JP2780293B2 - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JP2780293B2 JP2780293B2 JP32099988A JP32099988A JP2780293B2 JP 2780293 B2 JP2780293 B2 JP 2780293B2 JP 32099988 A JP32099988 A JP 32099988A JP 32099988 A JP32099988 A JP 32099988A JP 2780293 B2 JP2780293 B2 JP 2780293B2
- Authority
- JP
- Japan
- Prior art keywords
- connection
- semiconductor chip
- film
- transparent conductive
- liquid crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
- H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
Landscapes
- Liquid Crystal (AREA)
- Wire Bonding (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、透明導電膜から構成される液晶パネルに駆
動用の半導体チップを容易に、かつ信頼性良く直接実装
した液晶表示装置などに適用される半導体装置に関する
ものである。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is applied to, for example, a liquid crystal display device in which a semiconductor chip for driving is directly and easily and reliably mounted on a liquid crystal panel formed of a transparent conductive film. The present invention relates to a semiconductor device.
従来の技術 近年、透明導電膜が形成された2枚のガラス板の間隙
中に液晶物質を充填させた構成の液晶パネルに駆動用の
半導体チップを直接実装して薄形,軽量の液晶表示装置
にする試みが盛んに行われている。この代表的な方法と
して、予め半導体チップの電極部分に、金めっきなどで
形成された突起形状の接続用金属電極と、ガラス板上に
透明導電膜が形成された接続用電極とを互いに対向させ
た状態(半導体チップがフェースダウン状態をなす)
で、この間に、導電性接着剤を介在させて電気的接続と
接着・固定を行う方法がある。このとき、導電性接着剤
は、予め、半導体チップの突起形状の接続用金属電極面
に転写法やディップ法などにより形成しておき、ガラス
板上の透明導電膜パターンに位置整合し、載置した後、
熱硬化することにより、電気的接続させるものである。2. Description of the Related Art In recent years, a thin and light-weight liquid crystal display device in which a driving semiconductor chip is directly mounted on a liquid crystal panel having a structure in which a liquid crystal material is filled in a gap between two glass plates having a transparent conductive film formed thereon. Attempts have been made actively. As a typical method, a protruding connection metal electrode formed in advance by gold plating or the like on a semiconductor chip electrode portion and a connection electrode having a transparent conductive film formed on a glass plate are opposed to each other. State (semiconductor chip is in face-down state)
In this case, there is a method of performing electrical connection and bonding / fixing with a conductive adhesive interposed therebetween. At this time, the conductive adhesive is previously formed on the protruding connection metal electrode surface of the semiconductor chip by a transfer method or a dipping method, and is aligned with the transparent conductive film pattern on the glass plate. After doing
The electrical connection is made by thermosetting.
この液晶表示装置における導電性接着剤を用いた場合
の接続構造を第4図に示す。1a,1bは液晶パネルを構成
する2枚のガラス板でありそれぞれ透明導電膜4a,4bが
形成され、ガラス板1aには前記透明導電膜4aが外部に延
び接続用電極4a′として図に示すように庇状に形成さ
れ、導電性接着剤5を介して予め、突起形状の接続用金
属電極6が形成された半導体チップ7がフェースダウン
の状態で電気的に接続され、かつ接着・固定されてい
る。また、2は液晶、3はシール剤である。FIG. 4 shows a connection structure when a conductive adhesive is used in this liquid crystal display device. Reference numerals 1a and 1b denote two glass plates constituting a liquid crystal panel, on which transparent conductive films 4a and 4b are respectively formed. On the glass plate 1a, the transparent conductive film 4a extends to the outside and is shown as a connection electrode 4a 'in the figure. Semiconductor chip 7, which is formed in an eaves-like manner, and on which a protruding connection metal electrode 6 is formed in advance via conductive adhesive 5, is electrically connected face-down, and is bonded and fixed. ing. Reference numeral 2 denotes a liquid crystal, and reference numeral 3 denotes a sealant.
発明が解決しようとする課題 前記の接続構造においては、第4図に示すように一般
的には庇状のガラス板1aの表面に形成された透明導電膜
4aからなる接続用電極4a′上に直接半導体チップ7の突
起形状の接続用金属電極6がフェースダウンの状態で導
電性接着剤5を介して電気的接続および接着・固定を行
うために、前記接続用電極4a′の大部分は露出状態にな
っている(半導体チップ7が載置されない部分も含
む)。そして、透明電極に一般に使用される透明導電膜
は酸化物であるため乾燥大気中では安定であるが、水分
が存在すると分解し易く、さらに電圧を印加すると電解
腐食あるいは、隣接間ショートによる過大電流のために
透明導電膜の断線が生ずることや、金属クズなどの導電
性のゴミや汗、だ液などのイオン性汚物が付着し、ショ
ートや腐食の原因になるなど、液晶表示装置に適用した
場合に、品質、長期的接続信頼性に欠ける大きな問題を
有していた。この対策の一つとして、前記の接続用電極
4a′すなわち透明導電膜上に無電解めっき法などにより
ニッケルめっき、あるいはニッケルめっきした上に、さ
らに金めっきすることにより金属皮膜を施した構造が見
られる。この場合、透明導電膜表面の僅かな汚染等があ
れば、透明導電膜表面はめっき皮膜が均一、かつ完全に
被覆されず、多数のピンホールが発生する問題がある。
さらに透明導電膜の膜厚が通常300Å〜2000Åであり極
めて薄いために、厚み方向、すなわち、透明導電膜の側
面においては、めっき皮膜の密着が非常に悪い状態で形
成されるなどの問題があり、前記のように水分の存在な
どによりめっき皮膜のピンホールや、透明導電膜とめっ
き皮膜との界面から水分が侵入し、電圧を印加すること
によって電解腐食を生ずるなど恒久的な対策にはなって
いない。Problems to be Solved by the Invention In the above connection structure, as shown in FIG. 4, a transparent conductive film generally formed on the surface of an eave-shaped glass plate 1a
The connecting metal electrode 6 having a protruding shape of the semiconductor chip 7 is directly connected to the connecting electrode 4a 'made of the semiconductor chip 7 through the conductive adhesive 5 in a face-down state, and the bonding / fixing is performed. Most of the connection electrode 4a 'is exposed (including a portion where the semiconductor chip 7 is not mounted). A transparent conductive film generally used for a transparent electrode is an oxide and is stable in a dry atmosphere because it is an oxide. However, it is easily decomposed in the presence of moisture. It is applied to liquid crystal display devices, for example, because the transparent conductive film may be broken due to conductive dust such as metal scraps and ionic contaminants such as sweat and saliva adhere to it, causing short circuit and corrosion. In some cases, there was a major problem that lacked quality and long-term connection reliability. As one of the measures, the connection electrode
4a ', that is, a structure in which nickel plating is applied to the transparent conductive film by an electroless plating method or the like and a metal film is applied by further gold plating. In this case, if there is slight contamination on the surface of the transparent conductive film, the surface of the transparent conductive film is not uniformly and completely covered with the plating film, and there is a problem that a large number of pinholes are generated.
Further, since the thickness of the transparent conductive film is usually 300 to 2000 mm, which is extremely thin, there is a problem in that the thickness direction, that is, on the side surface of the transparent conductive film, the adhesion of the plating film is formed in a very poor state. As described above, permanent measures such as the intrusion of moisture from the pinholes of the plating film due to the presence of moisture and the interface between the transparent conductive film and the plating film and the occurrence of electrolytic corrosion by applying a voltage are provided. Not.
本発明は、このような課題を解決するものであり、突
起形状の接続用金属電極を設けた半導体チップを液晶パ
ネルに直接実装した液晶表示装置などにおける透明導電
膜の保護を完全に達成し、高品質,高信頼性の液晶表示
装置に適用できる半導体装置を提供するものである。The present invention solves such a problem, and completely achieves protection of a transparent conductive film in a liquid crystal display device or the like in which a semiconductor chip provided with protruding connection metal electrodes is directly mounted on a liquid crystal panel, An object of the present invention is to provide a semiconductor device applicable to a high-quality, high-reliability liquid crystal display device.
課題を解決するための手段 前記の課題を解決するために、本発明の半導体装置は
絶縁性基板上に、表面に金属皮膜を形成した透明導電膜
からなる接続用電極を設け、この接続用電極上に、合成
樹脂からなる保護膜を形成し、突起形状の接続用金属電
極を設けた半導体チップが、前記絶縁性基板上に形成し
た接続用電極と互いに対向するように配設され、前記半
導体チップの接続用金属電極が熱圧着により、前記保護
膜を突き破り、前記接続用電極と電気的に導通するよう
に取付けた構成とするものである。Means for Solving the Problems In order to solve the above problems, a semiconductor device of the present invention is provided with a connection electrode made of a transparent conductive film having a metal film formed on a surface thereof on an insulating substrate; A protective film made of a synthetic resin is formed thereon, and a semiconductor chip provided with a protruding connection metal electrode is disposed so as to face the connection electrode formed on the insulating substrate; The connection metal electrode of the chip is configured to penetrate the protective film by thermocompression bonding so as to be electrically connected to the connection electrode.
作用 この構成によれば、絶縁基板上の表面に金属皮膜を形
成した透明導電膜からなる接続用電極上に、さらに合成
樹脂からなる保護膜が形成されたものであり、突起形状
の接続用金属電極を設けた半導体チップと前記絶縁性基
板上に形成した接続用電極との電気的接続において、前
記保護膜は、半導体チップの熱圧着時に溶融し加圧力に
より、半導体チップに設けた突起形状の接続用金属電極
で突き破られるとともに接続用金属電極以外の周縁部に
排除されることにより電気的接続が得られるものであ
る。しかも、前記の如く絶縁性基板上の表面に金属皮膜
を形成することにより、透明導電膜からなる接続用電極
を予め、大まかに保護したうえに、半導体チップの接続
用金属電極の接続されない部分の接続用電極や、半導体
チップ以外の部分に保護膜が残存しているために、2重
に保護されていることになり、湿気,ゴミなどをしゃ断
でき、結果的に接続用電極が完全に外気から保護された
状態を保持し、高品質,高信頼性の半導体装置を得るこ
とができる。According to this configuration, a protective film made of a synthetic resin is further formed on the connection electrode made of a transparent conductive film having a metal film formed on the surface of the insulating substrate, and the connection metal having a projection shape is formed. In the electrical connection between the semiconductor chip provided with the electrodes and the connection electrode formed on the insulating substrate, the protective film is formed by melting the semiconductor chip at the time of thermocompression and applying a pressing force to the semiconductor chip. Electrical connection can be obtained by being pierced by the connection metal electrode and being excluded at the peripheral portion other than the connection metal electrode. In addition, by forming a metal film on the surface of the insulating substrate as described above, the connection electrode made of a transparent conductive film is roughly protected in advance, and the portion of the semiconductor chip where the connection metal electrode is not connected is not connected. Since the protective film remains on portions other than the connection electrode and the semiconductor chip, the protection film is doubly protected, and moisture and dust can be cut off. As a result, the connection electrode is completely exposed to the outside air. A high-quality and high-reliability semiconductor device can be obtained while maintaining the state protected from the semiconductor device.
実施例 以下、本発明の一実施例を図面を用いて説明する。第
2図aにおいて、11a,11bは液晶パネルを構成する2枚
の絶縁性基板としてのガラス板であり、それぞれ透明導
電膜14a,14bが形成されガラス板11aには、前記透明導電
膜14aが外部に延び庇状に露出している。なお、12は液
晶、13はシール剤である。15は前記透明導電膜14a上に
形成された金属皮膜であり、前記透明導電膜14aと金属
皮膜15とにより接続用電極として構成されている。16は
前記金属皮膜15上に形成された合成樹脂からなる保護膜
であり、前記接続用電極14a上には、金属皮膜15と、合
成樹脂16の2重の保護膜が形成されている。なお金属皮
膜15として、本実施例では無電解めっき法により膜厚0.
8μmのニッケルめっき皮膜を形成した後、さらに無電
解めっき法により0.05μmの金めっき皮膜を形成したも
のを用いたが、その他として、金,銀,銅,クロム,白
金,パラジウム,アルミニウム,半田等の単層皮膜、さ
らには、これらの多層皮膜,合金皮膜などを無電解めっ
き法,電解めっき法,スパッタリング法,蒸着法等を用
いて形成した金属皮膜なども有効である。また、合成樹
脂からなる保護膜16として、本実施例では、半導体チッ
プの熱圧着による接続において、容易に溶融し、かつ接
着強度の高い熱可塑性ポリエステル樹脂を用い、前記接
続用電極上に形成された金属皮膜15とを完全に覆うため
に、全面にコーティングを行い保護膜とした。その他、
前記保護膜として、アクリル,ポリビニールブチラー
ル,ポリスチレン等の熱可塑性樹脂、スチレン−ブタジ
ェン共重合体ゴム等の熱可塑性ゴム、未硬化液状のフェ
ノール樹脂、エポキシ樹脂、エポキシ変性フェノール樹
脂、シリコン樹脂等の硬化性樹脂、未硬化液状のエポキ
シアクリレートオリゴマー、アクリレートモノマー等の
光硬化性樹脂等の単体もしくは、混合物なども有効であ
る。なお第2図bは、前記第2図aにおけるA−A′部
分の断面図であり、ガラス板11a上に形成した透明導電
膜14aと、さらには、その上に形成した金属皮膜15とか
らなる接続用電極、および、接続用電極以外の余白部分
を含む全面に保護膜16を形成した状態を示すものであ
る。Embodiment Hereinafter, an embodiment of the present invention will be described with reference to the drawings. In FIG. 2a, reference numerals 11a and 11b denote glass plates as two insulating substrates constituting a liquid crystal panel, on which transparent conductive films 14a and 14b are respectively formed. On the glass plate 11a, the transparent conductive film 14a is provided. It extends outside and is exposed like an eave. In addition, 12 is a liquid crystal and 13 is a sealant. Reference numeral 15 denotes a metal film formed on the transparent conductive film 14a, and is constituted by the transparent conductive film 14a and the metal film 15 as a connection electrode. Numeral 16 denotes a protective film made of a synthetic resin formed on the metal film 15, and a double protective film of the metal film 15 and the synthetic resin 16 is formed on the connection electrode 14a. In the present embodiment, the thickness of the metal film 15 is set to 0 by electroless plating.
An 8 μm nickel plating film was formed, and then a 0.05 μm gold plating film was formed by an electroless plating method. In addition, gold, silver, copper, chromium, platinum, palladium, aluminum, solder, etc. And a metal film formed by electroless plating, electrolytic plating, sputtering, vapor deposition or the like of these multilayer films, alloy films and the like are also effective. Further, in the present embodiment, as the protective film 16 made of a synthetic resin, in the connection by thermocompression bonding of the semiconductor chip, it is easily melted, and is formed on the connection electrode using a thermoplastic polyester resin having a high adhesive strength. In order to completely cover the metal film 15, the entire surface was coated to form a protective film. Others
Examples of the protective film include a thermoplastic resin such as acrylic, polyvinyl butyral, and polystyrene; a thermoplastic rubber such as styrene-butadiene copolymer rubber; an uncured liquid phenol resin; an epoxy resin; an epoxy-modified phenol resin; A single substance or a mixture of a photocurable resin such as a curable resin, an uncured liquid epoxy acrylate oligomer, and an acrylate monomer is also effective. FIG. 2B is a cross-sectional view taken along the line AA ′ in FIG. 2A, and shows a transparent conductive film 14a formed on a glass plate 11a and a metal film 15 formed thereon. This shows a state in which a protective film 16 is formed on the entire surface including the connection electrode and a blank portion other than the connection electrode.
次いで第1図に示すように予め半導体チップ18の電極
部分に、金めっきにより突起形状の接続用金属電極17と
前記ガラス板11a上に形成した接続用電極とを互いに対
向させた状態(半導体チップがフェースダウン状態をな
す)で位置整合し、半導体チップ18の裏面から140℃加
熱ツールと3Kg/cm2の圧力で30秒間押え電気的に接続、
固定し液晶表示装置とした。このような接続構造によれ
ば、前記第2図に示すように保護膜16は半導体チップ18
の熱圧着時に溶融し加圧力により、半導体チップ18に形
成された突起形状の接続用金属電極17で突き破られると
ともに、流動し接続用金属電極17以外の周縁部に排除さ
れることにより、電気的接続が得られるものである。ま
た半導体チップ18のうち、接続用金属電極17以外に部分
も保護膜16により全面接着されるために接着強度が著し
く向上できる。さらには、接続用電極14において半導体
チップ18が載置されない部分には保護膜16が残存し外気
と遮断し防湿効果を得ることができる。なお、前記半導
体チップ18における突起形状の接続用金属電極17とし
て、本実施例では金を用いたが、その他として、半田,
銀,銅,白金,パラジウム,ニッケル等の単体、もしく
は複合したものを用いても良い。また接続用金属電極17
の断面形状としては、平形,おわん形でも良いが、本実
施例では、第3図に示すように両端部(上面から見た場
合、実際には、接続用金属電極の周縁部分に相当)が、
つの形状のものが、保護膜16を突き破るうえで特に有効
である。具体的には本実施例においては、つの部分を含
めた接続用金属電極17の総厚が約20μm、つの以外の部
分の総厚が約17μmに形成した金を用いた。Next, as shown in FIG. 1, the electrode portions of the semiconductor chip 18 are previously provided with the protruding connection metal electrodes 17 formed by gold plating and the connection electrodes formed on the glass plate 11a (semiconductor chip 18). Is in a face-down state), and is electrically connected from the back of the semiconductor chip 18 with a 140 ° C heating tool at a pressure of 3 kg / cm 2 for 30 seconds.
The liquid crystal display was fixed. According to such a connection structure, as shown in FIG.
Melting at the time of thermocompression bonding of the semiconductor chip 18 and being pierced by the protruding connection metal electrode 17 formed on the semiconductor chip 18 due to the applied pressure, flowing and being eliminated by the peripheral portion other than the connection metal electrode 17, The connection is obtained. In addition, the entire surface of the semiconductor chip 18 other than the connection metal electrodes 17 is also bonded by the protective film 16, so that the bonding strength can be significantly improved. Further, the protective film 16 remains in a portion of the connection electrode 14 where the semiconductor chip 18 is not mounted, and is shielded from the outside air, so that a moisture-proof effect can be obtained. In the present embodiment, gold was used as the protruding connection metal electrode 17 on the semiconductor chip 18.
A single substance or a composite substance of silver, copper, platinum, palladium, nickel, or the like may be used. Also, connection metal electrode 17
The cross-sectional shape may be flat or bowl-shaped, but in this embodiment, as shown in FIG. 3, both ends (actually, when viewed from the top, correspond to the periphery of the connection metal electrode). ,
One shape is particularly effective in breaking through the protective film 16. Specifically, in the present embodiment, gold is used in which the total thickness of the connecting metal electrode 17 including one portion is approximately 20 μm and the total thickness of the other portions is approximately 17 μm.
次いで、本実施例により得た液晶表示装置の防湿効果
を確認するために、前記液晶表示装置10個について、そ
れぞれ印加電圧DC15Vを印加しながら、60℃で90〜95%R
Hの恒温恒湿雰囲気中に投入し、耐電食性試験を行っ
た。これにより得た結果を次の表に示した。Next, in order to confirm the moisture-proof effect of the liquid crystal display device obtained in this example, 90-95% R at 60 ° C. was applied to each of the ten liquid crystal display devices while applying an applied voltage of 15 V DC.
H was placed in a constant temperature and constant humidity atmosphere, and an electrolytic corrosion resistance test was performed. The results obtained are shown in the following table.
さらに比較例1,2として従来技術により液晶表示装置
を作製した。Further, as Comparative Examples 1 and 2, liquid crystal display devices were manufactured by a conventional technique.
比較例1 第4図に示すように2枚のガラス板1a,1bには、それ
ぞれ透明導電膜4a,4bを形成し、ガラス板1aには、前記
透明導電膜4aが外部に延び接続用電極4aとして庇状に露
出させた液晶パネルを作製した。そしてこの液晶パネル
の庇状部分に形成した前記透明導電膜4aと、予め半導体
チップ7の電解部分に、金めっきで形成した突起形状の
接続用金属電極6に、銀粉末をエポキシ樹脂中に分散さ
せて得た導電性接着剤をディップ法により形成したもの
とを互いに対向させ、位置整合し、載置した後、150℃
で熱硬化し電気的に接続・固定し液晶表示装置を得た。COMPARATIVE EXAMPLE 1 As shown in FIG. 4, transparent conductive films 4a and 4b were formed on two glass plates 1a and 1b, respectively. As 4a, a liquid crystal panel exposed in an eaves shape was produced. Silver powder is dispersed in epoxy resin on the transparent conductive film 4a formed on the eaves-like portion of the liquid crystal panel and on the protruding connection metal electrode 6 formed on the electrolytic portion of the semiconductor chip 7 in advance by gold plating. The conductive adhesive obtained by dipping is opposed to each other, aligned, and placed at 150 ° C.
And then electrically connected and fixed to obtain a liquid crystal display device.
比較例2 比較例2として、比較例1における液晶パネルの庇状
に露出させた透明導電膜4aからなる接続用電極4a上に、
本実施例と同様に、0.8μm厚のニッケルめっき皮膜を
形成した後、さらに0.05μm厚の金めっき皮膜を形成
し、前記比較例1と同様の方法で、半導体チップ7を電
気的に接続・固定し液晶表示装置を得た。Comparative Example 2 As Comparative Example 2, on the connection electrode 4a made of the transparent conductive film 4a exposed in an eaves shape of the liquid crystal panel in Comparative Example 1,
After forming a nickel plating film having a thickness of 0.8 μm, a gold plating film having a thickness of 0.05 μm was further formed in the same manner as in the present embodiment. It was fixed to obtain a liquid crystal display device.
これら比較例1,2において本実施例と同様に、それぞ
れ液晶表示装置10個ずつについて、耐電食性試験を行っ
た。これにより得た結果を次の表1に示した。In these Comparative Examples 1 and 2, similarly to the present Example, an electrolytic corrosion resistance test was performed on ten liquid crystal display devices. The results obtained are shown in Table 1 below.
前記表に示すとおり、本実施例における液晶表示装置
は、耐電食性試験において、電食断線不良は全く発生し
なかった。 As shown in the above table, in the liquid crystal display device of the present example, in the electric corrosion resistance test, no electric corrosion breakage failure occurred at all.
発明の効果 本発明のように構成した半導体装置は、絶縁性基板上
に形成した透明導電膜上に金属皮膜と合成樹脂からなる
保護膜を形成した2重の保護膜構成により、半導体チッ
プが載置されない部分の透明導電膜の耐湿性,防塵性を
著しく向上できるとともに、半導体チップをフェースダ
ウン状で電気的に接続・固定において、その電気的接続
は、突起形状の接続用金属電極が、合成樹脂からなる保
護膜を突き破り、透明導電膜上に形成した金属皮膜に食
い込むように接続されるためオーミックな接続が得られ
(通常、金属皮膜表面は、透明導電膜表面より、表面粗
さが大きいため食い込み易い)、かつ、この状態で、合
成樹脂からなる保護膜で半導体チップの接続用金属電極
以外の部分が全面接着・固定されるため接続信頼性を著
しく向上できる。また液晶表示装置におけるクロストー
ク防止のために、抵抗値を低減する目的で、透明導電膜
上に金属皮膜を形成する試みも、従来は、電食断線が完
全に防止できなかったが、本発明の構成により、達成で
きるなど、半導体チップ実装タイプの液晶表示装置とし
て、高信頼性,高品位のものが得られるなど極めて工業
的価値の大なるものである。Effect of the Invention In a semiconductor device configured as in the present invention, a semiconductor chip is mounted by a double protective film configuration in which a protective film made of a metal film and a synthetic resin is formed on a transparent conductive film formed on an insulating substrate. The moisture resistance and dust resistance of the transparent conductive film in the part where it is not placed can be significantly improved, and the semiconductor chip is electrically connected and fixed in a face-down manner. An ohmic connection is obtained because the connection is made to penetrate the protective film made of resin and penetrate into the metal film formed on the transparent conductive film (usually, the surface of the metal film has a larger surface roughness than the surface of the transparent conductive film) In this state, the entire surface of the semiconductor chip other than the connection metal electrodes is adhered and fixed with a protective film made of a synthetic resin, thereby significantly improving connection reliability. it can. Also, attempts to form a metal film on a transparent conductive film for the purpose of reducing the resistance value in order to prevent crosstalk in a liquid crystal display device have hitherto failed to completely prevent electrolytic corrosion disconnection. With such a configuration, a semiconductor chip mounting type liquid crystal display device having a high reliability and a high quality can be obtained.
第1図は本発明の一実施例の半導体装置の部分断面図、
第2図a,bは本発明の一実施例の構成を説明するための
部分断面図、第3図は本発明の一実施例に用いた突起形
状の接続用金属電極を設けた半導体チップを示す部分断
面図、第4図は従来の半導体装置の接続状態を示す部分
断面図である。 11a,11b……絶縁性基板、12……液晶、13……シール
剤、14a,14b……透明導電膜、15……金属皮膜、16……
保護膜、17……接続用金属電極、18……半導体チップ。FIG. 1 is a partial sectional view of a semiconductor device according to one embodiment of the present invention,
2a and 2b are partial cross-sectional views for explaining the configuration of one embodiment of the present invention, and FIG. 3 is a semiconductor chip provided with a protruding connection metal electrode used in one embodiment of the present invention. FIG. 4 is a partial sectional view showing a connection state of a conventional semiconductor device. 11a, 11b: insulating substrate, 12: liquid crystal, 13: sealant, 14a, 14b: transparent conductive film, 15: metal film, 16 ...
Protective film, 17 ... Metal electrode for connection, 18 ... Semiconductor chip.
Claims (1)
た透明導電膜からなる接続用電極を設け、この接続用電
極上に、合成樹脂からなる保護膜を形成し、突起形状の
接続用金属電極を設けた半導体チップが、前記絶縁性基
板上に形成した前記接続用電極と互いに対向するように
配設され、前記半導体チップの接続用金属電極が熱圧着
により、前記保護膜を突き破り、前記接続用電極と電気
的に導通するように取付けた半導体装置。A connection electrode comprising a transparent conductive film having a metal film formed on a surface thereof is provided on an insulating substrate, and a protective film made of a synthetic resin is formed on the connection electrode to form a projection-shaped connection. A semiconductor chip provided with metal electrodes for connection is disposed so as to face the connection electrodes formed on the insulating substrate, and the metal electrodes for connection of the semiconductor chip break through the protective film by thermocompression bonding. A semiconductor device mounted so as to be electrically connected to the connection electrode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32099988A JP2780293B2 (en) | 1988-12-19 | 1988-12-19 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32099988A JP2780293B2 (en) | 1988-12-19 | 1988-12-19 | Semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02165073A JPH02165073A (en) | 1990-06-26 |
| JP2780293B2 true JP2780293B2 (en) | 1998-07-30 |
Family
ID=18127657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32099988A Expired - Fee Related JP2780293B2 (en) | 1988-12-19 | 1988-12-19 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2780293B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000002243A1 (en) | 1998-07-01 | 2000-01-13 | Seiko Epson Corporation | Semiconductor device, method of manufacture, circuit board, and electronic device |
| JP4288517B2 (en) * | 1998-07-01 | 2009-07-01 | セイコーエプソン株式会社 | Manufacturing method of semiconductor device |
| KR100543039B1 (en) * | 1998-07-31 | 2006-04-06 | 삼성전자주식회사 | Liquid crystal display |
| JP2002006330A (en) * | 2000-06-19 | 2002-01-09 | Micro Gijutsu Kenkyusho:Kk | Liquid crystal display device substrate and circuit mounting method thereof |
| US20070075436A1 (en) | 2003-10-06 | 2007-04-05 | Nec Corporation | Electronic device and manufacturing method of the same |
-
1988
- 1988-12-19 JP JP32099988A patent/JP2780293B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02165073A (en) | 1990-06-26 |
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