JP2760150B2 - Dry thin film processing equipment - Google Patents
Dry thin film processing equipmentInfo
- Publication number
- JP2760150B2 JP2760150B2 JP2324072A JP32407290A JP2760150B2 JP 2760150 B2 JP2760150 B2 JP 2760150B2 JP 2324072 A JP2324072 A JP 2324072A JP 32407290 A JP32407290 A JP 32407290A JP 2760150 B2 JP2760150 B2 JP 2760150B2
- Authority
- JP
- Japan
- Prior art keywords
- waveguide
- microwave
- resonator
- thin film
- film processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、LSI製造装置に代表される半導体製造装
置のなかでとくに低温成膜を必要とする超LSI成膜工程
に用いるECR方式の乾式薄膜加工装置に係り、装置の構
成として、マイクロ波発振器と、マイクロ波導波管と、
片側にマイクロ波の導入口を備え該導入口と対面する他
側にマイクロ波を外方へ散逸させる開口を備えた通過形
共振器を備えてなるマイクロ波立体回路を有し、この通
過形共振器の内部において磁場とマイクロ波の交番電界
との相互作用によって該通過形共振器内に導入されたガ
スをプラズマ化し、このプラズマを用いて基板に膜形成
あるいはエッチングなどの薄膜加工を行う乾式薄膜加工
装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a dry process of an ECR method used in a super LSI film forming process which requires low temperature film forming especially in a semiconductor manufacturing device represented by an LSI manufacturing device. According to the thin film processing apparatus, as a configuration of the apparatus, a microwave oscillator, a microwave waveguide,
A microwave three-dimensional circuit comprising a pass-type resonator having a microwave inlet on one side and an opening for dissipating microwaves on the other side facing the inlet is provided. A dry thin film in which the gas introduced into the through-type resonator is turned into plasma by the interaction between the magnetic field and the alternating electric field of the microwave inside the chamber, and this plasma is used to perform thin film processing such as film formation or etching on the substrate. It relates to a processing device.
低温成膜における膜質の向上を目的としてマイクロ波
と磁場との共鳴効果を用いたECR(電子サイクロトロン
共鳴)プラズマを用いたCVD,エッチング装置が研究され
ている。第9図に示した装置はその一例で、マイクロ波
の導入口3Aと,このマイクロ波導入口3Aと対面する開口
3Bとを備えた通過形共振器(以下単に共振器とも記す)
兼プラズマ生成室3と、開口3Bを介してプラズマ生成室
と連通する処理室5とを真空排気しておき、プラズマ生
成室3へ目的に応じてN2,O2,Ar等のキャリアガス(プラ
ズマ原料ガス)を流したところへマイクロ波をマイクロ
波発振器10から導波管1,マイクロ波導入窓2を介して送
り込む。プラズマ生成室3の外部には励磁ソレノイド6
が配置されプラズマ生成室3の内部にECR条件を満たす
磁場が発生しているとECRプラズマが発生する。このプ
ラズマが処理室5内に押し出され基板台7へ向かう空間
内にシランガスを送り込んでこのガスを上記プラズマに
より活性化すると、発生した活性種の作用により基板8
の表面にシリコン系薄膜が形成される。In order to improve the film quality in low-temperature film formation, a CVD and etching apparatus using ECR (Electron Cyclotron Resonance) plasma using a resonance effect of a microwave and a magnetic field has been studied. The apparatus shown in FIG. 9 is an example of such an apparatus, in which a microwave inlet 3A and an opening facing the microwave inlet 3A are provided.
Pass-through resonator with 3B (hereinafter simply referred to as resonator)
The plasma generation chamber 3 and the processing chamber 5 communicating with the plasma generation chamber through the opening 3B are evacuated and the carrier gas such as N 2 , O 2 , Ar, etc. is supplied to the plasma generation chamber 3 according to the purpose. The microwave is sent from the microwave oscillator 10 through the waveguide 1 and the microwave introduction window 2 to the place where the plasma raw material gas has flowed. An excitation solenoid 6 is provided outside the plasma generation chamber 3.
Is disposed, and a magnetic field that satisfies the ECR condition is generated inside the plasma generation chamber 3, an ECR plasma is generated. When this plasma is extruded into the processing chamber 5 and a silane gas is sent into a space toward the substrate table 7 and the gas is activated by the plasma, the substrate 8 is activated by the generated active species.
A silicon-based thin film is formed on the surface of the substrate.
このようなECRタイプの乾式薄膜加工装置において、
一般に、プラズマ生成室はそれ自体がマイクロ波共振器
を構成し、この共振器にマイクロ波を注入しかつ共振器
内の真空引きを可能にするための手段として、共振器の
マイクロ波導入口3Aをマイクロ波導入窓(以下、窓材と
も記す)2でOリング9を用いて気密に閉鎖する構成が
とられ、このマイクロ波窓材2を保持するハウジング4
を共振器にねじ止め固定することにより窓材2がOリン
グ9に圧着され、共振器3内が大気から気密に封止され
る。また、この共振器3にマイクロ波を導入するための
マイクロ波導波管1は、前記マイクロ波窓材固定用ハウ
ジング4と一体に形成されフランジ4aの支持部を兼ねる
導波管部分1Cと,マイクロ波発振器10側のフランジ10a
の支持部を兼ねる導波管部分1Aと,これらの導波管部分
1C,1Aの中間に位置する導波管部分1Bとを互いにフラン
ジを介して接続した構成を有し、一方、共振器3は、マ
イクロ波導波管と反対側にある処理室5にねじ止め固定
した構成が一般に用いられている。In such ECR type dry thin film processing equipment,
In general, the plasma generation chamber itself constitutes a microwave resonator, and the microwave inlet 3A of the resonator is used as a means for injecting microwaves into the resonator and for evacuating the resonator. A microwave introduction window (hereinafter also referred to as a window material) 2 is hermetically closed using an O-ring 9, and a housing 4 for holding the microwave window material 2.
Is screwed and fixed to the resonator, whereby the window material 2 is press-fitted to the O-ring 9, and the inside of the resonator 3 is hermetically sealed from the atmosphere. A microwave waveguide 1 for introducing microwaves into the resonator 3 includes a waveguide portion 1C formed integrally with the microwave window material fixing housing 4 and also serving as a support portion of the flange 4a, and a microwave waveguide portion 1C. Flange 10a on the side of the wave oscillator 10
Waveguide part 1A, which also serves as a support part, and these waveguide parts
It has a configuration in which a waveguide portion 1B located in the middle of 1C and 1A is connected to each other via a flange, while the resonator 3 is fixed by screwing to a processing chamber 5 on the opposite side of the microwave waveguide. Such a configuration is generally used.
また、マイクロ波立体回路は、第10図の構成によるも
のが一般的に用いられ、マイクロ波発振器10と、マイク
ロ波を1方向にだけ通し負荷からの反射波を吸収するア
イソレータ50,マイクロ波の進行波および反射波をそれ
ぞれの負荷へ向かって送り出す双方向性結合部51,マイ
クロ波発振器10からの進行波を受けて任意の振幅と位相
の反射波をつくり出し負荷からの反射波に重畳させるEH
チューナ52,などの機器と、マイクロ波の進路を曲げ
る,コーナと呼ばれる導波管1Dと、導波管1と、通過形
共振器3とで構成され、マイクロ波発振器と機器,機器
相互間および機器と導波管との結合は、結合部からのマ
イクロ波の洩れを防止するため、すべて、これら回路要
素のマイクロ波進行方向端部に形成されたフランジ55同
志を複数のボルトを用いて締結する剛結合により行われ
ている。A microwave three-dimensional circuit having the configuration shown in FIG. 10 is generally used. The microwave oscillator 10, an isolator 50 that passes microwaves in only one direction and absorbs reflected waves from a load, and a microwave A bidirectional coupling unit 51 that sends a traveling wave and a reflected wave toward respective loads, and an EH that receives a traveling wave from the microwave oscillator 10 and creates a reflected wave of an arbitrary amplitude and phase and superimposes the reflected wave from the load.
A device such as a tuner 52, a waveguide 1D called a corner, which bends the path of microwaves, a waveguide 1, and a pass-type resonator 3 are provided. In order to prevent microwaves from leaking from the joints, the flanges 55 formed at the ends of the circuit elements in the microwave traveling direction are all fastened using a plurality of bolts to prevent microwave leakage from the joints between the equipment and the waveguide. This is done by a rigid connection.
このように構成されるECR型乾式薄膜加工装置(以下
単に装置とも記す)において、基板表面に薄膜を形成す
る際に共振器兼プラズマ生成室内に生成されたプラズマ
により活性化されたソースガス(上述の例ではシランガ
ス)が基板台や処理室内壁,共振器内壁,マイクロ波導
入窓にも付着して薄膜を形成する。この付着した薄膜が
剥離すると、基板に形成された薄膜を汚損するごみを発
生し、基板を多数枚処理して行くうちに膜質が低下した
り、あるいはマイクロ波導入窓の汚れ等によりマイクロ
波の透過状況が変わり、膜厚分布のばらつきが大きくな
るなどの問題が生じるため、装置は定期的な洗浄が必要
である。そして、量産装置では、特に、この洗浄のため
の装置の分解,再組立に必要な時間を可能な限り短縮し
て装置の休止時間を最小限に止めることが生産性向上の
面から極めて重要である。また、再組立時に起こりうる
ねじの締め忘れや、各導波管部分相互の位置ずれ,導波
管部分のマイクロ波導入口との位置ずれ,共振器と励磁
ソレノイドとの軸芯のずれ等による装置性能の低下を防
止して装置性能の再現性を確保することもまた重要であ
る。しかし、従来技術による装置構成では、装置の洗浄
時にまず必要となるマイクロ波導波管の解体のために、
各導波管部分両端部のフランジを締結しているボルト
を、取り外される導波管部分が下方へ落下しないように
支えながら1本ずつ取り外す必要があり、また、取り外
した導波管部分は、後続の装置解体作業に支障を生じな
い位置まで移動させる必要がある。さらに、共振器を取
り外すためには、上述した導波管取り外し作業後に励磁
ソレノイドを下降させ、処理室との固定ボルトを1本ず
つ取り外す必要がある。しかし共振器の重量は10kg以上
あり、落下しないように外すためには二人作業かあるい
は別の取外し治具が必要となり、労力と時間とを必要と
していた。また、再組立時のねじの締め忘れや導波管部
分相互の位置ずれ,導波管部分とマイクロ波導入口との
位置ずれ,共振器と励磁ソレノイドとの軸芯のずれ等に
よる装置性能の低下のおそれが除去されないという問題
があった。In the ECR type dry thin film processing apparatus configured as described above (hereinafter simply referred to as an apparatus), a source gas activated by plasma generated in a resonator / plasma generation chamber when forming a thin film on a substrate surface (described above). In this example, silane gas adheres to the substrate stage, the inner wall of the processing chamber, the inner wall of the resonator, and the microwave introduction window to form a thin film. When the adhered thin film is peeled off, debris that contaminates the thin film formed on the substrate is generated. Since the transmission state changes and problems such as a large variation in the film thickness distribution occur, the apparatus needs to be periodically cleaned. In mass production equipment, it is extremely important to improve the productivity by minimizing the downtime of the equipment by minimizing the time required for disassembling and reassembling the equipment for cleaning. is there. In addition, the device may be caused by forgetting to tighten the screws that may occur at the time of reassembly, misalignment of each waveguide portion, misalignment of the waveguide portion with the microwave introduction port, misalignment of the axis between the resonator and the excitation solenoid, etc. It is also important to prevent performance degradation and ensure reproducibility of device performance. However, in the device configuration according to the prior art, the microwave waveguide that is first required when cleaning the device is required for disassembly.
It is necessary to remove the bolts fastening the flanges at both ends of each waveguide part one by one while supporting the removed waveguide part so as not to fall down. It is necessary to move the device to a position that does not interfere with the subsequent dismantling work. Further, in order to remove the resonator, it is necessary to lower the excitation solenoid after the above-described waveguide removing operation and remove the fixing bolts with the processing chamber one by one. However, the weight of the resonator was 10 kg or more, and removing it so as not to drop it required two-person work or another removal jig, which required labor and time. In addition, degradation of device performance due to forgetting to tighten screws during reassembly, misalignment between waveguide parts, misalignment between waveguide part and microwave inlet, misalignment between resonator and excitation solenoid, etc. However, there is a problem that the fear is not removed.
また、マイクロ波発振器からコーナに到るマイクロ波
立体回路直線部の結合部をすべて剛結合とすると、直線
部が短くコンパクトに構成される反面、メンテナンス作
業時に、対象とする機器だけを取り外そうとしても、少
なくともコーナと,コーナ側の1個または複数の機器と
を取り外してからでないと、対象とする機器を取り外す
ことができず、取外し作業および再組立て作業に労力と
時間とを必要としていた。また、再組立て時の機器相互
間および機器とコーナとの位置ずれによる装置性能の低
下のおそれがあった。Also, if all the joints of the microwave three-dimensional circuit straight line from the microwave oscillator to the corner are rigidly connected, the straight part is short and compact, but only the target equipment will be removed during maintenance work However, the target device cannot be removed unless at least the corner and one or a plurality of devices on the corner side are removed, which requires labor and time for removal and reassembly. . In addition, there is a possibility that the performance of the apparatus may be deteriorated due to a positional deviation between the apparatuses and a corner between the apparatuses during reassembly.
この発明の目的は、マイクロ波導入窓および共振器洗
浄のためのマイクロ波導波管の共振器からの切離しと移
動および処理室からの共振器の切離しと、ならびに洗浄
後の再結合が従来のような労力と時間とを必要とするこ
となく行われるとともに、マイクロ波発振器からコーナ
に到るマイクロ波立体回路の直線範囲を構成する機器等
の回路要素の点検が容易に行われ、かつ装置性能の再現
性確保に問題のないマイクロ波立体回路の構成を提供す
ることである。An object of the present invention is to separate and move a microwave waveguide from a resonator for microwave introduction windows and resonator cleaning, and to separate a resonator from a processing chamber, and to perform recombination after cleaning. It does not require much labor and time, and it is easy to inspect the circuit elements such as the equipment constituting the linear range of the microwave three-dimensional circuit from the microwave oscillator to the corner, and to check the performance of the equipment. An object of the present invention is to provide a configuration of a microwave three-dimensional circuit having no problem in ensuring reproducibility.
上記課題を解決するために、この発明においては、通
過形共振器のマイクロ波導入口から該通過形共振器の外
方へ該導入口の軸線方向に延びるマイクロ波導波管の直
線範囲が長手方向に伸縮可能となるように、マイクロ波
導波管が、前記直線範囲内の適宜の位置で長手方向に抜
き差し可能な,互いに径の異なる通過形共振器側導波管
とマイクロ波発振器側導波管とからなるとともに、該マ
イクロ波発振器側導波管が長手方向に2分割されて該2
分割されたマイクロ波発振器側導波管の通過形共振器側
がマイクロ波発振器側により分割点まわりに旋回可能に
枢支された構成とするものとし、この構成によるマイク
ロ波導波管のより好適な構成として、通過形共振器側導
波管の通過形共振器側端部が、通過形共振器のマイクロ
波導入口を気密に閉鎖する,誘電体からなるマイクロ波
導入窓を保持するハウジングを備えるとともに該ハウジ
ングが通過形共振器のマイクロ波導入口まわりの壁面に
吸着する真空チャックとして形成された構成とするもの
とする。In order to solve the above problems, in the present invention, the linear range of the microwave waveguide extending in the axial direction of the introduction port from the microwave introduction port of the through resonator to the outside of the through resonator extends in the longitudinal direction. The microwave waveguide is provided with a pass-through resonator-side waveguide and a microwave oscillator-side waveguide having different diameters that can be extended and retracted in an appropriate position within the linear range in the longitudinal direction so as to be expandable and contractible. And the microwave-oscillator-side waveguide is divided into two in the longitudinal direction.
The pass-through resonator side of the divided microwave oscillator-side waveguide shall be pivotally supported by the microwave oscillator side around the division point, and a more preferable configuration of the microwave waveguide according to this configuration will be described. A pass-type resonator side end of the pass-type resonator-side waveguide is provided with a housing for holding a microwave introduction window made of a dielectric, which hermetically closes a microwave introduction port of the pass-type resonator. It is assumed that the housing is formed as a vacuum chuck that is adsorbed on the wall around the microwave introduction port of the through-type resonator.
また、導波管がこのように構成される乾式薄膜加工装
置を、通過形共振器内部の磁場を該通過形共振器を励磁
コイルで囲んで形成させる装置構成とするとともに、装
置が、該励磁コイルを軸線方向に移動させるねじ棒を備
えかつ通過形共振器と励磁コイルとを互いに軸線が一致
するように支持するベースプレートと、該ベースプレー
トを上下方向に移動させる上下移動手段とを備え、通過
形共振器と励磁コイルとを前記上下移動手段が載置され
るレールに案内されて水平方向に引き出し可能な装置と
して形成するものとする。In addition, the dry thin film processing apparatus in which the waveguide is configured as described above has an apparatus configuration in which a magnetic field inside the through-type resonator is formed by surrounding the through-type resonator with an exciting coil, and A base plate having a screw rod for moving the coil in the axial direction and supporting the pass-type resonator and the exciting coil so that their axes coincide with each other; and a vertical moving means for moving the base plate in the vertical direction. It is assumed that the resonator and the exciting coil are formed as a device which is guided by a rail on which the vertical moving means is mounted and can be pulled out in the horizontal direction.
また、通過形共振器側マイクロ波導波管の直線範囲が
伸縮可能に形成された装置を、マイクロ波発振器側導波
管の分割点からマイクロ波発振器に到るマイクロ波立体
回路においては、マイクロ波発振器から直線状に延びる
マイクロ波立体回路部分に、長手方向に伸縮可能となる
ように互いに径の異なる導波管を用いて抜き差し可能に
構成された伸縮導波管が直列に介装された装置とすれば
さらに好適である。この場合、通過形共振器側マイクロ
波導波管の直線範囲およびマイクロ波発振器側立体回路
中の直線範囲を構成する,長手方向に抜き差し可能な,
互いに径の異なる導波管中、大口径側導波管の抜差し部
は、導波管端部に、導波管の周壁に沿って導波管を取り
巻く,導波管の長手方向に垂直な面方向の深さがマイク
ロ波の1/4波長の,導波管内側へ開放された断面方形の
溝が形成されたチョーク構造とするのがよい。In addition, a device in which the linear range of the microwave resonator on the side of the pass-through resonator can be expanded and contracted is used in a three-dimensional microwave circuit extending from the dividing point of the waveguide on the microwave oscillator side to the microwave oscillator. A device in which a stretchable waveguide configured to be insertable and retractable using waveguides having different diameters so as to be able to expand and contract in the longitudinal direction is interposed in series with a microwave three-dimensional circuit portion extending linearly from the oscillator. This is more preferable. In this case, the linear range of the microwave waveguide on the side of the pass-type resonator and the linear range of the three-dimensional circuit on the side of the microwave oscillator are included.
In the waveguides having different diameters, the insertion / removal portion of the large-diameter waveguide surrounds the waveguide at the end of the waveguide along the peripheral wall of the waveguide and is perpendicular to the longitudinal direction of the waveguide. It is preferable to use a choke structure in which a rectangular groove having a depth in the plane direction of 1/4 wavelength of the microwave and open to the inside of the waveguide and having a rectangular cross section is formed.
さらに、上記伸縮可能なマイクロ波導波管を備えた装
置において、マイクロ波立体回路を構成する導波管,EH
チューナ等の機器,マイクロ波発振器等回路要素相互間
の結合が、導波管の抜き差し部,マイクロ波発振器側導
波管の分割点および通過形共振器と導波管端部のハウジ
ングとの結合部を除き、回路要素本体のマイクロ波進行
方向端部に面方向をマイクロ波進行方向と垂直にして円
板状に形成され該円板の回路要素本体側周縁が円錐状に
形成されたフランジと、円弧状に形成され該円弧の内周
側に円弧の全長で前記フランジの円錐面とほぼ密に側壁
で接触する,両側へ開いた三角溝もしくは梯形溝が形成
された2個のアームと,該2個のアームを円弧の内周側
を対向させて同側端部で枢支する結合片と,該2個のア
ームの他側端部同志を締め合わせる締結部材とからなる
クイックカップリングとを用いて行われるようにすれば
好適である。Further, in the device provided with the extendable microwave waveguide, the waveguide constituting the microwave three-dimensional circuit, EH
The coupling between the components such as the tuner and the circuit elements such as the microwave oscillator is determined by the insertion / removal part of the waveguide, the division point of the waveguide on the microwave oscillator side, and the coupling between the through resonator and the housing at the end of the waveguide. Except for the flange, the peripheral edge of the circuit element body is formed in a disc shape with the surface direction perpendicular to the microwave traveling direction at the end of the microwave traveling direction of the circuit element body, and the peripheral edge of the circuit element body side of the disc is formed in a conical shape. Two arms formed in an arc shape and formed on the inner peripheral side of the arc with a triangular groove or a trapezoidal groove which is open on both sides and which is in full contact with the conical surface of the flange on the side wall with the entire length of the arc; A quick coupling comprising a connecting piece for pivotally supporting the two arms at the same ends with the inner peripheral side of the arc facing each other, and a fastening member for fastening the other ends of the two arms to each other; It is preferable that the processing be performed using
この発明は、定期的あるいは臨時に行われる洗浄ある
いは部品交換のための装置の解体,再組立時間に占める
マイクロ波導波管の解体,移動時間の割合が無視できな
いほどに大きいにもかかわらず、マイクロ波導波管がそ
れぞれ両端部にフランジを有する部分導波管をボルトで
互いに結合して構成される,極めて簡単な構造のため、
解体や移動時間短縮の対象となることなく看過されてい
た点に着目したものである。しかし、マイクロ波導波管
を前述のように構成すれば、2分割されたマイクロ波発
振器側導波管の通過形共振器側は、分割点まわり水平面
内で旋回可能に枢支されるから、マイクロ波導入窓を保
持しているハウジングが従来と同様に共振器にボルトで
固定される構造とした場合にも、2分割されたマイクロ
波発振器側導波管の,重量の大きい通過形共振器側を支
えることなくボルトを取り外すことができ、また、ボル
トを取り外した後、前記ハウジングを端部に備えた通過
形共振器側導波管をマイクロ波発振器側導波管内へスラ
イドさせて導波管の共振器側直線範囲の長さを短縮して
励磁ソレノイドに接触しないように前記2分割されたマ
イクロ波発振器側導波管の共振器側を水平面内で旋回さ
せることができ、従来の,導波管の分解,移動,再移
動,再組立作業に相当した作業を作業員1人で極めて容
易にかつ短時間に行うことができる。さらに、マイクロ
波導入窓を保持するハウジングを真空チャックとして構
成することにより、ハウジングの共振器からの分離は、
共振器内を大気圧に戻した後、真空チャックの吸着面前
面側の真空引きを停止するのみで可能となり、分離に必
要とする時間がさらに短縮される。また、分離されたハ
ウジングの共振器への再取付けも、真空チャックの吸着
面前面側の空気を真空掃除器のように吸い出しながらハ
ウジングを手で支えて共振器のマイクロ波導入口に近接
させ、マイクロ波導入窓をマイクロ波導入口まわりのシ
ール材に接触させるのみで行われ、取付け作業が短時間
に完了する。The present invention is directed to a micro-decomposition system in which the ratio of the time taken to disassemble and move the microwave waveguide to the time required for disassembly and reassembly for cleaning or replacement of parts regularly or occasionally is not negligible. Wave waveguides are constructed by connecting partial waveguides with flanges at both ends to each other with bolts.
It focuses on points that were overlooked without being subject to dismantling or moving time reduction. However, if the microwave waveguide is configured as described above, the pass-through resonator side of the microwave oscillator-side waveguide divided into two is pivotally supported around a division point in a horizontal plane, so Even in the case where the housing holding the wave introduction window is fixed to the resonator with bolts in the same manner as in the conventional case, the side of the microwave-oscillator-side waveguide divided into two, on the side of the heavier pass-type resonator, The bolt can be removed without supporting it, and after the bolt is removed, the waveguide on the side of the pass-type resonator provided with the housing at the end is slid into the waveguide on the microwave oscillator side. The length of the resonator-side linear range can be shortened so that the resonator side of the two-divided microwave oscillator-side waveguide can be swung in a horizontal plane so as not to come into contact with the excitation solenoid. Disassembly and movement of waveguide Re move the work corresponding to the re-assembling operation can be carried out very easily and in a short time in workers alone. Furthermore, by configuring the housing holding the microwave introduction window as a vacuum chuck, the separation of the housing from the resonator is
After the inside of the resonator is returned to the atmospheric pressure, it becomes possible only by stopping the evacuation of the front surface side of the suction surface of the vacuum chuck, and the time required for separation is further reduced. Also, when re-attaching the detached housing to the resonator, the air on the front side of the suction surface of the vacuum chuck is sucked out like a vacuum cleaner, and the housing is supported by hand and brought close to the microwave inlet of the resonator, It is performed only by bringing the wave introduction window into contact with the sealing material around the microwave introduction port, and the mounting operation is completed in a short time.
一方、共振器の取外し作業は、共振器が励磁コイルと
ともに共通のベースプレートにより支持されているた
め、このベースプレートを上下移動手段を操作して下降
させた後、上下移動手段が載置されているレール上を上
下移動手段とともに水平方向に移動させることにより行
われる。また、共振器と処理室との再組立は、取り外さ
れた共振器を上下移動手段とともにレール上を移動させ
て処理室の直下へもたらし、上下移動手段を操作してベ
ースプレートを上昇させることにより行われる。共振器
はベースプレートにより支持されているから、上下移動
手段によりベースプレートを介して共振器の接合面を処
理室の接合面にシール材を変形させつつ押圧状態に当接
させることにより、ボルト等の締結部材を用いることな
く気密に組立状態を維持することができ、共振器の取外
し,再組立に要する時間が大幅に短縮される。また、共
振器取り外し時のベースプレートの下降量は、処理室の
接合面に植設された,処理室と共振器との軸芯合わせの
ための位置決めピンの高さをかわすことができるだけの
小さい量でよく、上下移動手段は、装置の軸線方向にさ
ほど高さを必要とせず、装置を大型化することなく、共
振器の取外し,再組立を簡易に行うことができる。ま
た、ベースプレートは、共振器と励磁コイルとを互いに
軸線が一致するように支持しているから、再組立後も両
者の軸線のずれが生じる恐れはない。On the other hand, since the resonator is supported by a common base plate together with the exciting coil, the resonator is removed by operating the vertical moving means, and then the rail on which the vertical moving means is placed is mounted. This is performed by moving the upper part in the horizontal direction together with the vertical moving means. Reassembly of the resonator and the processing chamber is performed by moving the removed resonator on the rail together with the vertical moving means to bring it directly below the processing chamber, and operating the vertical moving means to raise the base plate. Will be Since the resonator is supported by the base plate, the joining surface of the resonator is brought into contact with the joining surface of the processing chamber in a pressed state while deforming the sealing material to the joining surface of the processing chamber through the base plate by means of the up and down moving means, thereby fastening bolts and the like. The assembly state can be maintained in an airtight manner without using any members, and the time required for removing and reassembling the resonator is greatly reduced. Also, the amount of lowering of the base plate when the resonator is removed should be small enough to avoid the height of the positioning pin implanted on the joint surface of the processing chamber and for aligning the axis of the processing chamber and the resonator. The vertical moving means does not require much height in the axial direction of the device, and can easily remove and reassemble the resonator without increasing the size of the device. Further, since the base plate supports the resonator and the exciting coil so that their axes are aligned with each other, there is no possibility that the axes of both will be shifted after reassembly.
また、通過形共振器共振器側マイクロ波導波管の直線
範囲が伸縮可能に形成された装置を、マイクロ波発振器
側導波管の分割点からマイクロ波発振器に到るマイクロ
波立体回路においては、マイクロ波発振器から直線状に
延びるマイクロ波立体回路部分に、長手方向に伸縮可能
となるように互いに径の異なる導波管を用いて抜き差し
可能に構成された伸縮導波管が直列に介装された装置と
すれば、互いに径の異なる導波管を長手方向に相対的に
スライドさせることにより、直線状のマイクロ波立体回
路を構成する回路要素中、対象とする回路要素のみを、
他の回路要素をマイクロ波立体回路から取り外すことな
く容易に取り外すことができ、また再取付けも容易にな
る。In addition, a device in which the linear range of the pass-through resonator resonator-side microwave waveguide is formed to be expandable and contractible is used in a microwave three-dimensional circuit extending from the division point of the microwave oscillator-side waveguide to the microwave oscillator. In the microwave three-dimensional circuit portion extending linearly from the microwave oscillator, a stretchable waveguide configured to be insertable and removable using waveguides having different diameters so as to be able to expand and contract in the longitudinal direction is interposed in series. In the case of the device, by sliding the waveguides having different diameters relative to each other in the longitudinal direction, of the circuit elements constituting the linear microwave three-dimensional circuit, only the circuit element of interest,
Other circuit elements can be easily removed without removing them from the microwave three-dimensional circuit, and re-attachment becomes easy.
この場合、通過形共振器側マイクロ波導波管の直線範
囲およびマイクロ波発振器側立体回路中の直線範囲を構
成する,長手方向に抜き差し可能な,互いに径の異なる
導波管中、大口径側導波管の抜差し部を、導波管端部
に、導波管の周壁に沿って導波管を取り巻く、導波管の
長手方向に垂直な面方向の深さがマイクロ波の1/4波長
の、導波管内側へ開放された断面方形の溝が形成された
チョーク構造とすれば、両導波管の嵌合い部の隙間に入
り込んだマイクロ波は、隙間の大きさに比べて幅が顕著
に大きい溝内へ、隙間と溝幅との比にほぼ比例した量入
り込み、マイクロ波の1/4波長の深さの溝の底面で反射
して、1/2波長おくれて溝の入口に到達する,到達瞬時
の位相が前記反射波と逆位相のマイクロ波に重畳され、
両導波管の隙間に入り込んだマイクロ波の大部分を打ち
消し、残りわずかの部分が、大口径側導波管の抜差し部
端面に両導波管の隙間を塞ぐように設けられるリング状
の導電性シールド材を温度上昇させるに過ぎず、従っ
て、両導波管の隙間を導波管の製作上容易に可能な範囲
に抑えることによりシールド材の温度上昇が抑えられ、
シールド材はその弾性度を減じることなくマイクロ波の
洩れ防止機能を維持することができ、抜き差しによる相
対移動可能な結合構造にもかかわらず、マイクロ波の伝
達効率の低下を防止することができる。また、マイクロ
波立体回路を構成する導波管,EHチューナ等の機器,マ
イクロ波発振器等回路要素相互間の結合を、導波管の抜
差し部,マイクロ波発振器側導波管の分割点および通過
形共振器と導波管端部のハウジングとの結合部を除き、
クィックカップリングを用いたフランジ結合とすること
により、フランジ結合の解除および再結合が1個の締結
部材の取付け,取外しにより行われ、回路要素のマイク
ロ波立体回路からの取外し,再取付けを迅速に行うこと
ができる。加えて、再取付け時の両フランジの芯ずれ
が、両フランジの円錐面と円弧状アームの三角溝もしく
は梯形溝側壁との接触によって生じる自動調芯作用によ
り締結部材の締結行程とともに矯正され、フランジ結合
に起因する装置性能の低下が防止される。In this case, the linear range of the pass-through-type resonator-side microwave waveguide and the linear range of the microwave-oscillator-side three-dimensional circuit are included. The insertion / removal part of the waveguide, at the end of the waveguide, surrounding the waveguide along the peripheral wall of the waveguide, the depth in the plane direction perpendicular to the longitudinal direction of the waveguide is 1/4 wavelength of microwave However, if the choke structure is formed with a rectangular cross-section groove open to the inside of the waveguide, the microwave that enters the gap between the fitting portions of both waveguides has a width that is smaller than the size of the gap. An amount that is approximately proportional to the ratio of the gap to the groove width enters the remarkably large groove, is reflected by the bottom of the groove at a depth of 1/4 wavelength of microwave, and is shifted by 1/2 wavelength to the entrance of the groove. The phase of the arrival and arrival is superimposed on the microwave having the opposite phase to the reflected wave,
A ring-shaped conductor provided to close the gap between the two waveguides at the end face of the insertion / removal part of the large-diameter side waveguide by canceling out most of the microwaves entering the gap between the two waveguides. The temperature rise of the shield material is suppressed only by increasing the temperature of the conductive shield material, and therefore, by suppressing the gap between the two waveguides to a range that can be easily manufactured in the waveguide, the temperature rise of the shield material is suppressed,
The shield material can maintain the function of preventing microwave leakage without reducing its elasticity, and can prevent a decrease in microwave transmission efficiency despite the relatively movable coupling structure due to insertion and removal. In addition, the coupling between circuit elements such as waveguides, EH tuners, etc., which constitute a microwave three-dimensional circuit, microwave oscillators, etc., is connected to the insertion / removal part of the waveguide, the split point of the waveguide on the microwave oscillator side, and the passage. Except for the joint between the resonator and the housing at the end of the waveguide,
By using the flange coupling using the quick coupling, the release and reconnection of the flange connection are performed by attaching and detaching one fastening member, and the detachment and reattachment of the circuit element from the microwave three-dimensional circuit can be quickly performed. It can be carried out. In addition, the misalignment of the two flanges at the time of reattachment is corrected together with the fastening process of the fastening member by the self-aligning action caused by the contact between the conical surfaces of the two flanges and the triangular groove or the trapezoidal groove side wall of the arc-shaped arm. A decrease in device performance due to the coupling is prevented.
このように、本発明によれば、従来のマイクロ波導波
管および共振器の解体,移動,再移動,再組立作業に相
当した作業に要する時間が大幅に短縮され、また、マイ
クロ波発振器から直線状に延びるマイクロ波立体回路部
分を構成する回路要素の取付け,取外しも容易で、特に
量産装置の休止期間短縮に基づく生産性向上の効果が著
しい。しかも、これらの作業は導波管を解体することな
く行われるため、導波管相互のボルトの締め忘れや位置
ずれが生せず、また、クィックカンプリングを用いたフ
ランジ結合部では、クィックカンプリングの持つ自動調
芯作用により、両フランジの芯ずれが矯正される。ま
た、共振器と励磁コイルとの位置ずれも、共振器と励磁
コイルとが共通のベースプレートに互いに軸線が一致す
るように支持されているために生ぜず、装置の生産性向
上とともに装置性能の再現性確保が同時に可能になる。As described above, according to the present invention, the time required for the operations corresponding to the disassembly, movement, re-movement, and re-assembly operations of the conventional microwave waveguide and resonator is greatly reduced, and the linear movement from the microwave oscillator is reduced. The circuit elements constituting the microwave three-dimensional circuit part extending in the shape can be easily attached and detached, and the effect of improving the productivity based on shortening the downtime of the mass production apparatus is remarkable. In addition, since these operations are performed without dismantling the waveguide, there is no forgetting to tighten bolts or misalignment between the waveguides, and the quick coupling is not used in the flange coupling portion using the quick coupling. The self-aligning action of the ring corrects the misalignment of both flanges. In addition, there is no displacement between the resonator and the excitation coil because the resonator and the excitation coil are supported on a common base plate so that their axes coincide with each other. Can be secured at the same time.
第1図に本発明による乾式薄膜加工装置構成の第1の
実施例を示す。第2図は第1図におけるA部の詳細図、
第3図は第1図のB−B線に沿う断面を示す。これらの
図において、第9図に対応する同一部材には同じ符号が
付してある。FIG. 1 shows a first embodiment of the configuration of a dry thin film processing apparatus according to the present invention. FIG. 2 is a detailed view of a portion A in FIG. 1,
FIG. 3 shows a cross section along the line BB of FIG. In these figures, the same members corresponding to FIG. 9 are denoted by the same reference numerals.
本発明によるマイクロ波導波管は、第1図に示すよう
に、共振器3との接合端にハウジング14を備えた導波管
部分11Cと、この導波管部分11Cと抜き差し可能となるよ
うに導波管部分11Cよりも大口径に形成された導波管部
分11Bと、この導波管部分11Bとヒンジ結合される,マイ
クロ波発振器側の導波管部分11Aとで構成されている。
また、ハウジング14は真空チャックとして構成され、共
振器3のマイクロ波導入口3Aまわりの壁面に吸着する吸
着面には、第2図に示すように、内部の空気が真空引き
されるリング状の溝14aと、この溝14aの内側と外側とに
Oリングなどのシール材が嵌め込まれるリング状の溝14
b,14cが形成されている。溝14aと、真空ポンプを備えた
真空源15との間は可撓管で接続されている。As shown in FIG. 1, the microwave waveguide according to the present invention has a waveguide portion 11C provided with a housing 14 at the joint end with the resonator 3, and can be inserted into and removed from the waveguide portion 11C. It is composed of a waveguide portion 11B formed to have a larger diameter than the waveguide portion 11C, and a waveguide portion 11A on the microwave oscillator side, which is hinged to the waveguide portion 11B.
The housing 14 is formed as a vacuum chuck, and has a ring-shaped groove on the suction surface of the resonator 3 on which the air is evacuated, as shown in FIG. 14a and a ring-shaped groove 14 into which a sealing material such as an O-ring is fitted inside and outside the groove 14a.
b, 14c are formed. The groove 14a and the vacuum source 15 having a vacuum pump are connected by a flexible tube.
導波管部分11Cと導波管部分11Bとの抜き差し部では、
この実施例では、大口径の導波管部分11Bの内側に形成
されたリング状の溝内にシールド材10(第2図)が埋め
込まれ、マイクロ波の導波管外部への洩れを防止してい
る。シールド材10には、細い金属線を柔らかく編んだ編
組導体が用いられ、導波管部分11C,11Bが互いに偏心し
ていても両者がシールド材を介して全周で電気的に接触
するようにしている。In the insertion and removal part of the waveguide part 11C and the waveguide part 11B,
In this embodiment, a shield material 10 (FIG. 2) is embedded in a ring-shaped groove formed inside a large-diameter waveguide portion 11B to prevent microwaves from leaking outside the waveguide. ing. For the shield material 10, a braided conductor made by softly knitting a thin metal wire is used, and even if the waveguide portions 11C and 11B are eccentric to each other, they are electrically connected all around via the shield material. I have.
他方、導波管部分11Bと導波管部分11Aとの常時の接続
は、第3図に示すように、部材19,20,21を用いてヒンジ
結合されたフランジ17,16の対向面を固定ねじ18で当接
させることにより行われる。装置の洗浄時には、固定ね
じ18を取り外して一点鎖線のように導波管部分11Bをピ
ン21まわりに水平面内で旋回させる。ここで、フランジ
17,16の対向面は、固定ねじ18で当接させられた状態
で、ピン21側に工作精度上不可避なすき間を生じ、この
すき間からマイクロ波が洩れるため、この洩れを防止す
るために、それぞれの対向面に対向面の最大すき間の数
倍程度の深さをもつリング状の溝が形成されている。On the other hand, the constant connection between the waveguide portion 11B and the waveguide portion 11A is achieved by fixing the opposing surfaces of the hinged flanges 17, 16 using members 19, 20, 21 as shown in FIG. This is performed by making contact with the screw 18. At the time of cleaning the device, the fixing screw 18 is removed, and the waveguide portion 11B is turned around the pin 21 in a horizontal plane as indicated by a chain line. Where the flange
In the state where the opposing surfaces 17 and 16 are abutted by the fixing screw 18, a gap is generated on the pin 21 side that is inevitable in terms of machining accuracy, and microwaves leak from the gap, so in order to prevent this leakage, A ring-shaped groove having a depth about several times the maximum gap of the facing surface is formed in each facing surface.
マイクロ波導波管がこのように構成されたECR型乾式
薄膜加工装置におけるマイクロ波導入窓2および共振器
3の洗浄もしくは新品との交換のためのメンテナンス作
業は次のように行われる。まず、処理室5と共振器3と
の内部空間を大気状態に戻す。次に真空源15に内蔵され
ている電磁弁を操作してハウジング14の溝14a(第2
図)を大気に連通させるとともに真空源15の運転を停止
させ、ハウジング14と窓材2とを一緒に導波管部分11B
を案内として下降させる。下降終了後、導波管部分11B,
11A(第3図)のフランジを当接状態に保持している固
定ねじ18を取り外し、導波管部分11Bを導波管部分11Cと
ともに励磁ソレノイド6の外側までピン21まわりに水平
に旋回させると、窓材2を容易に取り出すことができ
る。Maintenance work for cleaning or replacing the microwave introduction window 2 and the resonator 3 with a new one in the ECR type dry thin film processing apparatus having the microwave waveguide configured as described above is performed as follows. First, the internal space between the processing chamber 5 and the resonator 3 is returned to the atmospheric state. Next, the groove 14a of the housing 14 (the second
(Fig. 1) is communicated with the atmosphere, the operation of the vacuum source 15 is stopped, and the housing 14 and the window material 2 are joined together to form the waveguide section 11B.
Is lowered as a guide. After the descent, the waveguide portion 11B,
When the fixing screw 18 holding the flange of 11A (FIG. 3) in a contact state is removed, the waveguide portion 11B is horizontally turned around the pin 21 to the outside of the excitation solenoid 6 together with the waveguide portion 11C. The window member 2 can be easily taken out.
第4図に本発明の第2の実施例を示す。この実施例
は、第1図に示した,本発明の一実施例による構成のマ
イクロ波導波管を備えた装置を対象とした本発明の一実
施例を示す。図において、第1図と同一の部材には同一
符号を付して説明を省略する。FIG. 4 shows a second embodiment of the present invention. This embodiment shows an embodiment of the present invention which is directed to an apparatus provided with the microwave waveguide having the configuration according to the embodiment of the present invention shown in FIG. In the figure, the same members as those in FIG.
共振器3と励磁コイル6とを支持するベースプレート
25には、中央部に共振器3の胴部の外径とほぼ等しい内
径の孔が形成され、この孔を囲むピッチ円上に複数の位
置決めピン27Bが植設されている。一方、共振器3の上
端面の外周縁から半径方向外方へ延びるフランジの下面
には、共振器3の軸線位置を中心とする,前記位置決め
ピン27Bのピッチ円と同径のピッチ円上に、位置決めピ
ン27Bがほぼ静合状態に嵌入される座ぐり穴が形成さ
れ、共振器3は位置決めピン27Bを介してベースプレー
ト25により支持される。ベースプレート25には、さら
に、位置決めピン25Bのピッチ円の外側の,該ピッチ円
と同心のピッチ円上に中心を有する孔が複数形成され、
この孔にねじ棒29を軸まわり回転自在に支える軸受け30
が圧入されている。このねじ棒29は、励磁コイル6が取
り付けられるフランジ32のボス32aに形成されためねじ
にねじ込まれ、複数のねじ棒29のうち、いずれか1つを
回転操作することにより、この回転がベルト31を介して
他のねじ棒に伝達され、これらねじ棒の同時回転によ
り、励磁コイル6が軸線方向に移動して共振器3との最
適相対位置に到達する。なお、励磁コイル6はその軸線
が位置決めピン27Bのピッチ円の軸線と一致するように
フランジ32に取り付けられる。Base plate supporting resonator 3 and exciting coil 6
A hole having an inner diameter substantially equal to the outer diameter of the body of the resonator 3 is formed in the center of the hole 25, and a plurality of positioning pins 27B are implanted on a pitch circle surrounding the hole. On the other hand, on the lower surface of the flange extending radially outward from the outer peripheral edge of the upper end surface of the resonator 3, a pitch circle centered on the axial position of the resonator 3 and having the same diameter as the pitch circle of the positioning pins 27B is provided. A counterbore hole into which the positioning pin 27B is fitted in a substantially static state is formed, and the resonator 3 is supported by the base plate 25 via the positioning pin 27B. In the base plate 25, a plurality of holes having a center on a pitch circle concentric with the pitch circle outside the pitch circle of the positioning pins 25B are further formed,
A bearing 30 that supports a screw rod 29 in this hole so that it can rotate around its axis.
Is press-fitted. The screw rod 29 is formed on the boss 32a of the flange 32 to which the exciting coil 6 is attached, and is screwed into the screw. When one of the plurality of screw rods 29 is rotated, the rotation is performed by the belt 31. Are transmitted to the other screw rods via the shaft, and the simultaneous rotation of these screw rods causes the exciting coil 6 to move in the axial direction to reach the optimum relative position with respect to the resonator 3. The exciting coil 6 is attached to the flange 32 such that its axis coincides with the axis of the pitch circle of the positioning pin 27B.
このようにして共振器3と励磁コイル6とを支持する
ベースプレート25は、電動機と減速機構とからなる駆動
機構26Aにより、ベルト33を介して回転駆動されるねじ
棒34の回転により上下動する駆動プレート35上に立設さ
れた支柱36を介して上下方向に駆動される。これら駆動
機構26A,ベルト33,ねじ棒34,駆動プレート35を備えてな
る上下移動手段26は、基板37の下面にスライドピース38
を備え、直線スライドレール28に案内されて水平方向に
移動することができる。The base plate 25 supporting the resonator 3 and the exciting coil 6 in this manner is driven by a drive mechanism 26A including an electric motor and a speed reduction mechanism to move up and down by the rotation of a screw rod 34 that is rotationally driven via a belt 33. It is driven up and down via a column 36 erected on a plate 35. The vertical movement means 26 including the drive mechanism 26A, the belt 33, the screw rod 34, and the drive plate 35 is provided with a slide piece 38 on the lower surface of the substrate 37.
, And can be moved in the horizontal direction by being guided by the linear slide rail 28.
共振器3を、装置上方の架台に固定された処理室5か
ら取り外す際には、導波管部分11A,11B,11Cからなる導
波管を共振器3から切り離した後、上下移動手段の駆動
機構26Aでねじ棒34を回転駆動して駆動プレート35を下
降させ、支柱36,ベースプレート25を介して共振器3を
励磁コイル6とともに下降させる。共振器3の上面が、
処理室5の下面に植設された位置決めピン27Aの突出高
さをかわせる量だけ下降したら、駆動機構26Aの電源を
切って下降駆動を停止し、上下移動手段を共振器3,励磁
コイル6を搭載した状態で直線スライドレール28上を水
平方向に滑らせる。When removing the resonator 3 from the processing chamber 5 fixed to the pedestal above the apparatus, the waveguide composed of the waveguide portions 11A, 11B, and 11C is separated from the resonator 3, and then the drive of the vertical moving means is performed. The screw rod 34 is rotationally driven by the mechanism 26A to lower the drive plate 35, and the resonator 3 is lowered together with the exciting coil 6 via the support 36 and the base plate 25. The upper surface of the resonator 3
When the positioning pin 27A implanted on the lower surface of the processing chamber 5 has been lowered by an amount that allows the projecting height to be changed, the power of the driving mechanism 26A is turned off and the lowering drive is stopped. The slider is slid in a horizontal direction on the linear slide rail 28 in a mounted state.
共振器3の再組立は上述と逆の順序で行う。再組立
中、共振器3と励磁コイル6とは共通のベースプレート
25に同軸状態を保持して支持されているから、再組立時
に両者の位置ずれは生じない。そして、共振器3はベー
スプレート25により支持されているから、上下移動機構
によりベースプレート25を上昇させて共振器3の上面で
Oリング9を圧縮変形させつつ該上面を押圧状態に処理
室5の下面に当接させることにより、ボルト等による締
結作業を必要とすることなく再組立が短時間に完了す
る。つづいて導波管11(第1図)を共振器3に結合する
ことにより、処理室5より下方の再組立が作業者1人の
手で短時間にすべて完了する。Reassembly of the resonator 3 is performed in the reverse order. During reassembly, the resonator 3 and the exciting coil 6 share a common base plate.
Since they are supported coaxially with 25, they do not shift during reassembly. Since the resonator 3 is supported by the base plate 25, the base plate 25 is raised by a vertical movement mechanism to compress and deform the O-ring 9 on the upper surface of the resonator 3 while pressing the upper surface to a lower surface of the processing chamber 5. , The reassembly is completed in a short time without the need for a fastening operation using bolts or the like. Then, by coupling the waveguide 11 (FIG. 1) to the resonator 3, the reassembly below the processing chamber 5 can be completed by one operator in a short time.
第5図に第1図A部の,第2図とは別の拡大図を、ま
た第6図に第5図D部の拡大図を示す。第6図の拡大図
に示すように、大口径側導波管すなわち導波管部分11B
の端部に、深さがマイクロ波の1/4波長の,導波管部分1
1Bの周壁に沿う形状のリング状溝12aが形成されたチョ
ーク構造の袋フランジ12が接合されている。そして、袋
フランジ12の上面には、細かい金属線を柔らかく編んだ
編組導体からなるリング状シールド13aが、導波管部分1
1Cの外周全周に当るように押え金具13で押さえ込まれて
いる。大口径側導波管端部をこのように構成することに
より、両導波管の嵌合い部の隙間に入り込んだマイクロ
波は、隙間の大きさに比べて幅が顕著に大きい溝内へ、
隙間と溝幅との比にほぼ比例した量入り込み、マイクロ
波の1/4波長の深さの溝の底面で反射して、1/2波長おく
れて溝の入口に到達する,到達瞬時の位相が前記反射波
と逆位相のマイクロ波に重畳され、両導波管の隙間に入
り込んだマイクロ波の大部分を打ち消し、残りわずかの
部分が、リング状シールド13aを温度上昇させるに過ぎ
ず、従って第2図に示すマイクロ波洩れ止め構造のよう
に、嵌合い部の隙間の大きさを、両導波管部分11B,11C
がほぼ静合状態で嵌まり合う精度まで小さくすることな
く、導波管の製作上容易に可能な大きさとしてシールド
材の温度上昇を抑えることができ、これにより、シール
ド材がその弾性度を減じることなく導波管部分11Cとの
接触を継続し、マイクロ波の洩れ防止機能を維持するこ
とができる。FIG. 5 is an enlarged view of part A of FIG. 1 and another enlarged view from FIG. 2, and FIG. 6 is an enlarged view of part D of FIG. As shown in the enlarged view of FIG. 6, the large-diameter waveguide, that is, the waveguide portion 11B
At the end of the waveguide section 1/4 wavelength of microwave
A bag flange 12 having a choke structure in which a ring-shaped groove 12a having a shape along the peripheral wall of 1B is formed is joined. On the upper surface of the bag flange 12, a ring-shaped shield 13a made of a braided conductor in which a fine metal wire is softly knitted is provided on the waveguide portion 1.
It is held down by the holding bracket 13 so as to hit the entire outer circumference of 1C. By configuring the large-diameter-side waveguide end portion in this way, the microwaves that have entered the gap between the fitting portions of the two waveguides enter a groove whose width is significantly larger than the size of the gap.
The amount of intrusion that is almost proportional to the ratio between the gap and the groove width, is reflected at the bottom of the groove at a depth of 1/4 wavelength of the microwave, and reaches the entrance of the groove after 1/2 wavelength, the instantaneous phase of arrival Is superimposed on the microwave having the opposite phase to the reflected wave, cancels out most of the microwaves that have entered the gap between the two waveguides, and the remaining small portion only increases the temperature of the ring-shaped shield 13a, and therefore As in the microwave leakage prevention structure shown in FIG. 2, the size of the gap at the fitting portion is adjusted by the size of both waveguide portions 11B and 11C.
The size of the shield material can be reduced as much as possible in the manufacture of the waveguide without reducing the accuracy to fit in a nearly mated state, and the shield material can reduce its elasticity. The contact with the waveguide portion 11C can be continued without reduction, and the function of preventing microwave leakage can be maintained.
第7図に本発明による乾式薄膜加工装置構成の第3の
実施例を示す。この実施例は、第1図の実施例による乾
式薄膜加工装置における導波管部分11Aを含むマイクロ
波発振器側のマイクロ波立体回路中、マイクロ波発振器
10から直線状に延びるマイクロ波立体回路部分の構成を
対象としたものである。この直線状のマイクロ波立体回
路部分を構成するアイソレータ50,双方向結合器51,EHチ
ューナ52などの機器のうち、メンテナンス頻度の最も高
いEHチューナ52の隣に、長手方向に伸縮可能な伸縮導波
管53が直列に介装されている。この伸縮導波管53は、第
1図に示す導波管部分11B,11Cの場合と同様に、互いに
径の異なる2本の導波管を用いて抜き差し可能に構成さ
れ、また、大口径側導波管の抜き差し部は、第6図のよ
うなマイクロ波洩れ止め構造に形成されている。このよ
うに、伸縮導波管を直線状マイクロ波立体回路部分に直
列に介装することにより、このマイクロ波立体回路部分
を構成する機器中、対象とする機器のみを容易に取り外
すことができ、また、再取付けも容易になる。FIG. 7 shows a third embodiment of the configuration of the dry thin film processing apparatus according to the present invention. This embodiment differs from the microwave solid-state circuit on the microwave oscillator side including the waveguide portion 11A in the dry thin film processing apparatus according to the embodiment of FIG.
It is intended for the configuration of a microwave three-dimensional circuit portion extending linearly from 10. Among the devices such as the isolator 50, the bidirectional coupler 51, and the EH tuner 52 that make up this linear microwave three-dimensional circuit part, a telescopic conductor that can expand and contract in the longitudinal direction is located next to the EH tuner 52 that has the highest maintenance frequency. Wave tubes 53 are interposed in series. This telescopic waveguide 53 is configured to be insertable and removable by using two waveguides having different diameters, as in the case of the waveguide portions 11B and 11C shown in FIG. The insertion / extraction portion of the waveguide is formed in a microwave leakage preventing structure as shown in FIG. In this way, by interposing the expandable waveguide in series with the linear microwave three-dimensional circuit portion, it is possible to easily remove only the target device among the devices constituting the microwave three-dimensional circuit portion, Also, re-attachment becomes easy.
第8図は、第7図の実施例に示す構成の乾式薄膜加工
装置における導波管の抜き差し部,マイクロ波発振器側
導波管の分割点(第3図における導波管部分11Aと11Bと
の結合部)および通過形共振器と導波管端部のハウジン
グとの結合部を除く回路要素相互間の結合構造の一実施
例を示す。図は第7図におけるEHチューナ52と伸縮導波
管53の大口径側導波管すなわち導波管部分53Bとの結合
部Eの構造を示しているが、他の結合部分も結合構造は
同じである。FIG. 8 is a sectional view of the waveguide insertion / removal portion and the splitting point of the waveguide on the side of the microwave oscillator (the waveguide portions 11A and 11B in FIG. 3) in the dry thin film processing apparatus having the structure shown in FIG. An example of the coupling structure between circuit elements excluding the coupling between the pass-type resonator and the housing at the end of the waveguide is shown below. The figure shows the structure of the coupling portion E between the EH tuner 52 and the large-diameter side waveguide of the telescopic waveguide 53, that is, the waveguide portion 53B in FIG. 7, but the other coupling portions have the same coupling structure. It is.
第8図(a)に示すように、EHチューナ52本体のマイ
クロ波進行方向端部に面方向がマイクロ波進行方向に垂
直な円板状フランジ52Aが接合され、この円板のEHチュ
ーナ本体側周縁が円錐状に形成されている。また、導波
管部分53Bのマイクロ波進行方向端部にも円板状フラン
ジ53Aが接合され、導波管部分53B側周縁が円錐状に形成
されている。そして、フランジ52A,53Aを剛に結合する
結合部材として、同図(b)に示すように、2個の円弧
状アーム54Cと,結合片54Bと、蝶ナット54Aとを主要部
材として構成されたクィックカップリング54が用いられ
ている。アーム54Cは円弧の内周側に、断面が同図
(a)に示されるような梯形溝を形成され、このアーム
54Cを2個、内周側を対向させた状態で結合片54Bを介し
てそれぞれが結合片の支点まわりに揺動できるように結
合し、この2個のアーム54Cでフランジ52A,53Aを両側か
ら挟んで蝶ナット54を締めることにより、フランジ52A,
53Aは周縁側の円錐面を介して楔作用による押圧力を受
け、強固に結合される。このとき、両フランジに芯ずれ
があっても、この芯ずれは蝶ナットが締まるにつれ自動
的に矯正される。そして、この結合の解除,再結合は、
従来のように複数のボルト,ナット等を必要とすること
なく、1個の蝶ナットの取付け,取外しにより可能であ
る。As shown in FIG. 8 (a), a disc-shaped flange 52A having a surface direction perpendicular to the microwave traveling direction is joined to the end of the EH tuner 52 main body in the microwave traveling direction, and the disc is placed on the EH tuner main body side. The periphery is formed in a conical shape. Also, a disc-shaped flange 53A is joined to an end of the waveguide portion 53B in the microwave traveling direction, and the periphery of the waveguide portion 53B is formed in a conical shape. And, as a connecting member for rigidly connecting the flanges 52A, 53A, as shown in FIG. 3B, two arc-shaped arms 54C, a connecting piece 54B, and a wing nut 54A are constituted as main members. A quick coupling 54 is used. The arm 54C has a trapezoidal groove having a cross section as shown in FIG.
Two 54Cs are connected so that they can swing around the fulcrum of the connecting piece via the connecting piece 54B with the inner peripheral sides facing each other, and the flanges 52A, 53A are mounted on both sides by the two arms 54C. By pinching and tightening the wing nut 54, the flange 52A,
53A receives the pressing force by the wedge action via the peripheral conical surface, and is firmly connected. At this time, even if the two flanges are misaligned, the misalignment is automatically corrected as the wing nut is tightened. And the unbinding and reunion of this
It is possible by attaching and detaching one wing nut without requiring a plurality of bolts, nuts and the like as in the prior art.
本発明においては、乾式薄膜加工装置を以上のように
構成したので、次の効果が奏せられる。In the present invention, since the dry thin film processing apparatus is configured as described above, the following effects can be obtained.
請求項1の装置では、通過形共振器のマイクロ波導入
口を気密に閉鎖する,誘電体からなるマイクロ波導入窓
と通過形共振器とのメンテナンス作業が導波管を解体す
ることなく短時間に行われ、装置の生産性が向上すると
ともに、メンテナンス作業後の導波管と共振器との再結
合時のボルトの締め忘れや導波管部分相互の位置ずれに
よる装置性能の低下が防止され、装置性能の再現性が確
保されるようになった。In the apparatus according to the first aspect, the maintenance work of the microwave introduction window made of a dielectric and the passage type resonator for closing the microwave introduction port of the passage type resonator in an airtight manner can be performed in a short time without dismantling the waveguide. In addition to improving the productivity of the device, the device performance is prevented from being reduced due to forgetting to tighten bolts when the waveguide and the resonator are re-coupled after the maintenance work and misalignment between the waveguide portions. The reproducibility of the device performance has been secured.
請求項2の装置では、導波管の共振器側直線範囲の長
さを短縮させるための共振器と導波管との分離や、メン
テナンス作業後の再結合がより容易にかつより短時間に
可能になり、装置運転中の突発事故(例えばマイクロ波
導入窓の破損)時にも装置の復旧作業が短時間に完了す
る。In the device according to the second aspect, separation of the resonator from the waveguide for shortening the length of the resonator-side linear range of the waveguide and recombination after the maintenance work are easier and shorter. This makes it possible to complete the recovery operation of the apparatus in a short time even in the event of a sudden accident during operation of the apparatus (for example, breakage of the microwave introduction window).
請求項3の装置では、共振器と処理室との組立状態
が、ベースプレートを介して共振器の接合面を処理室の
接合面に押圧状態に当接,保持することにより維持され
るため、処理室と共振器とを結合するための,ボルト等
の締結部材が不要となり、共振器の取り外しに際し、直
ちにベースプレートの下降駆動に入ることができる。ま
た、共振器と処理室との軸線を一致させるためには、両
者のいずれか一方の接合面に位置決めピンを植設するの
みでよく、従ってベースプレートがこの位置決めピンの
高さをかわせる量だけ下降すれば、上下移動手段の水平
移動が可能になる。このため、上下移動手段はほほど高
さを必要とせず、装置を大形化することなく、共振器の
取外し,再組立が作業員1人の手で容易にかつ短時間に
可能となる。しかも、共振器と励磁コイルとは共通のベ
ースプレートに同軸状態を保って支持されているから、
再組立時に両者の軸線がずれるおそれがなく、装置性能
の再現性を確実に実現することができる。In the apparatus according to the third aspect, the assembly state of the resonator and the processing chamber is maintained by abutting and holding the bonding surface of the resonator against the bonding surface of the processing chamber via the base plate in a pressed state. A fastening member such as a bolt for connecting the chamber and the resonator is not required, and the lower plate can be immediately driven to lower when the resonator is removed. In order to make the axes of the resonator and the processing chamber coincide with each other, it is only necessary to implant a positioning pin on one of the joining surfaces of the two. Therefore, the base plate is lowered by an amount that replaces the height of the positioning pin. Then, the vertical movement means can be moved horizontally. For this reason, the vertical moving means does not require a very high height, and the removal and reassembly of the resonator can be easily and quickly performed by one worker without increasing the size of the apparatus. Moreover, since the resonator and the excitation coil are supported coaxially on a common base plate,
During reassembly, there is no risk that the axes of the two will shift, and reproducibility of the device performance can be reliably achieved.
以上に述べた,マイクロ波導波管の非解体切離し可能
構造と、この構造における共振器側端部の真空チャック
化、および共振器と励磁コイルとの支持物を共用化して
この支持物を上下,水平方向に移動させる上下移動手段
の構造を量産装置に適用することにより、装置の生産性
がさらに向上するとともに作業員の労力がさらに軽減さ
れる。そしてこの効果を、導波管の構造をさほど複雑化
することなく、また、上下移動手段を含む装置をさほど
大形化することなく得ることができる。As described above, the non-disassembly-separable structure of the microwave waveguide, the vacuum chucking of the end of the resonator in this structure, and the support of the resonator and the excitation coil are shared, and the support is vertically By applying the structure of the vertical moving means for moving in the horizontal direction to a mass production device, the productivity of the device is further improved and the labor of the operator is further reduced. This effect can be obtained without significantly complicating the structure of the waveguide, and without increasing the size of the device including the vertical moving means.
請求項4の装置では、直線状のマイクロ波立体回路部
分のメンテナンス時に、この回路部分を構成する回路要
素中、対象とする回路要素のみを取外すことができ、装
置の稼動率がさらに向上する。In the device according to the fourth aspect, during maintenance of the linear microwave three-dimensional circuit portion, only the target circuit element can be removed from the circuit components constituting the circuit portion, and the operation rate of the device is further improved.
請求項5の装置では、大口形側導波管と小口形側導波
管との抜き差し部の隙間の大きさを、導波管の製作上容
易に可能な範囲内に抑えることにより、この隙間を塞ぐ
ために設けられるリング状のシールド材を過熱すること
なく、マイクロ波の洩れ防止機能を安定に維持すること
ができる。また、この構造のもつ安定なマイクロ波の洩
れ防止機能により、大口径側導波管と小口径側導波管と
の抜き差しによる伸縮構造が容易に可能となった。In the apparatus according to the fifth aspect, the size of the gap between the insertion / removal portion between the large-side waveguide and the small-side waveguide is suppressed to a range that is easily possible in the manufacture of the waveguide. The microwave leakage prevention function can be stably maintained without overheating the ring-shaped shield member provided for closing the antenna. In addition, due to the stable microwave leakage prevention function of this structure, it is possible to easily expand and contract the structure by inserting and removing the large-diameter waveguide and the small-diameter waveguide.
請求項6の装置では、フランジ結合の解除および再結
合が1個の締結部材の取付け,取外しにより行われ、回
路要素のマイクロ波立体回路からの取外し,再取付けを
迅速に行うことができる。加えて、再取付け時の両フラ
ンジの芯ずれが、両フランジの円錐面と円弧状アームの
三角溝もしくは梯形溝側壁との接触によって生じる自動
調芯作用により締結部材の締結行程とともに矯正され、
フランジ結合に起因する装置性能の低下が防止される。In the apparatus according to the sixth aspect, the release and reconnection of the flange connection are performed by attaching and detaching one fastening member, so that the circuit element can be quickly removed and reattached from the microwave three-dimensional circuit. In addition, the misalignment of the two flanges at the time of reattachment is corrected together with the fastening process of the fastening member by an automatic centering action caused by the contact between the conical surfaces of the two flanges and the triangular groove or the trapezoidal groove side wall of the arc-shaped arm,
A decrease in device performance due to the flange connection is prevented.
第1図は本発明の第1の実施例によるマイクロ波導波管
の構成を示すECR型乾式薄膜加工装置の縦断面図、第2
図は第1図におけるA部の拡大図、第3図は第1図のB
−B線に沿う断面図、第4図は本発明の第2の実施例に
よる,通過形共振器の上下移動手段の構造を示すECR乾
式薄膜加工装置の部分断面縦断面図、第5図は第1図に
おけるA部の第2図とは別の拡大図、第6図は第5図に
おけるD部の拡大図、第7図は本発明の第3の実施例に
よる,乾式薄膜加工装置におけるマイクロ波立体回路中
のマイクロ波発振器から直線状に延びるマイクロ波立体
回路部分の構成を示す,マイクロ波立体回路の全体構成
図、第8図は本発明の第4の実施例による,マイクロ波
立体回路中の導波管の抜き差し部,導波管相互のヒンジ
結合部(第3図),通過形共振器と導波管端部ハウジン
グとの結合部を除く回路要素間結合部の結合構造を示す
ものであって同図(b)は結合部の正面図,同図(a)
は同図(b)のF−F線に沿う断面図、第9図は従来の
マイクロ波導波管の構成例を示すECR型乾式薄膜加工装
置の縦断面図、第10図は乾式薄膜加工装置における一般
のマイクロ波立体回路の全体構成図である。 1,11:マイクロ波導波管(回路要素)、1D,11D:コーナ
(導波管,回路要素)、2:マイクロ波導入窓、3:通過形
共振器、3A:マイクロ波導入口、4,14:ハウジング、6:励
磁コイル、8:基板、10:マイクロ波発振器(回路要
素)、12a:溝、25:ベースプレート、26:上下移動手段、
28:直線スライドレール(レール)、29:ねじ棒、50:ア
イソレータ(回路要素)、51:双方向性結合器(回路要
素)、52:EHチューナ(回路要素)、53:伸縮導波管、5
4:クィックカップリング、54A:蝶ナット(締結部材)、
54B:結合片、54C:アーム。FIG. 1 is a longitudinal sectional view of an ECR type dry thin film processing apparatus showing a configuration of a microwave waveguide according to a first embodiment of the present invention.
FIG. 3 is an enlarged view of a portion A in FIG. 1, and FIG. 3 is a view B in FIG.
FIG. 4 is a sectional view taken along the line B, FIG. 4 is a partial sectional longitudinal sectional view of an ECR dry thin film processing apparatus showing the structure of the vertical moving means of the through-type resonator according to the second embodiment of the present invention, and FIG. Fig. 1 is an enlarged view of part A in Fig. 2 different from Fig. 2, Fig. 6 is an enlarged view of part D in Fig. 5, and Fig. 7 is a dry thin film processing apparatus according to a third embodiment of the present invention. FIG. 8 is an overall configuration diagram of a microwave three-dimensional circuit showing a configuration of a microwave three-dimensional circuit portion linearly extending from a microwave oscillator in the microwave three-dimensional circuit, and FIG. 8 is a microwave three-dimensional circuit according to a fourth embodiment of the present invention. The coupling structure of the coupling between circuit elements excluding the insertion / removal part of the waveguide in the circuit, the hinge coupling part between the waveguides (FIG. 3), and the coupling part between the pass-through resonator and the waveguide end housing are shown. FIG. 2B is a front view of the connecting portion, and FIG.
FIG. 9 is a sectional view taken along the line FF in FIG. 10B, FIG. 9 is a longitudinal sectional view of an ECR type dry thin film processing apparatus showing a configuration example of a conventional microwave waveguide, and FIG. 10 is a dry thin film processing apparatus. 1 is an overall configuration diagram of a general microwave three-dimensional circuit in FIG. 1,11: microwave waveguide (circuit element), 1D, 11D: corner (waveguide, circuit element), 2: microwave introduction window, 3: pass-type resonator, 3A: microwave introduction port, 4,14 : Housing, 6: Excitation coil, 8: Substrate, 10: Microwave oscillator (circuit element), 12a: Groove, 25: Base plate, 26: Vertical moving means,
28: linear slide rail (rail), 29: screw rod, 50: isolator (circuit element), 51: bidirectional coupler (circuit element), 52: EH tuner (circuit element), 53: telescopic waveguide, Five
4: Quick coupling, 54A: Wing nut (fastening member),
54B: connecting piece, 54C: arm.
Claims (6)
と、片側にマイクロ波の導入口を備え該導入口と対面す
る他側にマイクロ波を外方へ散逸させる開口を備えた通
過形共振器とを備えてなるマイクロ波立体回路を有し、
この通過形共振器の内部において磁場とマイクロ波の交
番電界との相互作用によって該通過形共振器内に導入さ
れたガスをプラズマ化し、このプラズマを用いて基板に
膜形成あるいはエッチングなどの薄膜加工を行う乾式薄
膜加工装置において、通過形共振器のマイクロ波導入口
から該通過形共振器の外方へ該導入口の軸線方向に延び
るマイクロ波導波管の直線範囲が長手方向に伸縮可能と
なるように、マイクロ波導波管が、前記直線範囲内の適
宜の位置で長手方向に抜き差し可能な,互いに径の異な
る通過形共振器側導波管とマイクロ波発振器側導波管と
からなるとともに、該マイクロ波発振器側導波管が長手
方向に2分割されて該2分割されたマイクロ波発振器側
導波管の通過形共振器側の導波管部分がマイクロ波発振
器側の導波管部分により分割点まわりに旋回可能に枢支
されたことを特徴とする乾式薄膜加工装置。1. A pass-type resonator having a microwave oscillator, a microwave waveguide, and an opening for introducing microwaves on one side and an opening for dissipating microwaves on the other side facing the inlet. A microwave three-dimensional circuit comprising:
The gas introduced into the through-type resonator is turned into plasma by the interaction between the magnetic field and the alternating electric field of the microwave inside the through-type resonator, and the plasma is used to form a thin film on a substrate by forming a film or etching. In the dry thin film processing apparatus, the linear range of the microwave waveguide extending in the axial direction of the introduction port from the microwave introduction port of the through-type resonator to the outside of the through-type resonator can be extended and contracted in the longitudinal direction. In addition, the microwave waveguide comprises a pass-type resonator-side waveguide and a microwave oscillator-side waveguide having different diameters which can be inserted and removed in the longitudinal direction at an appropriate position within the linear range. The waveguide on the microwave oscillator side is divided into two in the longitudinal direction, and the waveguide part on the pass-type resonator side of the divided waveguide on the microwave oscillator side is the waveguide part on the microwave oscillator side. Dry film processing apparatus characterized by being pivotally supported pivotable about more division point.
おいて、通過形共振器側導波管の通過形共振器側端部
が、通過形共振器のマイクロ波導入口を気密に閉鎖す
る,誘電体からなるマイクロ波導入窓を保持するハウジ
ングを備えるとともに該ハウジングが通過形共振器のマ
イクロ波導入口まわりの壁面に吸着する真空チャックと
して形成されていることを特徴とする乾式薄膜加工装
置。2. A dry-type thin film processing apparatus according to claim 1, wherein a pass-type resonator side end of the pass-type resonator-side waveguide hermetically closes a microwave introduction port of the pass-type resonator. And a housing for holding a microwave introduction window made of a dielectric material, and the housing is formed as a vacuum chuck which is attracted to a wall around a microwave introduction port of the through-type resonator.
おいて、通過形共振器内部の磁場を、該通過形共振器を
励磁コイルで囲んで形成させるようにするとともに、該
励磁コイルを軸線方向に移動させるねじ棒を備えかつ通
過形共振器と励磁コイルとを互いの軸線が一致するよう
に支持するベースプレートと、該ベースプレートを上下
方向に移動させる上下移動手段とを備え、通過形共振器
と励磁コイルとを前記上下移動手段が載置されるレール
に案内されて水平方向に引き出し可能としたことを特徴
とする乾式薄膜加工装置。3. The dry thin film processing apparatus according to claim 1, wherein a magnetic field inside the pass-through resonator is formed by surrounding the pass-through resonator with an exciting coil. A base plate having a threaded rod for moving in the axial direction and supporting the pass-type resonator and the exciting coil so that their axes coincide with each other; and a vertical moving means for moving the base plate in the vertical direction. A dry-type thin film processing apparatus, wherein a vessel and an exciting coil are guided by a rail on which the vertical moving means is mounted and can be pulled out in a horizontal direction.
おいて、マイクロ波発振器側導波管の分割点からマイク
ロ波発振器に到るマイクロ波立体回路中、マイクロ波発
振器から直線状に延びるマイクロ波立体回路部分に、長
手方向に伸縮可能となるように互いに径の異なる導波管
を用いて抜き差し可能に構成された伸縮導波管が直列に
介装されていることを特徴とする乾式薄膜加工装置。4. A dry thin film processing apparatus according to claim 1, wherein the microwave three-dimensional circuit extends from the microwave oscillator side waveguide to a microwave oscillator from a division point of the microwave oscillator side waveguide, and extends linearly from the microwave oscillator. A dry type wherein a stretchable waveguide configured to be insertable / removable using waveguides having different diameters so as to be able to expand and contract in the longitudinal direction is interposed in series in the microwave three-dimensional circuit portion. Thin film processing equipment.
膜加工装置において、長手方向にに抜き差し可能な,互
いに径の異なる導波管中、大口径側導波管の抜差し部
を、導波管端部に、導波管の周壁に沿って導波管を取り
巻く,導波管の長手方向に垂直な面方向に深さがマイク
ロ波の1/4波長の,導波管内側へ開放された断面方形の
溝が形成されたチョーク構造としたことを特徴とする乾
式薄膜加工装置。5. A dry-type thin film processing apparatus according to claim 1, wherein the insertion portion of the large-diameter-side waveguide is inserted into waveguides having different diameters which can be inserted and removed in the longitudinal direction. At the end of the waveguide, surrounding the waveguide along the peripheral wall of the waveguide, the inside of the waveguide having a depth of 1/4 wavelength of microwave in the plane perpendicular to the longitudinal direction of the waveguide A dry thin film processing apparatus characterized in that it has a choke structure in which a groove having a rectangular cross section open to the side is formed.
の乾式薄膜加工装置において、マイクロ波立体回路を構
成する導波管,EHチューナ等の機器,マイクロ波発振器
等回路要素相互間の結合が、導波管の抜き差し部,マイ
クロ波発振器側導波管の分割点および通過形共振器と導
波管端部のハウジングとの結合部を除き、回路要素本体
のマイクロ波進行方向端部に面方向をマイクロ波進行方
向と垂直にして円板状に形成された該円板の回路要素本
体側周縁が円錐状に形成されたフランジと、円弧状に形
成され該円弧の内周側に円弧の全長で前記フランジの円
錐面とほぼ密に側壁で接触する,両側へ開いた三角溝も
しくは梯形溝が形成された2個のアームと,該2個のア
ームを円弧の内周側を対向させて同側端部で枢支する結
合片と,該2個のアームの他側端部同志を締め合わせる
締結部材とからなるクィックカップリングとを用いて行
わせることを特徴とする乾式薄膜加工装置。6. The dry thin-film processing apparatus according to claim 1, wherein a waveguide, a device such as an EH tuner, a circuit element such as a microwave oscillator and the like constitute a microwave three-dimensional circuit. Except for the insertion / removal part of the waveguide, the division point of the waveguide on the side of the microwave oscillator, and the coupling part between the pass-type resonator and the housing at the end of the waveguide, the coupling between the microwaves in the circuit element body is At the end of the direction, a flange formed in a disc shape with the surface direction perpendicular to the microwave traveling direction and a peripheral edge of a circuit element body side of the disc formed in a conical shape, and an arc formed in an arc shape Two arms formed with triangular grooves or trapezoidal grooves which are open on both sides and which are in contact with the conical surface of the flange on the side wall substantially the entire length of the arc on the circumferential side, and the two arms are connected to the inner circumference of the arc. A connecting piece pivotally supported at the same side end with the two sides facing each other, and the two Dry film processing apparatus for causing performed using a quick coupling consisting of a coupling member to align tightening the other end comrades arm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2324072A JP2760150B2 (en) | 1990-05-07 | 1990-11-27 | Dry thin film processing equipment |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2-117196 | 1990-05-07 | ||
| JP11719690 | 1990-05-07 | ||
| JP22872290 | 1990-08-30 | ||
| JP2-228722 | 1990-08-30 | ||
| JP2324072A JP2760150B2 (en) | 1990-05-07 | 1990-11-27 | Dry thin film processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04176872A JPH04176872A (en) | 1992-06-24 |
| JP2760150B2 true JP2760150B2 (en) | 1998-05-28 |
Family
ID=27313324
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2324072A Expired - Fee Related JP2760150B2 (en) | 1990-05-07 | 1990-11-27 | Dry thin film processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2760150B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11501957B2 (en) * | 2020-09-03 | 2022-11-15 | Applied Materials, Inc. | Pedestal support design for precise chamber matching and process control |
-
1990
- 1990-11-27 JP JP2324072A patent/JP2760150B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04176872A (en) | 1992-06-24 |
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