JP2809675B2 - Resin-sealed semiconductor device - Google Patents
Resin-sealed semiconductor deviceInfo
- Publication number
- JP2809675B2 JP2809675B2 JP1068896A JP6889689A JP2809675B2 JP 2809675 B2 JP2809675 B2 JP 2809675B2 JP 1068896 A JP1068896 A JP 1068896A JP 6889689 A JP6889689 A JP 6889689A JP 2809675 B2 JP2809675 B2 JP 2809675B2
- Authority
- JP
- Japan
- Prior art keywords
- resin
- lead
- semiconductor element
- semiconductor device
- sealed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/756—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink
Landscapes
- Lead Frames For Integrated Circuits (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Wire Bonding (AREA)
Description
【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は樹脂封止型半導体装置に係り、特に半導体素
子の大型化に対して適した樹脂封止型半導体装置に関す
る。The present invention relates to a resin-sealed semiconductor device, and more particularly to a resin-sealed semiconductor device suitable for increasing the size of a semiconductor element.
(従来の技術) 半導体素子の高集積化に伴って素子寸法が大型化する
傾向にあり、これに対して半導体装置の外形寸法は、他
の製品との互換性や実装の高密度化への要求によって自
由に変更し得ないのが実情である。ところで、この種の
半導体素子は、通常信頼性など考慮して、キャップ封止
や樹脂封止(モールド)などによりパッケージングして
実用に供されており、特に樹脂封止の場合は構成が容易
なことなどの点で関心が寄せられている。しかして、こ
の樹脂封止型半導体装置としては、たとえば特開昭57−
64942号公報に開示されている。すなわち第2図に断面
的に示すように、半導体素子1をタブ2上に固定すると
ともにその周囲にリード3を配設し、半導体素子1の端
子4と前記リード3とを金属配線(ボンディングワイ
ヤ)5により電気的に接続した構成として、これを封止
用樹脂6でモールドした構造のものが知られている。こ
の構造において、半導体素子1を大型化すると、前記封
止用樹脂6で封止されるリード3の長さLが小型の半導
体素子1を封止した場合に比べ短かくなる。つまり、樹
脂封止型半導体装置の外形寸法を一定に保持しようとす
ると、封止する半導体素子1の大型化に伴い前記リード
3が封止用樹脂6で封止される部分は必然的に短かくな
る。(Prior art) With the increase in the integration of semiconductor elements, the dimensions of the elements tend to increase. On the other hand, the external dimensions of the semiconductor device are becoming more compatible with other products and increasing the packaging density. The fact is that it cannot be changed freely by request. By the way, this kind of semiconductor element is usually put into practical use by packaging it with cap sealing or resin sealing (mold) in consideration of reliability and the like, and particularly in the case of resin sealing, the configuration is easy. There is interest in such things as things. For example, Japanese Patent Application Laid-Open No.
No. 64942. That is, as shown in cross section in FIG. 2, the semiconductor element 1 is fixed on the tub 2 and the leads 3 are arranged around the tub 2, and the terminals 4 of the semiconductor element 1 and the leads 3 are connected by metal wiring (bonding wire). As a configuration electrically connected by (5), a configuration in which this is molded with a sealing resin 6 is known. In this structure, when the size of the semiconductor element 1 is increased, the length L of the lead 3 sealed with the sealing resin 6 is shorter than that in the case where the small semiconductor element 1 is sealed. In other words, in order to keep the external dimensions of the resin-encapsulated semiconductor device constant, the portion where the lead 3 is encapsulated with the encapsulating resin 6 is necessarily short with the enlargement of the semiconductor element 1 to be encapsulated. It becomes scary.
(発明が解決しようとする課題) 上記のように第2図に示した構造の場合は、封止する
半導体素子1の大型化に伴い前記リード3が封止用樹脂
6で閉止される部分は必然的に短かくなる。このため、
たとえば半導体装置をICソケットに一定の回数挿抜を繰
り返し行った場合、外力に対するリード3の固定強度が
十分に得られないので、樹脂封止部においてリード3と
封止樹脂6との間に隙間が生じてリード3が破損した
り、またこの隙間を介して外部から水分が侵入し半導体
素子1の端子4が腐食することにより、半導体装置の信
頼性を低下すると言う問題がある。(Problems to be Solved by the Invention) In the case of the structure shown in FIG. 2 as described above, with the enlargement of the semiconductor element 1 to be sealed, the portion where the lead 3 is closed by the sealing resin 6 is Inevitably shorter. For this reason,
For example, when the semiconductor device is repeatedly inserted and removed a certain number of times into the IC socket, the fixing strength of the lead 3 against external force is not sufficiently obtained, so that a gap is formed between the lead 3 and the sealing resin 6 in the resin sealing portion. As a result, the lead 3 may be damaged, or moisture may enter from the outside through this gap to corrode the terminal 4 of the semiconductor element 1, thereby lowering the reliability of the semiconductor device.
[発明の構成] (課題を解決するための手段) 本発明は上記事情に対処してなされたもので、樹脂で
封止された半導体素子と、前記半導体素子にボンディン
グワイヤを介して一端が電気的に接続し、他端を封止樹
脂領域から導出させたリードとを有し、 前記半導体素子のボンディングパレットがTi/Ni/Auの
3層構造を成し、かつリードの一端が半導体素子の能動
領域面に設けられた保護膜上に接着固定されて成ること
を特徴とする。[Constitution of the Invention] (Means for Solving the Problems) The present invention has been made in view of the above circumstances, and has a semiconductor element sealed with a resin and one end electrically connected to the semiconductor element via a bonding wire. The semiconductor device has a three-layer structure of Ti / Ni / Au, and one end of the lead is connected to the semiconductor device. It is characterized by being adhered and fixed on a protective film provided on the active area surface.
つまり、半導体素子のボンディングパッドがTi/Ni/Au
の3層構造とする一方、リードの一端が半導体素子の能
動領域面上の保護膜上に接着固定する構成とし、前記ボ
ンディングパッドの再配置などを容易にするとともに、
前記リードの封止樹脂にてモールドされる部分(領域)
が長くなるようにしたことを骨子とする。In other words, the bonding pad of the semiconductor element is Ti / Ni / Au
On the other hand, one end of the lead is adhered and fixed on the protective film on the active area surface of the semiconductor element to facilitate the rearrangement of the bonding pad and the like.
Part (area) of the lead to be molded with the sealing resin
The main point is to make it longer.
(作 用) このように半導体素子の能動領域上に設けられた能動
領域保護膜の上にリードの一端が接着固定されているた
め、構造が簡略化するとともにリードの封止樹脂にモー
ルドされる部分も長くなる。また封止樹脂にモールドさ
れるリード部分が長くなったことに伴いリードの機械的
な保持乃至固定強度も向上するため、たとえば半導体装
置をICソケットに一定の回数挿抜を繰り返し行った場合
も破損など生じることもなくなるうえ、水分や塵などが
前記リード封止部を介して侵入する恐れも全面的になく
なる。(Operation) Since one end of the lead is adhesively fixed on the active area protective film provided on the active area of the semiconductor element, the structure is simplified and the lead is molded into a sealing resin. The part also gets longer. In addition, since the length of the lead molded in the sealing resin is increased, the mechanical holding or fixing strength of the lead is also improved. For example, the semiconductor device may be damaged by repeatedly inserting and removing the semiconductor device into and from the IC socket a certain number of times. In addition, there is no possibility that moisture or dust will enter through the lead sealing portion.
(実施例) 以下第1図を参照して本発明の実施例を説明する。第
1図は本発明に係る樹脂封止型半導体装置の構成例を断
面的に示したもので、1は能動領域面にTi/Ni/Au系から
成る端子(ボンディングパッド)4および厚さ7000Åの
PSG膜−厚さ6000ÅのSiN膜−厚さ2μmの感光性ポリイ
ミド樹脂層から成る積層構造の表面保護膜7が配設され
ている半導体素子たとえば集積回路チップ、3は前記集
積回路チップ1の表面保護膜7面上にエポキシ樹脂系接
着剤層8にて一端側が接着固定されたAuめっきしたCu合
金製のリードである。また5は前記集積回路チップ1の
表面保護膜7面上に一端が延設され接着固定されたリー
ド3と集積回路チップ1の端子4とを電気的に接続する
直径25μmのAl線、6はリード3の一部を含め集積回路
チップ1本体部を封止乃至モールドするたとえばエポキ
シ樹脂からなる封止樹脂層である。Embodiment An embodiment of the present invention will be described below with reference to FIG. FIG. 1 is a cross-sectional view showing a configuration example of a resin-encapsulated semiconductor device according to the present invention. In FIG. 1, reference numeral 1 denotes a terminal (bonding pad) 4 of Ti / Ni / Au system and a thickness of 7000 mm on an active area surface. of
A semiconductor element, for example, an integrated circuit chip, on which a surface protective film 7 having a laminated structure composed of a PSG film, a 6000 mm thick SiN film, and a 2 μm thick photosensitive polyimide resin layer is disposed. An Au-plated Cu alloy lead is bonded and fixed at one end to the protective film 7 with an epoxy resin-based adhesive layer 8. Reference numeral 5 denotes an Al wire having a diameter of 25 μm, which electrically connects the lead 3 having one end extending on the surface protective film 7 of the integrated circuit chip 1 and fixedly bonded thereto and the terminal 4 of the integrated circuit chip 1; A sealing resin layer made of, for example, epoxy resin for sealing or molding the main body of the integrated circuit chip 1 including a part of the lead 3.
しかして上記構成の樹脂封止型半導体装置は、たとえ
ば次のようにして製造し得る。能動領域面にTi/Ni/Au系
から成る端子(ボンディングパッド)4および厚さ7000
ÅのPSG膜−厚さ6000ÅのSiN膜−厚さ2μmの感光性ポ
リイミド樹脂層から成る積層構造の表面保護膜7が配設
されている集積回路チップ1の表面保護膜7の所定面上
およびリード(リードフレーム)3の一端側にそれぞれ
接着剤8を塗布し、集積回路チップ1をフェースダウン
の状態で位置合せし接着させてから150℃で3時間加熱
を施しリード3を表面保護膜7面上に接着固定した。次
いで集積回路チップ1の能動領域面に設けられているTi
/Ni/Au系から成る端子(ボンディングパッド)4と前記
表面保護膜7面上に接着固定したリード3とを、たとえ
ば加熱温度200℃,超音波出力3.9W,加圧力10gの条件設
定で超音波加熱ボールボンディング法により行う。この
ボンディングによるボンディング強度は5g以上であり良
好に接続していた。かくして集積回路チップ1およびリ
ードフレーム3を組み合わせた後、封止用樹脂としてエ
ポキシ樹脂を用いトランスファーモールドを行うことに
より所望の樹脂封止型半導体装置が得られる。Thus, the resin-sealed semiconductor device having the above configuration can be manufactured, for example, as follows. A terminal (bonding pad) 4 of Ti / Ni / Au system and a thickness of 7000 on the active area surface
{PSG film of {circle around (1)} — SiN film of thickness 6000} —a surface protection film 7 of a laminated structure composed of a photosensitive polyimide resin layer of thickness 2 μm is provided on a predetermined surface of the surface protection film 7 of the integrated circuit chip 1 and An adhesive 8 is applied to one end of the lead (lead frame) 3 and the integrated circuit chip 1 is aligned and bonded face down, and then heated at 150 ° C. for 3 hours to cover the lead 3 with the surface protective film 7. It was adhesively fixed on the surface. Next, Ti provided on the active area surface of the integrated circuit chip 1
A terminal (bonding pad) 4 of Ni / Ni / Au system and a lead 3 bonded and fixed on the surface protective film 7 are superposed under conditions of, for example, a heating temperature of 200 ° C., an ultrasonic output of 3.9 W, and a pressure of 10 g. This is performed by a sonic heating ball bonding method. The bonding strength by this bonding was 5 g or more, and the connection was good. Thus, after combining the integrated circuit chip 1 and the lead frame 3, transfer molding is performed using an epoxy resin as a sealing resin, whereby a desired resin-encapsulated semiconductor device is obtained.
このようにして構成した樹脂封止型半導体装置50個に
ついて評価したところ、いずれも正常動作し、ボンディ
ング時およびトランスファーモールド時に不良の発生が
認められず、またこれらの樹脂封止型半導体装置につい
てICソケットに1000回挿抜試験を行った結果異常は認め
られなかった。さらにこれら50個の樹脂封止型半導体装
置を85℃、95%RH中にて2000時間動作試験を行ったとこ
ろ不良の発生は全く認められず、封止した集積回路チッ
プ1の大きさの割に小型で、信頼性の高い機能を呈する
ことが確認できた。When the 50 resin-encapsulated semiconductor devices thus configured were evaluated, they all operated normally, no defects were observed during bonding and transfer molding, and the ICs of these resin-encapsulated semiconductor devices were evaluated. No abnormalities were found as a result of performing the insertion and removal test on the socket 1000 times. Further, when these 50 resin-encapsulated semiconductor devices were subjected to an operation test at 85 ° C. and 95% RH for 2000 hours, no defect was observed, and the size of the sealed integrated circuit chip 1 was reduced. It was confirmed that it was small and exhibited a highly reliable function.
なお、上記構成において、半導体素子の表面保護膜は
上記例示の材料に限られずPSG,SiN,SiO2,ポリイミド樹
脂,エポキシ樹脂,シリコーン樹脂,アクリル樹脂,ポ
リブタジェン樹脂などの単独もしくは複合系で形成して
もよい。またリード(リードフレーム)3はCu,Ni,SUS
などを基体としてこれにAuめっきもしくはAgめっきを施
したものも同様に使用し得るし、さらにボンディングワ
イヤ5としてはAlワイヤ,Cuワイヤなども同様に使用し
得る。In the above configuration, the surface protection film of the semiconductor element is not limited to the above-described materials, and may be formed of a single or composite system of PSG, SiN, SiO 2 , polyimide resin, epoxy resin, silicone resin, acrylic resin, polybutadiene resin, and the like. You may. The lead (lead frame) 3 is made of Cu, Ni, SUS
A substrate obtained by subjecting the substrate to Au plating or Ag plating may be used in the same manner, and an Al wire, a Cu wire, or the like may be used as the bonding wire 5 in the same manner.
[発明の効果] 本発明に係る樹脂封止型半導体装置の構成によれば、
封止乃至モールドされた半導体素子のサイズが大きい場
合でも、所定の外形寸法を保持しながら信頼性の高い樹
脂封止型半導体装置として機能し得る。すなわち、リー
ドの一端部乃至インナーリード部が半導体素子の能動領
域を保護する保護膜(パッシベーション膜)上に接着固
定するため、半導体素子をマウントするベッドが不要に
なるとともに、封止樹脂中に埋設されるリードの一端部
乃至インナーリード部の長さを十分長く設定できるの
で、引き抜き強度が向上するうえ外部からの水分などの
侵入も防止され、長期間に亘って所要の機能を維持,発
揮する。[Effect of the Invention] According to the configuration of the resin-encapsulated semiconductor device according to the present invention,
Even when the size of the sealed or molded semiconductor element is large, the semiconductor element can function as a highly reliable resin-sealed semiconductor device while maintaining a predetermined external dimension. That is, since one end of the lead or the inner lead portion is adhesively fixed on a protective film (passivation film) for protecting the active region of the semiconductor element, a bed for mounting the semiconductor element is not required and embedded in the sealing resin. Since the length of one end of the lead or the inner lead can be set to be sufficiently long, the pull-out strength is improved, the intrusion of moisture and the like from the outside is prevented, and the required function is maintained and exhibited for a long period of time. .
第1図は本発明に係る樹脂封止型半導体装置の構成例を
示す断面図、第2図は従来の樹脂封止型半導体装置の構
成例を示す断面図である。 1……半導体素子 3……リード 4……半導体素子の端子(ボンディングパッド) 5……ボンディングワイヤ 6……封止樹脂 7……表面保護膜 8……接着剤層FIG. 1 is a cross-sectional view showing a configuration example of a resin-encapsulated semiconductor device according to the present invention, and FIG. 2 is a cross-sectional view showing a configuration example of a conventional resin-encapsulated semiconductor device. DESCRIPTION OF SYMBOLS 1 ... Semiconductor element 3 ... Lead 4 ... Terminal (bonding pad) of semiconductor element 5 ... Bonding wire 6 ... Sealing resin 7 ... Surface protective film 8 ... Adhesive layer
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) H01L 23/50 H01L 21/60──────────────────────────────────────────────────続 き Continued on front page (58) Field surveyed (Int.Cl. 6 , DB name) H01L 23/50 H01L 21/60
Claims (1)
体素子にボンディングワイヤを介して一端が電気的に接
続し、他端を封止樹脂領域から導出させたリードとを有
し、 前記半導体素子のボンディングパッドがTi/Ni/Auの3層
構造を成し、かつリードの一端が半導体素子の能動領域
面に設けられた保護膜上に接着固定されて成ることを特
徴とする樹脂封止型半導体装置。A semiconductor element sealed with a resin, and a lead having one end electrically connected to the semiconductor element via a bonding wire and the other end led out of a sealing resin region; A resin seal, wherein a bonding pad of a semiconductor element has a three-layer structure of Ti / Ni / Au, and one end of a lead is adhered and fixed on a protective film provided on an active area surface of the semiconductor element. Stop type semiconductor device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1068896A JP2809675B2 (en) | 1989-03-20 | 1989-03-20 | Resin-sealed semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1068896A JP2809675B2 (en) | 1989-03-20 | 1989-03-20 | Resin-sealed semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02246357A JPH02246357A (en) | 1990-10-02 |
| JP2809675B2 true JP2809675B2 (en) | 1998-10-15 |
Family
ID=13386879
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1068896A Expired - Fee Related JP2809675B2 (en) | 1989-03-20 | 1989-03-20 | Resin-sealed semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2809675B2 (en) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1238119A (en) * | 1985-04-18 | 1988-06-14 | Douglas W. Phelps, Jr. | Packaged semiconductor chip |
| JPS63202031A (en) * | 1987-02-17 | 1988-08-22 | Mitsubishi Electric Corp | Semiconductor device |
-
1989
- 1989-03-20 JP JP1068896A patent/JP2809675B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02246357A (en) | 1990-10-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |