JP2709272B2 - Measurement method of crystallization rate in sublimation method - Google Patents
Measurement method of crystallization rate in sublimation methodInfo
- Publication number
- JP2709272B2 JP2709272B2 JP6256828A JP25682894A JP2709272B2 JP 2709272 B2 JP2709272 B2 JP 2709272B2 JP 6256828 A JP6256828 A JP 6256828A JP 25682894 A JP25682894 A JP 25682894A JP 2709272 B2 JP2709272 B2 JP 2709272B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- sealed tube
- growth
- temperature
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000002425 crystallisation Methods 0.000 title claims description 23
- 230000008025 crystallization Effects 0.000 title claims description 23
- 238000005092 sublimation method Methods 0.000 title description 4
- 238000000691 measurement method Methods 0.000 title 1
- 239000013078 crystal Substances 0.000 claims description 112
- 238000000034 method Methods 0.000 claims description 41
- 238000010438 heat treatment Methods 0.000 claims description 11
- 238000000859 sublimation Methods 0.000 claims description 6
- 230000008022 sublimation Effects 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 3
- 239000002994 raw material Substances 0.000 description 33
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 32
- 238000000746 purification Methods 0.000 description 19
- 239000011701 zinc Substances 0.000 description 11
- 238000007789 sealing Methods 0.000 description 9
- 239000012264 purified product Substances 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000005259 measurement Methods 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 229910052725 zinc Inorganic materials 0.000 description 5
- 238000007670 refining Methods 0.000 description 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 239000011630 iodine Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000003203 everyday effect Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- SPVXKVOXSXTJOY-UHFFFAOYSA-N selane Chemical compound [SeH2] SPVXKVOXSXTJOY-UHFFFAOYSA-N 0.000 description 2
- 229910000058 selane Inorganic materials 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 230000004580 weight loss Effects 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000002109 crystal growth method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、昇華法における結晶化
速度の測定方法に関し、特に、結晶原料の昇華による重
量減少と、結晶析出による重量増加を封管内の重量移動
として測定する方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for measuring a crystallization rate in a sublimation method, and more particularly to a method for measuring a weight loss due to sublimation of a crystal raw material and a weight increase due to crystal precipitation as a weight transfer in a sealed tube.
【0002】[0002]
【従来の技術】封管を用いた気相法による結晶の精製や
単結晶の成長には、PVT(PhysicalVapour Transpor
t)法とCVT(Chemical Vapour Transport )法があ
り、近年、融液法での結晶成長が困難なZnSe等のII
-VI 族化合物半導体単結晶の成長に応用されている。2. Description of the Related Art PVT (Physical Vapor Transporous) is used for purifying crystals and growing single crystals by a vapor phase method using a sealed tube.
t) method and CVT (Chemical Vapor Transport) method. In recent years, it is difficult to grow crystals by the melt method.
-Applied to the growth of Group VI compound semiconductor single crystals.
【0003】PVT法によるZnSe単結晶の成長で
は、10mm角程度の大きな単結晶が得られている(JOUR
NAL OF CRYSTAL GROWTH 94 (1989) P1〜P5参照)。この
方法は、原料として5gのZnSe多結晶と、種結晶と
してZnSe単結晶を用い、直径20mm、長さ70mmの
石英封管の両端に配置して真空封入し、この石英封管を
電気炉にセットして多結晶原料を約1070℃に、種結
晶を約1060℃に加熱して種結晶上にZnSe単結晶
を成長させるものである。In the growth of ZnSe single crystals by the PVT method, large single crystals of about 10 mm square have been obtained (JOUR
NAL OF CRYSTAL GROWTH 94 (1989) P1-P5). In this method, 5 g of ZnSe polycrystal as a raw material and a ZnSe single crystal as a seed crystal are placed at both ends of a quartz sealed tube having a diameter of 20 mm and a length of 70 mm and sealed in a vacuum, and this quartz sealed tube is placed in an electric furnace. The polycrystalline material is set to about 1070 ° C. and the seed crystal is heated to about 1060 ° C. to grow a ZnSe single crystal on the seed crystal.
【0004】CVT法によるZnSe単結晶の成長で
は、14×14×20mmの大きさの単結晶が得られてい
る(JOURNAL OF CRYSTAL GROWTH 91 (1988) P639〜P646
参照)。この方法は、原料として10gのZnSe粉末
と、種結晶としてZnSe単結晶を用い、直径25mm、
長さ50mmの石英封管の両端に配置し、かつ、封管の内
容積1cm3 当たり5.4mgのヨウ素を真空封入し、この
石英封管を電気炉にセットして原料粉末を約850℃
に、種結晶を約840〜845℃に加熱して種結晶上に
ZnSe単結晶を成長させるものである。In the growth of ZnSe single crystal by the CVT method, a single crystal having a size of 14 × 14 × 20 mm has been obtained (JOURNAL OF CRYSTAL GROWTH 91 (1988) P639 to P646).
reference). This method uses a ZnSe powder of 10 g as a raw material, a ZnSe single crystal as a seed crystal, a diameter of 25 mm,
It is placed at both ends of a 50 mm long quartz sealed tube, and 5.4 mg of iodine is sealed in a vacuum with 5.4 mg of iodine per 1 cm 3 of the inside volume of the sealed tube.
Then, the seed crystal is heated to about 840 to 845 ° C. to grow a ZnSe single crystal on the seed crystal.
【0005】PVT法とCVT法の違いは、PVT法で
は下記反応式(I)によって結晶成長が進むのに対し、
CVT法では石英封管中にヨウ素が存在するために、下
記反応式(II)によって結晶成長が進む。 ZnSe(s)→(←)Zn(g)+Se2 (g) (I) ZnSe(s)→(←)ZnI2 (g)+Se2 (g) (II)[0005] The difference between the PVT method and the CVT method is that crystal growth in the PVT method proceeds according to the following reaction formula (I).
In the CVT method, since iodine is present in the quartz sealed tube, crystal growth proceeds according to the following reaction formula (II). ZnSe (s) → (←) Zn (g) + Se 2 (g) (I) ZnSe (s) → (←) ZnI 2 (g) + Se 2 (g) (II)
【0006】PVT法やCVT法で単結晶を成長すると
きに、生産性を考慮すると成長速度をできるだけ速くす
る必要があるが、成長速度がある値を越えると多結晶化
する(上記文献参照)。そこで、多結晶化を回避しなが
ら高い成長速度を維持するためには、成長速度の測定を
欠かすことができない。しかし、PVT法やCVT法の
ように封管中で結晶を成長する方法においては、成長過
程において成長速度を測定することは従来できなかっ
た。そのため、成長終了後に封管を取り出すまで単結晶
が成長しているか、多結晶化しているか分からなかっ
た。また、結晶原料を精製する場合においても、精製終
了時を見積もることができないので、必要以上に長い時
間精製を続けざるを得ず、生産性が著しく損なわれてい
た。When growing a single crystal by the PVT method or the CVT method, it is necessary to increase the growth rate as much as possible in consideration of productivity. However, when the growth rate exceeds a certain value, polycrystallization occurs (see the above-mentioned document). . Therefore, in order to maintain a high growth rate while avoiding polycrystallization, measurement of the growth rate is indispensable. However, in a method of growing a crystal in a sealed tube such as the PVT method or the CVT method, it has not been possible to measure the growth rate in the growth process. For this reason, it was not known whether the single crystal was growing or polycrystallized until the sealed tube was taken out after the growth was completed. Further, even in the case of refining a crystal raw material, it is impossible to estimate the end of the refining, so that the refining must be continued for an unnecessarily long time, and the productivity has been significantly impaired.
【0007】[0007]
【発明が解決しようとする課題】そこで、本発明は、上
記の欠点を解消し、昇華法における結晶化速度を確実に
測定できるようにした測定方法を提供しようとするもの
である。SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to solve the above-mentioned drawbacks and to provide a measuring method capable of reliably measuring the crystallization rate in the sublimation method.
【0008】[0008]
【課題を解決するための手段】本発明は、以下の構成を
採用することにより、上記の発明の課題の解決に成功し
たものである。 (1) 封管の一端に結晶原料を真空封入し、該封管を加熱
炉に挿入し、前記結晶原料を昇華温度に加熱し、前記封
管の結晶析出部を結晶化温度に保持して結晶化するとき
の、結晶化速度を測定する方法において、前記加熱炉内
に第1の支点となる部材を置き、前記封管を該部材の上
に載せ、前記封管の一端を前記加熱炉の外まで延長し、
前記延長部を第2の支点で支持し、第2の支点にかかる
重量変化を測定することを特徴とする結晶化速度の測定
方法。The present invention has succeeded in solving the above-mentioned problems by employing the following constitutions. (1) A crystal raw material is vacuum-sealed at one end of a sealed tube, the sealed tube is inserted into a heating furnace, the crystal raw material is heated to a sublimation temperature, and a crystal deposition portion of the sealed tube is maintained at a crystallization temperature. In the method for measuring a crystallization rate during crystallization, a member serving as a first fulcrum is placed in the heating furnace, the sealed tube is placed on the member, and one end of the sealed tube is connected to the heating furnace. Extend out of the
A method for measuring a crystallization rate, wherein the extension is supported by a second fulcrum, and a change in weight applied to the second fulcrum is measured.
【0009】[0009]
【作用】本発明の結晶化速度の測定方法は、図1に示す
ように、一端を閉じた管の端部に原料を配置し、封入蓋
で封管を形成した後、図2のように、加熱炉に挿入して
管の中間部を支点1で回転可能に支持し、炉外に延びた
管の端部を支点2とし、重量測定手段で支持し、原料を
加熱昇華し、封入蓋側の低温部分に結晶を析出させる。
その際に、原料の昇華に伴う減量と、結晶析出に伴う増
量により支点2に加わる重量が変化するので、重心位置
の変化を測定し、この変化により結晶化速度を算出する
ものである。According to the method for measuring the crystallization rate of the present invention, as shown in FIG. 1, a raw material is placed at the end of a tube with one end closed, and a sealed tube is formed with a sealing lid. , The intermediate portion of the tube is rotatably supported at a fulcrum 1 by inserting it into a heating furnace, the end of the tube extending outside the furnace is used as a fulcrum 2, supported by weight measuring means, and the raw material is heated and sublimated, and a sealing lid is provided. Crystals are deposited in the low temperature part on the side.
At this time, the weight applied to the fulcrum 2 changes due to the weight loss due to the sublimation of the raw material and the weight increase due to the crystal precipitation. Therefore, the change in the position of the center of gravity is measured, and the crystallization rate is calculated from the change.
【0010】ここで、2つの支点間の距離をL1 、原料
と結晶の析出位置の間の距離をL2とし、原料がW(g)
だけ昇華して高温側から低温側に移行して析出したとす
ると、支点2にかかる重量の変化はW×L2 /L1 (g)
となる。したがって、結晶化速度の測定感度を向上させ
るためには、L1 /L2 の値を小さくすればよく、少な
くともL1 /L2 を1以下にすることが望ましい。な
お、L1 /L2 =1とは、重量変化が析出結晶の重量に
等しくなるときである。Here, the distance between the two supporting points is L 1 , the distance between the raw material and the crystal deposition position is L 2 , and the raw material is W (g).
Assuming that only the sublimation occurs and the precipitate moves from the high temperature side to the low temperature side, the change in the weight on the fulcrum 2 is W × L 2 / L 1 (g)
Becomes Therefore, in order to improve the measurement sensitivity of the crystallization rate, the value of L 1 / L 2 may be reduced, and it is desirable that at least L 1 / L 2 be 1 or less. Note that the L 1 / L 2 = 1, is when the weight change is equal to the weight of the precipitated crystals.
【0011】PVT法やPCT法により結晶を精製した
り、単結晶を成長させる速度は、封管全体の温度と、結
晶原料側と析出結晶側(封管中の最低温度部)の温度差
(以下、ΔTという)により変化する。そこで、本発明
の結晶の精製方法又は単結晶の成長方法では、前記の結
晶化速度の測定値により、封管全体の温度を上下させた
り、ΔTを調整することにより、結晶化速度の最適化制
御を行う。The rate at which a crystal is purified or a single crystal is grown by the PVT or PCT method depends on the temperature of the entire sealed tube and the temperature difference between the crystal raw material side and the precipitated crystal side (the lowest temperature portion in the sealed tube) ( Hereinafter, referred to as ΔT). Therefore, in the method for purifying a crystal or the method for growing a single crystal of the present invention, the crystallization rate is optimized by raising or lowering the temperature of the entire sealed tube or adjusting ΔT based on the measured value of the crystallization rate. Perform control.
【0012】また、図3のように、結晶原料を配置する
封管の端部に細管を接続し、該細管の端部に前記結晶の
構成元素を封入し、該元素の加熱温度を調節して封管内
の該元素の蒸気圧を制御することにより、結晶化速度を
調節することができる。したがって、この方法は、前記
の結晶化速度の最適化制御法に組み合わせて使用するこ
とができる。このような結晶化速度の最適化制御法を、
PVT法やCVT法での結晶成長法に利用すれば、単結
晶の成長がより確実に効率的に行うことができる。Further, as shown in FIG. 3, a thin tube is connected to the end of a sealed tube in which the crystal raw material is arranged, the constituent elements of the crystal are sealed in the end of the thin tube, and the heating temperature of the element is adjusted. The crystallization rate can be adjusted by controlling the vapor pressure of the element in the sealed tube. Therefore, this method can be used in combination with the above-mentioned crystallization rate optimization control method. Such a crystallization rate optimization control method
The use of the crystal growth method in the PVT method or the CVT method makes it possible to more reliably and efficiently grow a single crystal.
【0013】一方、単結晶の成長において、封管の端部
に結晶が析出するときに、核発生の個数を極力少なくす
ることが大切である。(核発生個数が1であることが理
想である。)図4では、封管を形成するための封入蓋を
円錐形にすることにより、多数の核発生を抑制しようと
するものである。また、図5では、図4の円錐形の先端
部に種結晶を配置して単結晶の成長を容易にしようとす
るものである。On the other hand, in the growth of a single crystal, it is important to minimize the number of nuclei generated when crystals are deposited at the end of the sealed tube. (It is ideal that the number of generated nuclei is 1.) In FIG. 4, the number of generated nuclei is suppressed by forming the sealing lid for forming the sealed tube into a conical shape. In FIG. 5, a seed crystal is arranged at the tip of the conical shape in FIG. 4 to facilitate the growth of a single crystal.
【0014】なお、前記の円錐形の封入蓋を用い、結晶
化速度(生成結晶の重量増加速度)を一定にして結晶成
長を行うと、成長初期において成長結晶表面の移動速度
が速くなりすぎて多結晶が発生し易くなる。そこで、成
長結晶表面の移動速度を一定になるように円錐形の形状
に合わせて結晶化速度を制御することが大切である。When crystal growth is performed using the above-mentioned conical encapsulation lid and keeping the crystallization rate (the rate of weight increase of the generated crystal) constant, the moving speed of the grown crystal surface becomes too fast in the initial stage of growth. Polycrystals are easily generated. Therefore, it is important to control the crystallization speed according to the conical shape so that the moving speed of the growing crystal surface is constant.
【0015】種結晶を使用するときには、成長開始前に
種結晶の温度を結晶原料側より高温にして種結晶の表面
層を昇華させて除去することが、多結晶化を防止する上
で重要である。従来は、表面層の除去量を測定すること
ができなかったので、表面層の除去及び単結晶化の再現
性が乏しかったが、本発明の結晶化速度の測定方法を利
用することにより、表面層の除去量を容易にかつ正確に
測定することができるので、所定量だけ種結晶の表面を
除去した後、温度条件を変更して結晶成長を開始するこ
とも容易になり、単結晶成長の再現性が向上した。When a seed crystal is used, it is important to prevent the polycrystallization by removing the surface layer of the seed crystal by raising the temperature of the seed crystal to a temperature higher than the crystal raw material side before the start of growth to prevent subcrystallization. is there. Conventionally, the amount of removal of the surface layer could not be measured, so that the reproducibility of the removal of the surface layer and the single crystallization was poor. Since the removal amount of the layer can be measured easily and accurately, after removing the surface of the seed crystal by a predetermined amount, it is also easy to start the crystal growth by changing the temperature condition, and it Reproducibility has been improved.
【0016】また、PVT法やCVT法で単結晶等を成
長するときに、成長速度が大きくばらつく原因の1つと
して、原料の多結晶組成(ZnSe多結晶におけるZn
とSeの比)のばらつきにあると考えられている。原料
組成のばらつきが大きすぎると、温度条件を制御するだ
けでは成長速度を所定の速さに制御することができな
い。One of the causes of a large variation in the growth rate when a single crystal or the like is grown by the PVT method or the CVT method is the polycrystalline composition of the raw material (ZnSe polycrystal).
And the ratio of Se). If the variation in the raw material composition is too large, the growth rate cannot be controlled to a predetermined rate only by controlling the temperature conditions.
【0017】そこで、本発明では、多結晶原料を予め
高温に加熱して昇華させ、再結晶化させた多結晶原料を
使用するか、多結晶を予め粉末に粉砕した後、この粉
末を真空中で、ZnSe結晶においては500℃以上、
1時間以上加熱し、原料として使用するか、ZnSe
結晶においてはセレン化水素と亜鉛蒸気を500℃以上
の温度で反応させて合成したZnSe多結晶を原料とし
て使用することにより、組成ばらつきの少ない原料から
の結晶成長を可能にし、成長速度の制御をより正確に行
うことができる。前記の方法は、ZnSe結晶の精製や
単結晶の成長に限らず、ZnS、CdTe、CdS等の
II-VI 族化合物半導体の成長に対しても有効に適用する
ことができる。Therefore, in the present invention, the polycrystalline raw material is preliminarily heated to a high temperature to be sublimated and sublimated, and the recrystallized polycrystalline raw material is used, or the polycrystal is previously pulverized into powder, and then the powder is placed in a vacuum. In a ZnSe crystal, 500 ° C. or more,
Heat for over 1 hour and use as raw material or ZnSe
In the crystal, ZnSe polycrystal synthesized by reacting hydrogen selenide and zinc vapor at a temperature of 500 ° C. or more is used as a raw material, thereby enabling crystal growth from a raw material with small composition variation and controlling the growth rate. It can be done more accurately. The above-described method is not limited to the purification of ZnSe crystals or the growth of single crystals, but may be used for ZnS, CdTe, CdS, etc.
It can be effectively applied to the growth of II-VI compound semiconductors.
【0018】[0018]
【実施例】〔実施例1〕 図1に示すように、内径14mm、全長30cmの石英管の
端部に約5gのZnSe多結晶原料を充填し、10-6To
rrまで排気した後封入蓋を挿入し、原料と封入蓋の間隔
を10cmになるように真空封入をした。ZnSe多結晶
原料は、内面をカーボンコーティングした石英封管中で
ZnとSeを加熱反応させて合成し、適当の大きさにス
ライスした後、沸騰NaOH溶液で10分間エッチング
したものを使用した。前記封管を、図2に示すように、
水平管状電気炉内に挿入し、該電気炉のアルミナ製炉芯
管(内径30mm)内部に配置した支点1と、電気炉外の
支点2で支持した。支点1は、図6に示すように内側を
鋭角に加工したアルミナ製リングを使用した。支点2に
は、重量変化を1mmgの測定精度で測定可能な電子天秤
を付設した。EXAMPLES As shown in Example 1 1, an inner diameter of 14 mm, filled with polycrystalline ZnSe starting material of from about 5g to the end of the quartz tube of the full-length 30 cm, 10 -6 the To
After evacuation to rr, the sealing lid was inserted, and vacuum sealing was performed so that the distance between the raw material and the sealing lid was 10 cm. The ZnSe polycrystalline raw material used was synthesized by heating and reacting Zn and Se in a quartz sealed tube having an inner surface coated with carbon, sliced into an appropriate size, and then etched with a boiling NaOH solution for 10 minutes. The sealed tube is, as shown in FIG.
It was inserted into a horizontal tubular electric furnace, and supported by a fulcrum 1 disposed inside a furnace core tube (inner diameter 30 mm) made of alumina of the electric furnace and a fulcrum 2 outside the electric furnace. As the fulcrum 1, as shown in FIG. 6, an alumina ring whose inside was machined to an acute angle was used. The fulcrum 2 was provided with an electronic balance capable of measuring a weight change with a measurement accuracy of 1 mmg.
【0019】電気炉の温度を上げて原料を約1020℃
に加熱して昇華させ、封入蓋の表面の温度(封管中の最
低温度部)を約1000℃に設定してZnSe結晶を析
出する精製実験を3回行い、その結果を図7に示した。
なお、前記の温度測定には、封管に触れないように炉芯
管内部を這わせた熱電対を使用した。精製物の重量は支
点2の重量を2倍(L1 /L2 =2をかける)したもの
である。図7より、各実験毎に精製物の重量が精製時間
に比例して増加している様子が分かる。最終的に封管か
ら取り出した精製ZnSeの重量を測定して生成途中の
測定値と比較すると、測定誤差が10%以下に抑えるら
れていた。Raise the temperature of the electric furnace to about 1020 ° C
The sublimation was carried out by heating to a temperature of about 1,000 ° C. at the surface of the sealing lid (the lowest temperature part in the sealed tube), and three purification experiments were performed to precipitate ZnSe crystals. The results are shown in FIG. .
In the temperature measurement, a thermocouple was used in which the inside of the furnace core tube was crawled so as not to touch the sealed tube. The weight of the purified product is twice the weight of the fulcrum 2 (multiplied by L 1 / L 2 = 2). FIG. 7 shows that the weight of the purified product increases in proportion to the purification time for each experiment. When the weight of the purified ZnSe finally taken out from the sealed tube was measured and compared with the measured value during the production, the measurement error was suppressed to 10% or less.
【0020】〔実施例2〕 実施例1で準備したものと同様に原料を充填した封管
を、図8のように炉の中に配置した。支点1と支点2の
間隔L1 を5cmに近づけた。この場合、封管の重量の釣
り合いから支点2が浮き上がるのを防止するために、支
点2に適当な重量の重りを取り付けた。実施例1と同様
に昇温して5日間精製を行った。5日後に封管から取り
出した精製ZnSeの量は2.20gであった。一方、
精製中に測定した重量に0.5(L1 /L2 =0.5)
を掛けて算出した精製物の重量は2.39gであり、実
施例1と同じように10%以内の誤差であった。なお、
実施例1では実際に精製されたZnSe重量の1/2の
重量が支点2で測定されたのに対し、実施例2では2倍
の重量が測定されており、感度が4倍に向上した。Example 2 A sealed tube filled with raw materials in the same manner as that prepared in Example 1 was placed in a furnace as shown in FIG. The distance L 1 of the pivot 1 and the fulcrum 2 has close to 5 cm. In this case, an appropriate weight was attached to the fulcrum 2 in order to prevent the fulcrum 2 from rising from the balance of the weight of the sealed tube. Purification was carried out for 5 days by raising the temperature in the same manner as in Example 1. After 5 days, the amount of purified ZnSe removed from the sealed tube was 2.20 g. on the other hand,
Weight 0.5 measured during purification (L 1 / L 2 = 0.5 )
The weight of the purified product calculated by multiplying by 2.39 g was within 10% as in Example 1. In addition,
In Example 1, half the weight of the actually purified ZnSe was measured at the fulcrum 2, whereas in Example 2, twice the weight was measured, and the sensitivity was improved four times.
【0021】〔実施例3〕 実施例2の方法で原料を精製する際に、1日毎に精製速
度を測定・算出し、現実の精製速度を0.5g/日に保
持するように、ΔTを一定に保持しながら、封管全体の
温度を上下して制御することを試みた。図9には、封管
蓋側の温度を表示してあるが、ΔTを一定にするため、
原料側の温度も封管蓋側の温度も同じだけ温度を上下さ
せた。その結果を図9に示したように、精製速度をほぼ
0.5g/日に保持することに成功した。なお、成長炉
の温度を変化させると、封管が伸縮するために、支点2
で測定する重量が変化するので、成長炉の温度を変化さ
せたときには、温度が安定した後(30分間後)の重量
を基準にして重量の変化を算出した。したがって、温度
を変化させた後の30分間の重量変化は測定することが
できないが、成長速度の測定間隔が1日であるところか
ら問題にならなかった。Example 3 In purifying a raw material by the method of Example 2, the purification rate was measured and calculated every day, and ΔT was adjusted so that the actual purification rate was maintained at 0.5 g / day. An attempt was made to control the temperature of the entire sealed tube up and down while keeping it constant. FIG. 9 shows the temperature on the side of the sealed tube lid. In order to keep ΔT constant,
The temperature on the raw material side and the temperature on the sealed tube lid side were raised and lowered by the same amount. As shown in FIG. 9, the results succeeded in maintaining the purification rate at approximately 0.5 g / day. If the temperature of the growth furnace is changed, the sealed tube expands and contracts.
When the temperature of the growth furnace was changed, the change in weight was calculated based on the weight after the temperature was stabilized (after 30 minutes). Therefore, the weight change for 30 minutes after the temperature was changed could not be measured, but this was not a problem since the measurement interval of the growth rate was one day.
【0022】〔実施例4〕 実施例2の方法で原料精製を行うときに、1日毎に精製
速度を算出し、現実の精製速度を0.5g/日に保持す
るように、原料側の温度を一定にし、封管蓋側の温度を
上下に調節した。その結果を図10に示した。同図から
明らかなように、現実の精製速度をほぼ0.5g/日に
制御することに成功した。このときも実施例3と同様
に、温度を変化させた30分後の重量を基準にして精製
速度の算出を行った。[Example 4] When the raw material is purified by the method of Example 2, the purification rate is calculated every day, and the temperature on the raw material side is maintained such that the actual purification rate is maintained at 0.5 g / day. And the temperature on the side of the sealed tube was adjusted up and down. The results are shown in FIG. As is clear from the figure, the actual purification rate was successfully controlled at about 0.5 g / day. At this time, as in Example 3, the purification rate was calculated based on the weight 30 minutes after the temperature was changed.
【0023】〔実施例5〕 図3に示した内径14mmの封管の原料側に、内径1.5
mmの細管を50cm延長し、その先端にZnを約1g充填
し、その他の条件は実施例1と同様にして用意した封管
を、図11に示すように、支点1と支点2の間を5cmに
なるように炉内に配置した。炉の温度を上げて、原料の
温度を1020℃に、封管蓋の先端温度を1000℃
に、細管先端のZnの温度を500℃に設定した。その
後、図12に示すように、Znの温度を上下させること
により、精製速度を0.5g/日に制御することに成功
した。Example 5 An inner diameter of 1.5 mm was placed on the raw material side of the sealed tube having an inner diameter of 14 mm shown in FIG.
A thin tube having a length of 50 mm was extended by 50 cm, and about 1 g of Zn was filled at the tip thereof. The other conditions were the same as in Example 1. A sealed tube prepared as shown in FIG. It was placed in the furnace so as to be 5 cm. Raise the temperature of the furnace, raise the temperature of the raw material to 1020 ° C, and raise the
Then, the temperature of Zn at the tip of the capillary was set to 500 ° C. Thereafter, as shown in FIG. 12, the purification rate was controlled to 0.5 g / day by raising and lowering the temperature of Zn.
【0024】〔実施例6〕 実施例4で使用した封管の代わりに、図4に示すよう
に、封管蓋を円錐形にして単結晶の成長を試みた。結晶
成長中の成長速度を0.5g/日になるように、実施例
4と同様に6時間毎にΔTを制御して2週間にわたって
結晶成長を行ったところ、約7gのZnSe結晶を得
た。同様の結晶成長を10回行った結果を表1に示し
た。10ラン中2ランでは、円錐形先端では数グレイン
が存在していたが、そのうちの1グレインが大きく成長
して単結晶が形成された。また、4ランでは比較的大き
なグレインが得られた。しかし、1ランでは、ΔTを5
0℃まで高めても成長速度が0.5g/日に達しなかっ
た。Example 6 Instead of the sealed tube used in Example 4, as shown in FIG. 4, a single-crystal growth was attempted with a sealed tube lid having a conical shape. Crystal growth was performed for 2 weeks by controlling ΔT every 6 hours in the same manner as in Example 4 so that the growth rate during crystal growth was 0.5 g / day, and about 7 g of ZnSe crystal was obtained. . Table 1 shows the results of the same crystal growth performed 10 times. In 2 runs out of 10 runs, several grains were present at the tip of the conical shape, but one of them grew greatly to form a single crystal. In the fourth run, relatively large grains were obtained. However, in one run, ΔT is 5
Even when the temperature was increased to 0 ° C., the growth rate did not reach 0.5 g / day.
【0025】[0025]
【表1】 [Table 1]
【0026】〔実施例7〕 実施例6において、ΔTを制御して成長速度を制御する
代わりに、実施例5に示した細管付き封管を使用し、実
施例5と同様に細管先端にZnを1g充填し、結晶成長
中にこのZnの温度を制御することによって成長速度を
0.5g/日に制御して、結晶を10回成長させた。そ
の結果、表2に示すように実施例6とほぼ同じ結果を得
ることができた。Example 7 In Example 6, instead of controlling the growth rate by controlling ΔT, the sealed tube with a thin tube shown in Example 5 was used. , And the crystal was grown 10 times by controlling the temperature of Zn during crystal growth to control the growth rate to 0.5 g / day. As a result, as shown in Table 2, almost the same results as in Example 6 could be obtained.
【0027】[0027]
【表2】 [Table 2]
【0028】〔実施例8〕 実施例6の単結晶の成長において、図5に示すように、
円錐形の封管蓋の先端にZnSe種結晶を配置して単結
晶の成長を行った。ZnSe種結晶は、実施例6で得た
単結晶ZnSeから厚さ1mmで5mm角の(100)ウエ
ハを切り出して粒径0.5μm のダイヤモンド・スラリ
ーで表面を研磨した後、沸騰NaOH溶液で5分間エッ
チングしたものを用いた。結晶成長中の成長速度は0.
5g/日になるように、実施例6と同様に6時間毎にΔ
Tを制御して2週間にわたって結晶成長を行った。この
結晶成長を10回行った結果を表3に示した。10ラン
中5ランで単結晶が成長したが、実施例6と同様に成長
速度が0.5g/日に達しない例が2ランあった。Example 8 In the growth of the single crystal of Example 6, as shown in FIG.
A single crystal was grown by disposing a ZnSe seed crystal at the tip of a conical sealed tube lid. The ZnSe seed crystal was obtained by cutting a (100) wafer having a thickness of 1 mm and a square of 5 mm from the single crystal ZnSe obtained in Example 6, polishing the surface with a diamond slurry having a particle size of 0.5 μm, and then polishing the surface with a boiling NaOH solution. One minute etched was used. The growth rate during crystal growth is 0.
Δ every 6 hours as in Example 6 so that 5 g / day
Crystal growth was performed over two weeks while controlling T. Table 3 shows the results of this crystal growth performed 10 times. Although the single crystal grew in 5 out of 10 runs, there were 2 runs in which the growth rate did not reach 0.5 g / day as in Example 6.
【0029】[0029]
【表3】 [Table 3]
【0030】〔実施例9〕 実施例6、8では、単位時間に成長する結晶の重量(以
下、重量成長速度という)を一定になるように制御した
ので、種結晶近傍の封管蓋円錐形部の断面積が小さい部
分では、単位時間に成長表面の移動量(以下、成長速度
という)が大きくなる。そこで、実施例8で使用した封
管を使用するが、成長速度が1mm/日になるように重量
成長速度を図13の実線に沿うように制御しながら、2
週間にわたって結晶成長を行った。重量成長速度の制御
はΔTを変化させることによって行った。この結晶成長
を10回行った結果を表4に示した。10ラン中8ラン
で単結晶を成長させることができ、多結晶が生成したの
は1回、成長しなかったのが1回でけあった。Embodiment 9 In Embodiments 6 and 8, the weight of the crystal growing per unit time (hereinafter referred to as the weight growth rate) was controlled to be constant. In a portion where the cross-sectional area of the portion is small, the amount of movement of the growth surface per unit time (hereinafter, referred to as growth speed) increases. Therefore, the sealed tube used in Example 8 is used, but while controlling the weight growth rate so that the growth rate is 1 mm / day along the solid line in FIG.
Crystal growth was performed over a week. The weight growth rate was controlled by changing ΔT. Table 4 shows the results of this crystal growth performed 10 times. A single crystal could be grown in 8 out of 10 runs, with polycrystals being formed only once and not growing once.
【0031】[0031]
【表4】 [Table 4]
【0032】〔実施例10〕 実施例9の結晶成長において、結晶成長前に原料側の温
度を1020℃に、種結晶側の温度を1040℃に設定
して種結晶を50mg(厚さ約80μm に相当)だけ昇華
させた後、種結晶側の温度を1000℃に下げて結晶成
長を開始し、その後は実施例9と同様にして結晶成長を
行った。この結晶成長を10回行った結果、表5に示す
ように、2回結晶が成長しない例があったが、残りの8
回は全て単結晶を得ることができた。Example 10 In the crystal growth of Example 9, the temperature of the raw material side was set to 1020 ° C. and the temperature of the seed crystal side was set to 1040 ° C. before the crystal growth, and the seed crystal was 50 mg (about 80 μm thick). ), The temperature on the seed crystal side was lowered to 1000 ° C., and crystal growth was started. Thereafter, crystal growth was performed in the same manner as in Example 9. As shown in Table 5, as a result of performing this crystal growth 10 times, there was an example in which the crystal did not grow twice, but the remaining 8
In each case, a single crystal was obtained.
【0033】[0033]
【表5】 [Table 5]
【0034】〔実施例11〕 実施例1〜10では原料ZnSe多結晶としてZnとS
eを加熱反応させて合成したものを使用したが、この実
施例では、上記のZnSe多結晶を実施例4の方法で昇
華・再結晶化させたものを原料として使用して実施例1
0と同様に結晶成長を10回行った。その結果、結晶が
成長しない例は1度もなく、10回全てにおいて単結晶
の成長に成功した。Example 11 In Examples 1 to 10, Zn and S were used as the starting ZnSe polycrystals.
In this example, a material obtained by sublimating and recrystallizing the above-mentioned ZnSe polycrystal by the method of Example 4 was used as a raw material.
Crystal growth was performed 10 times in the same manner as in Example 1. As a result, there was no case where the crystal did not grow, and the single crystal was successfully grown in all 10 times.
【0035】〔実施例12〕 ZnとSeを加熱反応させて合成したZnSe多結晶を
粉末状に粉砕し、この粉末を真空中で500℃の温度で
1時間加熱したものを使用して実施例10と同様に結晶
成長を10回行った。その結果、結晶が成長しない例は
1度もなく、10回全てにおいて単結晶の成長に成功し
た。Example 12 A ZnSe polycrystal synthesized by heating and reacting Zn and Se was pulverized into a powder, and this powder was heated at 500 ° C. for 1 hour in a vacuum. Crystal growth was performed 10 times in the same manner as in 10. As a result, there was no case where the crystal did not grow, and the single crystal was successfully grown in all 10 times.
【0036】〔実施例13〕 セレン化水素と亜鉛蒸気を500℃の温度で反応させ合
成したZnSe多結晶を原料として使用し、実施例10
と同様に結晶成長を10回行った。その結果、結晶が成
長しない例は1度もなく、10回全てにおいて単結晶の
成長に成功した。Example 13 Example 10 was carried out using a ZnSe polycrystal synthesized by reacting hydrogen selenide and zinc vapor at a temperature of 500 ° C. as a raw material.
Crystal growth was performed 10 times in the same manner as described above. As a result, there was no case where the crystal did not grow, and the single crystal was successfully grown in all 10 times.
【0037】[0037]
【発明の効果】本発明は、上記の構成を採用することに
より、昇華法での結晶精製又は単結晶の成長の過程にお
いても、結晶化速度を測定することが可能となり、結晶
化速度の最適制御が容易になり、再現性良くZnSe単
結晶を成長させることができるようになった。According to the present invention, by adopting the above structure, it is possible to measure the crystallization speed even in the process of crystal refining by the sublimation method or the growth of a single crystal. The control becomes easy, and the ZnSe single crystal can be grown with good reproducibility.
【図1】実施例1で使用した封管の断面図である。FIG. 1 is a sectional view of a sealed tube used in Example 1.
【図2】図1の封管を水平管状電気炉のアルミナ製炉芯
管内に配置した図である。FIG. 2 is a view in which the sealed tube of FIG. 1 is arranged in an alumina core tube of a horizontal tubular electric furnace.
【図3】実施例5で使用した封管の断面図である。FIG. 3 is a sectional view of a sealed tube used in Example 5.
【図4】実施例6で使用した封管の断面図であり、封管
蓋を円錐形にしたものである。FIG. 4 is a sectional view of a sealed tube used in Example 6, in which a sealed tube lid has a conical shape.
【図5】実施例8で使用した封管の断面図であり、図6
の封管の円錐形の封管蓋先端に種結晶を配置したもので
ある。5 is a sectional view of a sealed tube used in Example 8, and FIG.
The seed crystal is arranged at the tip of the conical sealing lid of the sealing tube.
【図6】電気炉の炉芯管内の支点1に使用する、内側を
鋭角に加工したアルミナ製リングの正面図と側面図であ
る。6A and 6B are a front view and a side view of an alumina ring whose inside is sharpened, which is used as a fulcrum 1 in a furnace core tube of an electric furnace.
【図7】実施例1における精製時間と精製物重量の増加
の関係を示したグラフである。FIG. 7 is a graph showing the relationship between the purification time and the increase in the weight of the purified product in Example 1.
【図8】実施例2において、封管を水平管状電気炉のア
ルミナ製炉芯管内に配置した図である。FIG. 8 is a view in Example 2 in which a sealed tube is arranged in an alumina core tube of a horizontal tubular electric furnace.
【図9】実施例3における精製時間と精製物重量の増加
の関係を示したグラフである。FIG. 9 is a graph showing the relationship between the purification time and the increase in the weight of a purified product in Example 3.
【図10】実施例4における精製時間と精製物重量の増
加の関係を示したグラフである。FIG. 10 is a graph showing the relationship between the purification time and the increase in the weight of a purified product in Example 4.
【図11】実施例5で使用した封管を水平管状電気炉の
アルミナ製炉芯管内に配置した図である。FIG. 11 is a view in which a sealed tube used in Example 5 is arranged in an alumina core tube of a horizontal tubular electric furnace.
【図12】実施例5における精製時間と、Znの温度並
びに精製速度の関係を示したグラフである。FIG. 12 is a graph showing the relationship between the purification time, the temperature of Zn, and the purification rate in Example 5.
【図13】実施例9において、精製時間と精製物重量及
び目標重量の関係を示したグラフである。FIG. 13 is a graph showing the relationship between the purification time, the weight of the purified product, and the target weight in Example 9.
Claims (1)
封管を加熱炉に挿入し、前記結晶原料を昇華温度に加熱
し、前記封管の結晶析出部を結晶化温度に保持して結晶
化するときの、結晶化速度を測定する方法において、前
記加熱炉内に第1の支点となる部材を置き、前記封管を
該部材の上に載せ、前記封管の一端を前記加熱炉の外ま
で延長し、前記延長部を第2の支点で支持し、第2の支
点にかかる重量変化を測定することを特徴とする結晶化
速度の測定方法。1. A crystal material is vacuum-sealed at one end of a sealed tube, the sealed tube is inserted into a heating furnace, the crystal material is heated to a sublimation temperature, and a crystal deposition portion of the sealed tube is maintained at a crystallization temperature. In the method of measuring the crystallization rate when crystallization is performed, a member serving as a first fulcrum is placed in the heating furnace, the sealed tube is placed on the member, and one end of the sealed tube is A method for measuring a crystallization rate, comprising extending the heating furnace, supporting the extension at a second fulcrum, and measuring a change in weight applied to the second fulcrum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6256828A JP2709272B2 (en) | 1994-10-21 | 1994-10-21 | Measurement method of crystallization rate in sublimation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6256828A JP2709272B2 (en) | 1994-10-21 | 1994-10-21 | Measurement method of crystallization rate in sublimation method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08119792A JPH08119792A (en) | 1996-05-14 |
| JP2709272B2 true JP2709272B2 (en) | 1998-02-04 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6256828A Expired - Fee Related JP2709272B2 (en) | 1994-10-21 | 1994-10-21 | Measurement method of crystallization rate in sublimation method |
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| Country | Link |
|---|---|
| JP (1) | JP2709272B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4020539B2 (en) * | 1999-06-29 | 2007-12-12 | ジーイーヘルスケア バイオサイエンス株式会社 | Method for measuring solute concentration in droplets using quartz crystal |
| KR100473154B1 (en) * | 2002-12-03 | 2005-03-10 | (주)그라쎌 | Furification apparatus using vacuum train sublimation and method thereof |
| CN110093667A (en) * | 2019-05-21 | 2019-08-06 | 浙江森尼克半导体有限公司 | A kind of device and method of vapor phase growth ZnTe monocrystal |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2575415B2 (en) * | 1987-10-01 | 1997-01-22 | 日本板硝子株式会社 | How to monitor crystal growth |
| JPH01183499A (en) * | 1988-01-13 | 1989-07-21 | Sumitomo Electric Ind Ltd | Production of high-purity znse single crystal and apparatus therefor |
| JPH0375291A (en) * | 1989-08-14 | 1991-03-29 | Nippon Mining Co Ltd | Production of znse single crystal |
| JP3231050B2 (en) * | 1991-06-24 | 2001-11-19 | シャープ株式会社 | Compound semiconductor crystal growth method |
| JPH06183897A (en) * | 1992-12-16 | 1994-07-05 | Nisshin Steel Co Ltd | Method for growing silicon carbide single crystal |
-
1994
- 1994-10-21 JP JP6256828A patent/JP2709272B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08119792A (en) | 1996-05-14 |
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| Date | Code | Title | Description |
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| LAPS | Cancellation because of no payment of annual fees |