JP2807064B2 - Manufacturing method of dinitrile - Google Patents
Manufacturing method of dinitrileInfo
- Publication number
- JP2807064B2 JP2807064B2 JP2192928A JP19292890A JP2807064B2 JP 2807064 B2 JP2807064 B2 JP 2807064B2 JP 2192928 A JP2192928 A JP 2192928A JP 19292890 A JP19292890 A JP 19292890A JP 2807064 B2 JP2807064 B2 JP 2807064B2
- Authority
- JP
- Japan
- Prior art keywords
- complex
- reaction
- tertiary amine
- recovered
- catalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 29
- 150000003512 tertiary amines Chemical class 0.000 claims description 26
- 239000003054 catalyst Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 23
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 14
- 239000001301 oxygen Substances 0.000 claims description 14
- 229910052760 oxygen Inorganic materials 0.000 claims description 14
- 238000004821 distillation Methods 0.000 claims description 12
- 239000012442 inert solvent Substances 0.000 claims description 11
- 150000003839 salts Chemical class 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 9
- 150000004984 aromatic diamines Chemical class 0.000 claims description 5
- 239000000706 filtrate Substances 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- 238000009835 boiling Methods 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 claims description 2
- 229910001882 dioxygen Inorganic materials 0.000 claims description 2
- 238000001914 filtration Methods 0.000 claims description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 20
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 10
- -1 nickel peroxide Chemical class 0.000 description 8
- QLQYLCRMTTXKHS-ZPUQHVIOSA-N (2e,4e)-hexa-2,4-dienedinitrile Chemical compound N#C\C=C\C=C\C#N QLQYLCRMTTXKHS-ZPUQHVIOSA-N 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- GWHJZXXIDMPWGX-UHFFFAOYSA-N 1,2,4-trimethylbenzene Chemical compound CC1=CC=C(C)C(C)=C1 GWHJZXXIDMPWGX-UHFFFAOYSA-N 0.000 description 3
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 3
- 229940045803 cuprous chloride Drugs 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 2
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 2
- DGRGLKZMKWPMOH-UHFFFAOYSA-N 4-methylbenzene-1,2-diamine Chemical compound CC1=CC=C(N)C(N)=C1 DGRGLKZMKWPMOH-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000009776 industrial production Methods 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- ACKFDYCQCBEDNU-UHFFFAOYSA-J lead(2+);tetraacetate Chemical compound [Pb+2].CC([O-])=O.CC([O-])=O.CC([O-])=O.CC([O-])=O ACKFDYCQCBEDNU-UHFFFAOYSA-J 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- QLQYLCRMTTXKHS-HSFFGMMNSA-N (2Z,4E)-hexa-2,4-dienedinitrile Chemical compound N#C\C=C\C=C/C#N QLQYLCRMTTXKHS-HSFFGMMNSA-N 0.000 description 1
- BSVZXPLUMFUWHW-OWOJBTEDSA-N (e)-hex-3-enedinitrile Chemical compound N#CC\C=C\CC#N BSVZXPLUMFUWHW-OWOJBTEDSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 1
- MHQULXYNBKWNDF-UHFFFAOYSA-N 3,4-dimethylbenzene-1,2-diamine Chemical compound CC1=CC=C(N)C(N)=C1C MHQULXYNBKWNDF-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910021589 Copper(I) bromide Inorganic materials 0.000 description 1
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 description 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 1
- WIVXEZIMDUGYRW-UHFFFAOYSA-L copper(i) sulfate Chemical compound [Cu+].[Cu+].[O-]S([O-])(=O)=O WIVXEZIMDUGYRW-UHFFFAOYSA-L 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012259 ether extract Substances 0.000 description 1
- 230000002140 halogenating effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- NTNWKDHZTDQSST-UHFFFAOYSA-N naphthalene-1,2-diamine Chemical compound C1=CC=CC2=C(N)C(N)=CC=C21 NTNWKDHZTDQSST-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 150000003141 primary amines Chemical group 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- VPYJNCGUESNPMV-UHFFFAOYSA-N triallylamine Chemical compound C=CCN(CC=C)CC=C VPYJNCGUESNPMV-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- FYGHSUNMUKGBRK-UHFFFAOYSA-N trimethylbenzene Natural products CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 238000003828 vacuum filtration Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/584—Recycling of catalysts
Landscapes
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は芳香環上に二個の一級アミノ基を有する芳香
族ジアミンを第三級アミン及び第一銅塩から成る触媒の
存在下に酸化する反応において、錯体触媒が不溶な不活
性溶媒を添加し、引き続き蒸留によって錯体触媒が可溶
な第三級アミンを分離し、析出した錯体触媒を回収・再
使用する方法に関する。The present invention relates to the oxidation of an aromatic diamine having two primary amino groups on an aromatic ring in the presence of a catalyst comprising a tertiary amine and a cuprous salt. In this reaction, an inert solvent in which the complex catalyst is insoluble is added, followed by separation of the tertiary amine in which the complex catalyst is soluble by distillation, and recovery and reuse of the precipitated complex catalyst.
ジニトリル類は医薬品原料、工業原料特に高分子原料
として有用である。Dinitrile is useful as a pharmaceutical raw material, an industrial raw material, particularly a polymer raw material.
従来、ムコノニトリル及びその誘導体の製造法として
は1,4−ジシアノ−2−ブテンをハロゲン化した後脱ハ
ロゲン化水素する方法(米国特許第2564102号)、芳香
族ジアジドの分解による方法〔J.Am.chem.Soc.87
(5),1147−8(1965)〕、ベンゼンを触媒の存在下
アンモニアでアミノ化し酸化する方法(米国特許第3579
559号)、アクリロニトリルを触媒の存在下カップリン
グする方法〔J.Orga−nomet.chem.1978,152(2),193
−5〕、及び芳香族o−ジアミンの四酢酸鉛酸化あるい
は過酸化ニッケル酸化による製造法等が公知である。Conventionally, mucononitrile and its derivatives have been produced by halogenating 1,4-dicyano-2-butene followed by dehydrohalogenation (U.S. Pat. No. 2,564,102), or by decomposition of aromatic diazide [J. Am .chem.Soc.87
(5), 1147-8 (1965)], a method for aminating and oxidizing benzene with ammonia in the presence of a catalyst (U.S. Pat.
No. 559), a method of coupling acrylonitrile in the presence of a catalyst [J. Orga-nomet. Chem. 1978, 152 (2), 193].
-5], and a method of producing an aromatic o-diamine by oxidation of lead tetraacetate or oxidation of nickel peroxide is known.
しかしながら四酢酸鉛あるいは過酸化ニッケルによる
芳香族o−ジアミンの酸化には化学量論量の触媒を必要
とする。しかもこれらの方法は収率が60%程度であるた
め工業的に好ましい方法とは言い難い。However, the oxidation of aromatic o-diamine with lead tetraacetate or nickel peroxide requires a stoichiometric amount of catalyst. Moreover, these methods have a yield of about 60% and are not industrially preferable.
一方、芳香族o−ジアミンからムコノニトリルを定量
的に製造する方法としては第三級アミン及び第一銅塩と
を含有してなる触媒の存在下に酸化開環する触媒的製造
方法(特公昭46−5133号)がある。該公報には反応終了
後、反応系から溶媒である過剰の第三級アミンの大半を
留去し、次に触媒とムコノニトリルを含む残渣をエーテ
ルで処理することにより、エーテル層にムコノニトリル
を抽出し、目的物のムコノニトリルを定量的に得る方法
の記述がある。On the other hand, as a method for quantitatively producing mucononitrile from an aromatic o-diamine, a catalytic production method of oxidatively opening a ring in the presence of a catalyst containing a tertiary amine and a cuprous salt (Japanese Patent Publication No. No.-5133). According to the publication, after completion of the reaction, most of the excess tertiary amine as a solvent was distilled off from the reaction system, and then the residue containing the catalyst and mucononitrile was treated with ether to extract mucononitrile in the ether layer. There is a description of a method for quantitatively obtaining the target product, mucononitrile.
本発明者らは該公報の反応方法を追試したところ、高
収率でムコノニトリルが得られるものの、エーテル抽出
の際、残渣として残った触媒はタール状となりフラスコ
壁に付着し、このままでは触媒を回収して再使用するこ
とは困難であり、コスト面及び反応の操作性の面からも
この方法は工業的製造法とは言い難いことがわかった。The present inventors have performed additional tests of the reaction method disclosed in the publication, and although mucononitrile can be obtained in high yield, the catalyst remaining as a residue in ether extraction becomes tar-like and adheres to the flask wall, and the catalyst is recovered as it is. It was found that this method was difficult to reuse, and in terms of cost and operability of the reaction, this method was hardly an industrial production method.
本発明者らはかかる状況に鑑みジニトリルの工業的製
造法につき鋭意検討した結果、不活性溶媒を添加し、過
剰の第三級アミンを分離することにより効果の著しい触
媒回収法を見い出し本発明を完成するに至った。In view of such circumstances, the present inventors have intensively studied an industrial production method of dinitrile, and as a result, have found a catalyst recovery method which is remarkably effective by adding an inert solvent and separating excess tertiary amine. It was completed.
即ち、本発明は芳香核上に隣接して二個の一級アミノ
基を有する芳香族ジアミンを第三級アミンを溶媒とし、
該アミン、第一銅塩、および酸素からなる錯体触媒の存
在下に分子状酸素で酸化してジニトリルを製造する方法
に於いて、反応系内に該錯体触媒を実質的に溶解せず、
且つ、使用する第三級アミンより沸点の高い不活性溶媒
を添加し、反応終了後、過剰の第三級アミンを蒸留回収
するとともに、蒸留残液中に析出した該錯体触媒を濾過
回収したのち、濾液からジエニトリルを分離することを
特徴とするジニトリルの製造法及び回収した触媒をくり
返し使用するジニトリルの製造法である。That is, the present invention uses an aromatic diamine having two primary amino groups adjacent to an aromatic nucleus with a tertiary amine as a solvent,
In the method for producing dinitrile by oxidizing with molecular oxygen in the presence of a complex catalyst comprising the amine, cuprous salt and oxygen, the complex catalyst is not substantially dissolved in the reaction system,
In addition, an inert solvent having a boiling point higher than that of the tertiary amine to be used is added, and after completion of the reaction, excess tertiary amine is recovered by distillation, and the complex catalyst precipitated in the distillation residue is recovered by filtration. A method for producing dinitrile, comprising separating dienitrile from a filtrate, and a method for producing dinitrile, wherein the recovered catalyst is used repeatedly.
本発明の反応を、例えば出発物質としてo−フェニレ
ンジアミンを用いる場合につき式で示すと次のようにな
る。The reaction of the present invention can be represented, for example, as follows when using o-phenylenediamine as a starting material.
上記の反応に於いては第三級アミン及び第一銅塩から
なる触媒が酸素によって酸化され活性な第二銅第三級ア
ミン酸素錯体を生成し、これがジアミンを酸化してニト
リルを生じると考えられる。 In the above reaction, the catalyst consisting of the tertiary amine and cuprous salt is oxidized by oxygen to form an active cupric tertiary amine oxygen complex, which is thought to oxidize the diamine to produce nitrile. Can be
反応に使われた錯体は酸素を吹き込み続けることによ
り、活性な第二銅第三級アミン酸素錯体を再び形成し、
触媒的に働く。しかし、該錯体は反応溶媒である第三級
アミンに可溶である為このままでの回収は困難である。The complex used in the reaction continues to blow oxygen to form an active cupric tertiary amine oxygen complex again,
Works catalytically. However, since the complex is soluble in a tertiary amine which is a reaction solvent, it is difficult to recover the complex as it is.
本発明方法の目的は、反応後錯体を結晶の形で回収す
るとともに該錯体を再使用するジニトリルの工業的製造
法を提供するものである。An object of the method of the present invention is to provide an industrial process for producing dinitrile by recovering the complex in the form of crystals after the reaction and reusing the complex.
本発明の方法に用いる第三級アミンとしては、例えば
トリメチルアミン、トリエチルアミン、トリプロピルア
ミン、トリブチルアミン、トリアリルアミン、ピリジ
ン、2−ピコリン、3−ピコリン、キノリン、イソキノ
リン、モルフォリン、ピペラジン等が挙げられる。好ま
しくはピリジンが用いられる。これらは一種又は二種以
上を混合しても差し支えない。Examples of the tertiary amine used in the method of the present invention include trimethylamine, triethylamine, tripropylamine, tributylamine, triallylamine, pyridine, 2-picoline, 3-picoline, quinoline, isoquinoline, morpholine, piperazine and the like. . Preferably, pyridine is used. These may be used alone or in combination of two or more.
本発明の方法に用いる第一銅塩としては、例えば塩化
第一銅、臭化第一銅、ヨウ化第一銅、硫酸第一銅等が挙
げられる。Examples of the cuprous salt used in the method of the present invention include cuprous chloride, cuprous bromide, cuprous iodide, cuprous sulfate and the like.
これら本発明の触媒の組成である第三級アミンと第一
銅塩の割合は特に規定されるものではないが通常銅一原
子当り、第三級アミン一分子以上が用いられる。Although the ratio of the tertiary amine to the cuprous salt, which is the composition of the catalyst of the present invention, is not particularly limited, one or more tertiary amine molecules are usually used per copper atom.
本発明方法の出発物質である芳香族ジアミン化合物は
芳香核上の隣接位に第一級アミンを結合しているもので
あればよく、その芳香核の他の位置に置換基が結合して
いても何ら差し支えない。The aromatic diamine compound as a starting material of the method of the present invention may be any one in which a primary amine is bonded to an adjacent position on an aromatic nucleus, and a substituent is bonded to another position of the aromatic nucleus. No problem.
本発明の反応に好ましく用いられる芳香族ジアミン化
合物としてはo−フェニレンジアミン、o−トルエンジ
アミン、3,4−ジメチル−o−フェニレンジアミン、4
−クロル−o−フェニレンジアミン、1,2−ジアミノナ
フタリン等を挙げることが出来るが、これらに限定され
るものではない。As the aromatic diamine compound preferably used in the reaction of the present invention, o-phenylenediamine, o-toluenediamine, 3,4-dimethyl-o-phenylenediamine,
-Chloro-o-phenylenediamine, 1,2-diaminonaphthalene and the like, but are not limited thereto.
本発明方法を実施態様に基づき以下に説明する。 The method of the present invention will be described below based on embodiments.
前述の第三級アミン類に第一銅塩を加え、この溶液中
に酸素を吹き込み第三級アミン、第一銅塩及び酸素から
成る錯体を形成する。次に芳香族ジアミン化合物を第三
級アミン又は不活性溶媒に溶解し錯体溶液の中にゆっく
りと滴下する。A cuprous salt is added to the above-mentioned tertiary amines, and oxygen is blown into this solution to form a complex composed of the tertiary amine, cuprous salt and oxygen. Next, the aromatic diamine compound is dissolved in a tertiary amine or an inert solvent and slowly dropped into the complex solution.
芳香族ジアミン化合物溶液を錯体溶液中に滴下する際
は錯体溶液中に酸素の吹き込みを続け、錯体の色が緑色
を保つように芳香族ジアミン化合物の滴下速度を調整す
る。滴下終了後、錯体が不溶である不活性溶媒を反応液
に添加する。ここで、不活性溶媒の添加は反応前、反応
後あるいは滴下する芳香族ジアミン化合物を溶解して反
応中に加えても差支えない。When the aromatic diamine compound solution is dropped into the complex solution, oxygen is continuously blown into the complex solution, and the dropping rate of the aromatic diamine compound is adjusted so that the color of the complex remains green. After completion of the dropwise addition, an inert solvent in which the complex is insoluble is added to the reaction solution. Here, the inert solvent may be added before, after, or after the reaction or by dissolving the aromatic diamine compound added dropwise during the reaction.
反応温度は10〜80℃好ましくは20〜40℃の範囲であ
る。酸素吹き込み速度は芳香族ジアミン1モルに対し0.
1〜10/min、好ましくは0.5〜2/minである。Reaction temperatures range from 10 to 80 ° C, preferably 20 to 40 ° C. Oxygen blowing rate is 0.1 per mole of aromatic diamine.
It is 1 to 10 / min, preferably 0.5 to 2 / min.
添加する不活性溶媒は錯体及び、本発明の反応に対し
て不活性であり、錯体に対し実質的に溶解性を有しない
ならばいずれの溶媒でもよい。具体的には例えばヘキサ
ン、シクロヘキサン、ヘプタン、オクタン、ノナン、デ
カン等の脂肪族炭化水素、ベンゼン、トルエン、キシレ
ン、トリメチルベンゼン、モノクロルベンゼン、ジクロ
ルベンゼン、テトラリン等の芳香族炭化水素が挙げられ
る。The inert solvent to be added may be any solvent as long as it is inert to the complex and the reaction of the present invention and has substantially no solubility in the complex. Specific examples include aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, and decane; and aromatic hydrocarbons such as benzene, toluene, xylene, trimethylbenzene, monochlorobenzene, dichlorobenzene, and tetralin.
添加する不活性溶媒の量としては原料の芳香族ジアミ
ンに対して0.5〜10ml/mmole、好ましくは1〜3ml/mmole
である。The amount of the inert solvent to be added is 0.5 to 10 ml / mmole, preferably 1 to 3 ml / mmole with respect to the starting aromatic diamine.
It is.
本発明方法で用いる不活性溶媒は第三級アミンを含む
混合溶液から第3級アミンを蒸留により留去し分離する
ため、沸点が第三級アミンより10℃以上、好ましくは20
℃以上高いものを選択する必要がある。Since the tertiary amine is distilled off from the mixed solution containing the tertiary amine by distillation, the inert solvent used in the method of the present invention has a boiling point of 10 ° C. or higher than that of the tertiary amine, preferably 20 ° C.
It is necessary to select one higher than ℃.
次に反応混合液から蒸留によって過剰の第三級アミン
を留去し、蒸留残分を冷却すると第一銅塩と第三級アミ
ンから成る錯体が結晶として析出してくる。析出した錯
体は通常の固液分離法で分離される。Next, excess tertiary amine is distilled off from the reaction mixture by distillation, and the distillation residue is cooled, whereby a complex comprising a cuprous salt and a tertiary amine is precipitated as crystals. The precipitated complex is separated by a usual solid-liquid separation method.
具体的方法としては減圧濾過が多用される。分離・回
収された錯体は引き続き反応に使用することが可能で、
2回目以降も1回目と同様な触媒活性を有していた。濾
液は不活性溶媒を留去した後、減圧・蒸留あるいは再結
晶等の精製法を実施することで目的物であるジニトリル
類を得ることができる。As a specific method, vacuum filtration is often used. The separated and recovered complex can be used for the subsequent reaction.
The second and subsequent times had the same catalytic activity as the first time. The filtrate is subjected to a purification method such as distillation under reduced pressure, distillation or recrystallization after distilling off the inert solvent to obtain the desired dinitrile.
本発明の方法に従えば、触媒の回収が容易に行え、回
収した触媒は繰り返し反応に使用する事が出来るため、
高工業的に極めて有利にジニトリル類を製造することが
出来る。According to the method of the present invention, the catalyst can be easily recovered, and the recovered catalyst can be used repeatedly for the reaction.
Dinitriles can be produced very advantageously on a high industrial scale.
実施例1 ピリジン100mlに塩化第一銅3.96gを加え、酸素を100m
l/minで吹込みながら撹拌する。最初黄色い溶液は酸素
を吹込み錯体が形成されるに従い暗緑色となる。1時間
酸素を吹込んだ後、酸素を100ml/minで吹込み続けなが
ら、3,4−ジアミノトルエン12.22gをピリジンに溶解し
た溶液を反応液が暗緑色を保つように滴下した。滴下終
了後反応液にキシレン200mlを加え、ピリジンを留去し
析出した錯体を減圧濾過した。錯体はn−ヘキサンで洗
浄した後、減圧乾燥して回収錯体6.72gを得た。濾液は6
N塩酸で洗浄し飽和炭酸水素ナトリウム水溶液で中和し
た後分離し、キシレンを減圧留去して2−メチル−cis,
cis−ムコノニトリル10.87g(純度98.0%、収率90.2
%)を得た。融点52〜54℃(文献値53〜54℃) 以上の操作によるピリジンの回収率は98.3%であっ
た。Example 1 3.96 g of cuprous chloride was added to 100 ml of pyridine, and oxygen was added to 100 m
Stir while blowing at l / min. Initially, the yellow solution turns dark green as oxygen is bubbled in to form the complex. After injecting oxygen for 1 hour, a solution in which 12.22 g of 3,4-diaminotoluene was dissolved in pyridine was added dropwise while continuing to inject oxygen at 100 ml / min so that the reaction solution remained dark green. After completion of the dropwise addition, 200 ml of xylene was added to the reaction solution, pyridine was distilled off, and the precipitated complex was filtered under reduced pressure. The complex was washed with n-hexane and then dried under reduced pressure to obtain 6.72 g of a recovered complex. The filtrate is 6
The mixture was washed with N hydrochloric acid, neutralized with a saturated aqueous solution of sodium hydrogen carbonate and then separated.
10.87 g of cis-mucononitrile (purity 98.0%, yield 90.2%)
%). Melting point 52-54 ° C (literature value 53-54 ° C) The recovery of pyridine by the above operation was 98.3%.
上記の操作で回収された錯体6.72gを上記の塩化第一
銅のかわりに使用し、同様の操作をさらに2回行ったと
ころ、2回目は2−メチル−cis,cis−ムコノニトリル
を10.66g(純度97.8%、収率88.3%)と回収錯体6.58g
を得、3回目は2−メチル−cis,cis−ムコノニトリル
を9.77g(純度97.8%、収率79.5%)と回収錯体を5.92g
得た。6.72 g of the complex recovered in the above operation was used in place of the cuprous chloride described above, and the same operation was further performed twice. The second time was 10.66 g of 2-methyl-cis, cis-mucononitrile ( Purity 97.8%, yield 88.3%) and recovered complex 6.58g
The third time, 9.77 g of 2-methyl-cis, cis-mucononitrile (purity 97.8%, yield 79.5%) and 5.92 g of recovered complex.
Obtained.
実施例2 実施例1のキシレンのかわりにo−ジクロルベンゼン
を用い、実施例1と同様に反応を3回繰り返したとこ
ろ、1回目は2−メチル−cis,cis−ムコノニトリルを1
0.36g(純度98.2%、収率86.1%)と回収錯体6.89gを得
た。2回目は2−メチル−cis,cis−ムコノニトリルを1
0.28g(純度98.0%、率85.3%)と回収錯体を6.53g得
た。3回目は2−メチル−cis,cis−ムコノニトリルを1
0.03g(純度97.2%、収率82.5%)と回収錯体を6.52g得
た。Example 2 The reaction was repeated three times in the same manner as in Example 1 except that o-dichlorobenzene was used in place of xylene of Example 1. The first time was the reaction of 2-methyl-cis, cis-mucononitrile with 1
0.36 g (purity 98.2%, yield 86.1%) and 6.89 g of the recovered complex were obtained. The second time is 2-methyl-cis, cis-mucononitrile with 1
0.28 g (purity 98.0%, rate 85.3%) and 6.53 g of recovered complex were obtained. Third time, 2-methyl-cis, cis-mucononitrile was added to 1
0.03 g (purity 97.2%, yield 82.5%) and 6.52 g of a recovered complex were obtained.
実施例3 実施例1のキシレンのかわりに1,2,4−トリメチルベ
ンゼンを用い、実施例1と同様に反応を3回繰り返した
ところ、1回目は2−メチル−cis,cis−ムコノニトリ
ルを10.56g(純度96.0%、収率85.8%)と回収錯体6.72
gを得た。2回目は2−メチル−cis,cis−ムコノニトリ
ルを10.32g(純度97.2%、収率84.9%)と回収錯体を6.
23g得た。3回目は2−メチル−cis,cis−ムコノニトリ
ルを10.10g(純度95.2%、収率81.4%)と回収錯体を5.
98g得た。Example 3 The reaction was repeated three times in the same manner as in Example 1 except that 1,2,4-trimethylbenzene was used in place of xylene of Example 1. As a result, the first reaction was performed using 10.56 g of 2-methyl-cis, cis-mucononitrile. g (purity 96.0%, yield 85.8%) and recovered complex 6.72
g was obtained. The second time was 10.32 g of 2-methyl-cis, cis-mucononitrile (purity 97.2%, yield 84.9%) and the recovered complex was 6.
23 g were obtained. The third time was 10.10 g of 2-methyl-cis, cis-mucononitrile (purity 95.2%, yield 81.4%) and the recovered complex was 5.
98g was obtained.
比較例1 実施例1と同様に反応を行い、3,4−トルエンジアミ
ンのピリジン溶液を滴下終了後、反応液から約90%のピ
リジンを蒸留により留去した。次に残渣にエーテル200m
lを加えムコノニトリルを抽出した後、エーテル抽出液
を乾燥濃縮して2−メチル−cis,cis−ムコノニトリル
を11.24g(純度92.5%、収率88%)を得た。Comparative Example 1 The reaction was carried out in the same manner as in Example 1. After the dropwise addition of the pyridine solution of 3,4-toluenediamine, about 90% of pyridine was distilled off from the reaction solution by distillation. Next, ether 200m to the residue
After l was added to extract mucononitrile, the ether extract was dried and concentrated to obtain 11.24 g (purity: 92.5%, yield: 88%) of 2-methyl-cis, cis-mucononitrile.
エーテル抽出の際、不溶物として残った錯体はフラス
コ壁等に付着し、そのままでの回収は困難であった。ま
た蒸留により留去するピリジンの量が約90%であり(そ
れ以上留去すると反応物がフラスコ壁に付着して抽出し
づらい)ピリジンが残っているため、エーテル層に錯体
が一部溶けてしまった。At the time of ether extraction, the complex remaining as an insoluble substance adhered to the flask wall or the like, and it was difficult to recover the complex as it was. In addition, the amount of pyridine distilled off by distillation is about 90% (if it is further distilled, the reaction product adheres to the flask wall and it is difficult to extract). Since the pyridine remains, the complex partially dissolves in the ether layer. Oops.
フロントページの続き (58)調査した分野(Int.Cl.6,DB名) C07C 255/09 C07C 253/00Continuation of front page (58) Field surveyed (Int.Cl. 6 , DB name) C07C 255/09 C07C 253/00
Claims (2)
有する芳香族ジアミンを第三級アミンを溶媒とし、該ア
ミン、第一銅塩、および酸素からなる錯体触媒の存在下
に分子状酸素で酸化してジニトリルを製造する方法に於
いて、反応系内に該錯体触媒を実質的に溶解せず、且
つ、使用する第三級アミンより沸点の高い不活性溶媒を
添加し、反応終了後、過剰の第三級アミンを蒸留回収す
るとともに、蒸留残液中に析出した該錯体触媒を濾過回
収したのち、濾液からジニトリルを分離することを特徴
とするジニトリルの製造法。1. An aromatic diamine having two primary amino groups adjacent to an aromatic nucleus in the presence of a tertiary amine as a solvent in the presence of a complex catalyst comprising said amine, cuprous salt and oxygen. In the method of producing dinitrile by oxidizing with molecular oxygen, the complex catalyst is not substantially dissolved in the reaction system, and an inert solvent having a higher boiling point than the tertiary amine used is added, After the reaction is completed, an excess tertiary amine is recovered by distillation, the complex catalyst precipitated in the distillation residue is recovered by filtration, and then dinitrile is separated from the filtrate.
返し使用するジニトリルの製造法。2. A method for producing dinitrile, wherein the catalyst recovered by the method according to claim 1 is used repeatedly.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2192928A JP2807064B2 (en) | 1990-07-23 | 1990-07-23 | Manufacturing method of dinitrile |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2192928A JP2807064B2 (en) | 1990-07-23 | 1990-07-23 | Manufacturing method of dinitrile |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0482868A JPH0482868A (en) | 1992-03-16 |
| JP2807064B2 true JP2807064B2 (en) | 1998-09-30 |
Family
ID=16299325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2192928A Expired - Fee Related JP2807064B2 (en) | 1990-07-23 | 1990-07-23 | Manufacturing method of dinitrile |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2807064B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006169131A (en) * | 2004-12-13 | 2006-06-29 | Mitsubishi Chemicals Corp | Hydroformylation process |
| JP5553552B2 (en) | 2009-07-24 | 2014-07-16 | 株式会社やまびこ | 2-cycle engine |
-
1990
- 1990-07-23 JP JP2192928A patent/JP2807064B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0482868A (en) | 1992-03-16 |
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