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JP2701489B2 - Turbo molecular pump - Google Patents
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JP2701489B2 - Turbo molecular pump - Google Patents

Turbo molecular pump

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Publication number
JP2701489B2
JP2701489B2 JP1310012A JP31001289A JP2701489B2 JP 2701489 B2 JP2701489 B2 JP 2701489B2 JP 1310012 A JP1310012 A JP 1310012A JP 31001289 A JP31001289 A JP 31001289A JP 2701489 B2 JP2701489 B2 JP 2701489B2
Authority
JP
Japan
Prior art keywords
gas
molecular pump
polishing
tmp
wing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1310012A
Other languages
Japanese (ja)
Other versions
JPH03168387A (en
Inventor
重一 川口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP1310012A priority Critical patent/JP2701489B2/en
Publication of JPH03168387A publication Critical patent/JPH03168387A/en
Application granted granted Critical
Publication of JP2701489B2 publication Critical patent/JP2701489B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、半導体製造装置を始めとする各種の製造分
野等に広く適用可能なターボ分子ポンプに関するもので
ある。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a turbo molecular pump that can be widely applied to various manufacturing fields such as a semiconductor manufacturing apparatus.

[従来の技術] ターボ分子ポンプ(以下、TMPと略称する)は、第5
図に概略図示されるように、外筒1内に回転可能にロー
タ2を配設し、該ロータ2外周に多数の回転翼3を一体
突設するとともに、これらの回転翼3間に、前記外筒1
内周にスペーサ4を介して挾着支持させた多数の固定翼
5を交互に差し込んでタービン6を形成し、吸気口7よ
り吸入したガスをタービン6で叩き飛ばし排気口8から
強制排気するものである。この種TMPは、排気能力にお
いて他の真空ポンプに抜きんでているため、半導体製造
装置その他の超高真空分野に広く利用されている。翼の
製造方法については、回転翼3は切削加工又は放電加工
でアルミ合金製のロータ2外周に一体的に作られ、固定
翼5はステンレス製(又はアルミ製)の半円環状ディス
ク所要位置にスリットを入れた後折曲げ加工を施して作
られる。加工後は、何れも超音波洗浄を施した程度でTM
P本体に組み付けられ、実用に供される。
[Prior Art] A turbo molecular pump (hereinafter abbreviated as TMP) is a fifth type.
As schematically shown in the drawing, a rotor 2 is rotatably disposed in an outer cylinder 1, and a number of rotors 3 are integrally protruded around the outer periphery of the rotor 2. Outer cylinder 1
A turbine 6 is formed by alternately inserting a number of fixed blades 5 sandwiched and supported by a spacer 4 on an inner periphery thereof, and a turbine 6 is formed. It is. This type of TMP is widely used in semiconductor manufacturing equipment and other ultra-high vacuum fields, because it is superior to other vacuum pumps in exhaust capacity. Regarding the method of manufacturing the blade, the rotor 3 is formed integrally with the outer periphery of the rotor 2 made of aluminum alloy by cutting or electric discharge machining, and the fixed blade 5 is placed at a required position of a semi-annular disk made of stainless steel (or aluminum). After slitting, it is made by bending. After processing, only the degree of ultrasonic cleaning
It is assembled to the P body and put to practical use.

[発明が解決しようとする課題] ところで、この種TMPの到達圧力は、ベーキング処理
後において10-10Torr台であり、磁気軸受形のTMPでさえ
10-11Torr台を達成することは至難とされている。
[Problems to be Solved by the Invention] By the way, the ultimate pressure of this type of TMP is in the order of 10 -10 Torr after the baking process, and even a magnetic bearing type TMP is used.
Achieving the 10 -11 Torr range is considered extremely difficult.

そこで、到達圧力を下げるため、本発明者が種々検討
した結果、次のようなことが次第に明らかとなった。す
なわち、翼加工の際に機械加工等を施すため、翼となる
母材表面の結晶が変型、破壊されるとともに、潤滑材、
研磨剤などが母材に食い込み、その結果、それらを吸蔵
物とする複雑な変質層が形成される。その吸蔵物は水素
ガス等であったり、反応性に富むガス放出物質であった
りする。しかも、その変質層は多孔性の酸化物質で覆わ
れ、ガス分子を吸着させ易い表面状態をとる。したがっ
て、TMPはこのような加工によりつくられた翼を使用す
るため、排気中に、吸蔵物の脱離、分解蒸発によるガス
放出や、新たに吸着したガス分子の脱離によるガス放出
を生じ、これが排気能力を低下させる主要因になってい
ると考えられる。
Then, as a result of various studies by the present inventor to lower the ultimate pressure, the following has been gradually clarified. In other words, in order to perform machining and the like at the time of wing processing, the crystal on the base material surface that becomes the wing is deformed and destroyed, and the lubricant,
Abrasives and the like bite into the base material, and as a result, a complex deteriorated layer using them as occlusion materials is formed. The occluded material may be hydrogen gas or the like, or a highly reactive gas releasing substance. In addition, the altered layer is covered with a porous oxidizing substance, and has a surface state in which gas molecules are easily adsorbed. Therefore, because TMP uses wings made by such processing, desorption of occluded substances, gas emission by decomposition and evaporation, and gas emission by desorption of newly adsorbed gas molecules occur in exhaust gas. This is considered to be the main factor that lowers the exhaust capacity.

本発明は、このような考察によりなされたものであっ
て、ガス放出の問題に善処することにより、従来に比べ
て排気性能の向上されたTMPを提供することを目的とし
ている。
The present invention has been made in view of such considerations, and an object of the present invention is to provide a TMP with improved exhaust performance as compared with the related art by taking good care of the problem of gas release.

[課題を解決するための手段] 本発明は、かかる目的を達成するために、次のような
手段を講じたものである。
[Means for Solving the Problems] The present invention employs the following means to achieve the above object.

すなわち、本発明に係るTMPは、固定翼と回転翼の表
面を、ガス放出の原因となる吸蔵物が少なく新たなガス
分子の吸着も防止できる程度の鏡面に設けていることを
特徴とする。また、鏡面仕上げには、電解研磨と化学研
磨との複合研磨を施す手法を採用する。
That is, the TMP according to the present invention is characterized in that the surfaces of the fixed wing and the rotary wing are provided on a mirror surface having a small amount of occluded substances causing gas release and preventing the adsorption of new gas molecules. For mirror finishing, a method of performing combined polishing of electrolytic polishing and chemical polishing is employed.

[作用] 本発明のごとく、TMPの両翼表面にガス放出性物質を
吸蔵せず、それがガスの吸着も許容しない鏡面である
と、排気中にガス放出を生じることが極めて少なくな
る。このため、これが原因でTMPの排気性能を低下させ
ていた従来の不具合を有効に解消することができる。
[Effect] As in the present invention, when a gas-releasing substance is not occluded on the surfaces of both wings of the TMP and is a mirror surface which does not allow the adsorption of gas, the generation of gas in the exhaust gas is extremely reduced. For this reason, it is possible to effectively solve the conventional problem that causes the exhaust performance of the TMP to be reduced due to this.

また、その鏡面仕上げを複合研磨を通じて行うと、吸
蔵物を含んだ変質層を電解研磨により溶解・除去して光
沢面にできる上に、電解研磨により生じる電解生成物を
化学研磨を併用することによって消失させることができ
るので、結果的に、両翼表面は緻密でクリーンな鏡面に
仕上げられることになる。
In addition, when the mirror finish is performed through composite polishing, the deteriorated layer containing occlusions can be dissolved and removed by electrolytic polishing to make a glossy surface, and the electrolytic product generated by electrolytic polishing is used in combination with chemical polishing. As a result, both wing surfaces can be finished to a dense and clean mirror surface.

[実施例] 以下、本発明の一実施例を第1図〜第4図を参照して
説明する。なお、第5図と共通する部分には同一符号を
付している。
[Embodiment] One embodiment of the present invention will be described below with reference to FIGS. Parts common to those in FIG. 5 are denoted by the same reference numerals.

この実施例では、一般的な機械加工によってつくられ
た第1図図示のロータ2全体(但しシャフトとの嵌合部
2aを除く)と、第2図図示の固定翼5の全体とに、加工
後、複合研磨を施す。
In this embodiment, the entire rotor 2 shown in FIG.
2a) and the entire fixed wing 5 shown in FIG. 2 is subjected to composite polishing after processing.

複合研磨は、在来の電解研磨装置をベースとし、これ
に化学研磨の要素を取り入れるという形で実現する。す
なわち、一般的な電解研磨は、電解槽中に電解液を入
れ、その中に工作物を浸漬させて陽極とし、陰極に不溶
性の金属を用いて通電することで工作物の表面を溶解さ
せ陰極に金属を析出させるものである(図示省略)。こ
のため、ロータ2及び固定翼5に対して機械加工を施し
た部分に生じている目に見えない変質層を除去すること
ができ、同時に、凸部を凹部よりも優先的に溶解させて
平滑面を得ることができる。しかし、このままでは電解
生成物が表面を覆い、良質の鏡面が得られない。そこで
処理温度、処理液を化学研磨に近い領域に設定し、電流
の流し方に工夫を凝らすことで、上記の過程において電
解生成物が工作物の表面を覆わないようにする。これに
より、回転翼3や固定翼5の表面は金属結晶構造が破壊
されず、その上に緻密で安定した鏡面をなす酸化薄膜が
形成されることになる。このようにして得られる表面の
SEM観察状態は第3図の如く平滑なものとなり、これを
従来の切削加工又は放電加工による図(第4図)と比較
すると、その表面粗度に驚くほど顕著な相違があるのが
認められる。表面の凹凸に沿って幾何学的表面積を計算
した結果、本実施例によると従来の約1/20程度にまで平
滑化できることが確認された。
Combined polishing is realized based on a conventional electropolishing apparatus and incorporating elements of chemical polishing. That is, in general electrolytic polishing, an electrolytic solution is put in an electrolytic cell, a workpiece is immersed in the electrolytic solution to serve as an anode, and an insoluble metal is used as a cathode to dissolve the surface of the workpiece to dissolve the cathode. To deposit metal on the surface (not shown). This makes it possible to remove the invisible altered layer generated in the portion where the rotor 2 and the fixed blade 5 have been machined, and at the same time, dissolve the convex portions preferentially over the concave portions and smoothen them. Face can be obtained. However, in this state, the electrolytic product covers the surface, and a high quality mirror surface cannot be obtained. Therefore, the processing temperature and the processing liquid are set in a region close to the chemical polishing, and the way of flowing the current is devised so that the electrolytic product does not cover the surface of the workpiece in the above process. As a result, the surfaces of the rotor blades 3 and the fixed blades 5 are not destroyed by the metal crystal structure, and a dense and stable mirror-formed oxide thin film is formed thereon. Of the surface obtained in this way
The SEM observation state becomes smooth as shown in FIG. 3, and when this is compared with the figure obtained by conventional cutting or electric discharge machining (FIG. 4), it is recognized that there is a surprisingly significant difference in the surface roughness. . As a result of calculating the geometric surface area along the irregularities of the surface, it was confirmed that according to the present example, the surface could be smoothed to about 1/20 of the conventional one.

しかして、このような鏡面を有したロータ3及び固定
翼5をTMP本体に組み付け、吸気口7にチャンバ等の使
用目的を接続して稼動すると、排気中に回転翼3や固定
翼5の表面から実際の排気とは無関係な水素ガス等が放
出されることが殆どなくなり、また、排気しようとする
ガスや前回使用時の残留ガス等がそれらの表面に対する
吸着/脱離を繰り返す中で排気を妨げていた不具合も有
効に解決することができる。このため、図示TMPによる
と排気の立ち上げ時間を短縮し、これによって運転コス
トも低減できるとともに、最も重要なファクターである
到達圧力を10-11Torr台以下にまで伸ばすためにも極め
て有効なものとなり得る。
When the rotor 3 and the fixed wing 5 having such mirror surfaces are assembled to the TMP main body, and the intended use of a chamber or the like is connected to the intake port 7 for operation, the surface of the rotary wing 3 or the fixed wing 5 is exhausted during exhaust. Hydrogen gas, etc., which is unrelated to the actual exhaust gas, is hardly released, and the exhaust gas is exhausted while the gas to be exhausted or the residual gas from the previous use repeatedly adsorbs / desorbs on those surfaces. The hindrance can be effectively solved. For this reason, according to the illustrated TMP, the startup time of exhaust gas is shortened, which can reduce operating costs and is extremely effective in increasing the ultimate pressure, which is the most important factor, to below 10 -11 Torr. Can be

なお、翼以外の部品(例えばスペーサ4、外筒1など
の真空領域に臨む部品、或いは使用対象であるチャンバ
等)にも本発明に係る処理を施すことで更にガス放出の
少ないTMPを実現することができる。
It should be noted that components other than the wings (for example, components facing the vacuum region such as the spacer 4 and the outer cylinder 1 or chambers to be used) are also subjected to the process according to the present invention, thereby realizing a TMP with less gas emission. be able to.

[発明の効果] 本発明のTMPは、以上の如く固定翼と回転翼の表面を
緻密でクリーンな鏡面とすることにより、排気に有害な
ガス放出量を低減して排気を実効ならしめることができ
る。そして、これによりターボ分子ポンプの排気速度や
到達真空度などの諸特性を従来に比べて確実に向上させ
ることが可能になる。また、複合研磨法によるとそのよ
うな鏡面が比較的容易に実現可能となる。
[Effects of the Invention] As described above, the TMP of the present invention can reduce the amount of gas harmful to the exhaust gas and make the exhaust gas effective by making the surfaces of the fixed wing and the rotary wing a dense and clean mirror surface. it can. As a result, various characteristics such as the evacuation speed and the ultimate vacuum of the turbo-molecular pump can be surely improved as compared with the related art. According to the composite polishing method, such a mirror surface can be realized relatively easily.

【図面の簡単な説明】[Brief description of the drawings]

第1図〜第4図は本発明の一実施例を示し、第1図はロ
ータを一部断面にして示す斜視図、第2図は固定翼の斜
視図、第3図は翼表面の断面図である。第4図は第3図
に対応して従来の翼表面を示す断面図、第5図は一般的
なTMPの縦断面図である。 3……回転翼、5……固定翼
1 to 4 show an embodiment of the present invention, FIG. 1 is a perspective view showing a rotor in partial cross section, FIG. 2 is a perspective view of a fixed wing, and FIG. 3 is a cross section of a wing surface. FIG. FIG. 4 is a sectional view showing a conventional blade surface corresponding to FIG. 3, and FIG. 5 is a longitudinal sectional view of a general TMP. 3 ... rotor wing, 5 ... fixed wing

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】固定翼と回転翼を具備してなるターボ分子
ポンプであって、前記両翼の表面を、電解研磨と化学研
磨との複合研磨を施すことによりガス放出の原因となる
吸蔵物が少なく新たなガス分子の吸着も防止できる程度
の鏡面に設けていることを特徴とするターボ分子ポン
プ。
1. A turbo-molecular pump comprising a fixed wing and a rotary wing, wherein an occluded substance causing gas release is obtained by subjecting the surfaces of the two wings to a combined polishing of electrolytic polishing and chemical polishing. A turbo-molecular pump characterized in that it is provided on a mirror surface that can prevent the adsorption of new gas molecules.
JP1310012A 1989-11-28 1989-11-28 Turbo molecular pump Expired - Fee Related JP2701489B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1310012A JP2701489B2 (en) 1989-11-28 1989-11-28 Turbo molecular pump

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1310012A JP2701489B2 (en) 1989-11-28 1989-11-28 Turbo molecular pump

Publications (2)

Publication Number Publication Date
JPH03168387A JPH03168387A (en) 1991-07-22
JP2701489B2 true JP2701489B2 (en) 1998-01-21

Family

ID=18000091

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1310012A Expired - Fee Related JP2701489B2 (en) 1989-11-28 1989-11-28 Turbo molecular pump

Country Status (1)

Country Link
JP (1) JP2701489B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3013083B2 (en) * 1998-06-23 2000-02-28 セイコー精機株式会社 Turbo molecular pump

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5615001B2 (en) * 1972-08-01 1981-04-08
JPS5528812A (en) * 1978-08-19 1980-02-29 Canon Inc Printing wheel selection type printing apparatus
JPS58102021U (en) * 1981-12-28 1983-07-11 日進精機株式会社 Cutting machine
JPS5920500A (en) * 1982-07-23 1984-02-02 Toshiba Corp Electropolishing method
JPS62203721A (en) * 1986-03-03 1987-09-08 Inoue Japax Res Inc Turbopump
JPS62278299A (en) * 1986-05-27 1987-12-03 Ishikawajima Harima Heavy Ind Co Ltd Electrolytic polishing method
JP2508520B2 (en) * 1987-02-09 1996-06-19 三菱マテリアル株式会社 Electrolyte for Zr and Zr alloy electrolytic polishing
JPS63283818A (en) * 1987-05-13 1988-11-21 Shizuoka Seiki Co Ltd Finishing method by electro-chemical machining
JPH01259199A (en) * 1988-04-11 1989-10-16 Kawasaki Steel Corp Manufacture of grain-oriented silicon steel sheet with low iron loss

Also Published As

Publication number Publication date
JPH03168387A (en) 1991-07-22

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