JP2813426B2 - Transparent heat ray reflection glass of radio wave reflection suppression type - Google Patents
Transparent heat ray reflection glass of radio wave reflection suppression typeInfo
- Publication number
- JP2813426B2 JP2813426B2 JP15898090A JP15898090A JP2813426B2 JP 2813426 B2 JP2813426 B2 JP 2813426B2 JP 15898090 A JP15898090 A JP 15898090A JP 15898090 A JP15898090 A JP 15898090A JP 2813426 B2 JP2813426 B2 JP 2813426B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- glass
- heat ray
- reflection
- transparent heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000011521 glass Substances 0.000 title claims description 42
- 230000001629 suppression Effects 0.000 title 1
- 239000000758 substrate Substances 0.000 claims description 18
- 239000010410 layer Substances 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 4
- 239000002356 single layer Substances 0.000 claims description 3
- 239000010408 film Substances 0.000 description 33
- 238000004544 sputter deposition Methods 0.000 description 11
- 239000010409 thin film Substances 0.000 description 11
- 229910010413 TiO 2 Inorganic materials 0.000 description 7
- 229910000906 Bronze Inorganic materials 0.000 description 6
- 239000010974 bronze Substances 0.000 description 6
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は、テレビ電波反射障害を起こさず建築意匠性
が高い透明熱線反射ガラスに関し、更に詳しく述べる
と、ガラス基板の表面に比較的薄く高抵抗のSiC膜を形
成することにより、テレビ電波の反射減衰量を増大させ
た透明熱線反射ガラスに関するものである。The present invention relates to a transparent heat ray reflective glass having a high architectural design without causing a television radio wave reflection obstacle, and more specifically, a relatively thin high-heat reflective glass on a surface of a glass substrate. The present invention relates to a transparent heat ray reflective glass in which the reflection attenuation of a television wave is increased by forming a resistance SiC film.
[従来の技術] 建築意匠性の向上と冷房負荷の軽減のため、近年、ビ
ル等の建築物に透明熱線反射ガラスが多用されている。
なかでも高性能熱線反射ガラスは、ガラス基板の表面に
金属や金属酸化物、金属窒化物などの薄膜を真空中でス
パッタリング法などによりコーティングしたものであ
り、次のような優れた特徴がある。[Related Art] In recent years, in order to improve architectural design and reduce cooling load, transparent heat ray reflective glass has been frequently used in buildings such as buildings.
Among them, the high-performance heat-reflective glass is obtained by coating the surface of a glass substrate with a thin film of a metal, a metal oxide, a metal nitride or the like in a vacuum by a sputtering method or the like, and has the following excellent characteristics.
シルバー、ブロンズ、ブルー、グリーンなど豊富なカ
ラーバリエーションのもつので建築意匠性が優れてい
る。It has a wide variety of colors such as silver, bronze, blue and green, so it has excellent architectural design.
可視光透過率8〜40%、可視光反射率10〜45%と可視
光線のバランスが良いので快適な室内空間を作り出し、
またプライバシーの保護に有効である。Visible light transmittance of 8-40%, visible light reflectance of 10-45% and good balance of visible light create a comfortable indoor space,
It is also effective in protecting privacy.
優れた日射光線の遮蔽性能を呈するため冷房負荷の低
減に役立つ。Since it exhibits excellent solar radiation blocking performance, it helps to reduce the cooling load.
[発明が解決しようとする課題] 従来の高性能熱線反射ガラスは、コーティング薄膜と
して前記のように金属や金属窒化物を用いており、その
表面抵抗値が低いため入射するテレビ電波に対して金属
板に近い性質をもち反射減衰量が低くなる傾向にある。[Problems to be Solved by the Invention] Conventional high-performance heat-reflective glass uses metal or metal nitride as a coating thin film as described above, and has a low surface resistance. It has a property close to that of a plate and tends to have a low return loss.
例えば従来の代表的な高性能熱線反射ガラスは、コー
ティング薄膜の表面抵抗値が250Ω/□以下であり、こ
のガラスの反射減衰量はVHF帯とUHF帯とで7dB以下であ
った。反射減衰量は、入射した電波エネルギーに対する
反射した電波エネルギーの割合を表しており、その値が
大きいほど反射が少なく、ゴースト障害は発生し難くな
る。ガラスの反射減衰量が上記のようにVHF帯とUHF帯と
で7dB以下であると、使用環境によっては(特に高層ビ
ルに大面積使用された場合)テレビ電波のゴースト障害
を起こす。For example, a conventional high-performance heat ray reflective glass has a coating thin film having a surface resistance value of 250Ω / □ or less, and the return loss of this glass is 7dB or less in a VHF band and a UHF band. The return loss represents the ratio of the reflected radio wave energy to the incident radio wave energy. The larger the value is, the less the reflection is, and the less likely the ghost failure is. If the return loss of the glass is 7 dB or less in the VHF band and the UHF band as described above, ghost interference of television waves may occur depending on the use environment (especially when used in a large area in a high-rise building).
本発明の目的は、上記のような従来技術の欠点を解消
し、優れた建築意匠性を維持したままテレビ電波のゴー
スト障害を起こさない新しい透明熱線反射ガラスを提供
することである。An object of the present invention is to solve the above-mentioned drawbacks of the prior art and to provide a new transparent heat ray reflective glass which does not cause a ghost disturbance of a television wave while maintaining excellent architectural design.
[課題を解決するための手段] 透明熱線反射ガラスは、その反射減衰量が15dB以上で
あれば問題になるようなゴースト障害は起こさないとさ
れている。そこで、まず理論からゴースト障害を起こさ
ない薄膜の表面抵抗値を求めた。第4図に示すように裏
面に薄膜の付いたガラスにテレビ電波が入射するモデル
を考える。このモデルは一般に第5図のような分布定数
回路に等価的に書き換え得る。端子A−Bから右側を見
た入力インピーダンスZinは(1)式で表される。[Means for Solving the Problems] It is said that the transparent heat ray reflective glass does not cause a ghost problem that causes a problem if the return loss is 15 dB or more. Therefore, first, the surface resistance of a thin film that does not cause ghost damage was determined from the theory. As shown in FIG. 4, consider a model in which television waves are incident on glass having a thin film on the back surface. This model can be generally rewritten equivalently to a distributed constant circuit as shown in FIG. The input impedance Z in as seen from the terminal AB on the right side is expressed by the equation (1).
またガラスの固有インピーダンスAと伝搬定数は
それぞれ(2)式と(3)式で表される。 Further, the specific impedance A and the propagation constant of the glass are represented by the equations (2) and (3), respectively.
Z0:空間のインピーダンス,Z0=377Ω j:虚数単位 :ガラスの誘電率,=7−0.1j t:ガラスの厚さ λ0:電波の波長 一方、薄膜は金属板のような完全反射体ではないので
RとZ0の並列抵抗で表され、その入射特性インピーダン
スBは(4)式のようになる。 Z 0 : Impedance of space, Z 0 = 377Ω j: Imaginary unit: Dielectric constant of glass, = 7-0.1jt: Thickness of glass λ 0 : Wavelength of radio wave On the other hand, a thin film is a perfect reflector such as a metal plate. Since it does not exist, it is represented by the parallel resistance of R and Z 0 , and its incident characteristic impedance B is as shown in equation (4).
以上よりガラスによる反射率Γは(5)式で表され
る。 As described above, the reflectance に よ る of the glass is represented by equation (5).
従って反射減衰量ηは(6)式のようになる。 Therefore, the return loss η is as shown in equation (6).
η=20logΓ …(6) ここで波長λ0=300cm(周波数f=100MHz)、ガラ
スの厚さt=10mmの時、ゴースト障害を起こさないため
に必要な反射減衰量η≧15dBを得るためには、薄膜の表
面抵抗は1000Ω/□以上あればよいことになる。η = 20logΓ (6) Here, when the wavelength λ 0 = 300 cm (frequency f = 100 MHz) and the glass thickness t = 10 mm, in order to obtain the return loss η ≧ 15 dB necessary to prevent ghost interference. Means that the surface resistance of the thin film should be 1000Ω / □ or more.
そこで、このように表面抵抗値が1000Ω/□以上で且
つ優れた熱線反射性能と建築意匠性をもつ薄膜材料を検
討した結果、SiC膜が有用であることが判明した。Thus, as a result of examining a thin film material having a surface resistance value of 1000Ω / □ or more and excellent heat ray reflection performance and architectural design, it was found that a SiC film was useful.
本発明は、ガラス基板の表面に、幾何学的厚さdが10
nm≦d≦40nmのSiC単層膜を形成するか、または幾何学
的厚さdが10nm≦d≦40nmのSiC膜と、光学的厚さndが2
nm≦nd≦400nmの透明誘電体膜とからなる2〜3層膜を
形成した電波反射抑制型の透明熱線反射ガラスである。In the present invention, the geometric thickness d is 10
forming a SiC monolayer film with nm ≦ d ≦ 40 nm, or a SiC film with a geometric thickness d of 10 nm ≦ d ≦ 40 nm, and an optical thickness nd of 2
This is a radio-reflection-suppressing transparent heat ray reflective glass in which a two- or three-layer film composed of a transparent dielectric film with nm ≦ nd ≦ 400 nm is formed.
本発明においてSiC膜の厚さを40nm以下に限定した理
由は、40nmを超えると透過光がきつい黄色〜橙色になり
建築物の窓用としては好ましくないこと、膜厚による非
膜面反射色の変化が大きくなり、特に大きなガラス基板
に成膜するときに膜厚分布が大きいと非膜面反射色の色
むらが大きくなり美観上好ましくないこと、膜厚が厚く
なるほど成膜に時間がかかりコスト高となること、など
の不都合が生じるためである。The reason why the thickness of the SiC film is limited to 40 nm or less in the present invention is that, when the thickness exceeds 40 nm, transmitted light becomes yellow to orange, which is not preferable for building windows. When the film thickness distribution is large, particularly when forming a film on a large glass substrate, the color unevenness of the non-film surface reflection color becomes large, which is not desirable from the viewpoint of aesthetics. This is because there is a problem such as an increase in height.
ガラス基板の厚さは6〜12mm程度とし、SiC膜は好ま
しくは20nm以上とし、直流スパッタリングで成膜する。
低設誘電体膜しては、TiO2,ZrO2,Ta2O5,Nb2O5等が好ま
しい。The thickness of the glass substrate is about 6 to 12 mm, the thickness of the SiC film is preferably 20 nm or more, and the film is formed by DC sputtering.
As the low dielectric film, TiO 2 , ZrO 2 , Ta 2 O 5 , Nb 2 O 5 and the like are preferable.
[作用] ガラス基板の表面に形成したSiC薄膜は、表面抵抗値
が1000Ω/□以上になり、入射するテレビ電波に対して
反射減衰量が15dB以上になるため、ゴースト障害は実質
的に発生しない。またこのSiC薄膜は優れた熱線反射特
性を呈する。更に40nm以下の薄膜は透過光の色が建築物
の窓用として適したものになり、非膜面反射は2゜視野
C光(JIS Z8729)でa*=−5〜+5,b*=−5〜+25
でありシルバー〜ブロンズの反射色になる。[Function] Since the SiC thin film formed on the surface of the glass substrate has a surface resistance value of 1000Ω / □ or more and a return loss of 15dB or more with respect to an incident television wave, ghost failure does not substantially occur. . Further, this SiC thin film exhibits excellent heat ray reflection characteristics. Furthermore the following thin film 40nm becomes what the color of the transmitted light is suitable as a window of buildings, in a non-film surface reflection 2 ° visual field C light (JIS Z8729) a * = -5~ + 5, b * = - 5- + 25
It becomes a reflection color of silver to bronze.
透明誘電体膜は、電気的特性とは無関係であり、色や
透過率、反射率などの調整を行い、また耐久性を向上さ
せる。The transparent dielectric film is irrelevant to the electrical characteristics, adjusts the color, transmittance, reflectance, etc., and improves the durability.
[実施例] 第1図は本発明に係る透明熱線反射ガラスの一実施例
を示す断面図である。ガラス基板10の表面に幾何学的厚
さ(物理的厚さ)dが30nmのSiC単層膜12を直流スパッ
タリング法により形成した例である。Example FIG. 1 is a sectional view showing an example of the transparent heat ray reflective glass according to the present invention. This is an example in which a SiC single layer film 12 having a geometric thickness (physical thickness) d of 30 nm is formed on the surface of a glass substrate 10 by a DC sputtering method.
ここで用いた直流スパッタリング装置の概略を第3図
に示す。アースされた真空槽20の一部にバリアブルバル
ブ22を設けた排気口24を形成し、この排気口24を介して
真空ポンプ26に接続し、真空槽20内を減圧できるように
している。また真空槽20の上部には、マグネトロンカソ
ード28a,28bを設け、直流電源30a,30bに接続している。
またマグネトロンカソード28a,28bの間にはバルブ32を
備えたガス供給管34を設け、真空槽20内にガスを供給で
きるようにしている。更に各マグネトロンカソード28a,
28bの下方には往復可能な搬送ベルト36を配置してい
る。FIG. 3 schematically shows the DC sputtering apparatus used here. An exhaust port 24 provided with a variable valve 22 is formed in a part of the grounded vacuum chamber 20, and connected to a vacuum pump 26 through the exhaust port 24 so that the inside of the vacuum chamber 20 can be depressurized. Further, magnetron cathodes 28a and 28b are provided above the vacuum chamber 20, and are connected to DC power supplies 30a and 30b.
A gas supply pipe 34 having a valve 32 is provided between the magnetron cathodes 28a and 28b so that gas can be supplied into the vacuum chamber 20. Further, each magnetron cathode 28a,
A reciprocable transport belt 36 is arranged below 28b.
まずカソード28aの下面にSiCをターゲット38aとして
取り付ける。そして搬送ベルト36上の基板ホルダ40に洗
浄したガラス基板10を載置し、バリアブルバルブ22を開
け、真空槽20内を5×10-6Torr以下まで減圧する。次い
でガス供給管34によりアルゴンガスを供給して、バリア
ブルバルブ22を閉じ、真空槽20内の圧力が2×10-3Torr
になるようにする。次にカソード28aに600Vの負電圧を
印加し、ガラス基板10をカソード28a下を移動させるこ
とでガラス基板10の表面にSiC膜12を形成する。First, SiC is attached to the lower surface of the cathode 28a as a target 38a. Then, the washed glass substrate 10 is placed on the substrate holder 40 on the conveyor belt 36, the variable valve 22 is opened, and the pressure in the vacuum chamber 20 is reduced to 5 × 10 −6 Torr or less. Next, argon gas is supplied through a gas supply pipe 34, the variable valve 22 is closed, and the pressure in the vacuum chamber 20 is 2 × 10 −3 Torr.
So that Next, a negative voltage of 600 V is applied to the cathode 28a, and the glass substrate 10 is moved below the cathode 28a to form the SiC film 12 on the surface of the glass substrate 10.
得られた透明体の表面抵抗値は2MΩ/□以上であっ
た。透過は可視光透過率30%、2゜視野C光(JIS Z872
9)でa=1.1,b=11.8でありブロンズ色となった。また
非膜面反射はL*=71.1,a*=−3.4,b*=1.3でありシ
ルバー反射色であった。The surface resistance of the obtained transparent body was 2 MΩ / □ or more. Transmission is visible light transmittance 30%, 2 ゜ field of view C light (JIS Z872
In 9), a = 1.1 and b = 11.8, and the color became bronze. The non-film surface reflection was L * = 71.1, a * =-3.4, b * = 1.3, which was a silver reflection color.
[実施例2] 第2図は本発明に係る透明熱線反射ガラスの他の実施
例を示す断面図である。ガラス基板14の表面に幾何学的
厚さ(物理的厚さ)dが40nmのSiC膜16と、光学的厚さn
dが12nmのTiO2膜18を直流スパッタリング法により形成
した例である。Example 2 FIG. 2 is a sectional view showing another example of the transparent heat ray reflective glass according to the present invention. A SiC film 16 having a geometric thickness (physical thickness) d of 40 nm on the surface of a glass substrate 14 and an optical thickness n
This is an example in which a TiO 2 film 18 with d of 12 nm is formed by a DC sputtering method.
ここで用いたスパッタリング装置も前記第3図に示し
たものである。まずカソード28aの下面にSiCをターゲッ
ト38aとして、またカソード28bの下面にTiをターゲット
38bとして取り付ける。そして実施例1と同様の方法で
ガラス基板の表面に第1層として幾何学的厚さ40nmのSi
C膜を形成する。そしてカソード28aのパワーを切り、バ
リアブルバルブ22を開き、再び5×10-6Torr以下まで減
圧した後、ガス供給管34から酸素を導入し、バリアブル
バルブ22を閉じ、真空層20内の圧力が2×10-3Torrにな
るようにする。次にカソード28bに500Vの負電圧を印加
し、ガラス基板をカソード28b下を移動させることでSiC
膜上に第2層として光学的厚さ12nmのTiO2膜を形成す
る。The sputtering apparatus used here is also the one shown in FIG. First, SiC is used as the target 38a on the lower surface of the cathode 28a, and Ti is used as the target on the lower surface of the cathode 28b.
Attach as 38b. Then, in the same manner as in Example 1, a 40 nm-thick Si layer was formed as a first layer on the surface of the glass substrate.
Form a C film. Then, the power of the cathode 28a is turned off, the variable valve 22 is opened, the pressure is reduced again to 5 × 10 −6 Torr or less, oxygen is introduced from the gas supply pipe 34, the variable valve 22 is closed, and the pressure in the vacuum layer 20 is reduced. 2 × 10 -3 Torr. Next, a negative voltage of 500 V is applied to the cathode 28b, and the glass substrate is moved under the cathode 28b, so that the SiC
A TiO 2 film having an optical thickness of 12 nm is formed as a second layer on the film.
得られた透明体の並列抵抗値は2MΩ/□以上であっ
た。透過は可視光透過率28%、2゜視野C光でa=−0.
6,b=6.8であり淡いブロンズ色であった。また非膜面反
射はL*=73.2,a*=−4.8,b*=13.2であり、ブロン
ズ反射色であった。The parallel resistance of the obtained transparent body was 2 MΩ / □ or more. Transmission is a visible light transmittance of 28%, a = −0 at 2 ° visual field C light.
6, b = 6.8, light pale bronze color. The non-film surface reflection was L * = 73.2, a * =-4.8, b * = 13.2, which was a bronze reflection color.
[実施例3] ガラス基板の表面に光学的厚さndが12nmのTiO2膜と、
幾何学的厚さdが30nmのSiC膜と、光学的厚さndが12nm
のTiO2膜を直流スパッタリング法により形成した。Example 3 A TiO 2 film having an optical thickness nd of 12 nm was formed on the surface of a glass substrate,
SiC film with a geometric thickness d of 30 nm and an optical thickness nd of 12 nm
A TiO 2 film was formed by DC sputtering.
スパッタリングの方法は前記実施例と同様である。得
られた透明体の並列抵抗値は2MΩ/□以上であった。透
過は可視光透過率29%、2゜視野C光でa=0.8,b=8.0
であり淡いブロンズ色であった。また非膜面反射はL*
=73.1,a*=−4.3,b*=4.4であり淡いイエローグリー
ン反射色であった。The sputtering method is the same as in the above embodiment. The parallel resistance of the obtained transparent body was 2 MΩ / □ or more. Transmission is visible light transmittance 29%, a = 0.8, b = 8.0 in 2 ゜ visual field C light.
And a pale bronze color. The non-film surface reflection is L *
= 73.1, a * = -4.3, b * = 4.4, indicating a pale yellow-green reflection color.
なお上記の実施例では膜形成方法として直流スパッタ
リング法を使用した。この方法は、高周波スパッタリン
グのようなマッチングが不要であり、また成膜速度も大
きくコスト上有利であるため好ましい。その他、真空蒸
着法、イオンプレーティング法、アーク蒸着法、CVD法
などを用いてもよい。また透明誘電体膜としてはSnO2,A
l2O3,ZnO,Bi2O3,ZrO2,Ta2O5,Nb2O5,AlN等もあるが、耐
久性と色調などからTiO2,ZrO2,Ta2O5,Nb2O5が好まし
い。In the above embodiment, a direct current sputtering method was used as a film forming method. This method is preferable because matching such as high-frequency sputtering is not required, and the film forming speed is large and the cost is advantageous. In addition, a vacuum evaporation method, an ion plating method, an arc evaporation method, a CVD method, or the like may be used. As a transparent dielectric film, SnO 2 , A
l 2 O 3 , ZnO, Bi 2 O 3 , ZrO 2 , Ta 2 O 5 , Nb 2 O 5 , AlN, etc., but TiO 2 , ZrO 2 , Ta 2 O 5 , Nb 2 O 5 is preferred.
[発明の効果] 本発明は上記のように、ガラス基板に薄いSiC膜を形
成する構成だから、表面抵抗値が1000Ω/□以上にな
り、入射するテレビ電波に対して反射減衰量が大きく、
ゴースト障害の発生を防止できる。また優れた建築意匠
性と熱線反射特性を発現させうる。[Effects of the Invention] As described above, since the present invention has a configuration in which a thin SiC film is formed on a glass substrate, the surface resistance value is 1000Ω / □ or more, and the return loss is large with respect to incident television waves.
Ghost failure can be prevented from occurring. Also, excellent architectural design and heat ray reflection characteristics can be exhibited.
第1図は本発明に係る透明熱線反射ガラスの一実施例を
示す断面図、第2図は本発明の他の実施例を示す断面図
である。第3図は本発明の実施に好適な直流スパッタリ
ング装置の説明図である。第4図は透明熱線反射ガラス
への電波入射モデル説明図、第5図はその等価回路図で
ある。 10,14……ガラス基板、12,16……SiC膜、18……TiO
2膜。FIG. 1 is a sectional view showing an embodiment of the transparent heat ray reflective glass according to the present invention, and FIG. 2 is a sectional view showing another embodiment of the present invention. FIG. 3 is an explanatory view of a DC sputtering apparatus suitable for carrying out the present invention. FIG. 4 is an explanatory diagram of a model of radio wave incidence on transparent heat ray reflective glass, and FIG. 5 is an equivalent circuit diagram thereof. 10,14 …… Glass substrate, 12,16 …… SiC film, 18… TiO
2 membranes.
Claims (2)
nm≦d≦40nmのSiC単層膜を形成した電波反射抑制型の
透明熱線反射ガラス。1. The method according to claim 1, wherein the geometric thickness d is 10 on the surface of the glass substrate.
A radio-reflection-suppressing transparent heat ray reflective glass formed with a SiC single layer film with nm ≦ d ≦ 40 nm.
nm≦d≦40nmのSiC膜と、光学的厚さndが2nm≦nd≦400n
mの透明誘電体膜とからなる2〜3層膜を形成した電波
反射抑制型の透明熱線反射ガラス。2. The method according to claim 1, wherein the geometric thickness d is 10 on the surface of the glass substrate.
nm ≦ d ≦ 40 nm SiC film and optical thickness nd is 2 nm ≦ nd ≦ 400 n
A radio-reflection-suppressing transparent heat ray reflective glass having a two- or three-layer film formed of a transparent dielectric film having a thickness of m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15898090A JP2813426B2 (en) | 1990-06-18 | 1990-06-18 | Transparent heat ray reflection glass of radio wave reflection suppression type |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15898090A JP2813426B2 (en) | 1990-06-18 | 1990-06-18 | Transparent heat ray reflection glass of radio wave reflection suppression type |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0450142A JPH0450142A (en) | 1992-02-19 |
| JP2813426B2 true JP2813426B2 (en) | 1998-10-22 |
Family
ID=15683585
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15898090A Expired - Fee Related JP2813426B2 (en) | 1990-06-18 | 1990-06-18 | Transparent heat ray reflection glass of radio wave reflection suppression type |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2813426B2 (en) |
-
1990
- 1990-06-18 JP JP15898090A patent/JP2813426B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0450142A (en) | 1992-02-19 |
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