JP2658752B2 - Epoxy resin composition and semiconductor device - Google Patents
Epoxy resin composition and semiconductor deviceInfo
- Publication number
- JP2658752B2 JP2658752B2 JP20193792A JP20193792A JP2658752B2 JP 2658752 B2 JP2658752 B2 JP 2658752B2 JP 20193792 A JP20193792 A JP 20193792A JP 20193792 A JP20193792 A JP 20193792A JP 2658752 B2 JP2658752 B2 JP 2658752B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- resin
- general formula
- resin composition
- phenol resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、エポキシ樹脂としてビ
フェニル型エポキシ樹脂を主成分として用いたエポキシ
樹脂組成物及びその硬化物で封止された半導体装置に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition containing a biphenyl-type epoxy resin as an epoxy resin as a main component and a semiconductor device sealed with a cured product thereof.
【0002】[0002]
【従来の技術及び発明が解決しようとする課題】現在、
半導体産業の中では樹脂封止型のダイオード、トランジ
スター、IC、LSI、超LSIが主流となっており、
中でもエポキシ樹脂は、一般に他の熱硬化性樹脂に比べ
成形性、接着性、電気特性、機械特性、耐湿性等に優れ
ているため、エポキシ樹脂組成物で半導体装置を封止す
ることが多く行われているが、最近においてこれらの半
導体装置は集積度が益々大きくなり、これに応じてチッ
プ寸法も大きくなりつつある。一方、これに対しパッケ
ージ外形寸法は電子機器の小型化、軽量化の要求にとも
ない、小型化、薄型化が進んでいる。更に、半導体部品
を回路基板へ取り付ける方法も、基板上の部品の高密度
化や基板の薄型化のため、半導体部品の表面実装が幅広
く行われるようになってきた。2. Description of the Related Art
In the semiconductor industry, resin-sealed diodes, transistors, ICs, LSIs, and super LSIs have become mainstream,
Of these, epoxy resins generally have better moldability, adhesiveness, electrical properties, mechanical properties, moisture resistance, etc. than other thermosetting resins, and therefore, semiconductor devices are often sealed with epoxy resin compositions. However, recently, the degree of integration of these semiconductor devices has been increasing, and the chip size has been increasing accordingly. On the other hand, package external dimensions are becoming smaller and thinner with the demand for smaller and lighter electronic devices. Further, in the method of attaching a semiconductor component to a circuit board, surface mounting of the semiconductor component has been widely performed due to a high density of components on the substrate and a reduction in thickness of the substrate.
【0003】しかしながら、半導体装置を表面実装する
場合、半導体装置全体を半田槽に浸漬するか又は半田が
溶融する高温ゾーンを通過させる方法が一般的である
が、その際の熱衝撃により封止樹脂層にクラックが発生
したり、リードフレームやチップと封止樹脂との界面に
剥離が生じてしまう。このようなクラックや剥離は、表
面実装時の熱衝撃以前に半導体装置の封止樹脂層が吸湿
していると更に顕著なものとなるが、実際の作業工程に
おいては、封止樹脂層の吸湿は避けられず、このため実
装後のエポキシ樹脂組成物で封止した半導体装置の信頼
性が大きく損なわれる場合がある。[0003] However, when a semiconductor device is surface-mounted, it is common to immerse the entire semiconductor device in a solder bath or to pass the semiconductor device through a high-temperature zone in which the solder is melted. Cracks occur in the layer, and peeling occurs at the interface between the lead frame or chip and the sealing resin. Such cracks and peeling become more remarkable when the sealing resin layer of the semiconductor device absorbs moisture before the thermal shock at the time of surface mounting. Therefore, the reliability of the semiconductor device sealed with the epoxy resin composition after mounting may be greatly impaired.
【0004】特に最近においては、エポキシ樹脂として
ビフェニル型エポキシ樹脂を用いることが注目されてい
るが、ビフェニル型エポキシ樹脂を用いたエポキシ樹脂
組成物における上記問題点の解決が要望されている。[0004] In particular, recently, attention has been paid to the use of a biphenyl type epoxy resin as an epoxy resin, but there is a demand for a solution to the above problems in an epoxy resin composition using a biphenyl type epoxy resin.
【0005】本発明は、上記事情に鑑みなされたもの
で、流動性が良好であり、成形性に優れていると共に、
内部ボイド等の発生が少なく、ガラス転移温度が高い上
に伸びが大きく、しかも接着性が良好でかつ低吸湿性の
硬化物を与える、ビフェニル型エポキシ樹脂を主成分と
したエポキシ樹脂組成物及びこのエポキシ樹脂組成物の
硬化物で封止された表面実装時の熱衝撃後においても高
い信頼性を有する半導体装置を提供することを目的とす
る。The present invention has been made in view of the above circumstances, and has good fluidity and excellent moldability.
An epoxy resin composition containing a biphenyl-type epoxy resin as a main component, which gives a cured product with a low occurrence of internal voids, a high glass transition temperature, a large elongation, a good adhesion, and a low hygroscopicity. It is an object of the present invention to provide a semiconductor device having high reliability even after thermal shock during surface mounting sealed with a cured product of an epoxy resin composition.
【0006】[0006]
【課題を解決するための手段及び作用】本発明者は上記
目的を達成するため鋭意検討を重ねた結果、エポキシ樹
脂、フェノール樹脂、無機質充填剤等を配合してなるエ
ポキシ樹脂組成物において、エポキシ樹脂として、
(a)下記一般式(1)で示されるナフタレン環含有エ
ポキシ樹脂と(b)下記一般式(2)で示されるビフェ
ニル型エポキシ樹脂とを重量比で(a)/(b)=0.
1〜1の割合で併用してなるエポキシ樹脂を使用すると
共に、フェノール樹脂として(c)下記一般式(3)で
示される多官能型フェノール樹脂と(d)下記一般式
(4)で示されるアラルキル型フェノール樹脂とを重量
比で(c)/(d)=0.5〜4の割合で併用してなる
フェノール樹脂を併用した場合、優れた特性を有するエ
ポキシ樹脂組成物が得られることを見出した。The present inventors have made intensive studies to achieve the above object, and have found that an epoxy resin composition containing an epoxy resin, a phenol resin, an inorganic filler, etc. As a resin,
(A) a naphthalene ring-containing epoxy resin represented by the following general formula (1) and (b) a biphenyl type epoxy resin represented by the following general formula (2) in a weight ratio of (a) / (b) = 0.
An epoxy resin used in combination at a ratio of 1 to 1 is used, and (c) a polyfunctional phenol resin represented by the following general formula (3) and (d) a phenol resin represented by the following general formula (4) as a phenol resin. When an aralkyl-type phenol resin is used in combination with a phenol resin obtained by using the aralkyl-type phenol resin at a weight ratio of (c) / (d) = 0.5 to 4, an epoxy resin composition having excellent properties can be obtained. I found it.
【0007】即ち、従来のビフェニル型エポキシ樹脂を
主成分とするエポキシ樹脂組成物は成形性、内部ボイド
等の不良発生率の点で満足できるものではなかったが、
これに比べて本発明のエポキシ樹脂組成物は流動性が良
好で成形性に優れ、内部ボイド等の不良発生率が著しく
少ない上、ガラス転移温度が高い上にガラス転移温度以
上の領域で弾性率が低下して伸びが大きくなり、低応力
性に優れ、しかも接着性が良好でかつ低吸湿性の硬化物
を与えることを知見し、本発明をなすに至ったものであ
る。That is, conventional epoxy resin compositions containing a biphenyl-type epoxy resin as a main component are not satisfactory in terms of moldability and the rate of occurrence of defects such as internal voids.
On the other hand, the epoxy resin composition of the present invention has good flowability and excellent moldability, has extremely low occurrence rate of defects such as internal voids, has a high glass transition temperature, and has an elastic modulus in a region higher than the glass transition temperature. Have been found to provide a cured product having a low elongation, high elongation, excellent low stress properties, good adhesion, and low hygroscopicity, and have accomplished the present invention.
【0008】[0008]
【化3】 Embedded image
【0009】[0009]
【化4】 Embedded image
【0010】従って、本発明は、 (I)(a)上記一般式(1)で示されるナフタレン環
含有エポキシ樹脂と(b)上記一般式(2)で示される
ビフェニル型エポキシ樹脂とを重量比で(a)/(b)
=0.1〜1の割合で併用してなるエポキシ樹脂、 (II)(c)上記一般式(3)で示される多官能型フ
ェノール樹脂と(d)上記一般式(4)で示されるアラ
ルキル型フェノール樹脂とを重量比で(c)/(d)=
0.5〜4の割合で併用してなるフェノール樹脂、 (III)無機質充填剤を配合してなるエポキシ樹脂組
成物、及びこのエポキシ樹脂組成物の硬化物で封止され
た半導体装置を提供する。[0010] Accordingly, the present invention provides (I) (a) a naphthalene ring-containing epoxy resin represented by the above general formula (1) and (b) a biphenyl type epoxy resin represented by the above general formula (2) in a weight ratio. And (a) / (b)
= An epoxy resin used in combination at a ratio of 0.1 to 1; (II) (c) a polyfunctional phenol resin represented by the general formula (3); and (d) an aralkyl represented by the general formula (4). (C) / (d) =
Provided are a phenolic resin used in combination at a ratio of 0.5 to 4, (III) an epoxy resin composition containing an inorganic filler, and a semiconductor device sealed with a cured product of the epoxy resin composition. .
【0011】以下、本発明につき更に詳細に説明する
と、本発明のエポキシ樹脂組成物は、上述したようにナ
フタレン環含有エポキシ樹脂、ビフェニル型エポキシ樹
脂、特定の構造を有する多官能型フェノール樹脂、アラ
ルキル型フェノール樹脂、無機質充填剤を配合してなる
ものである。Hereinafter, the present invention will be described in more detail. The epoxy resin composition of the present invention comprises a naphthalene ring-containing epoxy resin, a biphenyl type epoxy resin, a polyfunctional phenol resin having a specific structure, an aralkyl It is obtained by blending a phenolic resin and an inorganic filler.
【0012】ここで、第一必須成分のナフタレン環含有
エポキシ樹脂としては下記一般式(1)で示されるもの
を使用する。Here, as the naphthalene ring-containing epoxy resin as the first essential component, a resin represented by the following general formula (1) is used.
【0013】[0013]
【化5】 Embedded image
【0014】このようなナフタレン環含有エポキシ樹脂
の具体例としては、下記の化合物を挙げることができ
る。。Specific examples of such a naphthalene ring-containing epoxy resin include the following compounds. .
【0015】[0015]
【化6】 Embedded image
【0016】[0016]
【化7】 Embedded image
【0017】また、第二必須成分のビフェニル型エポキ
シ樹脂としては、下記一般式(2)で示されるものを使
用するもので、このビフェニル型エポキシ樹脂を上述し
たナフタレン環含有エポキシ樹脂と併用することによ
り、得られる硬化物の接着性を大幅に改善することがで
きる。As the second essential component, a biphenyl type epoxy resin represented by the following general formula (2) is used. This biphenyl type epoxy resin is used in combination with the above-mentioned naphthalene ring-containing epoxy resin. Thereby, the adhesiveness of the obtained cured product can be significantly improved.
【0018】[0018]
【化8】 Embedded image
【0019】このようなビフェニル型エポキシ樹脂とし
て具体的には、下記化合物を挙げることができる。Specific examples of such a biphenyl type epoxy resin include the following compounds.
【0020】[0020]
【化9】 Embedded image
【0021】なお、上記したビフェニル型エポキシ樹脂
の中でも特に上記式(5)の化合物が、組成物を低粘度
化し得、かつ組成物中の全塩素量を500ppm以下に
することが可能であるという点から好適に使用される。It is to be noted that among the above-mentioned biphenyl type epoxy resins, the compound of the above formula (5) is particularly capable of lowering the viscosity of the composition and making it possible to reduce the total chlorine content in the composition to 500 ppm or less. It is preferably used from the point of view.
【0022】本発明では、エポキシ樹脂として上述した
式(1)のナフタレン環含有エポキシ樹脂(a)と式
(2)のビフェニル型エポキシ樹脂(b)とを重量比で
(a)/(b)=0.1〜1、好ましくは0.2〜0.
8の割合で併用する。(a)/(b)が0.1に満たな
いと粘度が低くなりすぎて内部ボイドが発生し過ぎる
上、ガラス転移温度も低くなってしまい、(a)/
(b)が1を超えると接着性が発現しにくくなると共
に、エポキシ樹脂の溶融粘度が高くなりすぎて多ピンの
パッケージや薄型のパッケージを封止する場合、成形性
に問題が生じて封止後の信頼性が低下してしまう。In the present invention, the epoxy resin (a) containing the naphthalene ring of the above formula (1) and the biphenyl type epoxy resin (b) of the formula (2) are used in a weight ratio of (a) / (b). = 0.1-1, preferably 0.2-0.
8 at the same time. If (a) / (b) is less than 0.1, the viscosity becomes too low to cause internal voids, and the glass transition temperature becomes low.
When (b) is more than 1, the adhesiveness is hardly developed, and the melt viscosity of the epoxy resin becomes too high, so that when sealing a multi-pin package or a thin package, there is a problem in moldability and sealing is performed. Later reliability will be reduced.
【0023】本発明組成物には、上記エポキシ樹脂に加
えてその他のエポキシ樹脂を併用することができ、その
他のエポキシ樹脂として代表的には、1分子中にエポキ
シ基を少なくとも2個以上有するエポキシ樹脂、具体的
には、ビスフェノ−ルA型エポキシ樹脂、フェノ−ルノ
ボラック型エポキシ樹脂、トリフェノ−ルアルカン型エ
ポキシ樹脂及びその重合体、ジシクロペンタジエン型エ
ポキシ樹脂、フェノ−ルアラルキル型エポキシ樹脂、グ
リシジルエステル型エポキシ樹脂、脂環式エポキシ樹
脂、複素環式エポキシ樹脂、ハロゲン化エポキシ樹脂等
が例示される。In the composition of the present invention, other epoxy resins can be used in addition to the above-mentioned epoxy resins. As the other epoxy resins, an epoxy resin having at least two epoxy groups in one molecule is typically used. Resins, specifically, bisphenol A type epoxy resin, phenol novolak type epoxy resin, triphenol alkane type epoxy resin and polymers thereof, dicyclopentadiene type epoxy resin, phenol aralkyl type epoxy resin, glycidyl ester type Epoxy resins, alicyclic epoxy resins, heterocyclic epoxy resins, halogenated epoxy resins and the like are exemplified.
【0024】この場合、上記式(1)のナフタレン環含
有エポキシ樹脂及び式(2)のビフェニル型エポキシ樹
脂(b)の配合割合は、組成物中のエポキシ樹脂全体の
50%(重量%、以下同様)以上、特に70〜85%と
することが低吸水率、高接着力、高ガラス転移温度を維
持する点から好ましい。In this case, the mixing ratio of the naphthalene ring-containing epoxy resin of the above formula (1) and the biphenyl type epoxy resin (b) of the formula (2) is 50% (% by weight, hereinafter) of the whole epoxy resin in the composition. The same applies above, and it is particularly preferable to set the content to 70 to 85% from the viewpoint of maintaining low water absorption, high adhesive strength, and high glass transition temperature.
【0025】次に、本発明組成物には、上記エポキシ樹
脂の硬化剤として作用するフェノ−ル樹脂として、下記
一般式(3)で示される多官能型フェノール樹脂と
(d)下記一般式(4)で示されるアラルキル型フェノ
ール樹脂とを併用して使用する。このように式(1)及
び(2)のエポキシ樹脂の硬化剤として式(3)及び
(4)のフェノール樹脂を併用することにより、150
℃以上のガラス転移温度を示すにもかかわらず、ガラス
転移温度以上の領域で顕著な低弾性化を図ることができ
る。Next, in the composition of the present invention, as a phenol resin acting as a curing agent for the epoxy resin, a polyfunctional phenol resin represented by the following general formula (3) and (d) a phenol resin represented by the following general formula (3) It is used in combination with the aralkyl-type phenol resin shown in 4). By using the phenolic resins of the formulas (3) and (4) together as a curing agent for the epoxy resins of the formulas (1) and (2), 150
Despite having a glass transition temperature of not less than ° C., remarkable lowering of elasticity can be achieved in a region not lower than the glass transition temperature.
【0026】[0026]
【化10】 Embedded image
【0027】ここで、上記式(3)の多官能型フェノー
ル樹脂として具体的には、下記化合物を例示することが
できる。Here, specific examples of the polyfunctional phenol resin of the above formula (3) include the following compounds.
【0028】[0028]
【化11】 Embedded image
【0029】なお、これらの多官能型フェノール樹脂の
中では特に上記式(6)の化合物が組成物を低粘度化
し、かつ安定した成形性、硬化性を付与できるという点
から好適に使用される。Among these polyfunctional phenol resins, the compound of the above formula (6) is preferably used because it can lower the viscosity of the composition and impart stable moldability and curability. .
【0030】また、上記式(4)のアルケニル型フェノ
ール樹脂として具体的には、下記化合物を例示すること
ができる。Specific examples of the alkenyl-type phenol resin of the above formula (4) include the following compounds.
【0031】[0031]
【化12】 Embedded image
【0032】本発明では、フェノール樹脂として上述し
た式(3)の多官能型フェノール樹脂(c)と式(4)
のアルケニル型フェノール樹脂(d)とを重量比で
(c)/(d)=0.5〜4、好ましくは1〜3の割合
で併用する。(c)/(d)が0.5に満たないとガラ
ス転移温度が低くなりすぎ、(c)/(d)が4を超え
ると吸水率が増大し、また良好な接着力も得られなくな
る場合が生じる。In the present invention, as the phenol resin, the polyfunctional phenol resin (c) of the above formula (3) and the formula (4)
(C) / (d) = 0.5-4, preferably 1-3, in a weight ratio with the alkenyl type phenol resin (d). When (c) / (d) is less than 0.5, the glass transition temperature becomes too low, and when (c) / (d) exceeds 4, the water absorption increases and good adhesive strength cannot be obtained. Occurs.
【0033】また、フェノール樹脂として、上記フェノ
ール樹脂(c),(d)に加え、従来から公知のフェノ
ール樹脂、例えばノボラック型フェノ−ル樹脂、レゾ−
ル型フェノ−ル樹脂、トリフェノ−ルアルカン型樹脂、
ナフタレン環含有フェノ−ル樹脂、ジシクロペンタジエ
ン型フェノール樹脂等を添加することができる。なお、
これらの中でもナフタレン環含有フェノ−ル樹脂、ジシ
クロペンタジエン型フェノール樹脂が好適に使用され
る。As the phenolic resin, in addition to the above-mentioned phenolic resins (c) and (d), a conventionally known phenolic resin, for example, a novolak-type phenolic resin, a resin
Phenol resin, triphenol alkane resin,
A naphthalene ring-containing phenol resin, a dicyclopentadiene-type phenol resin or the like can be added. In addition,
Of these, naphthalene ring-containing phenol resins and dicyclopentadiene-type phenol resins are preferably used.
【0034】なお、上記式(3)の多官能型フェノール
樹脂及び式(4)のアルケニル型フェノール樹脂の配合
割合は、組成物中のフェノール樹脂全体の10%以上、
特に30〜100%となるようにすることが高ガラス転
移温度、高接着、低吸湿化を図る点で好ましい。The mixing ratio of the polyfunctional phenol resin of the formula (3) and the alkenyl phenol resin of the formula (4) is at least 10% of the total phenol resin in the composition.
In particular, it is preferable that the content be 30 to 100% from the viewpoint of achieving a high glass transition temperature, high adhesion, and low moisture absorption.
【0035】本発明においては、エポキシ樹脂とフェノ
−ル樹脂とをエポキシ樹脂中のエポキシ基の量とフェノ
−ル樹脂中のフェノ−ル性水酸基の量との比が0.5〜
2、特に0.8〜1.5の範囲にあるように配合するこ
とが好ましく、配合比が上記範囲外になると未反応のエ
ポキシ樹脂もしくはフェノール樹脂が残り、十分な強度
が得られなかったり、耐湿性を低下させる場合がある。In the present invention, the ratio of the amount of the epoxy group in the epoxy resin to the amount of the phenolic hydroxyl group in the phenol resin is 0.5 to 0.5.
2, it is particularly preferable to mix so as to be in the range of 0.8 to 1.5, and if the compounding ratio is out of the above range, unreacted epoxy resin or phenol resin remains, or sufficient strength cannot be obtained, May reduce moisture resistance.
【0036】なお、本発明では上記フェノ−ル樹脂と共
にアミン系硬化剤、酸無水物系硬化剤等のその他の硬化
剤を本発明の目的を妨げない範囲で併用することもでき
る。In the present invention, other curing agents such as an amine-based curing agent and an acid anhydride-based curing agent can be used in combination with the above-mentioned phenol resin within a range not to impair the object of the present invention.
【0037】本発明において、無機質充填剤としては、
通常エポキシ樹脂組成物に配合されるものを使用するこ
とができる。具体的には、溶融シリカ、結晶性シリカ等
のシリカ類、アルミナ、窒化珪素、窒化アルミ、ボロン
ナイトライド、酸化チタン、ガラス繊維等が挙げられ、
中でも溶融シリカが好適である。In the present invention, as the inorganic filler,
What is usually mix | blended with an epoxy resin composition can be used. Specifically, fused silica, silica such as crystalline silica, alumina, silicon nitride, aluminum nitride, boron nitride, titanium oxide, glass fibers, and the like,
Among them, fused silica is preferred.
【0038】これら無機質充填剤の平均粒径や形状は特
に限定されないが、溶融シリカとしては、平均粒径が3
〜15μmであるものが好ましく、また高充填化やチッ
プ表面に対する応力を小さくするため球状のものが好ま
しく使用される。なお、無機質充填剤は樹脂とその表面
の結合強度を強くするため、予めシランカップリング剤
などで表面処理したものを使用することが好ましい。更
に微細シリカ(平均粒径0.5〜3μm)を少量添加す
ると樹脂強度を更に向上させることもできる。The average particle size and shape of these inorganic fillers are not particularly limited.
The diameter is preferably 15 to 15 μm, and a spherical one is preferably used in order to increase the packing and reduce the stress on the chip surface. In order to increase the bonding strength between the resin and its surface, it is preferable to use an inorganic filler which has been previously surface-treated with a silane coupling agent or the like. Further, by adding a small amount of fine silica (average particle size of 0.5 to 3 μm), the resin strength can be further improved.
【0039】上記無機質充填剤は1種類を単独で使用し
ても2種類以上を併用してもよく、その配合量は特に制
限されないが、エポキシ樹脂及びフェノール樹脂の合計
量100部に対して100〜1000部、特に200〜
700部の範囲とすることが好ましい。One of the above inorganic fillers may be used alone or two or more of them may be used in combination. The amount of the inorganic filler is not particularly limited. ~ 1000 parts, especially 200 ~
The range is preferably set to 700 parts.
【0040】更に、本発明組成物には、硬化触媒を配合
することができる。硬化触媒としては、例えばイミダゾ
−ル化合物、三級アミン化合物、リン系化合物等が挙げ
られ、その配合量は特に制限されないが、エポキシ樹脂
及びフェノール樹脂の合計量100部に対して0.1〜
2部、特に0.4〜1.5部とすることが好ましい。Further, the composition of the present invention may contain a curing catalyst. Examples of the curing catalyst include an imidazole compound, a tertiary amine compound, and a phosphorus-based compound. The amount of the curing catalyst is not particularly limited, but is 0.1 to 100 parts by weight based on 100 parts of the total amount of the epoxy resin and the phenol resin.
It is preferably 2 parts, especially 0.4 to 1.5 parts.
【0041】本発明の組成物には、更に必要に応じてそ
の他の各種添加剤を配合することができる。例えば熱可
塑性樹脂、熱可塑性エラストマー、有機合成ゴム、シリ
コーン系等の低応力剤、カルナバワックス等のワックス
類、ステアリン酸等の脂肪酸及びその金属塩、カーボン
ブラック、コバルトブルー、ベンガラ等の顔料、酸化ア
ンチモン、ハロゲン化合物等の難燃化剤、グリシドキシ
プロピルトリメトキシシラン等のシランカップリング
剤、アルキルチタネート類等の表面処理剤、老化防止
剤、ハロゲントラップ剤等の添加剤を配合することがで
きる。特に本発明組成物には、添加剤としてシリコーン
変性のエポキシ樹脂やフェノール樹脂を加えると低応力
化を図ることができ、また熱可塑性樹脂、例えばスチレ
ン−ブタジエン−メタクリル酸メチル共重合体等の添加
により高接着性、耐衝撃性を得ることができる。The composition of the present invention may further contain other various additives as required. For example, thermoplastic resins, thermoplastic elastomers, organic synthetic rubbers, low stress agents such as silicones, waxes such as carnauba wax, fatty acids such as stearic acid and metal salts thereof, pigments such as carbon black, cobalt blue, red iron oxide, and oxidation Flame retardants such as antimony and halogen compounds, silane coupling agents such as glycidoxypropyltrimethoxysilane, surface treatment agents such as alkyl titanates, antioxidants, and additives such as halogen trapping agents can be blended. it can. Particularly, the composition of the present invention can be reduced in stress by adding a silicone-modified epoxy resin or phenol resin as an additive, and a thermoplastic resin such as a styrene-butadiene-methyl methacrylate copolymer is added. Thereby, high adhesiveness and impact resistance can be obtained.
【0042】本発明のエポキシ樹脂組成物は、その製造
に際して上述した成分の所定量を均一に撹拌、混合し、
予め70〜95℃に加熱してあるニーダー、ロール、エ
クストルーダーなどにより混練、冷却し、粉砕するなど
の方法で得ることができる。ここで、成分の配合順序に
特に制限はない。The epoxy resin composition of the present invention is prepared by uniformly stirring and mixing predetermined amounts of the above-mentioned components during the production thereof.
It can be obtained by kneading with a kneader, roll, extruder or the like which has been heated to 70 to 95 ° C. in advance, cooling, pulverizing, or the like. Here, there is no particular limitation on the order of compounding the components.
【0043】このようにして得られる本発明のエポキシ
樹脂組成物はSOP、SOJ、TSOP、TQFPなど
の半導体装置の封止用に有効に使用でき、この場合、成
形は従来より採用されている成形法、例えばトランスフ
ァー成形、インジェクション成形、注型法などを採用し
て行うことができる。なお、本発明のエポキシ樹脂組成
物の成形温度は150〜180℃で30〜180秒、ポ
ストキュアーは150〜180℃で2〜16時間行うこ
とが望ましい。The epoxy resin composition of the present invention thus obtained can be effectively used for sealing semiconductor devices such as SOP, SOJ, TSOP, TQFP, etc. A method such as transfer molding, injection molding, and casting can be employed. The molding temperature of the epoxy resin composition of the present invention is preferably 150 to 180 ° C. for 30 to 180 seconds, and post-curing is preferably performed at 150 to 180 ° C. for 2 to 16 hours.
【0044】[0044]
【発明の効果】本発明のエポキシ樹脂組成物は、流動性
が良好で成形性に優れ、また内部ボイド等の発生が少な
く、ガラス転移温度が高い上に伸びが大きく、しかも接
着性が良好でかつ低吸湿性の硬化物を与える。それ故、
本発明組成物でパワ−トランジスタ−、パワ−IC等の
フルモ−ルドパッケ−ジを封止しすると未充填などの不
具合がなく、熱放散性に優れた信頼性の高い半導体製品
を生産性良く製造することができる。The epoxy resin composition of the present invention has good flowability and excellent moldability, has little occurrence of internal voids and the like, has a high glass transition temperature, has a large elongation, and has good adhesiveness. And gives a cured product having low hygroscopicity. Therefore,
When a full-mold package such as a power transistor or a power IC is sealed with the composition of the present invention, there is no defect such as unfilled, and a highly reliable semiconductor product excellent in heat dissipation and excellent in heat dissipation can be manufactured. can do.
【0045】[0045]
【実施例】以下、実施例及び比較例を示して本発明を具
体的に説明するが、本発明は下記実施例に制限されるも
のではない。なお、各例中の部はいずれも重量部であ
る。EXAMPLES The present invention will be described in detail below with reference to examples and comparative examples, but the present invention is not limited to the following examples. All parts in each example are parts by weight.
【0046】また、各例については次の諸試験を行っ
た。 (イ)スパイラルフロー EMMI規格に準じた金型を使用して175℃、70k
g/cm2の条件で測定した。 (ロ)曲げ強さ及び曲げ弾性率 JIS−K6911に準じて175℃、70kg/cm
2、成形時間2分の条件で10×4×100mmの曲げ
試験片を成形し、180℃で4時間ポストキュアーした
ものについて215℃で測定した。 (ハ)膨張係数、ガラス転移温度 直径4mm、長さ15mmの試験片を用いて、TMA法
により毎分5℃の速さで昇温したときの値を測定した。 (ニ)吸湿後の耐半田クラック性 80ピンQFPをエポキシ樹脂組成物で175℃、70
kg/cm2、成形時間2分の条件で成形し、180℃
で4時間ポストキュアーした。これを85℃/85%R
Hの雰囲気に168時間放置した後、IRリフローを3
0秒間行いパッケージクラック数を測定した。 (ホ)吸水率 成形時間175℃、70kg/cm2、成形時間2分の
条件で成形し、180℃で4時間ポストキュアーした直
径50mm、厚さ2mmの円板を121℃/100%R
Hの雰囲気に24時間放置し、吸水率を測定した。 (ヘ)接着性 42アロイ板に直径5mmの円筒成形品を175℃、7
0kg/cm2、成形時間2分の条件で成形し、180
℃で4時間ポストキュアーした後、成形物と42アロイ
との接着力を測定した。The following tests were performed for each example. (A) Spiral flow 175 ° C, 70k using a mold conforming to EMMI standard
g / cm 2 . (B) Flexural strength and flexural modulus 175 ° C, 70 kg / cm according to JIS-K6911
2. A bending test piece of 10 × 4 × 100 mm was molded under the condition of a molding time of 2 minutes, and was subjected to post-curing at 180 ° C. for 4 hours. (C) Expansion coefficient, glass transition temperature Using a test piece having a diameter of 4 mm and a length of 15 mm, the value when the temperature was raised at a rate of 5 ° C. per minute by the TMA method was measured. (D) Solder crack resistance after moisture absorption 80-pin QFP was treated with an epoxy resin composition at 175 ° C and 70 ° C.
Molded under the conditions of kg / cm 2 and molding time of 2 minutes, 180 ° C
For 4 hours. 85 ℃ / 85% R
After leaving in an atmosphere of H for 168 hours, IR reflow was performed for 3 hours.
The measurement was performed for 0 seconds, and the number of package cracks was measured. (E) Water absorption A disk having a diameter of 50 mm and a thickness of 2 mm, which was molded under the conditions of a molding time of 175 ° C., 70 kg / cm 2 and a molding time of 2 minutes, and post-cured at 180 ° C. for 4 hours, was subjected to 121 ° C./100% R.
It was left in an atmosphere of H for 24 hours, and the water absorption was measured. (F) Adhesiveness A cylindrical molded product having a diameter of 5 mm was formed on a 42 alloy plate at 175 ° C. for 7
Molding under the conditions of 0 kg / cm 2 and molding time of 2 minutes, 180
After post-curing at 4 ° C. for 4 hours, the adhesive strength between the molded product and 42 alloy was measured.
【0047】〔実施例、比較例〕下記に示すエポキシ樹
脂及びフェノ−ル樹脂を表1に示す割合で使用し、硬化
触媒として1,8−ジアザビシクロ(5.4.0)ウン
デセン−7を0.6部、トリフェニルホスフィン0.5
部、下記に示す溶融シリカ(I)250部、溶融シリカ
(II)250部、溶融シリカ(III)50部、三酸
化アンチモン8部、カ−ボンブラック1.5部、カルナ
バワックス1部及びγーグリシドキシプロピルトリメト
キシシラン3部を熱2本ロ−ルで均一に溶融混合し、冷
却、粉砕して9種のエポキシ樹脂組成物(実施例1〜
5、比較例1〜4)を得た。Examples and Comparative Examples The following epoxy resin and phenol resin were used in the proportions shown in Table 1, and 1,8-diazabicyclo (5.4.0) undecene-7 was used as a curing catalyst in an amount of 0%. .6 parts, triphenylphosphine 0.5
Parts, 250 parts of fused silica (I), 250 parts of fused silica (II), 50 parts of fused silica (III), 8 parts of antimony trioxide, 1.5 parts of carbon black, 1 part of carnauba wax, and γ 3 parts of glycidoxypropyltrimethoxysilane are uniformly melt-mixed with two rolls of heat, cooled and pulverized to obtain nine types of epoxy resin compositions (Examples 1 to 3).
5, Comparative Examples 1-4) were obtained.
【0048】得られたエポキシ樹脂組成物について上記
諸試験を行った。結果を表1に示す。The above-mentioned tests were conducted on the obtained epoxy resin composition. Table 1 shows the results.
【0049】[0049]
【化13】 Embedded image
【0050】[0050]
【化14】 Embedded image
【0051】溶融シリカ (I)比表面積1.4m2/g,平均粒径15μmの球
状シリカ (II)比表面積2.5m2/g,平均粒径10μmの
球状シリカ (III)比表面積10m2/g,平均粒径1.0μm
の球状シリカFused silica (I) Spherical silica having a specific surface area of 1.4 m 2 / g and an average particle size of 15 μm (II) Spherical silica having a specific surface area of 2.5 m 2 / g and an average particle size of 10 μm (III) Specific surface area of 10 m 2 / G, average particle size 1.0 μm
Spherical silica
【0052】[0052]
【表1】 [Table 1]
【0053】表1の結果より、エポキシ樹脂組成物(実
施例1〜5)は、流動性が良好であると共に内部ボイド
等の発生が少なく成形性に優れ、ガラス転移温度が高い
上に伸びが大きく、しかも接着性が良好でかつ低吸湿性
の硬化物を与えることが確認された。From the results shown in Table 1, it can be seen that the epoxy resin compositions (Examples 1 to 5) have good flowability, have less occurrence of internal voids and the like, are excellent in moldability, have a high glass transition temperature, and have high elongation. It was confirmed that a large cured product having good adhesion and low hygroscopicity was obtained.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 23/29 H01L 23/30 R 23/31 (72)発明者 青木 貴之 群馬県碓氷郡松井田町大字人見1番地10 信越化学工業株式会社 シリコーン電 子材料技術研究所内 (72)発明者 富吉 和俊 群馬県碓氷郡松井田町大字人見1番地10 信越化学工業株式会社 シリコーン電 子材料技術研究所内 (56)参考文献 特開 平4−164917(JP,A) 特開 平4−173828(JP,A) 特開 平1−292029(JP,A)──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification number Agency reference number FI Technical indication location H01L 23/29 H01L 23/30 R 23/31 (72) Inventor Takayuki Aoki Matsuida-machi, Usui-gun, Gunma Prefecture Shin-Etsu Chemical Co., Ltd. Silicone Electronic Materials Technology Laboratory (72) Inventor Kazutoshi Tomiyoshi Matsuida-cho, Usui-gun, Gunma Pref. 56) References JP-A-4-164917 (JP, A) JP-A-4-173828 (JP, A) JP-A 1-292029 (JP, A)
Claims (2)
るナフタレン環含有エポキシ樹脂と(b)下記一般式
(2)で示されるビフェニル型エポキシ樹脂とを重量比
で(a)/(b)=0.1〜1の割合で併用してなるエ
ポキシ樹脂、 【化1】 (II)(c)下記一般式(3)で示される多官能型フ
ェノール樹脂と(d)下記一般式(4)で示されるアラ
ルキル型フェノール樹脂とを重量比で(c)/(d)=
0.5〜4の割合で併用してなるフェノール樹脂、 【化2】 (III)無機質充填剤を配合してなることを特徴とす
るエポキシ樹脂組成物。(I) (a) a naphthalene ring-containing epoxy resin represented by the following general formula (1) and (b) a biphenyl type epoxy resin represented by the following general formula (2) in a weight ratio of (a) / (B) = an epoxy resin used in combination at a ratio of 0.1 to 1, (II) (c) a polyfunctional phenol resin represented by the following general formula (3) and (d) an aralkyl phenol resin represented by the following general formula (4) in a weight ratio of (c) / (d) =
A phenolic resin used in combination at a ratio of 0.5 to 4, (III) An epoxy resin composition comprising an inorganic filler.
物で封止された半導体装置。2. A semiconductor device sealed with a cured product of the epoxy resin composition according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20193792A JP2658752B2 (en) | 1992-07-06 | 1992-07-06 | Epoxy resin composition and semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20193792A JP2658752B2 (en) | 1992-07-06 | 1992-07-06 | Epoxy resin composition and semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0625384A JPH0625384A (en) | 1994-02-01 |
| JP2658752B2 true JP2658752B2 (en) | 1997-09-30 |
Family
ID=16449259
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20193792A Expired - Fee Related JP2658752B2 (en) | 1992-07-06 | 1992-07-06 | Epoxy resin composition and semiconductor device |
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| Country | Link |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11140277A (en) * | 1997-11-10 | 1999-05-25 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device using the same |
| JP3627736B2 (en) * | 2002-10-11 | 2005-03-09 | 住友ベークライト株式会社 | Epoxy resin composition and semiconductor device using the same |
| JP2006291094A (en) * | 2005-04-13 | 2006-10-26 | Yokohama Rubber Co Ltd:The | Epoxy resin composition for reinforced composite material |
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1992
- 1992-07-06 JP JP20193792A patent/JP2658752B2/en not_active Expired - Fee Related
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|---|---|
| JPH0625384A (en) | 1994-02-01 |
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