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JP2652966B2 - Optical amplifier - Google Patents
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JP2652966B2 - Optical amplifier - Google Patents

Optical amplifier

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Publication number
JP2652966B2
JP2652966B2 JP1328817A JP32881789A JP2652966B2 JP 2652966 B2 JP2652966 B2 JP 2652966B2 JP 1328817 A JP1328817 A JP 1328817A JP 32881789 A JP32881789 A JP 32881789A JP 2652966 B2 JP2652966 B2 JP 2652966B2
Authority
JP
Japan
Prior art keywords
optical amplifier
uniform
regions
gain
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1328817A
Other languages
Japanese (ja)
Other versions
JPH03188424A (en
Inventor
日濬 車
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP1328817A priority Critical patent/JP2652966B2/en
Publication of JPH03188424A publication Critical patent/JPH03188424A/en
Application granted granted Critical
Publication of JP2652966B2 publication Critical patent/JP2652966B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、長距離大容量通信の分野において使用でき
る高性能な光増幅器に関する。
Description: TECHNICAL FIELD The present invention relates to a high-performance optical amplifier that can be used in the field of long-distance, large-capacity communication.

〔従来の技術〕[Conventional technology]

従来、長距離大容量通信を行うためには光を伝送媒体
として用い、数10kmにおきに光・電気、電気・光変換を
行う再生中継器を配して減衰に対応するのが一般的であ
った。しかし、再生中継器においては、光・電気、電気
・光変換を行うための特別な素子装置を必要とするので
コストがかかるという問題点を有していた。一方、上記
再生中継器の代替え用として開発されている近年の半導
体光増幅器を含めた光素子技術の進歩は、100km以上の
無中継伝送を可能にしつつある。また光交換の分野にお
いても上記光増幅器を用いて光スイッチの損失を補償
し、回線数を増すことが検討されている。
Conventionally, in order to perform long-distance large-capacity communication, it is common to use light as a transmission medium and arrange regenerative repeaters that perform light-to-electricity and electricity-to-light conversion every several tens of kilometers to deal with attenuation. there were. However, the regenerative repeater has a problem in that it requires a special element device for performing light-to-electricity and electricity-to-light conversion, so that it is costly. On the other hand, recent advances in optical device technology including semiconductor optical amplifiers, which have been developed as substitutes for the regenerative repeaters, have enabled repeaterless transmission of 100 km or more. Also in the field of optical switching, it has been studied to use the optical amplifier to compensate for the loss of the optical switch and increase the number of lines.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

しかし、従来の光増幅器ほ、光の進行方向にたいして
反転分布の大きさすなわち利得係数の大きさではなく励
起の大きさを一様にするような構造または構成を持ち、
増幅された自然放出光や増幅された信号光の影響によっ
て利得係数の大きさが空間的に不均一になり、励起の増
大による最大利得、最大増幅出力、雑音などの諸特性の
改善効果が抑制されるという問題があった。
However, conventional optical amplifiers have a structure or configuration that makes the magnitude of the pumping uniform rather than the magnitude of the population inversion, that is, the magnitude of the gain coefficient, in the traveling direction of light,
The magnitude of the gain coefficient becomes spatially non-uniform due to the effects of amplified spontaneous emission light and amplified signal light, and the effects of improving various characteristics such as maximum gain, maximum amplified output, and noise due to increased pumping are suppressed. There was a problem that was.

本発明の目的は、長距離大容量光通信の分野において
使用できる総合特性に優れた光増幅器を提供することに
ある。
SUMMARY OF THE INVENTION An object of the present invention is to provide an optical amplifier having excellent overall characteristics that can be used in the field of long-distance, large-capacity optical communication.

〔課題を解決するための手段〕[Means for solving the problem]

本発明の光増幅器は、光を導波するとともに増幅する
光導波路を備えてなる光増幅器において、前記光導波路
を光の伝搬方向に複数の領域に区分し、中央の領域から
両端の領域に向かうにしたがい高い励起エネルギーを注
入する手段を備え、前記各領域にわたり注入キャリアの
反転分布の大きさを均一に保つことを特徴とする。
An optical amplifier according to the present invention is an optical amplifier including an optical waveguide that guides and amplifies light, wherein the optical waveguide is divided into a plurality of regions in a light propagation direction, and goes from a central region to regions at both ends. Means for injecting high excitation energy in accordance with the present invention, wherein the magnitude of the population inversion of the injected carriers is kept uniform over the respective regions.

〔作用〕[Action]

以下本発明の原理を半導体光増幅器を例に挙げて説明
する。第2図及び第3図は従来の半導体光増幅器の問題
点を説明する図である。第2図及び第3図で(a)は光
を増幅導波する半導体光増幅器の主要部分を模式的に示
しており、(b)は光強度の空間分布(ここでは増幅さ
れた自然放出光が支配的である)を、(c)は励起キャ
リア密度の空間分布すなわち反転分布、(d)は利得係
数の空間並びに波長分布をそれぞれ示している。ただ
し、第2図は入力光強度が非常に弱い場合に相当し、第
3図は入力光強度が強い場合に相当する。第2図(a)
のように均一に電流を注入した場合すなわち均一励起を
行った場合には、同図(b)のように増幅された自然放
出光強度が空間的に不均一となる。一般に同じ励起状態
では、光強度密度が大きいほど反転分布は小さくなる
が、これに対応して、この場合には反転分布(励起キャ
リア密度分布)も空間的に不均一となる。これは増幅器
の利得係数が空間的に不均一になることを意味する。光
増幅器においては、高利得状態で用いる方が最大増幅出
力やS/Nの観点から有利であることが知られているが、
前述のような空間的な不均一があると、励起をあげるこ
とによる光増幅器の特性改善効果が阻害される。さら
に、均一励起の場合には、励起をあげるにつれてこのよ
うな空間的な不均一性が拡大される傾向にある。特に半
導体光増幅器の場合には、反転分布の大きさによって利
得が最大となる波長が異なり、第2図(d)や第3図
(d)に示すように利得係数が分布するため、一定の波
長を持つ信号光に対して半導体光増幅器内のある部分で
は大きさ利得を持つが、別の部分では著しく小さい利得
しか持たないという状況が起こり得る。このような空間
的な不均一性による弊害を除去するためには、反転分布
を均一化するように空間的に不均一に励起を行えば良い
ことは明かである。例えば、入力信号光強度が弱い場合
には、光増幅器の両端に対する励起を相対的に増大し、
入力信号光強度が大きい場合には光増幅器の出力部の励
起を相対的に増大すればよい。
Hereinafter, the principle of the present invention will be described using a semiconductor optical amplifier as an example. 2 and 3 are diagrams for explaining the problems of the conventional semiconductor optical amplifier. 2 and 3, (a) schematically shows a main part of a semiconductor optical amplifier that amplifies and guides light, and (b) shows a spatial distribution of light intensity (here, amplified spontaneous emission light). (C) shows the spatial distribution of the excited carrier density, that is, the population inversion, and (d) shows the spatial and wavelength distributions of the gain coefficient. However, FIG. 2 corresponds to the case where the input light intensity is very low, and FIG. 3 corresponds to the case where the input light intensity is high. Fig. 2 (a)
In the case where the current is uniformly injected as in the above, that is, when the uniform excitation is performed, the amplified spontaneous emission light intensity becomes spatially non-uniform as shown in FIG. In general, in the same excited state, the population inversion becomes smaller as the light intensity density becomes larger. However, in this case, the population inversion (excitation carrier density distribution) becomes spatially non-uniform. This means that the gain factor of the amplifier becomes spatially non-uniform. In optical amplifiers, it is known that use in a high gain state is advantageous from the viewpoint of maximum amplification output and S / N,
If there is such spatial non-uniformity, the effect of improving the characteristics of the optical amplifier by increasing the pumping is hindered. Furthermore, in the case of uniform excitation, such spatial non-uniformity tends to increase as the excitation increases. Particularly, in the case of a semiconductor optical amplifier, the wavelength at which the gain becomes maximum differs depending on the magnitude of the population inversion, and the gain coefficient is distributed as shown in FIGS. 2 (d) and 3 (d). A situation may occur in which a signal light having a wavelength has a large gain at a certain portion in the semiconductor optical amplifier, but has a very small gain at another portion. It is clear that in order to eliminate such adverse effects due to the spatial non-uniformity, the excitation may be performed spatially non-uniformly so as to make the population inversion uniform. For example, when the input signal light intensity is weak, the excitation to both ends of the optical amplifier is relatively increased,
When the input signal light intensity is high, the excitation of the output section of the optical amplifier may be relatively increased.

〔実施例〕〔Example〕

つぎに本発明の実施例を図面を用いて説明する。第1
図は本発明の一実施例である半導体光増幅器の斜線図で
ある。まず、n−InP基板1の上面にノンドープInGaAsP
活性層2、アンチメルトバック層(AMB層)3、p−InP
クラッド層4を順にそれぞれ厚さが0.2μm、0.01μ
m、1μmとなるように液相成長法により成長する。こ
の多層半導体結晶の[110]方向に、幅1μmのメサス
トライプ5を形成し、次に上記半導体多層結晶の上にメ
サストライプ5の上部を除いて、p−InP電流ブロック
層6、n−InP電流ブロック層7を、そして全面にp−I
nP埋め込み層8とp+−InGaAsPコンタクト層9を順にそ
れぞれ、平坦部での厚さが1μm、0.5μm、6μm、
0.5μmとなるようにMOVPE法により結晶成長する。コン
タクト層9の上には、CVD法により、厚さ3000ÅのSiO2
膜10を形成し、活性層の直上部のSiO2膜10に窓を開け、
さらに、SiO2膜10及び、SiO2膜10の窓部を覆うようにCr
/Auからなる電極11を形成する。つぎに、不均一励起を
行うために素子をそれぞれ長さが100μm、200μm、10
0μmの3つの領域に分け、長さ10μmの境界部12,13に
おいて電極11、SiO2膜10、p+−InGaAsPコンタクト層9
を除去する。さらに、n−InP基板1の下にAuGeNiから
なる電極14を形成する。最後に、両端面に無反射コーテ
ィング膜として、ECRプラズマCVD法により、厚さ2200Å
のSiON膜15、16を形成する。
Next, an embodiment of the present invention will be described with reference to the drawings. First
The figure is a hatched diagram of a semiconductor optical amplifier according to one embodiment of the present invention. First, a non-doped InGaAsP substrate is formed on the upper surface of the n-InP substrate 1.
Active layer 2, Anti-melt back layer (AMB layer) 3, p-InP
The thickness of the cladding layer 4 is 0.2 μm and 0.01 μm, respectively.
m and 1 μm by liquid phase growth. A mesa stripe 5 having a width of 1 μm is formed in the [110] direction of the multilayer semiconductor crystal, and then the p-InP current blocking layer 6 and the n-InP A current blocking layer 7 and a p-I
The nP buried layer 8 and the p + -InGaAsP contact layer 9 are sequentially formed to have thicknesses of 1 μm, 0.5 μm, 6 μm,
The crystal is grown by MOVPE so as to have a thickness of 0.5 μm. On the contact layer 9, a 3000 mm thick SiO 2 was formed by CVD.
A film 10 is formed, and a window is opened in the SiO 2 film 10 immediately above the active layer,
Further, the SiO 2 film 10 and to cover the window portion of the SiO 2 film 10 Cr
An electrode 11 made of / Au is formed. Next, in order to perform non-uniform excitation, the elements were respectively 100 μm, 200 μm, and 10 μm in length.
The electrode 11, the SiO 2 film 10, and the p + -InGaAsP contact layer 9 are divided into three regions of 10 μm at boundaries 12 and 13 having a length of 10 μm.
Is removed. Further, an electrode 14 made of AuGeNi is formed under the n-InP substrate 1. Finally, as a non-reflective coating film on both end surfaces, a thickness of 2200 mm
SiON films 15 and 16 are formed.

このように作製した半導体光増幅器において、入力信
号光が小さい場合に半導体光増幅器をシングルモードフ
ァイバと結合したときの入力ファイバ端ら出力ファイバ
端までの利得である未飽和ファイバ間利得は均一注入の
場合に15dBであったが全電流値を変えないで、前記3つ
の領域に注入する電流密度比を2:1:2となるように制御
することによって20dBに増大できた。入力信号光を増大
して行くと利得が低下するが、未飽和利得から3dB利得
が低下する点での増幅出力として定義される3dB飽和出
力は、均一注入の場合に7dBmであったが、前記3つの領
域に注入する電流密度比2:3:4に設定することによって1
2dBmに増大できた。また、雑音指数の値も均一注入の場
合に6dBであったのが不均一注入によって4dBとなり、量
子限界である3dBに近付けることができた。
In the semiconductor optical amplifier thus manufactured, when the input signal light is small, the gain from the input fiber end to the output fiber end when the semiconductor optical amplifier is coupled to the single mode fiber, the gain between the unsaturated fibers is uniform injection. In this case, the current density was 15 dB, but could be increased to 20 dB by controlling the current density ratio injected into the three regions to be 2: 1: 2 without changing the total current value. Although the gain decreases as the input signal light increases, the 3 dB saturation output defined as the amplified output at the point where the 3 dB gain decreases from the unsaturated gain is 7 dBm in the case of uniform injection. By setting the current density ratio injected into the three regions to 2: 3: 4, 1
It could be increased to 2dBm. In addition, the value of the noise figure was 6 dB in the case of the uniform injection, but it became 4 dB by the non-uniform injection, which was close to the quantum limit of 3 dB.

なお、本発明の実施例では不均一励起を行うために半
導体光増幅器を3つの領域に分けた例を示したが、領域
の数は任意でよい。また、PBH構造を持つ光増幅器の例
を示したが、DC−PBH構造やBH構造など他の構造を持つ
半導体光増幅器についても有効である。また、他の光増
幅器(例えばファイバ光増幅器)においても構成を工夫
し、不均一励起による利得係数の均一化を行うことによ
って同様の効果が期待できる。
In the embodiment of the present invention, an example is shown in which the semiconductor optical amplifier is divided into three regions in order to perform non-uniform excitation, but the number of regions may be arbitrary. Although the example of the optical amplifier having the PBH structure has been described, the present invention is also effective for a semiconductor optical amplifier having another structure such as a DC-PBH structure or a BH structure. Similar effects can be expected by devising the configuration of other optical amplifiers (for example, fiber optical amplifiers) and making the gain coefficient uniform by non-uniform pumping.

〔発明の効果〕〔The invention's effect〕

本発明による利得係数が空間的に均一化された光増幅
器によって光増幅器の総合的な性能を従来よりも改善で
き、大容量光通信に代表される光通信の分野で有用であ
る。
The optical amplifier according to the present invention, in which the gain coefficient is spatially uniformed, can improve the overall performance of the optical amplifier as compared with the related art, and is useful in the field of optical communication represented by large-capacity optical communication.

【図面の簡単な説明】 第1図は本発明の実施例を示す斜視図、第2図及び第3
図は従来の半導体光増幅器の問題点を説明する図であ
る。 1……n−InP基板、2……ノンドープInGaAsP活性層、
3……アンチメルトバック層(AMB層)、4……p−InP
クラッド層、5……メサストライプ、6……p−InP電
流ブロック層、7……p−InP電流ブロック層、8……
p−InP埋め込み層、9……p+−InGaAsPコンタクト層、
10……SiO2膜、11,14……電極、12,13……境界部、15,1
6……無反射コーティング膜。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view showing an embodiment of the present invention, FIG. 2 and FIG.
FIG. 1 is a diagram for explaining a problem of a conventional semiconductor optical amplifier. 1 ... n-InP substrate, 2 ... non-doped InGaAsP active layer,
3 ... Anti-melt back layer (AMB layer) 4 ... P-InP
Clad layer, 5 mesa stripe, 6 p-InP current blocking layer, 7 p-InP current blocking layer, 8
p-InP buried layer, 9 ... p + -InGaAsP contact layer,
10: SiO 2 film, 11, 14: Electrode, 12, 13: Boundary, 15, 1
6 …… Anti-reflective coating film.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】光を導波するとともに増幅する光導波路を
備えてなる光増幅器において、前記光導波路を光の伝搬
方向に複数の領域に区分し、中央の領域から両端の領域
に向かうにしたがい高い励起エネルギーを注入する手段
を備え、前記各領域にわたり注入キャリアの反転分布の
大きさを均一に保つことを特徴とする光増幅器。
1. An optical amplifier comprising an optical waveguide for guiding and amplifying light, wherein the optical waveguide is divided into a plurality of regions in a light propagation direction, and from a central region to regions at both ends. An optical amplifier comprising means for injecting high excitation energy, wherein the magnitude of population inversion of injected carriers is kept uniform over each of the regions.
JP1328817A 1989-12-18 1989-12-18 Optical amplifier Expired - Fee Related JP2652966B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1328817A JP2652966B2 (en) 1989-12-18 1989-12-18 Optical amplifier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1328817A JP2652966B2 (en) 1989-12-18 1989-12-18 Optical amplifier

Publications (2)

Publication Number Publication Date
JPH03188424A JPH03188424A (en) 1991-08-16
JP2652966B2 true JP2652966B2 (en) 1997-09-10

Family

ID=18214428

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1328817A Expired - Fee Related JP2652966B2 (en) 1989-12-18 1989-12-18 Optical amplifier

Country Status (1)

Country Link
JP (1) JP2652966B2 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0396928A (en) * 1989-09-11 1991-04-22 Hitachi Ltd Semiconductor optical amplifier

Also Published As

Publication number Publication date
JPH03188424A (en) 1991-08-16

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