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JP2705752B2 - Method of measuring refractive index and method of measuring property characteristics - Google Patents
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JP2705752B2 - Method of measuring refractive index and method of measuring property characteristics - Google Patents

Method of measuring refractive index and method of measuring property characteristics

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Publication number
JP2705752B2
JP2705752B2 JP6087984A JP8798494A JP2705752B2 JP 2705752 B2 JP2705752 B2 JP 2705752B2 JP 6087984 A JP6087984 A JP 6087984A JP 8798494 A JP8798494 A JP 8798494A JP 2705752 B2 JP2705752 B2 JP 2705752B2
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Japan
Prior art keywords
medium
interference
measured
harmonic
measuring
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JPH07270313A (en
Inventor
弘一 松本
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工業技術院長
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、電子工業・機械工業等
の精密生産分野におけるレーザ干渉計による位置決めや
寸法精度向上、光関連工業における光学材料の屈折率の
測定や化学工業における液体・気体の屈折率の測定の精
度向上と能率化を期せる屈折率の測定方法と、機械・電
子関連の生産工業における改質表面や塗装の特性の計測
評価に有効な物体の加工表面の性状特性の測定方法に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the improvement of positioning and dimensional accuracy by a laser interferometer in the precision production field of the electronic and mechanical industries, the measurement of the refractive index of an optical material in the optical-related industry, and the liquid and gas in the chemical industry Method for improving the accuracy and efficiency of the refractive index measurement of the surface of the object, and the property characteristics of the processed surface of the object effective for measuring and evaluating the properties of the modified surface and coating in the mechanical and electronic related production industries Related to the measurement method.

【0002】[0002]

【従来の技術】従来、長さを測定するための光干渉計に
おいては、空気の屈折率の補正が必要であり、2色法と
いう方法が知られている。この2色法は、光波干渉測長
計の光源として、波長変換素子による第2高調波と基本
波との2色レーザ光を用いて測定することによって、光
波干渉による光学的測長値に基づいて空気の屈折率の補
正を実時間で行うものである。
2. Description of the Related Art Conventionally, in an optical interferometer for measuring a length, it is necessary to correct the refractive index of air, and a two-color method is known. This two-color method is based on an optical measurement value due to light wave interference by measuring as a light source of a light wave interferometer using two-color laser light of a second harmonic and a fundamental wave by a wavelength conversion element. The correction of the refractive index of air is performed in real time.

【0003】ここで、上記した2色法による干渉計等に
おいては、基本波の波長λ1 による干渉測長値をL1
第2高調波の波長λ2 による干渉測長値をL2 、波長λ
2 における空気の屈折率をn2 としたとき、空気の屈折
率n2 は下式のように表される。
Here, in the above-described two-color interferometer and the like, the interferometric length value at the fundamental wavelength λ 1 is represented by L 1 ,
Let L 2 be the interference measurement value at the wavelength λ 2 of the second harmonic,
When the refractive index of air at 2 and n 2, the refractive index n 2 of the air is expressed by the following equation.

【0004】[0004]

【数1】 (Equation 1)

【0005】なお、上記(1)式の係数Aは、{(n2
−1)/(n2 −n1 )}で与えらる定数であることが
知られており、その値は10〜数100程度の値となる
が、干渉縞の位相を精密に測定することによって、比較
的短い長さ領域でも精密な空気の屈折率を求めることが
できる。しかしながら、このためには概略値でよいがL
の値を知る必要があり、例えば移動台に干渉計の反射鏡
を配置して所定の長さだけ走査することが必要である。
Note that the coefficient A in the above equation (1) is {(n 2
-1) / (n 2 −n 1 )}, which is known to be a value of about 10 to several hundreds. However, it is necessary to precisely measure the phase of interference fringes. Accordingly, a precise refractive index of air can be obtained even in a relatively short length region. However, for this purpose, approximate values are sufficient, but L
Needs to be known, for example, it is necessary to arrange a reflecting mirror of an interferometer on a movable table and scan by a predetermined length.

【0006】また、上記の2色干渉計においては、干渉
縞信号をコンピュータ等に一旦記録しておき、データ収
集が終了した後、干渉縞の位相の計算を静的に行うもの
であった。
In the two-color interferometer, the interference fringe signal is once recorded in a computer or the like, and after the data collection is completed, the phase of the interference fringe is calculated statically.

【0007】上記のような屈折率計は、多くの科学・工
業分野において、空気ゆらぎやその屈折率の補正のため
に利用され始めている。すなわち、先端的電子・機械工
業における部品の高精度化に利用されることのほか、近
来は測定の自動化や工業化のために、測定環境が安定で
ない場所や長い光路での使用の要求も増えているため
に、空気ゆらぎやその屈折率の補正が測定精度に多大な
影響を与えることとなるからである。
The refractometer as described above has begun to be used in many scientific and industrial fields for correcting air fluctuations and the refractive index thereof. In other words, in addition to being used for high-precision parts in the advanced electronics and machinery industries, recently, due to the automation and industrialization of measurement, the demand for use in places where the measurement environment is unstable or in long optical paths has increased. This is because the correction of the air fluctuation and the refractive index thereof has a great influence on the measurement accuracy.

【0008】[0008]

【発明が解決しようとする課題】しかし、上記したよう
な2色干渉計を用いて媒質の屈折率を求めるためには、
媒質の長さLの概略値を得る必要があり、干渉計の光路
長を走査するための等速で一定方向へ移動できる移動台
等の手段が別途必要であり、測定系が複雑になってしま
うだけでなく、固体や液体の屈折率の測定が不可能であ
った。しかも、光関連工業や機械・電子・化学などの生
産工業においては、気体だけでなく、液体や固体材料の
屈折率を知ることが重要であるが、上記のような方法で
は、液体や固体材料の屈折率を求めることはできない。
However, in order to determine the refractive index of the medium using the two-color interferometer as described above,
It is necessary to obtain an approximate value of the length L of the medium, and it is necessary to separately provide a moving table or the like capable of moving in a constant direction at a constant speed for scanning the optical path length of the interferometer, which complicates the measurement system. In addition, it was impossible to measure the refractive index of solids and liquids. In addition, in the optical-related industries and production industries such as machinery, electronics, and chemistry, it is important to know the refractive index of liquids and solid materials as well as gases. Cannot be determined.

【0009】また、最近進展が著しい材料の高機能化技
術、超精密化技術における精密加工表面の性状特性の計
測評価や、実装において求められる塗装の特性等を知
り、評価に充てることが極めて重要となっているが、上
記のような方法においては、干渉縞の位相測定を静的に
行っていたため、干渉計のレーザビームを被測定物体の
表面の垂直方向に走査し、当該物体の加工表面等の性状
特性や塗装の一様性を計測・評価する場合のように、2
次元的な領域での分布特性の測定に応用することもでき
なかった。
In addition, it is extremely important to know and evaluate the characteristics of the surface properties of precision-machined materials in the technology for the development of highly functional materials and ultra-precision technology, and the characteristics of the coating required for mounting, and to use them for evaluation. However, in the method as described above, since the phase measurement of the interference fringe is performed statically, the laser beam of the interferometer is scanned in a direction perpendicular to the surface of the object to be measured, and the processing surface of the object is processed. As in the case of measuring and evaluating the property characteristics such as
It could not be applied to the measurement of distribution characteristics in a dimensional area.

【0010】そこで、本発明は、気体・液体・固体の屈
折率の測定を簡便に行える屈折率の測定方法と性状特性
の測定方法を提供するものである。
Accordingly, the present invention provides a method for measuring the refractive index and a method for measuring the properties of a gas, a liquid, and a solid, which can easily measure the refractive index.

【0011】[0011]

【課題を解決するための手段】上記課題を解決するため
に、本発明に係る屈折率の測定方法においては、光源よ
り得た光を基本波とし、被測定媒質を通過する前の基本
波から生じさせた第1の高調波と、測定媒質を通過し
た基本波から生じさせた第2の高調波とを干渉させ、該
干渉によって生じた干渉波信号に基づいて干渉縞の次数
を求め、上記光源の周波数を連続的に変化させることに
基づく上記干渉縞の変化に基づいて上記被測定媒質の長
さを求め、上記干渉縞の次数と上記被測定媒質の長さと
を用いて上記被測定媒質の屈折率を測定するようにし
た。
In order to solve the above-mentioned problems, in the method of measuring a refractive index according to the present invention, light obtained from a light source is used as a fundamental wave, and the fundamental wave before passing through a medium to be measured is used. The generated first harmonic and a second harmonic generated from the fundamental wave passing through the medium to be measured are caused to interfere with each other, and an order of an interference fringe is obtained based on an interference wave signal generated by the interference. determined the length of the measuring medium on the basis of the above interference fringe changes based on continuously varying the frequency of the light source, the measuring with the length of the order and the measuring medium of the interference fringes The refractive index of the medium was measured.

【0012】また、本発明に係る性状特性の測定方法に
おいては、光源からの基本波と該基本波から生じせしめ
た第1の高調波とを被測定媒質表面へ照射し、被測定
媒質表面で反射した反射光を上記基本波と上記第1の高
調波に分離して、上記被測定媒質表面で反射した上記基
本波から生じせしめた第2の高調波と、周波数をシフト
させた第1の高調波とをヘテロダイン干渉させ、該ヘテ
ロダイン干渉によって生じた干渉波信号に基づいて干渉
縞の位相を求め、該干渉縞の位相に基づいて上記被測定
媒質表面の性状特性を測定するようにした。
Further, in the method for measuring property characteristics according to the present invention, a fundamental wave from a light source and a wave generated from the fundamental wave are used.
First and harmonic irradiated to the measured medium surface, the fundamental wave and the first high reflected light reflected by the object to be measured medium surface
The above-mentioned group separated into harmonics and reflected on the surface of the medium to be measured
Second harmonic generated from main wave and frequency shift
A first harmonic is to heterodyne interference, the Haitai
The phase of the interference fringe is determined based on the interference wave signal generated by the Rodyne interference, and the property of the surface of the medium to be measured is measured based on the phase of the interference fringe.

【0013】[0013]

【実施例】次に、本発明に係る屈折率の測定方法の実施
例を添付図面に基づいて詳細に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, an embodiment of a method for measuring a refractive index according to the present invention will be described in detail with reference to the accompanying drawings.

【0014】先ず、屈折率の測定方法における基本原理
を概説する。いま、波長λ1 とλ2における媒質の屈折
率を夫々n1 ,n2 とすると、予めλ2 に変換されて伝
搬する波と、λ1 のままで伝搬した後にλ2 に変換され
る波との干渉における光路差を2ΔLとすると、往路あ
るいは復路分の光路差ΔLは下式(2)として求められ
る。なお、Lは媒質の長さである。
First, the basic principle of the method for measuring the refractive index will be outlined. Now, assuming that the refractive indices of the medium at wavelengths λ 1 and λ 2 are n 1 and n 2 , respectively, a wave that is converted to λ 2 in advance and a wave that is converted to λ 2 after propagating as λ 1 Assuming that the optical path difference due to the interference with the optical path is 2ΔL, the optical path difference ΔL for the forward path or the return path is obtained by the following equation (2). Here, L is the length of the medium.

【0015】[0015]

【数2】 (Equation 2)

【0016】また、2ΔLは干渉の方程式である下式
(3)で与えられる。なお、Mは干渉縞の次数である。
Further, 2ΔL is given by the following equation (3) which is an equation of interference. Note that M is the order of the interference fringes.

【0017】[0017]

【数3】 (Equation 3)

【0018】上記の(3)式において、干渉縞の次数M
を精密に測定することで、光路差2ΔLを得ると、上記
(2)式から波長λ2 における媒質の屈折率n2 が求め
られる。すなわち、単一の波長λ2 による干渉縞だけの
測定で良いので、高い分解能で干渉縞の端数(位相)を
測定することが可能である。しかしながら、媒質の長さ
Lと干渉縞の次数Mの整数部とが未知数であるために、
正しい屈折率n2 を直接求めることができない。
In the above equation (3), the order M of the interference fringes
The By precisely measured and obtain an optical path difference 2.DELTA.L, (2) the refractive index of the medium at the wavelength lambda 2 from the formula n 2 is obtained. That is, since it is sufficient to measure only the interference fringe with a single wavelength λ2, it is possible to measure the fraction (phase) of the interference fringe with high resolution. However, since the length L of the medium and the integer part of the order M of the interference fringes are unknown,
The correct refractive index n 2 cannot be obtained directly.

【0019】そこで、先ず媒質の長さLを求める原理を
説明する。いま、2Lの光路差の干渉計において、光源
の周波数をΔνだけシフトさせた場合、下式(4)が成
立する。なお、cは光速度,mは光源の周波数がシフト
したときに形成される干渉縞の次数である。
Therefore, the principle of obtaining the length L of the medium will be described first. Now, in the interferometer having a 2L optical path difference, when the frequency of the light source is shifted by Δν, the following equation (4) is established. Here, c is the light speed, and m is the order of the interference fringes formed when the frequency of the light source shifts.

【0020】[0020]

【数4】 (Equation 4)

【0021】上記(4)式より明らかなように、予めΔ
νを知ってmを測定すると、Lが求められるのである。
例えば、Δνを10GHzとし、mの端数(位相)の測
定精度を1/300とすると、Lの決定精度は50μm
となり、必要十分な精度を得ることができる。
As is apparent from the above equation (4), Δ
When m is measured while knowing ν, L is obtained.
For example, assuming that Δν is 10 GHz and the measurement accuracy of a fraction (phase) of m is 1/300, the determination accuracy of L is 50 μm
Thus, necessary and sufficient accuracy can be obtained.

【0022】また、媒質の屈折率を求めるためには、干
渉縞の次数Mが必要であるが、干渉縞の測定で得られる
のは、Mの端数部(位相)のみであり、Mの整数部を別
途求める必要がある。斯くするためには、媒質の厚さL
が大幅に異なるものを数種類用意し、先ず薄いものの測
定によって屈折率の概略値を得ておき、次に厚いものを
測定したときのMの整数部を先の値を利用して一義的に
決定すればよい。
In order to determine the refractive index of the medium, the order M of the interference fringes is required. However, only the fractional part (phase) of M can be obtained by measuring the interference fringes, It is necessary to ask for a part separately. To do so, the thickness of the medium L
Prepare several kinds of things that are significantly different from each other, first obtain the approximate value of the refractive index by measuring the thin one, and then determine the integer part of M when measuring the thick one uniquely using the previous value do it.

【0023】上述したように、媒質の長さLと干渉縞の
次数Mを求めることで、上記(2)〜(4)式から波長
λ2 における媒質の屈折率n2 を簡便に得ることができ
るのである。
As described above, the refractive index n 2 of the medium at the wavelength λ 2 can be easily obtained from the above equations (2) to (4) by obtaining the length L of the medium and the order M of the interference fringes. You can.

【0024】上記原理に基づく屈折率の測定方法を具現
化した屈折率計の第1実施例を図1により説明する。
A first embodiment of a refractometer embodying a method of measuring a refractive index based on the above principle will be described with reference to FIG.

【0025】この干渉計において、レーザ光源1より出
力されたレーザ光は、第1レンズ2aを経た後に第1波
長変換素子3aに入射し、該入射光を基本波とする第2
高調波が発生され、第2レンズ2bによってコリメート
され、この第2高調波の一部は第1ビームスプリッタ4
aによって反射されて第2ビームスプリッタ4bへ向
い、ほとんどの光(約96%程度)は上記第1ビームス
プリッタ4aを透過する。該第1ビームスプリッタ4a
を透過した基本波と第2高調波は空気中を伝搬して反射
鏡5で反射され、往路と略々平行な伝搬路を経て第2ビ
ームスプリッタ4bへ至る。なお、図面に示す反射鏡5
は、2枚の鏡面より構成するものとし、これら二面当た
るレーザ光の反射角を適宜に調整(例えば2枚の鏡を9
0゜に配置すると共に、レーザ光の入射角を45゜に設
定)することで、往路と復路とを略々平行にする。ま
た、本実施例における媒質の長さLは、第1ビームスプ
リッタ4aから反射鏡5に到達するまでの距離である。
In this interferometer, the laser light output from the laser light source 1 enters the first wavelength conversion element 3a after passing through the first lens 2a, and a second light having the incident light as a fundamental wave.
A harmonic is generated and collimated by the second lens 2b, and a part of this second harmonic is
The light is reflected by the first beam splitter 4b and travels to the second beam splitter 4b. Most of the light (about 96%) passes through the first beam splitter 4a. The first beam splitter 4a
The fundamental wave and the second harmonic transmitted through are propagated in the air, reflected by the reflector 5, and reach the second beam splitter 4b via a propagation path substantially parallel to the outward path. The reflecting mirror 5 shown in the drawing
Is composed of two mirror surfaces, and the reflection angles of the laser light hitting the two surfaces are appropriately adjusted (for example, two mirrors
By setting the angle to 0 ° and setting the incident angle of the laser beam to 45 °), the forward path and the return path are made substantially parallel. Further, the length L of the medium in the present embodiment is a distance from the first beam splitter 4a to the reflection mirror 5.

【0026】上記第2ビームスプリッタ4bへ到達した
基本波と第2高調波の大部分(約96%程度)は第2ビ
ームスプリッタ4bを透過し、第2集光レンズ2bを経
て第2波長変換素子3bの中心部に集光されて、基本波
の一部が第2高調波に変換される。斯くして、第2波長
変換素子3bに入射した第2高調波と第2波長変換素子
3b内で変換された第2高調波とが干渉することとな
り、該第2高調波の干渉に基づく干渉縞信号のみを第1
フィルタ6aによって選択透過させ、第1光電検出器7
aによって干渉縞信号を光電検出する。そして、第1光
電検出器7aによって光電検出された干渉縞検出信号は
データ解析装置8へ供給され、光路の長さLと関連した
干渉縞の位相(端数)が測定される。
Most of the fundamental wave and the second harmonic (about 96%) reaching the second beam splitter 4b pass through the second beam splitter 4b and pass through the second condenser lens 2b to the second wavelength converter. The light is focused on the center of the element 3b, and a part of the fundamental wave is converted into the second harmonic. Thus, the second harmonic incident on the second wavelength conversion element 3b and the second harmonic converted in the second wavelength conversion element 3b interfere with each other, and the interference based on the interference of the second harmonic occurs. First fringe signal only
The light is selectively transmitted through the filter 6a, and the first photoelectric detector 7
The interference fringe signal is photoelectrically detected by a. Then, the interference fringe detection signal photoelectrically detected by the first photoelectric detector 7a is supplied to the data analyzer 8, and the phase (fraction) of the interference fringe associated with the length L of the optical path is measured.

【0027】なお、上記の測定を行う際には、第1,第
2ビームスプリッタ4a,4b間に設けたシャッタ9を
閉じておくものとし、第1ビームスプリッタ4aで反射
された基本波と第2高調波が第2ビームスプリッタ4b
へ到達することがないようにしてある。
When performing the above measurement, the shutter 9 provided between the first and second beam splitters 4a and 4b is closed, and the fundamental wave reflected by the first beam splitter 4a and the second The second harmonic is the second beam splitter 4b
So that you don't get to

【0028】次いで、上記シャッタ9を開くと、第1ビ
ームスプリッタ4aで反射される基本波および第2高調
波は第2ビームスプリッタ4bへ到達し、反射鏡5で反
射された基本波および第2高調波と干渉し、第2フィル
タ6bを選択的に透過した第2高調波の干渉縞信号のみ
が第2光電検出器7bで光電検出され、光電検出信号を
データ解析装置8へ供給する。そして、レーザ光源1の
光周波数をドライバ10によって予め定めたΔνだけ走
査し、このときに発生する干渉縞の位相変化を測定する
ことにより、光路の長さLを決定するのである。また、
この測定値Lと上記のようにして得られた干渉縞の端数
(位相)の測定値とから、空気の屈折率を算出すること
により、媒質たる空気の屈折率を求めることができるの
である。なお、干渉縞の整数部を求めるには、反射鏡5
の配設位置を変えるだけでよいので、従来の2色干渉計
のように、媒質の長さを定速度で変化させながら測定す
るような煩雑さがない。
Next, when the shutter 9 is opened, the fundamental wave and the second harmonic reflected by the first beam splitter 4a reach the second beam splitter 4b, where the fundamental wave and the second harmonic reflected by the reflector 5 are reflected. Only the interference fringe signal of the second harmonic, which interferes with the harmonic and selectively passes through the second filter 6b, is photoelectrically detected by the second photoelectric detector 7b, and supplies the photoelectric detection signal to the data analyzer 8. Then, the optical frequency of the laser light source 1 is scanned by the driver 10 for a predetermined Δν, and the phase change of the interference fringe generated at this time is measured to determine the length L of the optical path. Also,
By calculating the refractive index of the air from the measured value L and the measured value of the fraction (phase) of the interference fringes obtained as described above, the refractive index of the air as the medium can be obtained. In order to determine the integer part of the interference fringes, the reflection mirror 5 is used.
Since it is only necessary to change the disposition position, there is no need to perform the measurement while changing the length of the medium at a constant speed unlike the conventional two-color interferometer.

【0029】図2に示す第2実施例は、固体の屈折率を
測定するための屈折率計であり、上記第1実施例と同様
の構成については、同一の符号を付して説明を省略す
る。
The second embodiment shown in FIG. 2 is a refractometer for measuring the refractive index of a solid. The same components as those in the first embodiment are denoted by the same reference numerals and description thereof is omitted. I do.

【0030】第1ビームスプリッタ4aへ到達した光
(基本波と第2高調波)の一部は、該第1ビームスプリ
ッタ4aによって反射され、開状態の第1シャッタ9a
及び第3レンズ2cを介して、基本波を反射する第1ダ
イクロイックミラー11aへ到達し、該第1ダイクロイ
ックミラー11aを透過した第2高調波の大部分は第2
波長変換素子3bの中心部に集光され、ビームスプリッ
タ4へ至る。一方、第1ビームスプリッタ4aを透過し
た大部分の光(基本波と第2高調波)は透光性の被測定
媒質12中を伝搬し、反射鏡5で反射された後に再び被
測定媒質12中を伝搬し、第4レンズ2dを介して基本
波を透過する第2ダイクロイックミラー11bへ到達す
る。
A part of the light (a fundamental wave and a second harmonic) that has reached the first beam splitter 4a is reflected by the first beam splitter 4a, and the first shutter 9a in the open state.
The second harmonic reaches the first dichroic mirror 11a that reflects the fundamental wave via the third lens 2c and passes through the first dichroic mirror 11a.
The light is condensed at the center of the wavelength conversion element 3 b and reaches the beam splitter 4. On the other hand, most of the light (the fundamental wave and the second harmonic) transmitted through the first beam splitter 4a propagates through the translucent medium to be measured 12 and is reflected by the reflecting mirror 5 before being again transmitted to the medium 12 to be measured. The light propagates through the inside and reaches the second dichroic mirror 11b which transmits the fundamental wave via the fourth lens 2d.

【0031】上記第2ダイクロイックミラー11bへ到
達した基本波は、その周波数特性から第2ダイクロイッ
クミラー11bを透過し、開状態の第2シャッタ9bを
介して第1ダイクロイックミラー11aへ到達し、該第
1ダイクロイックミラー11aで反射され、第2波長変
換素子3bの中心部に集光され、ビームスプリッタ4へ
至る。一方、第2ダイクロイックミラー11bへ到達し
た第2高調波は、その波長特性から第2ダイクロイック
ミラー11bで反射し、反射鏡13によって進行方向を
変化させられて音響光学変調器14に到達し、該音響光
学変調器14によって光周波数がシフトされ、ビームス
プリッタ4に至る。なお、本実施例におけるビームスプ
リッタ4は透過率と反射率が略々半々であるハーフミラ
ーを用いるものとしてある。
The fundamental wave that has reached the second dichroic mirror 11b passes through the second dichroic mirror 11b due to its frequency characteristics, reaches the first dichroic mirror 11a via the second shutter 9b in the open state, and The light is reflected by the one dichroic mirror 11a, condensed at the center of the second wavelength conversion element 3b, and reaches the beam splitter 4. On the other hand, the second harmonic that has reached the second dichroic mirror 11b is reflected by the second dichroic mirror 11b due to its wavelength characteristics, the traveling direction is changed by the reflecting mirror 13, and reaches the acousto-optic modulator 14, where The optical frequency is shifted by the acousto-optic modulator 14 and reaches the beam splitter 4. Note that the beam splitter 4 in the present embodiment uses a half mirror whose transmittance and reflectance are approximately half.

【0032】上記のような3つの異なるルートから得ら
れた三種類の第2高調波がビームスプリッタ4で干渉す
ることによりビート信号が発生され、該ビート信号は第
5レンズ2eを経てフィルタ6へ至り、該フィルタ6を
通過した第2高調波のビート信号のみが光電検出器7へ
到達して光電検出され、光電検出信号が2位相型ロック
イン増幅器等の位相測定器15へ供給される。そして、
位相測定器15はドライブ発振器16からのドライブ信
号を参照信号として干渉縞の位相を測定し、測定値をデ
ータ解析装置8へ供給する。
A beat signal is generated by the interference of the three types of second harmonics obtained from the three different routes as described above in the beam splitter 4, and the beat signal is transmitted to the filter 6 via the fifth lens 2e. Only the beat signal of the second harmonic that has passed through the filter 6 reaches the photoelectric detector 7 and is photoelectrically detected, and the photoelectric detection signal is supplied to a phase measuring device 15 such as a two-phase lock-in amplifier. And
The phase measuring device 15 measures the phase of the interference fringes using the drive signal from the drive oscillator 16 as a reference signal, and supplies the measured value to the data analyzer 8.

【0033】測定に際しては、先ず、第1シャッタ9a
を閉じると共に第2シャッタ9bを開き、ヘテロダイン
干渉によって生ずる干渉縞の端数(位相)を測定し、干
渉縞の次数を求める。次いで、第1シャッタ9aを開く
と共に第2シャッタ9bを閉じた状態でレーザ光源1の
光周波数をドライバ10により走査し、この時に発生す
る干渉縞の位相変化を測定することにより被測定媒質1
2の長さLを求める。斯くして、干渉縞の次数と被測定
媒質12の長さLとから被測定媒質12の屈折率が得ら
れるのである。なお、本第2実施例においては、被測定
媒質12とは異なる媒質(例えば空気)中をレーザ光が
通ることとなるために、若干の誤差が生じるが、被測定
媒質12を置かない状態での測定値を以てプリセットす
ることができる。また、被測定媒質としての気体や液体
を収納するために用いる容器によって生じる誤差も同様
にプリセット可能である。
At the time of measurement, first, the first shutter 9a
Is closed and the second shutter 9b is opened to measure the fraction (phase) of the interference fringes generated by the heterodyne interference, thereby obtaining the order of the interference fringes. Next, the optical frequency of the laser light source 1 is scanned by the driver 10 while the first shutter 9a is opened and the second shutter 9b is closed, and the phase change of the interference fringe generated at this time is measured to thereby measure the medium 1 to be measured.
2 to determine the length L. In this way, the refractive index of the measured medium 12 can be obtained from the order of the interference fringes and the length L of the measured medium 12. In the second embodiment, since the laser light passes through a medium (for example, air) different from the medium to be measured 12, a slight error occurs. Can be preset with the measured values of. In addition, an error caused by a container used to store a gas or a liquid as a medium to be measured can be similarly preset.

【0034】図3に示す第3実施例は、加工表面の性状
特性を測定するための性状特性測定装置であり、上記第
1,第2実施例と同様の構成については、同一の符号を
付して説明を省略する。
The third embodiment shown in FIG. 3 is a property characteristic measuring device for measuring the property of the processed surface, and the same components as those in the first and second embodiments are denoted by the same reference numerals. And the description is omitted.

【0035】第2レンズ2bによってコリメートされた
光(基本波と第2高調波)は、ステージ17に定置され
た被測定媒質12′の表面へ照射され、該被測定媒質1
2′の表面で反射された反射光は、第1反射鏡13aお
よび第3レンズ2cを介してダイクロイックミラー11
へ至る。該ダイクロイックミラー11を透過した第2高
調波は音響光学変調器14に入射して、光周波数シフト
を受けた後、第2反射鏡13bを経てビームスプリッタ
4へ到達する。一方、ダイクロイックミラー11の表面
で反射した基本波は第2波長変換素子3bの中心部に集
光され、第3反射鏡13cを経てビームスプリッタ4へ
到達する。
The light (fundamental wave and second harmonic) collimated by the second lens 2b is applied to the surface of the medium to be measured 12 'fixed on the stage 17, and the medium to be measured 1
The light reflected by the surface of the dichroic mirror 11a is reflected by the first reflecting mirror 13a and the third lens 2c.
To The second harmonic transmitted through the dichroic mirror 11 enters the acousto-optic modulator 14, undergoes an optical frequency shift, and reaches the beam splitter 4 via the second reflecting mirror 13 b. On the other hand, the fundamental wave reflected on the surface of the dichroic mirror 11 is condensed at the center of the second wavelength conversion element 3b, and reaches the beam splitter 4 via the third reflecting mirror 13c.

【0036】上記のようにしてビームスプリッタ4へ至
った2種類の第2高調波が干渉することによりビート信
号が発生し、該ビート信号は第4レンズ2dを経て基本
波除去用のフィルタを透過して、検出器によって光
電検出され、該検出信号は位相測定器15によって位相
測定され、データ解析装置8へ供給される。ここで、ス
テージ17を移動させつつ、レーザービームにより被測
定媒質12′の表面を走査すると、表面の分散特性に応
じてビート信号の位相が変化し、イオンビームなどによ
る改質表面の性状特性を測定することができる。
A beat signal is generated by the interference of the two kinds of second harmonics reaching the beam splitter 4 as described above, and the beat signal passes through a fourth lens 2d to a filter 6 for removing a fundamental wave. The transmitted light is photoelectrically detected by the detector 7 , the detected signal is subjected to phase measurement by the phase measuring device 15, and supplied to the data analyzer 8. Here, when the surface of the medium to be measured 12 ′ is scanned by the laser beam while moving the stage 17, the phase of the beat signal changes according to the dispersion characteristics of the surface, and the property characteristics of the modified surface due to the ion beam or the like are changed. Can be measured.

【0037】なお、上記した各実施例においては、非線
形光学結晶であるKTiOPO4 等を波長変換素子とし
て用いることにより、基本波から第2高調波を発生させ
て測定に供するものとしたが、第3高調波や第4高調波
等のより高次の高調波を用いて屈折率の測定や性状特性
の測定を行うようにしても良い。斯くすれば、干渉縞の
端数(位相)の測定精度が更に高まるので、高精度の屈
折率・性状特性の測定に一層好適なものとなる。
In each of the above-described embodiments, the second harmonic is generated from the fundamental wave for use in measurement by using a nonlinear optical crystal such as KTiOPO 4 as the wavelength conversion element. The measurement of the refractive index and the measurement of the property may be performed using higher harmonics such as the third harmonic and the fourth harmonic. In this case, the measurement accuracy of the fraction (phase) of the interference fringes is further improved, and therefore, it becomes more suitable for highly accurate measurement of refractive index and property characteristics.

【0038】[0038]

【発明の効果】以上説明したように、本発明に係る屈折
率の測定方法においては、被測定媒質を通過する前の基
本波より生じさせた高調波と被測定媒質を通過した後の
基本波より生じさせた高調波とを干渉させて得た干渉縞
信号に基づいて、精度の高い干渉縞の次数を得ることが
できると共に、光源の光周波数を所定幅だけ変化させた
ときの干渉縞の位相変化に基づいて被測定媒質の長さを
簡便に求めることができ、高精度且つ簡便に得られた干
渉縞の次数と被測定媒質の長さとを用いて、被測定媒質
の屈折率を求められるのである。しかも、被測定媒質の
長さを求めるために大がかりな測定系を必要としないの
で、安価な屈折率測定装置の供給が可能になると共に、
被測定媒質の性質に依存することなく、気体・液体・固
体のいずれであっても測定対象とすることができる。
As described above, in the method for measuring the refractive index according to the present invention, the harmonics generated from the fundamental wave before passing through the medium to be measured and the fundamental wave after passing through the medium to be measured. Based on the interference fringe signal obtained by interfering with the generated higher harmonics, it is possible to obtain a high-precision interference fringe order, and to obtain the interference fringe when the light frequency of the light source is changed by a predetermined width. The length of the medium to be measured can be easily obtained based on the phase change, and the refractive index of the medium to be measured is obtained using the order of the interference fringes and the length of the medium to be measured which are obtained with high precision and ease. It is done. In addition, since a large-scale measurement system is not required to determine the length of the medium to be measured, it is possible to supply an inexpensive refractive index measuring device,
Regardless of the nature of the medium to be measured, any of gas, liquid, and solid can be measured.

【0039】また、本発明に係る性状特性の測定方法に
おいては、ヘテロダイン干渉によって生じさせた干渉縞
信号に基づいて干渉縞の位相を求め、該干渉縞の位相に
基づいて被測定媒質表面の性状特性を測定するものとし
たので、光源から被測定媒質表面までの距離を一定に保
持した状態で走査することにより、2次元的な領域での
性状特性を簡便に得ることができる。
In the method for measuring property characteristics according to the present invention, the phase of the interference fringe is determined based on the interference fringe signal generated by the heterodyne interference, and the property of the surface of the medium to be measured is determined based on the phase of the interference fringe. Since the characteristics are measured, the property characteristics in a two-dimensional area can be easily obtained by scanning while keeping the distance from the light source to the surface of the medium to be measured constant.

【図面の簡単な説明】[Brief description of the drawings]

【図1】第1実施例に係る屈折率測定装置の概略構成を
示す機能ブロック図である。
FIG. 1 is a functional block diagram illustrating a schematic configuration of a refractive index measuring device according to a first embodiment.

【図2】第2実施例に係る屈折率測定装置の概略構成を
示す機能ブロック図である。
FIG. 2 is a functional block diagram illustrating a schematic configuration of a refractive index measuring device according to a second embodiment.

【図3】第3実施例に係る加工表面の性状特性測定装置
の概略構成を示す機能ブロック図である。
FIG. 3 is a functional block diagram showing a schematic configuration of an apparatus for measuring properties of a processed surface according to a third embodiment.

【符号の説明】[Explanation of symbols]

1 レーザ光源 3a 第1波長変換素子 3b 第2波長変換素子 4a 第1ビームスプリッタ 4b 第2ビームスプリッタ 5 反射鏡 7a 第1光電検出器 7b 第2光電検出器 8 データ解析装置 10 ドライバ DESCRIPTION OF SYMBOLS 1 Laser light source 3a 1st wavelength conversion element 3b 2nd wavelength conversion element 4a 1st beam splitter 4b 2nd beam splitter 5 Reflector 7a 1st photoelectric detector 7b 2nd photoelectric detector 8 Data analyzer 10 Driver

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 光源より得た光を基本波とし、被測定媒
質を通過する前の基本波から生じさせた第1の高調波
と、測定媒質を通過した基本波から生じさせた第2の
高調波とを干渉させ、該干渉によって生じた干渉波信号
に基づいて干渉縞の次数を求め、上記光源の周波数を
続的に変化させることに基づく上記干渉縞の変化に基づ
いて上記被測定媒質の長さを求め、上記干渉縞の次数と
上記被測定媒質の長さとを用いて上記被測定媒質の屈折
率を測定するようにしたことを特徴とする屈折率の測定
方法。
[Claim 1] a fundamental wave light obtained from the light source, the first and harmonics caused from a fundamental wave before passing through the measured medium, a second that caused from the fundamental wave having passed through the measurement medium And the order of the interference fringes is determined based on the interference wave signal generated by the interference, and the frequency of the light source is linked.
It determined the length of the measuring medium on the basis of a change in the interference fringe based on making continue to change, the refractive index of the measuring medium with the length of the order and the measuring medium of the interference fringes A method for measuring a refractive index, characterized in that the refractive index is measured.
【請求項2】 光源より得た光を基本波とし、被測定媒
質を通過する前の基本波から生じさせた第1の高調波
と、上記被測定媒質を通過した基本波から生じさせた第
2の高調波を得て、上記第1の高調波の周波数をシフト
させて上記第2の高調波とヘテロダイン干渉させ、該ヘ
テロダイン干渉によって生じた干渉波信号に基づいて干
渉縞の次数を求め、上記光源の周波数を連続的に変化さ
せることに基づく上記干渉縞の変化に基づいて上記被測
定媒質の長さを求め、上記干渉縞の次数と上記被測定媒
質の長さとを用いて上記被測定媒質の屈折率を測定する
ようにしたことを特徴とする屈折率の測定方法。
2. The method according to claim 1, wherein the light obtained from the light source is a fundamental wave,
First harmonic generated from fundamental before passing through quality
And a second wave generated from the fundamental wave passing through the medium to be measured.
2nd harmonic and shift the frequency of the first harmonic
Is allowed by the heterodyne interference the second harmonic, interference based on the raw Ji interference wave signal by the heterodyne interference
Obtain the order of the interference fringes and change the frequency of the light source continuously.
Measuring the interference fringes based on the
Determine the length of the constant medium, and determine the order of the interference fringes and the medium to be measured.
A method for measuring the refractive index, wherein the refractive index of the medium to be measured is measured using the length of the material .
【請求項3】 光源より得た光を基本波とし、被測定媒
質を通過する前の基本波から第1の非線形光学結晶を介
して生じさせた第1の高調波と、上記被測定媒質を通過
した基本波から第2の非線形光学結晶を介して生じさせ
た第2の高調波とを干渉させ、該干渉によって生じた干
渉波信号に基づいて干渉縞の次数を求め、上記光源の周
波数を連続的に変化させることに基づく上記干渉縞の変
化に基づいて上記被測定媒質の長さを求め、上記干渉縞
の次数と上記被測定媒質の長さとを用いて上記被測定媒
質の屈折率を測定するようにしたことを特徴とする屈折
率の測定方法。
3. A medium to be measured, wherein light obtained from a light source is used as a fundamental wave.
Through the first nonlinear optical crystal from the fundamental wave before passing through the quality
Passing through the first harmonic and the medium to be measured
From the fundamental wave through the second nonlinear optical crystal
Interference with the second harmonic, and the interference caused by the interference.
The order of the interference fringes is determined based on the interference signal, and the
The change of the interference fringes based on the continuous change of the wave number
The length of the medium to be measured is determined based on the
Of the medium to be measured using the order of
A method for measuring a refractive index, comprising measuring a refractive index of a material.
【請求項4】 光源より得た光を基本波とし、被測定媒
質を通過する前の基本波から第1の非線形光学結晶を介
して生じさせた第1の高調波と、上記被測定媒質を通過
した基本波から第2の非線形光学結晶を介して生じさせ
た第2の高調波を得て、上記第1の高調波の周波数をシ
フトさせて上記第2の高調波とヘテロダイン干渉させ、
該ヘテロダイン干渉によって生じた干渉波信号に基づい
干渉縞の次数を求め、上記光源の周波数を連続的に変
化させることに基づく上記干渉縞の変化に基づいて上記
被測定媒質の長さを求め、上記干渉縞の次数と上記被測
定媒質の長さとを用いて上記被測定媒質の屈折率を測定
するようにしたことを特徴とする屈折率の測定方法。
4. A medium to be measured, wherein light obtained from a light source is used as a fundamental wave.
From the fundamental wave before passing through the first nonlinear optical crystal
Passing through the first harmonic and the medium to be measured
From the fundamental wave through the second nonlinear optical crystal
The second harmonic is obtained and the frequency of the first harmonic is
To cause heterodyne interference with the second harmonic,
Based on the interference signal generated by the heterodyne interference
The order of the interference fringes, and continuously change the frequency of the light source.
Based on the change of the interference fringes based on
The length of the medium to be measured is determined, and the order of the interference fringes and the measured
Measures the refractive index of the medium to be measured using the length of the constant medium
A method of measuring a refractive index.
【請求項5】 光源からの基本波と該基本波から生じせ
しめた第1の高調波とを被測定媒質表面へ照射し、
測定媒質表面で反射した反射光を上記基本波と上記第1
の高調波に分離して、上記被測定媒質表面で反射した上
記基本波から生じせしめた第2の高調波と、周波数をシ
フトさせた第1の高調波とをヘテロダイン干渉させ、該
ヘテロダイン干渉によって生じた干渉波信号に基づいて
干渉縞の位相を求め、該干渉縞の位相に基づいて上記被
測定媒質表面の性状特性を測定するようにしたことを特
徴とする性状特性の測定方法。
5. A fundamental wave from a light source and a beam generated from the fundamental wave.
A first harmonic which made irradiated to the measured medium surface, the fundamental wave and the first reflected light reflected by the object to be measured medium surface
After being reflected at the surface of the medium to be measured.
The second harmonic generated from the fundamental and the frequency
Heterodyne interference with the shifted first harmonic
Determining a phase of an interference fringe based on an interference wave signal generated by the heterodyne interference, and measuring a property of the surface of the medium to be measured based on the phase of the interference fringe. .
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004286575A (en) * 2003-03-20 2004-10-14 National Institute Of Advanced Industrial & Technology Method and apparatus for precisely measuring group refractive index of optical material

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CN100485739C (en) 2005-11-01 2009-05-06 南京大学 Polarization demo instrument through bicolor laser

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JPS6350705A (en) * 1986-08-21 1988-03-03 Chino Corp Apparatus for measuring film thickness
JP3077703B2 (en) * 1990-05-28 2000-08-14 科学技術振興事業団 Phase image detection device using heterodyne detection light receiving system
JP2953004B2 (en) * 1990-09-12 1999-09-27 ブラザー工業株式会社 Optically integrated heterodyne interference refractive index distribution measuring device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
APPL.OPT.,VOL.25,NO.8(1986)P.1344−1349

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004286575A (en) * 2003-03-20 2004-10-14 National Institute Of Advanced Industrial & Technology Method and apparatus for precisely measuring group refractive index of optical material

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