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JP2562983B2 - Method for producing photosensitive compound - Google Patents
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JP2562983B2 - Method for producing photosensitive compound - Google Patents

Method for producing photosensitive compound

Info

Publication number
JP2562983B2
JP2562983B2 JP2158274A JP15827490A JP2562983B2 JP 2562983 B2 JP2562983 B2 JP 2562983B2 JP 2158274 A JP2158274 A JP 2158274A JP 15827490 A JP15827490 A JP 15827490A JP 2562983 B2 JP2562983 B2 JP 2562983B2
Authority
JP
Japan
Prior art keywords
general formula
compound represented
photosensitive compound
formula
iii
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2158274A
Other languages
Japanese (ja)
Other versions
JPH0449278A (en
Inventor
壯一 橋本
俊和 小田
規人 内野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GOO KAGAKU KOGYO KK
Original Assignee
GOO KAGAKU KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GOO KAGAKU KOGYO KK filed Critical GOO KAGAKU KOGYO KK
Priority to JP2158274A priority Critical patent/JP2562983B2/en
Publication of JPH0449278A publication Critical patent/JPH0449278A/en
Application granted granted Critical
Publication of JP2562983B2 publication Critical patent/JP2562983B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Quinoline Compounds (AREA)
  • Pyridine Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はホルミルスチリンピリジニウム塩又はホルミ
ルスチリルキノリニウム塩からなる感光性化合物の製造
方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for producing a photosensitive compound comprising a formylstyrin pyridinium salt or a formylstyryl quinolinium salt.

〔従来の技術〕[Conventional technology]

ホルミルスチリルピリジニウム塩及びホルミルスチリ
ルキノリニウム塩は、水溶性の感光性樹脂の原料化合物
として有用な化合物である。
Formylstyrylpyridinium salt and formylstyrylquinolinium salt are useful compounds as raw material compounds for water-soluble photosensitive resins.

前記塩の製造方法として、特開昭55−24126号公報に
開示されているように、メチルピリジニウム塩又はメチ
ルキノリニウム塩とフタルアルデヒドとを反応溶媒中に
おいて塩基性職媒の存在下に縮合させる方法が従来知ら
れている。この製造方法では、反応溶媒としてメタノー
ル、エタノール等の極性溶媒を用いるが、副生成物が多
く、主生成物(目的物)の収率が低い(50%以下)とい
う欠点がある。
As a method for producing the salt, as disclosed in JP-A-55-24126, a methylpyridinium salt or methylquinolinium salt and phthalaldehyde are condensed in a reaction solvent in the presence of a basic working medium. The method of making it known is conventionally known. In this production method, a polar solvent such as methanol or ethanol is used as a reaction solvent, but there are many by-products and the yield of the main product (target product) is low (50% or less).

同様の出発原料からの別の製造方法として、特開昭59
−199672号公報に開示されるように、極性溶媒と非極性
溶媒との混合溶媒系で反応させる方法、及び特開昭59−
193872号公報に開示されるように、四級塩を滴下する方
法が知られている。これらの製造方法では、副生成物で
あるジオレフィン型化合物が極性溶媒の単独使用の場合
よりは減少しているが、まだ工業的に有利な製造方法と
は言い難い。
As another manufacturing method from the same starting material, Japanese Patent Laid-Open No.
-Method of reacting in a mixed solvent system of a polar solvent and a non-polar solvent, as disclosed in JP-A-199672, and JP-A-59-
As disclosed in Japanese Patent No. 193872, a method of dropping a quaternary salt is known. In these production methods, the amount of the by-product diolefin type compound is reduced as compared with the case where the polar solvent is used alone, but it is still difficult to say that it is an industrially advantageous production method.

さらに、公知の前記製造方法における縮合終了後の反
応生成物の処理についても、沈殿固形物の生成のために
反応釜からの反応液の取り出しが非常に困難であるこ
と、フタルアルデヒドの除去に際して反応生成物の沈殿
固形物を溶剤で洗浄する場合に沈殿の状態によって洗浄
結果にバラツキが生じ、完全な洗浄が困難であること、
目的物を取り出すのに熱時濾過の操作が必要であるこ
と、及び最終工程として濾液を蒸発乾固させて目的物を
製造する必要があること等の多くの問題点があった。
Further, regarding the treatment of the reaction product after completion of the condensation in the above-mentioned known production method, it is very difficult to take out the reaction solution from the reaction vessel due to the formation of precipitated solid, When washing the precipitated solid of the product with a solvent, the washing result varies depending on the state of precipitation, and complete washing is difficult,
There are many problems such as the operation of hot filtration is required to take out the desired product, and the final step is to evaporate the filtrate to dryness to produce the desired product.

〔発明が解決しようとする課題〕[Problems to be Solved by the Invention]

本発明の課題は、工業的に高収率が得られる感光性化
合物の製造方法を提供することにある。また、本発明の
別の課題は、縮合終了後の反応生成物の処理が容易な感
光性化合物の製造方法を提供することにある。
An object of the present invention is to provide a method for producing a photosensitive compound that can be industrially obtained in high yield. Another object of the present invention is to provide a method for producing a photosensitive compound in which the reaction product after the condensation is easily treated.

〔課題を解決するための技術手段及び作用〕[Technical Means and Actions for Solving Problems]

本発明者らは、前記課題を解決するために検討を重ね
た結果、前記縮合工程及び縮合終了後の精製工程に改良
を加えることにより本発明を完成した。
As a result of repeated studies to solve the above problems, the present inventors have completed the present invention by improving the condensation step and the purification step after completion of the condensation.

即ち、本発明に係る感光性化合物の製造方法は、 一般式[I]又は[II] (式中、R1は水素原子、アルキル基又はアラルキル基を
示し、これらはヒドロキシル基、カルバモイル基、エー
テル結合、不飽和結合を含んでもよく、R2は水素原子又
は低級アルキル基を示し、X-は陰イオンを示す) で表される化合物とフタルアルデヒドとを反応溶媒中に
おいて塩基性触媒の存在下に縮合させて、一般式[II
I] (式中、Aは 一般式[IV]又は[V] で表される基を示し、一般式[IV]又は[V]中のR1
R2及びX-はそれぞれ前記と同義である) で表される感光性化合物を製造するにあたり、反応溶媒
として一般式[I]又は[II]で表わされる化合物及び
フタルアルデヒドを溶解するが一般式[III]で表され
る感光性化合物を溶解しないものを用いる方法におい
て、 縮合によって精製する水を逐次系外に除去することを
特徴とするものである。
That is, the process for producing the photosensitive compound according to the present invention is carried out according to the general formula [I] or [II] (In the formula, R 1 represents a hydrogen atom, an alkyl group or an aralkyl group, and these may include a hydroxyl group, a carbamoyl group, an ether bond, or an unsaturated bond, and R 2 represents a hydrogen atom or a lower alkyl group, X - it is condensed in the presence of a basic catalyst in a reaction solvent and a compound with phthalic aldehyde represented by represents an anion), the general formula [II
I] (In the formula, A is a general formula [IV] or [V] R 1 in the general formula [IV] or [V],
R 2 and X have the same meanings as defined above, respectively. In producing the photosensitive compound represented by the above formula, the compound represented by the general formula [I] or [II] and phthalaldehyde are dissolved as a reaction solvent. In the method using a compound which does not dissolve the photosensitive compound represented by [III], water to be purified by condensation is successively removed to the outside of the system.

また、本発明に係る感光性化合物の別の製造方法は、 前記の一般式[I]又は[II]で表される化合物とフ
タルアルデヒドとを塩基性の存在下に縮合させて、前記
の一般式[III]で表わされる感光性化合物を製造する
にあたり、反応溶媒として一般式[I]又は[II]で表
される化合物及びフタルアルデヒドを溶解するが一般式
[III]で表される感光性化合物を溶解しないものを用
いる方法において、 縮合終了後に一般式[III]で表される感光性化合物
を水に溶解して分離精製することを特徴とするものであ
る。
In addition, another method for producing a photosensitive compound according to the present invention is a method of condensing a compound represented by the general formula [I] or [II] and phthalaldehyde in the presence of a basic compound, In producing the photosensitive compound represented by the formula [III], the compound represented by the general formula [I] or [II] and phthalaldehyde are dissolved as a reaction solvent. A method using a compound which does not dissolve the compound is characterized in that the photosensitive compound represented by the general formula [III] is dissolved in water and separated and purified after completion of the condensation.

一般式[III]の感光性化合物は、一般式[I]又は
[II]の化合物、即ちメチルピリジニウム塩又はメチル
キノリニウム塩とフタルアルデヒドとを反応溶媒中にお
いて塩基性触媒の存在下に縮合させることにより得るこ
とができ、該縮合反応に際して、副生成物として、通
常、 一般式[IV] (式中、Aは前記と同義である) で表わされるジオレフィン型化合物が生成する。
The photosensitive compound represented by the general formula [III] is obtained by condensing a compound represented by the general formula [I] or [II], that is, a methylpyridinium salt or methylquinolinium salt and phthalaldehyde in a reaction solvent in the presence of a basic catalyst. The compound of the general formula [IV] is usually used as a by-product in the condensation reaction. (In the formula, A has the same meaning as above), and a diolefin type compound represented by the formula is produced.

前記縮合反応及び副反応を式で示すと次の通りであ
る。
The condensation reaction and side reaction are represented by the formulas as follows.

[I]又は[II]+フタルアルデヒド→[III]+H2O [III]+[I]又は[II]→[VI]+H2O 従来の前記製造方法では、反応溶媒は、一般式[I]
又は[II]の化合物及びフタルアルデヒドを溶解し、一
般式[III]の感光性化合物及び一般式[VI]の化合物
を溶解せずに沈殿として析出させるとしている。しかし
ながら、実際には、縮合によって生成する水が溶媒に加
わるために、一般式[III]の感光性化合物は若干溶媒
に溶解し、さらに次の副反応が進行して一般式[VI]の
化合物が副生すると考えられる。
[I] or [II] + phthalaldehyde → [III] + H 2 O [III] + [I] or [II] → [VI] + H 2 O In the conventional production method described above, the reaction solvent is represented by the general formula [I] ]
Alternatively, the compound of [II] and phthalaldehyde are dissolved, and the photosensitive compound of general formula [III] and the compound of general formula [VI] are not dissolved but precipitated as a precipitate. However, in practice, water generated by condensation is added to the solvent, so that the photosensitive compound of the general formula [III] is slightly dissolved in the solvent, and further the following side reaction proceeds to further advance the compound of the general formula [VI]. Are considered to be by-products.

本発明では、縮合によって生成する水を逐次系外に除
去するので、溶媒組成の変化がなく、従来方法に比較し
て溶媒への一般式[III]の感光性化合物の溶媒が抑え
られ、結果的に一般式[VI]の化合物の副生が減少し、
主生成物である一般式[III]の感光性化合物の収率向
上をもたらしたものと考えられる。
In the present invention, since water generated by condensation is sequentially removed from the system, the solvent composition does not change, and the solvent of the photosensitive compound of the general formula [III] is suppressed in the solvent as compared with the conventional method. By-product of the general formula [VI] is reduced,
It is considered that the yield of the photosensitive compound of the general formula [III], which is the main product, was improved.

また、従来方法では、フタルアルデヒドの過剰分、即
ち未反応の残存フタルアルデヒドは、反応条件下では溶
媒に溶解しているが、反応系を冷却後、濾別するときに
一部析出し、一般式[III]の感光性化合物及び一般式
[VI]の化合物からなる沈殿中に不純物として含まれる
ことになる。
Further, in the conventional method, the excess amount of phthalaldehyde, that is, the unreacted residual phthalaldehyde is dissolved in the solvent under the reaction conditions, but it is partially precipitated when the reaction system is cooled and then separated by filtration. It will be contained as an impurity in the precipitate composed of the photosensitive compound of the formula [III] and the compound of the general formula [VI].

しかし、本発明では、反応系を冷却後、水を加え、一
般式[III]の感光性化合物及び一般式[VI]の化合物
を従来方法とは逆に水層に溶解させる。このとき、反応
液は2層に分離しており、オイル層の方には残存フタル
アルデヒドが溶解し、且つ副生する着色成分も該オイル
層に溶解する。これを分液して、水層をさらにベンゼン
等の非極性溶媒で洗浄することにより、微量に含まれて
いるフタルアルデヒド及び着色成分を完全に除去するこ
とができる。なお、従来方法では反応釜からの反応生成
物の取り出しが困難であったが、本発明では反応生成物
を溶液として簡単に取り出すことがことができる。前記
洗浄後の水層から、溶解度の差により、一般式[VI]の
化合物を濾別し、一般式[III]の感光性化合物を晶出
により得ることができる。
However, in the present invention, after cooling the reaction system, water is added to dissolve the photosensitive compound of the general formula [III] and the compound of the general formula [VI] in the aqueous layer, contrary to the conventional method. At this time, the reaction liquid is separated into two layers, the residual phthalaldehyde is dissolved in the oil layer, and the coloring component produced as a by-product is also dissolved in the oil layer. By separating this and further washing the aqueous layer with a non-polar solvent such as benzene, it is possible to completely remove phthalaldehyde and coloring components contained in a trace amount. It is difficult to take out the reaction product from the reaction vessel by the conventional method, but in the present invention, the reaction product can be easily taken out as a solution. The compound of the general formula [VI] can be filtered out from the aqueous layer after the washing due to the difference in solubility, and the photosensitive compound of the general formula [III] can be obtained by crystallization.

本発明に使用される反応溶媒は、極性の高い溶媒と極
性の低い溶媒との混合溶媒が好ましく、前者の例として
低級アルコール、多価アルコール誘導体、ジメチルホル
ムアミド、ジメチルスルホキシド等から少なくとも1種
を選ぶことができ、後者の例として、芳香族炭化水素、
脂肪族炭化水素、脂環族炭化水素、ハロゲン価炭化水
素、高級アルコール、ケトン類、エーテル類、エステル
類等から少なくとも1種を選ぶことができる。
The reaction solvent used in the present invention is preferably a mixed solvent of a solvent having a high polarity and a solvent having a low polarity, and examples of the former include at least one selected from lower alcohols, polyhydric alcohol derivatives, dimethylformamide, dimethylsulfoxide and the like. As an example of the latter, an aromatic hydrocarbon,
At least one kind can be selected from aliphatic hydrocarbons, alicyclic hydrocarbons, halogenated hydrocarbons, higher alcohols, ketones, ethers, esters and the like.

前記低級アルコールとして、メタノール、エタノー
ル、プロピルアルコール、イソプロピルアルコール、ブ
チルアルコール、イソブチルアルコール、ターシャリー
ブチルアルコール、エチレングリコール、プロピレング
リコール等を挙げることができる。多価アルコール誘導
体として、一般式[I]又は[II]の化合物を溶解し得
るものが好ましく、メチルセロソルブ、エチルセロソル
ブ、ブチルセロソルブ、ターシャリーブチルセロソルブ
等を挙げることができる。芳香族炭化水素として、ベン
ゼン、トルエン、キシレン、エチルベンゼン等を挙げる
ことができる。脂肪族炭化水素として、ヘキサン、ヘプ
タン、オクタン等を挙げることができる。脂環族炭化水
素として、シクロヘキサン、メチルシクロヘキサン、シ
クロヘプタン等を挙げることができる。ハロゲン化炭化
水素として、四塩化炭素、ジクロロエタン、トリクロロ
エタン等を挙げることができる。高級アルコールとし
て、オクタノール、シクロヘキサノール等を挙げること
ができる。ケトン類として、メチルエチルケトン、メチ
ルプロピルケトン等を挙げることができる。エーテル類
として、ジプロピルエーテル、ジブチルエーテル等を挙
げることができる。また、エステル類としては、酢酸エ
チル、酢酸イソプロピル、酢酸イソブチル、酢酸イソペ
ンチル、プロピオン酸ブチル等を挙げることができる。
Examples of the lower alcohol include methanol, ethanol, propyl alcohol, isopropyl alcohol, butyl alcohol, isobutyl alcohol, tertiary butyl alcohol, ethylene glycol, propylene glycol and the like. As the polyhydric alcohol derivative, those capable of dissolving the compound of the general formula [I] or [II] are preferable, and methyl cellosolve, ethyl cellosolve, butyl cellosolve, tertiary butyl cellosolve and the like can be mentioned. Examples of aromatic hydrocarbons include benzene, toluene, xylene, ethylbenzene and the like. Examples of the aliphatic hydrocarbon include hexane, heptane, octane and the like. Examples of the alicyclic hydrocarbon include cyclohexane, methylcyclohexane, cycloheptane and the like. Examples of the halogenated hydrocarbon include carbon tetrachloride, dichloroethane, trichloroethane and the like. Examples of higher alcohols include octanol and cyclohexanol. Examples of ketones include methyl ethyl ketone and methyl propyl ketone. Examples of ethers include dipropyl ether and dibutyl ether. Examples of the esters include ethyl acetate, isopropyl acetate, isobutyl acetate, isopentyl acetate, butyl propionate and the like.

縮合によって生成する水を系外に除去する方法とし
て、例えば、水を含む三成分系で共沸組成を有する溶媒
を用いて還流条件下に縮合させ、溜った還流分の中で分
液してくる水槽部分又は水を含む部分を系外に除去する
か、水を含む留分、即ち反応液組成よりも水の濃縮され
た状態での留分を系外に除去する等の方法を採用するこ
とができる。なお、一般式[I]又は[II]の化合物
は、フタルアルデヒドと塩基性触媒とを含む溶液の還流
下に、徐々に滴下することが好ましい。
As a method for removing the water generated by the condensation out of the system, for example, a solvent having an azeotropic composition in a ternary system containing water is condensed under reflux conditions, and liquid is separated in the collected reflux fraction. The water tank part or the part containing water is removed to the outside of the system, or a fraction containing water, that is, a fraction in a state where water is more concentrated than the composition of the reaction solution is removed to the outside of the system. be able to. The compound of the general formula [I] or [II] is preferably gradually added dropwise under reflux of a solution containing phthalaldehyde and a basic catalyst.

本発明において、一般式[I]又は[II]の化合物に
対するフタルアルデヒドの使用量は、1.0〜1.5倍モルで
十分である。
In the present invention, the amount of phthalaldehyde used is 1.0 to 1.5 times the mole of the compound of the general formula [I] or [II].

〔実施例〕〔Example〕

以下、本発明の実施例を比較例と対比させて説明する
が、本発明はこれらに限定されるものではない。
Hereinafter, examples of the present invention will be described in comparison with comparative examples, but the present invention is not limited to these examples.

〈実施例1〉 γ−ピコリン46.6g(0.50モル)をイソプロピルアル
コール80gとベンゼン60gとの混合溶楳に加え、この溶液
中に、撹拌下でジメチル硫酸63g(0.50モル)を1時間
で滴下し、さらに反応液を常温で1時間撹拌し、これを
A液とした。
<Example 1> 46.6 g (0.50 mol) of γ-picoline was added to a mixed melt of 80 g of isopropyl alcohol and 60 g of benzene, and 63 g (0.50 mol) of dimethylsulfate was added dropwise to this solution under stirring for 1 hour. The reaction solution was further stirred at room temperature for 1 hour, and this was designated as solution A.

次に、還流冷却器とその下部に還流液体の分液部及び
留出用コックが付いた任意の還流分を留出できる装置を
備えたフラスコに、テレフタルアルデヒド100.6g(0.75
モル)とピペリジン8.5g(0.1モル)とを、イソプロピ
ルアルコール80gとベンゼン110gとの混合溶媒に溶解し
た。この溶液を加熱撹拌し、還流条件下に前記A液を3
時間で滴下した。
Next, 100.6 g (0.75 g) of terephthalaldehyde was placed in a flask equipped with a reflux condenser and a device capable of distilling any of the reflux liquid having a liquid separating part and a distilling cock at the bottom thereof.
Mol) and 8.5 g (0.1 mol) of piperidine were dissolved in a mixed solvent of 80 g of isopropyl alcohol and 110 g of benzene. This solution is heated and stirred, and the solution A is mixed under reflux conditions.
Dropped over time.

滴下直後に黄色結晶が析出し、還流部分に反応の進行
に従って水層が下層として分離してきたので、該水層を
留出用コックで徐々に系外に除去した。滴下終了後、さ
らに5時間還流を続け、その間に分離してくる水層を前
記と同様に徐々に除去した。
Immediately after the dropping, yellow crystals were deposited, and an aqueous layer was separated as a lower layer in the refluxed portion as the reaction progressed. Therefore, the aqueous layer was gradually removed from the system with a distillation cock. After the dropwise addition was completed, the reflux was continued for another 5 hours, and the aqueous layer separated during that period was gradually removed in the same manner as above.

冷却後、水200gを加えると、過剰のテレフタルアルデ
ヒド及び着色成分を含む上層(オイル層)と主生成物及
び副生成物であるジオレフィン型化合物を含む下層(水
層)との2層に分離し、この下層をベンゼンで数回洗浄
した。
After cooling, add 200 g of water to separate into two layers, an upper layer (oil layer) containing excess terephthalaldehyde and coloring components, and a lower layer (water layer) containing diolefin type compounds, which are main products and by-products. Then, this lower layer was washed several times with benzene.

前記下層の溶液を濾別して、副生成物ジオレフィン型
化合物の結晶を分離し(収量5g、収率3.7%)、スチリ
ルピリジニウム塩の溶解している濾液を得た。該濾液に
アセトンを加えて結晶を析出させ、主生成物N−メチル
−4−(p−ホルミルスチリル)ピリジニウムメトサル
フェートの黄色結晶を得た(収量148g、収率88.3%)。
The solution of the lower layer was separated by filtration to separate the crystals of the by-product diolefin type compound (yield 5 g, 3.7% yield) to obtain a filtrate in which a styrylpyridinium salt was dissolved. Acetone was added to the filtrate to precipitate crystals, and yellow crystals of the main product N-methyl-4- (p-formylstyryl) pyridinium methosulfate were obtained (amount 148 g, yield 88.3%).

〈実施例2〉 ジメチル硫酸の代りにp−トルエンスルホン酸メチル
を用い、イソプロパノールの代りにエタノールを用いた
以外は実施例1と同様の工程で処理した。
<Example 2> The same process as in Example 1 was carried out except that methyl p-toluenesulfonate was used in place of dimethyl sulfate and ethanol was used in place of isopropanol.

主生成物N−メチル−4−(p−ホルミルスチリル)
ピリジニウムp−トルエンスルホン酸塩は収率86.0%、
副生成物は収率5.0%であった。
Main product N-methyl-4- (p-formylstyryl)
The yield of pyridinium p-toluenesulfonate is 86.0%,
The yield of by-products was 5.0%.

〈実施例3〉 γ−ピコリンの代りに4−メチルキノリンを用い、ベ
ンゼンの代りにシクロヘキサンを用いた以外は実施例1
と同様の工程で処理した。
<Example 3> Example 1 except that 4-methylquinoline was used in place of γ-picoline, and cyclohexane was used in place of benzene.
The same process was carried out.

主生成物N−メチル−4−(p−ホルミルスチリル)
キノリニウムメトサルフェートは収率87.5%、副生成物
は収率4.6%であった。
Main product N-methyl-4- (p-formylstyryl)
The yield of quinolinium methosulfate was 87.5% and the yield of by-products was 4.6%.

〈実施例4〉 γ−ピコリンの代りにα−ピコリンを用い、イソプロ
パノール及びベンゼンの代りにそれぞれn−プロパノー
ル及びシクロヘキサンを用いた以外は実施例1と同様の
工程で処理した。
<Example 4> A process similar to that of Example 1 was carried out except that α-picoline was used in place of γ-picoline, and n-propanol and cyclohexane were used in place of isopropanol and benzene, respectively.

主生成物N−メチル−2−(p−ホルミルスチリル)
ピリジニウムメトサルフェートは収率85.1%、副生成物
は収率5.8%であった。
Main product N-methyl-2- (p-formylstyryl)
The yield of pyridinium methosulfate was 85.1% and the yield of by-products was 5.8%.

〈比較例1〉 還流冷却器を備えたフラスコを用い、生成する水の除
去を行なわずに単なる還流条件下に縮合させた以外は実
施例1と同様の工程で処理した。
<Comparative Example 1> A treatment was performed in the same manner as in Example 1 except that a flask equipped with a reflux condenser was used and condensation was performed under the simple reflux condition without removing the produced water.

主生成物N−メチル−4−(p−ホルミルスチリル)
ピリジニウムメトサルフェートは収率70.5%、副生成物
は収率14.9%であった。
Main product N-methyl-4- (p-formylstyryl)
The yield of pyridinium methosulfate was 70.5% and the yield of by-products was 14.9%.

〔発明の効果〕〔The invention's effect〕

以上のように、本発明に係る感光性化合物の製造方法
によれば、ホルミルスチリルピリジニウム塩又はホルミ
ルスチリルキノリニウム塩からなる感光性化合物を高収
率で容易に製造することができる。
As described above, according to the method for producing a photosensitive compound of the present invention, a photosensitive compound comprising a formylstyrylpyridinium salt or a formylstyrylquinolinium salt can be easily produced in high yield.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭59−193892(JP,A) 特開 昭59−199672(JP,A) 特開 平4−112871(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-59-193892 (JP, A) JP-A-59-199672 (JP, A) JP-A-4-112871 (JP, A)

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】一般式[I]又は[II] (式中、R1は水素原子、アルキル基又はアラルキル基を
示し、これらはヒドロキシル基、カルバモイル基、エー
テル結合、不飽和結合を含んでもよく、R2は水素原子又
は低級アルキル基を示し、X-は陰イオンを示す) で表される化合物とフタルアルデヒドとを反応溶媒中に
おいて塩基性触媒の存在下に縮合させて、一般式[II
I] (式中、Aは 一般式[IV]又は[V] で表される基を示し、一般式[IV]又は[V]中のR1
R2及びX-はそれぞれ前記と同義である) で表される感光性化合物を製造するにあたり、反応溶媒
として一般式[I]又は[II]で表される化合物及びフ
タルアルデヒドを溶解するが一般式[III]で表される
感光性化合物を溶解しないものを用いる方法において、 縮合によって生成する水を逐次系外に除去することを特
徴とする一般式[III]で表される感光性化合物の製造
方法。
1. A general formula [I] or [II] (In the formula, R 1 represents a hydrogen atom, an alkyl group or an aralkyl group, and these may include a hydroxyl group, a carbamoyl group, an ether bond, or an unsaturated bond, and R 2 represents a hydrogen atom or a lower alkyl group, X - it is condensed in the presence of a basic catalyst in a reaction solvent and a compound with phthalic aldehyde represented by represents an anion), the general formula [II
I] (In the formula, A is a general formula [IV] or [V] R 1 in the general formula [IV] or [V],
R 2 and X each have the same meaning as described above.) In producing the photosensitive compound represented by the formula (I), the compound represented by the general formula [I] or [II] and phthalaldehyde are generally dissolved as a reaction solvent. In a method using a compound which does not dissolve the photosensitive compound represented by the formula [III], the water generated by condensation is sequentially removed out of the system to obtain a photosensitive compound represented by the general formula [III] Production method.
【請求項2】請求項1記載の一般式[I]又は[II]で
表される化合物とフタルアルデヒドとを塩基性触媒の存
在下に縮合させて、請求項1記載の一般式[III]で表
わされる感光性化合物を製造するにあたり、反応溶媒と
して一般式[I]又は[II]で表される化合物及びフタ
ルアルデヒドを溶解するが一般式[III]で表される感
光性化合物を溶解しないものを用いる方法において、 縮合終了後に一般式[III]で表される感光性化合物を
水に溶解して分離精製することを特徴とする一般式[II
I]で表される感光性化合物の製造方法。
2. A compound represented by the general formula [I] or [II] of claim 1 and phthalaldehyde are condensed in the presence of a basic catalyst to give a compound of the general formula [III] of claim 1. In producing the photosensitive compound represented by, the compound represented by the general formula [I] or [II] and phthalaldehyde are dissolved as a reaction solvent, but the photosensitive compound represented by the general formula [III] is not dissolved. In the method using the compound of the general formula [II], the photosensitive compound represented by the general formula [III] is dissolved in water and separated and purified after completion of the condensation.
I] A method for producing a photosensitive compound represented by the formula [I].
【請求項3】縮合によって生成する水を逐次系外に除去
するものである、請求項2記載の感光性化合物の製造方
法。
3. The method for producing a photosensitive compound according to claim 2, wherein water produced by condensation is successively removed from the system.
JP2158274A 1990-06-17 1990-06-17 Method for producing photosensitive compound Expired - Lifetime JP2562983B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2158274A JP2562983B2 (en) 1990-06-17 1990-06-17 Method for producing photosensitive compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2158274A JP2562983B2 (en) 1990-06-17 1990-06-17 Method for producing photosensitive compound

Publications (2)

Publication Number Publication Date
JPH0449278A JPH0449278A (en) 1992-02-18
JP2562983B2 true JP2562983B2 (en) 1996-12-11

Family

ID=15668024

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2562983B2 (en)

Also Published As

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