JP2658963B2 - Cleaning device for charged particles - Google Patents
Cleaning device for charged particlesInfo
- Publication number
- JP2658963B2 JP2658963B2 JP8613195A JP8613195A JP2658963B2 JP 2658963 B2 JP2658963 B2 JP 2658963B2 JP 8613195 A JP8613195 A JP 8613195A JP 8613195 A JP8613195 A JP 8613195A JP 2658963 B2 JP2658963 B2 JP 2658963B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaned
- cleaning
- charged particles
- electrodes
- liquid tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004140 cleaning Methods 0.000 title claims description 46
- 239000002245 particle Substances 0.000 title claims description 38
- 239000007788 liquid Substances 0.000 claims description 18
- 230000005684 electric field Effects 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 238000003825 pressing Methods 0.000 claims 1
- 238000003795 desorption Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は洗浄装置に関し、特に洗
浄槽内でガラスやシリコンウェハー等の被洗浄物を帯電
させないように直流電圧と超音波を印加することにより
表面に吸着した荷電粒子を取り除くと共に、除去後の再
付着を防ぐことにより清浄な表面を得る洗浄装置であ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus, and in particular, applies a DC voltage and ultrasonic waves in a cleaning tank so as not to charge an object to be cleaned such as a glass or a silicon wafer to remove charged particles adsorbed on the surface. It is a cleaning device that removes and prevents re-adhesion after removal to obtain a clean surface.
【0002】[0002]
【従来の技術】半導体基板の洗浄等に用いられる従来の
洗浄装置として、水槽中に電極を設け半導体基板等の洗
浄対象物(「被洗浄物」という)を浸漬させて電界を印
加し、被洗浄物表面の不純物を除去する装置が提案され
ている(例えば特開平3-82029号公報、特開平4-75339号
公報、特開平2-303027号公報等参照)。図3は、従来の
洗浄装置として、直流印加電圧による微粒子除去装置の
洗浄原理を説明する図である。2. Description of the Related Art As a conventional cleaning apparatus used for cleaning a semiconductor substrate, an electrode is provided in a water bath, an object to be cleaned such as a semiconductor substrate (referred to as "substrate to be cleaned") is immersed, and an electric field is applied thereto. An apparatus for removing impurities on the surface of a cleaning object has been proposed (see, for example, JP-A-3-82029, JP-A-4-75339, JP-A-2-303027, etc.). FIG. 3 is a view for explaining the principle of cleaning a particle removing device using a DC applied voltage as a conventional cleaning device.
【0003】図3に示すように、純水37で満たした洗浄
槽30内に電極34、35を設置し、その間に被洗浄物33を置
き、電極34、35に電源36から電圧を印加し、電極34、35
間に電界を印加することにより被洗浄物33の表面に吸着
した正に帯電した粒子31は負電極35に移動し(図中矢印
方向)、負に帯電した粒子32は正電極34に移動して(図
中矢印方向)、被洗浄物33の表面を清浄にする。As shown in FIG. 3, electrodes 34 and 35 are placed in a cleaning tank 30 filled with pure water 37, an object 33 to be cleaned is placed between them, and a voltage is applied to the electrodes 34 and 35 from a power supply 36. , Electrodes 34, 35
By applying an electric field between them, the positively charged particles 31 adsorbed on the surface of the object 33 to be cleaned move to the negative electrode 35 (in the direction of the arrow in the figure), and the negatively charged particles 32 move to the positive electrode 34. (In the direction of the arrow in the figure) to clean the surface of the object 33 to be cleaned.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、前記従
来の洗浄装置では、まず被洗浄物33の表面の帯電が考慮
されていない。電極に電圧を印加すると、図3に示すよ
うに、被洗浄物33自体が分極して正極側の表面は負に、
負極側の表面は正に帯電する。However, in the above-described conventional cleaning apparatus, first, charging of the surface of the object 33 to be cleaned is not considered. When a voltage is applied to the electrode, as shown in FIG. 3, the object 33 itself is polarized and the surface on the positive electrode side becomes negative,
The surface on the negative electrode side is positively charged.
【0005】この状態になると、例えば正極側の被洗浄
物33の表面では負の荷電粒子32は除去できるが、残った
正の荷電粒子31はクーロン力により表面上により強く束
縛されてしまい、除去が望めない他、更に新たな正の荷
電粒子の付着が懸念される。In this state, for example, the negatively charged particles 32 can be removed from the surface of the cleaning object 33 on the positive electrode side, but the remaining positively charged particles 31 are more strongly bound on the surface by Coulomb force, and are removed. However, there is a concern that new positively charged particles may adhere.
【0006】次に、前記従来の洗浄装置では、一方向の
電界しか印加しないために、片方の被洗浄物33の表面か
らは正又は負のいずれか一方の荷電粒子しか除去できな
い。すなわち、正電極34側では正の荷電粒子31が残り、
負電極35側では負の荷電粒子32が残ってしまう。Next, in the conventional cleaning apparatus, since only one direction of electric field is applied, only one of positive and negative charged particles can be removed from the surface of one of the objects to be cleaned 33. That is, the positive charged particles 31 remain on the positive electrode 34 side,
The negative charged particles 32 remain on the negative electrode 35 side.
【0007】仮に、ここで電界の向きを反転させても洗
浄槽が1槽しか設けられていないために、それぞれの電
極表面に一度トラップされた荷電粒子が逆電界のために
泳動して、再び被洗浄物33の表面に付着してしまう。[0007] Even if the direction of the electric field is reversed, only one cleaning tank is provided, so that the charged particles once trapped on the surface of each electrode migrate due to the reverse electric field, and again. It adheres to the surface of the object 33 to be cleaned.
【0008】従って、本発明は上記従来技術の問題点を
解消し、被洗浄物表面の帯電を防ぐと同時に、超音波印
加により吸着種の脱離を促進させるとともに、被洗浄物
表面の両側に正と負の両方の電界を印加することによ
り、全ての荷電粒子を除去することを可能とする洗浄装
置を提供することを目的とする。Accordingly, the present invention solves the above-mentioned problems of the prior art, prevents the surface of the object to be cleaned from being charged, promotes the desorption of the adsorbed species by applying ultrasonic waves, and reduces An object of the present invention is to provide a cleaning apparatus that can remove all charged particles by applying both positive and negative electric fields.
【0009】[0009]
【課題を解決するための手段】前記目的を達成するため
に、本発明は、互いに平行な電極対を1又は複数備え、
洗浄液中に浸漬させ被洗浄物を前記電極間に配置して洗
浄をなす少なくとも第1、第2の液槽を備え、前記第1
の液槽では前記電極対間に所定の向きの電界を印加して
前記被洗浄物を洗浄し、前記第2の液槽では前記電極対
間に前記第1の液槽とは逆向きの電界を印加して前記被
洗浄物を洗浄するように構成された洗浄装置を提供す
る。In order to achieve the above object, the present invention comprises one or more pairs of electrodes parallel to each other,
The apparatus includes at least first and second liquid tanks that are immersed in a cleaning liquid and disposed between the electrodes to perform cleaning.
In the liquid tank, an electric field in a predetermined direction is applied between the pair of electrodes to wash the object to be cleaned. In the second liquid tank, an electric field opposite to the direction of the first liquid tank between the pair of electrodes in the second liquid tank. And a cleaning device configured to clean the object to be cleaned.
【0010】本発明においては、好ましくは、前記液槽
内に超音波発生手段を配設し、前記被洗浄物表面に超音
波を印加して荷電粒子の脱離を行うことを特徴とする。In the present invention, preferably, an ultrasonic wave generating means is provided in the liquid tank, and ultrasonic waves are applied to the surface of the object to be cleaned to separate charged particles.
【0011】本発明においては、好ましくは、前記被洗
浄物が接地されたことを特徴とする。In the present invention, preferably, the object to be cleaned is grounded.
【0012】[0012]
【作用】本発明によれば、互いに逆方向の電界が印加さ
れる2つの槽で2段階の洗浄を行うことにより、被洗浄
物表面の荷電粒子を全て除去することができる。また、
超音波を印加することにより被洗浄物表面に吸着してい
る正及び負の荷電粒子をともに効率よく被洗浄物表面か
ら脱離させることができる。さらに、本発明によれば、
被洗浄物にアースを設けたことにより、表面の帯電を防
ぎ、荷電粒子の再付着が回避され極めて清浄な表面を得
ることができる。According to the present invention, all the charged particles on the surface of the object to be cleaned can be removed by performing two-stage cleaning in two tanks to which electric fields in opposite directions are applied. Also,
By applying ultrasonic waves, both positive and negative charged particles adsorbed on the surface of the object to be cleaned can be efficiently desorbed from the surface of the object to be cleaned. Furthermore, according to the present invention,
By providing the ground to the object to be cleaned, the surface is prevented from being charged, and the reattachment of charged particles is avoided, so that an extremely clean surface can be obtained.
【0013】[0013]
【実施例】図面を参照して、本発明の実施例を以下に説
明する。図1は本発明の一実施例に係る洗浄装置の概略
構成を示す図であり、図2は洗浄原理を説明する図であ
る。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a view showing a schematic configuration of a cleaning apparatus according to one embodiment of the present invention, and FIG. 2 is a view for explaining the principle of cleaning.
【0014】図1を参照して、本実施例は、2段階の洗
浄を行うために2槽の洗浄槽10、11を設ける。第1槽10
と第2槽11ともに純水12で満たされており、平板の正電
極2と負電極3の組を複数組設置する。なお、図1で
は、各電極は水平方向に互いに平行に配設されている
が、垂直方向に配設してもよい。Referring to FIG. 1, in this embodiment, two cleaning tanks 10 and 11 are provided for performing two-step cleaning. First tank 10
The second tank 11 and the second tank 11 are both filled with pure water 12, and a plurality of pairs of flat electrode 2 and negative electrode 3 are provided. In FIG. 1, the electrodes are arranged in parallel in the horizontal direction, but may be arranged in the vertical direction.
【0015】電極2、3の表面は水の電気分解等の電気
化学反応を防ぐために絶縁皮膜(不図示)で覆われてい
る。そして、被洗浄物1は正電極2と負電極3の間に平
行に置かれ、被洗浄物1にはアース5が接続されてい
る。The surfaces of the electrodes 2 and 3 are covered with an insulating film (not shown) to prevent electrochemical reactions such as electrolysis of water. The object to be cleaned 1 is placed in parallel between the positive electrode 2 and the negative electrode 3, and a ground 5 is connected to the object to be cleaned 1.
【0016】また、荷電粒子の脱離を促進するために容
器の壁面に超音波発生板4を配設してある。Further, an ultrasonic wave generating plate 4 is provided on the wall surface of the container to promote desorption of charged particles.
【0017】図示の如く、電極の組数を増やせば増やす
程1度に洗浄できる被洗浄物1の個数が増加する。As shown in the figure, as the number of electrode sets is increased, the number of objects to be cleaned 1 which can be cleaned at one time increases.
【0018】第1槽10での洗浄が終了した後、被洗浄物
1は第1槽10での電極との位置関係を保ったままで第2
槽11へと移動する。例えば、図1の第1槽10の最上部の
被洗浄物は第2層11の最上部の電極間に置かれる。第2
槽11での印加電界の向きは第1槽11と逆にする。After the cleaning in the first tank 10 is completed, the object 1 to be cleaned is maintained in the second tank 10 while maintaining the positional relationship with the electrodes in the first tank 10.
Move to tank 11. For example, the object to be cleaned at the top of the first tank 10 in FIG. 1 is placed between the electrodes at the top of the second layer 11. Second
The direction of the applied electric field in the tank 11 is opposite to that in the first tank 11.
【0019】図2を参照して、本実施例における洗浄原
理を説明する。なお、図2には、図1に示す本実施例の
複数組の電極のうち一対の電極2、3のみが示されてい
る。Referring to FIG. 2, the principle of cleaning in this embodiment will be described. FIG. 2 shows only a pair of electrodes 2 and 3 among a plurality of sets of electrodes of the present embodiment shown in FIG.
【0020】被洗浄物1の表面に正の荷電粒子21と負の
荷電粒子22が付着しているものとする。第1槽10で電界
の向きは正電極2から負電極3であるから、被洗浄物1
の正電極2側の表面では負の荷電粒子22が正電極2の方
向へ力を受けて脱離し、正電極2へと泳動してそこに保
持される。被洗浄物1の負電極3側の表面では正の荷電
粒子21が負電極3の方向へ力を受けて脱離し、負電極3
へと泳動してそこに保持される。また、本実施例におい
ては、荷電粒子の脱離を促進されるために、図1の超音
波発生板4から超音波が印加される。It is assumed that positively charged particles 21 and negatively charged particles 22 adhere to the surface of the object 1 to be cleaned. Since the direction of the electric field in the first tank 10 is from the positive electrode 2 to the negative electrode 3, the object to be cleaned 1
On the surface on the side of the positive electrode 2, the negatively charged particles 22 are desorbed by receiving a force in the direction of the positive electrode 2, migrate to the positive electrode 2 and are held there. On the surface of the cleaning object 1 on the side of the negative electrode 3, the positively charged particles 21 are desorbed by receiving a force in the direction of the negative electrode 3.
And is retained there. Further, in the present embodiment, an ultrasonic wave is applied from the ultrasonic wave generating plate 4 of FIG. 1 in order to promote the desorption of the charged particles.
【0021】この段階では、被洗浄物1の正電極2側の
表面には正の荷電粒子が残り、被洗浄物1の負電極3側
には負の荷電粒子が残っている。At this stage, positive charged particles remain on the surface of the object 1 to be cleaned on the positive electrode 2 side, and negative charged particles remain on the surface of the object 1 to be cleaned 1 on the negative electrode 3 side.
【0022】なお、前記従来の洗浄装置ではここで洗浄
が終わっていた。しかも、図3に示すように前記従来の
洗浄装置では、被洗浄物33にはアースが取り付けられて
いないために、被洗浄物33の表面が帯電し、このため残
留荷電粒子との吸着力がより強くなっていた。In the above-described conventional cleaning apparatus, cleaning has been completed here. In addition, as shown in FIG. 3, in the conventional cleaning apparatus, since the ground is not attached to the cleaning target 33, the surface of the cleaning target 33 is charged, so that the adsorption power with the residual charged particles is reduced. Had become stronger.
【0023】これに対して本実施においては、図2に示
すように、被洗浄物1は残留荷電粒子の除去を行うため
に第2槽11へと進む。また、被洗浄物1にはアース5が
着けられているため、被洗浄物1表面の帯電が生じない
結果、残留荷電粒子の吸着力も前記従来の洗浄装置に比
べ弱くなっている。On the other hand, in the present embodiment, as shown in FIG. 2, the object 1 to be cleaned proceeds to the second tank 11 in order to remove residual charged particles. Further, since the ground 1 is attached to the object 1 to be cleaned, the surface of the object 1 to be cleaned is not charged, so that the adsorption power of the residual charged particles is weaker than that of the conventional cleaning apparatus.
【0024】第2槽11では第1槽10と逆向きの電界が被
洗浄物1に印加される結果、負電極7側の被洗浄物1の
表面に残っていた正の荷電粒子27は負電極7の方向に吸
引力を受けて脱離し、被洗浄物1の反対側表面に残って
いる負の荷電粒子28は正電極8の方向に力を受けて脱離
する。In the second tank 11, an electric field in a direction opposite to that of the first tank 10 is applied to the object 1 to be cleaned. As a result, the positive charged particles 27 remaining on the surface of the object 1 to be cleaned on the negative electrode 7 side become negative. The negatively charged particles 28 remaining on the surface on the opposite side of the object 1 to be cleaned are desorbed by receiving a force in the direction of the positive electrode 8.
【0025】このように、本実施例によれば、2段階の
洗浄を行うことにより被洗浄物表面の荷電粒子を全て除
去することができる。また、被洗浄物にアースを設ける
ことで表面の帯電を防ぐために荷電粒子の再付着も起こ
らず、清浄な表面が得られる。As described above, according to this embodiment, all charged particles on the surface of the object to be cleaned can be removed by performing the two-stage cleaning. Further, by providing a ground to the object to be cleaned, charged particles are prevented from re-adhering to prevent charging of the surface, and a clean surface can be obtained.
【0026】以上、本発明を上記実施例に即して説明し
たが、本発明は上記態様にのみ限定されるものでなく、
本発明の原理に準ずる各種態様を含む。Although the present invention has been described with reference to the above embodiments, the present invention is not limited to only the above embodiments.
Various modes according to the principle of the present invention are included.
【0027】[0027]
【発明の効果】以上説明したように、本発明によれば、
互いに逆方向の電界が印加される2つの槽で2段階の洗
浄を行うことにより、被洗浄物表面の荷電粒子を全て除
去することができると共に、超音波を印加することによ
り、被洗浄物表面に吸着している正及び負の荷電粒子を
ともに効率よく被洗浄物表面から脱離させることができ
るという効果を有する。さらに、本発明によれば、被洗
浄物にアースを設けることで、表面の帯電を防いでいる
ので荷電粒子の再付着がなく、非常に清浄な表面を得る
ことができる。As described above, according to the present invention,
By performing two-stage cleaning in two tanks to which electric fields in opposite directions are applied, all charged particles on the surface of the object to be cleaned can be removed, and by applying ultrasonic waves, the surface of the object to be cleaned can be removed. This has the effect that both the positive and negative charged particles adsorbed on the surface can be efficiently desorbed from the surface of the object to be cleaned. Furthermore, according to the present invention, since the surface is prevented from being charged by providing the ground to the object to be cleaned, there is no re-attachment of charged particles, and a very clean surface can be obtained.
【図1】本発明の一実施例の洗浄装置を示す図である。FIG. 1 is a view showing a cleaning apparatus according to one embodiment of the present invention.
【図2】本発明の一実施例の洗浄原理を説明する図であ
る。FIG. 2 is a diagram illustrating a cleaning principle of one embodiment of the present invention.
【図3】従来の洗浄装置を説明する図である。FIG. 3 is a diagram illustrating a conventional cleaning device.
1 被洗浄物 2、8 正電極 3、7 負電極 4 超音波発生板 5 アース 6、6′ 電源 10 第1槽 11 第2槽 12 純水 21、27 正の荷電粒子 22、28 負の荷電粒子 DESCRIPTION OF SYMBOLS 1 To-be-cleaned object 2,8 Positive electrode 3,7 Negative electrode 4 Ultrasonic generation plate 5 Ground 6,6 'Power supply 10 1st tank 11 2nd tank 12 Pure water 21,27 Positive charged particles 22,28 Negative charge particle
Claims (6)
浄液中に浸漬させ被洗浄物を前記電極間に配置して洗浄
をなす少なくとも第1、第2の液槽を備え、前記第1の
液槽では前記電極対間に所定の向きの電界を印加して前
記被洗浄物を洗浄し、前記第2の液槽では前記電極対間
に前記第1の液槽とは逆向きの電界を印加して前記被洗
浄物を洗浄するように構成された洗浄装置。1. An apparatus according to claim 1, further comprising one or more pairs of electrodes parallel to each other, at least first and second liquid tanks for immersing in a cleaning liquid and arranging an object to be cleaned between said electrodes for cleaning. In the liquid tank, an electric field in a predetermined direction is applied between the pair of electrodes to wash the object to be cleaned, and in the second liquid tank, an electric field opposite to the direction of the first liquid tank between the pair of electrodes in the second liquid tank. And a cleaning device configured to clean the object to be cleaned by applying pressure.
あと、前記被洗浄物を前記第1の液槽における配置状態
と同一の配置状態で前記第2の液槽で洗浄することを特
徴とする請求項1記載の洗浄装置。2. After the object to be cleaned is cleaned in the first liquid tank, the object to be cleaned is cleaned in the second liquid tank in the same arrangement state as that in the first liquid tank. The cleaning device according to claim 1, wherein
記被洗浄物表面に超音波を印加して荷電粒子の脱離を行
うことを特徴とする請求項1記載の洗浄装置。3. The cleaning apparatus according to claim 1, wherein an ultrasonic wave generating means is provided in the liquid tank, and charged particles are desorbed by applying ultrasonic waves to the surface of the object to be cleaned. .
る請求項1又は2記載の洗浄装置。4. The cleaning apparatus according to claim 1, wherein the object to be cleaned is grounded.
とを特徴とする請求項1ないし3のいずれか一に記載の
洗浄装置。5. The cleaning apparatus according to claim 1, wherein a DC electric field is applied between said pair of electrodes.
請求項1ないし4のいずれか一に記載の洗浄装置。6. The cleaning apparatus according to claim 1, wherein the cleaning liquid is pure water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8613195A JP2658963B2 (en) | 1995-03-17 | 1995-03-17 | Cleaning device for charged particles |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8613195A JP2658963B2 (en) | 1995-03-17 | 1995-03-17 | Cleaning device for charged particles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08264501A JPH08264501A (en) | 1996-10-11 |
| JP2658963B2 true JP2658963B2 (en) | 1997-09-30 |
Family
ID=13878161
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8613195A Expired - Lifetime JP2658963B2 (en) | 1995-03-17 | 1995-03-17 | Cleaning device for charged particles |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2658963B2 (en) |
-
1995
- 1995-03-17 JP JP8613195A patent/JP2658963B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08264501A (en) | 1996-10-11 |
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| Date | Code | Title | Description |
|---|---|---|---|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 19970506 |