JP2736453B2 - Package for storing semiconductor elements - Google Patents
Package for storing semiconductor elementsInfo
- Publication number
- JP2736453B2 JP2736453B2 JP1308597A JP30859789A JP2736453B2 JP 2736453 B2 JP2736453 B2 JP 2736453B2 JP 1308597 A JP1308597 A JP 1308597A JP 30859789 A JP30859789 A JP 30859789A JP 2736453 B2 JP2736453 B2 JP 2736453B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor element
- external lead
- lid
- insulating base
- lead terminal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/851—Dispositions of multiple connectors or interconnections
- H10W72/874—On different surfaces
- H10W72/884—Die-attach connectors and bond wires
Landscapes
- Lead Frames For Integrated Circuits (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は半導体素子を収容する半導体素子収納用パッ
ケージの改良に関するものである。Description: TECHNICAL FIELD The present invention relates to an improvement in a semiconductor device housing package for housing a semiconductor device.
(従来の技術) 従来、半導体素子を収容するためのパッケージ、特に
ガラスの溶着によって封止するガラス封止型半導体素子
収納用パッケージは、絶縁基体と蓋体とから成り、内部
に半導体素子を収容する空所を有する絶縁容器と、該容
器内に収容される半導体素子を外部電気回路に電気的に
接続するための外部リード端子とから構成されており、
絶縁基体及び蓋体の相対向する主面に予め封止用のガラ
ス部材を被着形成すると共に、絶縁基体主面に外部リー
ド端子を固定し、半導体素子の各電極と外部リード端子
とをワイヤボンド接続した後、絶縁基体及び蓋体のそれ
ぞれに被着させた封止用のガラス部材を溶融一体化させ
ることによって内部に半導体素子を気密に封止してい
る。(Prior Art) Conventionally, a package for accommodating a semiconductor element, particularly a package for accommodating a glass-encapsulated semiconductor element sealed by welding glass, includes an insulating base and a lid, and accommodates the semiconductor element inside. And an external lead terminal for electrically connecting a semiconductor element housed in the container to an external electric circuit,
A glass member for sealing is applied in advance on the opposing main surfaces of the insulating base and the lid, and external lead terminals are fixed on the main surface of the insulating base, and each electrode of the semiconductor element and the external lead terminal are wired. After the bond connection, the semiconductor element is hermetically sealed inside by fusing and integrating a sealing glass member attached to each of the insulating base and the lid.
(発明が解決しようとする課題) しかし乍ら、この従来のガラス封止型半導体素子収納
用パッケージは通常、外部リード端子がコバール(29Wt
%Ni−16Wt%Co−55Wt%Fe合金)や42Alloy(42Wt%Ni
−58Wt%Fe合金)の導電性材料から成っており、該コバ
ールや42Alloy等は透磁率が高く、且つ導電率が低いこ
とから以下に述べる欠点を有する。(Problems to be Solved by the Invention) However, this conventional package for housing a glass-sealed semiconductor element usually has an external lead terminal of Kovar (29 Wt).
% Ni-16Wt% Co-55Wt% Fe alloy) and 42Alloy (42Wt% Ni alloy)
-58Wt% Fe alloy), and Kovar and 42Alloy have the following disadvantages due to their high magnetic permeability and low electric conductivity.
即ち、 コバールや42Alloyは鉄(Fe)、ニッケル(Ni)、コ
バルト(Co)といった強磁性体金属のみから成ってお
り、その透磁率は250〜700(CGS)と高い。そのためこ
のコバールや42Alloy等から成る外部リード端子に電流
が流れると外部リード端子中に透磁率に比例した大きな
自己インダクタンスが発生し、これが逆起電力を誘発し
てノイズとなると共に、該ノイズが半導体素子に入力さ
れて半導体素子に誤動作を生じさせる、 コバールや42Alloyはその導電率が3.0〜3.5%(IAC
S)と低い。そのためこのコバールや42Alloy等から成る
外部リード端子に信号を伝搬させた場合、信号の伝搬速
度が極めて遅いものとなり、高速駆動を行う半導体素子
はその収容が不可となってしまう、 半導体素子収納用パッケージの内部に収容する半導体
素子の高密度化、高集積化の進展に伴い、半導体素子の
電極数が大幅に増大しており、半導体素子の各電極を外
部電気回路に接続する外部リード端子の線幅も極めて細
くなってきている。そのため外部リード端子は上記に
記載のコバールや42Alloyの導電率が低いことと相俊っ
て電気抵抗が極めて大きなものになってきており、外部
リード端子に信号を伝搬させると、該外部リード端子の
電気抵抗に起因して信号が大きく減衰し、内部に収容す
る半導体素子に信号を正確に入力することができず、半
導体素子に誤動作を生じさせてしまう、 等の欠点を有していた。That is, Kovar and 42Alloy are made of only ferromagnetic metals such as iron (Fe), nickel (Ni), and cobalt (Co), and have high magnetic permeability of 250 to 700 (CGS). Therefore, when a current flows through the external lead terminal made of Kovar or 42Alloy, a large self-inductance is generated in the external lead terminal in proportion to the magnetic permeability, which induces a back electromotive force to become noise, and the noise becomes a semiconductor. The conductivity of Kovar or 42Alloy is 3.0 to 3.5% (IAC
S) and low. Therefore, when a signal is propagated to an external lead terminal made of Kovar or 42Alloy, the signal propagation speed becomes extremely slow, and semiconductor devices that perform high-speed driving cannot be accommodated. The number of electrodes of a semiconductor element has increased significantly with the progress of higher density and higher integration of semiconductor elements housed inside the semiconductor device, and wires of external lead terminals for connecting each electrode of the semiconductor element to an external electric circuit. The width has also become extremely narrow. For this reason, the external lead terminal has become extremely large in electrical resistance in tandem with the low conductivity of Kovar and 42 Alloy described above, and when a signal is propagated to the external lead terminal, the external lead terminal becomes The signal is greatly attenuated due to the electric resistance, and the signal cannot be accurately input to the semiconductor element housed therein, thereby causing a malfunction in the semiconductor element.
(発明の目的) 本発明は上記欠点に鑑み案出されたもので、その目的
は外部リード端子で発生するノイズ及び外部リード端子
における信号の減衰を極小となし、内部に収容する半導
体素子への信号の入出力を確実に行うことを可能として
半導体素子を長期間にわたり正常、且つ安定に作動させ
ることができる半導体素子収納用パッケージを提供する
ことにある。(Object of the Invention) The present invention has been devised in view of the above-mentioned drawbacks, and has as its object to minimize the noise generated at the external lead terminals and the signal attenuation at the external lead terminals to minimize the semiconductor device housed therein. An object of the present invention is to provide a package for housing a semiconductor element capable of reliably inputting / outputting a signal and allowing a semiconductor element to operate normally and stably for a long period of time.
また本発明の他の目的は高速駆動を行う半導体素子を
収容することができる半導体素子収納用パッケージを提
供することにある。Another object of the present invention is to provide a semiconductor element housing package capable of housing a semiconductor element which operates at high speed.
(課題を解決するこめの手段) 本発明は絶縁基体と蓋体とから成り、内部に半導体素
子を収容するための空所を有する絶縁容器と、該容器内
に収容される半導体素子を外部電気回路に接続するため
の外部リード端子とから成る半導体素子収納用パッケー
ジにおいて、前記絶縁基体及び蓋体をスピネルもしくは
ステアタイト質焼結体で、外部リード端子をニッケル3
1.5乃至32.5Wt%、コバルト16.5乃至17.5Wt%、鉄50.0
乃至52.0Wt%の合金から成る板状体の上下面に、該板状
体の厚みに対し60乃至80%の厚みの銅板を接合させた金
属体で形成したことを特徴とするものである。(Means for Solving the Problems) The present invention comprises an insulating container having an insulating base and a lid and having a space for accommodating a semiconductor element therein, and an external electric device for accommodating the semiconductor element accommodated in the container. In a semiconductor device housing package comprising external lead terminals for connecting to a circuit, the insulating base and the lid are made of a spinel or steatite sintered body, and the external lead terminals are made of nickel.
1.5-32.5Wt%, Cobalt 16.5-17.5Wt%, Iron 50.0
It is characterized by being formed of a metal body in which a copper plate having a thickness of 60 to 80% with respect to the thickness of the plate body is joined to upper and lower surfaces of a plate body made of an alloy of 5 to 20% by weight.
(実施例) 次に本発明を添付図面に基づき詳細に説明する。(Example) Next, the present invention will be described in detail with reference to the accompanying drawings.
第1図及び第2図は本発明の半導体素子収納用パッケ
ージの一実施例を示し、1は絶縁基体、2は蓋体であ
る。この絶縁基体1と蓋体2とにより絶縁容器3が構成
される。1 and 2 show an embodiment of a package for accommodating a semiconductor element according to the present invention, wherein 1 is an insulating base and 2 is a lid. The insulating container 3 is constituted by the insulating base 1 and the lid 2.
前記絶縁基体1及び蓋体2はそれぞれの中央部に半導
体素子を収容する空所を形成するための凹部が設けてあ
り、絶縁基体1の凹部底面には半導体素子4が樹脂、ガ
ラス、ロウ剤等の接着剤を介し取着固定される。The insulating base 1 and the lid 2 are each provided with a concave portion for forming a space for accommodating a semiconductor element at the center thereof, and the semiconductor element 4 is formed of resin, glass, brazing agent on the bottom surface of the concave portion of the insulating base 1. It is attached and fixed via an adhesive such as.
前記絶縁基体1及び蓋体2はスピネルもしくはステア
タイト質焼結体から成り、第1図に示すような絶縁基体
1及び蓋体2に対応した形状を有するプレス型内に、ス
ピネルの場合はマグネシア(MgO)、アルミナ(Al2O3)
等の原料粉末を、ステアタイト質焼結体の場合はマグネ
シア(MgO)、シリカ(SiO2)等の原料粉末を充填させ
るとともに一定圧力を印加して成形し、しかる後、成形
品を約1200〜1700℃の温度で焼成することによって製作
される。The insulating base 1 and the lid 2 are made of a spinel or steatite sintered body. In a press mold having a shape corresponding to the insulating base 1 and the lid 2 as shown in FIG. (MgO), alumina (Al 2 O 3 )
Raw material powder such as magnesia (MgO) or silica (SiO 2 ) in the case of a steatite sintered body, and molding by applying a constant pressure. It is manufactured by firing at a temperature of ~ 1700 ° C.
尚、前記絶縁基体1及び蓋体2を形成するスピネルも
しくはステアタイト質焼結体はその熱膨張係数が70〜85
×10-7/℃であり、後述する封止用ガラス部材の熱膨張
係数との関係において絶縁基体1及び蓋体2と封止用ガ
ラス部材間に大きな熱膨張の差が生じることはない。The spinel or steatite sintered body forming the insulating base 1 and the lid 2 has a coefficient of thermal expansion of 70 to 85.
× 10 −7 / ° C., and there is no large difference in thermal expansion between the insulating base 1 and the lid 2 and the sealing glass member in relation to the coefficient of thermal expansion of the sealing glass member described later.
また前記絶縁基体1及び蓋体2にはその相対向する主
面に封止用のガラス部材6が予め被着形成されており、
該絶縁基体1及び蓋体2の各々に被着されている封止用
ガラス部材6を加熱溶融させ一体化させることにより絶
縁容器3内の半導体素子4を気密に封止する。Further, a glass member 6 for sealing is previously formed on the opposing main surfaces of the insulating base 1 and the lid 2.
The semiconductor element 4 in the insulating container 3 is hermetically sealed by heating and melting the sealing glass member 6 attached to each of the insulating base 1 and the lid 2 to be integrated.
前記絶縁基体1及び蓋体2の相対向する主面に被着さ
れる封止用ガラス部材6は、例えばホウケイ酸鉛系ガラ
スにフィラーを添加したものから成り、原料粉末として
の酸化鉛(PbO)70.0〜90.0Wt%、酸化ホウ素(B2O3)1
2.0〜13.0Wt%、シリカ(SiO2)0.5〜3.0Wt%及びアル
ミナ(Al2O3)0.5〜3.0Wt%にフィラーとしてチタン酸
鉛(PbTiO3)、β−ユークリプタイト(Li2Al2Si
2O8)、コージライト(Mg2Al4Si5O18)、ジルコン(ZrS
iO4)、酸化スズ(SnO2)、ウイレマイト(Zn2SiO4)等
を15〜30Vol%添加混合すると共に、該混合粉末を950〜
1100℃の温度で加熱溶融させることによって製作され
る。このホウケイ酸鉛系のガラスはその熱膨張係数が60
〜90×10-7/℃である。The sealing glass member 6 attached to the opposing main surfaces of the insulating base 1 and the lid 2 is made of, for example, lead borosilicate glass to which a filler is added. ) 70.0~90.0Wt%, boron oxide (B 2 O 3) 1
2.0~13.0Wt%, silica (SiO 2) 0.5~3.0Wt% and alumina (Al 2 O 3) lead titanate as a filler 0.5~3.0Wt% (PbTiO 3), β- eucryptite (Li 2 Al 2 Si
2 O 8 ), cordierite (Mg 2 Al 4 Si 5 O 18 ), zircon (ZrS
iO 4 ), tin oxide (SnO 2 ), willemite (Zn 2 SiO 4 ), etc. are added at 15 to 30% by volume, and the mixed powder is mixed at 950 to
It is manufactured by heating and melting at a temperature of 1100 ° C. This lead borosilicate glass has a coefficient of thermal expansion of 60
9090 × 10 −7 / ° C.
前記封止用ガラス部材6はその熱膨張係数が60〜90×
10-7/℃であり、絶縁基体1及び蓋体2の各々の熱膨張
係数と近似することから絶縁基体1及び蓋体2の各々に
被着されている封止用ガラス部材6を加熱溶融させ一体
化させることにより絶縁容器3内の半導体素子4を気密
に封止する際、絶縁基体1及び蓋体2と封止用ガラス部
材6との間には両者の熱膨張係数の相違に起因する熱応
力が発生することは殆どなく、絶縁基体1と蓋体2とを
封止用ガラス部材6を介し強固に接合することが可能と
なる。The sealing glass member 6 has a thermal expansion coefficient of 60 to 90 ×.
Since the thermal expansion coefficient is 10 −7 / ° C. and approximates the thermal expansion coefficients of the insulating base 1 and the lid 2, the sealing glass member 6 attached to each of the insulating base 1 and the lid 2 is heated and melted. When the semiconductor element 4 in the insulating container 3 is air-tightly sealed by integrating them, the difference in thermal expansion coefficient between the insulating base 1 and the lid 2 and the sealing glass member 6 is caused. Almost no thermal stress is generated, and the insulating base 1 and the lid 2 can be firmly joined via the glass member 6 for sealing.
尚、前記封止用ガラス部材6はフィラーを添加したホ
ウケイ酸鉛系ガラスの粉末に適当な有機溶剤、溶媒を添
加して得たガラスペーストを従来周知の厚膜手法を採用
することによって絶縁基体1及び蓋体2の相対向する主
面に被着形成される。The sealing glass member 6 is made of a glass paste obtained by adding a suitable organic solvent and a solvent to a powder of lead borosilicate glass to which a filler has been added by employing a conventionally well-known thick film method. 1 and the cover 2 are attached to the opposing main surfaces.
また前記封止用ガラス部材6はフィラーを添加したホ
ウケイ酸鉛系のガラスに限定されるものではなく、熱膨
張係数が60〜90×10-7/℃の範囲のガラスであればいか
なるものでも使用することができる。Further, the sealing glass member 6 is not limited to a lead borosilicate glass to which a filler is added, and any glass having a coefficient of thermal expansion in a range of 60 to 90 × 10 −7 / ° C. Can be used.
前記絶縁基体1と蓋体2との間には導電性材料から成
る外部リード端子5が配されており、該外部リード端子
5は半導体素子4の各電極がワイヤ7を介し電気的に接
続され、外部リード端子5を外部電気回路に接続するこ
とによって半導体素子4が外部電気回路に接続されるこ
ととなる。An external lead terminal 5 made of a conductive material is disposed between the insulating base 1 and the lid 2. The external lead terminal 5 is electrically connected to each electrode of the semiconductor element 4 via a wire 7. By connecting the external lead terminal 5 to an external electric circuit, the semiconductor element 4 is connected to the external electric circuit.
前記外部リード端子5は絶縁基体1と蓋体2の相対向
する主面に被着させた封止用ガラス部材6を溶融一体化
させ、絶縁容器3を気密封止する際に同時に絶縁基体1
と蓋体2との間に取着される。The external lead terminals 5 are formed by melting and integrating a sealing glass member 6 attached to the opposing main surfaces of the insulating base 1 and the lid 2, and simultaneously sealing the insulating container 3 with the insulating base 1.
And the cover 2.
前記外部リード端子5はニッケル31.5乃至32.5Wt%、
コバルト16.5乃至17.5Wt%、鉄50.0乃至52.0Wt%の合金
から成る板状体の上下面に、該板状体の厚みに対し60乃
至80%の厚みの銅板を接合させた金属体から成り、その
透磁率は約93(CGS)、導電率は62.3%(IACS)、熱膨
張係数は約71×10-7/℃である。The external lead terminal 5 has nickel of 31.5 to 32.5 Wt%,
A metal body in which a copper plate having a thickness of 60 to 80% with respect to the thickness of the plate body is joined to upper and lower surfaces of a plate body made of an alloy of cobalt 16.5 to 17.5 Wt% and iron 50.0 to 52.0 Wt%, Its magnetic permeability is about 93 (CGS), conductivity is 62.3% (IACS), and thermal expansion coefficient is about 71 × 10 -7 / ° C.
尚、前記外部リード端子5はニッケル−コバルト−鉄
合金(Ni−Co−Fe合金)の板状体の上下面に銅(Cu)板
を圧接し、しかる後、これを圧延することによって形成
される。The external lead terminal 5 is formed by pressing a copper (Cu) plate on the upper and lower surfaces of a nickel-cobalt-iron alloy (Ni-Co-Fe alloy) plate and then rolling it. You.
また前記外部リード端子5はニッケル(Ni)、コバル
ト(Co)、鉄(Fe)の量及び板状体と銅板の厚みが上述
の範囲から外れると外部リード端子5の透磁率が所望す
る低い値に、導電率が高い値にならなくなり、また熱膨
張係数も絶縁基体及び蓋体の熱膨張係数と合わなくな
る。そのため外部リード端子5はニッケル31.5乃至32.5
Wt%、コバルト16.5乃至17.5Wt%、鉄50.0乃至52.0Wt%
の合金から成る板状体の上下面に、該板状体の厚みに対
し60乃至80%の厚みの銅板を接合させた金属体で形成す
ることに限定される。When the amount of nickel (Ni), cobalt (Co) and iron (Fe) and the thickness of the plate and the copper plate are out of the above ranges, the magnetic permeability of the external lead terminal 5 becomes a desired low value. In addition, the conductivity does not reach a high value, and the coefficient of thermal expansion does not match the coefficient of thermal expansion of the insulating base and the lid. Therefore, external lead terminal 5 is nickel 31.5 to 32.5
Wt%, cobalt 16.5-17.5Wt%, iron 50.0-52.0Wt%
It is limited to a metal body in which a copper plate having a thickness of 60 to 80% of the thickness of the plate is bonded to the upper and lower surfaces of the plate made of the alloy.
前記外部リード端子5はその透磁率が93(CGS)であ
り、透磁率が低いことから外部リード端子5に電流が流
れたとしても外部リード端子5中には大きな自己インダ
クタンスが発生することはなく、その結果、前記自己イ
ンダクタンスにより誘発される逆起電力に起因したノイ
ズを極小となし、内部に収容する半導体素子4を常に正
常に作動させることができる。Since the magnetic permeability of the external lead terminal 5 is 93 (CGS) and the magnetic permeability is low, even if a current flows through the external lead terminal 5, a large self-inductance is not generated in the external lead terminal 5. As a result, noise caused by the back electromotive force induced by the self-inductance can be minimized, and the semiconductor element 4 housed therein can always operate normally.
また前記外部リード端子5はその導電率が62.3%(IA
CS)以上であり、電気を流し易いことから外部リード端
子5の信号伝搬速度を極めて速いものとなすことがで
き、絶縁容器3内に収容した半導体素子4を高速駆動さ
せたとしても半導体素子4と外部電気回路との間におけ
る信号の出し入れは常に安定、且つ確実となすことがで
きる。The external lead terminal 5 has a conductivity of 62.3% (IA
CS) or more, and since it is easy to conduct electricity, the signal propagation speed of the external lead terminal 5 can be made extremely high. Even if the semiconductor element 4 housed in the insulating container 3 is driven at high speed, the semiconductor element 4 Signals can be always sent and received between the power supply and the external electric circuit in a stable and reliable manner.
また同時に外部リード端子5の導電率が高いことから
外部リード端子5の線幅が細くなったとしても外部リー
ド端子5の電気抵抗を低く抑えることができ、その結
果、外部リード端子5における信号の減衰を極小として
内部に収容する半導体素子4に外部電気回路から供給さ
れる電気信号を正確に入力することができる。At the same time, since the electrical conductivity of the external lead terminal 5 is high, even if the line width of the external lead terminal 5 is reduced, the electrical resistance of the external lead terminal 5 can be suppressed low. An electric signal supplied from an external electric circuit can be accurately input to the semiconductor element 4 housed therein with the attenuation being minimized.
また更に前記外部リード端子5はその熱膨張係数が約
71×10-7/℃であり、封止用ガラス部材6の熱膨張係数
と近似することから外部リード端子5を絶縁基体1と蓋
体2の間に封止用ガラス部材6を用いて固定する際、外
部リード端子5と封止用ガラス部材6との間には両者の
熱膨張係数の相違に起因する熱応力が発生することはな
く、外部リード端子5を封止用ガラス部材6で強固に固
定することも可能となる。Further, the external lead terminal 5 has a thermal expansion coefficient of about
The external lead terminal 5 is fixed between the insulating base 1 and the lid 2 using the sealing glass member 6 because it is 71 × 10 −7 / ° C. and is close to the coefficient of thermal expansion of the sealing glass member 6. At this time, no thermal stress is generated between the external lead terminal 5 and the sealing glass member 6 due to the difference in the coefficient of thermal expansion between the external lead terminal 5 and the sealing glass member 6. It becomes possible to fix firmly.
かくして、この半導体素子収納用パッケージによれば
絶縁基体1の凹部底面に半導体素子4を取着固定すると
ともに該半導体素子4の各電極をボンディングワイヤ7
により外部リード端子5に接続させ、しかる後、絶縁基
体1と蓋体2とを該絶縁基体1及び蓋体2の相対向する
主面に予め被着させておいた封止用ガラス部材6を溶融
一体化させることによって接合させ、これによって最終
製品としての半導体装置が完成する。Thus, according to the package for accommodating the semiconductor element, the semiconductor element 4 is attached and fixed to the bottom surface of the concave portion of the insulating base 1 and each electrode of the semiconductor element 4 is connected to the bonding wire 7.
After that, the sealing glass member 6 in which the insulating substrate 1 and the lid 2 are previously adhered to the opposing main surfaces of the insulating substrate 1 and the lid 2 is removed. The semiconductor device as a final product is completed by joining by melting and integrating.
(発明の効果) 本発明の半導体素子収納用パッケージによれば、半導
体素子を収容するための絶縁容器を構成する絶縁基体及
び蓋体をスピネルもしくはステアタイト質焼結体で、外
部リード端子をニッケル31.5乃至32.5Wt%、コバルト1
6.5乃至17.5Wt%、鉄50.0乃至52.0Wt%の合金から成る
板状体の上下面に、該板状体の厚みに対し60乃至80%の
厚みの銅板を接合させた透磁率が約93(CGS)、導電率
が62.3%(IACS)、熱膨張係数が約71×10-7/℃の金属
体で形成したことから外部リード端子に電流を流したと
しても該外部リード端子中に大きな自己インダクタンス
が発生することはなく、その結果、前記自己インダクタ
ンスにより誘発される逆起電力に起因したノイズを極小
となし、内部に収容する半導体素子を常に正常に作動さ
せることが可能となる。(Effect of the Invention) According to the package for housing a semiconductor element of the present invention, the insulating base and the lid constituting the insulating container for housing the semiconductor element are made of a spinel or steatite sintered body, and the external lead terminals are made of nickel. 31.5 to 32.5 Wt%, cobalt 1
A copper plate having a thickness of 60 to 80% with respect to the thickness of the plate is joined to the upper and lower surfaces of a plate made of an alloy of 6.5 to 17.5 Wt% and iron 50.0 to 52.0 Wt% to have a magnetic permeability of about 93 ( CGS), conductivity of 62.3% (IACS), and thermal expansion coefficient of about 71 × 10 -7 / ° C. No inductance is generated. As a result, noise caused by the back electromotive force induced by the self-inductance is minimized, and the semiconductor element housed therein can always operate normally.
また外部リード端子の信号伝搬速度を極めて速いもの
となすことができ、絶縁容器内に収容した半導体素子を
高速駆動させたとしても半導体素子と外部電気回路との
間における信号の出し入れを常に安定、且つ確実となす
ことが可能となる。In addition, the signal propagation speed of the external lead terminal can be made extremely fast, so that even when the semiconductor element housed in the insulating container is driven at high speed, the transfer of signals between the semiconductor element and the external electric circuit is always stable, In addition, it is possible to make sure.
更に外部リード端子の線幅が細くなったとしても外部
リード端子の電気抵抗を低く抑えることができ、その結
果、外部リード端子における信号の減衰を極小として内
部に収容する半導体素子に外部電気回路から供給される
電気信号を正確に入力することが可能となる。Furthermore, even if the line width of the external lead terminal is reduced, the electric resistance of the external lead terminal can be kept low. The supplied electric signal can be input accurately.
また更に外部リード端子はその熱膨張係数が絶縁基
体、蓋体及び封止用ガラス部材の各々の熱膨張係数と近
似し、絶縁基体と蓋体との間に外部リード端子を挟み、
各々を封止用ガラス部材で取着接合したとしても絶縁基
体及び蓋体と封止用ガラス部材との間、外部リード端子
と封止用ガラス部材との間のいずれにも熱膨張係数の相
違に起因する熱応力は発生せず、すべてを強固に取着接
合することも可能となる。Further, the thermal expansion coefficient of the external lead terminal is close to the thermal expansion coefficient of each of the insulating base, the lid and the sealing glass member, and the external lead terminal is sandwiched between the insulating base and the lid,
Even if each of them is attached and bonded with a sealing glass member, the thermal expansion coefficient is different between the insulating base and the lid and the sealing glass member, and between the external lead terminal and the sealing glass member. No thermal stress is caused by this, and it is possible to firmly attach and join all of them.
第1図は本発明の半導体素子収納用パッケージの一実施
例を示す断面図、第2図は第1図に示すパッケージの絶
縁基体上面より見た平面図である。 1……絶縁基体、2……蓋体 3……絶縁容器 5……外部リード端子 6……封止用ガラス部材FIG. 1 is a cross-sectional view showing one embodiment of a package for housing a semiconductor element according to the present invention, and FIG. 2 is a plan view of the package shown in FIG. DESCRIPTION OF SYMBOLS 1 ... Insulating base 2 ... Lid 3 ... Insulating container 5 ... External lead terminal 6 ... Glass member for sealing
Claims (1)
素子を収容するための空所を有する絶縁容器と、該容器
内に収容される半導体素子を外部電気回路に接続するた
めの外部リード端子とから成る半導体素子収納用パッケ
ージにおいて、前記絶縁基体及び蓋体をスピネルもしく
はステアタイト質焼結体で、外部リード端子をニッケル
31.5乃至32.5Wt%、コバルト16.5乃至17.5Wt%、鉄50.0
乃至52.0Wt%の合金から成る板状体の上下面に、該板状
体の厚みに対し60乃至80%の厚みの銅板を接合させた金
属体で形成したことを特徴とする半導体素子収納用パッ
ケージ。An insulating container, comprising an insulating base and a lid, having a space for accommodating a semiconductor element therein, and an external container for connecting the semiconductor element contained in the container to an external electric circuit. In the semiconductor device housing package comprising lead terminals, the insulating base and the lid are made of a spinel or steatite sintered body, and the external lead terminals are made of nickel.
31.5-32.5Wt%, Cobalt 16.5-17.5Wt%, Iron 50.0
Characterized by being formed of a metal body in which a copper plate having a thickness of 60 to 80% with respect to the thickness of the plate body is joined to upper and lower surfaces of a plate body made of an alloy of 5 to 52.0 Wt%. package.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1308597A JP2736453B2 (en) | 1989-11-27 | 1989-11-27 | Package for storing semiconductor elements |
| US07/573,406 US5057905A (en) | 1989-08-25 | 1990-08-24 | Container package for semiconductor element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1308597A JP2736453B2 (en) | 1989-11-27 | 1989-11-27 | Package for storing semiconductor elements |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03167853A JPH03167853A (en) | 1991-07-19 |
| JP2736453B2 true JP2736453B2 (en) | 1998-04-02 |
Family
ID=17982956
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1308597A Expired - Lifetime JP2736453B2 (en) | 1989-08-25 | 1989-11-27 | Package for storing semiconductor elements |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2736453B2 (en) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4301324A (en) * | 1978-02-06 | 1981-11-17 | International Business Machines Corporation | Glass-ceramic structures and sintered multilayer substrates thereof with circuit patterns of gold, silver or copper |
| US5001546A (en) * | 1983-07-27 | 1991-03-19 | Olin Corporation | Clad metal lead frame substrates |
| JPS6232631A (en) * | 1985-08-05 | 1987-02-12 | Hitachi Ltd | Integrated circuit package |
| CA1300648C (en) * | 1987-04-27 | 1992-05-12 | Francis Willis Martin | Glass-ceramics for electronic packaging |
-
1989
- 1989-11-27 JP JP1308597A patent/JP2736453B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03167853A (en) | 1991-07-19 |
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