JP2797751B2 - Manufacturing method of vapor deposition material - Google Patents
Manufacturing method of vapor deposition materialInfo
- Publication number
- JP2797751B2 JP2797751B2 JP3091692A JP9169291A JP2797751B2 JP 2797751 B2 JP2797751 B2 JP 2797751B2 JP 3091692 A JP3091692 A JP 3091692A JP 9169291 A JP9169291 A JP 9169291A JP 2797751 B2 JP2797751 B2 JP 2797751B2
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- deposition material
- ceramic filter
- inclusions
- melt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
Landscapes
- Manufacture And Refinement Of Metals (AREA)
- Physical Vapour Deposition (AREA)
Description
【０００１】[0001]
【産業上の利用分野】この発明は、真空蒸着法により薄
膜を形成する際の蒸発源として用いられる蒸着材の製造
方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an evaporation material used as an evaporation source when forming a thin film by a vacuum evaporation method.
【０００２】[0002]
【従来の技術】従来、情報記録媒体としてのＶＴＲ用磁
気テ−プや、コンピュ−タのフロッピ−ディスク等で
は、通常、プラスチックフィルム上に磁性体薄膜を真空
蒸着法もしくはスパッタリング法により形成している。
上記の真空蒸着法の場合、蒸発源としてはＮｉ合金、Ｃ
ｒ合金、Ｃｏ合金等の蒸着材が好適に用いられる。2. Description of the Related Art Conventionally, in a magnetic tape for a VTR as an information recording medium or a floppy disk of a computer, a magnetic thin film is usually formed on a plastic film by a vacuum evaporation method or a sputtering method. I have.
In the case of the above vacuum deposition method, Ni alloy, C
A vapor deposition material such as an r alloy or a Co alloy is preferably used.
【０００３】上記の蒸着材は、通常、蒸着材の原料を真
空中で加熱溶融した後、インゴットとして鋳造し、塑性
加工、機械加工がなされて棒状もしくは板状の蒸着材と
される。[0003] The above-mentioned vapor deposition material is usually heated and melted in a vacuum, then cast as an ingot, subjected to plastic working and mechanical processing to be a rod-shaped or plate-shaped vapor deposition material.
【０００４】[0004]
【発明が解決しようとする課題】ところで、従来の蒸着
材の製造方法では、蒸着材の原料を真空中で加熱溶融
し、その後鋳造しているが、加熱溶融、鋳造時に発生し
た酸化物系の介在物（蒸着材の原料である金属の酸化
物）及び炉材として使用されている耐火物が蒸着材内に
巻き込まれ、製品としての蒸着材の純度が低下するとい
う問題があった。By the way, in the conventional method of manufacturing a vapor deposition material, the material of the vapor deposition material is heated and melted in a vacuum, and then cast. There was a problem that inclusions (metal oxides, which are the raw materials of the vapor deposition material) and refractories used as furnace materials were caught in the vapor deposition material, and the purity of the vapor deposition material as a product was reduced.
【０００５】また、この様な蒸着材を用いて真空蒸着を
行った場合、蒸着時に溶湯面に前記介在物の膜が形成さ
れるために、蒸着速度が変化し、安定な操業が困難にな
るという問題もあった。[0005] Further, when vacuum deposition is performed using such a deposition material, a film of the inclusion is formed on the surface of the molten metal at the time of deposition, so that the deposition rate changes and stable operation becomes difficult. There was also a problem.
【０００６】本発明は、上記従来技術の有する問題点に
鑑みてなされたものであり、無機多孔質体の整流作用に
より介在物の巻込み防止を図って、蒸着材の純度を高め
るとともに、表面が清浄で加工性が向上する蒸着材の製
造方法を提供することを目的としている。[0006] The present invention addresses the problems of the prior art.
It was made in view of the rectification of inorganic porous material.
Increasing the purity of the deposition material to prevent inclusions
In addition, it is an object of the present invention to provide a method for producing a deposition material having a clean surface and improved workability .
【０００７】[0007]
【課題を解決するための手段】上記目的を達成するため
の本発明は、真空蒸着法の蒸着源として用いられる蒸着
材の製造方法であって、蒸着材の原料としてのＣｏまた
はＣｏ基合金を加熱溶融し、得られた溶融物を、内部に
ジルコニア系無機多孔質体を備えたタンディッシュ内に
流し込むことにより、前記ジルコニア系無機多孔質体を
通過させ、その後鋳造することを特徴とするものであ
る。[MEANS FOR SOLVING THE PROBLEMS] To achieve the above object
The present invention is a method for producing an evaporation material used as an evaporation source in a vacuum evaporation method, wherein Co or
Heats and melts a Co-based alloy and places the resulting melt inside.
In a tundish with zirconia-based inorganic porous material
By pouring, it passed through the zirconia inorganic porous body, der those characterized by subsequently casting
You .
【０００８】ここで、前記溶融物を無機多孔質体を通過
させるのは、該無機多孔質体の有する整流作用により溶
湯の流れを穏やかにし介在物の混入、溶湯の跳ねを防止
し、該溶融物中に含まれる介在物を除去するためであ
る。The reason why the molten material is passed through the inorganic porous material is that the flow of the molten metal is moderated by the rectifying action of the inorganic porous material to prevent inclusion of inclusions and splashing of the molten metal. This is for removing inclusions contained in the object.
【０００９】[0009]
【作用】この発明の蒸着材の製造方法では、前記溶融物
を無機多孔質体を通過させることにより、溶湯が乱流状
態から整流状態へと変化する。これにより溶湯表面に浮
遊する介在物の巻込みを防止することが可能となる。ま
た、鋳型表面への跳ねもなくなりインゴットの鋳肌表面
が清浄になり加工性が向上し、結果として歩留まりが向
上する。In the method for producing a vapor deposition material according to the present invention, the molten metal is changed from a turbulent state to a rectified state by passing the melt through an inorganic porous material. This makes it possible to prevent inclusions floating on the surface of the molten metal from being involved. Also, the surface of the casting surface of the ingot is not cleaned and the workability is improved, and as a result, the yield is improved.
【００１０】更に、溶湯の中に含まれる微細な介在物が
無機多孔質体の表面に吸着されるため、溶湯自体に含ま
れる介在物の量が減少し純度が向上する。Further, since fine inclusions contained in the molten metal are adsorbed on the surface of the inorganic porous material, the amount of inclusions contained in the molten metal itself is reduced, and the purity is improved.
【００１１】[0011]
【実施例】以下、この発明の一実施例について説明す
る。まず、蒸着材を製造する際に用いられるセラミック
フィルタ（無機多孔質体）について図２に基づき説明す
る。An embodiment of the present invention will be described below. First, a ceramic filter (inorganic porous body) used when manufacturing a deposition material will be described with reference to FIG.
【００１２】図１２は、セラミックフィルタ１の全体斜
視図である。このセラミックフィルタ１はジルコニア系
（例えばＺｒＯ 2 ≦９７％）の材質よりなる無機多孔質
体で、外形寸法が幅（Ｗ）１５０mm×厚み（Ｔ）２５mm
×高さ（Ｈ）１００mm、孔の寸法が約１０〜３０ppi（p
pi：１inchの長さ当りを横切る孔の数）のものである。
孔の寸法を１０〜３０ppiとしたのは、１０以下の場合
粗すぎてフィルタ効果が失われ、また、３０以上の場合
密すぎて溶融物が通過しないからである。FIG. 12 is an overall perspective view of the ceramic filter 1. This ceramic filter 1 is made of zirconia
(For example, ZrO 2 ≦ 97%) made of an inorganic porous material having an outer dimension of 150 mm in width (W) × 25 mm in thickness (T)
X height (H) 100mm, hole size is about 10-30ppi (p
pi: the number of holes crossing the length of one inch).
The reason why the size of the holes is set to 10 to 30 ppi is that if it is less than 10, the filter effect is lost because it is too coarse, and if it is more than 30, the melt is too dense to pass.
【００１３】次に、この発明の蒸着材の製造方法につい
て図１を基に説明する。まず、表１の組成となる様に蒸
着材の原料としてのＣｏまたはＣｏ基合金をそれぞれ所
定量秤量する。Next, a method of manufacturing a deposition material according to the present invention will be described with reference to FIG. First, a predetermined amount of Co or a Co-based alloy as a raw material of a vapor deposition material is weighed so that the composition shown in Table 1 is obtained.
【表１】 これらの原料としては通常３Ｎ以上の金属塊を用いる。
これらの原料を溶解炉１１中で高周波誘導加熱等の方法
で溶解する。電子ビーム炉やアーク炉に置き換えても全
く同様に加熱溶融することができる。[Table 1] Usually, a metal lump of 3N or more is used as these raw materials.
These raw materials are melted in a melting furnace 11 by a method such as high-frequency induction heating. Even if it is replaced with an electron beam furnace or an arc furnace, it can be heated and melted in the same manner.
【００１４】次に、得られた溶融物１２Ａを、真空中、
あるいは不活性もしくは還元性のいずれかの雰囲気中に
おいて、セラミックフィルタ１で仕切られた底浅のタン
ディッシュ（耐熱容器）１３内に流し込み、この溶融物
１２Ａをセラミックフィルタ１を通過させ、タンディッ
シュ１３の底部１３ａの流出口１４から下方に流出させ
る。Next, the obtained melt 12A is placed in a vacuum,
Alternatively, the molten material 12A is poured into a shallow bottomed tundish (heat-resistant container) 13 partitioned by the ceramic filter 1 in an inert or reducing atmosphere, and the melt 12A is passed through the ceramic filter 1 so that the tundish 13 From the outlet 14 of the bottom 13a.
【００１５】通過する溶融物１２Ｂは、セラミックフィ
ルタ１の整流作用により穏やかな流れとなる。この結
果、介在物１５，…の巻込みが防止でき、跳ねもなくな
りインゴットの鋳肌がきれいになり加工性が向上する。
また、溶融物１２Ｂは、セラミックフィルタ１を通過す
る間に内部に含まれる介在物１５，…が効果的に除去さ
れて高純度化される。The passing molten material 12B has a gentle flow due to the rectifying action of the ceramic filter 1. As a result, the inclusions of the inclusions 15,... Can be prevented, and there is no rebound, the casting surface of the ingot becomes clean, and the workability is improved.
Further, the inclusions 15,... Contained in the melt 12B while passing through the ceramic filter 1 are effectively removed, and the melt 12B is highly purified.
【００１６】凝固した蒸着材１７はインゴットケ−ス１
６から取り出され、製品とされる。また、使用者の要求
寸法に応じ更に熱間加工が加えられ製品とされる。The solidified vapor deposition material 17 is an ingot case 1
6 and taken out as a product. Further, hot working is further performed in accordance with the dimensions required by the user to obtain a product.
【００１７】表２は、上記の製造方法による蒸着材（実
施例）と従来の製造方法による蒸着材（比較例）各々の
特性を比較したものである。介在物評価試験は、図３に
示す様に、約２ｃｍ角の試料に真空中で電子ビームをあ
てて溶解し凸面状の金属塊２１とし、この時に金属塊２
１の表面に浮上した介在物２２の面積を計測し、該介在
物２２の面積率を求め評価を行った。Table 2 shows a comparison between the characteristics of the vapor deposition material produced by the above-described production method (Example) and the characteristics of the vapor deposition material produced by the conventional production method (Comparative Example). In the inclusion evaluation test, as shown in FIG. 3, an approximately 2 cm square sample was irradiated with an electron beam in a vacuum to dissolve it into a convex metal lump 21.
The area of the inclusions 22 floating on the surface of Sample No. 1 was measured, and the area ratio of the inclusions 22 was determined and evaluated.
【表２】 表２から明らかな様に、この発明の蒸着材では、鋳造状
況、介在物評価試験結果共に比較例と比べて大幅に向上
していることがわかる。[Table 2] As is clear from Table 2, in the vapor deposition material of the present invention, both the casting condition and the results of the inclusion evaluation test are significantly improved as compared with the comparative example.
【００１８】以上説明した様に、上記実施例の蒸着材１
７の製造方法によれば、蒸着材１７の原料を溶解炉１１
中に充填して加熱溶融し、得られた溶融物１２Ａを、真
空中、あるいは不活性もしくは還元性のいずれかの雰囲
気中において、タンディッシュ１３内に流し込み、この
溶融物１２Ａをセラミックフィルタ１を通過させ、この
溶融物１２Ｂをインゴットケ−ス１６に鋳造し蒸着材１
７としたので、セラミックフィルタ１の整流作用により
溶融物１２Ａの表面に浮かぶ介在物１５，…の巻込みを
防止でき、溶湯の跳ねもなくなるので鋳肌表面がきれい
になり、インゴットの加工性を向上させることができ
る。更に、インゴット表面に介在物１５，…が付着する
こともなくなり、表面加工の手間を省くことができる。As described above, the vapor deposition material 1 of the above embodiment is used.
7, the raw material of the vapor deposition material 17 is supplied to the melting furnace 11
The resulting melt 12A is poured into a tundish 13 in a vacuum or in an inert or reducing atmosphere, and the melt 12A is passed through the ceramic filter 1. The molten material 12B is cast into an ingot case 16 and
7, it is possible to prevent inclusions 15,... Floating on the surface of the melt 12A by the rectifying action of the ceramic filter 1 and prevent the molten metal from splashing, so that the casting surface is clean and the workability of the ingot is improved. Can be done. Furthermore, the inclusions 15,... Do not adhere to the surface of the ingot, so that the time for surface processing can be saved.
【００１９】また、溶融物１２Ｂ中に含まれる介在物１
５，…を効果的に除去することができ、インゴットを高
純度化することができる。The inclusions 1 contained in the melt 12B
Can be effectively removed, and the ingot can be highly purified.
【００２０】図４は、セラミックフィルタ１の他の設置
例を示す図であり、上記のタンディッシュ１３の底部１
３ａの流出口１４を拡径し、セラミックフィルタ１をこ
の流出口２５に嵌入したものである。FIG. 4 is a view showing another example of installation of the ceramic filter 1.
The outlet 14a of 3a is enlarged in diameter, and the ceramic filter 1 is fitted into the outlet 25.
【００２１】図５は、セラミックフィルタ３１の全体斜
視図である。このセラミックフィルタ３１は、ＺｒＯ2
（ジルコニア）等を主成分とする円筒状の無機多孔質体
で、外形寸法が外径（φo）１００mm×高さ（Ｈ）１０
０mm、中央のくり抜き部の内径（φi）が５０mm、孔の
寸法が約１０〜３０ppiのものである。FIG. 5 is an overall perspective view of the ceramic filter 31. This ceramic filter 31 is made of ZrO 2
(Zirconia) etc. as a main component, a cylindrical inorganic porous material, whose outer dimensions are 100 mm in outer diameter (φ o ) × 10 in height (H)
0 mm, the inside diameter (φ i ) of the central hollow portion is 50 mm, and the size of the hole is about 10 to 30 ppi.
【００２２】図６は、セラミックフィルタ３１の設置例
を示す図であり、セラミックフィルタ３１をタンディッ
シュ１３の底部１３ａの流出口１４に同軸的に載置した
ものである。FIG. 6 is a view showing an example of installation of the ceramic filter 31, in which the ceramic filter 31 is coaxially mounted on the outlet 14 of the bottom 13 a of the tundish 13.
【００２３】このように、セラミックフィルタ１，３１
は、タンディッシュ１３の形状に合わせて様々な形態で
設置することが可能である。As described above, the ceramic filters 1 and 31
Can be installed in various forms according to the shape of the tundish 13.
【００２４】[0024]
【発明の効果】以上説明した様に、この発明の蒸着材の
製造方法によれば、真空蒸着法の蒸発源として用いられ
る蒸着材の製造方法であって、前記蒸着材の原料として
のＣｏまたはＣｏ基合金を加熱溶融し、得られた溶融物
を、内部にジルコニア系無機多孔質体を備えたタンディ
ッシュ内に流し込むことにより、前記ジルコニア系無機
多孔質体を通過させ、その後鋳造することとしたので、
前記流し込み時に発生した溶融物の乱流状態をジルコニ
ア系無機多孔質体により整流状態とし、これにより介在
物の巻込みを防ぎ、溶湯の跳ねがなくなるために鋳肌表
面がきれいになり、インゴットの加工性を向上させるこ
とができる。更に、インゴット表面に介在物が付着する
こともなくなり、表面加工の手間を省くことができる。
また、ＣｏまたはＣｏ基合金の融点が約１５００℃と高
温であるにもかかわらず、無機多孔質体として高温強度
や耐熱衝撃に優れたジルコニア系のものを使用すること
により、ＣｏまたはＣｏ基合金との反応を抑制し、上記
整流作用を十分に発揮することができる。 As described above, according to the method for producing a vapor deposition material of the present invention, a method for producing a vapor deposition material used as an evaporation source in a vacuum vapor deposition method is provided.
Of Co or a Co-based alloy is heated and melted, and the obtained melt is tanned with a zirconia-based inorganic porous material inside.
The zirconia-based inorganic material is poured into the
Since it was decided to pass through the porous body and then cast
The turbulent state of the melt generated at the time of
A rectifying state is provided by the inorganic porous body , thereby preventing inclusions from being caught and eliminating the splashing of the molten metal, so that the casting surface becomes clean and the workability of the ingot can be improved. Further, no inclusions are attached to the surface of the ingot, and the time and effort for surface processing can be saved.
Further, the melting point of Co or a Co-based alloy is as high as about 1500 ° C.
High temperature strength as inorganic porous material despite its high temperature
Use a zirconia-based material with excellent thermal shock resistance
By suppressing the reaction with Co or Co-based alloy,
The rectifying action can be sufficiently exhibited.
【００２５】また、溶融物中に含まれる介在物を効果的
に除去することができ、インゴットを高純度化すること
ができる。Further, inclusions contained in the melt can be effectively removed, and the ingot can be highly purified.
【図面の簡単な説明】[Brief description of the drawings]
【図１】本発明の蒸着材の製造方法を示す一概略図であ
る。FIG. 1 is a schematic view showing a method for producing a vapor deposition material of the present invention.
【図２】本発明の製造方法において用いられるセラミッ
クフィルタの一実施例を示す全体斜視図である。FIG. 2 is an overall perspective view showing one embodiment of a ceramic filter used in the manufacturing method of the present invention.
【図３】介在物評価試験の試料形状を示す図である。FIG. 3 is a diagram showing a sample shape in an inclusion evaluation test.
【図４】本発明のセラミックフィルタの他の設置例を示
す図である。FIG. 4 is a view showing another installation example of the ceramic filter of the present invention.
【図５】本発明の製造方法において用いられるセラミッ
クフィルタの他の一実施例を示す全体斜視図である。FIG. 5 is an overall perspective view showing another embodiment of the ceramic filter used in the manufacturing method of the present invention.
【図６】本発明のセラミックフィルタの他の設置例を示
す図である。FIG. 6 is a view showing another installation example of the ceramic filter of the present invention.
１，３１ セラミックフィルタ １１ 溶解炉 １２Ａ，１２Ｂ 溶融物 １３ タンディッシュ（耐熱容器） １５ 介在物 １６ インゴットケ−ス １７ 蒸着材 Reference Signs List 1,31 Ceramic filter 11 Melting furnace 12A, 12B Melt 13 Tundish (heat-resistant container) 15 Inclusion 16 Ingot case 17 Evaporation material
フロントページの続き (72)発明者 佐藤 昭文 埼玉県桶川市上日出谷1230番地 三菱マ テリアル株式会社 桶川第一製作所内 (56)参考文献 特開 平２−159371（ＪＰ，Ａ) 特開 昭49−41226（ＪＰ，Ａ) (58)調査した分野(Int.Cl.6，ＤＢ名) C23C 14/00 - 14/58 B22D 7/12Continuation of the front page (72) Inventor Akifumi Sato 1230 Kamijiya, Okegawa-shi, Saitama Mitsubishi Materials Corporation Okegawa Daiichi Mfg. Co., Ltd. (56) References JP-A-2-159371 (JP, A) JP-A-49 −41226 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) C23C 14/00-14/58 B22D 7/12
Claims (1)
着材の製造方法であって、 蒸着材の原料としてのＣｏまたはＣｏ基合金を加熱溶融
し、得られた溶融物を、内部にジルコニア系無機多孔質
体を備えたタンディッシュ内に流し込むことにより、前
記ジルコニア系無機多孔質体を通過させ、その後鋳造す
ることを特徴とする蒸着材の製造方法。A method for producing a vapor deposition material used as a vapor deposition source in a vacuum vapor deposition method, wherein Co or a Co-based alloy as a raw material of the vapor deposition material is heated and melted , and a zirconia-based melt is obtained inside By pouring into a tundish with inorganic porous material ,
A method for producing a vapor-deposited material, comprising passing through the zirconia-based inorganic porous material and then casting.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3091692A JP2797751B2 (en) | 1991-03-29 | 1991-03-29 | Manufacturing method of vapor deposition material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3091692A JP2797751B2 (en) | 1991-03-29 | 1991-03-29 | Manufacturing method of vapor deposition material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04304360A JPH04304360A (en) | 1992-10-27 |
| JP2797751B2 true JP2797751B2 (en) | 1998-09-17 |
Family
ID=14033564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3091692A Expired - Lifetime JP2797751B2 (en) | 1991-03-29 | 1991-03-29 | Manufacturing method of vapor deposition material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2797751B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002180144A (en) * | 2000-12-15 | 2002-06-26 | Tohoku Tokushuko Kk | Refining method of cobalt material |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02159371A (en) * | 1988-12-12 | 1990-06-19 | Daicel Chem Ind Ltd | Production of te alloy target material |
-
1991
- 1991-03-29 JP JP3091692A patent/JP2797751B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04304360A (en) | 1992-10-27 |
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