JP2668945B2 - optical disk - Google Patents
optical diskInfo
- Publication number
- JP2668945B2 JP2668945B2 JP63149845A JP14984588A JP2668945B2 JP 2668945 B2 JP2668945 B2 JP 2668945B2 JP 63149845 A JP63149845 A JP 63149845A JP 14984588 A JP14984588 A JP 14984588A JP 2668945 B2 JP2668945 B2 JP 2668945B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- resin
- molecular weight
- optical disk
- heat resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title claims description 43
- 239000011347 resin Substances 0.000 claims description 41
- 229920005989 resin Polymers 0.000 claims description 41
- 239000000758 substrate Substances 0.000 claims description 37
- 238000005984 hydrogenation reaction Methods 0.000 claims description 31
- 229920000642 polymer Polymers 0.000 claims description 29
- 229920002554 vinyl polymer Polymers 0.000 claims description 21
- -1 vinyl aromatic hydrocarbon Chemical class 0.000 claims description 18
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 26
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 229920001400 block copolymer Polymers 0.000 description 7
- 230000007423 decrease Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 238000001746 injection moulding Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 6
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 6
- 150000001993 dienes Chemical class 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 6
- 239000004417 polycarbonate Substances 0.000 description 6
- 239000004926 polymethyl methacrylate Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 229920001519 homopolymer Polymers 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012760 heat stabilizer Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 239000012994 photoredox catalyst Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 230000000930 thermomechanical effect Effects 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- AHAREKHAZNPPMI-AATRIKPKSA-N (3e)-hexa-1,3-diene Chemical compound CC\C=C\C=C AHAREKHAZNPPMI-AATRIKPKSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- NJIDLJRHMJCJIV-UHFFFAOYSA-N C.C(CC)(=O)O Chemical compound C.C(CC)(=O)O NJIDLJRHMJCJIV-UHFFFAOYSA-N 0.000 description 1
- 229910002546 FeCo Inorganic materials 0.000 description 1
- 101150000419 GPC gene Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 239000007868 Raney catalyst Substances 0.000 description 1
- 229910000564 Raney nickel Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 description 1
- DSVGQVZAZSZEEX-UHFFFAOYSA-N [C].[Pt] Chemical compound [C].[Pt] DSVGQVZAZSZEEX-UHFFFAOYSA-N 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000012668 chain scission Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 150000002642 lithium compounds Chemical class 0.000 description 1
- 238000010551 living anionic polymerization reaction Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229920006132 styrene block copolymer Polymers 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は光ディスクに係り、特に、熱加工安定性等に
優れた、特定の分子量及び軟化点を有するポリビニルシ
クロヘキサン系樹脂より構成された基板を有する光ディ
スクに関する。The present invention relates to an optical disc, and more particularly, to a substrate composed of a polyvinylcyclohexane-based resin having a specific molecular weight and a softening point, which is excellent in thermal processing stability and the like. The present invention relates to an optical disk having the same.
[従来の技術] レーザーを用いた光学記録は高密度の情報記録、保
存、及び再生が可能であるため、近年その開発が積極的
に行なわれている。この様な光学記憶の一例として光デ
ィスクを挙げることが出来る。一般に光ディスクは、透
明な基板とその上にコートされた種々の記録媒体とから
基本的に構成される。[Prior Art] Optical recording using a laser is capable of high-density information recording, storage, and reproduction, and has been actively developed in recent years. An example of such optical storage is an optical disk. Generally, an optical disc is basically composed of a transparent substrate and various recording media coated thereon.
光ディスクの透明基板には無色透明な合成樹脂が用い
られるケースが多く、その代表的なものとしてポリカー
ボネート(以下、「PC」と略称する。)又はポリメチル
メタクリレート(以下、「PMMA」と略称する。)を挙げ
ることができる。これらの樹脂は無色透明性に秀いでる
他、夫々に固有の優れた性質を有するものではあるが、
光学材料、特に光ディスク基板としての要件を全て備え
ている訳ではなく、解決すべき問題点を有している。例
えば、PCにおいてはその芳香族環に起因する複屈折性の
問題があり、また、吸水性或いは透水性においても問題
がある。一方、PMMAにおいては、耐熱性、吸水性、靭性
の面における問題点がかねてより指摘されている。In many cases, a transparent substrate of an optical disc is made of a colorless and transparent synthetic resin, and a typical example thereof is polycarbonate (hereinafter, abbreviated as “PC”) or polymethyl methacrylate (hereinafter, abbreviated as “PMMA”). ). Although these resins excel in colorless transparency, they also have excellent properties unique to each,
Not all of the requirements for optical materials, especially optical disk substrates, are met, and there are problems to be solved. For example, PC has a problem of birefringence caused by the aromatic ring, and also has a problem of water absorption or water permeability. On the other hand, problems with heat resistance, water absorption, and toughness have been pointed out for PMMA.
このように、これらの樹脂は夫々固有の問題点を内在
させつつ使用に供されているのであるが、実際には更
に、これらの樹脂よりなる透明基板の上にコートされる
記録媒体との関係において、後述のような新たな問題が
生じている。As described above, each of these resins is used with inherent problems inherent therein. However, in practice, the relationship with a recording medium coated on a transparent substrate made of these resins is further increased. , A new problem as described below has arisen.
一方、記録媒体については、従来より光ディスクの用
途に応じて多岐にわたる開発が行なわれている。例え
ば、ライト・ワンス型と呼ばれる記録−再生専用のもの
では穴あけタイプのものが、またイレーザブル型と呼ば
れる、記録−再生−消去−再記録用のものでは、結晶転
移現象を利用した相転移タイプのもの、光磁気効果を利
用した光磁気タイプのもの等が知られている。これらの
記録媒体用材料は、ライト・ワンス型ではテルル又はそ
の酸化物、合金化合物等、イレーザブル型では、GdFe、
TbFe、GdFeCo、TbFeCoといった希土類−遷移金属のアモ
ルファス合金化合物等、無機系材料が主流とされてお
り、一般に高真空下でのスパッタリング等の乾式処法に
より、透明基板上に成膜することにより形成されてい
る。On the other hand, a wide variety of recording media have been conventionally developed according to the use of optical disks. For example, a write-once type dedicated to recording and reproduction is a drilling type, and an erasable type for recording-reproduction-erasing-re-recording is a phase transition type utilizing a crystal transition phenomenon. And a magneto-optical type utilizing the magneto-optical effect are known. Materials for these recording media include tellurium or its oxides in the write-once type, alloy compounds, etc., and GdFe in the erasable type,
Inorganic materials such as rare earth-transition metal amorphous alloy compounds such as TbFe, GdFeCo, and TbFeCo are mainly used, and are generally formed by forming a film on a transparent substrate by a dry process such as sputtering under high vacuum. Have been.
ところで、PC、PMMAの吸湿性及び透水性は、一方では
基板自身の吸湿時の膨張によるソリの問題を引き起こす
ものであるが、他方、基板を通しての水分の透過により
記録媒体の腐食を引き起こし、光ディスク基板の寿命を
縮める原因となっている。By the way, the hygroscopicity and water permeability of PC and PMMA cause, on the one hand, a problem of warpage due to expansion of the substrate itself when absorbing moisture, but on the other hand, the permeation of moisture through the substrate causes corrosion of the recording medium, and the optical disk This is a cause of shortening the life of the substrate.
また、基板用樹脂の耐熱性について更に言及すれば、
次のような問題がある。即ち、光ディスク、特にライト
・ワンス型、イレーザブル型等の光ディスクにおいて
は、記録の書き込み、消去時の記録媒体の温度は200℃
以上にもなる。このため、ディスク基板にこの熱が直接
かかることは無いにしても、記録の書き込み、消去時に
は基板が相当高温になることが予想され、耐熱性の低い
樹脂では、基板の変形或いはグループの変形等の問題が
起こり得る。Further, if further mentioning the heat resistance of the substrate resin,
There are the following problems. That is, in an optical disk, particularly in a write-once type, an erasable type or the like, the temperature of the recording medium at the time of writing and erasing the recording is 200 ° C.
That's all. For this reason, even if this heat is not directly applied to the disk substrate, it is expected that the substrate will become extremely hot at the time of writing or erasing the recording. Problems can occur.
一方、光ディスクの生産工程においては、基板或いは
記録媒体の経時変化防止等の目的で、熱処理工程を取り
入れることが多いが、生産性の向上のためには、できる
だけ高い処理温度で処理することにより処理時間を短縮
することが望まれる。この様な観点からも、樹脂の耐熱
性が低いと高い処理温度を採用することができず、生産
性を上げることができないという不具合がある。On the other hand, in the optical disk production process, a heat treatment process is often adopted for the purpose of preventing the substrate or the recording medium from changing over time. However, in order to improve the productivity, the process is performed by processing at the highest possible processing temperature. It is desired to reduce the time. From such a viewpoint, if the heat resistance of the resin is low, a high processing temperature cannot be adopted, and there is a problem that productivity cannot be increased.
このようなことから、光ディスクの生産工程或いは使
用状況の高温度に耐えるには、耐熱性の低いPMMAでは全
く不十分であり、従来においては専ら、より耐熱性の高
いPCが透明基板材料として検討されている。しかしなが
ら、PCでも必ずしも耐熱性が十分であるという評価を受
けているわけではなく、より高い耐熱性を備える樹脂材
料の出現が望まれている。For these reasons, PMMA with low heat resistance is not enough to withstand the high temperatures of the optical disc production process or usage conditions. Conventionally, PCs with higher heat resistance are exclusively considered as transparent substrate materials. Have been. However, PCs are not always evaluated as having sufficient heat resistance, and the emergence of resin materials having higher heat resistance is desired.
PC、PMMA等の従来の樹脂の欠点を補うものとして、特
開昭63−43910、特願昭62−157324において、ポリビニ
ルシクロヘキサン系樹脂を光ディスク基板として用いる
方法が提案されている。To compensate for the drawbacks of conventional resins such as PC and PMMA, Japanese Patent Application Laid-Open No. 63-43910 and Japanese Patent Application No. 62-157324 propose a method using a polyvinylcyclohexane-based resin as an optical disk substrate.
[発明が解決しようとする課題] しかしながら、ポリビニルシクロヘキサン系樹脂を用
いた場合においても、必ずしも高特性光ディスク基板が
得られるわけではなく、耐熱性等の面で満足し得る結果
が得られていないのが現状である。[Problems to be Solved by the Invention] However, even when a polyvinylcyclohexane-based resin is used, a high-performance optical disc substrate is not always obtained, and a satisfactory result in terms of heat resistance and the like is not obtained. Is the current situation.
本発明者等は、前記特許出願において提案されている
ポリビニルシクロヘキサン系樹脂を基板材料として用い
た光ディスクの製造上の問題等について詳細に検討した
結果、次のような知見を得た。The present inventors have studied in detail the problems in the production of an optical disk using a polyvinylcyclohexane-based resin as a substrate material and the like proposed in the above-mentioned patent application, and have obtained the following knowledge.
ポリビニルシクロヘキサン系樹脂は、通常、ビニル芳
香族系重合体の芳香族の水添により得られ、一般にポリ
スチレン同様の脆性高分子として知られている樹脂であ
る。The polyvinyl cyclohexane resin is a resin generally obtained by aromatic hydrogenation of a vinyl aromatic polymer and is generally known as a brittle polymer like polystyrene.
前述した様にライト・ワンス型、イレーザブル型等の
光ディスクにおいては、その使用状況、生産工程におい
て、相当の熱履歴を受けることから、樹脂基板に対して
高い耐熱性が要求される。また、ディスク基板様樹脂材
料としては、少なくとも射出成形の際の金型離型時に破
損しない程度の靭性も要求される。As described above, optical disks of the write-once type, erasable type and the like receive a considerable heat history in their use and production process, and therefore require high heat resistance to the resin substrate. In addition, the disk substrate-like resin material is required to have at least a toughness that does not cause damage during mold release during injection molding.
このような観点から、上述の従来の出願に記載される
ポリビニルシクロヘキサン系樹脂を用いて光ディスク基
板を製造する場合について検討を行なった結果、これら
従来の出願に開示される重合体では、上記要求特性を満
足し得ないことが判明した。即ち、核水添率が高く耐熱
性の高い重合体では、分子量が低く、射出成形時に破損
等が発生することなどから、満足なディスク基板が得ら
れなかった。一方、分子量低下が少ない重合体では、核
水添率が低く耐熱性が不十分であった。From such a point of view, as a result of studying the case of manufacturing an optical disc substrate using the polyvinylcyclohexane-based resin described in the above-mentioned conventional application, the polymers disclosed in these conventional applications have the above-mentioned required characteristics. Turned out to be unsatisfactory. That is, a polymer having a high nuclear hydrogenation rate and a high heat resistance has a low molecular weight and is likely to be damaged during injection molding. Therefore, a satisfactory disk substrate cannot be obtained. On the other hand, a polymer with a small decrease in molecular weight had a low nuclear hydrogenation rate and insufficient heat resistance.
本発明は上記従来の問題点を解決し、耐熱性に優れま
た成形性も良好なポリビニルシクロヘキサン系樹脂より
構成される基板を備える光ディスクを提供することを目
的とする。SUMMARY OF THE INVENTION It is an object of the present invention to solve the above-mentioned conventional problems and to provide an optical disc having a substrate made of polyvinyl cyclohexane resin having excellent heat resistance and good moldability.
[課題を解決するための手段及び作用] 本発明の光ディスクは、ビニル芳香族炭化水素重合体
セグメント含有率80重量%以上、核水添率90%以上で、
かつ、数平均分子量が50,000より大であり、軟化点が15
0℃以上のポリビニルシクロヘキサン系樹脂からなる基
板を有することを特徴とする。[Means and Actions for Solving the Problems] The optical disc of the present invention has a vinyl aromatic hydrocarbon polymer segment content of 80% by weight or more and a nuclear hydrogenation rate of 90% or more,
Moreover, the number average molecular weight is more than 50,000 and the softening point is 15
It is characterized by having a substrate made of polyvinyl cyclohexane-based resin at 0 ° C. or higher.
即ち、本発明者等は、前述のポリビニルシクロヘキサ
ン系樹脂の耐熱性、成形性の改善について鋭意検討した
結果、スチレン系重合体を特定の核水添率で核水添して
得られる、特定の分子量及び軟化点を備えるポリビニル
シクロヘキサン系樹脂を用いることにより、ライト・ワ
ンス型、イレーザブル型等の苛酷な熱的条件下でも有効
に使用し得る光ディスクを高い生産性で得ることができ
ることを見出し、本発明に到達した。That is, the present inventors have conducted intensive studies on the improvement of heat resistance and moldability of the above-mentioned polyvinylcyclohexane-based resin, and as a result, a styrene-based polymer obtained by nuclear hydrogenation at a specific nucleus hydrogenation rate is obtained. By using a polyvinylcyclohexane-based resin having a molecular weight and a softening point, the present inventors have found that an optical disk that can be used effectively under severe thermal conditions such as a write-once type and an erasable type can be obtained with high productivity. The invention has been reached.
本発明で用いるポリビニルシクロヘキサン系樹脂のビ
ニル芳香族炭化水素重合体セグメントの含有率が80重量
%未満であると、核水添後に得られる樹脂の耐熱性が低
下し、光ディスク基板としては不適当なものとなる。ま
た、核水添率が90%未満であると、得られる樹脂の耐熱
性の低下、複屈折の増大等の問題があり好ましくない。
また、数平均分子量が50,000以下であると樹脂の靭性が
乏しく、射出成形の際の金型離型時に基板の破損が起こ
る。また、軟化点が150℃未満であると、ライト・ワン
ス型、イレーザブル型等の光ディスクにおける記録の書
き込み、消去時の熱で、基板が反ったり、グルーブが変
形する等の問題が生じる。また、光ディスクの生産工程
での熱処理温度を下げなければならず、特に従来検討さ
れていたPCに比べ生産性が低下することとなる。When the content of the vinyl aromatic hydrocarbon polymer segment of the polyvinylcyclohexane-based resin used in the present invention is less than 80% by weight, the heat resistance of the resin obtained after nucleus hydrogenation decreases, and the resin is unsuitable as an optical disk substrate. It will be. Further, if the nuclear hydrogenation rate is less than 90%, there are problems such as a decrease in heat resistance of the obtained resin and an increase in birefringence, which is not preferable.
Further, when the number average molecular weight is 50,000 or less, the toughness of the resin is poor, and the substrate is damaged during mold release during injection molding. If the softening point is lower than 150 ° C., there arises a problem that the substrate is warped or a groove is deformed by heat at the time of writing or erasing a record in an optical disk such as a write-once type or an erasable type. In addition, the heat treatment temperature in the optical disc production process must be lowered, and the productivity will be lower than that of the PC that has been conventionally studied.
以下に本発明を詳細に説明する。 Hereinafter, the present invention will be described in detail.
本発明で用いられるポリビニルシクロヘキサン系樹脂
は、スチレン系重合体を核水添して得られる。The polyvinyl cyclohexane resin used in the present invention is obtained by nuclear hydrogenating a styrene polymer.
原料のスチレン系重合体としては、ビニル芳香族炭化
水素重合体或いはビニル芳香族炭化水素ブロック共重合
体が挙げられる。後者のビニル芳香族炭化水素ブロック
共重合体としてはビニル芳香族炭化水素重合体セグメン
ト(以下、「Aセグメント」と略称する。)少なくとも
1種以上の共役ジエン重合体セグメント7(以下、「B
セグメント」と略称する。)から成るものが挙げられ
る。Examples of the raw material styrene-based polymer include a vinyl aromatic hydrocarbon polymer and a vinyl aromatic hydrocarbon block copolymer. As the latter vinyl aromatic hydrocarbon block copolymer, a vinyl aromatic hydrocarbon polymer segment (hereinafter abbreviated as "A segment") at least one or more conjugated diene polymer segment 7 (hereinafter "B segment").
Abbreviated as "segment". ).
モノマーとして用いられるビニル芳香族炭化水素とし
ては、スチレン、p−メチルスチレン、α−メチルスチ
レン等を挙げることができ、特に代表的なものとしてス
チレンが挙げられる。Examples of the vinyl aromatic hydrocarbon used as a monomer include styrene, p-methylstyrene, α-methylstyrene, and the like, and styrene is particularly typical.
ビニル芳香族炭化水素重合体としては、これらのビニ
ル芳香族炭化水素1種よりなる単独重合体或いは2種以
上の共重合体が挙げられる。特に接着性等が要求される
場合には、上記ビニル芳香族炭化水素と、これと共重合
可能な、極性基を持つ不飽和単量体とを、ビニル芳香族
炭化水素重合体の特性が失なわれない範囲で共重合して
得られる共重合体を用いるのが好ましい。Examples of the vinyl aromatic hydrocarbon polymer include a homopolymer or a copolymer of two or more of these vinyl aromatic hydrocarbons. In particular, when adhesiveness or the like is required, the vinyl aromatic hydrocarbon and an unsaturated monomer having a polar group copolymerizable therewith lose the properties of the vinyl aromatic hydrocarbon polymer. It is preferable to use a copolymer obtained by copolymerization within a range not to be restricted.
次に、ビニル芳香族炭化水素ブロック共重合体中のA
セグメントとしては上述のビニル芳香族炭化水素重合体
と同様のものが挙げられる。また、ブロック共重合体中
のBセグメントの共役ジエンとしては1,3−ブタジエ
ン、イソプレン、2,3−ジメチル−1,3−ブタジエン、1,
3−ペンタジエン、1,3−ヘキサジエン等が挙げられ、特
に、1,3−ブタジエン、イソプレンが一般的である。A
セグメント及びBセグメントからなるブロック共重合体
は、いわゆるリビングアニオン重合と称せられる公知の
方法、例えば有機リチウム化合物を開始剤とし、ヘキサ
ン、ヘプタンの様な炭化水素溶媒中で重合する方法等に
より容易に得ることができる。なお、このようなブロッ
ク共重合体中のAセグメントの含有量は80重量%以上、
好ましくは90重量%以上、更に好ましくは93重量%以上
である。Aセグメントの含有量が80重量%未満の場合に
は、水素付加後に得られる樹脂の耐熱性が低下し、光デ
ィスク基板としては不適なものとなる。Next, A in the vinyl aromatic hydrocarbon block copolymer
Examples of the segment include those similar to the above-mentioned vinyl aromatic hydrocarbon polymer. Further, as the conjugated diene of the B segment in the block copolymer, 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene, 1,
Examples thereof include 3-pentadiene and 1,3-hexadiene. In particular, 1,3-butadiene and isoprene are common. A
The block copolymer comprising a segment and a B segment can be easily prepared by a known method called so-called living anionic polymerization, for example, a method in which an organic lithium compound is used as an initiator, and a method of polymerizing in a hydrocarbon solvent such as hexane and heptane. Obtainable. Incidentally, the content of the A segment in such a block copolymer is 80% by weight or more,
It is preferably at least 90% by weight, more preferably at least 93% by weight. When the content of the A segment is less than 80% by weight, the heat resistance of the resin obtained after hydrogenation is lowered, and it becomes unsuitable as an optical disk substrate.
本発明において、このような原料スチレン系重合体の
分子量は、数平均分子量で80,000以上であることが好ま
しい。スチレン系重合体の分子量が低過ぎると、水素付
加後得られる樹脂の耐熱性、靭性が低下する。分子量の
低下に伴う靭性の低下は、重合体中のジエン系重合体の
含有量が少いもの程著しい。従って、ジエン系重合体を
含まない重合体に関しては、数平均分子量が100,000よ
り大であることが好ましい。一方、分子量の上限につい
ては特に制限はないが、通常の場合、400,000以下であ
ることが好ましい。In the present invention, the molecular weight of such a raw material styrene-based polymer is preferably 80,000 or more in terms of number average molecular weight. If the molecular weight of the styrene polymer is too low, the heat resistance and toughness of the resin obtained after hydrogenation will decrease. The decrease in the toughness accompanying the decrease in the molecular weight is more remarkable as the content of the diene polymer in the polymer is smaller. Therefore, it is preferable that the number average molecular weight of the polymer not containing the diene polymer is larger than 100,000. On the other hand, the upper limit of the molecular weight is not particularly limited, but is usually preferably 400,000 or less.
ポリビニルシクロヘキサン系樹脂は、このようなスチ
レン系重合体を、芳香族水素化能を有する水素化触媒の
存在下で、核水添して得ることができる。ここで使用さ
れる水素化触媒としては、例えばニッケル、コバルト、
ルテニウム、ロジウム、白金、パラジウム等の金属又は
その酸化物、塩、錯体及びこれらの活性炭、ケイソウ
土、アルミナ等の担体に担持したもの等が挙げられる。
これらの中でも特にラネーニッケル、ラネーコバルト、
安定化ニッケル及びルテニウム、ロジウム又は白金のカ
ーボン又はアルミナ担持触媒が、反応性の面から好まし
い。The polyvinylcyclohexane-based resin can be obtained by hydrogenating such a styrene-based polymer in the presence of a hydrogenation catalyst having an aromatic hydrogenation ability. As the hydrogenation catalyst used here, for example, nickel, cobalt,
Examples thereof include metals such as ruthenium, rhodium, platinum and palladium, or oxides, salts and complexes thereof, and those supported on carriers such as activated carbon, diatomaceous earth and alumina.
Among these, Raney nickel, Raney cobalt,
Stabilized nickel and ruthenium, rhodium or platinum carbon or alumina supported catalysts are preferred from the standpoint of reactivity.
核水添反応は、50〜250kg/cm2の圧力、100〜200℃の
温度下にて、溶媒としてシクロヘキサン、メチルシクロ
ヘキサン、n−オクタン、デカリン、テトラリン、ナフ
サ等の飽和炭化水素系溶媒を用いて行なうのが好まし
い。The nuclear hydrogenation reaction uses a saturated hydrocarbon solvent such as cyclohexane, methylcyclohexane, n-octane, decalin, tetralin, or naphtha as a solvent at a pressure of 50 to 250 kg / cm 2 and a temperature of 100 to 200 ° C. It is preferable to carry out.
なお、通常、スチレン系重合体の核水添においては、
副反応として重合体の分子鎖の切断を伴う。この分子鎖
切断を防ぐために、水素化はできるだけ高い水素圧力
で、かつ短時間で行なうことが好ましい。Incidentally, usually, in the nuclear hydrogenation of the styrene polymer,
As a side reaction, the molecular chain of the polymer is cut. In order to prevent this molecular chain scission, it is preferable to carry out the hydrogenation at as high a hydrogen pressure as possible and in a short time.
核水添反応による芳香核の核水添率は90%以上、好ま
しくは95%以上である。核水添率が低く、90%未満であ
ると、得られる樹脂の耐熱性の低下、複屈折の増大等の
問題があり好ましくない。The nuclear hydrogenation rate of aromatic nuclei by the nuclear hydrogenation reaction is 90% or more, preferably 95% or more. When the nuclear hydrogenation rate is low and less than 90%, there are problems such as a decrease in heat resistance of the obtained resin and an increase in birefringence, which is not preferable.
本発明において、このようにして得られるポリビニル
シクロヘキサン系樹脂の分子量は、原料となるスチレン
系重合体の組成、分子量、水素化(水添)条件等に依存
し、またその適正範囲も、組成により異なるが、通常、
数平均分子量で50,000より大きく、好ましくは60,000よ
り大である。靭性の面からは、ジエン系重合体の含有量
が小であるもの程、分子量が高いことが要求され、ジエ
ン系重合体を含有しないものに関しては、分子量は60,0
00より大であり、好ましくは70,000より大であることが
必要である。分子量の上限は、成形性の面から規定され
るが、通常は数平均分子量で300,000以下である。ま
た、その軟化点は、サーモメカニカルアナライザーで測
定した軟化点で150℃以上、好ましくは160℃以上であ
る。In the present invention, the molecular weight of the polyvinylcyclohexane-based resin thus obtained depends on the composition, molecular weight, hydrogenation (hydrogenation) conditions and the like of the styrene-based polymer as a raw material, and the appropriate range also depends on the composition. Different, but usually
The number average molecular weight is more than 50,000, preferably more than 60,000. From the aspect of toughness, the smaller the content of the diene-based polymer, the higher the molecular weight is required, and for those not containing the diene-based polymer, the molecular weight is 60,0.
It should be greater than 00, preferably greater than 70,000. The upper limit of the molecular weight is defined from the viewpoint of moldability, but is usually 300,000 or less in number average molecular weight. The softening point thereof is 150 ° C or higher, preferably 160 ° C or higher, as measured by a thermomechanical analyzer.
このような本発明に係るポリビニルシクロヘキサン系
樹脂は、炭化水素系樹脂であるので、簡単な乾燥処理に
より、樹脂中の水分を除くことができ、射出成形等の成
形に供することができる。なお、成形にあたっては、成
形中の樹脂の劣化を防止するための熱安定剤、酸化防止
剤等の添加剤を必要に応じて加えることができる。Since such a polyvinylcyclohexane-based resin according to the present invention is a hydrocarbon-based resin, moisture in the resin can be removed by a simple drying treatment, and the resin can be used for molding such as injection molding. Upon molding, additives such as a heat stabilizer and an antioxidant for preventing deterioration of the resin during molding can be added as necessary.
本発明の光ディスクの基板の製造にあたっては、ま
ず、上記ポリビニルシクロヘキサン系樹脂に必要に応じ
て安定剤等の添加剤を加えてリボンブレンダー、タンブ
ラーブレンダー、ヘンシェルミキサー等で混合し、その
後、バンバリーミキサー、一軸押出機、二軸押出機等で
溶融混練し、ペレット形状とすることにより混合する。
しかして、このようにして得られたペレットを用い、成
形温度270〜330℃で射出成形することにより、透明性、
耐熱性等に優れ、光学歪の少ない光ディスク基板を得る
ことができる。In the production of the substrate of the optical disk of the present invention, first, an additive such as a stabilizer is added to the polyvinyl cyclohexane-based resin as needed, and mixed with a ribbon blender, a tumbler blender, a Henschel mixer, etc., and then a Banbury mixer, The mixture is melt-kneaded with a single-screw extruder, a twin-screw extruder, or the like, and pelletized to mix them.
Then, by using the pellets thus obtained, by injection molding at a molding temperature of 270 ~ 330 ℃, transparency,
It is possible to obtain an optical disc substrate having excellent heat resistance and a small optical distortion.
このような光ディスク基板を用いて本発明の光ディス
クを製造する際には、該基板表面に金属蒸着等によりTe
又はこれの酸化物、合金化合物等、又はTbFe、TbFeCo、
TbCo、DyFeCoといった希土類−遷移金属のアモルファス
合金化合物等の記録媒体の皮膜を設け、これらを更に保
護膜で覆う等の方法を採用することができる。When the optical disk of the present invention is manufactured using such an optical disk substrate, Te is formed on the surface of the substrate by metal vapor deposition or the like.
Or its oxides, alloy compounds, etc., or TbFe, TbFeCo,
A method of providing a film of a recording medium such as an amorphous alloy compound of a rare earth-transition metal such as TbCo or DyFeCo, and further covering these with a protective film can be adopted.
[実施例] 以下に実施例及び比較例を挙げて本発明をより具体的
に説明するが、本発明はその要旨を超えない限り、以下
の実施例に限定されるものではない。EXAMPLES Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples. However, the present invention is not limited to the following Examples as long as the gist of the present invention is not exceeded.
なお、以下の実施例及び比較例における各種物性は、
次の方法によって測定したものである。In addition, various physical properties in the following Examples and Comparative Examples,
It was measured by the following method.
数平均分子量: ゲル・パーミエーション・クロマトグラフィー(GP
C)により、テトラヒドロフラン(THF)を溶媒としてポ
リスチレンと同様に測定し、ポリスチレン換算の数平均
分子量を求めた。Number average molecular weight: gel permeation chromatography (GP
C), tetrahydrofuran (THF) was used as a solvent in the same manner as polystyrene, and the polystyrene-equivalent number average molecular weight was determined.
核水添率(%): ポリビニルシクロヘキサン系樹脂をテトラヒドロフラ
ン(THF)に溶解し、UV吸収により測定した。Nuclear hydrogenation rate (%): A polyvinylcyclohexane-based resin was dissolved in tetrahydrofuran (THF) and measured by UV absorption.
軟化点(℃): Dupont社製サーモメカニカルアナライザーを用いて、
5℃/分の昇温速度で軟化温度を測定した。なお、荷重
は5g、試験片の厚みは3mmとした。Softening point (℃): Using a thermomechanical analyzer manufactured by Dupont
The softening temperature was measured at a heating rate of 5 ° C./min. The load was 5 g and the thickness of the test piece was 3 mm.
光ディスクの耐熱性測定: 記録媒体、保護膜をつけた光ディスクを、PINフォト
ダイオード差動検出器をもった動特性検出器によりキャ
リアレベル(C/N比)(Al膜を用いた場合を0dBとする)
を測定した。測定は、100℃を2時間の熱処理の前後で
行ない、結果を比較した。Measurement of heat resistance of optical disk: The optical disk with a recording medium and a protective film was measured for the carrier level (C / N ratio) using a dynamic characteristic detector with a PIN photodiode differential detector (0 dB when an Al film was used). Do)
Was measured. The measurement was performed before and after heat treatment at 100 ° C. for 2 hours, and the results were compared.
なお、記録、再生条件は下記の通りとした。 The recording and reproducing conditions were as follows.
記録条件:CAV(定角速度)1800rpm 半径30mm位置、溝上記録 記録周波数0.5MHz duty50% 再生条件:CAV1800rpm 再生パワー0.8mW 実施例1 スチレン単独重合体の水添により得られた、数平均分
子量70,000、核水添率99%、軟化点171℃のポリビニル
シクロヘキサン100重量部に、熱安定剤として、テトラ
キス[メチレン−3−(3,5−ジ−t−ブチル−4−ヒ
ドロキシフェニル)]プロピオネートメタン(日本チバ
ガイギー社製Irganox1010)及びテトラキス(2,4−ジ−
t−ブチルフェニル−4,4′−ビフェニレンホスフォナ
イト(同Irgaphos−PEPQ)各0.2重量部を添加し、押出
機を用いて260℃で溶融混練を行ないペレット化した。Recording conditions: CAV (constant angular velocity) 1800 rpm Radius 30 mm position, recording on groove Recording frequency 0.5 MHz Duty 50% Reproduction conditions: CAV 1800 rpm Reproduction power 0.8 mW Example 1 Number average molecular weight 70,000, nucleus obtained by hydrogenation of styrene homopolymer As a heat stabilizer, tetrakis [methylene-3- (3,5-di-t-butyl-4-hydroxyphenyl)] propionate methane was added to 100 parts by weight of polyvinylcyclohexane having a hydrogenation rate of 99% and a softening point of 171 ° C. (Nippon Ciba-Geigy Irganox 1010) and tetrakis (2,4-di-
Each 0.2 parts by weight of t-butylphenyl-4,4'-biphenylenephosphonite (the same Irgaphos-PEPQ) was added, and the mixture was melt-kneaded at 260 ° C. using an extruder to form pellets.
このペレットを射出成形機(各機社製「M−140A」)
を用いて、可動金型側にグルーブ付スタンパーを取り付
け、樹脂温度300℃で厚さ1.2mm、直径130mmの円盤状光
ディスク基板を形成した。Injection molding machine for these pellets ("M-140A" manufactured by each machine)
Using, a stamper with a groove was attached to the movable mold side to form a disk-shaped optical disc substrate having a resin temperature of 300 ° C. and a thickness of 1.2 mm and a diameter of 130 mm.
得られた基板をスパッタリング装置に装入し、まず8
×10-7torr以下まで排気し、ArとO2との混合ガスを用い
てTaターゲットの反応性スパッタを行ないTa2O5からな
る干渉層(厚さ800Å)を形成した。次いで、Tbターゲ
ット及びFeCoターゲットを用いたArガスによる2元同時
スパッタにより、TbFeCoの記録層(厚さ300Å)を設け
た。更に、Tiチップを配置したAlターゲットをArガス中
でスパッタして厚さ300Åの反射層を形成した。The obtained substrate was charged into a sputtering apparatus, and first, 8
The exhaust was evacuated to × 10 -7 torr or less, and reactive sputtering of a Ta target was performed using a mixed gas of Ar and O 2 to form an interference layer (thickness 800 Å) made of Ta 2 O 5 . Next, a TbFeCo recording layer (thickness: 300 mm) was provided by binary simultaneous sputtering using Ar gas using a Tb target and an FeCo target. Further, an Al target on which a Ti chip was placed was sputtered in Ar gas to form a 300 Å thick reflective layer.
得られた光ディスクの熱処理前のキャリアレベル(C/
N比)は60.8dBであり、熱処理後も変化がなかった。ま
た、グルーブ形状にも変化はなかった。The carrier level (C /
The N ratio) was 60.8 dB, which was unchanged after the heat treatment. In addition, there was no change in the groove shape.
実施例2 アニオン重合により合成したスチレン−ブタジエン−
スチレンブロック共重合体(ブタジエン含量5重量%)
を核水添して得られた数平均分子量61,000、核水添率99
%、軟化点165℃のポリビニルシクロヘキサン−(エチ
レン−ブテン−1)−ビニルシクロヘキサンブロック共
重合体を用い、実施例1と同様に基板成形、記録層形成
を行なった。Example 2 Styrene-butadiene-synthesized by anionic polymerization
Styrene block copolymer (butadiene content 5% by weight)
Number average molecular weight 61,000 obtained by nuclear hydrogenation, nuclear hydrogenation rate 99
%, A polyvinyl cyclohexane- (ethylene-butene-1) -vinyl cyclohexane block copolymer having a softening point of 165 ° C. was used to form a substrate and form a recording layer in the same manner as in Example 1.
得られた光ディスクの熱処理前のキャリアレベル(C/
N比)は60.5dBであり、熱処理後も変化がなかった。ま
た、グルーブ形状にも変化はなかった。The carrier level (C /
The N ratio) was 60.5 dB, which was unchanged after the heat treatment. In addition, there was no change in the groove shape.
比較例1 スチレン単独重合体を核水添して得られた、数平均分
子量35,000、核水添率97%、軟化点156℃のポリビニル
シクロヘキサンを用いて、実施例1と同様に射出成形を
行なった。その結果、分子量が低く、樹脂が脆いため、
金型離型時に基板にクラックが入り、正常な基板が得ら
れなかった。従って、光ディスクとしての評価は行なえ
なかった。Comparative Example 1 Injection molding was performed in the same manner as in Example 1 using polyvinylcyclohexane having a number average molecular weight of 35,000, a nucleus hydrogenation rate of 97%, and a softening point of 156 ° C., which was obtained by nuclear hydrogenation of a styrene homopolymer. Was. As a result, the molecular weight is low and the resin is brittle,
A normal substrate could not be obtained because the substrate was cracked when the mold was released. Therefore, it cannot be evaluated as an optical disc.
比較例2 スチレン単独共重合体を核水添して得た、数平均分子
量80,000、核水添率82%、軟化点125℃のビニルシクロ
ヘキサン−スチレン共重合体を用いて、実施例1と同様
に基板成形、記録層形成を行なった。Comparative Example 2 A vinylcyclohexane-styrene copolymer having a number-average molecular weight of 80,000, a nuclear hydrogenation rate of 82%, and a softening point of 125 ° C., obtained by subjecting a styrene homopolymer to nuclear hydrogenation, was the same as in Example 1. Then, a substrate was formed and a recording layer was formed.
得られた光ディスクに熱処理を施したところ、耐熱性
が低いためにグルーブ形状が変化した。When the obtained optical disk was subjected to heat treatment, the groove shape changed due to low heat resistance.
以上の結果をまとめて第1表に示す。 Table 1 summarizes the above results.
第1表より明らかなように、本発明によれば、耐熱
性、光磁気記録特性に優れた光ディスクが提供される。 As is clear from Table 1, according to the present invention, an optical disc having excellent heat resistance and magneto-optical recording characteristics is provided.
[発明の効果] 以上詳述した通り、本発明の光ディスクによれば、耐
熱性、透明性等に優れ、低吸湿性、低複屈折性で光特性
が著しく良好な光ディスクであって、その基板成形性、
生産性も良好な光ディスクが提供される。[Effects of the Invention] As described in detail above, according to the optical disc of the present invention, the optical disc is excellent in heat resistance, transparency, etc., has low moisture absorption, low birefringence, and has remarkably good optical characteristics. Moldability,
An optical disk with good productivity is provided.
Claims (1)
有率80重量%以上、核水添率90%以上で、かつ、数平均
分子量が50,000より大であり、軟化点が150℃以上のポ
リビニルシクロヘキサン系樹脂からなる基板を有するこ
とを特徴とする光ディスク。1. Polyvinylcyclohexane having a vinyl aromatic hydrocarbon polymer segment content of 80% by weight or more, a nuclear hydrogenation rate of 90% or more, a number average molecular weight of more than 50,000, and a softening point of 150 ° C. or more. An optical disc having a substrate made of a resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63149845A JP2668945B2 (en) | 1988-06-17 | 1988-06-17 | optical disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63149845A JP2668945B2 (en) | 1988-06-17 | 1988-06-17 | optical disk |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01318015A JPH01318015A (en) | 1989-12-22 |
| JP2668945B2 true JP2668945B2 (en) | 1997-10-27 |
Family
ID=15483911
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63149845A Expired - Lifetime JP2668945B2 (en) | 1988-06-17 | 1988-06-17 | optical disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2668945B2 (en) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2022027A1 (en) * | 1989-07-28 | 1991-01-29 | Yoshinori Suga | Substrate of optical disc |
| JP2995884B2 (en) * | 1991-03-18 | 1999-12-27 | 三菱化学株式会社 | Hydrogenated vinyl aromatic hydrocarbon polymer composition and optical disk substrate |
| US6433102B1 (en) | 1998-12-04 | 2002-08-13 | Nippon Zeon Co., Ltd. | Hydrogenated polymers, resin composition, and process for producing substrate for information-recording medium |
| DE19921943A1 (en) * | 1999-05-12 | 2000-11-16 | Bayer Ag | Substrate for optical data storage, based on homo-, co- and/or block polymers of vinylcyclohexane, and has specified moment of inertia and specific density |
| US20020061981A1 (en) | 1999-06-11 | 2002-05-23 | Donald Robert J. | Compositions comprising hydrogenated block copolymers and end-use applications thereof |
| US6426390B1 (en) | 1999-06-11 | 2002-07-30 | Dow Global Technology Inc. | Hydrogenated block copolymer compositions |
| US20020061982A1 (en) | 1999-06-11 | 2002-05-23 | Donald Robert J. | Compositions comprising hydrogenated block copolymers and end-use applications thereof |
| AU5008800A (en) * | 1999-06-11 | 2001-01-02 | Dow Chemical Company, The | Hydrogenated block copolymers and optical media discs produced therefrom |
| AU5588100A (en) * | 1999-06-11 | 2001-01-02 | Dow Chemical Company, The | Compositions comprising hydrogenated block copolymers and end-use applications thereof |
| JP4224655B2 (en) * | 1999-08-12 | 2009-02-18 | 日本ゼオン株式会社 | Alicyclic hydrocarbon copolymer |
| US6299802B1 (en) | 1999-09-08 | 2001-10-09 | The Dow Chemical Company | Method of producing optical media discs from hydrogenated block copolymers |
| US20040077795A1 (en) * | 2001-01-25 | 2004-04-22 | Kiyonari Hashizume | Hydrogenated styrene-conjugated diene/styrene block copolymer and process for production thereof |
-
1988
- 1988-06-17 JP JP63149845A patent/JP2668945B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01318015A (en) | 1989-12-22 |
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