JP2555070B2 - Manufacturing method of high strength copper base alloy - Google Patents
Manufacturing method of high strength copper base alloyInfo
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- JP2555070B2 JP2555070B2 JP62101406A JP10140687A JP2555070B2 JP 2555070 B2 JP2555070 B2 JP 2555070B2 JP 62101406 A JP62101406 A JP 62101406A JP 10140687 A JP10140687 A JP 10140687A JP 2555070 B2 JP2555070 B2 JP 2555070B2
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- oxidizing atmosphere
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Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は電子・電気機器・特に電子部品のリード材,
スイッチ・端子・コネクター等の配器材やばね材として
多く用いることができる高い強度と優れたメッキ性・半
田接合強度・耐食性・耐熱性等をもつ高力銅合金の製造
法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a lead material for electronic / electrical equipment, especially electronic parts,
The present invention relates to a method for producing a high-strength copper alloy having high strength and excellent plating properties, solder joint strength, corrosion resistance, heat resistance, etc., which can be used as a switch, terminal, connector, and other distribution materials and spring materials.
電子機器部品、例えばトランジスタ,IC,LSI,VLSI,ダ
イオード等の半導体のリードフレーム材、ヒートシンク
材、電子部品のリード材、コネクター・スイッチ・リレ
ー等の構成部品のばね材及び各種端子材には多くの銅合
金が利用されている。近年さらに電子機器部品の小型
化,高性能化,高密度化に伴ってより高性能の合金が求
められるようになり、特に最先端にある半導体は高集積
化が目覚しく、これに用いられるリード材には高い強度
が要求されている。Many are used for electronic equipment parts, such as semiconductor lead frame materials such as transistors, ICs, LSIs, VLSIs, diodes, heat sink materials, lead materials for electronic parts, spring materials and various terminal materials for components such as connectors, switches and relays. Copper alloy is used. In recent years, with the miniaturization, high performance, and high density of electronic device parts, higher performance alloys have been required. Especially, semiconductors at the leading edge are remarkably highly integrated, and lead materials used for them. Requires high strength.
このような強度の優れた銅合金の代表的なものとして
は従来Cu−Sn−P系,Cu−Ni−Sn系及びCu−Zn−Pb系合
金等があるが、これらの合金は製造工程中に熱間加工が
不可欠であるために、さらに加えて熱間加工性が乏しい
ために次のような問題が発生しており品質の低下とコス
トの上昇を招いている。Typical of such copper alloys having excellent strength are conventional Cu-Sn-P-based alloys, Cu-Ni-Sn-based alloys, and Cu-Zn-Pb-based alloys. In addition, since hot working is indispensable and, in addition, the hot workability is poor, the following problems occur, resulting in deterioration in quality and increase in cost.
(1)熱間圧延時及び熱間加工時に大気中での高温加熱
により材料表面に多層,多量の酸化スケールが発生し、
これを除去するために多大な研削が必要であり、材料歩
留りが低下すると共に添加元素の内部酸化や圧延時の酸
化スケールの巻き込み等により内部欠陥を生じ、半田付
け性やメッキ密着性が低下する。(1) During hot rolling and hot working, high temperature heating in the atmosphere causes multi-layers and a large amount of oxide scale on the material surface,
A large amount of grinding is required to remove this, and the material yield decreases, and internal defects occur due to internal oxidation of additive elements and inclusion of oxide scale during rolling, which reduces solderability and plating adhesion. .
(2)大気加熱による再熱割れ及び熱間加工時の割れが
生じ、かつこれらの割れにより歩留りが低下し、従って
生産コストが増加する。(2) Reheat cracking due to atmospheric heating and cracks during hot working occur, and these cracks reduce the yield, thus increasing the production cost.
(3)熱間加工時に材料を高温に加熱するため多量のエ
ネルギーを必要とし、かつそれに伴ない大きな設備投資
を必要とし生産コストが増加する。(3) Since the material is heated to a high temperature during hot working, a large amount of energy is required, and accompanying this, a large capital investment is required and the production cost increases.
本発明はこれに鑑み種々検討の結果、熱間加工工程を
廃止することにより上記問題点を解消した高力銅基合金
の製造法に開発したもので、Ti0.01〜5.0wt%を含み、
さらに2.2wt%以下のSnとそれぞれ2.5wt%以下のNi,Zn,
Mn,Co,Alとそれぞれ0.5wt%以下のMg,As,Ca,V,Y,希土類
元素,In,Pb,Sb,Bi,Te,Ag,Au,P,B,Cr,Ga,Zr,Geの1種又
は2種以上を合計で5.0wt%以下を含み、残部Cuと不可
避的不純物から成る銅合金を連続鋳造し、該鋳塊の表面
を研削した後、20〜95%の加工率で冷間加工を行ない、
しかる後非酸化性雰囲気中にて300〜900℃で5秒〜24時
間加熱して0.01〜500℃/秒の冷却速度で冷却を行なう
工程の後、表面を溶解又は研削により清浄化し、5〜90
%の加工率で冷間加工を行ない、しかる後非酸化性雰囲
気中にて200〜650℃で5秒〜24時間加熱する工程を1回
以上繰り返して行なうことを特徴とするものである。The present invention has been developed in a method for producing a high-strength copper-based alloy that solves the above problems by eliminating the hot working step as a result of various studies in view of this, and includes Ti 0.01 to 5.0 wt%,
Furthermore, 2.2 wt% or less of Sn and 2.5 wt% or less of Ni, Zn, and
Mn, Co, Al and Mg, As, Ca, V, Y, rare earth elements, In, Pb, Sb, Bi, Te, Ag, Au, P, B, Cr, Ga, Zr, Ge of 0.5 wt% or less respectively 1 or 2 or more of 5.0 wt% or less in total, the copper alloy consisting of the balance Cu and unavoidable impurities is continuously cast, and after grinding the surface of the ingot, the working rate is 20 to 95%. Cold working,
Then, after the step of heating in a non-oxidizing atmosphere at 300 to 900 ° C. for 5 seconds to 24 hours and cooling at a cooling rate of 0.01 to 500 ° C./second, the surface is cleaned by melting or grinding, and 90
It is characterized in that cold working is performed at a working rate of%, and then a step of heating in a non-oxidizing atmosphere at 200 to 650 ° C. for 5 seconds to 24 hours is repeated once or more.
本発明において合金組成を上記の如く限定したのは次
の理由による。The reason why the alloy composition is limited as described above in the present invention is as follows.
Tiの含有量を0.01〜5.0wt%と限定したのは、Tiの含
有量が0.01wt%未満では所望の強度が得られないからで
あり、Tiの含有量が5.0wt%を超える場合は高い強度は
得られるが冷間加工性や曲げ成型性の低下が大きく半田
付け性やメッキ密着性も低下するからである。The reason why the Ti content is limited to 0.01 to 5.0 wt% is that the desired strength cannot be obtained if the Ti content is less than 0.01 wt%, and it is high when the Ti content exceeds 5.0 wt%. This is because the strength can be obtained, but the cold workability and the bendability are largely deteriorated, and the solderability and the plating adhesion are also deteriorated.
さらにSn,Ni,Zn,Mn,Co,Al,Mg,As,Ca,V,Y,希土類元素,
In,Pb,Sb,Bi,Te,Ag,Au,P,B,Cr,Ga,Zr,Ge(以下これらを
副成分と記す)において、2.2wt%以下のSnとそれぞれ
2.5wt%以下のNi,Zn,Mn,Co,Alとそれぞれ0.5wt%以下の
Mg,As,Ca,V,Y,希土類元素,In,Pb,Sb,Bi,Te,Ag,Au,P,B,C
r,Ga,Zr,Geの1種又は2種以上を合計で5.0wt%以下と
限定したのは、これらを添加することにより電子部品と
して良好な強度,半田付け性,メッキ密着性及び優れた
鋳造性を有するからであり、添加量が合計で5.0wt%を
超えると鋳造性,半田付け性及びメッキ密着性が劣るか
らである。In addition, Sn, Ni, Zn, Mn, Co, Al, Mg, As, Ca, V, Y, rare earth elements,
In, Pb, Sb, Bi, Te, Ag, Au, P, B, Cr, Ga, Zr, Ge (hereinafter, these are referred to as subcomponents), 2.2 wt% or less Sn and
Ni, Zn, Mn, Co, Al less than 2.5wt% and less than 0.5wt% respectively
Mg, As, Ca, V, Y, rare earth elements, In, Pb, Sb, Bi, Te, Ag, Au, P, B, C
The reason why one or more of r, Ga, Zr, Ge is limited to 5.0 wt% or less in total is that by adding these, good strength, solderability, plating adhesion and excellent electronic parts are obtained. This is because it has castability, and if the total amount added exceeds 5.0 wt%, castability, solderability, and plating adhesion will be poor.
次に上記組成の合金を連続鋳造後表面研削するのは、
鋳造時の欠陥や偏析を除去するためであり、機械的ある
いは化学的な方法で表層を研削すれば良い。その後の冷
間加工の加工率を20〜95%と限定したのは20%未満では
後工程の熱処理時に再結晶を起こさせるのに不十分であ
り、95%を超えると材料組織の不均一性を招くためであ
る。Next, the surface grinding after continuously casting the alloy of the above composition is
This is to remove defects and segregation during casting, and the surface layer may be ground by a mechanical or chemical method. The reason for limiting the working rate of the subsequent cold working to 20 to 95% is that if it is less than 20% it is insufficient to cause recrystallization during the heat treatment in the subsequent process, and if it exceeds 95%, the non-uniformity of the material structure occurs. This is because it invites.
引き続いての熱処理で加熱温度を300〜900℃と限定し
たのは300℃未満では材料の再結晶が不十分であり、900
℃を超えると粗大な結晶粒を生じ特性を劣化するからで
ある。さらに加熱時間を5秒〜24時間と限定したのは5
秒未満では再結晶を伴なう焼鈍の効果がなく、24時間を
超える熱処理は生産性を低下させコスト高の要因となる
からである。その後の冷却速度を0.01〜500℃/秒と限
定したのは0.01℃/秒未満では冷却終了までの時間が長
く、生産性が低下するからであり、500℃/秒を超える
と冷却に伴なう材料内部の温度差のため材料変形が生じ
るからである。また以上の熱処理を非酸化性雰囲気で行
なうのは材料の表面及び内部の酸化を防止するためであ
る。In the subsequent heat treatment, the heating temperature was limited to 300-900 ° C because the recrystallization of the material was insufficient below 300 ° C.
This is because when the temperature exceeds ℃, coarse crystal grains are generated and the characteristics are deteriorated. Furthermore, the reason for limiting the heating time to 5 seconds to 24 hours is 5
This is because if it is less than 2 seconds, there is no effect of annealing accompanied by recrystallization, and heat treatment for more than 24 hours lowers productivity and causes a cost increase. The reason why the cooling rate after that is limited to 0.01 to 500 ° C / sec is that if it is less than 0.01 ° C / sec, it takes a long time to finish the cooling and the productivity is lowered, and if it exceeds 500 ° C / sec, it is accompanied by cooling. This is because the material is deformed due to the temperature difference inside the material. The reason why the above heat treatment is performed in a non-oxidizing atmosphere is to prevent the surface and the inside of the material from being oxidized.
次に表面を溶解又は研削により清浄化するのは製造工
程中の材料の酸化や冷間圧延時の圧延油の付着に伴なう
熱処理時の変色をそのまま放置して製品とすると半田付
け性やメッキ密着性に著しい低下を引き起こして信頼性
を大きく損なうのでこれらを防ぐためであり、酸やバフ
等を用い0.1〜5μm程度表面層を除去するのが望まし
く、5μmを超えると表面が荒れることにより半田付け
性及びメッキ密着性が低下してしまう。Next, the surface is cleaned by melting or grinding, because the discoloration during heat treatment due to the oxidation of materials during the manufacturing process and the adhesion of rolling oil during cold rolling is left as it is for solderability and This is to prevent the plating adhesion from being significantly reduced and the reliability to be greatly impaired, so it is desirable to remove the surface layer by about 0.1 to 5 μm using acid or buff, and if it exceeds 5 μm, the surface will become rough. Solderability and plating adhesion will be reduced.
その後の施す冷間加工を5〜90%と限定したのは5%
未満では材料の平坦度や面粗度が劣り、強度も小さいか
らであり、90%を超えると材料組織の不均一性を招くか
らである。さらに引き続いての熱処理が仕上げ加工後の
最終焼鈍である場合は該熱処理は材料の調質と内部歪の
除去のために行なうものであり、他方中間焼鈍である場
合は該熱処理は以後に続く加工を容易にするためのもの
であり、それぞれの加熱温度を200〜650℃、加熱時間を
5秒〜24時間と限定したのは、これら範囲外では所期の
目的を達せられないからである。なお最終焼鈍の場合は
再結晶温度以下、即ち200〜560℃で5秒〜24時間の処理
が望ましく、中間焼鈍の場合は再結晶温度以上即ち400
〜650℃で10秒〜24時間の処理が望ましい。さらに上記
熱処理を非酸化性雰囲気中で行なう理由は材料の表面及
び内部酸化を抑制するためである。5% limited the subsequent cold working to 5 to 90%
If it is less than 90%, the flatness and surface roughness of the material are inferior and the strength is small, and if it exceeds 90%, nonuniformity of the material structure is caused. Further, if the subsequent heat treatment is final annealing after finishing, the heat treatment is performed for the purpose of refining the material and removal of internal strain, while if it is intermediate annealing, the heat treatment is for subsequent processing. The heating temperature is limited to 200 to 650 ° C. and the heating time is limited to 5 seconds to 24 hours because the intended purpose cannot be achieved outside these ranges. It should be noted that in the case of final annealing, it is desirable to perform the treatment at a recrystallization temperature or lower, that is, at 200 to 560 ° C. for 5 seconds to 24 hours, and in the case of intermediate annealing, a temperature above the recrystallization temperature, ie 400
Treatment at ~ 650 ° C for 10 seconds to 24 hours is desirable. Further, the reason for performing the heat treatment in a non-oxidizing atmosphere is to suppress the surface and internal oxidation of the material.
また上記表面清浄とそれに続く冷間加工及び熱処理を
適宜繰り返して行なう事により平滑で表面欠陥のない表
面性の優れた高強度かつ伸びの良好な材料を得ることが
できる。Further, by appropriately repeating the above-mentioned surface cleaning and subsequent cold working and heat treatment, it is possible to obtain a material having high strength and good elongation which is smooth, has no surface defects, and has excellent surface properties.
なお最終的に歪取りと形状矯正のためテンションレベ
ラー又はテンションアニール等を行なうことにより所望
の特性に調整することができる。Finally, the desired characteristics can be adjusted by performing tension leveler or tension annealing for strain relief and shape correction.
次に本発明の実施例について説明する。 Next, examples of the present invention will be described.
第1表に示す組成の合金をそれぞれ溶解し水平連続鋳
造により厚さ10mmの鋳塊を得、片面0.5mmづつ研削して
冷間圧延により厚さ1.5mmとした後、非酸化性雰囲気中
で580℃の温度で2時間保持し、0.03℃/秒の冷却速度
で冷却した。その後、表面を清浄化し、0.42mmの厚さま
で冷間圧延を行なった後非酸化性雰囲気中にて540℃で
1時間保持して中間焼鈍を施し、0.03℃/秒の冷却速度
で冷却し、再び表面清浄化を行ない冷間圧延により厚さ
を0.25mmとした後、非酸化性雰囲気中にて300℃で2時
間保持して仕上焼鈍を施し、0.05℃/秒の冷却速度で冷
却した。このような本発明による供試材についてそれぞ
れ引張強さ,伸び,曲げ成型性,半田接合強度,メッキ
密着性を調査し、その結果を第1表に併記した。Alloys with the compositions shown in Table 1 were each melted to obtain ingots with a thickness of 10 mm by horizontal continuous casting, and each side was ground by 0.5 mm and cold-rolled to a thickness of 1.5 mm, then in a non-oxidizing atmosphere. The temperature was maintained at 580 ° C for 2 hours, and the cooling rate was 0.03 ° C / sec. After that, the surface is cleaned, cold-rolled to a thickness of 0.42 mm, then held in a non-oxidizing atmosphere at 540 ° C for 1 hour for intermediate annealing, and cooled at a cooling rate of 0.03 ° C / sec. After the surface was cleaned again and the thickness was reduced to 0.25 mm by cold rolling, finish annealing was carried out by holding at 300 ° C. for 2 hours in a non-oxidizing atmosphere, and cooled at a cooling rate of 0.05 ° C./sec. Tensile strength, elongation, bendability, solder joint strength, and plating adhesion were investigated for each of the test materials according to the present invention, and the results are also shown in Table 1.
なお曲げ成型性は先端半径(R)の異なる90゜ダイス
の先端折り曲げ軸を供試材の圧延方向と平行に合わせて
供試材を折り曲げ、マイクロクラックの発生の有無を調
べて板厚(t)との比R/tで表わし、半田接合強度は供
試材の直径12mmの部分に引張り用リード線を共晶半田付
けした後、150℃で600時間保持してから引張り試験を行
ないその強度で表わし、さらにメッキ密着性は供試材を
ホウフッ化物浴を用いてSn−5%Pb合金を7.5μmの厚
さにメッキした後105℃で1000時間保持し、その後180゜
に折り曲げ、折り曲げ部のメッキ層の剥離の有無を検鏡
した。The bending formability is determined by bending the test material with the tip bending axis of a 90 ° die having a different tip radius (R) parallel to the rolling direction of the test material, and checking for microcracks to determine the plate thickness (t ), The solder joint strength is determined by conducting a tensile test after eutectic soldering the lead wire for tension to the 12 mm diameter part of the test material and holding it at 150 ° C for 600 hours. In addition, the plating adhesion is determined by plating the test material with a borofluoride bath of Sn-5% Pb alloy to a thickness of 7.5 μm, holding it at 105 ° C for 1000 hours, and then bending it to 180 °. The presence or absence of peeling of the plated layer was examined under a microscope.
次に第1表のNo.3の組成の合金を溶解し、水平連続鋳
造して厚さ10mmの鋳塊を得、該鋳塊を片面0.5mmづつ研
削し、冷間圧延により厚さ1.5mmとした後、非酸化性雰
囲気中にて第2表に示す条件でそれぞれ熱処理を施し、
その後表面を清浄化して冷間圧延にて厚さ0.42mmとし非
酸化性雰囲気中にて460℃で1時間保持して中間焼鈍を
施し、0.03℃/秒の冷却速度で冷却し再び表面を清浄化
して冷間圧延にて厚さ0.25mmとし、非酸化性雰囲気中に
て300℃で2時間保持して仕上焼鈍を施し、0.05℃/秒
の冷却速度で冷却して供試材とし、それぞれ引張り強
さ,伸び,曲げ成型性,半田接合強度,メッキ密着性を
調査してその結果を第2表に併記した。 Next, the alloy of composition No. 3 in Table 1 was melted and continuously cast horizontally to obtain an ingot with a thickness of 10 mm, the ingot was ground by 0.5 mm on each side, and the thickness was 1.5 mm by cold rolling. After that, heat treatment was performed in a non-oxidizing atmosphere under the conditions shown in Table 2,
After that, the surface is cleaned and cold-rolled to a thickness of 0.42 mm, held in a non-oxidizing atmosphere at 460 ° C for 1 hour for intermediate annealing, cooled at a cooling rate of 0.03 ° C / sec, and the surface is cleaned again. And cold-rolled to a thickness of 0.25 mm, held in a non-oxidizing atmosphere at 300 ° C for 2 hours for finish annealing, and cooled at a cooling rate of 0.05 ° C / sec. Tensile strength, elongation, bendability, solder joint strength, and plating adhesion were investigated and the results are also shown in Table 2.
次に第1表のNo.3の組成の合金を溶解し、水平連続鋳
造して厚さ10mmの鋳塊を得、該鋳塊を片面0.5mmづつ研
削し、冷間圧延により厚さ1.5mmとした後、非酸化性雰
囲気中にて480℃で5時間保持し、0.02℃/秒の冷却速
度で冷却し表面を清浄化し、その後第3表に示す条件で
冷間圧延を施したものを中間焼鈍をせずに非酸化性雰囲
気中にて300℃で2時間保持して仕上焼鈍をし、0.05℃
/秒の冷却速度で冷却して供試材とし、それぞれ引張り
強さ,伸び,曲げ成型性,半田接合強度及びメッキ密着
性を調査してその結果を第3表に併記した。 Next, the alloy of composition No. 3 in Table 1 was melted and continuously cast horizontally to obtain an ingot with a thickness of 10 mm, the ingot was ground by 0.5 mm on each side, and the thickness was 1.5 mm by cold rolling. After that, the product was kept at 480 ° C for 5 hours in a non-oxidizing atmosphere, cooled at a cooling rate of 0.02 ° C / sec to clean the surface, and then cold-rolled under the conditions shown in Table 3. Finish annealing is performed by holding at 300 ° C for 2 hours in a non-oxidizing atmosphere without intermediate annealing, and 0.05 ° C.
The test materials were cooled at a cooling rate of / sec, and the tensile strength, elongation, bendability, solder joint strength, and plating adhesion were investigated, and the results are also shown in Table 3.
さらに第1表のNo.3及びNo.7の組成の合金を溶解し、
水平連続鋳造により厚さ10mmの鋳塊を得、該鋳塊を片面
0.5mmづつ研削し、冷間圧延により厚さ1.5mmとした後非
酸化性雰囲気中にて520℃で2時間保持し、0.03℃/秒
の冷却速度で冷却し表面を清浄化し、その後冷間圧延し
て厚さ0.42mmとし非酸化性雰囲気中にて460℃で1時間
保持して中間焼鈍を施し、0.03℃/秒の冷却速度で冷却
し、しかる後再び表面を清浄化し冷間圧延を行なって0.
25mmの厚さとし、第4表に示す条件にて仕上焼鈍を施し
て供試材とし、それぞれ引張強さ,伸び,曲げ成型性,
半田接合強度及びメッキ密着性を調査してその結果を第
4表に併記する。 Furthermore, melt the alloys of composition No. 3 and No. 7 in Table 1,
Horizontal ingot casting produces a 10 mm thick ingot, and the ingot is single-sided.
After grinding by 0.5 mm and cold rolling to a thickness of 1.5 mm, the product is held in a non-oxidizing atmosphere at 520 ° C for 2 hours, cooled at a cooling rate of 0.03 ° C / sec to clean the surface, and then cold. Rolled to a thickness of 0.42 mm, kept at 460 ° C for 1 hour in a non-oxidizing atmosphere, subjected to intermediate annealing, cooled at a cooling rate of 0.03 ° C / sec, and then cleaned the surface again and cold rolled. Go 0.
With a thickness of 25 mm, finish annealing was performed under the conditions shown in Table 4 to obtain test materials, and tensile strength, elongation, bend formability,
The solder joint strength and plating adhesion were investigated and the results are also shown in Table 4.
第1表〜第4表から明らかなように本発明法による合
金はいずれも引張り強さにおいては60.8kgf/mm以上、伸
びについては10.0%以上及び半田接合強度については0.
9kgf/mm以上有し、また曲げ成型性においてはいずれも
0.8以下、さらにメッキ層の剥離は皆無であり、良好な
特性を有している。これに対し本発明法と製造条件の異
なる比較法による合金は少なくとも1つ以上の特性につ
いて本発明法による合金より劣っていることが判る。即
ち、比較法No.15は半田接合強度が小さく、曲げ成型性
及びメッキ密着性が劣っており、比較法No.17は曲げ成
型性及びメッキ密着性が悪い。また比較法No.23及びNo.
29はいずれも引張り強さが小さく、比較法No.16,No.22
及びNo.28はいずれも伸びが小さく、曲げ成型性が劣っ
ている。 As is clear from Tables 1 to 4, all the alloys according to the method of the present invention have a tensile strength of 60.8 kgf / mm or more, an elongation of 10.0% or more, and a solder joint strength of 0.
It has 9kgf / mm or more, and in terms of bendability
It is 0.8 or less, and there is no peeling of the plating layer, which has good characteristics. On the other hand, it can be seen that the alloy according to the comparative method having different manufacturing conditions from the method according to the present invention is inferior to the alloy according to the present invention in at least one characteristic. That is, Comparative method No. 15 has a low solder joint strength and is inferior in bend formability and plating adhesion, and Comparative method No. 17 is poor in bend formability and plating adhesion. In addition, comparative methods No. 23 and No.
No. 29 and No. 22 of Comparative method have low tensile strength.
No. 28 and No. 28 both have low elongation and poor bendability.
このように本発明によれば電子機器部品のリードフレ
ーム材,ヒートシンク材,電子部品のリード材や構成部
品のばね材及び各種端子材に利用する合金の製造におい
て熱間加工工程を廃止することによりコストを低減で
き、高強度と優れた加工性,半田性,メッキ性が得られ
る等工業上顕著な効果を奏するものである。As described above, according to the present invention, by eliminating the hot working step in the production of alloys used for the lead frame material of electronic device parts, the heat sink material, the lead material of electronic parts, the spring material of component parts and various terminal materials. The cost is reduced, and high strength and excellent workability, solderability, and plating property can be obtained, which is an industrially significant effect.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 志賀 章二 日光市清滝町500番地 古河電気工業株 式会社日光電気精銅所内 (56)参考文献 特開 昭61−143566(JP,A) 特開 昭62−47465(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shoji Shiga 500 Kiyotaki Town, Nikko City Furukawa Electric Co., Ltd. Nikko Denki Copper Works (56) Reference JP-A-61-143566 (JP, A) JP Sho 62-47465 (JP, A)
Claims (1)
下のSnとそれぞれ2.5wt%以下のNi,Zn,Mn,Co,Alとそれ
ぞれ0.5wt%以下のMg,As,Ca,V,Y,希土類元素,In,Pb,Sb,
Bi,Te,Ag,Au,P,B,Cr,Ga,Zr,Geの1種又は2種以上を合
計で5.0wt%以下を含み、残部Cuと不可避的不純物から
成る銅合金を連続鋳造し、該鋳塊の表面を研削した後、
20〜95%の加工率で冷間加工を行ない、しかる後非酸化
性雰囲気中にて300〜900℃で5秒〜24時間加熱して0.01
〜500℃/秒の冷却速度で冷却を行なう工程の後、表面
を溶解又は研削により清浄化し、5〜90%の加工率で冷
間加工を行ない、しかる後非酸化性雰囲気中にて200〜6
50℃で5秒〜24時間加熱する工程を1回以上繰り返して
行なうことを特徴とする高力銅基合金の製造法。1. A steel containing 0.01 to 5.0 wt% of Ti, 2.2 wt% or less of Sn, 2.5 wt% or less of Ni, Zn, Mn, Co, Al and 0.5 wt% or less of Mg, As, Ca, respectively. , V, Y, rare earth element, In, Pb, Sb,
Continuous casting of a copper alloy containing Bi, Te, Ag, Au, P, B, Cr, Ga, Zr, Ge, and one or more of them in a total amount of 5.0 wt% or less, with the balance Cu and inevitable impurities. , After grinding the surface of the ingot,
Cold work at a working rate of 20 to 95%, then heat at 300 to 900 ° C for 5 seconds to 24 hours in a non-oxidizing atmosphere for 0.01
After the step of cooling at a cooling rate of ~ 500 ° C / sec, the surface is cleaned by melting or grinding, and cold working is performed at a working rate of 5 to 90%, and then 200 to 200 in a non-oxidizing atmosphere. 6
A method for producing a high-strength copper-based alloy, which comprises repeating the step of heating at 50 ° C for 5 seconds to 24 hours once or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62101406A JP2555070B2 (en) | 1987-04-24 | 1987-04-24 | Manufacturing method of high strength copper base alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62101406A JP2555070B2 (en) | 1987-04-24 | 1987-04-24 | Manufacturing method of high strength copper base alloy |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63266054A JPS63266054A (en) | 1988-11-02 |
| JP2555070B2 true JP2555070B2 (en) | 1996-11-20 |
Family
ID=14299837
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62101406A Expired - Fee Related JP2555070B2 (en) | 1987-04-24 | 1987-04-24 | Manufacturing method of high strength copper base alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2555070B2 (en) |
Cited By (2)
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|---|---|---|---|---|
| JP6196435B2 (en) * | 2012-10-02 | 2017-09-13 | Jx金属株式会社 | Titanium copper and method for producing the same |
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| CN112030033A (en) * | 2020-09-14 | 2020-12-04 | 江西省科学院应用物理研究所 | Rare earth copper alloy for high-strength high-conductivity contact line |
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Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61143566A (en) * | 1984-12-13 | 1986-07-01 | Nippon Mining Co Ltd | Manufacture of high strength and highly conductive copper base alloy |
-
1987
- 1987-04-24 JP JP62101406A patent/JP2555070B2/en not_active Expired - Fee Related
Cited By (4)
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|---|---|---|---|---|
| KR20210036290A (en) * | 2019-09-25 | 2021-04-02 | 제이엑스금속주식회사 | Copper titanium alloy sheet for vapor chamber and vapor chamber |
| KR20210036289A (en) * | 2019-09-25 | 2021-04-02 | 제이엑스금속주식회사 | Copper titanium alloy sheet for vapor chamber and vapor chamber |
| KR102418922B1 (en) * | 2019-09-25 | 2022-07-08 | 제이엑스금속주식회사 | Copper titanium alloy sheet for vapor chamber and vapor chamber |
| KR102423266B1 (en) * | 2019-09-25 | 2022-07-20 | 제이엑스금속주식회사 | Copper titanium alloy sheet for vapor chamber and vapor chamber |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63266054A (en) | 1988-11-02 |
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