JP2583574B2 - Mold for molding glass optical elements - Google Patents
Mold for molding glass optical elementsInfo
- Publication number
- JP2583574B2 JP2583574B2 JP63137152A JP13715288A JP2583574B2 JP 2583574 B2 JP2583574 B2 JP 2583574B2 JP 63137152 A JP63137152 A JP 63137152A JP 13715288 A JP13715288 A JP 13715288A JP 2583574 B2 JP2583574 B2 JP 2583574B2
- Authority
- JP
- Japan
- Prior art keywords
- optical element
- molding die
- intermediate layer
- molding
- mold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000465 moulding Methods 0.000 title claims description 36
- 230000003287 optical effect Effects 0.000 title claims description 20
- 239000011521 glass Substances 0.000 title claims description 13
- 239000000463 material Substances 0.000 claims description 9
- 238000005524 ceramic coating Methods 0.000 claims description 3
- 238000003825 pressing Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 39
- 239000000758 substrate Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 12
- 150000004767 nitrides Chemical class 0.000 description 7
- 239000011247 coating layer Substances 0.000 description 6
- 238000001552 radio frequency sputter deposition Methods 0.000 description 5
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 238000001659 ion-beam spectroscopy Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000011195 cermet Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000001420 photoelectron spectroscopy Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- -1 oxides Chemical class 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/22—Non-oxide ceramics
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/34—Intermediate layers, e.g. graded zone of base/top material of ceramic or cermet material, e.g. diamond-like carbon
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ガラス光学素子の成形用型に関する。Description: TECHNICAL FIELD The present invention relates to a mold for molding a glass optical element.
近年、レンズ，プリズム，フィルタ等の光学素子の製
造方法として、研削，研磨等を行わずに、高い面精度の
一対の成形用型間に加熱，軟化した光学素子のガラス素
材を挿入配置し、これをプレスするだけで光学素子を得
るプレス成形が行われている。In recent years, as a method of manufacturing an optical element such as a lens, a prism, and a filter, a glass material of a heated and softened optical element is inserted and arranged between a pair of molding dies with high surface accuracy without performing grinding and polishing. Press molding for obtaining an optical element only by pressing this is performed.
従来、上記プレス成形で用いられる成形用型として
は、例えば特公昭62−28093号公報に開示されるような
ものが知られている。この成形用型は、金属とセラミッ
クスとからなる複合材を型基材とし、この型基材に窒化
物，炭化物，酸化物および金属の中から選ばれた一種以
上の中間層を介して、貴金属層を形成したものである。Conventionally, as a molding die used in the press molding, for example, a molding die disclosed in Japanese Patent Publication No. 62-28093 is known. This molding die uses a composite material composed of a metal and a ceramic as a base material, and the noble metal is formed on the base material through one or more intermediate layers selected from nitrides, carbides, oxides, and metals. A layer is formed.
しかし、上記従来の成形用型では、中間層として窒化
物，炭化物，酸化物等のセラミックス層を形成した場
合、サーメットや合金からなる成形用型基材との密着性
が極めて悪く、剥離を生じてしまう。また、中間層とし
て合金膜を用いた場合、成形用型基材との密着性は良好
なものの、その成分の拡散が大きく、光学的性能の優れ
た光学素子を得ることができないという問題があった。However, in the above conventional molding die, when a ceramic layer such as a nitride, carbide, or oxide is formed as an intermediate layer, adhesion to a molding die substrate made of a cermet or an alloy is extremely poor, and peeling occurs. Would. Further, when an alloy film is used as the intermediate layer, there is a problem that although the adhesion to the molding die substrate is good, the diffusion of the components is large and an optical element having excellent optical performance cannot be obtained. Was.
本発明は、かかる従来の問題点に鑑みてなされたもの
で、低コストにして高品質な光学素子を得ることができ
るガラス光学素子の成形用型を提供することを目的とす
る。The present invention has been made in view of such a conventional problem, and an object of the present invention is to provide a mold for forming a glass optical element that can obtain a high-quality optical element at low cost.
上記目的を達成するために、本発明は、光学素子のガ
ラス素材を加熱，軟化させ、これを一対の成形用型間に
挿入配置し、プレスすることによって最終形状の光学素
子を得る際に用いられるガラス光学素子の成形用型にお
いて、成形用型基材の少なくとも一部に中間層となる硼
化物層を介してセラミックスコーティングを施した。In order to achieve the above object, the present invention provides a method of heating and softening a glass material of an optical element, inserting the glass material between a pair of molding dies, and pressing the glass material to obtain an optical element having a final shape. In the molding die for a glass optical element to be obtained, a ceramic coating was applied to at least a part of the molding die substrate via a boride layer serving as an intermediate layer.
本発明において用いられる硼化物としては、TiB2,CrB
2,ZrB2,TaB2,WB,HfB2等が最適であり、B2Cもこれらとほ
ぼ同様の効果が得られるものの、成形用型基材との密着
性が若干劣る。As the boride used in the present invention, TiB 2 , CrB
2 , ZrB 2 , TaB 2 , WB, HfB 2 and the like are optimal, and B 2 C has almost the same effects as these, but the adhesion to the molding die substrate is slightly inferior.
また、硼化物層の成形手段としては、RFスパッタ法，
イオンビームスパッタ法,CVC法が比較的容易であり、イ
オンプレーティングの各法およびIVD法でも適用でき
る。さらに、RFスパッタ法およびイオンビームスパッタ
法においては、硼化物層を形成した後、窒化物層や炭化
物層を形成する際に、窒素系ガスまたは炭化水素系ガス
を徐々に導入することにより、硼化物層と窒化物層また
は炭化物層との界面を混合化し、両層間の密着性を飛躍
的に高めることができる。この場合、最表層は、BN−MN
x（M:金属元素）である複合窒化物（または炭化物）と
なる。The boride layer may be formed by RF sputtering,
The ion beam sputtering method and the CVC method are relatively easy, and can be applied to each of the ion plating methods and the IVD method. Further, in the RF sputtering method and the ion beam sputtering method, after forming a boride layer, when a nitride layer or a carbide layer is formed, a nitrogen-based gas or a hydrocarbon-based gas is gradually introduced, so that the boron By mixing the interface between the nitride layer and the nitride layer or the carbide layer, the adhesion between the two layers can be dramatically improved. In this case, the outermost layer is BN-MN
It becomes a composite nitride (or carbide) which is x (M: metal element).
上記構成のガラス光学素子の成形用型においては、硼
化物を中間層に設けているので、特にサーメットや合金
等からなる成形用型基材との密着性が良好で、しかもそ
の硼化物層の上に形成した他のセラミックス層との密着
性も良好であり、高温での使用に際しても充分な耐剥離
性を有している。また、硼化物からなる中間層は、高温
（約700℃以下）領域でも安定しており、他の層との原
子拡散も合金に比して極めて小さい。In the molding die for a glass optical element having the above-described configuration, since the boride is provided in the intermediate layer, the adhesion with the molding die substrate made of cermet or alloy is particularly good, and the boride layer is It has good adhesion to other ceramic layers formed thereon, and has sufficient peeling resistance even when used at high temperatures. Further, the intermediate layer made of boride is stable even in a high temperature (approximately 700 ° C. or lower) region, and the atomic diffusion with other layers is extremely small as compared with the alloy.
（第１実施例） WC−17Ni−5Crサーメットにより成形用型基材を製作
し、特に成形面をダイヤモンドペースト等を用いて鏡面
研磨（Rmax≦0.02μｍ）とした。その後、RFスパッタ法
により、厚さ2000ÅのCrB2からなる硼化物中間層を形成
するとともに、その中間層の上に厚さ4000ÅのCrN−BN
からなる離型用被覆層を形成した。(First Example) A molding die substrate was manufactured using WC-17Ni-5Cr cermet, and the molding surface was particularly mirror-polished (Rmax ≦ 0.02 μm) using a diamond paste or the like. Then, by an RF sputtering method, to form a boride intermediate layer composed of CrB 2 thick 2000 Å, the thickness of 4000Å on top of the intermediate layer CrN-BN
Was formed.
（第２実施例） 第１実施例と同様にして、成形用型基材を製作した。
その後、RFスパッタ法により、厚さ2000ÅのTiB2からな
る硼化物中間層を形成するとともに、その中間層の上に
厚さ4000ÅのTiN−BNからなる離型用被覆層を形成し
た。(Second Example) A molding die substrate was manufactured in the same manner as in the first example.
Then, by an RF sputtering method, to form a boride intermediate layer made of TiB 2 having a thickness of 2000 Å, to form a mold release coating layer made of TiN-BN having a thickness of 4000Å on top of the intermediate layer.
（第３実施例） 第１実施例と同様にして、成形用型基材を製作した。
その後、イオンビームスパッタ法により、厚さ2000Åの
TaB2からなる硼化物中間層を形成するとともに、その中
間層の上に厚さ3000ÅのTaN−BNからなる離型用被覆層
を形成した。(Third Example) A molding die substrate was manufactured in the same manner as in the first example.
After that, by ion beam sputtering method,
To form a boride intermediate layer made of TaB 2, to form a mold release coating layer made of TaN-BN having a thickness of 3000Å on top of the intermediate layer.
（第４実施例） 第１実施例と同様にして、成形用型基材を製作した。
その後、イオンビームスパッタ法により、厚さ2000Åの
HfB2からなる硼化物中間層を形成するとともに、その中
間層の上に厚さ3500ÅのHfN−BNからなる離型用被覆層
を形成した。(Fourth Example) A molding die substrate was manufactured in the same manner as in the first example.
After that, by ion beam sputtering method,
To form a boride intermediate layer composed of HfB 2, to form a mold release coating layer made of HfN-BN having a thickness of 3500Å on top of the intermediate layer.
（第５実施例） 第１実施例と同様にして、成形用型基材を製作した。
その後、CVD法により、厚さ2000ÅのTiB2からなる硼化
物中間層を形成するとともに、その中間層の上に厚さ30
00ÅのcBNからなる離型用被覆層を形成した。(Fifth Example) A molding die substrate was manufactured in the same manner as in the first example.
Thereafter, a boride intermediate layer made of TiB 2 having a thickness of 2000 mm is formed by CVD, and a thickness of 30 nm is formed on the intermediate layer.
A release coating layer made of 00 ° cBN was formed.
（第６実施例） 第１実施例と同様にして、成形用型基材を製作した。
その後、RFスパッタ法により、厚さ1500ÅのCrB2からな
る硼化物中間層を形成するとともに、IVD法により、そ
の中間層の上に厚さ3000ÅのBNからなる離型用被覆層を
形成した。Sixth Example A molding die substrate was manufactured in the same manner as in the first example.
Thereafter, a boride intermediate layer made of CrB 2 having a thickness of 1500 ° was formed by RF sputtering, and a release coating layer made of BN having a thickness of 3000 ° was formed on the intermediate layer by an IVD method.
（第７実施例） 第１実施例と同様にして、成形用型基材を製作した。
その後、プラズマCVD法により、厚さ1500ÅのTiB2から
なる硼化物中間層を形成するとともに、その中間層の上
に厚さ3500ÅのVCからなる離型用被覆層を形成した。(Seventh Example) A molding die substrate was manufactured in the same manner as in the first example.
Thereafter, a boride intermediate layer made of TiB 2 having a thickness of 1500 ° was formed by a plasma CVD method, and a release coating layer made of VC having a thickness of 3500 ° was formed on the intermediate layer.
以上のようにして得られた各実施例の成形用型を用い
て、光学ガラスBaSFおよびSK種を素材とし、各500ショ
ット、合計1000ショットの連続成形を行った。その後、
成形用型の成形面に対し、XPS（光電子分光）その他の
物理的分析手法および光学顕微鏡観察により、成形用型
基材に含まれるバインダー金属成分（NiおよびCr）の膜
中（最表面より約3000Åの深さ）での拡散状態と、表層
セラミック層の剥離状態とを調べた。その結果を次表に
示す。Using the molding dies of the examples obtained as described above, optical glass BaSF and SK were used as materials, and 500 shots each were continuously formed for a total of 1000 shots. afterwards,
XPS (photoelectron spectroscopy) and other physical analysis techniques and optical microscope observation were performed on the molding surface of the molding die, and the film of the binder metal component (Ni and Cr) contained in the molding die substrate (about The diffusion state at a depth of 3000 mm) and the peeling state of the surface ceramic layer were examined. The results are shown in the following table.
上記表から判るように、各実施例で得られた成形用型
は、いずれも良好な結果を示した。 As can be seen from the above table, all of the molding dies obtained in the examples showed good results.
なお、従来のように、中間層として窒化物（SiNx）、
炭化物（WCx）を用いた場合、その中間層から剥離等の
現象を生じてしまった。In addition, nitride (SiNx),
When carbide (WCx) was used, phenomena such as peeling occurred from the intermediate layer.
以上のように、本発明のガラス光学素子の成形用型に
よれば、成形用型基材の少なくとも一部に中間層となる
硼化物層を介してセラミックスコーティングを施すこと
としたので、膜剥離等を生じることがなく、耐久性が向
上し、型交換，型メンテナンス等の回数を著しく減少で
き、低コストにして高品質な光学素子を得ることができ
る。As described above, according to the molding die for a glass optical element of the present invention, since the ceramic coating is applied to at least a part of the molding die substrate via the boride layer serving as the intermediate layer, the film is separated. The durability is improved, the number of times of mold replacement, mold maintenance, and the like can be significantly reduced, and a high-quality optical element can be obtained at low cost.
Claims (1)
これを一対の成形用型間に挿入配置し、プレスすること
によって最終形状の光学素子を得る際に用いられるガラ
ス光学素子の成形用型において、成形用型基材の少なく
とも一部に中間層となる硼化物層を介してセラミックス
コーティングを施したことを特徴とするガラス光学素子
の成形用型。1. A glass material for an optical element is heated and softened,
This is inserted and arranged between a pair of molding dies, and in a molding mold of a glass optical element used when obtaining an optical element of a final shape by pressing, an intermediate layer and at least a part of a molding mold base material. A molding die for a glass optical element, wherein a ceramic coating is applied via a boride layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63137152A JP2583574B2 (en) | 1988-06-03 | 1988-06-03 | Mold for molding glass optical elements |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63137152A JP2583574B2 (en) | 1988-06-03 | 1988-06-03 | Mold for molding glass optical elements |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01305828A JPH01305828A (en) | 1989-12-11 |
| JP2583574B2 true JP2583574B2 (en) | 1997-02-19 |
Family
ID=15192037
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63137152A Expired - Fee Related JP2583574B2 (en) | 1988-06-03 | 1988-06-03 | Mold for molding glass optical elements |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2583574B2 (en) |
-
1988
- 1988-06-03 JP JP63137152A patent/JP2583574B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01305828A (en) | 1989-12-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |