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JP2754764B2 - Hybrid integrated circuit - Google Patents
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JP2754764B2 - Hybrid integrated circuit - Google Patents

Hybrid integrated circuit

Info

Publication number
JP2754764B2
JP2754764B2 JP1186736A JP18673689A JP2754764B2 JP 2754764 B2 JP2754764 B2 JP 2754764B2 JP 1186736 A JP1186736 A JP 1186736A JP 18673689 A JP18673689 A JP 18673689A JP 2754764 B2 JP2754764 B2 JP 2754764B2
Authority
JP
Japan
Prior art keywords
conductor layer
insulating substrate
conductor
conductor layers
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1186736A
Other languages
Japanese (ja)
Other versions
JPH0350783A (en
Inventor
和義 上村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP1186736A priority Critical patent/JP2754764B2/en
Publication of JPH0350783A publication Critical patent/JPH0350783A/en
Application granted granted Critical
Publication of JP2754764B2 publication Critical patent/JP2754764B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00Fixed inductances of the signal type
    • H01F17/0006Printed inductances
    • H01F17/0013Printed inductances with stacked layers
    • H01F2017/002Details of via holes for interconnecting the layers

Landscapes

  • Parts Printed On Printed Circuit Boards (AREA)
  • Coils Or Transformers For Communication (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は混成集積回路に関し、特に混成集積回路のイ
ンダクタンス素子の構成に関する。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hybrid integrated circuit, and more particularly to a configuration of an inductance element of a hybrid integrated circuit.

〔従来の技術〕[Conventional technology]

従来の混成集積回路のインダクタンス部は、第3図
(a)に示す平面配置図のように、絶縁基板1の上面あ
るいは下面に形成された導体層11のみで構成されるか、
あるいは、第3図(b)に示す断面図のように、絶縁基
板1の上面あるいは下面に独立に形成された導体層11と
導体層11aとの間に、コイル等のディスクリート部品12
を半田13により接続することにより構成されていた。
The inductance part of the conventional hybrid integrated circuit is composed of only the conductor layer 11 formed on the upper surface or the lower surface of the insulating substrate 1 as shown in the plan view of FIG.
Alternatively, as shown in the sectional view of FIG. 3B, a discrete component 12 such as a coil is provided between a conductor layer 11a and a conductor layer 11a independently formed on the upper or lower surface of the insulating substrate 1.
Are connected by a solder 13.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

上述した従来の混成集積回路のインダクタンス部を導
体層パターンのみで構成する場合、比較的大きなインダ
クタンスを得るためには、パターンの占有面積を広くと
る必要があり、装置の小型化や高集積化を計るうえで不
都合を生じるという欠点がある。
When the inductance portion of the conventional hybrid integrated circuit described above is formed only of the conductor layer pattern, it is necessary to increase the area occupied by the pattern in order to obtain a relatively large inductance. There is a disadvantage that it causes inconvenience in measuring.

また、コイル等のディスクリート部品でインダクタン
ス部を構成する場合には、使用するディスクリート部品
の厚さにより装置の厚さあるいは高さが制限され、装置
の薄型化に不都合を生じるという欠点がある。
Further, when the inductance portion is formed by discrete components such as coils, the thickness or height of the device is limited by the thickness of the discrete component used, and there is a drawback that the thickness of the device is disadvantageously reduced.

〔課題を解決するための手段〕[Means for solving the problem]

本発明の混成集積回路は、絶縁基板の上面に独立に形
成された複数の第1の導体層と少なくとも1つの第2の
導体層があり、絶縁基板には複数のスルーホール(貫通
孔)が形成され、各スルーホールには第3の導体層が形
成され、第1の導体層および第2の導体層がスルーホー
ルに形成された第3の導体層を介して絶縁基板の下面に
形成された第4の導体層に電気的に接続されて構成され
るインダクタンス単位が複数あり、絶縁基板の上面にお
いて複数のインダクタンス単位の第1の導体層および第
2の導体層を金属ワイヤにより必要に応じてボンディン
グすることにより、インダクタンス部を構成している。
The hybrid integrated circuit of the present invention has a plurality of first conductor layers and at least one second conductor layer independently formed on an upper surface of an insulating substrate, and the insulating substrate has a plurality of through holes (through holes). A third conductor layer is formed in each through hole, and a first conductor layer and a second conductor layer are formed on the lower surface of the insulating substrate via the third conductor layer formed in the through hole. There is a plurality of inductance units configured to be electrically connected to the fourth conductor layer, and the first conductor layer and the second conductor layer of the plurality of inductance units are formed on the upper surface of the insulating substrate by metal wires as necessary. Thus, an inductance portion is formed by bonding.

〔実施例〕〔Example〕

次に本発明について図面を参照して説明する。 Next, the present invention will be described with reference to the drawings.

第1図は本発明の第1の実施例の図であり、第1図
(a)は絶縁基板の上面の平面配置図、第1図(b)は
絶縁基板の下面の平面配置図、第1図(c)は第1図
(a),(b)のAA′線における断面図である。
FIG. 1 is a view of a first embodiment of the present invention, FIG. 1 (a) is a plan view of an upper surface of an insulating substrate, FIG. 1 (b) is a plan view of a lower surface of the insulating substrate, FIG. FIG. 1 (c) is a cross-sectional view taken along the line AA 'in FIGS. 1 (a) and 1 (b).

厚さ0.635mmのアルミナ製の絶縁基板1の上面に、膜
厚12μm程度の複数の第1の導体層2,2a,2bと複数の第
2の導体層3,3a,3bとが形成されており、絶縁基板1の
下面には膜厚12μm程度の複数の第4の導体層4,4a,4b
が形成されている。
A plurality of first conductor layers 2, 2a, 2b and a plurality of second conductor layers 3, 3a, 3b each having a thickness of about 12 μm are formed on an upper surface of an alumina insulating substrate 1 having a thickness of 0.635 mm. On the lower surface of the insulating substrate 1, a plurality of fourth conductor layers 4, 4a, 4b having a thickness of about 12 μm are provided.
Are formed.

また、絶縁基板1には、0.3mmφの複数のスルーホー
ル5,5a,5b,6,6a,6b(貫通孔)が形成されており、第1
の導体層2,2a,2bと第4の導体層4,4a,4bおよび第2の導
体層3,3a,3bと第4の導体層4,4a,4bはスルーホール5,5
a,5bおよびスルーホール6,6a,6bの内壁に形成された第
3の導体層7,7a,7bおよび第3の導体層8,8a,8bにより電
気的に導通している。
The insulating substrate 1 has a plurality of through holes 5, 5a, 5b, 6, 6a, 6b (through holes) each having a diameter of 0.3 mm.
Conductor layers 2, 2a, 2b and fourth conductor layers 4, 4a, 4b and second conductor layers 3, 3a, 3b and fourth conductor layers 4, 4a, 4b
Electrical conduction is provided by third conductor layers 7, 7a, 7b and third conductor layers 8, 8a, 8b formed on the inner walls of a, 5b and through holes 6, 6a, 6b.

本実施例では、絶縁基板1の上面において、第1の導
体層2aと第2の導体層3および第1の導体層2bと第2の
導体層3aが30μmφの金線9および金線9aによるボンデ
ィングにより電気的に接続されている。
In this embodiment, on the upper surface of the insulating substrate 1, the first conductor layer 2a and the second conductor layer 3 and the first conductor layer 2b and the second conductor layer 3a are formed by the gold wire 9 and the gold wire 9a having a diameter of 30 μm. They are electrically connected by bonding.

以上の構成により、本実施例では、各導体層を第1の
導体層2,第3の導体層7,第4の導体層4,第3の導体層8,
第2の導体層3,金線9,第1の導体層2a,第3の導体層7a,
第4の導体層4a,第3の導体層8a,第2の導体層3a,金線9
a,第1の導体層2b,第3の導体層7b,第4の導体層4b,第
3の導体層8b,第2の導体層3bの順に接続することによ
り、インダクタンス部を実現している。
With the above configuration, in the present embodiment, each of the conductor layers is defined as the first conductor layer 2, the third conductor layer 7, the fourth conductor layer 4, the third conductor layer 8,
The second conductor layer 3, the gold wire 9, the first conductor layer 2a, the third conductor layer 7a,
Fourth conductor layer 4a, third conductor layer 8a, second conductor layer 3a, gold wire 9
a, the first conductor layer 2b, the third conductor layer 7b, the fourth conductor layer 4b, the third conductor layer 8b, and the second conductor layer 3b are connected in this order to realize an inductance portion. .

第2図は本発明の第2の実施例の図であり、第2図
(a)は絶縁基板の上面の平面配置図、第2図(b)は
第2図(a)のBB′線における断面図である。
FIG. 2 is a view of a second embodiment of the present invention. FIG. 2 (a) is a plan view of the upper surface of the insulating substrate, and FIG. 2 (b) is a line BB 'in FIG. 2 (a). FIG.

本実施例においては、厚さ0.635mmのアルミナ製の絶
縁基板1の上面に、膜厚12μm程度の複数の第1の導体
層2,2a,2bと複数の第2の導体層3,3a,3bとが形成され、
更に、フェライト部材10が樹脂等の接着剤で固定されて
いる。一方、絶縁基板1の下面には膜厚12μm程度の複
数の第4の導体層4,4a,4bが形成されている。
In the present embodiment, a plurality of first conductor layers 2, 2a, 2b and a plurality of second conductor layers 3, 3a, 3b having a thickness of about 12 μm are formed on an upper surface of an insulating substrate 1 made of alumina having a thickness of 0.635 mm. 3b is formed,
Further, the ferrite member 10 is fixed with an adhesive such as a resin. On the other hand, a plurality of fourth conductor layers 4, 4a, 4b each having a thickness of about 12 μm are formed on the lower surface of the insulating substrate 1.

また、絶縁基板1には、0.3mmφの複数のスルーホー
ル5,5a,5b,6,6a,6b(貫通孔)が形成されており、第1
の導体層2,2a,2bと第4の導体層4,4a,4bおよび第2の導
体層3,3a,3bと第4の導体層4,4a,4bはスルーホール5,5
a,5bおよびスルーホール6,6a,6bの内壁に形成された第
3の導体層7,7a,7bおよび第3の導体層8,8a,8bにより電
気的に導通している。
The insulating substrate 1 has a plurality of through holes 5, 5a, 5b, 6, 6a, 6b (through holes) each having a diameter of 0.3 mm.
Conductor layers 2, 2a, 2b and fourth conductor layers 4, 4a, 4b and second conductor layers 3, 3a, 3b and fourth conductor layers 4, 4a, 4b
Electrical conduction is provided by third conductor layers 7, 7a, 7b and third conductor layers 8, 8a, 8b formed on the inner walls of a, 5b and through holes 6, 6a, 6b.

本実施例では、絶縁基板1の上面において、第1の導
体層2aと第2の導体層3および第1の導体層2bと第2の
導体層3aが30μmφの金線9および金線9aによるボンデ
ィングにより電気的に接続されている。
In this embodiment, on the upper surface of the insulating substrate 1, the first conductor layer 2a and the second conductor layer 3 and the first conductor layer 2b and the second conductor layer 3a are formed by the gold wire 9 and the gold wire 9a having a diameter of 30 μm. They are electrically connected by bonding.

以上の構成により、本実施例では、各導体層を第1の
導体層2,第3の導体層7,第4の導体層4,第3の導体層8,
第2の導体層3,金線9,第1の導体層2a,第3の導体層7a,
第4の導体層4a,第3の導体層8a,第2の導体層3a,金線9
a,第1の導体層2b,第3の導体層7b,第4の導体層4b,第
3の導体層8b,第2の導体層3bの順に接続することによ
りコイルが形成され、このコイルとフェライト部材10と
によりインダクタンス部を実現している。
With the above configuration, in the present embodiment, each of the conductor layers is defined as the first conductor layer 2, the third conductor layer 7, the fourth conductor layer 4, the third conductor layer 8,
The second conductor layer 3, the gold wire 9, the first conductor layer 2a, the third conductor layer 7a,
Fourth conductor layer 4a, third conductor layer 8a, second conductor layer 3a, gold wire 9
a, the first conductor layer 2b, the third conductor layer 7b, the fourth conductor layer 4b, the third conductor layer 8b, and the second conductor layer 3b are connected in this order to form a coil. The ferrite member 10 realizes an inductance part.

本実施例のインダクタンス部は、電気回路の発信防止
に用いられるフェライトコア付インダクタンスコイルと
同等の効果を有している。
The inductance part of the present embodiment has the same effect as an inductance coil with a ferrite core used for preventing transmission of an electric circuit.

〔発明の効果〕〔The invention's effect〕

以上説明したように本発明は、絶縁基板の上下両面の
導体パターンと金属ワイヤおよびスルーホール内壁導体
によりインダクタンス回路を構成することにより、従来
例に比較してインダクタンス回路の占有面積を約1/2以
下に減小させることが出来る。
As described above, according to the present invention, the inductance circuit is configured by the conductor patterns on the upper and lower surfaces of the insulating substrate, the metal wires, and the inner wall conductors of the through holes. It can be reduced below.

また、第3図(b)に示したコイル等のディスクリー
ト部材を絶縁基板に実装していた場合に比べ、混成集積
回路から構成される装置の厚さを激減することが可能と
なる。
In addition, the thickness of the device composed of the hybrid integrated circuit can be drastically reduced as compared with the case where the discrete member such as the coil shown in FIG. 3B is mounted on the insulating substrate.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明の第1の実施例の図であり、第1図
(a)は絶縁基板の上面の平面配置図、第1図(b)は
絶縁基板の下面の平面配置図、第1図(c)は第1図
(a),(b)のAA′線における断面図、第2図は本発
明の第2の実施例の図であり、第2図(a)は絶縁基板
の上面の平面配置図、第2図(b)は第2図(a)のB
B′線における断面図、第3図(a)は従来技術の一例
を示す平面配置図、第3図(b)は従来技術の他の例を
示す断面図である。 1……絶縁基板、2,2a,2b……第1の導体層、3,3a,3b…
…第2の導体層、4,4a,4b……第4の導体層、5,5a,5b,
6,6a,6b……スルーホール、7,7a,7b,8,8a,8b……第3の
導体層、9,9a……金線、10……フェライト部材、11,11a
……導体層、12……ディスクリート部材、13……半田。
FIG. 1 is a view of a first embodiment of the present invention, FIG. 1 (a) is a plan view of an upper surface of an insulating substrate, FIG. 1 (b) is a plan view of a lower surface of the insulating substrate, FIG. 1 (c) is a sectional view taken along the line AA 'of FIGS. 1 (a) and 1 (b), FIG. 2 is a view of a second embodiment of the present invention, and FIG. 2 (a) is an insulating substrate. FIG. 2 (b) is a plan view of the upper surface of FIG.
FIG. 3 (a) is a cross-sectional view taken along the line B ', FIG. 3 (a) is a plan view showing an example of the prior art, and FIG. 1 ... insulating substrate, 2, 2a, 2b ... first conductor layer, 3, 3a, 3b ...
… Second conductor layer, 4, 4a, 4b… fourth conductor layer, 5, 5a, 5b,
6, 6a, 6b: Through-hole, 7, 7a, 7b, 8, 8a, 8b: Third conductor layer, 9, 9a: Gold wire, 10: Ferrite member, 11, 11a
... conductor layer, 12 ... discrete member, 13 ... solder.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】絶縁基板の上面および下面に電気回路が構
成され、前記電気回路の一部にインダクタンス部が構成
されている混成集積回路において、前記絶縁基板の前記
上面に複数の第1の導体層と少なくとも1つの第2の導
体層とが独立に形成され、少なくとも1つの前記第1の
導体層と少なくとも1つの前記第2の導体層とは金属ワ
イヤのボンディングにより電気的導通がとられ、前記絶
縁基板に形成された複数のスルーホールと前記スルーホ
ールに形成された第3の導体層と前記絶縁基板の前記下
面に形成された少なくとも1つの第4の導体層とを有
し、少なくとも2つの前記第1の導体層,少なくとも1
つの前記金属ワイヤ,少なくとも1つの前記第2の導体
層,少なくとも2つの前記第3の導体層,少なくとも1
つの前記第4の導体層によりインダクタンス部が構成さ
れることを特徴とする混成集積回路。
1. A hybrid integrated circuit in which an electric circuit is formed on an upper surface and a lower surface of an insulating substrate and an inductance portion is formed on a part of the electric circuit, wherein a plurality of first conductors are provided on the upper surface of the insulating substrate. A layer and at least one second conductor layer are independently formed, and at least one of the first conductor layers and at least one of the second conductor layers are electrically connected by bonding metal wires; A plurality of through-holes formed in the insulating substrate, a third conductive layer formed in the through-hole, and at least one fourth conductive layer formed on the lower surface of the insulating substrate; Two said first conductor layers, at least one
One said metal wire, at least one said second conductor layer, at least two said third conductor layers, at least one
A hybrid integrated circuit, wherein an inductance section is formed by the four fourth conductor layers.
JP1186736A 1989-07-18 1989-07-18 Hybrid integrated circuit Expired - Fee Related JP2754764B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1186736A JP2754764B2 (en) 1989-07-18 1989-07-18 Hybrid integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1186736A JP2754764B2 (en) 1989-07-18 1989-07-18 Hybrid integrated circuit

Publications (2)

Publication Number Publication Date
JPH0350783A JPH0350783A (en) 1991-03-05
JP2754764B2 true JP2754764B2 (en) 1998-05-20

Family

ID=16193751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1186736A Expired - Fee Related JP2754764B2 (en) 1989-07-18 1989-07-18 Hybrid integrated circuit

Country Status (1)

Country Link
JP (1) JP2754764B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110291788A1 (en) * 2010-05-26 2011-12-01 Tyco Electronics Corporation Planar inductor devices
JP2014127512A (en) * 2012-12-25 2014-07-07 Fujitsu Semiconductor Ltd Wiring board, electronic device and manufacturing method for electronic device
JP5897065B2 (en) 2014-05-28 2016-03-30 三菱電機株式会社 Electronic equipment unit

Also Published As

Publication number Publication date
JPH0350783A (en) 1991-03-05

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