JP2716639B2 - Low dielectric constant thermosetting resin composition - Google Patents
Low dielectric constant thermosetting resin compositionInfo
- Publication number
- JP2716639B2 JP2716639B2 JP4344781A JP34478192A JP2716639B2 JP 2716639 B2 JP2716639 B2 JP 2716639B2 JP 4344781 A JP4344781 A JP 4344781A JP 34478192 A JP34478192 A JP 34478192A JP 2716639 B2 JP2716639 B2 JP 2716639B2
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- dielectric constant
- epoxy resin
- low dielectric
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000011342 resin composition Substances 0.000 title claims description 7
- 229920001187 thermosetting polymer Polymers 0.000 title claims description 7
- 239000003822 epoxy resin Substances 0.000 claims description 24
- 229920000647 polyepoxide Polymers 0.000 claims description 24
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 125000003700 epoxy group Chemical group 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 150000002989 phenols Chemical class 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims 1
- 229920005989 resin Polymers 0.000 description 17
- 239000011347 resin Substances 0.000 description 17
- 239000000203 mixture Substances 0.000 description 12
- 239000002904 solvent Substances 0.000 description 9
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- -1 polyphenylene Polymers 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 150000002367 halogens Chemical group 0.000 description 4
- 229920002589 poly(vinylethylene) polymer Polymers 0.000 description 4
- 229920001955 polyphenylene ether Polymers 0.000 description 4
- 239000002966 varnish Substances 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical group C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000005062 Polybutadiene Substances 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- HRWADRITRNUCIY-UHFFFAOYSA-N 2-(2-propan-2-yloxyethoxy)ethanol Chemical compound CC(C)OCCOCCO HRWADRITRNUCIY-UHFFFAOYSA-N 0.000 description 1
- XYVAYAJYLWYJJN-UHFFFAOYSA-N 2-(2-propoxypropoxy)propan-1-ol Chemical compound CCCOC(C)COC(C)CO XYVAYAJYLWYJJN-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 1
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 1
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 239000004643 cyanate ester Substances 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N dimethylformamide Substances CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0326—Organic insulating material consisting of one material containing O
Landscapes
- Epoxy Resins (AREA)
- Organic Insulating Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は低誘電率、低誘電正接で
金属への接着性に優れた高耐熱性の熱硬化性樹脂組成物
に関するものであり、積層板、金属箔張積層板等に好適
に使用されるものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high heat-resistant thermosetting resin composition having a low dielectric constant, a low dielectric loss tangent, and excellent adhesion to metals. It is preferably used for
【0002】[0002]
【従来の技術】近年、高周波領域で用いられるプリント
配線に耐熱性に優れ低誘電率、低誘電正接の積層板用樹
脂が望まれている。これに対し誘電率の小さいフッ素樹
脂やポリフェニレンエーテル樹脂などの熱可塑性樹脂が
提案されているが、作業性、接着性が悪く、信頼性に欠
けるなどの問題があった。そこで作業性、接着性を改善
する目的でエポキシ変性ポリフェニレンエーテル樹脂或
いはポリフェニレンエーテル変性エポキシ樹脂も提案さ
れている。しかしエポキシ樹脂の誘電率が高く満足な特
性が得られていない。ポリフェニレンエーテル樹脂と多
官能シアン酸エステル樹脂類、更にこれにその他の樹脂
を配合し、ラジカル重合開始剤を添加し、予備反応させ
てなる硬化可能な樹脂組成物(特開昭57−18535
0号公報参照)が知られているが、誘電率の低下は不充
分であった。2. Description of the Related Art In recent years, there has been a demand for a resin for a laminate having excellent heat resistance and a low dielectric constant and a low dielectric loss tangent for a printed wiring used in a high frequency range. On the other hand, thermoplastic resins such as fluororesins and polyphenylene ether resins having a small dielectric constant have been proposed, but have problems such as poor workability and adhesiveness and lack of reliability. Therefore, an epoxy-modified polyphenylene ether resin or a polyphenylene ether-modified epoxy resin has been proposed for the purpose of improving workability and adhesiveness. However, the dielectric constant of the epoxy resin is high and satisfactory characteristics have not been obtained. A curable resin composition obtained by blending a polyphenylene ether resin and a polyfunctional cyanate ester resin, and further mixing other resins, adding a radical polymerization initiator, and performing a preliminary reaction (Japanese Patent Application Laid-Open No. S57-18535).
No. 0) is known, but the decrease in the dielectric constant was insufficient.
【0003】また熱硬化性の1,2−ポリブタジエンを
主成分とするポリブタジエン樹脂は低誘電率であるが、
接着性に劣り耐熱性が不充分であった。ポリフェニレン
エーテル樹脂100重量部に対し1,2−ポリブタジエ
ン樹脂5〜20重量部、架橋性モノマー5〜10重量部
及びラジカル架橋剤を配合した組成物(特開昭61−8
3224公報参照)が知られているが、分子量数千の
1,2−ポリブタジエン樹脂を用いた場合には組成物か
ら溶媒を除いた場合にベタツキが残り、ガラス基材等に
塗布、含浸して得られるプリプレグがタックフリーの状
態を維持できないので実用上問題があった。一方ベタツ
キを無くすために高分子量の1,2−ポリブタジエンを
用いる方法があるが、この方法によれば溶媒への溶解性
が低下し溶液が高粘度になり流動性が低下し実用上問題
であった。A polybutadiene resin containing thermosetting 1,2-polybutadiene as a main component has a low dielectric constant.
The adhesiveness was poor and the heat resistance was insufficient. Composition containing 5 to 20 parts by weight of a 1,2-polybutadiene resin, 5 to 10 parts by weight of a crosslinkable monomer and a radical crosslinking agent per 100 parts by weight of a polyphenylene ether resin (JP-A-61-8)
However, when a 1,2-polybutadiene resin having a molecular weight of several thousand is used, stickiness remains when the solvent is removed from the composition, and the composition is coated and impregnated on a glass substrate or the like. There is a practical problem since the obtained prepreg cannot maintain a tack-free state. On the other hand, in order to eliminate stickiness, there is a method using 1,2-polybutadiene having a high molecular weight. However, according to this method, the solubility in a solvent is reduced, the solution becomes high in viscosity, and the fluidity is reduced, which is a practical problem. Was.
【0004】[0004]
【発明が解決しようとする課題】本発明は低誘電率、高
耐熱性、高接着性を有し作業性にも優れた熱硬化性樹脂
を得るべく鋭意検討を重ねた結果なされたものである。SUMMARY OF THE INVENTION The present invention has been made as a result of intensive studies to obtain a thermosetting resin having low dielectric constant, high heat resistance, high adhesiveness and excellent workability. .
【0005】[0005]
【課題を解決するための手段】即ち本発明は、分子内に
2個以上のエポキシ基を含む下記一般式で示されるエポ
キシ樹脂(A)を主成分とするエポキシ樹脂と、That is, the present invention provides an epoxy resin containing, as a main component, an epoxy resin (A) represented by the following general formula containing two or more epoxy groups in a molecule:
【0006】[0006]
【化1】 (RはH又はC1〜C10のアルキル基を表し、それぞれ
のRは同一でも異なっていてもよく、Rの少なくとも一
つは前記アルキル基である。kは0〜10の整数であ
る。)下記一般式で表されるフェノール化合物(B)Embedded image (R represents an alkyl group of H or C 1 -C 10, each R may be the same or different, .k least one of R is the alkyl group is an integer of 0. ) A phenol compound (B) represented by the following general formula:
【0007】[0007]
【化2】 (l,mは0または1以上の整数、nは自然数を意味す
る。xはHまたはアルキル基を表わす。)とを含有する
ことを特徴とする低誘電率熱硬化性樹脂組成物である。Embedded image (L and m are 0 or an integer of 1 or more, n is a natural number, and x represents H or an alkyl group.).
【0008】[0008]
【作用】本発明において用いられるエポキシ樹脂(A)
はノボラック型のエポキシ樹脂であるので、耐熱性、接
着性に優れている。また、ベンゼン核に2個のアルキル
置換基を有することによりエポキシ樹脂の誘電率を低く
押さえることができる。分子内にエポキシ基を1個のみ
含むエポキシ化合物は硬化性が不充分で低耐熱性の硬化
物しか得られないので好ましくない。望ましいエポキシ
樹脂(A)としてはThe epoxy resin (A) used in the present invention
Is a novolak type epoxy resin, and thus has excellent heat resistance and adhesiveness. Also, by having two alkyl substituents on the benzene nucleus, the dielectric constant of the epoxy resin can be kept low. An epoxy compound containing only one epoxy group in the molecule is not preferable because the curability is insufficient and only a cured product having low heat resistance can be obtained. Desirable epoxy resin (A)
【0009】[0009]
【化3】 (kは1〜3の整数である。)Embedded image (K is an integer of 1 to 3.)
【0010】等の構造のC3〜C8のアルキル置換基を分
子内に有するエポキシ樹脂が好ましい。そして、An epoxy resin having a C 3 -C 8 alkyl substituent having the above structure in the molecule is preferred. And
【化4】 Embedded image
【0011】等ハロゲン置換基を有するエポキシ樹脂の
組合わせが好ましい例として挙げられ、また、テトラブ
ロモビスフェノールAなどのハロゲン置換基を有するフ
ェノール化合物との反応物も好ましく使用し得るが、特
に限定されるものではない。本発明のエポキシ樹脂はそ
の全量のうち15〜40重量%に相当するハロゲン置換
基を有することが好ましい。15重量%未満であると難
燃性が得られないので好ましくなく、40重量%を越え
ると耐熱性が損われるので好ましくない。ハロゲン置換
基は特に限定されるものではないが臭素、塩素等を挙げ
ることができる。また必要に応じて難燃助剤を添加する
こともできる。本発明において用いられるフェノール化
合物(B)は上記一般式(2)で示されるが、分子内に
フェノール性水酸基を有するため、エポキシ樹脂の硬化
剤として機能するものである。更に分子骨格には1,2
−あるいは1,4−ポリブタジエン残基を有していた
り、環化構造を有するために誘電率並びに誘電正接の値
を下げる機能を併せ持つので好ましい。このフェノール
化合物の水酸基当量は350〜2000であることが望
ましい。350未満であると誘電特性向上効果が薄れる
ので好ましくなく、2000を越えるとエポキシの硬化
剤としては架橋密度が低下して、充分な耐熱性が得られ
ないので好ましくない。本発明のエポキシ樹脂組成物は
特定のエポキシ樹脂とフェノール化合物を含有してなる
ものであるが、硬化速度を調整するために硬化促進剤を
用いることができる。硬化促進剤としては、イミダゾー
ル化合物、有機リン化合物、第3級アミン、第4級アン
モニウム塩などが用いられる。これらの促進剤は何種類
かを併用することも可能である。配合量はエポキシ樹脂
に対して 0.01〜5重量%が好ましい。 0.01重量
%未満であると促進効果が小さく、5重量%を越えると
保存安定性が低下する。Preferred examples include a combination of epoxy resins having a halogen substituent, and a reaction product with a phenol compound having a halogen substituent such as tetrabromobisphenol A can be preferably used. Not something. The epoxy resin of the present invention preferably has a halogen substituent equivalent to 15 to 40% by weight of the total amount. If it is less than 15% by weight, flame retardancy cannot be obtained, so that it is not preferable. If it exceeds 40% by weight, heat resistance is impaired, so that it is not preferable. The halogen substituent is not particularly limited, and examples thereof include bromine and chlorine. Further, a flame retardant aid can be added as needed. The phenol compound (B) used in the present invention is represented by the general formula (2), but has a phenolic hydroxyl group in the molecule, and thus functions as a curing agent for an epoxy resin. Furthermore, the molecular skeleton has 1,2
It has a-or 1,4-polybutadiene residue and has a cyclized structure, which is preferable because it has a function of lowering the dielectric constant and the dielectric loss tangent. The phenolic compound preferably has a hydroxyl equivalent of 350 to 2,000. If it is less than 350, the effect of improving the dielectric properties is undesirably reduced, and if it is more than 2,000, the crosslinking density of the epoxy curing agent decreases, and sufficient heat resistance cannot be obtained, which is not preferred. Although the epoxy resin composition of the present invention contains a specific epoxy resin and a phenol compound, a curing accelerator can be used to adjust the curing speed. As the curing accelerator, an imidazole compound, an organic phosphorus compound, a tertiary amine, a quaternary ammonium salt, or the like is used. Some of these accelerators can be used in combination. The compounding amount is preferably 0.01 to 5% by weight based on the epoxy resin. If it is less than 0.01% by weight, the accelerating effect is small, and if it exceeds 5% by weight, the storage stability decreases.
【0012】本発明のエポキシ樹脂組成物を種々の形態
で利用されるが、基材に塗布含浸する際にはしばしば溶
剤が用いられる。用いられる溶剤は組成物の一部或いは
全てに対して良好な溶解性を示すことが必要であるが、
悪影響を及ぼさない範囲で貧溶媒を用いることもでき
る。用いられる溶剤の例を挙げると、アセトン、メチル
エチルケトン、メチルイソブチルケトン、シクロヘキサ
ノン等のケトン系溶剤、トルエン、キシレン、メシチレ
ン等の芳香族炭化水素系溶剤、メチルセルソルブ、エチ
ルセルソルブブチルアルソルブ、イソブチルセルソル
ブ、ジエチレングリコールモノメチルエーテル、トリエ
チレングリコールモノメチルエーテル、プロピレングリ
コールモノメチルエーテル、ジプロピレングールモノメ
チルエーテル、プロピレングリコールモノプロピルエー
テル、ジプロピレングリコールモノプロピルエーテル、
エチレングリコールモノイソプロピルエーテル、ジエチ
レングリコールモノイソプロピルエーテル、ジエチレン
グリコールモノブチルエーテル等の各種グリコールエー
テル系溶剤、メチルセルソルブアセテート、エチルセル
ソルブアセテート、ブチルセルソルブアセテート、酢酸
エチル等のエステル系溶剤、エチレングリコールジメチ
ルエーテル、ジエチレングタコールジメチルエーテル、
ジエチレングリコールジエチルエーテル、ジエチレング
リコールジブチルエーテル等のジアルキルグリコールエ
ーテル系溶剤、N,N−ジメチルアセトアミド、N,N
−ジメチルホルムアミド、N−メチル−2−ピロリドン
等のアミド系溶剤、メタノール、エタノール等のアルコ
ール系溶剤があり、これらは何種類かを併用して用いる
こともできる。Although the epoxy resin composition of the present invention is used in various forms, a solvent is often used when coating and impregnating a substrate. The solvent used is required to show good solubility in part or all of the composition,
A poor solvent can be used as long as no adverse effect is exerted. Examples of solvents used include acetone, methyl ethyl ketone, methyl isobutyl ketone, ketone solvents such as cyclohexanone, aromatic hydrocarbon solvents such as toluene, xylene and mesitylene, methyl cellosolve, ethyl cellosolve butyl alsolve, and isobutyl. Cellosolve, diethylene glycol monomethyl ether, triethylene glycol monomethyl ether, propylene glycol monomethyl ether, dipropylene ghoul monomethyl ether, propylene glycol monopropyl ether, dipropylene glycol monopropyl ether,
Various glycol ether solvents such as ethylene glycol monoisopropyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monobutyl ether, etc .; ester solvents such as methyl cellosolve acetate, ethyl cellosolve acetate, butyl cellosolve acetate, and ethyl acetate; ethylene glycol dimethyl ether; diethylene Gutacol dimethyl ether,
Dialkyl glycol ether solvents such as diethylene glycol diethyl ether and diethylene glycol dibutyl ether, N, N-dimethylacetamide, N, N
There are amide solvents such as -dimethylformamide and N-methyl-2-pyrrolidone, and alcohol solvents such as methanol and ethanol, and some of these can be used in combination.
【0013】本発明のエポキシ樹脂組成物を上記溶剤を
用いて得られるワニスは、ガラス織布、ガラス不織布ま
たは紙、あるいはガラス以外を成分とする布等の基材に
塗布、含浸させ乾燥炉中で80〜200℃の範囲内で乾
燥させることにより、プリント配線板用プリプレグを得
ることができる。プリプレグは加熱加圧してプリント配
線板を製造することに用いられるが、本発明のエポキシ
樹脂組成物は低誘電率、低誘電正接で作業性に優れ金属
への接着性に優れた高耐熱性の熱硬化性樹脂であり、積
層板、金属張積層板等に好適に使用されるものである。A varnish obtained by using the epoxy resin composition of the present invention with the above-mentioned solvent is coated and impregnated on a substrate such as glass woven fabric, glass nonwoven fabric or paper, or a cloth having a component other than glass, and then impregnated in a drying oven. By drying in the range of 80 to 200 ° C., a prepreg for a printed wiring board can be obtained. Prepreg is used to manufacture printed wiring boards by heating and pressing, but the epoxy resin composition of the present invention has low dielectric constant, low dielectric loss tangent, excellent workability, excellent adhesion to metal, and high heat resistance. It is a thermosetting resin and is suitably used for a laminate, a metal-clad laminate, and the like.
【0014】[0014]
【実施例】以下本発明を実施例により更に詳しく説明す
る。 《実施例1》エポキシ当量が240である次式で示され
るエポキシ化合物66部(重量部、以下同じ)The present invention will be described in more detail with reference to the following examples. << Example 1 >> 66 parts of an epoxy compound represented by the following formula having an epoxy equivalent of 240 (parts by weight, the same applies hereinafter)
【化5】 Embedded image
【0015】にテトラブロモビスフェノールAを34部
加えて120℃に加熱撹拌し、更に2−メチルイミダゾ
ールを 0.01部添加して150℃で4時間反応させ、
エポキシ当量470、臭素含有率20%である固形のエ
ポキシ樹脂を得た。以下、これを樹脂(a)と略記す
る。樹脂(a)に対してOH当量317なる日本石油株
式会社製のフェノール樹脂PP−700−300(化合
式(2)において、l=m=0,n=1.23)を樹脂
(a)に対して当量比(エポキシ基モル数/水酸基モル
数)が1になるように添加し、更に両者の固形分の合計
100部に対して 0.8部の硬化促進剤、2−エチル−
4−メチルイミダゾールを加え、メチルエチルケトンで
不揮発分濃度55%となるようワニス溶液を調整した。
しかる後このワニスを用いてガラスクロス(厚さ0.1
8mm、日東紡績(株)製Eガラス)100部にワニスを
固形分で43部含浸させて150℃の乾燥炉中で4分間
乾燥させ、プリプレグを作成した。得られたプリプレグ
はタックフリーで作業性に優れていた。上記乾燥プリプ
レグ8枚重ねて上下に35μm厚みの電解銅箔を重ね
て、圧力40kgf/cm2、温度175℃で1時間加熱加
圧成形を行い、厚さ1.6mm の積層板を得た。この積層
板の表面をエッチング除去した後、121℃で圧力 2.
0気圧のプレッシャークッカー条件下で20時間処理
し、重量増加分を測定した。結果を表2に示す。34 parts of tetrabromobisphenol A was added thereto, and the mixture was heated and stirred at 120 ° C., and 0.01 parts of 2-methylimidazole was further added. The mixture was reacted at 150 ° C. for 4 hours.
A solid epoxy resin having an epoxy equivalent of 470 and a bromine content of 20% was obtained. Hereinafter, this is abbreviated as resin (a). A phenolic resin PP-700-300 manufactured by Nippon Oil Co., Ltd. having an OH equivalent of 317 with respect to the resin (a) (l = m = 0, n = 1.23 in the compound formula (2)) is used as the resin (a). And the equivalent ratio (moles of epoxy groups / moles of hydroxyl groups) to 1 was obtained. Further, 0.8 parts of a curing accelerator and 2-ethyl-
4-Methylimidazole was added, and the varnish solution was adjusted with methyl ethyl ketone to a non-volatile content of 55%.
Then, using this varnish, a glass cloth (thickness 0.1)
100 parts of 8 mm E glass manufactured by Nitto Boseki Co., Ltd. was impregnated with 43 parts of a varnish with a solid content and dried in a drying oven at 150 ° C. for 4 minutes to prepare a prepreg. The obtained prepreg was tack-free and excellent in workability. Eight pieces of the dried prepregs were stacked and electrolytic copper foil having a thickness of 35 μm was stacked on the upper and lower sides, and heated and pressed at a pressure of 40 kgf / cm 2 and a temperature of 175 ° C. for 1 hour to obtain a 1.6 mm thick laminated plate. After the surface of the laminate was removed by etching, the pressure was set at 121 ° C. 2.
The treatment was performed for 20 hours under a pressure cooker condition of 0 atm, and the weight increase was measured. Table 2 shows the results.
【0016】また、誘電率及び誘電正接の測定は JIS C
6481 に準じて行ない、周波数1MHzの静電容量を測
定して求めた。半田耐熱性、ピール強度についても JIS
C 6481 に準じて測定し、半田耐熱性は260℃、30
0秒で外観の異常の有無を調べた。難燃性はUL−94
規格に従い垂直法により評価した。またガラス転移温度
は粘弾性法により tan δ のピーク温度から求めた。こ
れらの結果を合わせて表2に示した。 《比較例1、2》表1に示したように各エポキシ樹脂の
組成及び硬化剤以外は全て実施例と同様の方法で積層板
を作成し種々の特性を評価した。結果を表2に示す。The measurement of the dielectric constant and the dielectric loss tangent are based on JIS C
The measurement was performed according to 6481, and the capacitance at a frequency of 1 MHz was measured. JIS for solder heat resistance and peel strength
Measured according to C 6481. Solder heat resistance is 260 ° C, 30
At 0 seconds, the appearance was checked for abnormalities. Flame retardant is UL-94
It was evaluated by the vertical method according to the standard. The glass transition temperature was determined from the peak temperature of tan δ by the viscoelastic method. The results are shown in Table 2. << Comparative Examples 1 and 2 >> As shown in Table 1, except for the composition of each epoxy resin and the curing agent, laminated boards were prepared in the same manner as in the examples, and various characteristics were evaluated. Table 2 shows the results.
【0017】[0017]
【表1】 [Table 1]
【0018】[0018]
【表2】 [Table 2]
【0019】[0019]
【発明の効果】表1,表2の結果からも明らかなよう
に、本発明のエポキシ樹脂組成物は低誘電率、低誘電正
接で金属への接着性及び耐熱性にも優れた熱硬化性樹脂
組成物である。従って低誘電率や低誘電正接が必要とさ
れるプリント配線板用には最適な樹脂であり、従来の積
層板用樹脂と同様の工程で銅張積層板を製造することが
でき産業上のメリット大である。As is clear from the results shown in Tables 1 and 2, the epoxy resin composition of the present invention has a low dielectric constant, a low dielectric loss tangent, and excellent thermosetting properties with excellent adhesion to metal and excellent heat resistance. It is a resin composition. Therefore, it is the most suitable resin for printed wiring boards that require low dielectric constant and low dielectric loss tangent, and copper-clad laminates can be manufactured in the same process as conventional resin for laminates, which is an industrial advantage. Is big.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 // H01B 3/40 H01B 3/40 K ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification code Agency reference number FI Technical indication location // H01B 3/40 H01B 3/40 K
Claims (3)
記一般式で示されるエポキシ樹脂(A)を主成分とする
エポキシ樹脂と、 【化1】 (RはH又は C1〜C10のアルキル基を表し、それぞれ
のRは同一でも異なっていてもよく、Rの少なくとも一
つは前記アルキル基である。kは0〜10の整数であ
る。)下記一般式で表されるフェノール化合物(B) 【化2】 (l,mは0または1以上の整数、nは自然数である。
xはHまたはアルキル基を表わす。)とを含有すること
を特徴とする低誘電率熱硬化性樹脂組成物。1. An epoxy resin containing, as a main component, an epoxy resin (A) represented by the following general formula containing two or more epoxy groups in a molecule: (R represents H or an alkyl group of C 1 to C 10 , wherein each R may be the same or different, at least one of R is the alkyl group, and k is an integer of 0 to 10. ) A phenolic compound (B) represented by the following general formula: (L and m are 0 or an integer of 1 or more, and n is a natural number.
x represents H or an alkyl group. A) a low-permittivity thermosetting resin composition comprising:
0重量%のハロゲン置換基を有することを特徴とする請
求項1記載の樹脂組成物。2. An epoxy resin having a total amount of 15 to 4
2. The resin composition according to claim 1, having 0% by weight of a halogen substituent.
350〜2000であることを特徴とする請求項1記載
の樹脂組成物。3. The resin composition according to claim 1, wherein the phenolic compound (B) has a hydroxyl equivalent of 350 to 2,000.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4344781A JP2716639B2 (en) | 1992-12-24 | 1992-12-24 | Low dielectric constant thermosetting resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4344781A JP2716639B2 (en) | 1992-12-24 | 1992-12-24 | Low dielectric constant thermosetting resin composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06192392A JPH06192392A (en) | 1994-07-12 |
| JP2716639B2 true JP2716639B2 (en) | 1998-02-18 |
Family
ID=18371937
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4344781A Expired - Fee Related JP2716639B2 (en) | 1992-12-24 | 1992-12-24 | Low dielectric constant thermosetting resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2716639B2 (en) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3310426B2 (en) * | 1993-12-08 | 2002-08-05 | 住友ベークライト株式会社 | Low dielectric constant thermosetting resin composition |
| JP3238064B2 (en) * | 1996-02-05 | 2001-12-10 | ティーディーケイ株式会社 | Method of using low dielectric polymer material and method of using film, substrate and electronic component using the same |
| KR20010013831A (en) | 1998-04-16 | 2001-02-26 | 엔오에프 코퍼레이션 | Composite Dielectric Material Composition, and Film, Substrate, Electronic Part and Molded Article Produced Therefrom |
| CN108192076A (en) * | 2017-12-29 | 2018-06-22 | 纽宝力精化(广州)有限公司 | A kind of preparation method of insulation board brominated epoxy resin and preparation method thereof and insulation board |
| CN119161537A (en) | 2019-12-03 | 2024-12-20 | 电化株式会社 | Copolymer and laminate containing the same |
| CN118599041A (en) | 2020-07-15 | 2024-09-06 | 电化株式会社 | Composition and cured body |
| KR102890823B1 (en) | 2020-09-11 | 2025-11-24 | 덴카 주식회사 | Composition and cured product thereof |
| KR20240051988A (en) | 2021-10-14 | 2024-04-22 | 덴카 주식회사 | Multilayer structure containing an insulating layer |
| US20250084195A1 (en) | 2022-01-19 | 2025-03-13 | Denka Company Limited | Copolymer, composition, varnish, and cured products of these |
| WO2024014436A1 (en) | 2022-07-11 | 2024-01-18 | デンカ株式会社 | Varnish and cured body thereof |
| CN120225576A (en) | 2022-12-27 | 2025-06-27 | 电化株式会社 | Copolymer, method for producing same, and cured body containing copolymer |
| JP7664498B1 (en) | 2023-08-02 | 2025-04-17 | デンカ株式会社 | Uncured sheet and its cured body |
-
1992
- 1992-12-24 JP JP4344781A patent/JP2716639B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06192392A (en) | 1994-07-12 |
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