JP2707647B2 - Pattern formation method for charge-coupled color line sensor - Google Patents

Description

Description: TECHNICAL FIELD The present invention relates to a pattern forming method for a charge-coupled color line sensor.

[Summary of the Invention]

According to the present invention, in a pattern forming method of a charge-coupled color line sensor in which a pattern is formed by divided exposure, the number of bits of a repeated pattern portion formed by the divided exposure is set to a multiple of 12, so that Thus, a pattern can be repeatedly formed by divisional exposure without causing disturbance.

[Conventional technology]

A charge-coupled color line sensor (hereinafter, referred to as a CCD color line sensor) is used as a sensor for reading in a color copier or the like.

In recent years, in the manufacture of this CCD color line sensor, exposure for forming a pattern has been performed using a reduction projection exposure apparatus having a reduction ratio of, for example, 5: 1 with the miniaturization of patterns. In this case, for example, when trying to form a pattern of a large CCD color line sensor having a chip length of 20 mm or more by the above-described 5: 1 reduction projection exposure, 1
A reticle with a size of 00 mm or more is required. But,
At present, the size of the reticle is not very large, so it is not easy to manufacture a large CCD color line sensor.

Exposure for forming a pattern of a CCD color line sensor having such a large size is proposed in, for example, "Nikkei Micro Devices", May 1986, pp. 132-134 (published by Nikkei McGraw-Hill). As described above, it is conceivable to perform the operation in a plurality of times.

[Problems to be solved by the invention]

However, according to the study of the present inventor, the following problem occurs only by performing divisional exposure as described above. That is, for example, three color filters of red (R), green (G), and blue (B) are repeatedly arranged in the sensor portion of the CCD color line sensor in the longitudinal direction thereof in units of these. Therefore, if the exposure for forming the pattern of the color filter is simply performed in a divided manner, the repetition cycle of R, G, and B is disturbed at a joint between the divided and exposed areas, and as a result, The CCD color line sensor becomes defective.

SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a pattern formation method for a charge-coupled color line sensor that can form a repetitive pattern by divided exposure without causing a disorder in a repetition period.

[Means for solving the problem]

In the sensor section of the CCD color line sensor, three of the already described R, G, B, yellow (Ye), cyan (Cy), G, etc.
There are a repetition of a four-time cycle and a four-time repetition in which white (W) for obtaining a luminance signal is added thereto. Therefore,
When the repetition pattern of the color filter is formed by division exposure, the number of bits of the repetition pattern portion formed by one division exposure is a multiple of 12 which is the least common multiple of these two types of repetition periods 3 and 4. Then, when performing the divisional exposure, disturbance of the repetition period does not occur at the joint between the dividedly exposed areas.

The present invention has been made based on the above study.

That is, according to the present invention, in the pattern forming method of the charge-coupled color line sensor in which the pattern is formed by the division exposure, the number of bits of the repetitive pattern portion formed by the division exposure is a multiple of 12.

[Action]

According to the above-described means, since the number of bits of the repetitive pattern portion formed by the divided exposure is a multiple of 12,
Repetition of three cycles such as (R, G, B) and (Ye, Cy, G) and repetition of four cycles such as (R, G, B, W) and (Ye, Cy, G, W) However, the repetition patterns corresponding to multiples of these repetition units are collectively exposed by each divided exposure. Therefore, there is no disturbance in the repetition period of the repetition pattern at the joint between the divided exposure areas. That is, it is possible to form a repetitive pattern by divided exposure without causing disturbance in the repetition period.

〔Example〕

Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

First, a reticle used for forming a color filter pattern of a CCD color line sensor by reduction projection exposure in this embodiment will be described. FIG. 3 shows the reticle. As shown in FIG. 3, this reticle is formed by forming an A pattern portion 2, a B pattern portion 3, and a C pattern portion 4 on a transparent glass plate 1. Reference numeral 5 indicates a light shielding area. A pattern part 2
Has a pattern corresponding to the output part of the CCD color line sensor and part of the sensor part. The B pattern section 3 has a pattern corresponding to the sensor section of the CCD color line sensor. In this case, the total number of bits of the repetition pattern in the B pattern unit 3 is 12 × N
(Where N is a positive integer). On the other hand, the C pattern section 4 has a pattern corresponding to a part of the input section and the sensor section of the CCD color line sensor.

Next, a method of forming a color filter pattern of a CCD color line sensor will be described.

First, the reticle shown in FIG. 3 is set in, for example, a 5: 1 reduction projection exposure apparatus, and a step is performed on a semiconductor wafer (not shown), such as a silicon wafer, on which a film for forming a color filter is previously formed. Reduced projection exposure is performed by the AND repeat method. That is, as shown in FIG. 1, first, exposure is performed using the A pattern portion 2 of the reticle, and then a predetermined number of times is performed using the B pattern portion 3 in a region adjacent to the exposure region of the A pattern portion 2. The division exposure is repeated only (four times in FIG. 1). Next, subsequently, exposure is performed using the C pattern portion 8 in a region adjacent to the exposure region of the B pattern portion 3. In this manner, in the case of this embodiment, the exposure for one CCD color line sensor is completed by the divisional exposure of a total of six shots. After the exposure, a film for forming a color filter is developed to form a desired filter pattern. By repeating these steps, for example, color filters of three colors of R, G, and B can be formed.

2A and 2B show examples of the arrangement of the color filters thus formed.

FIG. 1 shows a case where one CCD color line sensor is exposed, but in practice, as shown in FIG. 4, the same exposure as in FIG. 1 is performed on the entire surface of the semiconductor wafer 6. .

As described above, according to the present embodiment, when a repetitive pattern of a color filter is formed on a sensor portion of a CCD color line sensor by divided exposure, a repetitive pattern portion formed by each divided exposure (B shown in FIG. 3). Since the number of bits of the pattern portion 3 is a multiple of 12, even if there are three repetitions and four repetitions, disturbance of the repetition period occurs at the joint between the divided exposure areas. Will not occur. Therefore, by the divisional exposure using the reduction projection exposure apparatus, even a large CCD color line sensor having a chip length of 20 mm or more, for example, can easily perform pattern formation without causing a defect. In this case, the length of the CCD color line sensor that can be manufactured is limited only by the diameter of the semiconductor wafer 6 to be used. In addition, since the exposure is performed using the reduction projection exposure apparatus, the pattern alignment accuracy is good.

Although the embodiments of the present invention have been specifically described above, the present invention is not limited to the above-described embodiments, and various modifications based on the technical idea of the present invention are possible.

For example, in the above embodiment, as shown in FIG. 3, the A pattern portion 2, the B pattern portion 3, and the C pattern portion 4
Exposure is performed using the reticle with
It is also possible to perform exposure using a reticle in which the A pattern portion 2, the B pattern portion 3, and the C pattern portion 4 are separately formed. The number of divisions of exposure for forming one CCD color line sensor pattern can be selected as needed.

〔The invention's effect〕

As described above, according to the present invention, since the number of bits of the repetitive pattern portion formed by the divided exposure is set to a multiple of 12, it is possible to form the repetitive pattern by the divided exposure without disturbing the repetition period. it can.

[Brief description of the drawings]

FIG. 1 is a plan view for explaining an embodiment of the present invention, FIGS. 2A and 2B are diagrams showing examples of arrangement of color filters in a sensor portion of a CCD color line sensor, and FIG. Plan view showing a reticle used for projection exposure,
FIG. 4 is a plan view showing an example of exposure of a semiconductor wafer for manufacturing a CCD color line sensor. Explanation of main symbols in the drawings 2: A pattern portion, 3: B pattern portion, 4: C pattern portion, 6: semiconductor wafer.

 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Seiichi Kawamoto 6-7-35 Kita-Shinagawa, Shinagawa-ku, Tokyo Inside Sony Corporation (56) References JP-A-60-218650 (JP, A)

Claims (1)

(57) [Claims] 1. A pattern forming method for a charge-coupled color line sensor, wherein a pattern is formed by divisional exposure, wherein the number of bits of a repeated pattern portion formed by the divisional exposure is a multiple of 12. Forming method of a charge-coupled color line sensor.