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JP2723082B2 - Oxide magnetic body and magnetic sensing element using the same - Google Patents
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JP2723082B2 - Oxide magnetic body and magnetic sensing element using the same - Google Patents

Oxide magnetic body and magnetic sensing element using the same

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Publication number
JP2723082B2
JP2723082B2 JP7159544A JP15954495A JP2723082B2 JP 2723082 B2 JP2723082 B2 JP 2723082B2 JP 7159544 A JP7159544 A JP 7159544A JP 15954495 A JP15954495 A JP 15954495A JP 2723082 B2 JP2723082 B2 JP 2723082B2
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JP
Japan
Prior art keywords
magnetic
layer
oxide
magnetic field
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP7159544A
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Japanese (ja)
Other versions
JPH097832A (en
Inventor
毅 小畑
久尚 柘植
伸明 正畑
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP7159544A priority Critical patent/JP2723082B2/en
Priority to US08/670,615 priority patent/US5681500A/en
Publication of JPH097832A publication Critical patent/JPH097832A/en
Application granted granted Critical
Publication of JP2723082B2 publication Critical patent/JP2723082B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/02Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09Magnetoresistive devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3967Composite structural arrangements of transducers, e.g. inductive write and magnetoresistive read
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/40Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials of magnetic semiconductor materials, e.g. CdCr2S4
    • H01F1/401Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials of magnetic semiconductor materials, e.g. CdCr2S4 diluted
    • H01F1/407Diluted non-magnetic ions in a magnetic cation-sublattice, e.g. perovskites, La1-x(Ba,Sr)xMnO3
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/80Constructional details
    • H10N50/85Materials of the active region
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B2005/3996Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Power Engineering (AREA)
  • Thin Magnetic Films (AREA)
  • Hall/Mr Elements (AREA)
  • Measuring Magnetic Variables (AREA)
  • Magnetic Heads (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、磁気抵抗効果を有する
材料と、それを用いた高感度磁気検出素子に関するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a material having a magnetoresistance effect and a high-sensitivity magnetic sensing element using the same.

【0002】[0002]

【従来の技術】従来、磁気抵抗効果を利用した磁気セン
サーや薄膜磁気ヘッドの磁性薄膜には、パーマロイを中
心とした金属磁性材料が用いられて形成されている。こ
のような磁気抵抗効果素子は、パーマロイの電流方向と
磁化の方向の相対角に依存して生じる抵抗の差を利用し
たものであるが、磁気抵抗変化率が、3〜4%程度と小
さく、高感度化のためには、磁気抵抗変化率の大きい材
料が望まれている。ここでいう磁気抵抗変化率ΔR/R
とは、下記の数式1のように磁場中の抵抗値RHから零
磁場での抵抗値Ro を引いたものを磁場中の抵抗値RH
で除した値を指すものとする。
2. Description of the Related Art Conventionally, magnetic thin films of magnetic sensors and thin-film magnetic heads utilizing the magnetoresistive effect have been formed by using metallic magnetic materials centering on permalloy. Such a magnetoresistive element utilizes a difference in resistance generated depending on the relative angle between the current direction of Permalloy and the direction of magnetization. However, the magnetoresistance change rate is as small as about 3 to 4%. For high sensitivity, a material having a large magnetoresistance change rate is desired. The rate of change in magnetoresistance ΔR / R here
The resistance value R H of a magnetic field the minus resistance R o of zero magnetic field from the resistance value R H of a magnetic field as Equation 1 below
It means the value divided by.

【0003】[0003]

【数1】 近年、パーマロイより高感度な磁気抵抗効果材料とし
て、例えば第69回日本応用磁気学会研究会資料(19
91)の21〜26頁に記載されているFe/Cr/F
e、アイ・イー・イー・イー・トランスアクション・オ
ン・マグネティクス 第18巻第2号(1982)の7
07〜708頁(IEEE Transaction
on Magnetics,Vol.Mag−18,N
o.2(1982),707−708)に記載されてい
るNi/NiO/Ni、フィジカルレビュー B 第4
3巻第1号(1991)の1297〜1300頁(Ph
ysical Review B,vol.43,N
o.1(1991),1297−1300)に記載され
ているいわゆるスピンバルブと称されるような積層膜が
挙げられる。
(Equation 1) In recent years, as a magnetoresistive material having a higher sensitivity than permalloy, for example, the 69th meeting of the Japan Society of Applied Magnetics (19)
91) Fe / Cr / F described on pages 21-26.
e, IEE Transactions on Magnetics Vol. 18, No. 2, Issue 1982-7
Pages 07 to 708 (IEEE Transaction)
on Magnetics, Vol. Mag-18, N
o. 2 (1982), 707-708), Ni / NiO / Ni, Physical Review B No. 4
Vol. 3, No. 1 (1991), pages 1297-1300 (Ph
original Review B, vol. 43, N
o. 1 (1991), 1297-1300).

【0004】さらに最近、La−(Ca,Sr)−Mn
−Oより構成されるペロブスカイト型の結晶構造を有す
る酸化物において、50〜100000%という非常に
大きな磁気抵抗変化率が観測されている(アプライド・
フィジックス・レターズ 63巻、14号(199
3)、1990〜1992頁(Applied Phy
sics Letters,vol.63,No.14
(1993),1990−1992)あるいはアプライ
ド・フィジックス・レターズ 64巻、22号(199
4)、3045〜3047頁(Applied Phy
sics Letters,vol.64,No.22
(1994),3045−3047))。例えば、特開
平6−237022号公報によれば、イオンビームスパ
ッタ法によってMgO(100)基板上に付着させたL
1-x Cax MnO3 の薄膜では最大で−50%の巨大
な磁気抵抗変化率が観測されており、この材料の薄膜を
用いて磁気抵抗効果素子を作成している。また、アプラ
イド・フィジックス・レターズ64巻、22号(199
4)、3045−3047(Appl.Phys.Le
tt.,vol.64(1994),3045−304
7)によれば、パルスドレーザーデポジション法によっ
てLaAlO3 上に付着されたLa0.66Ca0.33MnO
3 の薄膜では最大で−127000%という非常に巨大
な磁気抵抗変化率が観測されている。ここで、前記のL
a−(Ca,Sr)−Mn−Oより構成されるペロブス
カイト型の結晶構造を有する酸化物が大きな磁気抵抗効
果を示す理由について以下に簡単に述べる。このLa−
(Ca,Sr)−Mn−O系酸化物は、温度が強磁性−
常磁性転移温度より十分小さい時にはMnイオンの伝導
電子のスピンが強磁性的に揃い、金属的な電気伝導性を
示すが、温度が強磁性−常磁性転移温度近傍やそれ以上
になると、そのスピンの秩序が乱れ、電気抵抗が上昇す
る。このLa−(Ca,Sr)−Mn−O系酸化物にお
ける負の巨大磁気抵抗効果は、強磁性−常磁性転移温度
近傍で外部磁場によってそのスピンの秩序の乱れが、修
復されて伝導電子が強磁性的に揃うことによって起こる
と考えられている。
More recently, La- (Ca, Sr) -Mn
In oxides having a perovskite-type crystal structure composed of -O, an extremely large magnetoresistance change ratio of 50 to 100000% has been observed (Applied.
Physics Letters 63, 14 (199
3), 1990-1992 (Applied Phy
sics Letters, vol. 63, No. 14
(1993), 1990-1992) or Applied Physics Letters 64, 22 (199).
4), pp. 3045-3047 (Applied Phys)
sics Letters, vol. 64, no. 22
(1994), 3045-3047)). For example, according to Japanese Patent Application Laid-Open No. 6-237022, L deposited on an MgO (100) substrate by an ion beam sputtering method.
In the thin film of a 1-x Ca x MnO 3 , a giant magnetoresistance change rate of -50% at the maximum was observed, and a magnetoresistive element was formed using the thin film of this material. Also, Applied Physics Letters 64, 22 (199
4), 3045-3047 (Appl. Phys. Le)
tt. , Vol. 64 (1994), 3045-304
According to 7), La 0.66 Ca 0.33 MnO deposited on LaAlO 3 by pulsed laser deposition.
In the thin film of No. 3 , an extremely large magnetoresistance change rate of up to -127000% is observed. Where L
The reason why an oxide having a perovskite crystal structure composed of a- (Ca, Sr) -Mn-O exhibits a large magnetoresistance effect will be briefly described below. This La-
(Ca, Sr) -Mn-O-based oxide has a ferromagnetic temperature.
When the temperature is sufficiently lower than the paramagnetic transition temperature, the spins of the conduction electrons of the Mn ions are ferromagnetically aligned and exhibit metallic electrical conductivity. However, when the temperature is near or above the ferromagnetic-paramagnetic transition temperature, the spin becomes Disorder and the electrical resistance rises. The negative giant magnetoresistance effect in the La- (Ca, Sr) -Mn-O-based oxide is that the disorder of the spin order is restored by an external magnetic field near the ferromagnetic-paramagnetic transition temperature, and the conduction electrons are restored. It is thought to be caused by ferromagnetic alignment.

【0005】[0005]

【発明が解決しようとする課題】近年の磁気記録の高密
度化や磁気センサーの高感度化の要求に伴い、より小さ
な磁場変化で大きい抵抗変化を示す(すなわち磁場感度
の高い)材料が必要とされているが、前記の従来材料で
はいわゆる飽和磁場が0.1〜数Tと大きい上に、前記
のような大きな磁気抵抗変化率を得るには−200℃以
下という極低温が必要であるという大きな欠点があっ
た。
With the recent demand for higher density of magnetic recording and higher sensitivity of magnetic sensors, a material which exhibits a large resistance change with a smaller magnetic field change (that is, a material having a high magnetic field sensitivity) is required. However, in the above-mentioned conventional materials, the so-called saturation magnetic field is as large as 0.1 to several T, and an extremely low temperature of −200 ° C. or less is required to obtain the large magnetoresistance change rate as described above. There were major drawbacks.

【0006】例えば前記のLa−(Ca,Sr)−Mn
−Oより構成されるペロブスカイト型の結晶構造を有す
る酸化物では、外部磁場の方向をc軸方向とすると、M
nイオンのスピンはc面内で強磁性的に結合しているだ
けではなく、c面間でも反強磁性的に結合しているの
で、小さな外部磁場では強磁性−常磁性転移温度近傍で
のスピンの乱れを十分に修復できない。また、本質的に
この酸化物では強磁性−常磁性転移温度が約−200℃
とかなり低いという欠点があった。
For example, the aforementioned La- (Ca, Sr) -Mn
In an oxide having a perovskite crystal structure composed of —O, the direction of the external magnetic field is c-axis direction,
Since the spins of the n ions are not only ferromagnetically coupled in the c-plane but also antiferromagnetically coupled between the c-planes, the n-ion spins around the ferromagnetic-paramagnetic transition temperature in a small external magnetic field Spin disorder cannot be fully repaired. In addition, this oxide has a ferromagnetic-paramagnetic transition temperature of about -200 ° C.
And had the disadvantage of being quite low.

【0007】本発明の目的は、磁気抵抗効果を利用した
磁気検出素子において、飽和磁場が小さくかつ室温にお
いても十分に大きな磁気抵抗変化を有する材料を用いた
高感度の磁気検出能力を有する磁気抵抗効果材料を提供
することにある。特に前記の従来材料の欠点を克服する
べく、酸化物磁性材料の磁気抵抗効果において飽和磁場
を小さくするために、弱い磁場でもスピンの乱れが十分
に修復されるような材料設計を行い、また室温で大きな
磁気抵抗変化を得るために、強磁性−常磁性転移温度が
室温付近に存在する材料を選択する。
SUMMARY OF THE INVENTION An object of the present invention is to provide a magnetic sensing element utilizing a magnetoresistive effect, which has a high saturation magnetic sensing capability using a material having a small saturation magnetic field and a sufficiently large magnetoresistance change even at room temperature. It is to provide an effect material. In particular, in order to overcome the above-mentioned drawbacks of the conventional materials, in order to reduce the saturation magnetic field in the magnetoresistance effect of the oxide magnetic material, a material design is performed so that spin disturbance is sufficiently restored even in a weak magnetic field, and In order to obtain a large magnetoresistance change, a material having a ferromagnetic-paramagnetic transition temperature near room temperature is selected.

【0008】[0008]

【課題を解決するための手段】本発明の磁気検出素子
は、磁気抵抗効果層と前記磁気抵抗効果層に設けられた
一組の電極とからなる磁気検出素子であって、前記磁気
抵抗効果層として酸化物磁性体、(A′1-x x n+1
(Mn1-y y n z (但し、Aはランタノイド、
Y、Biのうちの少なくとも1元素。A′はアルカリ土
類金属、Pbのうちの少なくとも1元素。MはNi、C
uのうちの少なくとも1元素。また、0<x,y≦0.
5、3n≦z≦3n+2、n=1,2,3)、または
(BiO)2 [(A1-x A′x n (Mn1-y y
n+1 Oz](但し、Aはランタノイド、Y、Biのうち
の少なくとも1元素。A′はアルカリ土類金属、Pbの
うちの少なくとも1元素。MはTa、Nb、Ti、Zr
のうちの少なくとも1元素。また、0≦x≦0.5、0
≦y≦1、2n+2≦z≦3n+4、n=3,4,
5)、または(Bi1-x x O)2 [An+1 (Mn1-y
y n z ](但し、Aはアルカリ土類金属のうちの
少なくとも1元素。BはPb、Tlのうちの少なくとも
1元素。MはNi、Cuのうちの少なくとも1元素。ま
た、0.5<x<1、0≦y≦0.5、2n+2≦z≦
3n+2、n=1,2,3,4)を用いる。
According to another aspect of the present invention, there is provided a magnetic sensing element comprising a magnetoresistive layer and a pair of electrodes provided on the magnetoresistive layer, wherein the magnetoresistive layer includes a plurality of electrodes. As an oxide magnetic material, (A ' 1-x A x ) n + 1
(Mn 1-y M y) n O z ( where, A is a lanthanoid,
At least one element of Y and Bi. A 'is at least one element among alkaline earth metals and Pb. M is Ni, C
at least one element of u. Also, 0 <x, y ≦ 0.
5, 3n ≦ z ≦ 3n + 2, n = 1, 2, 3) or (BiO) 2 [(A 1−x A ′ x ) n (Mn 1− y My )
n + 1 Oz] (where A is a lanthanoid, at least one element of Y and Bi. A ′ is an alkaline earth metal and at least one element of Pb. M is Ta, Nb, Ti, Zr
At least one element of the above. Also, 0 ≦ x ≦ 0.5, 0
≦ y ≦ 1, 2n + 2 ≦ z ≦ 3n + 4, n = 3,4
5) or (Bi 1-x B x O) 2 [A n + 1 (Mn 1-y
M y ) n O z ] (where A is at least one element of alkaline earth metals, B is at least one element of Pb and Tl, M is at least one element of Ni and Cu, and 0 0.5 <x <1, 0 ≦ y ≦ 0.5, 2n + 2 ≦ z ≦
3n + 2, n = 1, 2, 3, 4).

【0009】[0009]

【作用】図1に本発明の磁気検出素子の断面図を、また
図2に本発明を応用した複合型磁気ヘッドの断面図を、
図5に図2の複合型磁気ヘッドを用いた磁気ディスク装
置の例を示す。
FIG. 1 is a sectional view of a magnetic sensing element of the present invention, and FIG. 2 is a sectional view of a composite magnetic head to which the present invention is applied.
FIG. 5 shows an example of a magnetic disk drive using the composite magnetic head of FIG.

【0010】まず酸化物磁性層2を形成するための基体
1の材料としては、非磁性で(電気的に)絶縁性の材料
を用いる。また図2のような複合型磁気ヘッドとして用
いるときには、再生ヘッドの漏れ磁界による混乱を防止
するため、基体として非磁性かつ絶縁性の母材11に下
部磁気シールド層12を形成したものを用いる。
First, as a material of the substrate 1 for forming the oxide magnetic layer 2, a non-magnetic (electrically) insulating material is used. When used as a composite type magnetic head as shown in FIG. 2, a substrate in which a lower magnetic shield layer 12 is formed on a nonmagnetic and insulating base material 11 is used to prevent confusion due to a leakage magnetic field of the reproducing head.

【0011】次に図1の酸化物磁性層2、図2の13と
して次の〜のいずれかの酸化物材料を用いる。
Next, any of the following oxide materials is used for the oxide magnetic layer 2 in FIG. 1 and 13 in FIG.

【0012】A1-x A′x Mn1-y y z (但し、Aはランタノイド、Y、Biのうちの少なくと
も1元素。A′はアルカリ土類金属、Pbのうちの少な
くとも1元素。MはNi、Cuのうちの少なくとも1元
素。また、0<x,y≦0.5、2.5≦z≦3.5) (A′1-x x n+1 (Mn1-y y n z (但し、Aはランタノイド、Y、Biのうちの少なくと
も1元素。A′はアルカリ土類金属、Pbのうちの少な
くとも1元素。MはNi、Cuのうちの少なくとも1元
素。また、0<x,y≦0.5、3n≦z≦3n+2、
n=1,2,3) (BiO)2 [(A1-x A′x n (Mn1-y y
n+1 z ] (但し、Aはランタノイド、Y、Biのうちの少なくと
も1元素。A′はアルカリ土類金属、Pbのうちの少な
くとも1元素。MはTa、Nb、Ti、Zrのうちの少
なくとも1元素。また、0≦x≦0.5、0≦y≦1、
2n+2≦z≦3n+4、n=3,4,5) (Bi1-x x O)2 [An+1 (Mn1-y y n
z ] (但し、Aはアルカリ土類金属のうちの少なくとも1元
素。BはPb、Tlのうちの少なくとも1元素。MはN
i、Cuのうちの少なくとも1元素。また、0.5<x
<1、0≦y≦0.5、2n+2≦z≦3n+2、n=
1,2,3,4) さらに、図1の酸化物磁性層2(または図2の13)に
生じる磁気抵抗変化を読み出すための一組の図1の電極
3(または図2の14)を図1の酸化物磁性層2(また
は図2の13)に設ける。図1の電極3(または図2の
14)の材料としては金属や導電性酸化物を用いること
ができる。また、図1の電極3(または図2の14)は
通常一対の電圧印加用端子と更に一対の電流検出用端子
という構成からなるが、一対の端子が定電流供給用端子
と電圧検出用端子とを兼ねた構成であっても良い。
A 1-x A ′ x Mn 1-y M y O z (where A is at least one element of lanthanoid, Y and Bi. A ′ is at least one element of alkaline earth metal and Pb) M is at least one element of Ni and Cu, and 0 <x, y ≦ 0.5, 2.5 ≦ z ≦ 3.5) (A ′ 1−x A x ) n + 1 (Mn 1 -y M y) n O z (where, a is a lanthanoid, Y, at least one element .A 'is an alkaline earth metal of Bi, at least one element .M of Pb is Ni, at least one of Cu 1 element, 0 <x, y ≦ 0.5, 3n ≦ z ≦ 3n + 2,
n = 1, 2, 3) (BiO) 2 [(A 1−x A ′ x ) n (Mn 1− y My )
n + 1 O z ] (where A is at least one element of lanthanoid, Y and Bi; A ′ is at least one element of alkaline earth metal and Pb; M is one of Ta, Nb, Ti and Zr) And at least one element of 0 ≦ x ≦ 0.5, 0 ≦ y ≦ 1,
2n + 2 ≦ z ≦ 3n + 4, n = 3, 4, 5) (Bi 1−x B x O) 2 [A n + 1 (Mn 1− y My ) n O
z ] (where A is at least one element of alkaline earth metals; B is at least one element of Pb and Tl; M is N
i, at least one element of Cu. Also, 0.5 <x
<1, 0 ≦ y ≦ 0.5, 2n + 2 ≦ z ≦ 3n + 2, n =
1, 2, 3, 4) Further, a pair of electrodes 3 (or 14 in FIG. 2) of FIG. 1 for reading out a magnetoresistance change occurring in the oxide magnetic layer 2 (or 13 of FIG. 2) of FIG. It is provided on the oxide magnetic layer 2 of FIG. 1 (or 13 of FIG. 2). As a material of the electrode 3 in FIG. 1 (or 14 in FIG. 2), a metal or a conductive oxide can be used. The electrode 3 in FIG. 1 (or 14 in FIG. 2) usually has a configuration including a pair of voltage application terminals and a pair of current detection terminals, and the pair of terminals includes a constant current supply terminal and a voltage detection terminal. The configuration may also be used.

【0013】また図2のような複合型磁気ヘッドの場合
には漏れ磁界による再生ヘッドの混乱を防止するために
上部磁気シールド層15を形成し、さらに下部磁性膜1
6、上部磁性膜17、コイル18からなる記録用ヘッド
を設ける。
In the case of the composite type magnetic head as shown in FIG. 2, an upper magnetic shield layer 15 is formed to prevent the read head from being confused due to a leakage magnetic field.
6. A recording head including an upper magnetic film 17 and a coil 18 is provided.

【0014】ここで、で示したような擬ペロブスカイ
ト型酸化物では、図3に示すようなBサイトにあるMn
イオンとNi(またはCu)イオンとは価数が異なるた
めに、Oイオンを挟んで隣は互いに異なる元素になるよ
うに秩序的に配置されている。またMnイオンは3価ま
たは4価の状態を採っており、d軌道の電子数は5以下
になっているが、一方Ni(またはCu)イオンは2価
または3価の状態を採っており、d軌道の電子数は5以
上になっているので、Oイオンを挟んでほぼ一直線上に
並んでいるMnイオンとNi(またはCu)イオンの互
いのスピンはOイオンを介したいわゆる超交換相互作用
により強磁性的に揃いやすくなっていると考えられる。
さらにMnイオンとNi(またはCu)イオン上のスピ
ン間の相互作用が比較的強いので、この酸化物材料では
強磁性−常磁性転移温度を室温付近にとらせることが可
能であり、室温でも小さな磁場でスピンの乱れが十分に
修復され大きな磁気抵抗変化が起こる。同様に、〜
に示したような層状酸化物でも、MnイオンとNi(ま
たはCu)イオンの互いのスピンはOイオンを介したい
わゆる超交換相互作用により強磁性的に揃いやすくなっ
ており、小さな磁場でもスピンの乱れが十分に修復され
て大きく抵抗が下がる。
Here, in the pseudo-perovskite oxide as shown in FIG. 3, Mn at the B site as shown in FIG.
Since ions and Ni (or Cu) ions have different valences, they are ordered and arranged so that adjacent elements are different from each other across the O ions. Also, Mn ions are in a trivalent or tetravalent state, and the number of electrons in the d orbital is 5 or less, while Ni (or Cu) ions are in a divalent or trivalent state, Since the number of electrons in the d orbital is 5 or more, the mutual spins of Mn ions and Ni (or Cu) ions, which are arranged substantially in a straight line with the O ions interposed therebetween, are the so-called super-exchange interaction via O ions. It is considered that ferromagnetic materials are easily aligned.
Further, since the interaction between Mn ions and spins on Ni (or Cu) ions is relatively strong, this oxide material can have a ferromagnetic-paramagnetic transition temperature close to room temperature, and has a small ferromagnetic-paramagnetic transition temperature even at room temperature. The disturbance of the spin is sufficiently repaired by the magnetic field, and a large magnetoresistance change occurs. Similarly, ~
In the layered oxide shown in FIG. 1, the mutual spins of Mn ions and Ni (or Cu) ions are likely to be ferromagnetically aligned by so-called super-exchange interaction via O ions. The turbulence is sufficiently repaired, and the resistance is greatly reduced.

【0015】加えて(または)で示したようなBi
層状酸化物では、図4に示すように[(A1-x A′x
n (Mn1-y y n+1 z ](または[(A1-x A′
x n (Mn1-y y n+1 z ])で表される擬ペロ
ブスカイト層が(Bi2 2)層によって層状に区切ら
れた構造をしており、(Bi2 2 )層を挟んだMnO
2 面(すなわちc面)間でのスピンの結合が弱くなって
いるので、比較的小さな磁場でもスピンの乱れが修復さ
れ、飽和磁場をさらに下げることができる。
In addition, Bi as shown in (or)
In a layered oxide, as shown in FIG. 4, [(A 1 -x A ′ x )
n (Mn 1-y M y ) n + 1 O z] ( or [(A 1-x A '
x) has a n (Mn 1-y M y ) n + 1 O z]) perovskite layer which is expressed by (Bi 2 O 2) separated in layers by layer structure, (Bi 2 O 2 ) MnO sandwiching layers
Since the spin coupling between the two planes (that is, the c-plane) is weak, even a relatively small magnetic field can repair the disorder of the spin and further reduce the saturation magnetic field.

【0016】本発明の磁気検出素子を応用した図2で示
されるような複合型磁気ヘッドを用いれば、図5に示す
ような高性能の磁気ディスク装置を製造することがき
る。記録媒体を両面に有する磁気ディスク21をスピン
ドルモータ22で回転させ、アクチュエータ23によっ
てヘッドスライダ24を記録媒体の所望のトラック上に
誘導する。ヘッドスライダ24上に形成した複合型磁気
ヘッドの再生ヘッドおよび記録ヘッドは、この回転によ
って記録媒体上に接近して相対運動し、信号を順次書き
込みまたは読み取る。記録信号は信号処理系25を通じ
て、記録ヘッドにて記録媒体上に記録し、再生ヘッドの
出力を信号処理系25を経て記録信号として読み取る。
If a composite magnetic head as shown in FIG. 2 to which the magnetic sensing element of the present invention is applied is used, a high-performance magnetic disk device as shown in FIG. 5 can be manufactured. A magnetic disk 21 having a recording medium on both sides is rotated by a spindle motor 22, and an actuator 23 guides a head slider 24 onto a desired track of the recording medium. The reproducing head and the recording head of the composite magnetic head formed on the head slider 24 move relatively close to the recording medium by this rotation, and write or read signals sequentially. The recording signal is recorded on the recording medium by the recording head through the signal processing system 25, and the output of the reproducing head is read as the recording signal through the signal processing system 25.

【0017】[0017]

【実施例】【Example】

(実施例1)本発明の実施例を図6に沿って説明する。 (Embodiment 1) An embodiment of the present invention will be described with reference to FIG.

【0018】図6は再生部分に本発明の磁気検出素子を
応用した複合型磁気ヘッドの断面図である。この複合型
磁気ヘッドは、本発明の磁気検出素子を応用した再生用
ヘッドと、インダクティブ型の記録用ヘッド、および漏
れ磁界による再生用ヘッドの混乱を防止するための磁気
シールド部とからなる。再生用ヘッドは、Al2 3
TiC複合セラミックス母材30と母材30に形成した
下部磁気シールド層31とからなる基体を用い、該基体
上に酸化物磁性層32としてLa0.7 Sr0.3Mn0.5
Ni0.5 3 をレーザーアブレーション法により下記の
表1の条件で形成した。この様にして作成した酸化物磁
性層32は、X線回折(XRD)の結果多結晶であるこ
とがわかった。また適当な成長条件コントロールによ
り、室温付近で酸化物磁性層32に強磁性−常磁性転移
を起こさせることができる。この後、酸化物磁性層32
上に電極33として厚さ200nmのPt層、さらにそ
の上に上部磁気シールド層34を形成し、再生用ヘッド
とした。
FIG. 6 is a sectional view of a composite magnetic head in which the magnetic detecting element of the present invention is applied to a reproducing portion. The composite magnetic head includes a reproducing head to which the magnetic detecting element of the present invention is applied, an inductive recording head, and a magnetic shield for preventing the reproducing head from being disrupted by a leakage magnetic field. The reproducing head is Al 2 O 3
A base comprising a TiC composite ceramic base material 30 and a lower magnetic shield layer 31 formed on the base material 30 is used, and an oxide magnetic layer 32 is formed on the base as La 0.7 Sr 0.3 Mn 0.5
Ni 0.5 O 3 was formed by the laser ablation method under the conditions shown in Table 1 below. X-ray diffraction (XRD) revealed that the oxide magnetic layer 32 thus formed was polycrystalline. Also, by controlling the growth conditions appropriately, the ferromagnetic-paramagnetic transition can be caused in the oxide magnetic layer 32 at around room temperature. Thereafter, the oxide magnetic layer 32
A Pt layer having a thickness of 200 nm was formed thereon as an electrode 33, and an upper magnetic shield layer 34 was further formed thereon to obtain a reproducing head.

【0019】[0019]

【表1】 最後に下部磁性膜35、上部磁性膜36、およびコイル
37からなる記録用ヘッドを形成し、複合型ヘッドを構
成した。
[Table 1] Finally, a recording head including the lower magnetic film 35, the upper magnetic film 36, and the coil 37 was formed to form a composite head.

【0020】このようにして作成した複合型ヘッドは室
温で1000Oeの外部磁場により−30%の磁気抵抗
変化率を示した。さらに磁気抵抗変化率は、印加される
外部磁場が膜面に平行の場合も垂直の場合も同じであ
り、等方的な磁気抵抗効果を示した。
The composite type head thus produced exhibited a magnetoresistance ratio of -30% at room temperature by an external magnetic field of 1000 Oe. Further, the magnetoresistance change rate was the same whether the applied external magnetic field was parallel or perpendicular to the film surface, and showed an isotropic magnetoresistance effect.

【0021】また、電極33を形成した後に酸素中、4
00〜600℃でアニールすると、さらに磁気抵抗変化
率が増加し、磁場検出感度の向上が確かめられた。
After the electrode 33 has been formed,
Annealing at 00 to 600 ° C. further increased the rate of change in magnetoresistance, confirming improvement in magnetic field detection sensitivity.

【0022】なお本実施例では酸化物磁性層32として
La0.7 Sr0.3 Mn0.5 Ni0.53 を用いた場合に
ついて述べたが、Laの代わりにY、Pr、Nd、E
u、Dy、YbまたはBiを、またSrの代わりにC
a、BaまたはPbを、さらにNiの代わりにCuを用
いることができる。
In this embodiment, the case where La 0.7 Sr 0.3 Mn 0.5 Ni 0.5 O 3 is used as the oxide magnetic layer 32 has been described, but instead of La, Y, Pr, Nd, E
u, Dy, Yb or Bi, and C for Sr
a, Ba, or Pb, and further, Cu can be used instead of Ni.

【0023】(実施例2)本発明の実施例を図7に沿っ
て説明する。
(Embodiment 2) An embodiment of the present invention will be described with reference to FIG.

【0024】表面を熱酸化したSiウェハー41と、S
iウェハー41上に直流スパッタ法により形成した厚さ
50nmのTi層42と、Ti層42上に直流スパッタ
法により形成した厚さ200nmのPt層43と、Pt
層43上にRFスパッタ法により成長させた厚さ200
nmの多結晶のSrTiO3 層44とからなる基体上
に、酸化物磁性層45として(Y0.7 Sr0.3 3 (M
0.5 Cu0.5 2 7をイオンビームスパッタ法によ
り下記の表2の条件で形成した。この様にして作成した
酸化物磁性層45は、XRDの結果多結晶であることが
確かめられた。
A Si wafer 41 whose surface is thermally oxidized,
a 50 nm thick Ti layer 42 formed on the i-wafer 41 by DC sputtering, a 200 nm thick Pt layer 43 formed on the Ti layer 42 by DC sputtering,
Thickness of 200 grown on layer 43 by RF sputtering
An oxide magnetic layer 45 is formed on a substrate composed of a polycrystalline SrTiO 3 layer having a thickness of (Y 0.7 Sr 0.3 ) 3 (M
n 0.5 Cu 0.5 ) 2 O 7 was formed by ion beam sputtering under the conditions shown in Table 2 below. XRD confirmed that the oxide magnetic layer 45 thus formed was polycrystalline.

【0025】[0025]

【表2】 さらに酸化物磁性層45上に電極46として厚さ200
nmのRuO2 を直流スパッタ法で形成した。この様に
して作成した磁気検出素子は、室温で1000Oeの外
部磁場により−20%の磁気抵抗変化率を示した。
[Table 2] Further, on the oxide magnetic layer 45, an electrode 46 having a thickness of 200
nm of RuO 2 was formed by DC sputtering. The magnetic sensing element thus produced exhibited a magnetoresistance ratio of −20% at room temperature with an external magnetic field of 1000 Oe.

【0026】さらに電極46の上に保護層47としてア
ルミナ層をRFマグネトロンスパッタ法で形成すること
で、空気中の水分などによる酸化物磁性層45の劣化を
防止することができ、素子の信頼性を向上させることが
できる。
Further, by forming an alumina layer as a protective layer 47 on the electrode 46 by RF magnetron sputtering, it is possible to prevent the oxide magnetic layer 45 from deteriorating due to moisture in the air and the like, and to improve the reliability of the element. Can be improved.

【0027】なお基体として、Al2 3 、MgO、S
rTiO3 、LaAlO3 の多結晶や単結晶を、また電
極46として、Pt、Al、Ti、Ta、Au、W、S
i、Cu、Agやそれらの合金、もしくはTiN、Ir
2 を用いることもできる。さらに、電極46として、
Pt、Au、もしくはTiN、IrO2 、RuO2 を用
いる場合は、電極46を形成した後に酸素中、400〜
600℃でアニールするとさらに磁気抵抗変化率が増加
した。
As a substrate, Al 2 O 3 , MgO, S
A polycrystal or single crystal of rTiO 3 or LaAlO 3 , and Pt, Al, Ti, Ta, Au, W, S
i, Cu, Ag and their alloys, or TiN, Ir
O 2 can also be used. Further, as the electrode 46,
When Pt, Au, or TiN, IrO 2 , or RuO 2 is used, the electrode
Annealing at 600 ° C. further increased the magnetoresistance ratio.

【0028】なお本実施例では酸化物磁性層45として
(Y0.7 Sr0.3 3 (Mn0.5 Cu0.5 2 7 を用
いた場合について述べたが、Yの代わりにLa、Pr、
Nd、Eu、Dy、YbまたはBiを、またSrの代わ
りにCa、BaまたはPbを、さらにCuの代わりにN
iを用いることができる。
In this embodiment, the case where (Y 0.7 Sr 0.3 ) 3 (Mn 0.5 Cu 0.5 ) 2 O 7 is used as the oxide magnetic layer 45 has been described, but La, Pr,
Nd, Eu, Dy, Yb or Bi, Ca, Ba or Pb instead of Sr, and N instead of Cu
i can be used.

【0029】(実施例3)本発明の実施例を図8に沿っ
て説明する。
(Embodiment 3) An embodiment of the present invention will be described with reference to FIG.

【0030】基体51には単結晶のLaAlO3 (10
0)を鏡面研磨した基板を用い、基体51上に酸化物磁
性層52として(Bi0.35Pb0.65O)2 (Sr2 Ca
Mn2 6 )をRFマグネトロンスパッタ法により下記
の表3の条件で形成した。この様にして作成した酸化物
磁性層52は、XRDの結果<100>方向に強く配向
していることが確かめられた。
The substrate 51 is made of single-crystal LaAlO 3 (10
(Bi 0.35 Pb 0.65 O) 2 (Sr 2 Ca) as an oxide magnetic layer 52 on a substrate 51 using a mirror-polished substrate
Mn 2 O 6 ) was formed by RF magnetron sputtering under the conditions shown in Table 3 below. As a result of XRD, it was confirmed that the oxide magnetic layer 52 thus formed was strongly oriented in the <100> direction.

【0031】[0031]

【表3】 さらに酸化物磁性層52上に電極53として厚さ300
nmのAuを直流スパッタ法で形成し、さらにその上に
保護層54としてアルミナ層をRFマグネトロンスパッ
タ法で形成した。この様にして作成した磁気検出素子
は、室温で1000Oeの外部磁場(但し磁場は膜面に
平行)により−25%の磁気抵抗変化率を示した。さら
に磁気抵抗変化率は、印加される外部磁場が膜面に平行
の場合と垂直の場合とで異なり、外部磁場が膜面に平行
の時若干磁気抵抗変化率が大きくなる異方的な磁気抵抗
効果を示した。
[Table 3] Further, on the oxide magnetic layer 52, an electrode 53 having a thickness of 300
nm of Au was formed by a direct current sputtering method, and an alumina layer was formed thereon as a protective layer 54 by an RF magnetron sputtering method. The magnetic sensing element thus prepared exhibited a magnetoresistance change rate of -25% at room temperature by an external magnetic field of 1,000 Oe (the magnetic field was parallel to the film surface). Furthermore, the magnetoresistance change rate differs between when the applied external magnetic field is parallel to the film surface and when it is perpendicular, and when the external magnetic field is parallel to the film surface, the magnetoresistance change rate increases slightly. The effect was shown.

【0032】なお基体51として、Al2 3 、Mg
O、SrTiO3 、LaAlO3 の多結晶や単結晶を、
また電極53として、Pt、Al、Ti、Ta、W、S
i、Cu、Agやそれらの合金、もしくはTiN、Ir
2 、RuO2 を用いることもできる。さらに、電極5
3として、Pt、Au、もしくはTiN、IrO2 、R
uO2 を用いる場合は、電極53を形成した後に酸素
中、400〜600℃でアニールするとさらに磁気抵抗
変化率が増加した。
As the substrate 51, Al 2 O 3 , Mg
O, SrTiO 3 , LaAlO 3 polycrystal or single crystal,
Pt, Al, Ti, Ta, W, S
i, Cu, Ag and their alloys, or TiN, Ir
O 2 and RuO 2 can also be used. Further, the electrode 5
As Pt, Au, or TiN, IrO 2 , R
When uO 2 was used, annealing at 400 to 600 ° C. in oxygen after forming the electrode 53 further increased the magnetoresistance ratio.

【0033】なお本実施例では酸化物磁性層52として
(Bi0.35Pb0.65O)2 (Sr2CaMn2 6 )を
用いた場合について述べたが、Pbの代わりにTlを、
SrとCaの代わりにBaを用いることができる。また
Mnの一部をNiまたはCuで置換してもよい。
In this embodiment, the case where (Bi 0.35 Pb 0.65 O) 2 (Sr 2 CaMn 2 O 6 ) is used as the oxide magnetic layer 52 has been described, but Tl is used instead of Pb.
Ba can be used instead of Sr and Ca. Further, a part of Mn may be replaced with Ni or Cu.

【0034】(実施例4)本発明の実施例を図9に沿っ
て説明する。
(Embodiment 4) An embodiment of the present invention will be described with reference to FIG.

【0035】基体61には単結晶のMgO(100)を
鏡面研磨した基板を用い、基体61上に酸化物磁性層6
2として(BiO)2 [Bi2 (Mn0.6 Ta0.4 3
10]を有機金属分解法により下記の表4の条件で形成
した。この様にして作成した酸化物磁性層62は、XR
Dの結果<100>方向に強く配向していることが確か
められた。
As the base 61, a single-crystal MgO (100) mirror-polished substrate was used.
(BiO) 2 [Bi 2 (Mn 0.6 Ta 0.4 ) 3
O 10 ] was formed by the organometallic decomposition method under the conditions shown in Table 4 below. The oxide magnetic layer 62 formed in this manner has an XR
As a result of D, it was confirmed that the film was strongly oriented in the <100> direction.

【0036】[0036]

【表4】 さらに酸化物磁性層62上に電極63として厚さ200
nmのPtを直流スパッタ法で形成し、さらにその上に
保護層64としてジルコニア層をRFマグネトロンスパ
ッタ法で形成した。この様にして作成した磁気検出素子
は、室温で1000Oeの外部磁場(但し磁場は膜面に
平行)により−25%の磁気抵抗変化率を示した。さら
に磁気抵抗変化率は、印加される外部磁場が膜面に平行
の場合と垂直の場合とで異なり、外部磁場が膜面に平行
の時若干磁気抵抗変化率が大きくなる異方的な磁気抵抗
効果を示した。
[Table 4] Further, on the oxide magnetic layer 62, an electrode 63 having a thickness of 200
nm of Pt was formed by a DC sputtering method, and a zirconia layer was further formed thereon as a protective layer 64 by an RF magnetron sputtering method. The magnetic sensing element thus prepared exhibited a magnetoresistance change rate of -25% at room temperature by an external magnetic field of 1,000 Oe (the magnetic field was parallel to the film surface). Furthermore, the magnetoresistance change rate differs between when the applied external magnetic field is parallel to the film surface and when it is perpendicular, and when the external magnetic field is parallel to the film surface, the magnetoresistance change rate increases slightly. The effect was shown.

【0037】なお基体61として、Al2 3 、Mg
O、SrTiO3 、LaAlO3 の多結晶や単結晶を、
また電極63として、Al、Ti、Ta、W、Si、C
u、Ag、Auやそれらの合金、もしくはTiN、Ir
2 、RuO2 を用いることもできる。さらに、電極6
3として、Pt、Au、もしくはTiN、IrO2 、R
uO2 を用いる場合は、電極63を形成した後に酸素
中、400〜600℃でアニールするとさらに磁気抵抗
変化率が増加した。
As the substrate 61, Al 2 O 3 , Mg
O, SrTiO 3 , LaAlO 3 polycrystal or single crystal,
Further, as the electrode 63, Al, Ti, Ta, W, Si, C
u, Ag, Au and their alloys, or TiN, Ir
O 2 and RuO 2 can also be used. Further, the electrode 6
As Pt, Au, or TiN, IrO 2 , R
When using uO 2 , annealing at 400 to 600 ° C. in oxygen after forming the electrode 63 further increased the magnetoresistance ratio.

【0038】なお本実施例では酸化物磁性層62として
(BiO)2 [Bi2 (Mn0.6 Ta0.4 3 10]を
用いた場合について述べたが、Biの代わりにY、L
a、Pr、Nd、Eu、Dy、YbまたはCa、Sr、
Ba、Pbを、またTaの代わりにNb、Zr、Tiを
用いることができる。
In this embodiment, the case where (BiO) 2 [Bi 2 (Mn 0.6 Ta 0.4 ) 3 O 10 ] is used as the oxide magnetic layer 62 has been described, but instead of Bi, Y and L are used.
a, Pr, Nd, Eu, Dy, Yb or Ca, Sr,
Ba and Pb can be used, and Nb, Zr and Ti can be used instead of Ta.

【0039】[0039]

【発明の効果】本発明により、飽和磁場が小さくかつ室
温においても十分に大きな磁気抵抗変化を有する材料を
用いて高感度の磁気検出能力を有する磁気検出素子を容
易に実現することができる。
According to the present invention, it is possible to easily realize a magnetic sensing element having high sensitivity magnetic sensing ability using a material having a small saturation magnetic field and having a sufficiently large magnetoresistance change even at room temperature.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の磁気検出素子の断面図。FIG. 1 is a sectional view of a magnetic sensing element according to the present invention.

【図2】本発明を応用した複合型磁気ヘッドの断面図。FIG. 2 is a sectional view of a composite magnetic head to which the present invention is applied.

【図3】A1-x A′x Mn1-y y z (但し、Aはラ
ンタノイド、Y、Biのうちの少なくとも1元素。A′
はアルカリ土類金属、Pbのうちの少なくとも1元素。
MはNi、Cuのうちの少なくとも1元素。また、0<
x,y≦0.5、2.5≦z≦3.5)の構造。
FIG. 3 A 1-x A ′ x Mn 1- y My O z (where A is at least one element of lanthanoid, Y and Bi; A ′
Is at least one element among alkaline earth metals and Pb.
M is at least one element of Ni and Cu. Also, 0 <
x, y ≦ 0.5, 2.5 ≦ z ≦ 3.5).

【図4】(BiO)2 [(A1-x A′x n (Mn1-y
y n+1 z ](但し、Aはランタノイド、Y、Bi
のうちの少なくとも1元素。A′はアルカリ土類金属、
Pbのうちの少なくとも1元素。MはTa、Nb、T
i、Zrのうちの少なくとも1元素。また、0≦x≦
0.5、0≦y≦1、2n+2≦z≦3n+4、n=
3,4,5)および(Bi1-x x O)2 [An+1 (M
1-y y n z ](但し、Aはアルカリ土類金属の
うちの少なくとも1元素。BはPb、Tlのうちの少な
くとも1元素。MはNi、Cuのうちの少なくとも1元
素。また、0.5<x<1、0≦y≦0.5、2n+2
≦z≦3n+2、n=1,2,3,4)の構造。
FIG. 4 shows (BiO) 2 [(A 1-x A ′ x ) n (Mn 1-y
M y ) n + 1 O z ] (where A is a lanthanoid, Y, Bi
At least one element of the above. A 'is an alkaline earth metal,
At least one element of Pb. M is Ta, Nb, T
At least one element of i and Zr. Also, 0 ≦ x ≦
0.5, 0 ≦ y ≦ 1, 2n + 2 ≦ z ≦ 3n + 4, n =
3, 4, 5) and (Bi 1-x B x O) 2 [A n + 1 (M
n 1-y M y) n O z] ( where, A is at least one element selected from the group consisting of at least one element .M is Ni, Cu of the at least one element .B is Pb, Tl of the alkaline earth metal 0.5 <x <1, 0 ≦ y ≦ 0.5, 2n + 2
≦ z ≦ 3n + 2, n = 1, 2, 3, 4).

【図5】本発明の磁気検出素子を用いた磁気ディスク装
置の概念図。
FIG. 5 is a conceptual diagram of a magnetic disk drive using the magnetic detection element of the present invention.

【図6】本発明の実施例1の磁気検出素子を応用した複
合型磁気ヘッドの断面図。
FIG. 6 is a sectional view of a composite magnetic head to which the magnetic detection element according to the first embodiment of the present invention is applied.

【図7】本発明の実施例2の磁気検出素子の断面図。FIG. 7 is a sectional view of a magnetic sensor according to a second embodiment of the present invention.

【図8】本発明の実施例3の磁気検出素子の断面図。FIG. 8 is a sectional view of a magnetic sensing element according to a third embodiment of the present invention.

【図9】本発明の実施例4の磁気検出素子の断面図。FIG. 9 is a sectional view of a magnetic detection element according to a fourth embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 基体 2 酸化物磁性層(磁気抵抗効果層) 3 電極 11 母材 12 下部磁気シールド層 13 酸化物磁性層 14 電極 15 上部磁気シールド層 16 下部磁性膜 17 上部磁性膜 18 コイル 21 磁気ディスク 22 スピンドルモータ 23 アクチュエータ 24 ヘッドスライダ 25 信号処理系 30 母材 31 下部磁気シールド層 32 酸化物磁性層 33 電極 34 上部磁気シールド層 35 下部磁性膜 36 上部磁性膜 37 コイル 41 Siウェハー 42 Ti層 43 Pt層 44 SrTiO3 層 45 酸化物磁性層 46 電極 47 保護層 51 基体 52 酸化物磁性層 53 電極 54 保護層 61 基体 62 酸化物磁性層 63 電極 64 保護層REFERENCE SIGNS LIST 1 base 2 oxide magnetic layer (magnetoresistive layer) 3 electrode 11 base material 12 lower magnetic shield layer 13 oxide magnetic layer 14 electrode 15 upper magnetic shield layer 16 lower magnetic film 17 upper magnetic film 18 coil 21 magnetic disk 22 spindle Motor 23 Actuator 24 Head slider 25 Signal processing system 30 Base material 31 Lower magnetic shield layer 32 Oxide magnetic layer 33 Electrode 34 Upper magnetic shield layer 35 Lower magnetic film 36 Upper magnetic film 37 Coil 41 Si wafer 42 Ti layer 43 Pt layer 44 SrTiO 3 layer 45 oxide magnetic layer 46 electrode 47 protective layer 51 substrate 52 oxide magnetic layer 53 electrode 54 protective layer 61 substrate 62 oxide magnetic layer 63 electrode 64 protective layer

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 43/10 G01R 33/06 R ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification code Agency reference number FI Technical display location H01L 43/10 G01R 33/06 R

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 (A′1-x x n+1 (Mn1-y y
n z (但し、Aはランタノイド、Y、Biのうちの少
なくとも1元素。A′はアルカリ土類金属、Pbのうち
の少なくとも1元素。MはNi、Cuのうちの少なくと
も1元素。また、0<x,y≦0.5、3n≦z≦3n
+2、n=1,2,3)で表されることを特徴とする酸
化物磁性体。
1. (A ' 1-x A x ) n + 1 (Mn 1- y My )
n O z (where A is at least one element of lanthanoid, Y and Bi; A ′ is at least one element of alkaline earth metal and Pb; M is at least one element of Ni and Cu; 0 <x, y ≦ 0.5, 3n ≦ z ≦ 3n
+2, n = 1, 2, 3).
【請求項2】 (BiO)2 [(A1-x A′x n (M
1-y y n+1 Oz](但し、Aはランタノイド、
Y、Biのうちの少なくとも1元素。A′はアルカリ土
類金属、Pbのうちの少なくとも1元素。MはTa、N
b、Ti、Zrのうちの少なくとも1元素。また、0≦
x≦0.5、0≦y≦1、2n+2≦z≦3n+4、n
=3,4,5)で表されることを特徴とする酸化物磁性
体。
2. (BiO) 2 [(A 1 -x A ′ x ) n (M
n 1-y M y) n + 1 Oz] ( where, A is a lanthanoid,
At least one element of Y and Bi. A 'is at least one element among alkaline earth metals and Pb. M is Ta, N
b, at least one element of Ti and Zr. Also, 0 ≦
x ≦ 0.5, 0 ≦ y ≦ 1, 2n + 2 ≦ z ≦ 3n + 4, n
= 3, 4, 5).
【請求項3】 (Bi1-x x O)2 [An+1 (Mn
1-y y n z ](但し、Aはアルカリ土類金属のう
ちの少なくとも1元素。BはPb、Tlのうちの少なく
とも1元素。MはNi、Cuのうちの少なくとも1元
素。また、0.5<x<1、0≦y≦0.5、2n+2
≦z≦3n+2、n=1,2,3,4)で表されること
を特徴とする酸化物磁性体。
(Bi 1-x B x O) 2 [A n + 1 (Mn
1-y M y ) n O z ] (where A is at least one element of alkaline earth metals; B is at least one element of Pb and Tl; M is at least one element of Ni and Cu). Also, 0.5 <x <1, 0 ≦ y ≦ 0.5, 2n + 2
≦ z ≦ 3n + 2, n = 1, 2, 3, 4).
【請求項4】 磁気抵抗効果層と前記磁気抵抗効果層に
設けられた一組の電極とからなる磁気検出素子であっ
て、前記磁気抵抗効果層として請求項1ないし3のいず
れか1項に記載の酸化物磁性体を用いることを特徴とす
る磁気検出素子。
4. A magnetic sensing element comprising a magnetoresistive layer and a pair of electrodes provided on the magnetoresistive layer, wherein the magnetoresistive layer is used as the magnetoresistive layer. A magnetic sensing element using the oxide magnetic material according to any one of the preceding claims.
JP7159544A 1995-06-26 1995-06-26 Oxide magnetic body and magnetic sensing element using the same Expired - Fee Related JP2723082B2 (en)

Priority Applications (2)

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JP7159544A JP2723082B2 (en) 1995-06-26 1995-06-26 Oxide magnetic body and magnetic sensing element using the same
US08/670,615 US5681500A (en) 1995-06-26 1996-06-26 Magnetic oxide having a large magnetoresistance effect at room temperature

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7159544A JP2723082B2 (en) 1995-06-26 1995-06-26 Oxide magnetic body and magnetic sensing element using the same

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