JP2808310B2 - Combustion furnace pressure fluctuation transmission prevention method - Google Patents
Combustion furnace pressure fluctuation transmission prevention methodInfo
- Publication number
- JP2808310B2 JP2808310B2 JP1189352A JP18935289A JP2808310B2 JP 2808310 B2 JP2808310 B2 JP 2808310B2 JP 1189352 A JP1189352 A JP 1189352A JP 18935289 A JP18935289 A JP 18935289A JP 2808310 B2 JP2808310 B2 JP 2808310B2
- Authority
- JP
- Japan
- Prior art keywords
- exhaust gas
- combustion furnace
- combustion
- gas
- ejector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- Incineration Of Waste (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、アルシン、ホスフィン、ジボラン、モノシ
ラン等で代表される有毒性ガスを含む排ガスを燃焼処理
するにあたって、その排ガスの燃焼処理に際して起る燃
焼炉の圧力変動が有毒性排ガス発生源に伝達するのを防
止する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention occurs in the combustion treatment of exhaust gas containing toxic gas represented by arsine, phosphine, diborane, monosilane and the like. The present invention relates to a method for preventing pressure fluctuation of a combustion furnace from being transmitted to a toxic exhaust gas source.
(従来の技術および発明が解決しようとする課題) 半導体製造工程からは、前記した如きガス状の有毒性
物質を含む有毒性排ガスが生成する。このような有毒性
排ガスは人体に対する毒性が極めて高いので、その排ガ
スの大気への放出に際しては、それに含まれる有毒性物
質の完全除去が要求される。(Problems to be Solved by the Related Art and the Invention) From the semiconductor manufacturing process, toxic exhaust gas containing the above-mentioned gaseous toxic substances is generated. Since such toxic exhaust gas is extremely toxic to the human body, it is necessary to completely remove toxic substances contained in the exhaust gas when releasing the exhaust gas into the atmosphere.
排ガス中に含まれる有毒性物質を除去するための有効
な方法の1つとして、燃焼法が知られている(特開昭62
−134414号、特開昭62−152517号)。この方法は、排ガ
ス中の有毒性物質を燃焼条件で酸化分解し、単体元素や
酸化物の固体状物質に変換させて除去する方法である。As one of effective methods for removing toxic substances contained in exhaust gas, a combustion method is known (Japanese Patent Application Laid-Open No. Sho 62-62).
-134414, JP-A-62-152517). This method is a method in which toxic substances in exhaust gas are oxidatively decomposed under combustion conditions, and converted into solid substances such as elemental elements and oxides to remove them.
この固体状物質も有毒であるため完全に燃焼ガス中か
ら除去されなければならないが、生成される固体状物質
は、気相で生成されるためサブミクロンサイズの微粉末
であることから、通常の数ミクロンサイズの微粉末に比
し燃焼ガス中にこの固体微粉末を燃焼ガスから完全除去
するのに著しい困難が生じる。本発明者らは、先に、こ
のような固体微粉末から効率よく除去するために、燃焼
炉内壁に水膜をを流下させ、この水膜に固体微粉末を捕
捉吸収させる一連の有毒性排ガスの燃焼処理方法及び装
置を提案している(特願昭63−218389号、特願昭63−28
4930号)。This solid substance is also toxic and must be completely removed from the combustion gas.However, since the solid substance produced is a submicron-sized fine powder because it is produced in the gas phase, the usual solid substance is produced. Significant difficulties arise in completely removing this solid fine powder from the combustion gas in the combustion gas compared to a fine powder of several microns in size. The present inventors have previously made a series of toxic exhaust gases in which a water film is allowed to flow down on the inner wall of the combustion furnace and the solid fine powder is captured and absorbed by the water film in order to efficiently remove such solid fine powder. (Japanese Patent Application No. 63-218389, Japanese Patent Application No. 63-28)
No. 4930).
ところで、特願昭63−231787号では、燃焼炉の圧力変
動を燃焼炉に設けた伸縮性部材を伸縮させることにより
制御しているが、燃焼炉の圧力変動が伸縮性部材の制御
能力を超すえるような場合には炉内の圧力変動を制御し
きれず、このため、燃焼炉に連なる半導体製造装置に悪
影響を及ぼす恐れがあった。By the way, in Japanese Patent Application No. 63-231787, the pressure fluctuation of the combustion furnace is controlled by expanding and contracting an elastic member provided in the combustion furnace, but the pressure fluctuation of the combustion furnace exceeds the control capability of the elastic member. In such a case, the pressure fluctuation in the furnace cannot be controlled completely, which may adversely affect the semiconductor manufacturing apparatus connected to the combustion furnace.
(課題を解決するための手段) 本発明者らは、燃焼炉内で起る圧力変動の半導体製造
工程への伝達を防止すべく鋭意研究を重ねた結果、燃焼
炉の上流側に加圧駆動気体を噴出させたエゼクターを配
設し、このエゼクターに有毒性排ガスを吸引させるとと
もに、このエゼクターから有毒性排ガスを駆動気体との
混合ガスとして取出し、これを燃焼炉へ導入する時に
は、燃焼炉内で起る圧力変動は、そのエゼクター部で遮
断され、それより上流側には伝達されないことを見出
し、本発明を完成するに至った。(Means for Solving the Problems) The present inventors have conducted intensive studies to prevent transmission of pressure fluctuations occurring in the combustion furnace to the semiconductor manufacturing process, and as a result, a pressure drive was performed on the upstream side of the combustion furnace. An ejector that ejects gas is provided, and the toxic exhaust gas is sucked into the ejector, and the toxic exhaust gas is extracted from the ejector as a mixed gas with the driving gas. Was found to be blocked at the ejector portion and not transmitted to the upstream side thereof, and completed the present invention.
即ち、本発明によれば、有毒性排ガス発生源からの有
毒性排ガスを、加圧駆動気体を噴出させたエゼクターに
吸引させるとともに、該エゼクターから該駆動気体との
混合ガスとして取出し、これを燃焼炉に導入し、バーナ
燃焼させる方法であって、該エゼクターと燃焼炉との間
には逆火防止装置が介在しないことを特徴とする燃焼炉
の圧力変動が有毒性排ガス発生源へ伝達するのを防止す
る方法が提供される。That is, according to the present invention, the toxic exhaust gas from the toxic exhaust gas generation source is sucked into the ejector from which the pressurized driving gas has been ejected, and is taken out from the ejector as a mixed gas with the driving gas, and is burned. A method of introducing into a furnace and burning a burner, wherein a flashback preventing device is not interposed between the ejector and the combustion furnace. Are provided.
(発明の実施例) 本発明の方法を実施する装置の一例を図面について説
明すると、第1図において、1は半導体製造装置等の有
毒性排ガス発生源を示す。2は吸着処理装置、3は燃焼
処理装置、4は逆火防止装置、5は除塵フィルターを各
示す。有毒性排ガス発生源からの有毒性排ガス供給ライ
ン(配管)は、その切換バルブ7及び8により吸着処理
装置2に続くライン9と、逆火防止装置4を介して燃焼
処理装置3に続くライン10とに分岐される。通常の状態
においては、吸着処理装置に続くバルブ7は閉とされ、
逆火防止装置に続くバルブ8は開放される。(Embodiment of the Invention) An example of an apparatus for carrying out the method of the present invention will be described with reference to the drawings. In Fig. 1, reference numeral 1 denotes a toxic exhaust gas source such as a semiconductor manufacturing apparatus. Reference numeral 2 denotes an adsorption treatment device, 3 denotes a combustion treatment device, 4 denotes a flashback prevention device, and 5 denotes a dust filter. A toxic exhaust gas supply line (piping) from the toxic exhaust gas source is connected to a line 9 connected to the adsorption treatment device 2 by the switching valves 7 and 8 and a line 10 connected to the combustion treatment device 3 via the flashback prevention device 4. Branched to In a normal state, the valve 7 following the adsorption device is closed,
The valve 8 following the flashback prevention device is opened.
有毒性排ガス発生源1からの有毒性排ガス(以下、単
に排ガスとも言う)は、ライン6、バルブ8及びライン
10を通って逆火防止装置4を通過した後、ライン11を通
り、バーナ12を通って燃焼処理装置3内に噴出され燃焼
処理される。燃焼排ガスは、ライン13を通って抜出さ
れ、除塵フィルター5及び排気ポンプ14を通って大気へ
放出される。燃焼処理装置3では、有毒性排ガスの燃焼
処理により生成した微粉末は、燃焼処理装置の上端部に
ライン18を介して導入され、炉壁を液膜として流下する
液体及び中間部にライン18を介してスプレーされた液滴
によって捕捉される。微粉末を捕捉した液体は、装置底
部から、ライン15は、液循環ポンプ16、冷却器17を通っ
て再び燃焼炉へ循環される。その循環液の一部はライン
19を通って廃液ドラム20に貯留される。このような燃焼
処理装置は、特願昭63−218389号及び特願昭63−284930
号明細書に記載されている。The toxic exhaust gas (hereinafter, also simply referred to as exhaust gas) from the toxic exhaust gas source 1 is supplied to the line 6, the valve 8, and the line
After passing through the flashback prevention device 4 through 10, it passes through the line 11, passes through the burner 12, and is ejected into the combustion treatment device 3 for combustion treatment. The flue gas is extracted through a line 13 and discharged to the atmosphere through a dust filter 5 and an exhaust pump 14. In the combustion treatment device 3, fine powder generated by the combustion treatment of the toxic exhaust gas is introduced into the upper end portion of the combustion treatment device via the line 18, and the liquid flowing down the furnace wall as a liquid film and the line 18 to the intermediate portion are introduced. Trapped by droplets sprayed through. The liquid capturing the fine powder is circulated from the bottom of the apparatus through the liquid circulation pump 16 and the cooler 17 to the combustion furnace again through the line 15. Part of the circulating fluid is in the line
It is stored in a waste liquid drum 20 through 19. Such a combustion processing apparatus is disclosed in Japanese Patent Application Nos. 63-218389 and 63-284930.
It is described in the specification.
有毒性排ガス発生源と逆火防止装置との間のラインに
は、必要に応じ、可燃性ガスがライン21を通って導入さ
れ、燃焼バーナー12には支燃ガスとしての酸素又は空気
がライン22を通って導入される。燃焼バーナへの排ガス
供給ライン11には、窒素ガスライン23がバルブ25及びラ
イン27を介して接続されるとともに、給水ライン24がバ
ルブ26及びライン27を介して接続され、必要に応じ、窒
素ガスと水との混合物が排ガス供給ライン27を通って燃
焼バーナノズル内を流れるようになっている。水と窒素
ガスとの混合物を燃焼バーナノズル内を流通させること
によって、バーナノズルの洗浄を行うことができる。If necessary, a flammable gas is introduced into the line between the toxic exhaust gas source and the flashback prevention device through a line 21, and oxygen or air as a supporting gas is supplied to the combustion burner 12 through a line 22. Introduced through. To the exhaust gas supply line 11 to the combustion burner, a nitrogen gas line 23 is connected via a valve 25 and a line 27, and a water supply line 24 is connected via a valve 26 and a line 27. A mixture of water and water flows through the exhaust gas supply line 27 in the combustion burner nozzle. By flowing the mixture of water and nitrogen gas through the combustion burner nozzle, the burner nozzle can be cleaned.
本発明においては、前記したように燃焼処理装置3の
バーナ12に至るライン11に加圧駆動気体aを噴出させた
エゼクター28を介設させ、排ガスを、エゼクターから繰
胴気体との混合ガスとして取出し、これをバーナ12に送
入する。In the present invention, as described above, the ejector 28 that ejects the pressurized driving gas a is provided in the line 11 that reaches the burner 12 of the combustion processing apparatus 3, and the exhaust gas is mixed from the ejector with the cylinder gas as a mixed gas. Take it out and send it to burner 12.
このエセクター28は、一般に使用されるエセグターと
同様のものであって、第2図に明らかなようにノズル部
分29、吸引室部分30、デフューザー部分31よりなり、加
圧された駆動気体aをノズル33から噴射すると吸引室34
は減圧となり、排ガスbが吸引されて両者が激しく混合
しながらデフューザー35内を通過する。このようにして
エゼクターを通過した排ガスを燃焼バーナ12に導入して
燃焼処理する時には、燃焼処理装置の燃焼炉内に圧力変
動が生じても、この圧力変動の伝達はエゼクター28によ
って遮断され、エゼクター28より上流側には伝達されな
い。This e-sector 28 is similar to a commonly-used e-segmenter, and includes a nozzle portion 29, a suction chamber portion 30, and a diffuser portion 31, as shown in FIG. Suction chamber 34 when injected from 33
Is reduced, exhaust gas b is sucked, and the two pass through the diffuser 35 while being vigorously mixed. When the exhaust gas that has passed through the ejector in this way is introduced into the combustion burner 12 for combustion treatment, even if a pressure fluctuation occurs in the combustion furnace of the combustion processing device, the transmission of the pressure fluctuation is blocked by the ejector 28, and the ejector 28 is blocked. It is not transmitted upstream from 28.
エゼクター28における駆動気体としては、窒素、水
素、メタン、プロパン等の各種のガスが用いられる。駆
動気体の圧力は、デュフューザー出口圧力の2〜15倍、
好ましくは3〜10倍にするのがよく、また、デュフュー
ザー出口圧力は、吸引される排ガス圧力の1〜10倍、好
ましくは1〜5倍にするのがよい。As the driving gas in the ejector 28, various gases such as nitrogen, hydrogen, methane, and propane are used. The pressure of the driving gas is 2 to 15 times the outlet pressure of the diffuser,
The pressure is preferably 3 to 10 times, and the outlet pressure of the diffuser is 1 to 10 times, preferably 1 to 5 times the pressure of the exhaust gas to be sucked.
(発明の効果) 本発明は、以上のように、燃焼炉のバーナ上流側にエ
ゼクターを通してエゼクター駆動気体との混合ガスとし
て取出し、これを燃焼炉へ導入することにより、燃焼炉
内で起る圧力変動の燃焼炉上流側への伝達を、そのエゼ
クター部で遮断し、有毒性排ガス発生源に伝達すること
を防止したものである。従って、本発明によれば、有毒
性排ガス発生源である半導体製造装置において圧力条件
が何ら変動しないことから、その半導体装置では安定な
操業を行うことができる。(Effect of the Invention) As described above, according to the present invention, a pressure generated in a combustion furnace is obtained by extracting a mixed gas with an ejector driving gas through an ejector upstream of a burner of the combustion furnace and introducing the mixed gas to the combustion furnace. The transmission of the fluctuations to the upstream side of the combustion furnace is blocked by the ejector portion to prevent the fluctuations from being transmitted to the toxic exhaust gas source. Therefore, according to the present invention, since the pressure condition does not fluctuate at all in the semiconductor manufacturing apparatus which is a toxic exhaust gas generation source, stable operation can be performed in the semiconductor apparatus.
第1図は本発明の方法を実施する装置の系統図、第2図
は同じくエゼクタの縦断面図である。 1……有毒性排ガス発生源 2……吸着処理装置 3……燃焼処理装置 7,8……切換バルブ 12……バーナ 16……液循環ポンプ 28……エゼクター 33……ノズル、 34……吸引室 35……デュフューザー a……駆動気体 b……有毒性排ガスFIG. 1 is a system diagram of an apparatus for performing the method of the present invention, and FIG. 2 is a longitudinal sectional view of the same ejector. 1. Toxic exhaust gas source 2. Adsorption treatment device 3. Combustion treatment device 7,8 Switching valve 12 Burner 16 Liquid circulation pump 28 Ejector 33 Nozzle 34 Suction Chamber 35: Dufuser a: Drive gas b: Toxic exhaust gas
───────────────────────────────────────────────────── フロントページの続き (72)発明者 岩本 憲男 神奈川県横浜市保土ケ谷区東川島町63― 2 (72)発明者 河合 弘治 東京都品川区北品川6丁目7番35号 ソ ニー株式会社内 (72)発明者 石川 秀人 東京都品川区北品川6丁目7番35号 ソ ニー株式会社内 (72)発明者 森 芳文 東京都品川区北品川6丁目7番35号 ソ ニー株式会社内 (56)参考文献 特開 昭53−30025(JP,A) (58)調査した分野(Int.Cl.6,DB名) F23G 7/06──────────────────────────────────────────────────続 き Continuing on the front page (72) Norio Iwamoto, Inventor 63-2 Higashikawashima-cho, Hodogaya-ku, Yokohama, Kanagawa, Japan (72) Koji Kawai 6-7-35 Kita-Shinagawa, Shinagawa-ku, Tokyo Inside Sony Corporation ( 72) Inventor Hideto Ishikawa 6-35, Kita-Shinagawa, Shinagawa-ku, Tokyo Sony Corporation (72) Inventor Yoshifumi Mori 6-35, Kita-Shinagawa, Shinagawa-ku, Tokyo Inside Sony Corporation (56 References JP-A-53-30025 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) F23G 7/06
Claims (1)
を、加圧駆動気体を噴出させたエゼクターに吸引させる
とともに、該エゼクターから該駆動気体との混合ガスと
して取出し、これを燃焼炉に導入し、バーナ燃焼させる
方法であって、該エゼクターと燃焼炉との間には逆火防
止装置が介在しないことを特徴とする燃焼炉の圧力変動
が有毒性排ガス発生源へ伝達するのを防止する方法。1. A toxic exhaust gas from a toxic exhaust gas generating source is sucked into an ejector from which a pressurized driving gas has been ejected, and is taken out from the ejector as a mixed gas with the driving gas, and is introduced into a combustion furnace. A method of burning a burner, wherein a flashback preventing device is not interposed between the ejector and the combustion furnace, wherein a pressure fluctuation of the combustion furnace is prevented from being transmitted to a toxic exhaust gas generation source. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1189352A JP2808310B2 (en) | 1989-07-21 | 1989-07-21 | Combustion furnace pressure fluctuation transmission prevention method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1189352A JP2808310B2 (en) | 1989-07-21 | 1989-07-21 | Combustion furnace pressure fluctuation transmission prevention method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0355415A JPH0355415A (en) | 1991-03-11 |
| JP2808310B2 true JP2808310B2 (en) | 1998-10-08 |
Family
ID=16239889
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1189352A Expired - Fee Related JP2808310B2 (en) | 1989-07-21 | 1989-07-21 | Combustion furnace pressure fluctuation transmission prevention method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2808310B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001355820A (en) * | 2000-06-12 | 2001-12-26 | Sumitomo Seika Chem Co Ltd | Method and device for treating exhaust gas |
| CN107940475A (en) * | 2017-12-21 | 2018-04-20 | 中冶焦耐(大连)工程技术有限公司 | Combustion chamber structure and process of a device for treating waste gas from a vanadium-titanium reduction rotary kiln |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5139950B2 (en) * | 1973-07-06 | 1976-10-30 | ||
| JPS5138189B2 (en) * | 1973-08-06 | 1976-10-20 | ||
| JPS5330025A (en) * | 1976-08-31 | 1978-03-20 | Hitachi Zosen Corp | Gas discharging device |
-
1989
- 1989-07-21 JP JP1189352A patent/JP2808310B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0355415A (en) | 1991-03-11 |
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