JP2641002B2 - Diphenyl sulfone compound - Google Patents
Diphenyl sulfone compoundInfo
- Publication number
- JP2641002B2 JP2641002B2 JP4000715A JP71592A JP2641002B2 JP 2641002 B2 JP2641002 B2 JP 2641002B2 JP 4000715 A JP4000715 A JP 4000715A JP 71592 A JP71592 A JP 71592A JP 2641002 B2 JP2641002 B2 JP 2641002B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- normal
- compound
- added
- phenyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- -1 Diphenyl sulfone compound Chemical class 0.000 title description 11
- KZTYYGOKRVBIMI-UHFFFAOYSA-N S-phenyl benzenesulfonothioate Natural products C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 title 1
- 150000001875 compounds Chemical class 0.000 claims description 25
- 125000003118 aryl group Chemical group 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 125000004104 aryloxy group Chemical group 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- ILQWYZZOCYARGS-UHFFFAOYSA-N 4-(4-hydroxy-3-phenylphenyl)sulfonyl-2-phenylphenol Chemical compound OC1=CC=C(S(=O)(=O)C=2C=C(C(O)=CC=2)C=2C=CC=CC=2)C=C1C1=CC=CC=C1 ILQWYZZOCYARGS-UHFFFAOYSA-N 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 6
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 4
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229910000027 potassium carbonate Inorganic materials 0.000 description 3
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 238000010898 silica gel chromatography Methods 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 150000001721 carbon Chemical class 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 239000005457 ice water Substances 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 235000010292 orthophenyl phenol Nutrition 0.000 description 2
- 239000004306 orthophenyl phenol Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- MNDIARAMWBIKFW-UHFFFAOYSA-N 1-bromohexane Chemical compound CCCCCCBr MNDIARAMWBIKFW-UHFFFAOYSA-N 0.000 description 1
- YZWKKMVJZFACSU-UHFFFAOYSA-N 1-bromopentane Chemical compound CCCCCBr YZWKKMVJZFACSU-UHFFFAOYSA-N 0.000 description 1
- CYNYIHKIEHGYOZ-UHFFFAOYSA-N 1-bromopropane Chemical compound CCCBr CYNYIHKIEHGYOZ-UHFFFAOYSA-N 0.000 description 1
- NAMYKGVDVNBCFQ-UHFFFAOYSA-N 2-bromopropane Chemical compound CC(C)Br NAMYKGVDVNBCFQ-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 125000002102 aryl alkyloxo group Chemical group 0.000 description 1
- 125000005160 aryl oxy alkyl group Chemical group 0.000 description 1
- 125000000051 benzyloxy group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])O* 0.000 description 1
- RDHPKYGYEGBMSE-UHFFFAOYSA-N bromoethane Chemical compound CCBr RDHPKYGYEGBMSE-UHFFFAOYSA-N 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- QGJOPFRUJISHPQ-NJFSPNSNSA-N carbon disulfide-14c Chemical compound S=[14C]=S QGJOPFRUJISHPQ-NJFSPNSNSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000002933 cyclohexyloxy group Chemical group C1(CCCCC1)O* 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000008269 hand cream Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000005186 naphthyloxy group Chemical group C1(=CC=CC2=CC=CC=C12)O* 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 239000003586 protic polar solvent Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Color Printing (AREA)
Description
【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION
【0001】[0001]
【産業上の利用分野】本発明は、電子供与性無色染料と
電子受容性化合物を使用した記録材料、例えば感圧記録
材料、感熱記録材料用の電子受容性化合物として有用な
3,3′−ジフェニル−4−ヒドロキシ−4′−置換ヒ
ドロキシジフェニルスルホン化合物に関する。BACKGROUND OF THE INVENTION The present invention relates to a recording material using an electron-donating colorless dye and an electron-accepting compound, for example, 3,3'- useful as an electron-accepting compound for pressure-sensitive recording materials and heat-sensitive recording materials. It relates to a diphenyl-4-hydroxy-4'-substituted hydroxydiphenylsulfone compound.
【0002】[0002]
【従来の技術】感圧記録材料、感熱記録材料用の電子受
容性化合物としてフェノール性化合物は各種知られてい
るが、何れも発色濃度、発色感度、未印字部保存性、印
字部保存性(耐候性、耐薬品性等)等に於いて幾つかの
欠点を有していた。例えば、特公平3−54655号に
開示されている4−イソプロポキシ−4′−ヒドロキシ
ジフェニルスルホンを感熱記録紙に用いた場合、高い発
色濃度、感度を示すが、マジック、蛍光ペン等で筆記す
る事により未印字部が発色したり、印字した画像が消え
てしまう等、耐薬品性が不十分であった。2. Description of the Related Art Various phenolic compounds are known as electron-accepting compounds for pressure-sensitive recording materials and heat-sensitive recording materials. All of them are known as color density, color sensitivity, unprinted area preservability, and printed area preservation ( Weather resistance, chemical resistance, etc.). For example, when 4-isopropoxy-4'-hydroxydiphenylsulfone disclosed in Japanese Patent Publication No. 3-54555 is used for thermal recording paper, it exhibits high color density and sensitivity, but is written with a magic marker, highlighter, or the like. As a result, the unprinted portion was colored or the printed image disappeared, and the chemical resistance was insufficient.
【0003】また特開平2−266981号に開示され
ているビス−(3−フェニル−4−ヒドロキシフェニ
ル)スルホンを感熱記録紙に用ると発色感度が低く、マ
ジック、蛍光ペン等で筆記する事により画像の消色は示
さないが未印字部が発色し、ハンドクリーム等が付着す
ると、たちまち画像が消色する等、発色感度、耐薬品性
が不十分であった。When bis- (3-phenyl-4-hydroxyphenyl) sulfone disclosed in JP-A-2-266981 is used for heat-sensitive recording paper, the color-forming sensitivity is low, and it is difficult to write with a magic pen or a fluorescent pen. Although no decoloration of the image was shown, the unprinted portion was colored, and if hand cream or the like was attached, the image was immediately decolored, and the color sensitivity and chemical resistance were insufficient.
【0004】[0004]
【発明が解決しようとする課題】本発明は、発色濃度、
発色感度、未印字部保存性、印字部保存性(耐候性、耐
薬品性等)等を同時に満足するフェノール性化合物を提
供する事である。DISCLOSURE OF THE INVENTION The present invention provides a color density,
An object of the present invention is to provide a phenolic compound which simultaneously satisfies the color development sensitivity, preservability of an unprinted portion, preservability of a printed portion (weather resistance, chemical resistance, etc.).
【0005】[0005]
【課題を解決するための手段】上記課題は、フェノール
性化合物として、下記一般式(1)で表される、3,
3′−ジフェニル−4−ヒドロキシ−4′−置換ヒドロ
キシジフェニルスルホン化合物により達成された。 一般式(1)The object of the present invention is to provide a phenolic compound represented by the following general formula (1):
Achieved by 3'-diphenyl-4-hydroxy-4'-substituted hydroxydiphenylsulfone compounds. General formula (1)
【0006】[0006]
【化2】 Embedded image
【0007】式中、Rはアルコキシ基、アリール基、ま
たはアリールオキシ基で置換されていてもよいアルキル
基を表す。In the formula, R represents an alkoxy group, an aryl group, or an alkyl group which may be substituted with an aryloxy group.
【0008】Rで表されるアルキル基は直鎖でも分岐で
も、環を形成していてもよく、炭素数1〜25の基が好
ましく、中でも炭素数1〜18の基が好ましい。特に
は、メチル基、エチル基、ノルマルプロピル基、イソプ
ロピル基、ノルマルブチル基、イソブチル基、セカンダ
リーブチル基、ノルマルアミル基、イソアミル基、ノル
マルヘキシル基、シクロヘキシル基、ノルマルヘプチル
基、ノルマルオクチル基、ノルマルノニル基、ノルマル
デシル基、ラウリル基、ステアリル基、が好ましい。The alkyl group represented by R may be linear, branched or form a ring, and is preferably a group having 1 to 25 carbon atoms, more preferably a group having 1 to 18 carbon atoms. Particularly, methyl group, ethyl group, normal propyl group, isopropyl group, normal butyl group, isobutyl group, secondary butyl group, normal amyl group, isoamyl group, normal hexyl group, cyclohexyl group, normal heptyl group, normal octyl group, normal Nonyl, normal decyl, lauryl and stearyl groups are preferred.
【0009】Rで表されるアルキル基に置換していても
よいアルコキシ基としては、直鎖でも分岐でも、環を形
成していてもよく、炭素数1〜10の基が好ましく、中
でも炭素数1〜6の基が好ましい。特には、メトキシ
基、エトキシ基、ノルマルプロポキシ基、イソプロポキ
シ基、ノルマルブトキシ基、イソブトキシ基、セカンダ
リーブトキシ基、ノルマルアミルオキシ基、イソアミル
オキシ基、ノルマルヘキシルオキシ基、シクロヘキシル
オキシ基が好ましい。The alkoxy group which may be substituted on the alkyl group represented by R may be linear, branched or form a ring, and is preferably a group having 1 to 10 carbon atoms. Groups 1-6 are preferred. In particular, a methoxy group, an ethoxy group, a normal propoxy group, an isopropoxy group, a normal butoxy group, an isobutoxy group, a secondary butoxy group, a normal amyloxy group, an isoamyloxy group, a normal hexyloxy group, and a cyclohexyloxy group are preferable.
【0010】Rで表されるアルキル基に置換してもよい
アリール基としては、炭素数6〜14の基が好ましく、
この炭素数とは別に芳香環上に更に置換基を有していて
もよい。アリール基として特には、フェニル基、ナフチ
ル基、アントラセニル基が好ましい。芳香環上に有して
いてもよい置換基としてはアルキル基、アルコキシ基、
アリール基、アリールオキシ基、ハロゲン原子が好まし
く、特には、メチル基、エチル基、ノルマルプロピル
基、イソプロピル基、ノルマルブチル基、イソブチル
基、ノルマルアミル基、イソアミル基、ノルマルヘキシ
ル基、メトキシ基、エトキシ基、ノルマルプロポキシ
基、イソプロポキシ基、ノルマルブトキシ基、イソブト
キシ基、セカンダリーブトキシ基、ノルマルアミルオキ
シ基、イソアミルオキシ基、フェニル基、フェノキシ
基、フッ素原子、塩素原子、臭素原子が好ましい。The aryl group which may be substituted with the alkyl group represented by R is preferably a group having 6 to 14 carbon atoms.
Apart from this carbon number, the aromatic ring may further have a substituent. As the aryl group, a phenyl group, a naphthyl group and an anthracenyl group are particularly preferred. As a substituent which may be present on the aromatic ring, an alkyl group, an alkoxy group,
An aryl group, an aryloxy group, and a halogen atom are preferable, and particularly, a methyl group, an ethyl group, a normal propyl group, an isopropyl group, a normal butyl group, an isobutyl group, a normal amyl group, an isoamyl group, a normal hexyl group, a methoxy group, and an ethoxy group Group, normal propoxy group, isopropoxy group, normal butoxy group, isobutoxy group, secondary butoxy group, normal amyloxy group, isoamyloxy group, phenyl group, phenoxy group, fluorine atom, chlorine atom and bromine atom are preferable.
【0011】Rで表されるアルキル基に置換してもよい
アリールオキシ基としては、炭素数6〜10の基が好ま
しく、この炭素数とは別に芳香環上に更に置換基を有し
ていてもよい。アリールオキシ基として特には、フェニ
ルオキシ基、ナフチルオキシ基が好ましい。芳香環上に
有していてもよい置換基としてはアルキル基、アルコキ
シ基、アラルキルオキシ基、アリール基、アリールオキ
シ基、ハロゲン原子が好ましく、特には、メチル基、エ
チル基、ノルマルプロピル基、イソプロピル基、ノルマ
ルブチル基、イソブチル基、ノルマルアミル基、イソア
ミル基、ノルマルヘキシル基、シクロヘキシル基、メト
キシ基、エトキシ基、ノルマルプロポキシ基、イソプロ
ポキシ基、ノルマルブトキシ基、イソブトキシ基、セカ
ンダリーブトキシ基、ノルマルアミルオキシ基、イソア
ミルオキシ基、フェニル基、クミル基、ベンジルオキシ
基、フェニルオキシ基、フッ素原子、塩素原子、臭素原
子が好ましい。The aryloxy group which may be substituted by the alkyl group represented by R is preferably a group having 6 to 10 carbon atoms. Apart from this carbon number, the aryloxy group may further have a substituent on the aromatic ring. Is also good. As the aryloxy group, a phenyloxy group and a naphthyloxy group are particularly preferred. As the substituent which may be present on the aromatic ring, an alkyl group, an alkoxy group, an aralkyloxy group, an aryl group, an aryloxy group, and a halogen atom are preferable, and in particular, a methyl group, an ethyl group, a normal propyl group, and isopropyl Group, normal butyl group, isobutyl group, normal amyl group, isoamyl group, normal hexyl group, cyclohexyl group, methoxy group, ethoxy group, normal propoxy group, isopropoxy group, normal butoxy group, isobutoxy group, secondary butoxy group, normal amyl Preferred are an oxy group, an isoamyloxy group, a phenyl group, a cumyl group, a benzyloxy group, a phenyloxy group, a fluorine atom, a chlorine atom, and a bromine atom.
【0012】一般式(1)で表される化合物の具体例を
以下に示すが、本発明はこれらに限定されるものではな
い。Specific examples of the compound represented by the general formula (1) are shown below, but the present invention is not limited thereto.
【0013】[0013]
【化3】 Embedded image
【0014】[0014]
【化4】 Embedded image
【0015】[0015]
【化5】 Embedded image
【0016】[0016]
【化6】 Embedded image
【0017】[0017]
【化7】 Embedded image
【0018】[0018]
【化8】 Embedded image
【0019】[0019]
【化9】 Embedded image
【0020】[0020]
【化10】 Embedded image
【0021】[0021]
【化11】 Embedded image
【0022】本発明の化合物は、既知の合成法を参考に
して容易に合成できる。例えば、ビス−(3−フェニル
−4−ヒドロキシフェニル)スルホンを無溶媒或いは、
水、アルコール等のプロトン性溶媒、ジメチルホルムア
ミド、ジメチルアセトアミド、ジメチルスルホキシド等
の非プロトン性溶媒、アセトニトリル、酢酸エチル、ア
セトン、トルエン等の極性溶媒、ヘキサン、ベンゼン、
エーテル等の非極性溶媒、ジクロロメタン、クロロホル
ム等の含ハロゲン溶媒、又はこれらの混合溶媒中(二層
系でもよい)、水酸化ナトリウム、水酸化カリウム、炭
酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭
酸水素カリウム、水酸化マグネシウム、水酸化カルシウ
ム等の結合剤の存在下、添加剤無し、又は四級アンモニ
ウム塩、ハロゲン化アルカリ等の添加剤を加えて、対応
するアルキル基、アラルキル基、アリールオキシアルキ
ル基のハロゲン化物、パラトルエンスルホン酸エステ
ル、硫酸エステル等と0〜150℃で0.5〜24時間
反応させる。次いで、反応混合物を氷水中にあけ、有機
溶剤で分液操作をして抽出するか、再結晶又はシリカゲ
ルカラムクロマトグラフィーにより精製して目的の化合
物を得ることが出来る。The compounds of the present invention can be easily synthesized with reference to known synthetic methods. For example, bis- (3-phenyl-4-hydroxyphenyl) sulfone is used without solvent or
Water, protic solvents such as alcohols, aprotic solvents such as dimethylformamide, dimethylacetamide, dimethylsulfoxide, polar solvents such as acetonitrile, ethyl acetate, acetone, toluene, hexane, benzene,
In a non-polar solvent such as ether, a halogen-containing solvent such as dichloromethane or chloroform, or a mixed solvent thereof (may be a two-layer system), sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, hydrogencarbonate In the presence of a binder such as potassium, magnesium hydroxide or calcium hydroxide, without additives, or with the addition of additives such as quaternary ammonium salts and alkali halides, the corresponding alkyl group, aralkyl group, aryloxyalkyl group Is reacted at 0 to 150 ° C. for 0.5 to 24 hours. Next, the reaction mixture is poured into ice water and subjected to liquid separation operation with an organic solvent for extraction or purification by recrystallization or silica gel column chromatography to obtain the desired compound.
【0023】また別の合成法として例えば、対応する4
−ヒドロキシ−3−フェニルベンゼンスルホニルクロラ
イドのアルキル、アラルキル、アリールオキシアルキル
エーテルとオルトフェニルフェノールとを塩化アルミ、
塩化鉄、塩化亜鉛、硫酸等の結合剤の存在下、無溶媒或
いはジクロロメタン、ジクロロエタン、ニトロベンゼ
ン、二硫化炭素等の溶媒中、−10〜150℃の反応温
度で0.5から24時間反応させ、通常は氷冷した塩酸
で処理し、必要なら再結晶、シリカゲルカラムクロマト
グラフィー等により精製しても目的の化合物を得ること
ができる。As another synthesis method, for example, the corresponding 4
Alkyl-aralkyl, aralkyl, aryloxyalkyl ether of -hydroxy-3-phenylbenzenesulfonyl chloride and orthophenylphenol with aluminum chloride,
In the presence of a binder such as iron chloride, zinc chloride, and sulfuric acid, in a solvent such as no solvent or in a solvent such as dichloromethane, dichloroethane, nitrobenzene, and carbon disulfide, and reacted at a reaction temperature of -10 to 150 ° C for 0.5 to 24 hours, Usually, the target compound can be obtained by treating with ice-cooled hydrochloric acid and, if necessary, purifying by recrystallization, silica gel column chromatography or the like.
【0024】[0024]
実施例1 具体例(1)の化合物の合成 ジメチルアセトアミド20ml中にビス−(3−フェニ
ル−4−ヒドロキシフェニル)スルホン10g、炭酸カ
リウム4.28g、沃化メチル4.4gを加え40℃で
6時間攪拌した。冷却後、反応混合物を氷水中にあけ食
塩と酢酸エチルを加え一時間攪拌した。酢酸エチル層を
濃縮し、シリカゲルカラムクロマトグラフィーにより精
製して目的の化合物を得た。融点133〜136℃。Example 1 Synthesis of Compound of Specific Example (1) In 20 ml of dimethylacetamide, 10 g of bis- (3-phenyl-4-hydroxyphenyl) sulfone, 4.28 g of potassium carbonate, and 4.4 g of methyl iodide were added, and the mixture was added at 40 ° C. for 6 hours. Stirred for hours. After cooling, the reaction mixture was poured into ice water, salt and ethyl acetate were added, and the mixture was stirred for 1 hour. The ethyl acetate layer was concentrated and purified by silica gel column chromatography to obtain the target compound. 133-136 ° C.
【0025】実施例2 具体例(2)の化合物の合成 メタノール40ml中にビス−(3−フェニル−4−ヒ
ドロキシフェニル)スルホン10g、エチルブロマイド
3.38g、48%NaOHaq2.75gを加え40
℃で6時間攪拌した。冷却後、実施例1と同様に処理し
て目的の化合物を得た。融点169〜172℃。Example 2 Synthesis of Compound of Specific Example (2) 10 g of bis- (3-phenyl-4-hydroxyphenyl) sulfone, 3.38 g of ethyl bromide, and 2.75 g of 48% NaOHaq were added to 40 ml of methanol, and the mixture was added with 40 g of methanol.
Stirred at C for 6 hours. After cooling, the mixture was treated in the same manner as in Example 1 to obtain the desired compound. Melting point 169-172 [deg.] C.
【0026】実施例3 具体例(3)の化合物の合成 水171ml中にビス−(3−フェニル−4−ヒドロキ
シフェニル)スルホン30g、ノルマルプロピルブロマ
イド10.5gを加え50℃で攪拌した。次いで20重
量%炭酸ナトリウム水溶液84.7gを50℃で2時間
かけて滴下した後、70℃で3時間攪拌した。冷却後、
塩酸でpH7.5にし、濾過、水洗、乾燥して粗結晶を
得た。イソプロピルアルコールより再結晶して目的の化
合物を得た。融点172〜175℃。Example 3 Synthesis of Compound of Specific Example (3) 30 g of bis- (3-phenyl-4-hydroxyphenyl) sulfone and 10.5 g of normal propyl bromide were added to 171 ml of water and stirred at 50 ° C. Next, 84.7 g of a 20% by weight aqueous sodium carbonate solution was added dropwise at 50 ° C. over 2 hours, followed by stirring at 70 ° C. for 3 hours. After cooling,
The pH was adjusted to 7.5 with hydrochloric acid, filtered, washed with water and dried to obtain crude crystals. Recrystallization from isopropyl alcohol gave the desired compound. Melting point 172-175 [deg.] C.
【0027】実施例4 具体例(4)の化合物の合成 ビス−(3−フェニル−4−ヒドロキシフェニル)スル
ホン48.2g、イソプロピルブロマイド18.5g及
び炭酸カリウム22.2gをジメチルホルムアミド20
0ml中に加え100〜120℃の温度で4時間攪拌し
た。ジメチルホルムアミドを減圧下に留去し、残留物に
クロロホルム200mlと水200を加えて溶解し、さ
らに少量の硫酸を加えて水層のpHを5.0として分液
した。クロロホルム層を100mlの水で洗浄したの
ち、クロロホルムを留去し、残留物をトルエンで再結晶
して目的の化合物を得た。融点153〜156℃。Example 4 Synthesis of Compound of Specific Example (4) 48.2 g of bis- (3-phenyl-4-hydroxyphenyl) sulfone, 18.5 g of isopropyl bromide and 22.2 g of potassium carbonate were added to dimethylformamide 20
The mixture was added to 0 ml and stirred at a temperature of 100 to 120 ° C for 4 hours. Dimethylformamide was distilled off under reduced pressure, 200 ml of chloroform and 200 of water were added to the residue to dissolve it, and a small amount of sulfuric acid was added to adjust the pH of the aqueous layer to 5.0, followed by liquid separation. After the chloroform layer was washed with 100 ml of water, chloroform was distilled off, and the residue was recrystallized from toluene to obtain the desired compound. 153-156 ° C.
【0028】実施例5 具体例(9)の化合物の合成 水酸化ナトリウム8g、水25gを入れ、溶解後、ビス
−(3−フェニル−4−ヒドロキシフェニル)スルホン
40gを加え加温溶解した。液温を70℃にした後、ノ
ルマルアミルブロマイド16.5gを1時間で滴下し、
更に65〜72℃で12時間攪拌を続けた。反応液にト
ルエンを加え、ジエーテル体をトルエン層に抽出除去し
たあと、水層に酢酸エチルを加えて抽出し、目的物を酢
酸エチル層に抽出した。酢酸エチル層を希塩酸で中和、
水洗後、溶媒を留去して得られた残渣をトルエンから再
結晶して目的の化合物を得た。融点140〜143℃。Example 5 Synthesis of the compound of the specific example (9) 8 g of sodium hydroxide and 25 g of water were added and dissolved. Then, 40 g of bis- (3-phenyl-4-hydroxyphenyl) sulfone was added and dissolved by heating. After the liquid temperature was 70 ° C., 16.5 g of normal amyl bromide was added dropwise over 1 hour.
Stirring was further continued at 65-72 ° C for 12 hours. Toluene was added to the reaction solution, and the diether was extracted and removed from the toluene layer. Ethyl acetate was added to the aqueous layer for extraction, and the desired product was extracted into the ethyl acetate layer. Neutralize the ethyl acetate layer with dilute hydrochloric acid,
After washing with water, the residue obtained by evaporating the solvent was recrystallized from toluene to obtain the desired compound. 140-143 ° C.
【0029】実施例6 具体例(11)の化合物の合成 水酸化ナトリム2g、臭化ナトリウム2.0g、水12
g、ビス−(3−フェニル−4−ヒドロキシフェニル)
スルホン10gを仕込み、溶解後、ノルマルヘキシルブ
ロマイド16.5gを70℃、1時間で滴下した。実施
例5 と同様に反応、処理して、目的の化合物を得た。融
点138〜141℃。Example 6 Synthesis of Compound of Specific Example (11) 2 g of sodium hydroxide, 2.0 g of sodium bromide, 12 g of water
g, bis- (3-phenyl-4-hydroxyphenyl)
After 10 g of sulfone was charged and dissolved, 16.5 g of normal hexyl bromide was added dropwise at 70 ° C. for 1 hour. The reaction and treatment were conducted in the same manner as in Example 5 to obtain the desired compound. 138-141 ° C.
【0030】実施例7〜17 下記、表1に、実施例2と同様の方法で合成した化合物
とその融点を示す。Examples 7 to 17 Table 1 below shows compounds synthesized by the same method as in Example 2 and their melting points.
【0031】[0031]
【表1】 [Table 1]
【0032】実施例18 具体例(9)の化合物の合成 1,2−ジクロロエタン40ml中に3−フェニル−4
−ノルマルアミルオキシフェニルスルホニルクロライド
9.66g、塩化アルミニウム4.73g、オルトフェ
ニルフェノール4.85gを加え室温で12時間攪拌し
た。反応液を氷と希塩酸の混合物中に注入し有機層を水
で繰り返し洗い、乾燥した。溶媒を留去し残渣をエタノ
ールから再結晶して目的の化合物を得た。融点140〜
143℃。Example 18 Synthesis of the compound of the specific example (9) 3-phenyl-4 in 40 ml of 1,2-dichloroethane
-Normal amyloxyphenylsulfonyl chloride (9.66 g), 4.73 g of aluminum chloride and 4.85 g of orthophenylphenol were added, and the mixture was stirred at room temperature for 12 hours. The reaction solution was poured into a mixture of ice and diluted hydrochloric acid, and the organic layer was repeatedly washed with water and dried. The solvent was distilled off, and the residue was recrystallized from ethanol to obtain the desired compound. Melting point 140-
143 ° C.
Claims (1)
フェニル−4−ヒドロキシ−4′−置換ヒドロキシジフ
ェニルスルホン化合物。 一般式(1) 【化1】 式中、Rはアルコキシ基、アリール基、またはアリール
オキシ基で置換されていてもよいアルキル基を表す。1. A 3,3'-diphenyl-4-hydroxy-4'-substituted hydroxydiphenylsulfone compound represented by the following general formula (1). General formula (1) In the formula, R represents an alkyl group which may be substituted with an alkoxy group, an aryl group, or an aryloxy group.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4000715A JP2641002B2 (en) | 1992-01-07 | 1992-01-07 | Diphenyl sulfone compound |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4000715A JP2641002B2 (en) | 1992-01-07 | 1992-01-07 | Diphenyl sulfone compound |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05186417A JPH05186417A (en) | 1993-07-27 |
| JP2641002B2 true JP2641002B2 (en) | 1997-08-13 |
Family
ID=11481460
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4000715A Expired - Fee Related JP2641002B2 (en) | 1992-01-07 | 1992-01-07 | Diphenyl sulfone compound |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2641002B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000273081A (en) * | 1999-03-23 | 2000-10-03 | Nippon Soda Co Ltd | Industrial production of diphenyl sulfone compound |
| US7241924B2 (en) | 1999-03-23 | 2007-07-10 | Nippon Soda Co., Ltd. | Industrial process for the production of diphenyl sulfone compounds |
| CN1273447C (en) | 2001-01-22 | 2006-09-06 | 日本曹达株式会社 | Process for preparing diphenylsulfone compounds |
-
1992
- 1992-01-07 JP JP4000715A patent/JP2641002B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05186417A (en) | 1993-07-27 |
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