JP2748892B2 - X-ray diffraction microscope and X-ray diffraction microscope method - Google Patents
X-ray diffraction microscope and X-ray diffraction microscope methodInfo
- Publication number
- JP2748892B2 JP2748892B2 JP18830995A JP18830995A JP2748892B2 JP 2748892 B2 JP2748892 B2 JP 2748892B2 JP 18830995 A JP18830995 A JP 18830995A JP 18830995 A JP18830995 A JP 18830995A JP 2748892 B2 JP2748892 B2 JP 2748892B2
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- Prior art keywords
- sample
- ray
- diffraction
- ray diffraction
- diffracted
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Links
- 238000002441 X-ray diffraction Methods 0.000 title claims description 22
- 238000000034 method Methods 0.000 title claims description 5
- 239000013078 crystal Substances 0.000 claims description 47
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000000386 microscopy Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 238000001000 micrograph Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 101700004678 SLIT3 Proteins 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 102100027339 Slit homolog 3 protein Human genes 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 210000004072 lung Anatomy 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は結晶学的評価に用いるＸ
線回折顕微装置に関し、特に大型化しなくとも試料結晶
の大口径化に対応し得るＸ線回折顕微装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention
The present invention relates to an X-ray diffraction microscope, and more particularly to an X-ray diffraction microscope that can cope with an increase in the diameter of a sample crystal without increasing the size.
【０００２】[0002]
【従来の技術】Ｘ線回折顕微装置は、格子歪を回折位置
のずれ、反射率の変化として検出するものである。格子
歪の結晶内分布に関する信頼性のある情報を得ること
は、極めて重要な問題であり、特に大面積である材料を
取り扱う現在の半導体工業の分野においては、迅速でか
つ非破壊で材料試験を行う必要から、他の試験法に比較
して、非常に有力な試験、評価手段であるとして用いら
れている。2. Description of the Related Art An X-ray diffraction microscope detects lattice distortion as a shift in diffraction position and a change in reflectance. Obtaining reliable information about the distribution of lattice strains within a crystal is a critical issue, especially in the current semiconductor industry where large area materials are used. Because of the need to perform it, it is used as a very powerful test and evaluation tool as compared to other test methods.
【０００３】ここで、Ｘ線回折顕微装置とは、試料から
の回折Ｘ線を原子核乾板等に記録し、試料と写真との間
に１対１の対応をつけ、回折Ｘ線の強度及び方向の場所
的変化を観察する装置のすべてを意味するものである
（例えば、文献「応用物理、３６−２、８８、１９６７
年」参照）。[0003] Here, the X-ray diffraction microscope is a device that records a diffracted X-ray from a sample on a nucleus plate or the like, makes a one-to-one correspondence between the sample and a photograph, and obtains the intensity and direction of the diffracted X-ray. Means all devices for observing a change in location (for example, the literature "Applied Physics, 36-2, 88, 1967").
Year ").
【０００４】以下、回折顕微装置の代表的な装置である
ラング・カメラについて説明する。Hereinafter, a Lang camera, which is a typical diffraction microscope, will be described.
【０００５】図３（Ａ）、図３（Ｂ）は、ラング・カメ
ラを説明するために用いた回折装置の平面図と正面図を
それぞれ模式的に表わした図である。FIGS. 3A and 3B are a plan view and a front view, respectively, of a diffraction device used for explaining a Lang camera.
【０００６】図３を参照して、ラング・カメラは、検出
器１０と、スリット５を取り付けた２θ回転台１４と、
試料水平走査台９を載せたθ回転台１５とから構成され
ている。Referring to FIG. 3, a Lang camera includes a detector 10, a 2θ turntable 14 having a slit 5 attached thereto,
And a θ rotation table 15 on which the sample horizontal scanning table 9 is mounted.
【０００７】ラング・カメラの使用法は、まず２θ回転
台１４を回転して検出器１０を回折Ｘ線１３が入射する
方向にセットし、Ｘ線焦点（Ｘ線源）１より発生したＸ
線ビ−ム２を矢印で示した如く、スリット３を通じ、Ｋ
α1線だけが試料結晶４で回折を起こすような角度θBに
θ回転台１５を回転して調整する。The method of using the Lang camera is as follows. First, the 2θ turntable 14 is rotated to set the detector 10 in the direction in which the diffracted X-rays 13 are incident.
As shown by the arrow in the line beam 2, through the slit 3, K
The θ rotation table 15 is rotated and adjusted to an angle θ B such that only the α 1 line causes diffraction in the sample crystal 4.
【０００８】この時、試料結晶４全面からの回折を得る
ためには、Ｘ線源１と試料結晶４との距離Ｌは、Ｘ線ビ
ーム２の鉛直方向の発散角をαラジアン、試料結晶４の
鉛直方向の長さをｌとすると，Ｌ＞ｌ／αにする必要が
ある。At this time, in order to obtain diffraction from the entire surface of the sample crystal 4, the distance L between the X-ray source 1 and the sample crystal 4 is determined by setting the vertical divergence angle of the X-ray beam 2 to α radian, the sample crystal 4 It is necessary to satisfy L> l / α, where l is the length in the vertical direction.
【０００９】次に、試料結晶４を透過した透過Ｘ線ビ−
ム１２をスリット５で切り、回折Ｘ線ビ−ム１３だけを
それに垂直に置いた写真乾板ホルダ７に固定された写真
乾板６に到達させる。Next, the transmitted X-ray beam transmitted through the sample crystal 4
The beam 12 is cut by the slit 5 and only the diffracted X-ray beam 13 reaches the photographic dry plate 6 fixed to the photographic dry plate holder 7 placed perpendicularly thereto.
【００１０】この状態では、入射Ｘ線２は試料結晶４内
の符号ＡＢＣで示したウエーブ・ファンと呼ばれる領域
に広がっている。In this state, the incident X-rays 2 have spread to a region called a wave fan indicated by ABC in the sample crystal 4.
【００１１】ここで、この回折条件を保ちながら、試料
結晶４と写真乾板ホルダ７を載せた試料水平走査台９を
試料結晶４の表面に平行に往復運動させて、試料結晶４
の広い領域の回折像を得る。これをラング回折顕微写真
（ラング・トポグラフ）と呼んでいる。Here, while maintaining the diffraction conditions, the sample horizontal scanning table 9 on which the sample crystal 4 and the photographic dry plate holder 7 are placed is reciprocated in parallel to the surface of the sample crystal 4 so that the sample crystal 4
To obtain a diffraction image of a wide area. This is called a Lang diffraction micrograph (Lung topograph).
【００１２】[0012]
【発明が解決しようとする課題】しかしながら、上記し
た従来の回折顕微装置においては、大きな試料結晶を測
定する場合には、図３で示したＸ線源１と試料結晶４と
の距離Ｌを大きくとらなければならず、装置が非常に大
きくなるという問題があった。However, in the conventional diffraction microscope described above, when measuring a large sample crystal, the distance L between the X-ray source 1 and the sample crystal 4 shown in FIG. However, there is a problem that the device becomes very large.
【００１３】従って、本発明の目的は、上記従来の技術
の問題点を解消し、装置を大型化しなくとも大口径試料
を測定することのできるＸ線回折顕微装置及び方法を提
供することにある。Accordingly, an object of the present invention is to provide an X-ray diffraction microscope and an X-ray diffraction microscope capable of solving the above-mentioned problems of the prior art and measuring a large-diameter sample without increasing the size of the apparatus. .
【００１４】[0014]
【課題を解決するための手段】前記目的を達成するた
め、本発明は、円盤状の単結晶試料にＸ線ビームを入射
し、得られる回折Ｘ線を写真乾板上に記録するＸ線回折
顕微装置において、前記試料を該試料の中心を回転中心
として試料平面内で回転させる機構と、前記試料の中心
から回折されたＸ線が写真乾板上に入射する点を中心と
して写真乾板を写真乾板平面内で回転させる機構と、を
備えることを特徴とするＸ線回折顕微装置を提供する。In order to achieve the above-mentioned object, the present invention provides an X-ray diffraction microscope for irradiating a disk-shaped single crystal sample with an X-ray beam and recording the obtained diffraction X-ray on a photographic dry plate. In the apparatus, the center of the sample is a rotation center.
A mechanism for rotating the sample flat plane as the center of the sample
Centering on the point where the X-ray diffracted from
And a mechanism for rotating the photographic dry plate in the plane of the photographic dry plate .
【００１５】また、本発明は、円盤状の単結晶試料にＸ
線ビームを入射し、得られる回折Ｘ線を写真乾板上に記
録するＸ線回折顕微装置において、前記試料を該試料の
中心を回転中心として試料平面内で回転させる機構と、
前記試料の中心から回折されたＸ線が写真乾板上に入射
する点を中心として写真乾板を写真乾板平面内で回転さ
せる機構と、を備え、前記試料を水平往復運動させて所
定の部分領域からの回折像を得た後、前記試料および前
記写真乾板を予め定めた所定角度だけ面内回転させた後
に再び前記試料を水平往復運動させ前記部分領域とは別
の部分領域からの回折像を得るという具合に複数回に分
けて前記試料の全体からの回折像を得るようにしたこと
を特徴とするＸ線回折顕微装置を提供する。Further, the present invention provides a method for preparing a disk-shaped single crystal
An X-ray diffraction microscope that receives an X-ray beam and records the obtained diffracted X-rays on a photographic dry plate .
A mechanism for rotating in the sample plane about the center of rotation,
X-ray diffracted from the center of the sample enters the photographic plate
The photographic plate is rotated in the plane of the photographic plate around the point
And a mechanism for horizontally reciprocating the sample to obtain a diffraction image from a predetermined partial area, and then rotating the sample and the photographic dry plate in a plane at a predetermined angle, and then re-executing the sample again. that to obtain a diffraction image from the whole of the sample a plurality of times so on the obtained diffraction image from another part region and is horizontally reciprocating said partial region
An X-ray diffraction microscope is provided.
【００１６】本発明は、好ましくは、前記試料に近接し
て、前記Ｘ線ビームの鉛直方向のビーム幅を制限するた
めのスリットが配設されたことを特徴とする。Preferably, the present invention is characterized in that a slit for limiting a vertical beam width of the X-ray beam is provided near the sample.
【００１７】[0017]
【作用】本発明においては、試料結晶および写真乾板を
連動して面内回転できる機構を備えたことにより、水平
往復運動を鉛直方向に複数回に分けて行うことができ
る。その結果、大きな試料結晶を測定しても、Ｘ線源と
試料結晶との距離を長くとらなくてもよいため、装置の
大型化を防止できる。According to the present invention, a horizontal reciprocating motion can be divided into plural times in the vertical direction by providing a mechanism capable of rotating the sample crystal and the photographic plate in-plane in conjunction with each other. As a result, even if a large sample crystal is measured, the distance between the X-ray source and the sample crystal does not need to be long, so that an increase in the size of the apparatus can be prevented.
【００１８】[0018]
【実施例】図面を参照して、本発明の実施例を以下に説
明する。Embodiments of the present invention will be described below with reference to the drawings.
【００１９】図１は本発明の一実施例に係るＸ線回折顕
微装置の平面図を示し、図２（Ａ）、図２（Ｂ）は正面
図および側面図を模式的に示した図である。FIG. 1 is a plan view of an X-ray diffraction microscope according to one embodiment of the present invention, and FIGS. 2A and 2B are diagrams schematically showing a front view and a side view. is there.
【００２０】図１及び図２を参照して、本実施例に係る
装置は、検出器１０と、スリット５を取り付けた２θ回
転台１４と、試料水平走査台９を載置したθ回転台１５
とから構成され、試料水平走査台９には試料結晶４から
の回折Ｘ線を記録する写真乾板６を備えている。Referring to FIGS. 1 and 2, the apparatus according to the present embodiment comprises a detector 10, a 2θ turntable 14 on which a slit 5 is mounted, and a θ turntable 15 on which a sample horizontal scanning table 9 is mounted.
The sample horizontal scanning table 9 is provided with a photographic dry plate 6 for recording diffraction X-rays from the sample crystal 4.
【００２１】試料水平走査台９の上に試料結晶４と写真
乾板ホルダ７が載置されている点は、図３に示した前記
従来のＸ線回折顕微装置と同様である。The point that the sample crystal 4 and the photographic dry plate holder 7 are mounted on the sample horizontal scanning table 9 is the same as the conventional X-ray diffraction microscope shown in FIG.
【００２２】しかし、本実施例においては、前記従来例
と相違して、試料結晶４とＸ線源１との距離は、試料結
晶４全面からの回折は得られないが半分以上の回折が得
られる距離であり、また、試料水平走査台９の上に円盤
状の試料結晶４を円の中心Ｄを中心として面内回転させ
る機構１１と、写真乾板ホルダ７を試料結晶４の中心か
ら回折されたＸ線が写真乾板上に入射する点Ｅを中心と
して面内回転させる機構１６とが備えられ、試料結晶４
に近接して、Ｘ線ビーム２の鉛直方向のビーム幅を制限
するためのスリット８が設置されている。However, in the present embodiment, unlike the conventional example, the distance between the sample crystal 4 and the X-ray source 1 is such that diffraction from the entire surface of the sample crystal 4 cannot be obtained but more than half the diffraction can be obtained. And a disk above the sample horizontal scanning table 9
Mechanism 11 for rotating the sample crystal 4 in a plane around the center D of the circle, and moving the photographic dry plate holder 7 to the center of the sample crystal 4
Centered on the point E where the X-ray diffracted from
And a mechanism 16 for in-plane rotation of the sample crystal 4
, A slit 8 for limiting the beam width of the X-ray beam 2 in the vertical direction is provided.
【００２３】測定にあたっては、Ｘ線ビーム２が試料結
晶４の下半分だけに照射するように鉛直方向のビーム幅
をスリット８により制限し、試料結晶４を試料水平走査
台９によって水平方向に往復運動させることにより、図
２（Ｂ）の斜線で示した部分からの回折像を得た後、試
料ホルダ回転機構１１と写真乾板ホルダ回転機構１６に
より試料結晶４と写真乾板６を１８０度回転し、再度水
平方向に往復運動させて試料結晶４全体からの回折像を
得る。In the measurement, the beam width in the vertical direction is set so that the X-ray beam 2 irradiates only the lower half of the sample crystal 4.
Is restricted by the slit 8 and the sample crystal 4 is reciprocated in the horizontal direction by the sample horizontal scanning table 9 to obtain a diffraction image from the hatched portion in FIG. The sample crystal 4 and the photographic plate 6 are rotated by 180 degrees by the 11 and the photographic plate holder rotating mechanism 16 and reciprocated in the horizontal direction again to obtain a diffraction image from the entire sample crystal 4.
【００２４】このようにすることにより、試料結晶４と
Ｘ線源１との距離Ｌを短くすることが可能となり、装置
の大型化を避けることができる。By doing so, the distance L between the sample crystal 4 and the X-ray source 1 can be reduced , and an increase in the size of the apparatus can be avoided.
【００２５】本実施例で得られた測定結果の一例を以下
に説明する。An example of the measurement results obtained in this embodiment will be described below.
【００２６】試料に入射するＸ線としては、モリブデン
のＫα1線（波長０．０７０９３ｎｍ）を使用した。表
面が（１００）面の直径２０ｃｍのシリコン単結晶基板
試料に対し、θBを１０．６４度に設定することによ
り、０２２回折が起こるようにして撮影を行った。[0026] As X-rays incident on the sample, was used K [alpha 1 line of molybdenum (wavelength 0.07093nm). A silicon single crystal substrate sample having a (100) surface and a diameter of 20 cm was photographed by setting θ B to 10.64 ° so that 022 diffraction occurred.
【００２７】また、スリット８の幅は１０ｃｍに設定し
た。The width of the slit 8 was set to 10 cm.
【００２８】まず、図２（Ｂ）に示した状態で、試料結
晶４を水平往復運動させた後、試料結晶４と写真乾板ホ
ルダ７を回転中心ＤおよびＥを中心として１８０度回転
させ、前回と同じ回数だけ水平往復運動を行った。First, in the state shown in FIG. 2 (B), the sample crystal 4 is caused to reciprocate horizontally, and then the sample crystal 4 and the photographic plate holder 7 are rotated 180 degrees about the rotation centers D and E. Horizontal reciprocation was performed the same number of times.
【００２９】この時、Ｘ線源と試料結晶４との距離は１
ｍであったが、試料結晶４全体からの良好な回折顕微写
真が撮影できた。At this time, the distance between the X-ray source and the sample crystal 4 is 1
m, a good diffraction micrograph of the entire sample crystal 4 could be taken.
【００３０】比較のために、同じ試料を従来のラング・
カメラで測定したところ試料結晶４と写真乾板の距離を
２ｍまで離さないと、試料全体からの回折顕微写真は得
られなかった。For comparison, the same sample was used for the conventional Lang
When measured with a camera, a diffraction micrograph from the entire sample could not be obtained unless the distance between the sample crystal 4 and the photographic plate was set to 2 m.
【００３１】すなわち、本実施例によれば、試料結晶４
の大型化に伴う回折顕微装置の大型化を回避しつつ、試
料結晶４の広い領域からの良好な回折顕微写真を得るこ
とが可能とされている。That is, according to this embodiment, the sample crystal 4
It is possible to obtain a good diffraction microscope photograph from a wide area of the sample crystal 4 while avoiding an increase in the size of the diffraction microscope accompanying the increase in the size of the sample.
【００３２】なお、上記実施例ではラング・カメラにつ
いてのみ説明を行ったが、本発明は、ラング・カメラだ
けでなく大口径結晶を試料とするすべての回折顕微装置
について適応可能である。Although only the Lang camera has been described in the above embodiment, the present invention is applicable not only to the Lang camera but also to all diffraction microscopes using a large-diameter crystal as a sample.
【００３３】また、上記実施例では、水平往復運動を試
料結晶４を１８０度回転させることにより２回に分けて
行う装置を用いたが、試料の大きさ等により９０度ずつ
回転させて４回にすることも可能である。Further, in the above-described embodiment, the apparatus is used in which the horizontal reciprocating motion is performed twice by rotating the sample crystal 4 by 180 degrees. However, the apparatus is rotated four times by 90 degrees depending on the size of the sample. It is also possible to
【００３４】更に、上記実施例では表面が（１００）面
である試料結晶４についてのみ説明を行ったが、（１１
１）面が表面である場合には、１２０度ずつ回転させる
ことにより、３回に分けて撮影すればよい。Further, in the above embodiment, only the sample crystal 4 having a (100) surface has been described.
1) When the surface is the front surface, the image can be divided into three times by rotating the image by 120 degrees.
【００３５】以上、本発明を上記実施例に即して説明し
たが、本発明は上記態様にのみ限定されず、本発明の原
理に準ずる各種態様を含むことは勿論である。Although the present invention has been described with reference to the above embodiment, the present invention is not limited to the above embodiment, but includes various embodiments according to the principle of the present invention.
【００３６】[0036]
【発明の効果】以上説明したように、本発明によれば、
試料結晶の大型化に伴う回折顕微装置の大型化を回避し
つつ、試料結晶の広い領域からの良好な回折顕微写真を
得ることが可能となり、Ｘ線回折顕微像測定の改良、改
善が達成され、大口径材料の試験、評価等に与える効果
は大きく、その実用的効果は極めて大きい。As described above, according to the present invention,
It is possible to obtain good diffraction micrographs from a wide area of the sample crystal while avoiding the increase in the size of the diffraction microscope due to the increase in the size of the sample crystal. The effect on the test and evaluation of large-diameter materials is great, and the practical effect is extremely large.
【図１】本発明の回折顕微装置の一実施例の平面図を模
式的に示す図ある。FIG. 1 is a diagram schematically showing a plan view of an embodiment of a diffraction microscope according to the present invention.
【図２】（Ａ）本発明の回折顕微装置の一実施例の正面
図を模式的に示す図ある。 （Ｂ）本発明の回折顕微装置の一実施例の側面図を模式
的に示す図ある。FIG. 2A is a diagram schematically showing a front view of an embodiment of the diffraction microscope according to the present invention. (B) It is a figure which shows typically the side view of one Example of the diffraction microscope of this invention.
【図３】（Ａ）従来のＸ線回折顕微装置の一例の平面図
を模式的に示す図である。 （Ｂ）従来のＸ線回折顕微装置の一例の正面図を模式的
に示す図である。FIG. 3A is a diagram schematically showing a plan view of an example of a conventional X-ray diffraction microscope. (B) It is a figure which shows typically the front view of an example of the conventional X-ray diffraction microscope.
１ Ｘ線源 ２ Ｘ線ビ−ム ３、５、８ スリット ４ 試料結晶 ６ 写真乾板 ７ 写真乾板ホルダ ９ 試料水平走査台 １０ 検出器 １１ 試料ホルダ回転機構 １２ 透過Ｘ線ビーム １３ 回折Ｘ線ビーム １４ ２θ回転台 １５ θ回転台 １６ 写真乾板ホルダ回転機構 REFERENCE SIGNS LIST 1 X-ray source 2 X-ray beam 3, 5, 8 slit 4 Sample crystal 6 Photoplate 7 Photoplate holder 9 Sample horizontal scanning table 10 Detector 11 Sample holder rotation mechanism 12 Transmission X-ray beam 13 Diffracted X-ray beam 14 2θ turntable 15 θ turntable 16 Photoplate holder rotation mechanism
Claims (4)
し、得られる回折Ｘ線を写真乾板上に記録するＸ線回折
顕微装置において、 前記試料を該試料の中心を回転中心として試料平面内で
回転させる機構と、 前記試料の中心から回折されたＸ線が写真乾板上に入射
する点を中心として 写真乾板を写真乾板平面内で回転さ
せる機構と、を備えることを特徴とするＸ線回折顕微装
置。1. An X-ray diffraction microscope for irradiating a disk-shaped single crystal sample with an X-ray beam and recording the obtained diffracted X-rays on a photographic dry plate, wherein the sample is rotated about the center of the sample. a mechanism for <br/> rotated in a flat plane, X-rays diffracted from the center of the sample is incident on a photographic plate
The photographic plate is rotated in the plane of the photographic plate around the point
An X-ray diffraction microscope.
し、得られる回折Ｘ線を写真乾板上に記録するＸ線回折
顕微装置において、前記試料を該試料の中心を回転中心として試料平面内で
回転させる機構と、 前記試料の中心から回折されたＸ線が写真乾板上に入射
する点を中心として写真乾板を写真乾板平面内で回転さ
せる機構と、を備え、 前記試料を水平往復運動させて所定の部分領域からの回
折像を得た後、前記試料および前記写真乾板を予め定め
た所定角度だけ面内回転させた後に再び前記試料を水平
往復運動させ前記部分領域とは別の部分領域からの回折
像を得るという具合に複数回に分けて前記試料の全体か
らの回折像を得るようにしたことを特徴とするＸ線回折
顕微装置。2. An X-ray diffraction microscope, wherein an X-ray beam is incident on a disk-shaped single crystal sample and the obtained diffraction X-ray is recorded on a photographic plate. In the plane
Rotating mechanism and X-ray diffracted from the center of the sample enters the photographic plate
The photographic plate is rotated in the plane of the photographic plate around the point
And a mechanism for horizontally reciprocating the sample to obtain a diffraction image from a predetermined partial area, and then rotating the sample and the photographic dry plate in a plane at a predetermined angle, and then re-executing the sample again. the X-ray diffraction microscopy, characterized in that to obtain the diffraction image from the whole of the sample a plurality of times so on to obtain a diffraction image from another part region and is horizontally reciprocating said partial region apparatus.
直方向のビーム幅を制限するためのスリットが配設され
たことを特徴とする請求項１又は２記載のＸ線回折顕微
装置。3. An X-ray diffraction microscope according to claim 1, wherein a slit for limiting a vertical beam width of the X-ray beam is provided near the sample. .
し、得られる回折Ｘ線を写真乾板上に記録するＸ線回折
顕微方法において、前記試料を水平往復運動させて所定の部分領域からの回
折像を得た後、前記試料を、該試料の中心を回転中心と
して、前記写真乾板を前記試料の中心から回折されたＸ
線が写真乾板上に入射する点を中心として、予め定めた
所定角度だけ面 内回転させた後に再び前記試料を水平往
復運動させ前記部分領域とは別の部分領域からの回折像
を得るという具合に複数回に分けて前記試料の全体から
の回折像を得るようにしたことを特徴とするＸ線回折顕
微方法 。4. An X-ray beam is incident on a single crystal sample on a disk.
X-ray diffraction that records the resulting diffracted X-rays on a photographic plate
In the microscopic method, the sample is reciprocated horizontally to rotate the sample from a predetermined partial area.
After obtaining the folded image, the sample is rotated with the center of the sample as the center of rotation.
The X-ray diffracted from the center of the sample
Predetermined centered on the point where the line falls on the photographic plate
After rotating the in- plane by a predetermined angle, the sample is moved horizontally again.
Diffracted image from a partial area different from the partial area after the backward movement
From the whole of the sample by dividing into several times
X-ray diffraction microscope characterized by obtaining a diffraction image of
Fine method .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18830995A JP2748892B2 (en) | 1995-06-30 | 1995-06-30 | X-ray diffraction microscope and X-ray diffraction microscope method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18830995A JP2748892B2 (en) | 1995-06-30 | 1995-06-30 | X-ray diffraction microscope and X-ray diffraction microscope method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0915400A JPH0915400A (en) | 1997-01-17 |
| JP2748892B2 true JP2748892B2 (en) | 1998-05-13 |
Family
ID=16221356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18830995A Expired - Lifetime JP2748892B2 (en) | 1995-06-30 | 1995-06-30 | X-ray diffraction microscope and X-ray diffraction microscope method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2748892B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009085767A (en) * | 2007-09-28 | 2009-04-23 | Niigata Univ | Strain measuring apparatus and measuring method by diffraction method |
-
1995
- 1995-06-30 JP JP18830995A patent/JP2748892B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0915400A (en) | 1997-01-17 |
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