
このように、グランド層3a,3bや信号配線層4a,4b、あ
るいは電源・信号乗換え層7や電気部品搭載層8などの
導体配線層とポリイミド樹脂絶縁層5a〜5dが交互に積層
されたポリイミド樹脂多層配線基板において、グランド
層3a,3bと信号配線層4a,4bとの間にBCB樹脂絶縁層6a,6b
を形成するようにすることによって、誘電率が3.4〜3.8
程度の一般的なポリイミド樹脂の絶縁層に比べて、グラ
ンド層3a,3bと信号配線層4a,4bとの間の絶縁層の誘電率
が2.6に下がるので、高速の信号伝播速度を実現するこ
とができる。In this way, the ground layers 3a and 3b, the signal wiring layers 4a and 4b, or the conductor wiring layers such as the power supply / signal transfer layer 7 and the electric component mounting layer 8 and the polyimide resin insulating layers 5a to 5d are alternately laminated. In the resin multilayer wiring board, the BCB resin insulation layers 6a, 6b are provided between the ground layers 3a, 3b and the signal wiring layers 4a, 4b.
To form a dielectric constant of 3.4 to 3.8.
The dielectric constant of the insulating layer between the ground layers 3a, 3b and the signal wiring layers 4a, 4b is reduced to 2.6, compared to a general polyimide resin insulating layer, so that a high signal propagation speed can be realized. You can
また、BCB樹脂の絶縁層をグランド層3a,3bと信号配線
層4a,4bとの間にのみ使用するので、BCB樹脂のみで多層
配線基板の高多層化を行う場合のように配線の角部や絶
縁層にクラックが発生するのを防ぐことができる。Moreover, since the insulating layer of BCB resin is used only between the ground layers 3a and 3b and the signal wiring layers 4a and 4b, the corner portions of the wiring can be formed as in the case where only the BCB resin is used to increase the number of layers of the multilayer wiring board. It is possible to prevent the occurrence of cracks in the insulating layer.
よって、配線の角部や絶縁層にクラックが発生するこ
となく、高速の信号伝播速度を実現することができる。Therefore, a high signal propagation speed can be realized without generating a crack in the corner portion of the wiring or the insulating layer.
発明の効果 以上説明したように本発明によれば、有機樹脂多層配
線基板上に交互に積層された導体配線層のうち信号層と
グランド層との間の絶縁層をベンゾシクロブテン樹脂で
構成するようにすることによって、配線の角部や絶縁層
にクラックが発生することなく、高速の信号伝播速度を
実現することができるという効果がある。EFFECTS OF THE INVENTION As described above, according to the present invention, the insulating layer between the signal layer and the ground layer of the conductor wiring layers alternately laminated on the organic resin multilayer wiring board is made of benzocyclobutene resin. By doing so, there is an effect that a high signal propagation speed can be realized without generating a crack in the corner portion of the wiring or the insulating layer.
第1図は本発明の一実施例を示す断面図、第2図は従来
例を示す断面図である。 主要部分の符号の説明 1……セラミック多層配線基板 3a,3b……グランド層 4a,4b……信号配線層 5a〜5b……ポリイミド樹脂絶縁層 6a,6b……ベンゾシクロブテン樹脂絶縁層FIG. 1 is a sectional view showing an embodiment of the present invention, and FIG. 2 is a sectional view showing a conventional example. Explanation of symbols for main parts 1 …… Ceramic multilayer wiring board 3a, 3b …… Ground layer 4a, 4b …… Signal wiring layer 5a-5b …… Polyimide resin insulation layer 6a, 6b …… Benzocyclobutene resin insulation layer
Claims (1)
積層された有機樹脂多層配線基板であって、前記導体配
線層のうち信号層とグランド層との間の前記絶縁層をベ
ンゾシクロブテン樹脂で構成し、他の前記絶縁層をポリ
イミド樹脂で構成したことを特徴とする有機樹脂多層配
線基板。1. An organic resin multilayer wiring board in which conductor wiring layers and insulating layers of organic resin are alternately laminated, wherein the insulating layer between the signal layer and the ground layer of the conductor wiring layers is made of benzo. An organic resin multilayer wiring board comprising a cyclobutene resin and the other insulating layer made of a polyimide resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27810890A JP2551223B2 (en) | 1990-10-17 | 1990-10-17 | Organic resin multilayer wiring board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27810890A JP2551223B2 (en) | 1990-10-17 | 1990-10-17 | Organic resin multilayer wiring board |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04152696A JPH04152696A (en) | 1992-05-26 |
| JP2551223B2 true JP2551223B2 (en) | 1996-11-06 |
Family
ID=17592739
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27810890A Expired - Fee Related JP2551223B2 (en) | 1990-10-17 | 1990-10-17 | Organic resin multilayer wiring board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2551223B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2882380B2 (en) * | 1996-09-05 | 1999-04-12 | 日本電気株式会社 | Semiconductor device and manufacturing method thereof |
-
1990
- 1990-10-17 JP JP27810890A patent/JP2551223B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04152696A (en) | 1992-05-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4710854A (en) | Hybrid multilayer wiring board | |
| US5827605A (en) | Ceramic multilayer substrate and method of producing the same | |
| WO1998047326A1 (en) | Wiring board having vias | |
| JPS59167096A (en) | Circuit board | |
| US5849396A (en) | Multilayer electronic structure and its preparation | |
| JP2551223B2 (en) | Organic resin multilayer wiring board | |
| JPS63307768A (en) | Multilayer circuit board for loading semiconductor | |
| JPH0754874B2 (en) | Multilayer printed wiring board | |
| JP3921756B2 (en) | Printed circuit board and manufacturing method thereof | |
| JPH067578B2 (en) | Ceramic multilayer board | |
| US3144704A (en) | Method of making couplings to super-conductor circuits | |
| CN113260137A (en) | Printed circuit board, circuit board assembly and power supply device | |
| US4916259A (en) | Composite dielectric structure for optimizing electrical performance in high performance chip support packages | |
| JPS59151490A (en) | Wiring conductor of circuit board | |
| JPH08213762A (en) | Wiring board with low permittivity | |
| JPS62165350A (en) | Multilayer interconnection substrate | |
| JPS6010698A (en) | Multilayer circuit board and method of producing same | |
| JPS6319896A (en) | Multilayer interconnection board | |
| EP0354341B1 (en) | A composite structure for use in electronic packages | |
| JPS60134497A (en) | Wiring board and its manufacturing method | |
| CN207783251U (en) | A kind of light and handy slim HDI high-density circuit boards | |
| JP3490185B2 (en) | Multi-layer wiring structure | |
| CN207783249U (en) | A kind of high multistage HDI high-density circuit boards of novel high-precision | |
| JP2787238B2 (en) | Film carrier with printing element | |
| JPH04132293A (en) | Polyimide resin multilayer wiring board |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 12 Free format text: PAYMENT UNTIL: 20080822 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090822 Year of fee payment: 13 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 14 Free format text: PAYMENT UNTIL: 20100822 |
|
| LAPS | Cancellation because of no payment of annual fees |