JP2717210B2 - Semiconductor optical waveguide polarization element - Google Patents
Semiconductor optical waveguide polarization elementInfo
- Publication number
- JP2717210B2 JP2717210B2 JP11629888A JP11629888A JP2717210B2 JP 2717210 B2 JP2717210 B2 JP 2717210B2 JP 11629888 A JP11629888 A JP 11629888A JP 11629888 A JP11629888 A JP 11629888A JP 2717210 B2 JP2717210 B2 JP 2717210B2
- Authority
- JP
- Japan
- Prior art keywords
- optical waveguide
- light intensity
- intensity modulator
- interferometric light
- mode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/21—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour by interference
- G02F1/225—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour by interference in an optical waveguide structure
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、光通信,光信号処理に適用可能な偏波面選
択性を有する半導体光導波路型偏光素子に関するもので
ある。Description: TECHNICAL FIELD The present invention relates to a semiconductor optical waveguide type polarizing element having polarization plane selectivity applicable to optical communication and optical signal processing.
(従来の技術) 従来、この種の導波路型偏光素子として金属クラッデ
ィング偏光子がある。この金属クラッディング偏光子は
光導波路表面に直接金属をクラッディングすることによ
って、TMモードを吸収しTMモードのみを透過するという
特徴をもっている。(Prior Art) Conventionally, there is a metal cladding polarizer as this type of waveguide type polarizing element. This metal cladding polarizer has the characteristic that it absorbs the TM mode and transmits only the TM mode by cladding the metal directly on the optical waveguide surface.
この従来例としては、文献(Y.Suematsu,M.Hakuta,K.
Furuya,K.Chiba,and R.HasumiらによりAppl.Phys,Let
t.,vol.21,No.6,pp.291−293,Sept.1972)に記載された
ものである。このような従来例を第4図に基づいて説明
する。As this conventional example, a literature (Y. Suematsu, M. Hakuta, K.
Appl.Phys, Let by Furuya, K. Chiba, and R. Hasumi
t., vol. 21, No. 6, pp. 291-293, Sept. 1972). Such a conventional example will be described with reference to FIG.
第4図は従来例の構成図である。基板11の上にそれよ
り屈折率の大きい薄膜12を設け、光導波層とする。薄膜
12の一部には金属(アルミニウム)膜13が設けられてい
る。光はプリズム14によりA→B→C→Dのように伝搬
し、BC間を伝搬する間にTMモードのみが減衰し、Dから
はTEモードだけが出射する。FIG. 4 is a configuration diagram of a conventional example. A thin film 12 having a larger refractive index is provided on a substrate 11 to serve as an optical waveguide layer. Thin film
A metal (aluminum) film 13 is provided on a part of 12. The light is propagated by the prism 14 in the order of A → B → C → D. While propagating between the BCs, only the TM mode is attenuated, and from the D, only the TE mode is emitted.
(発明が解決しようとする課題) 第4図に示すような従来例では、TEモードだけを透過
することができるが、TEあるいはTMいずれかの偏波モー
ドを選択的に透過することはできない。また、光導波層
12は1次元的な光閉じ込めを持つだけで、光が光導波層
12を伝搬する間に広がるため、信号光の強度が減衰す
る。従って、光信号処理等を目的とした導波路型素子と
して従来例を適用することはできない。(Problems to be Solved by the Invention) In the conventional example as shown in FIG. 4, only the TE mode can be transmitted, but either the TE or TM polarization mode cannot be selectively transmitted. Also, the optical waveguide layer
12 has only one-dimensional optical confinement, and the light is
Since it spreads while propagating through 12, the intensity of the signal light is attenuated. Therefore, the conventional example cannot be applied as a waveguide type element for the purpose of optical signal processing or the like.
導波路型素子を用いて光信号処理を行う場合、導波路
型素子はTEあるいはTMのいずれかの偏光に対してのみ動
作することが多く、したがってTEとTMモードのいずれか
を選択することが要求される。本発明は上記の要望に沿
うため提案されたもので、TEとTMモードをいずれかを選
択的に除去し、一方の偏波モードのみを選択的に透過す
る半導体光導波路型偏光素子を提供することを目的とす
る。When performing optical signal processing using a waveguide-type element, the waveguide-type element often operates only for either TE or TM polarized light, and therefore, it is often necessary to select either TE or TM mode. Required. The present invention has been proposed in order to meet the above demand, and provides a semiconductor optical waveguide type polarizing element that selectively removes either TE mode or TM mode and selectively transmits only one polarization mode. The purpose is to:
(課題を解決するための手段) 上記目的を達成するため、本発明は、2次元的な光閉
じ込めを有する1本の半導体光導波路を2本に分岐した
後、再び1本にすることによって構成される干渉型光強
度変調器を、縦列に2個以上接続する半導体光導波路型
偏光素子であって、この半導体光導波路型偏光素子は、
3mの対称性をもつジンクブレンド型半導体結晶に形成
された光導波路からなり、縦列に接続される2個以上の
干渉型光強度変調器は、その干渉型光強度変調器を構成
する光導波路の方向が、半導体の(100)面内で<0
1>方位あるいは<011>方位と平行である第1の干渉
型光強度変調器と、前記第1の干渉型光強度変調器との
なす角度の大きさが45度である第2の干渉型光強度変調
器とに区別され、前記第1の干渉型光強度変調器を構成
する半導体光導波路は、(100)面内にあって<01
>方向に平行な方向に延びていて、電極を介し(100)
面に垂直な電場を印加し、かつ第2の干渉型光強度変調
器部分は、光導波路は(100)面内にあって第1の干渉
型光強度変調器部分の光導波路と45度をなす方向に延び
て、(100)面に平行であって光導波路の延在する方向
と垂直な方向に電極を介し電場を印加することで、第1
の干渉型光強度変調器部分ではTEモードのみを、第2の
干渉型光強度変調器部分ではTMモードのみを変調して何
れかを選択的に出射可能としたことを特徴とする半導体
光導波路型偏光素子を発明の要旨とするものである。(Means for Solving the Problems) In order to achieve the above object, the present invention is configured such that one semiconductor optical waveguide having two-dimensional optical confinement is branched into two, and then made one again. A plurality of interferometric light intensity modulators to be connected in tandem, a semiconductor optical waveguide type polarizing element,
It consists of an optical waveguide formed on a zinc-blend type semiconductor crystal having a symmetry of 3 m, and two or more interferometric light intensity modulators connected in tandem are the optical waveguides constituting the interferometric light intensity modulator. The direction is <0 in the (100) plane of the semiconductor.
A first interference type light intensity modulator parallel to the 1> direction or the <011> direction, and a second interference type in which an angle between the first interference type light intensity modulator and the first interference type light intensity modulator is 45 degrees. The semiconductor optical waveguide constituting the first interference type optical intensity modulator, which is distinguished from the optical intensity modulator, is located in the (100) plane and is <01.
> Extends in the direction parallel to the direction, and through the electrode (100)
An electric field perpendicular to the plane is applied, and the second interferometric light intensity modulator section is such that the optical waveguide is in the (100) plane and is 45 degrees with the optical waveguide of the first interferometric light intensity modulator section. By applying an electric field through an electrode in a direction parallel to the (100) plane and perpendicular to the direction in which the optical waveguide extends, the first
Wherein only the TE mode is modulated in the interferometric light intensity modulator portion and only the TM mode is modulated in the second interferometric light intensity modulator portion so that either one can be selectively emitted. It is an object of the present invention to provide a type polarizing element.
しかして、本発明は導波路型素子を用いた光信号処理
を有効に行うために、電圧を印加することによってTEあ
るいはTMの偏波モードのいずれか一方だけを選択的に透
過することを最も主要な特徴とする。従来の導波路型偏
光子では、透過する偏波モードは予め定められており、
任意の偏波モードだけを選択的に透過することは不可能
であった。一方、本発明においては、電圧印加により透
過する偏波モードを選択できる点が従来の技術とは著し
く異なる。更に従来技術の金属クラッディング偏光子は
1次元的な光閉じ込めしか持たず、光導波路素子へ応用
することは困難である。一方、本発明の偏光素子は2次
元的な光閉じ込めを持つ半導体光導波路によって構成さ
れており、光導波路素子として光集積回路への応用も十
分可能である。Therefore, in order to effectively perform optical signal processing using the waveguide element, the present invention most prefers to selectively transmit only one of the TE and TM polarization modes by applying a voltage. Main features. In the conventional waveguide polarizer, the polarization mode to be transmitted is predetermined,
It was impossible to selectively transmit only an arbitrary polarization mode. On the other hand, the present invention is significantly different from the prior art in that a polarization mode that transmits by applying a voltage can be selected. Further, the metal cladding polarizer of the prior art has only one-dimensional light confinement, and is difficult to apply to an optical waveguide device. On the other hand, the polarizing element of the present invention is composed of a semiconductor optical waveguide having two-dimensional optical confinement, and is sufficiently applicable to an optical integrated circuit as an optical waveguide element.
(作用) 本発明は2次元的な光閉じ込めを有する半導体光導波
路によって構成される2つの干渉型光強度変調器を縦列
接続して構成されているので、電極に印加する電圧によ
ってTEあるいはTMのいずれかの偏波モードを選択的に透
過させることができる。(Operation) Since the present invention is configured by cascade-connecting two interferometric light intensity modulators each formed by a semiconductor optical waveguide having two-dimensional optical confinement, the TE or TM is changed depending on the voltage applied to the electrodes. Either polarization mode can be selectively transmitted.
次に本発明の実施例について説明する。なお、実施例
は一つの例示であって、本発明の精神を逸脱しない範囲
で、種々の変更あるいは改良を行いうることは言うまで
もない。Next, examples of the present invention will be described. It should be noted that the embodiments are merely examples, and it is needless to say that various changes or improvements can be made without departing from the spirit of the present invention.
(実施例) 第1図は本発明の半導体光導波路型変光素子の実施例
を示す。この図において信号光は2次元的な光閉じ込め
を有する半導体光導波路中をA→B→C→D→E→Fと
伝搬する。四角形PQRSはGaAsあるいはInP等の3mの対
称性をもつジンクブレンド型半導体結晶の(100)面で
あり、PQとPSとは<011>に垂直なへき開面であり、QP
とSPは<01>に垂直なへき開面である。1a,1bおよ
び2a,2bはそれぞれ光導波路の両側に設けられた電極を
表す。(Embodiment) FIG. 1 shows an embodiment of a semiconductor optical waveguide type variable light device according to the present invention. In this figure, signal light propagates in a semiconductor optical waveguide having two-dimensional optical confinement in the order of A → B → C → D → E → F. The square PQRS is the (100) plane of a zinc-blend semiconductor crystal with a symmetry of 3 m, such as GaAs or InP. PQ and PS are cleavage planes perpendicular to <011>.
And SP are cleavage planes perpendicular to <01>. 1a, 1b and 2a, 2b represent electrodes provided on both sides of the optical waveguide, respectively.
BとCの間は1本の光導波路を2本の直線光導波路に
分岐した後、再び1本に戻す第1の干渉型光強度変調器
を形成している。BC間の光導波路の長さはいずれの経路
をとっても等しい。AとBとCで構成される直線はPQに
平行すなわち<01>方向の直線となる。DE間はBC間と
同一の第2の干渉型光強度変調器である。BC間とDE間の
第1及び第2の干渉型光強度変調器は互いに角度θを形
成するように、光導波路CDを介して滑らかに接続され
る。光導波路EFは、SPと平行なへき開面QRから信号光を
出射させるために滑らかな曲線を形成する。1a,1bは第
1の干渉型光強度変調器の電極、2a,2bは第2の干渉型
光強度変調器の電極を示す。A first interference type optical intensity modulator is formed between B and C, after one optical waveguide is branched into two linear optical waveguides and then returned to one. The length of the optical waveguide between the BCs is the same regardless of the path. The straight line composed of A, B and C is parallel to PQ, that is, a straight line in the <01> direction. Between the DEs is the same second interferometric light intensity modulator as between the BCs. The first and second interferometric light intensity modulators between BC and DE are smoothly connected via an optical waveguide CD so as to form an angle θ with each other. The optical waveguide EF forms a smooth curve for emitting signal light from the cleavage plane QR parallel to the SP. Reference numerals 1a and 1b denote electrodes of the first interferometric light intensity modulator, and 2a and 2b denote electrodes of the second interferometric light intensity modulator.
第2,第3図はそれぞれBC間(第1)とDE間(第2)の
干渉型光強度変調器のK−L及びM−Nに沿う断面図で
ある。第2図及び第3図において、4は(100)面をも
つ半導体基板、6は半導体基板4上にエピタキシャル成
長した膜であり、5はエピタキシャル膜6の中に形成さ
れ、かつ膜6より大きな屈折率を有する半導体光導波路
である。7と9と10とは夫々電極8又は11とオーミック
接合を得るための高キャリア濃度領域であると同時に、
領域7は光導波路5に(100)面と垂直方向に電圧を印
加し、領域9と10とは光導波路5に(100)面と平行方
向の電圧を印加する働きをもつ。3と8と11とはオーミ
ック電極である。2 and 3 are cross-sectional views of the interferometric light intensity modulator between BC (first) and DE (second) along KL and MN, respectively. 2 and 3, 4 is a semiconductor substrate having a (100) plane, 6 is a film epitaxially grown on the semiconductor substrate 4, and 5 is formed in the epitaxial film 6 and has a larger refraction than the film 6. It is a semiconductor optical waveguide having an index. 7, 9 and 10 are high carrier concentration regions for obtaining an ohmic junction with the electrode 8 or 11, respectively.
The region 7 applies a voltage to the optical waveguide 5 in a direction perpendicular to the (100) plane, and the regions 9 and 10 apply a voltage to the optical waveguide 5 in a direction parallel to the (100) plane. 3, 8 and 11 are ohmic electrodes.
次に動作について説明する。 Next, the operation will be described.
第1図のAから偏波方向が(100)面と平行なTEと偏
波方向が(100)面と垂直なTMモードの混在した楕円偏
光が入射するとする。BC間の第1の干渉型光強度変調器
を構成する2本の平行な光導波路のうちの一方の光導波
路に(100)面と垂直方向に第2図の電極3と8を介し
て電圧を印加すると、光導波路を伝搬するTEとTMモード
のうちの、TEモードだけの位相を変化させることができ
る。このときTMモードの位相はまったく変化しない。印
加する電圧を適当に選ぶことによってTEモードの位相変
化量を半波長分すなわちπとすることができ、この場合
TEモードはCにおいて、第1の干渉型光強度変調器の他
方の光導波路を伝搬してきたTEモードと逆相となり、C
以降の光導波路を伝搬するTEモードの光強度は消滅す
る。次にBC間とDE間との第1及び第2の干渉型光強度変
調器のなす角度θが±45度となるように製作された第1
図の実施例において、DE間の第2の干渉型光強度変調器
と構成する2本の平行な光導波路のうちの一方の光導波
路に(100)面と平行方向に第3図の電極11を介して電
圧を印加すると、光導波路を伝搬するTEとTMモードのう
ちのTMモードだけの位相を変化させることができる。It is assumed from FIG. 1A that elliptically polarized light in which a TE mode whose polarization direction is parallel to the (100) plane and a TM mode whose polarization direction is perpendicular to the (100) plane are mixed. A voltage is applied to one of the two parallel optical waveguides constituting the first interferometric light intensity modulator between BCs in the direction perpendicular to the (100) plane via the electrodes 3 and 8 in FIG. Is applied, the phase of only the TE mode of the TE mode and the TM mode propagating in the optical waveguide can be changed. At this time, the phase of the TM mode does not change at all. By appropriately selecting the voltage to be applied, the phase change amount of the TE mode can be set to a half wavelength, that is, π.
The TE mode has a phase opposite to that of the TE mode propagating in the other optical waveguide of the first interferometric light intensity modulator at C.
The subsequent light intensity of the TE mode propagating through the optical waveguide disappears. Then, the first and second interferometric light intensity modulators between BC and DE are manufactured so that the angle θ is ± 45 degrees.
In the embodiment shown in the figure, one of the two parallel optical waveguides constituting the second interferometric light intensity modulator between DEs is provided with one of the electrodes 11 of FIG. 3 in a direction parallel to the (100) plane. When a voltage is applied through the optical waveguide, the phase of only the TM mode of the TE mode and the TM mode propagating in the optical waveguide can be changed.
印加する電圧を適当に選ぶことによって、TEモードの
位相変化量をπとすることができ、Eにおいて他方の光
導波路を伝搬してきたTMモードと逆相の関係にできる。
したがって、E以降の光導波路を伝搬するTMモードの光
強度は消滅する。この場合にはTEモードの伝搬光はDM間
では何らの位相変化も受けない。By appropriately selecting the voltage to be applied, the phase change amount of the TE mode can be set to π, and the relationship of the E mode and the TM mode which has propagated through the other optical waveguide can be reversed.
Therefore, the light intensity of the TM mode propagating through the optical waveguide after E disappears. In this case, the propagation light of the TE mode does not undergo any phase change between DMs.
このようなTEとTMモードに対する変調特性を有する2
つの干渉型光強度変調器を縦列に接続した第1図の実施
例においては、TEとTMモードの混在する信号光をAから
入力し、BC間の干渉型光強度変調器の一方の光導波路に
適当な電圧を印加し、さらにDE間の干渉型光強度変調器
には電圧を印加しない場合にはFからTMモードのみを出
力させることができる。また、BC間の干渉型光強度変調
器には電圧を印加せず、DE間の干渉型光強度変調器の一
方の光導波路に適当な電圧を印加する場合にはFからTE
モードのみを出力させることができる。2 having modulation characteristics for such TE and TM modes
In the embodiment of FIG. 1 in which two interferometric light intensity modulators are connected in cascade, a signal light in which TE and TM modes coexist is input from A, and one optical waveguide of the interferometric light intensity modulator between BC is input. When an appropriate voltage is applied to the light source and no voltage is applied to the interferometric light intensity modulator between DEs, F can output only the TM mode. Further, when a voltage is not applied to the interferometric light intensity modulator between BC and an appropriate voltage is applied to one of the optical waveguides of the interferometric light intensity modulator between DE, F to TE
Only the mode can be output.
この結果から明らかなように、2次元的な光閉じ込め
を有する半導体光導波路によって構成される2つの干渉
型光強度変調器を縦列接続した本発明の偏光素子は、電
極に印加する電圧によってTEあるいはTMいずれかの偏波
モードを選択的に透過させることができるという特長を
有する。As is clear from this result, the polarizing element of the present invention in which two interferometric light intensity modulators each formed by a semiconductor optical waveguide having two-dimensional light confinement are connected in cascade, TE or TE depends on the voltage applied to the electrode. It has the feature that any polarization mode can be selectively transmitted.
(発明の効果) 叙上のように本発明による半導体偏光素子は、透過さ
せる偏光モードを電圧印加により選択でき、かつ2次元
的な光閉じ込めを有する光導波路によって構成されるた
めに、光通信あるいは光信号処理を目的とした光導波路
型素子としての応用が可能である効果を有する。(Effects of the Invention) As described above, the semiconductor polarization element according to the present invention can select the polarization mode to be transmitted by applying a voltage and is constituted by an optical waveguide having two-dimensional optical confinement. This has the effect that it can be applied as an optical waveguide device for optical signal processing.
第1図は本発明の半導体光導波路型偏光素子の実施例、
第2図及び第3図は第1図においてK−L及びM−N線
に沿う断面図、第4図は従来例を示す。 1a,1b,2a,2b……変調用電極 3,8,11……電極 4……半導体基板 5……光導波路 6……光導波路5より屈折率の小さいエピタキシャル成
長膜 7,9,10……高キャリア濃度領域FIG. 1 shows an embodiment of a semiconductor optical waveguide type polarizing element of the present invention,
2 and 3 are sectional views taken along lines KL and MN in FIG. 1, and FIG. 4 shows a conventional example. 1a, 1b, 2a, 2b: Modulating electrodes 3, 8, 11: Electrode 4: Semiconductor substrate 5: Optical waveguide 6: Epitaxially grown film having a smaller refractive index than optical waveguide 5 7, 9, 10 ... High carrier concentration region
Claims (1)
体光導波路を2本に分岐した後、再び1本にすることに
よって構成される干渉型光強度変調器を、縦列に2個以
上接続する半導体光導波路型偏光素子であって、この半
導体光導波路型偏光素子は、3mの対称性をもつジンク
ブレンド型半導体結晶に形成された光導波路からなり、
縦列に接続される2個以上の干渉型光強度変調器は、そ
の干渉型光強度変調器を構成する光導波路の方向が、半
導体の(100)面内で<01>方位あるいは<011>方
位と平行である第1の干渉型光強度変調器と、前記第1
の干渉型光強度変調器とのなす角度の大きさが45度であ
る第2の干渉型光強度変調器とに区別され、前記第1の
干渉型光強度変調器を構成する半導体光導波路は、(10
0)面内にあって<011>方向に平行な方向に延びて
いて、電極を介し(100)面に垂直な電場を印加し、か
つ第2の干渉型光強度変調器部分は、光導波路は(10
0)面内にあって第1の干渉型光強度変調器部分の光導
波路と45度をなす方向に延びて、(100)面に平行であ
って光導波路の延在する方向と垂直な方向に電極を介し
電場を印加することで、第1の干渉型光強度変調器部分
ではTEモードのみを、第2の干渉型光強度変調器部分で
はTMモードのみを変調して何れかを選択的に出射可能と
したことを特徴とする半導体光導波路型偏光素子。1. An interferometric light intensity modulator comprising a semiconductor optical waveguide having two-dimensional optical confinement, which is divided into two, and then split into two. A semiconductor optical waveguide type polarizing element to be connected, the semiconductor optical waveguide type polarizing element comprises an optical waveguide formed on a zinc blend type semiconductor crystal having a symmetry of 3 m,
In the two or more interferometric light intensity modulators connected in cascade, the direction of the optical waveguide forming the interferometric light intensity modulator is <01> orientation or <011> orientation in the (100) plane of the semiconductor. A first interferometric light intensity modulator parallel to
The semiconductor optical waveguide constituting the first interferometric light intensity modulator is distinguished from the second interferometric light intensity modulator in which the angle formed by the interferometric light intensity modulator is 45 degrees. ,(Ten
0) an electric field which extends in a direction parallel to the <011> direction in the plane, applies an electric field perpendicular to the (100) plane through an electrode, and the second interferometric light intensity modulator comprises an optical waveguide Is (10
0) A direction extending in the plane at an angle of 45 degrees with the optical waveguide of the first interferometric light intensity modulator, parallel to the (100) plane and perpendicular to the direction in which the optical waveguide extends. The first interferometric light intensity modulator modulates only the TE mode and the second interferometric light intensity modulator modulates only the TM mode by applying an electric field through the electrodes to select either one. A semiconductor optical waveguide type polarizing element characterized in that light can be emitted to the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11629888A JP2717210B2 (en) | 1988-05-13 | 1988-05-13 | Semiconductor optical waveguide polarization element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11629888A JP2717210B2 (en) | 1988-05-13 | 1988-05-13 | Semiconductor optical waveguide polarization element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01285919A JPH01285919A (en) | 1989-11-16 |
| JP2717210B2 true JP2717210B2 (en) | 1998-02-18 |
Family
ID=14683562
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11629888A Expired - Fee Related JP2717210B2 (en) | 1988-05-13 | 1988-05-13 | Semiconductor optical waveguide polarization element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2717210B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07318986A (en) * | 1994-05-25 | 1995-12-08 | Nec Corp | Waveguide type optical switch |
| JP2007134480A (en) * | 2005-11-10 | 2007-05-31 | Nippon Telegr & Teleph Corp <Ntt> | Tunable light source |
| JP2007133286A (en) * | 2005-11-14 | 2007-05-31 | Nippon Telegr & Teleph Corp <Ntt> | Wavelength multiplexer / demultiplexer |
| JP2007133287A (en) * | 2005-11-14 | 2007-05-31 | Nippon Telegr & Teleph Corp <Ntt> | Wavelength multiplexer / demultiplexer |
| JP2008282937A (en) * | 2007-05-10 | 2008-11-20 | Nippon Telegr & Teleph Corp <Ntt> | Tunable light source |
-
1988
- 1988-05-13 JP JP11629888A patent/JP2717210B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01285919A (en) | 1989-11-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |