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JP2754606B2 - Method and apparatus for evaluating high frequency device - Google Patents
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JP2754606B2 - Method and apparatus for evaluating high frequency device - Google Patents

Method and apparatus for evaluating high frequency device

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Publication number
JP2754606B2
JP2754606B2 JP26648888A JP26648888A JP2754606B2 JP 2754606 B2 JP2754606 B2 JP 2754606B2 JP 26648888 A JP26648888 A JP 26648888A JP 26648888 A JP26648888 A JP 26648888A JP 2754606 B2 JP2754606 B2 JP 2754606B2
Authority
JP
Japan
Prior art keywords
characteristic impedance
signal line
frequency
frequency element
dielectric substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP26648888A
Other languages
Japanese (ja)
Other versions
JPH02112768A (en
Inventor
晃 井上
泰 吉井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP26648888A priority Critical patent/JP2754606B2/en
Publication of JPH02112768A publication Critical patent/JPH02112768A/en
Application granted granted Critical
Publication of JP2754606B2 publication Critical patent/JP2754606B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、高周波素子評価装置に係り、特に、マイ
クロ波帯などの高い周波数帯域における高周波素子の評
価に関するものである。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-frequency device evaluation apparatus, and more particularly to evaluation of a high-frequency device in a high frequency band such as a microwave band.

〔従来の技術〕[Conventional technology]

第3図は、従来の高周波素子評価装置の一例を示す斜
視図である。図において、(1)は、被測定高周波素子
を内蔵したパツケージである。パツケージ(1)よりリ
ード線(4)が出ており、リード線(4)は、パツケー
ジ(1)内部の高周波素子に結線されている。(6)
は、接地導体であり、誘電体基板(2)の裏面は、接地
されている。(3)は、誘電体基板(2)上に設けられ
た信号線路である。(5)は、リード線(4)を押さえ
つけることにより、リード線(4)と信号線路(3)を
接触させる圧接棒である。
FIG. 3 is a perspective view showing an example of a conventional high-frequency element evaluation device. In the figure, (1) is a package incorporating a high-frequency device to be measured. A lead wire (4) protrudes from the package (1), and the lead wire (4) is connected to a high-frequency element inside the package (1). (6)
Is a ground conductor, and the back surface of the dielectric substrate (2) is grounded. (3) is a signal line provided on the dielectric substrate (2). Reference numeral (5) denotes a press-contact rod for pressing the lead wire (4) to bring the lead wire (4) into contact with the signal line (3).

次に動作について説明する。一般にマイクロ波帯の高
周波信号を扱う場合、信号線路(3)は、分布定数線路
として機能する。第3図では、接地導体(6)と信号線
路(3)は、マイクロストリツプ線路を構成しており、
誘電体基板(2)の誘電率をε,基板厚をd,信号線路
(3)の線路幅をWとすると、信号線路(3)の特性イ
ンピーダンスZ0は、Z0(ε,d,W)となつて3変数の関数
になる。高周波素子の評価を行うためには、不要な高周
波信号の反射が生じないように、所望の特性インピーダ
ンス(一般には50Ω)にしなければならない。
Next, the operation will be described. Generally, when handling microwave band high frequency signals, the signal line (3) functions as a distributed constant line. In FIG. 3, the ground conductor (6) and the signal line (3) constitute a microstrip line,
Assuming that the dielectric constant of the dielectric substrate (2) is ε, the substrate thickness is d, and the line width of the signal line (3) is W, the characteristic impedance Z0 of the signal line (3) is Z0 (ε, d, W). This is a function of three variables. In order to evaluate a high-frequency element, it is necessary to set a desired characteristic impedance (generally 50Ω) so that unnecessary reflection of a high-frequency signal does not occur.

一方、圧接棒(5)の材料としては、テフロンなどの
絶縁体を用いるため、圧接棒(5)の誘電率εは空気
中の誘電率εと異なるため、圧接棒(5)により押さ
えられている信号線路(3)の部分(以上第1の部分と
いう)では、 特性インピーダンス Z1=Z1(ε,ε≠εO,d,W) ≠Z0(ε,d,W) となり、第1の部分の特性インピーダンスの不一致に
より、不要な高周波信号の反射が生ずる。
On the other hand, since an insulating material such as Teflon is used as the material of the pressure welding rod (5), the dielectric constant ε A of the pressure welding rod (5) is different from the dielectric constant ε O of air, so that the pressure welding rod (5) is used to hold down. in part (referred to or larger than the first portion) of its dependent signal line (3), the characteristic impedance Z1 = Z1 (ε, ε a ≠ ε O, d, W) ≠ Z0 (ε, d, W) , and the second The mismatch of the characteristic impedance of the portion 1 causes unnecessary reflection of the high-frequency signal.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

従来の高周波素子評価装置は以上のように構成されて
いるので、パツケージのリード線を押さえつけて誘電体
基板上の信号線路に接触させる圧接棒の直下で、信号線
路の特性インピーダンスの不一致が生じ、不要な高周波
信号の反射が起こるため、正確な高周波素子評価ができ
ず、問題があつた。
Since the conventional high-frequency device evaluation device is configured as described above, the characteristic impedance mismatch of the signal line occurs just below the pressure contact rod that presses the lead wire of the package and contacts the signal line on the dielectric substrate, Since unnecessary reflection of high-frequency signals occurs, accurate evaluation of high-frequency elements cannot be performed, which causes a problem.

この発明は、上記のような問題点を解消するためにな
されたもので、圧接棒直下の特性インピーダンスを一致
させ、不要な高周波信号の反射をなくすことを目的とす
る。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-described problems, and has as its object to match the characteristic impedance immediately below a pressure contact rod and eliminate unnecessary reflection of a high-frequency signal.

〔課題を解決するための手段〕[Means for solving the problem]

この発明に係る高周波素子評価装置は、所望の特性イ
ンピーダンスとなる信号線路幅及び誘電体基板厚を定め
て誘電体基板上に形成された信号線路と高周波素子を内
蔵したパツケージのリード線とを、絶縁体である圧接棒
により押さえつけて接触することにより、高周波素子の
評価を行う高周波素子評価装置において、信号線路は圧
接棒直下となる第1の部分と第1の部分以外の第2の部
分を有し、第1の部分は圧接棒で押圧されたときに第1
の部分の特性インピーダンスと第2の部分の特性インピ
ーダンスが等しくなるように、圧接棒による押圧時を除
いて第1の部分の特性インピーダンスと上記第2の部分
の特性インピーダンスとを相違させたものである。
A high-frequency device evaluation apparatus according to the present invention includes a signal line formed on a dielectric substrate by defining a signal line width and a dielectric substrate thickness to have a desired characteristic impedance, and a lead wire of a package incorporating the high-frequency device, In a high-frequency element evaluation device that evaluates a high-frequency element by pressing and contacting with a pressure contact rod that is an insulator, a signal line includes a first portion immediately below the pressure contact rod and a second portion other than the first portion. The first part has a first part when pressed with a pressure rod.
The characteristic impedance of the first part and the characteristic impedance of the second part are different except that the characteristic impedance of the second part is equal to the characteristic impedance of the second part, except at the time of pressing by the pressure contact rod. is there.

さらに信号線路の第1の部分と第2の部分の信号線路
幅を変えることにより第1の部分の特性インピーダンス
と第2の部分の特性インピーダンスとを相違させたもの
である。
Further, the characteristic impedance of the first part and the characteristic impedance of the second part are made different by changing the signal line width of the first part and the second part of the signal line.

またさらに信号線路の第1の部分と第2の部分の誘電
体基板厚を変えることにより第1の部分の特性インピー
ダンスと第2の部分の特性インピーダンスとを相違させ
たものである。
Further, the characteristic impedance of the first portion and the characteristic impedance of the second portion are made different by changing the thickness of the dielectric substrate of the first portion and the second portion of the signal line.

またこの発明に係る高周波素子の評価方法は上記の高
周波素子評価装置のいずれか一つを準備する工程と、こ
の高周波素子評価装置に高周波素子を内蔵したパッケー
ジを装着し、圧接棒を用いて押圧し信号線路の第1の部
分にリード線を接触させ、高周波素子を評価する工程
と、を含むものである。
Further, the method for evaluating a high-frequency element according to the present invention includes a step of preparing any one of the above-described high-frequency element evaluation apparatuses, and mounting a package containing the high-frequency element in the high-frequency element evaluation apparatus and pressing the package using a pressure contact rod. Contacting a lead wire with the first portion of the signal line, and evaluating the high-frequency element.

〔作用〕[Action]

この発明に係る高周波素子評価装置は、信号線路は圧
接棒直下となる第1の部分と第1の部分以外の第2の部
分を有し、第1の部分が圧接棒で押圧されたときに第1
の部分の特性インピーダンスと第2の部分の特性インピ
ーダンスが等しくなるように、圧接棒による押圧時を除
いて第1の部分の特性インピーダンスと第2の部分の特
性インピーダンスとを相違させたので、高周波素子の評
価に際して不要な高周波信号の反射が発生しない。
In the high-frequency element evaluation device according to the present invention, the signal line has a first portion immediately below the pressure contact bar and a second portion other than the first portion, and when the first portion is pressed by the pressure contact bar. First
Since the characteristic impedance of the first part and the characteristic impedance of the second part are made different from each other so that the characteristic impedance of the part and the characteristic impedance of the second part become equal except for the pressing by the press-contact rod, No unnecessary reflection of a high-frequency signal occurs during the evaluation of the device.

またこの発明に係る高周波素子の評価方法は上記の高
周波素子評価装置を準備する工程と、この高周波素子評
価装置により高周波素子を評価する工程とを含むので、
高周波素子の評価に際して不要な高周波信号の反射がな
い。
Further, since the method for evaluating a high-frequency element according to the present invention includes the step of preparing the above-described high-frequency element evaluation apparatus and the step of evaluating the high-frequency element by the high-frequency element evaluation apparatus,
There is no unnecessary reflection of high-frequency signals when evaluating high-frequency elements.

〔実施例〕〔Example〕

以下に、この発明の一実施例を図面について説明す
る。第1図はこの発明の一実施例による高周波素子評価
装置の斜視図である。図において(1)〜(6)は第3
図の従来例に示したものと同等であるので説明は省略す
る。(7)は、圧接棒(5)の誘電率を考慮した信号線
路である。
An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view of a high-frequency device evaluation apparatus according to one embodiment of the present invention. In the figure, (1) to (6) are the third
The description is omitted because it is equivalent to that shown in the conventional example of FIG. (7) is a signal line in consideration of the dielectric constant of the pressure welding rod (5).

次に動作について説明する。信号線路(7)の線路幅
をW、′,信号線路(3)の線路幅をWとした時、 Z1(ε,εA,d,W′)=ZO(ε,d,W) …… となるようにW′を定めている。
Next, the operation will be described. When the line width of the signal line (7) is W and ', and the line width of the signal line (3) is W, Z1 (ε, ε A , d, W ′) = Z O (ε, d, W) W ′ is determined so that

ただし、d,εは誘電体基板(2)のそれぞれの基板厚
及び誘電率であり、Z1は、圧接棒(5)直下の特性イン
ピーダンス、ZOは、それ以外の部分の特性インピーダン
スである。
Here, d and ε are the substrate thickness and dielectric constant of the dielectric substrate (2), Z1 is the characteristic impedance immediately below the pressure welding rod (5), and ZO is the characteristic impedance of other parts.

(1)式のようにしたため、特性インピーダンスは、
信号線路(3)及び圧接棒の誘電率を考慮した信号線路
(7)のどの部分でも同じであり、不要な高周波信号の
反射は生じず、正確な高周波素子評価ができる。
Since the equation (1) is used, the characteristic impedance is
The same applies to any part of the signal line (3) and the signal line (7) in consideration of the permittivity of the press-connecting rod, unnecessary reflection of high-frequency signals does not occur, and accurate high-frequency element evaluation can be performed.

なお、上記実施例では特性インピーダンスを信号線路
(3)の部分で整合させたが、誘電体基板(2)の部分
で行つても良い。
In the above embodiment, the characteristic impedance is matched at the signal line (3), but may be adjusted at the dielectric substrate (2).

第2図はこの発明の他の実施例を示すもので、高周波
素子評価装置を示す斜視図である。図において(1)〜
(6)は第1図に示すものと同等である。(8)は、圧
接棒(5)の誘電率を考慮した誘電体基板であり、その
厚さをd′とした時、 Z1(ε,εA,d′,W)=ZO(ε,d,W) …… となるようにd′を定めている。
FIG. 2 shows another embodiment of the present invention and is a perspective view showing a high-frequency device evaluation apparatus. In the figure, (1) ~
(6) is equivalent to that shown in FIG. (8) is a dielectric substrate in consideration of the dielectric constant of the pressure rod (5), 'when a, Z 1 (ε, ε A , d' the thickness d, W) = Z O ( ε , d, W)... d ′ is determined as follows.

ただし、ε,d,W,Z0,Z1は(1)式と同じ変数を表わ
す。
Here, ε, d, W, Z0, and Z1 represent the same variables as in equation (1).

(2)式のようにしたため、特性インピーダンスは、
信号線路(3)のどの部分でも同じであり、不要な高周
波信号の反射が生じず、正確な高周波素子評価ができ
る。
Because of the equation (2), the characteristic impedance is
The same applies to any part of the signal line (3), and unnecessary high-frequency signal reflection does not occur, and accurate high-frequency element evaluation can be performed.

〔発明の効果〕〔The invention's effect〕

以上のように、この発明に係る高周波素子評価装置
は、信号線路は圧接棒直下となる第1の部分と第1の部
分以外の第2の部分を有し、第1の部分が圧接棒で押圧
されたときに第1の部分の特性インピーダンスと第2の
部分の特性インピーダンスが等しくなるように圧接棒に
よる押圧時を除いて第1の部分の特性インピーダンスと
上記第2の部分の特性インピーダンスとを相違させたの
で、高周波素子の評価に際して不要な高周波信号の反射
が発生せず、またこの発明に係る高周波素子の評価方法
は上記の高周波素子評価装置を準備する工程と、この高
周波素子評価装置により高周波素子を評価する工程とを
含むので、高周波素子の評価に際して不要な高周波信号
の反射がなく、正確な高周波素子評価が可能となる効果
がある。
As described above, in the high-frequency element evaluation device according to the present invention, the signal line has the first portion immediately below the pressure contact bar and the second portion other than the first portion, and the first portion is a pressure contact rod. The characteristic impedance of the first part and the characteristic impedance of the second part are set so that the characteristic impedance of the first part and the characteristic impedance of the second part become equal when pressed. Therefore, unnecessary reflection of a high-frequency signal does not occur during the evaluation of the high-frequency element, and the method for evaluating the high-frequency element according to the present invention includes the steps of preparing the above-described high-frequency element evaluation apparatus; And the step of evaluating the high-frequency element by the method described above. Therefore, there is an effect that unnecessary high-frequency signal reflection is not caused in the evaluation of the high-frequency element and accurate high-frequency element evaluation can be performed.

【図面の簡単な説明】[Brief description of the drawings]

第1図は、この発明の一実施例による高周波素子評価装
置を示す斜視図、第2図は、この発明の他の実施例によ
る高周波素子評価装置を示す斜視図、第3図は従来の高
周波素子評価装置を示す斜視図である。 図において、(1)はパツケージ、(2)は誘電体基
板、(3)は信号線路、(4)はリード線、(5)は圧
接棒、(6)は接地導体、(7)は圧接棒の誘電率を考
慮した信号線路、(8)は圧接棒の誘電率を考慮した誘
電体基板である。 なお、図中同一符号は同一又は相当部分を示す。
FIG. 1 is a perspective view showing a high-frequency device evaluation device according to one embodiment of the present invention, FIG. 2 is a perspective view showing a high-frequency device evaluation device according to another embodiment of the present invention, and FIG. It is a perspective view which shows an element evaluation apparatus. In the figure, (1) is a package, (2) is a dielectric substrate, (3) is a signal line, (4) is a lead wire, (5) is a press-contact rod, (6) is a ground conductor, and (7) is a press-contact. A signal line taking into account the permittivity of the rod, and (8) is a dielectric substrate taking into account the permittivity of the pressure contact rod. In the drawings, the same reference numerals indicate the same or corresponding parts.

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】所望の特性インピーダンスとなる信号線路
幅及び誘電体基板厚を定めて誘電体基板上に形成された
信号線路と高周波素子を内蔵したパッケージのリード線
とを、絶縁体である圧接棒により押さえつけて接触させ
ることにより、上記高周波素子の評価を行う高周波素子
評価装置において、上記信号線路は上記圧接棒直下とな
る第1の部分と上記第1の部分以外の第2の部分を有
し、上記第1の部分が圧接棒で押圧されたときに上記第
1の部分の特性インピーダンスと上記第2の部分の特性
インピーダンスが等しくなるように、圧接棒による押圧
時を除いて上記第1の部分の特性インピーダンスと上記
第2の部分の特性インピーダンスとを相違させたことを
特徴とする高周波素子評価装置。
A signal line formed on a dielectric substrate by defining a signal line width and a dielectric substrate thickness to obtain a desired characteristic impedance, and a lead wire of a package containing a high-frequency element are pressure-welded as an insulator. In the high-frequency device evaluation apparatus for evaluating the high-frequency device by pressing and contacting with a rod, the signal line has a first portion directly below the press-contact bar and a second portion other than the first portion. Then, the first portion except for the pressing by the press-contact bar is set so that the characteristic impedance of the first portion is equal to the characteristic impedance of the second portion when the first portion is pressed by the press-contact bar. The characteristic impedance of the portion is different from the characteristic impedance of the second portion.
【請求項2】信号線路の第1の部分と第2の部分の信号
線路幅を変えることにより第1の部分の特性インピーダ
ンスと上記第2の部分の特性インピーダンスとを相違さ
せたことを特徴とする請求項1記載の高周波素子評価装
置。
2. The characteristic impedance of the first part and the characteristic impedance of the second part are changed by changing the signal line width of the first part and the second part of the signal line. The high-frequency element evaluation device according to claim 1.
【請求項3】信号線路の第1の部分と第2の部分の誘電
体基板厚を変えることにより第1の部分の特性インピー
ダンスと上記第2の部分の特性インピーダンスとを相違
させたことを特徴とする請求項1記載の高周波素子評価
装置。
3. The characteristic impedance of the first part and the characteristic impedance of the second part are changed by changing the thickness of the dielectric substrate of the first part and the second part of the signal line. The high-frequency element evaluation device according to claim 1, wherein
【請求項4】請求項1乃至請求項3のいずれか1項に記
載の高周波素子評価装置を準備する工程と、 この高周波素子評価装置に高周波素子を内蔵したパッケ
ージを装着し、圧接棒を用いて押圧し信号線路の第1の
部分にリード線を接触させ、高周波素子を評価する工程
と、 を含む高周波素子の評価方法。
4. A step of preparing the high-frequency device evaluation device according to claim 1, wherein a package containing a high-frequency device is mounted on the high-frequency device evaluation device, and a pressing rod is used. And pressing the lead wire into contact with the first portion of the signal line to evaluate the high-frequency element.
JP26648888A 1988-10-21 1988-10-21 Method and apparatus for evaluating high frequency device Expired - Lifetime JP2754606B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26648888A JP2754606B2 (en) 1988-10-21 1988-10-21 Method and apparatus for evaluating high frequency device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26648888A JP2754606B2 (en) 1988-10-21 1988-10-21 Method and apparatus for evaluating high frequency device

Publications (2)

Publication Number Publication Date
JPH02112768A JPH02112768A (en) 1990-04-25
JP2754606B2 true JP2754606B2 (en) 1998-05-20

Family

ID=17431628

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26648888A Expired - Lifetime JP2754606B2 (en) 1988-10-21 1988-10-21 Method and apparatus for evaluating high frequency device

Country Status (1)

Country Link
JP (1) JP2754606B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4621414B2 (en) * 2003-03-13 2011-01-26 双信電機株式会社 Antenna measuring apparatus and antenna measuring method

Also Published As

Publication number Publication date
JPH02112768A (en) 1990-04-25

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