JP2814279B2 - Waterless photosensitive lithographic printing plate developer - Google Patents
Waterless photosensitive lithographic printing plate developerInfo
- Publication number
- JP2814279B2 JP2814279B2 JP2022098A JP2209890A JP2814279B2 JP 2814279 B2 JP2814279 B2 JP 2814279B2 JP 2022098 A JP2022098 A JP 2022098A JP 2209890 A JP2209890 A JP 2209890A JP 2814279 B2 JP2814279 B2 JP 2814279B2
- Authority
- JP
- Japan
- Prior art keywords
- resin
- weight
- diazo
- silicone rubber
- developer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007639 printing Methods 0.000 title claims description 29
- 229920002379 silicone rubber Polymers 0.000 claims description 43
- 239000004945 silicone rubber Substances 0.000 claims description 43
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 33
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 26
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 12
- 239000010410 layer Substances 0.000 description 60
- 229920005989 resin Polymers 0.000 description 40
- 239000011347 resin Substances 0.000 description 40
- 239000000243 solution Substances 0.000 description 25
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 24
- 239000000203 mixture Substances 0.000 description 23
- 229920000642 polymer Polymers 0.000 description 22
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 21
- 229910052782 aluminium Inorganic materials 0.000 description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 15
- -1 For example Polymers 0.000 description 14
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 12
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 12
- 229920001577 copolymer Polymers 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 10
- 239000002253 acid Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 229920001296 polysiloxane Polymers 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 8
- 238000011161 development Methods 0.000 description 8
- 239000000178 monomer Substances 0.000 description 8
- 239000002244 precipitate Substances 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000011230 binding agent Substances 0.000 description 7
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 6
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 239000006087 Silane Coupling Agent Substances 0.000 description 5
- 239000004115 Sodium Silicate Substances 0.000 description 5
- 230000001476 alcoholic effect Effects 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 5
- 229910052911 sodium silicate Inorganic materials 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229920006122 polyamide resin Polymers 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 229920005749 polyurethane resin Polymers 0.000 description 4
- 229910052913 potassium silicate Inorganic materials 0.000 description 4
- 235000019353 potassium silicate Nutrition 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 4
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 229920005601 base polymer Polymers 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 125000004953 trihalomethyl group Chemical group 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- XUVKSPPGPPFPQN-UHFFFAOYSA-N 10-Methyl-9(10H)-acridone Chemical compound C1=CC=C2N(C)C3=CC=CC=C3C(=O)C2=C1 XUVKSPPGPPFPQN-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- AMIMRNSIRUDHCM-UHFFFAOYSA-N Isopropylaldehyde Chemical compound CC(C)C=O AMIMRNSIRUDHCM-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229930040373 Paraformaldehyde Natural products 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004111 Potassium silicate Substances 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- TVJPBVNWVPUZBM-UHFFFAOYSA-N [diacetyloxy(methyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(OC(C)=O)OC(C)=O TVJPBVNWVPUZBM-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 235000010980 cellulose Nutrition 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229920006026 co-polymeric resin Polymers 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 150000008049 diazo compounds Chemical class 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000004043 dyeing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- 239000000025 natural resin Substances 0.000 description 2
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 229920002866 paraformaldehyde Polymers 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
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- 238000007788 roughening Methods 0.000 description 2
- 125000005372 silanol group Chemical group 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- 235000019795 sodium metasilicate Nutrition 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 2
- 239000011592 zinc chloride Substances 0.000 description 2
- 235000005074 zinc chloride Nutrition 0.000 description 2
- VLTYTTRXESKBKI-UHFFFAOYSA-N (2,4-dichlorophenyl)-phenylmethanone Chemical compound ClC1=CC(Cl)=CC=C1C(=O)C1=CC=CC=C1 VLTYTTRXESKBKI-UHFFFAOYSA-N 0.000 description 1
- PJMXUSNWBKGQEZ-UHFFFAOYSA-N (4-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(O)C=C1 PJMXUSNWBKGQEZ-UHFFFAOYSA-N 0.000 description 1
- WXWYJCSIHQKADM-ZNAKCYKMSA-N (e)-n-[bis[[(e)-butan-2-ylideneamino]oxy]-ethenylsilyl]oxybutan-2-imine Chemical compound CC\C(C)=N\O[Si](O\N=C(/C)CC)(O\N=C(/C)CC)C=C WXWYJCSIHQKADM-ZNAKCYKMSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 description 1
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical class C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- QHIGBUQIFLDZPZ-UHFFFAOYSA-N 1-[(4e)-4-diazo-2-methoxycyclohexa-1,5-dien-1-yl]pyrrolidine Chemical compound C1=CC(=[N+]=[N-])CC(OC)=C1N1CCCC1 QHIGBUQIFLDZPZ-UHFFFAOYSA-N 0.000 description 1
- FHDQFPCQZMLBFE-UHFFFAOYSA-N 1-[(4e)-4-diazo-2-methylcyclohexa-1,5-dien-1-yl]pyrrolidine Chemical compound C1=CC(=[N+]=[N-])CC(C)=C1N1CCCC1 FHDQFPCQZMLBFE-UHFFFAOYSA-N 0.000 description 1
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 description 1
- QFDDZIRGHKFRMR-UHFFFAOYSA-N 10-butylacridin-9-one Chemical compound C1=CC=C2N(CCCC)C3=CC=CC=C3C(=O)C2=C1 QFDDZIRGHKFRMR-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- RSZXXBTXZJGELH-UHFFFAOYSA-N 2,3,4-tri(propan-2-yl)naphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(C(C)C)C(C(C)C)=C(C(C)C)C(S(O)(=O)=O)=C21 RSZXXBTXZJGELH-UHFFFAOYSA-N 0.000 description 1
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- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 235000019794 sodium silicate Nutrition 0.000 description 1
- PNGLEYLFMHGIQO-UHFFFAOYSA-M sodium;3-(n-ethyl-3-methoxyanilino)-2-hydroxypropane-1-sulfonate;dihydrate Chemical compound O.O.[Na+].[O-]S(=O)(=O)CC(O)CN(CC)C1=CC=CC(OC)=C1 PNGLEYLFMHGIQO-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000012192 staining solution Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 125000005289 uranyl group Chemical group 0.000 description 1
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は、水なし感光性平版印刷版用現像液に関する
ものであり、更に詳しくは現像時にシリコーンゴム層に
ブラシによる傷が付きにくく、ブラシ等に珪酸塩の結晶
物が付着しにくく、更に網点再現性に優れている水なし
感光性平版印刷版用現像液に関するものである。Description: FIELD OF THE INVENTION The present invention relates to a developer for a waterless photosensitive lithographic printing plate, and more particularly to a silicone rubber layer which is less likely to be damaged by a brush during development. The present invention relates to a developing solution for a water-free photosensitive lithographic printing plate, in which silicate crystals are less likely to adhere to the lithographic printing plate and the like.
[発明の背景] 従来、水なし感光性平版印刷版としては、支持体上に
感光層及びインキ反発層を順次塗設した構成を有するも
のを始め、種々のものが知られている。BACKGROUND OF THE INVENTION Conventionally, various waterless photosensitive lithographic printing plates have been known, including those having a structure in which a photosensitive layer and an ink repellent layer are sequentially coated on a support.
この水なし感光性平版印刷版は画像露光された後、現
像されるが、これに使用される現像液としては、従来ア
イソバーHやトルエン等の炭化水素系の有機溶剤を用い
たものが知られているが、前記水なし感光性平版印刷版
用現像液として、これらの炭化水素系の有機溶剤を用い
た場合、安全・衛生上、問題があり、したがって近年で
はこれに代って水系現像液を用いる技術が多く用いられ
るようになった。例えば特開平1−257847号公報には、
水なし平版印刷版用原版を現像するための現像液につい
て記載され、具体的には感光層の未露光部分を溶解又は
膨潤する有機溶剤、塩基性化合物及び界面活性剤を含む
アルカリ性の水系現像液について開示されている。この
現像液は、塩基性物質を含ませることにより、現像液中
のヘドロの発生を防止するものであるが、塩基性物質を
含む現像液が高pHであるので、水なし平版印刷版用原版
の現像時に、強固に接着されている非画像部分において
感光層とシリコーンゴム層との間の接着性が低下し該感
光層上からシリコーンゴム層が剥れ、その結果シャドー
部分の再現性が悪くなるという問題があった。This waterless photosensitive lithographic printing plate is developed after being exposed to an image. As a developer used for this, a solution using a hydrocarbon-based organic solvent such as Isobar H or toluene is conventionally known. However, when these hydrocarbon-based organic solvents are used as the developer for a waterless photosensitive lithographic printing plate, there is a problem in safety and hygiene, and in recent years, instead of this, an aqueous developer has been used. The technology that uses is widely used. For example, JP-A-1-257847 discloses that
Describes a developer for developing a waterless lithographic printing plate precursor, specifically, an alkaline aqueous developer containing an organic solvent that dissolves or swells the unexposed portion of the photosensitive layer, a basic compound and a surfactant. Is disclosed. This developer prevents the generation of sludge in the developer by including a basic substance.However, since the developer containing a basic substance has a high pH, the lithographic printing plate precursor without water is used. At the time of development, the adhesiveness between the photosensitive layer and the silicone rubber layer is reduced in the non-image portion which is firmly adhered, and the silicone rubber layer peels off from the photosensitive layer, resulting in poor reproducibility of the shadow portion. There was a problem of becoming.
そこで、本発明者等は、前記問題点を種々検討した結
果、現像液中の塩基性物質として珪酸塩を用いることに
より、高pHにおいても感光層とシリコーンゴム層との間
の接着性が低下せず、シャドー部分の再現性が良好な印
刷板が得られることを見出したが、自動現像機に前記現
像液を用いる場合には、現像時にシリコーンゴム層にブ
ラシによる傷が付き易く、また自動現像機を数日間使用
しないとブラシに現像液中の珪酸塩の結晶が固着するこ
とにより現像時にシリコーンゴム層の傷を増大するとい
う欠点がある。このような点について更に検討した結
果、前記珪酸塩と共にプロピレングリコールを併用する
と、このような欠点のない水なし感光性平版印刷版用現
像液が得られることが見出された。Therefore, the present inventors have conducted various studies on the above problems, and as a result, by using silicate as a basic substance in the developer, the adhesion between the photosensitive layer and the silicone rubber layer is reduced even at a high pH. It was found that a printing plate having good shadow portion reproducibility could be obtained without using the developing solution.However, when the developing solution was used for an automatic developing machine, the silicone rubber layer was easily scratched by a brush during development, and the automatic If the developing machine is not used for several days, the silicate crystals in the developing solution will adhere to the brush, resulting in an increase in damage to the silicone rubber layer during development. As a result of further study on such points, it was found that when propylene glycol was used in combination with the silicate, a water-free photosensitive lithographic printing plate developer free from such defects was obtained.
[発明の目的] したがって、本発明の目的は、現像時にシリコーンゴ
ム層にブラシによる傷が付きにくく、ブラシ等に珪酸塩
の結晶物が付着しにくく、更に網点再現性に優れている
水なし感光性平版印刷版用現像液を提供することにあ
る。[Object of the Invention] Therefore, an object of the present invention is to provide a silicone rubber layer that is hardly damaged by a brush during development, that silicate crystals are less likely to adhere to a brush or the like, and that there is no water having excellent halftone dot reproducibility. An object of the present invention is to provide a photosensitive lithographic printing plate developer.
[発明の構成] 本発明の前記目的は、支持体上にプライマー層、光硬
化性感光層及びシリコーンゴム層を順次有する水なし感
光性平版印刷版用現像液において、該現像液が珪酸塩、
プロピレングリコール及び水を含むことを特徴とする水
なし感光性平版印刷版用現像液によって達成された。[Constitution of the Invention] The object of the present invention is to provide a developer for a waterless photosensitive lithographic printing plate having a primer layer, a photocurable photosensitive layer and a silicone rubber layer in this order on a support, wherein the developer is a silicate,
This was achieved by a developer for waterless photosensitive lithographic printing plates characterized by comprising propylene glycol and water.
以下、本発明を具体的に説明する。 Hereinafter, the present invention will be described specifically.
本発明の現像液は、主として光硬化性感光層を含む水
なし感光性平版印刷版を現像するものであり、該現像液
は珪酸塩、プロピレングリコール及び水からなるもので
あるが、現像液に悪影響を与えない限り、他の現像液成
分を含むことができる。現像液中の珪酸塩のSiO2濃度は
0.5重量%〜6重量%の範囲がよく、更に好ましくはSiO
2濃度が4.0重量%〜5.0重量%の範囲である。好ましい
珪酸塩としては、メタ珪酸カリウム、珪酸カリウム、メ
タ珪酸ナトリウム、珪酸ナトリウム等が挙げられる。The developing solution of the present invention is mainly for developing a waterless photosensitive lithographic printing plate containing a photocurable photosensitive layer, and the developing solution is composed of silicate, propylene glycol and water. Other developer components can be included as long as they have no adverse effect. The silicate SiO 2 concentration in the developer is
The range is preferably 0.5% to 6% by weight, more preferably SiO 2
2 The concentration ranges from 4.0% to 5.0% by weight. Preferred silicates include potassium metasilicate, potassium silicate, sodium metasilicate, sodium silicate and the like.
本発明の現像液に添加されるプロピレングリコールの
量は0.1重量%〜20重量%、好ましくは1重量%〜10重
量%である。また水の含有量は、70重量%以上、好まし
くは85重量%以上である。The amount of propylene glycol added to the developer of the present invention is 0.1% by weight to 20% by weight, preferably 1% by weight to 10% by weight. The water content is 70% by weight or more, preferably 85% by weight or more.
本発明の現像液は、高pHであり、特にpH12〜13.5で用
いられることが好ましく、より好ましくはpH12.5〜13.0
である。The developer of the present invention has a high pH, particularly preferably used at pH 12 to 13.5, and more preferably at pH 12.5 to 13.0.
It is.
本発明の現像液は、実質的に珪酸塩、プロピレングリ
コール及び水からなるが、差し支えない範囲で通常現像
液に添加される如く有機溶剤や界面活性剤を含んでいて
もよく。The developing solution of the present invention substantially comprises a silicate, propylene glycol and water, but may contain an organic solvent or a surfactant as usually added to the developing solution within a safe range.
本発明に用いられる感光層には、高分子重合体を含有
させることが好ましいが、特に酸価10〜300の高分子重
合体を含有させることが好ましく、該重合体としては、
例えば、アクリル酸またはメタクリル酸共重合体、クロ
トン酸共重合体、イタコン酸共重合体、マレイン酸共重
合体、側鎖にカルボキシル基を有するセルロース誘導
体、側鎖にカルボキシル基を有するポリビニルアルコー
ル誘導体、側鎖にカルボキシル基を有するヒドロキシア
ルキルアクリレート又はメタクリレート共重合体、側鎖
にカルボキシル基を有する不飽和ポリエステル樹脂等を
挙げることができる。The photosensitive layer used in the present invention preferably contains a high-molecular polymer, particularly preferably contains a high-molecular polymer having an acid value of 10 to 300, and as the polymer,
For example, acrylic acid or methacrylic acid copolymer, crotonic acid copolymer, itaconic acid copolymer, maleic acid copolymer, a cellulose derivative having a carboxyl group in a side chain, a polyvinyl alcohol derivative having a carboxyl group in a side chain, Examples thereof include a hydroxyalkyl acrylate or methacrylate copolymer having a carboxyl group in a side chain, and an unsaturated polyester resin having a carboxyl group in a side chain.
これらのうちで好ましいものは、特開昭55−155355号
公報中に記載されているフェノール性水酸基を側鎖に持
つ共重合体や特開昭50−118802号公報中に記載されてい
る側鎖にアルコール性水酸基を有する共重合体、特に染
色性、接着性の点からアルコール性水酸基含有ポリマー
が好ましく用いられる。Among these, preferred are copolymers having a phenolic hydroxyl group in the side chain described in JP-A-55-155355 and side-chains described in JP-A-50-118802. In particular, a copolymer having an alcoholic hydroxyl group, particularly a polymer having an alcoholic hydroxyl group is preferably used in view of dyeability and adhesiveness.
このアルコール性水酸基含有ポリマーとしては、例え
ば2−ヒドロキシエチルアクリレート、2−ヒドロキシ
エチルメタクリレート、N−(4−ヒドロキシエチルフ
ェニル)メタクリルアミド、ヒドロキシメチルジアセト
ン(メタ)アクリルアミド等が挙げられる。Examples of the alcoholic hydroxyl group-containing polymer include 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, N- (4-hydroxyethylphenyl) methacrylamide, and hydroxymethyldiacetone (meth) acrylamide.
本発明に係る樹脂バインダーとして用いられる高分子
重合体は、その酸価が10〜300の範囲で好ましい結果を
得ることができる。即ち水系現像液において、特にアル
カリ現像性を付与するには、酸価10〜300の範囲のバイ
ンダー樹脂を使用することが好ましく、これにより現像
スピードが速く、しかも良好な画像が得られる。The polymer used as the resin binder according to the present invention can obtain favorable results when the acid value is in the range of 10 to 300. That is, in order to impart alkali developability to an aqueous developer, it is preferable to use a binder resin having an acid value in the range of 10 to 300, whereby a high developing speed and a good image can be obtained.
したがって、酸価が10未満では、現像スピードが不十
分であり、また酸価が300より大きいとオーバー現像に
対して弱いので、このましくない。Therefore, when the acid value is less than 10, the developing speed is insufficient, and when the acid value is more than 300, the film is weak against over-developing.
本発明の現像液に適した感光層には、ジアゾ化合物、
光重合性化合物、光架橋性化合物等が用いられる。好ま
しくはジアゾ樹脂が用いられる。The photosensitive layer suitable for the developer of the present invention includes a diazo compound,
Photopolymerizable compounds, photocrosslinkable compounds and the like are used. Preferably, a diazo resin is used.
本発明に用いられる感光層としては、ジアゾ樹脂の種
々のものを含むが、好ましくは、p−ジアゾジフェニル
アミンとホルムアルデヒドとの縮合物で代表されるジア
ゾ樹脂であって、水不溶性で有機溶媒可溶性のもので、
好ましくは特公昭47−1167号及び同57−43890号公報等
に記載されているような水不溶性かつ通常の有機溶媒可
溶性のものが使用される。特に好ましくは下記の一般式
[I]で示されるジアゾ樹脂である。The photosensitive layer used in the present invention includes various types of diazo resins, and is preferably a diazo resin represented by a condensate of p-diazodiphenylamine and formaldehyde, and is water-insoluble and organic solvent-soluble. Things
Preferably, those which are insoluble in water and soluble in ordinary organic solvents as described in JP-B-47-1167 and JP-B-57-43890 are used. Particularly preferred is a diazo resin represented by the following general formula [I].
一般式[I] [式中、R1、R2およびR3は、水素原子、アルキル基又は
アルコキシ基を示し、R4は水素原子、アルキル基又はフ
ェニル基を示す。General formula [I] [Wherein R 1 , R 2 and R 3 represent a hydrogen atom, an alkyl group or an alkoxy group, and R 4 represents a hydrogen atom, an alkyl group or a phenyl group.
XはPF6又はBF4を示し、Yは−NH−、−S−又は−O
−を示す。] 本発明に用いられるジアゾ樹脂におけるジアゾモノマ
ーとしては、例えば、4−ジアゾ−ジフェニルアミン、
1−ジアゾ−4−N,N−ジメチルアミノベンゼン、1−
ジアゾ−4−N,N−ジエチルアミノベンゼン、1−ジア
ゾ−4−N−エチル−N−ヒドロキシエチルアミノベン
ゼン、1−ジアゾ−4−N−メチル−N−ヒドロキシエ
チルアミノベンゼン、1−ジアゾ−2,5−ジエトキシ−
4−ベンゾイルアミノベンゼン、1−ジアゾ−4−N−
ベンジルアミノベンゼン、1−ジアゾ−4−N,N−ジメ
チルアミノベンゼン、1−ジアゾ−4−モノホリノベン
ゼン、1−ジアゾ−2,5−ジメトキシ−4−p−トリル
メルカプトベンゼン、1−ジアゾ−2−エトキシ−4−
N,N−ジメチルアミノベンゼン、p−ジアゾ−ジメチル
アニルン、1−ジアゾ−2,5−ジブトキシ−4−モルホ
リノベンゼン、1−ジアゾ−2,5−ジエトキシ−4−モ
ルホリノベンゼン、1−ジアゾ−2,5−ジメトキシ−4
−モルホリノベンゼン、1−ジアゾ−2,5−ジエトキシ
−4−p−トリルメルカプトベンゼン、1−ジアゾ−4
−N−エチル−N−ヒドロキシエチルアミノベンゼン、
1−ジアゾ−3−エトキシ−4−N−メチル−N−ベン
ジルアミノベンゼン、1−ジアゾ−3−クロロ−4−N,
N−ジエチルアミノベンゼン、1−ジアゾ−3−メチル
−4−ピロリジノベンゼン、1−ジアゾ−2−クロロ−
4−N,N−ジメチルアミノ−5−メトキシベンゼン、1
−ジアゾ−3−メトキシ−4−ピロリジノベンゼン、3
−メトキシ−4−ジアゾフェニルアミン、3−エトキシ
−4−ジアゾジフェニルアミン、3−(n−プロポキ
シ)−4−ジアゾジフェニルアミン、3−(イソプロポ
キシ)−4−ジアゾジフェニルアミン等が挙げられる。X represents a PF 6 or BF 4, Y is -NH -, - S- or -O
Indicates-. As the diazo monomer in the diazo resin used in the present invention, for example, 4-diazo-diphenylamine,
1-diazo-4-N, N-dimethylaminobenzene, 1-
Diazo-4-N, N-diethylaminobenzene, 1-diazo-4-N-ethyl-N-hydroxyethylaminobenzene, 1-diazo-4-N-methyl-N-hydroxyethylaminobenzene, 1-diazo-2 , 5-diethoxy-
4-benzoylaminobenzene, 1-diazo-4-N-
Benzylaminobenzene, 1-diazo-4-N, N-dimethylaminobenzene, 1-diazo-4-monophorinobenzene, 1-diazo-2,5-dimethoxy-4-p-tolylmercaptobenzene, 1-diazo -2-ethoxy-4-
N, N-dimethylaminobenzene, p-diazo-dimethylanilone, 1-diazo-2,5-dibutoxy-4-morpholinobenzene, 1-diazo-2,5-diethoxy-4-morpholinobenzene, 1-diazo- 2,5-dimethoxy-4
Morpholinobenzene, 1-diazo-2,5-diethoxy-4-p-tolylmercaptobenzene, 1-diazo-4
-N-ethyl-N-hydroxyethylaminobenzene,
1-diazo-3-ethoxy-4-N-methyl-N-benzylaminobenzene, 1-diazo-3-chloro-4-N,
N-diethylaminobenzene, 1-diazo-3-methyl-4-pyrrolidinobenzene, 1-diazo-2-chloro-
4-N, N-dimethylamino-5-methoxybenzene, 1
-Diazo-3-methoxy-4-pyrrolidinobenzene, 3
-Methoxy-4-diazophenylamine, 3-ethoxy-4-diazodiphenylamine, 3- (n-propoxy) -4-diazodiphenylamine, 3- (isopropoxy) -4-diazodiphenylamine and the like.
前記ジアゾモノマーとの縮合剤として用いられるアル
デヒドとしては、例えば、ホルムアルデヒド、アセトア
ルデヒド、プロピオンアルデヒド、ブチルアルデヒド、
イソブチルアルデヒド、またはベンズアルデヒド等が挙
げられる。As the aldehyde used as a condensing agent with the diazo monomer, for example, formaldehyde, acetaldehyde, propionaldehyde, butyraldehyde,
Isobutyraldehyde, benzaldehyde and the like can be mentioned.
更に陰イオンとしては、塩素イオンやテトラクロロ亜
鉛酸等を用いることにより水溶性のジアゾ樹脂を得るこ
とができ、また四フッ化ホウ素、六フッ化燐酸、トリイ
ソプロピルナフタレンスルホン酸、4,4′−ビフェニル
ジスルホン酸、2,5−ジメチルベンゼンスルホン酸、2
−ニトロベンゼンスルホン酸、2−メトキシ−4−ヒド
ロキシ−5−ベンゾイル−ベンゼンスルホン酸等を用い
ることにより、有機溶剤可溶性のジアゾ樹脂を得ること
ができる。特に好ましくは、六フッ化燐酸からなるジア
ゾ樹脂が用いられる。Further, as the anion, a water-soluble diazo resin can be obtained by using a chloride ion, tetrachlorozinc acid or the like, and boron tetrafluoride, phosphorous hexafluoride, triisopropylnaphthalenesulfonic acid, 4,4 ′ -Biphenyldisulfonic acid, 2,5-dimethylbenzenesulfonic acid, 2
By using -nitrobenzenesulfonic acid, 2-methoxy-4-hydroxy-5-benzoyl-benzenesulfonic acid, or the like, an organic solvent-soluble diazo resin can be obtained. Particularly preferably, a diazo resin composed of hexafluorophosphoric acid is used.
ジアゾ樹脂は皮膜形成性樹脂、特に水酸基を有する高
分子化合物と混合して使用するのが好ましい。特に好ま
しくは、高分子化合物としては、側鎖に脂肪族水酸基を
有するモノマー、例えば2−ヒドロキシエチルアクリレ
ート又は2−ヒドロキシエチルメタクリレートと他の共
重合し得るモノマーとの共重合体が挙げられる。The diazo resin is preferably used in combination with a film-forming resin, particularly a polymer compound having a hydroxyl group. Particularly preferably, the polymer compound includes a monomer having an aliphatic hydroxyl group in a side chain, for example, a copolymer of 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate with another copolymerizable monomer.
これら以外にも、必要に応じてポリビニルブチラール
樹脂、ポリウレタン樹脂、ポリアミド樹脂、エポキシ樹
脂、ノボラック樹脂、天然樹脂等を添加してもよい。In addition to these, a polyvinyl butyral resin, a polyurethane resin, a polyamide resin, an epoxy resin, a novolak resin, a natural resin, and the like may be added as necessary.
この他ジアゾニウム塩と併用される結合剤としては種
々の高分子化合物が使用され得るが、好ましくは特開昭
54−98613号公報に記載されているような芳香族性水酸
基を有する単量体、例えばN−(4−ヒドロキシフェニ
ル)アクリルアミド、N−(4−ヒドロキシフェニル)
メタクリルアミド、o−,m−,またはp−ヒドロキシス
チレン、o−,m−,またはp−ヒドロキシフェニルメタ
クリレート等と他の単量体との共重合体、米国特許第4,
123,276号明細書に記載されているようなヒドロキシエ
チルアクリレート単位またはヒドロキシエチルメタクリ
レート単位を主なる繰り返し単位として含むポリマー等
が挙げられる。As the binder used in combination with the diazonium salt, various polymer compounds can be used.
Monomers having an aromatic hydroxyl group as described in JP-A-54-98613, for example, N- (4-hydroxyphenyl) acrylamide, N- (4-hydroxyphenyl)
Copolymers of methacrylamide, o-, m-, or p-hydroxystyrene, o-, m-, or p-hydroxyphenyl methacrylate with other monomers, U.S. Pat.
Polymers containing a hydroxyethyl acrylate unit or a hydroxyethyl methacrylate unit as a main repeating unit as described in 123,276 are exemplified.
これらポリマー以外にも、必要に応じてポリビニルブ
チラール樹脂、ポリウレタン樹脂、ポリアミド樹脂、エ
ポキシ樹脂、ノボラック樹脂、シェラック、ロジン等の
天然樹脂、ポリビニルアルコール、米国特許第3,751,25
7号明細書に記載されているポリアミド樹脂、米国特許
第3,660,097号明細書に記載されている線状ポリウレタ
ン樹脂、ポリビニルアルコールのフタレート化樹脂、ビ
スフェノールAとエピクロルヒドリンから縮合されたエ
ポキシ樹脂、酢酸セルロース、セルロースアセテートフ
タレート等のセルロース類が含有される。In addition to these polymers, if necessary, polyvinyl butyral resin, polyurethane resin, polyamide resin, epoxy resin, novolak resin, shellac, rosin and other natural resins, polyvinyl alcohol, US Patent No. 3,751,25
No. 7, the polyamide resin described in U.S. Pat.No. 3,660,097, a linear polyurethane resin described in U.S. Pat.No. 3,660,097, a phthalated resin of polyvinyl alcohol, an epoxy resin condensed from bisphenol A and epichlorohydrin, cellulose acetate, It contains celluloses such as cellulose acetate phthalate.
アルカリ可溶性樹脂としては、ノボラック樹脂、フェ
ノール性水酸基を有するビニル系重合体、特開昭55−57
841号公報に記載されている多価フェノールとアルデヒ
ド又はケトンとの縮合樹脂等が挙げられる。ノボラック
樹脂としては、例えばフェノール・ホルムアルデヒド樹
脂、クレゾール・ホルムアルデヒド樹脂、特開昭55−57
841号公報に記載されているようなフェノール・クレゾ
ール・ホルムアルデヒド共重縮合樹脂、特開昭55−1275
53号公報に記載されているようなp−置換フェノールと
フェノールもしくは、クレゾールとホルムアルデヒドと
の共重縮合樹脂等が挙げられる。Examples of alkali-soluble resins include novolak resins, vinyl polymers having phenolic hydroxyl groups, and JP-A-55-57
And a condensation resin of a polyhydric phenol and an aldehyde or ketone described in JP-A-841. Novolak resins include, for example, phenol-formaldehyde resin, cresol-formaldehyde resin, and JP-A-55-57
Phenol / cresol / formaldehyde copolycondensation resin as described in JP 841
No. 53, a copolycondensation resin of p-substituted phenol and phenol or cresol and formaldehyde, and the like.
本発明に用いられるジアゾ樹脂は、バインダー樹脂と
混合して用いられるが、このバインダー樹脂を100とし
た場合に、ジアゾ樹脂20重量部〜200重量部の範囲がよ
く、好ましくは50重量部〜150重量部の範囲である。The diazo resin used in the present invention is used by being mixed with a binder resin.When the binder resin is taken as 100, the diazo resin has a good range of 20 to 200 parts by weight, preferably 50 to 150 parts by weight. It is in the range of parts by weight.
これらの感光性組成物には、その他の染料、顔料等の
色素、感脂化剤、可塑剤、界面活性剤などを添加するこ
とができる。これらの添加剤の添加量としては、感光層
の固形分中に0.1重量%〜20重量%、好ましくは0.5重量
%〜10重量%の範囲で用いられる。To these photosensitive compositions, other dyes such as dyes and pigments, sensitizers, plasticizers, surfactants and the like can be added. These additives are used in an amount of 0.1% by weight to 20% by weight, preferably 0.5% by weight to 10% by weight, based on the solid content of the photosensitive layer.
また重合体主鎖または側鎖に感光基として を含むポリエステル類、ポリアミド類、ポリカーボネー
ト類のような感光性重合体を主成分とするものも挙げら
れる。例えば、特開昭55−40415号に記載されているよ
うなフェニレンジエチルアクリレートと水素添加したビ
スフェノールAおよびトリエチレングリコールとの縮合
で得られる感光性ポリエステル、米国特許第2,956,878
号明細書中に記載されているようなシンナミリデンマロ
ン酸等の(2−プロペリデン)マロン酸化合物及び二官
能性グリコール類から誘導される感光性ポリエステル類
等が挙げられる。Also as a photosensitive group on the polymer main chain or side chain And those containing a photosensitive polymer as a main component, such as polyesters, polyamides, and polycarbonates. For example, a photosensitive polyester obtained by condensation of phenylenediethyl acrylate with hydrogenated bisphenol A and triethylene glycol as described in JP-A-55-40415, U.S. Pat. No. 2,956,878
And (2-properidene) malonic acid compounds such as cinnamylidenemalonic acid and photosensitive polyesters derived from difunctional glycols.
さらにまた、付加重合性不飽和化合物からなる光重合
性組成物も挙げられる。Furthermore, a photopolymerizable composition comprising an addition-polymerizable unsaturated compound is also included.
ここで不飽和モノマーとしては、アルコール類(例え
ば、エタノール、プロパノール、ヘキサノール、オクタ
ノール、シクロヘキサノール、エチレングリコール、プ
ロピレングリコール、ジエチレングリコール、トリエチ
レングリコール、テトラエチレングリコール、ポリエチ
レングリコール、グリセリン、トリメチロールプロパ
ン、ペンタエリスリトール等)のアクリル酸またはメタ
クリル酸エステル、 アミン類(例えば、メチルアミン、エチルアミン、ブ
チルアミン、ベンジルアミン、エチレンジアミン、ジエ
チレントリアミン、ヘキサメチレンジアミン、キシリレ
ンジアミン、ジメチルアミン、ジエチルアミン、エタノ
ールアミン、ジエタノールアミン、アニリン等)とアク
リル酸グリシジルまたはメタクリル酸グリシジルとの反
応生成物。Here, the unsaturated monomer includes alcohols (for example, ethanol, propanol, hexanol, octanol, cyclohexanol, ethylene glycol, propylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, glycerin, trimethylolpropane, pentane Acrylic acid or methacrylic acid ester of erythritol, etc., amines (eg, methylamine, ethylamine, butylamine, benzylamine, ethylenediamine, diethylenetriamine, hexamethylenediamine, xylylenediamine, dimethylamine, diethylamine, ethanolamine, diethanolamine, aniline, etc.) ) With glycidyl acrylate or glycidyl methacrylate Adult.
カルボン酸(例えば、酢酸、プロピオン酸、安息香
酸、アクリル酸、メタクリル酸、コハク酸、マレイン
酸、フタル酸、酒石酸、クエン酸等)とアクリル酸グリ
シジルまたはメタクリル酸グリシジルとの反応生成物。Reaction products of carboxylic acids (eg, acetic acid, propionic acid, benzoic acid, acrylic acid, methacrylic acid, succinic acid, maleic acid, phthalic acid, tartaric acid, citric acid, etc.) with glycidyl acrylate or glycidyl methacrylate.
アミド誘導体(例えば、アクリルアミド、メタクリル
アミド、N−メチロールアクリルアミド、メチレンビス
アクリルアミド等)、 エポキシ化合物とアクリル酸またはメタクリル酸との
反応物等を使用することができる。An amide derivative (for example, acrylamide, methacrylamide, N-methylolacrylamide, methylenebisacrylamide, etc.), a reaction product of an epoxy compound and acrylic acid or methacrylic acid, or the like can be used.
光重合開始剤としては、次のようなものを使用するこ
とができる。The following can be used as the photopolymerization initiator.
ベンゾインメチルエーテル、ベンゾインイソプロピル
エーテル、α,α−ジメトキシ−α−フェニルアセトフ
ェノン等のベンゾイン誘導体、ベンゾフェノン、2,4−
ジクロルベンゾフェノン、o−ベンゾイル安息香酸メチ
ル、4,4′−ビス(ジメチルアミノ)ベンゾフェノン、
4,4′−ビス(ジエチルアミノ)ベンゾフェノン等のベ
ンゾフェノン誘導体、2−クロルチオキサントン、2−
イソプロピルチオキサントン等のチオキサントン誘導
体、2−クロルアントラキノン、2−メチルアントラキ
ノン等のアントラキノン誘導体、N−メチルアクリド
ン、N−ブチルアクリドン等のアクリドン誘導体、α,
α−ジエトキシアセトフェノン、ベンジル、フルオレノ
ン、キサントン、ウラニル化合物、ハロゲン化合物等。Benzoin derivatives such as benzoin methyl ether, benzoin isopropyl ether, α, α-dimethoxy-α-phenylacetophenone, benzophenone, 2,4-
Dichlorobenzophenone, methyl o-benzoylbenzoate, 4,4'-bis (dimethylamino) benzophenone,
Benzophenone derivatives such as 4,4'-bis (diethylamino) benzophenone, 2-chlorothioxanthone,
Thioxanthone derivatives such as isopropylthioxanthone, anthraquinone derivatives such as 2-chloroanthraquinone and 2-methylanthraquinone, acridone derivatives such as N-methylacridone and N-butylacridone, α,
α-diethoxyacetophenone, benzyl, fluorenone, xanthone, uranyl compounds, halogen compounds and the like.
またこの光重合性組成物は、好ましくは結合剤が添加
される。結合剤としては、ジアゾ樹脂と共に用いたもの
が使用でき、さらに好ましくは特公昭49−17874号等に
記載されている側鎖にエチレン性不飽和結合を有する光
架橋性の共重合体が使用される。In addition, a binder is preferably added to the photopolymerizable composition. As the binder, those used together with the diazo resin can be used, and more preferably, a photocrosslinkable copolymer having an ethylenically unsaturated bond in a side chain described in JP-B-49-17874 is used. You.
感光層には、上記以外に露光後或は現像後に像を可視
化させるための色素、例えば、ビクトリアピュアブルー
BOH(保土谷化学社製)、オイルブルー#603(オリエン
ト化学工業社製)等のトリフェニルメタン系、ジフェニ
ルメタン系色素等、露光により酸を発生する物質(光酸
発生剤)として、感光性ジアゾ化合物、o−ナフトキノ
ンジアジド化合物、トリハロメチル基を有する芳香族化
合物、例えばトリハロメチル基を有するオキサジアゾー
ル化合物あるいはトリハロメチル基を有するs−トリア
ジン化合物等(具体的には特開昭62−112162号公報や参
照)を含有している。In addition to the above, a dye for visualizing an image after exposure or development, for example, Victoria Pure Blue
Photo-sensitive diazo compounds such as triphenylmethane-based and diphenylmethane-based dyes such as BOH (made by Hodogaya Chemical) and Oil Blue # 603 (made by Orient Chemical Industries), etc. Compounds, o-naphthoquinonediazide compounds, aromatic compounds having a trihalomethyl group, such as oxadiazole compounds having a trihalomethyl group or s-triazine compounds having a trihalomethyl group (for example, see JP-A-62-112162). Gazettes and references).
また感光層には塗布性を改良するためのアルキルエー
テル類(例えば、エチルセルロース、メチルセルロース
等)、弗素系界面活性剤、ノニオン系界面活性剤(例え
ば、プルロニックL64(旭電化社製)等)、塗膜の柔軟
性を付与するための可塑剤(例えば、ポリエチレングリ
コール、リン酸トリクレジル、アクリル酸又はメタクリ
ル酸ポリマー等)、安定剤(例えばリン酸等)を含有す
ることができる。Further, in the photosensitive layer, alkyl ethers (for example, ethylcellulose, methylcellulose, etc.) for improving coating properties, fluorine surfactants, nonionic surfactants (for example, Pluronic L64 (manufactured by Asahi Denka Co., Ltd.), etc.), A plasticizer (for example, polyethylene glycol, tricresyl phosphate, acrylic acid or methacrylic acid polymer, etc.) and a stabilizer (for example, phosphoric acid, etc.) for imparting flexibility of the membrane can be contained.
本発明に用いられるシリコーンゴムとしては、次のよ
うな一般式[I]で示される繰り返し単位を有する分子
量数千〜数十万の主鎖中または主鎖の末端に水酸基を有
する線状有機ポリシロキサンを主成分とするものが好ま
しい。As the silicone rubber used in the present invention, a linear organic polymer having a repeating unit represented by the following general formula [I] and having a hydroxyl group in the main chain or at the terminal of the main chain having a molecular weight of thousands to hundreds of thousands is preferred. Those containing siloxane as a main component are preferred.
一般式[I] ここでnは2以上の整数、Rは炭素数1〜10のアルキ
ル基、ハロゲン化アルキル基、アルコキシル基、ビニル
基、アリール基、シラノール基(OH基)、であり、Rの
60%以上がメチル基であるものが好ましい。なお上記シ
ラノール基(OH基)は主鎖中または主鎖の末端のどちら
にあってもよいが、末端にあることが好ましい。General formula [I] Here, n is an integer of 2 or more, and R is an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group, an alkoxyl group, a vinyl group, an aryl group, or a silanol group (OH group).
Those in which 60% or more are methyl groups are preferred. The silanol group (OH group) may be in the main chain or at the terminal of the main chain, but is preferably at the terminal.
本発明に用いられるシランカップリング剤(またはシ
リコーン架橋剤)としては、 RnSiX4-n (式中、nは1〜3の整数であり、Rはアルキル、アリ
ール、アルケニルまたはこれらの組合された一価の基を
表し、またこれらの基はハロゲン、アミン、ヒドロキ
シ、アルコキシ、アリーロキシ、チオール等の官能基を
有していてもよい。Xは−OH、−OR2、−OAc、 −Cl、−Br、−I等の置換基を表す。ここでR2、R3は上
記のRと同じものを表し、R2、R3はそれぞれ同じであっ
ても異っていてもよい。またAcはアセチル基を表す。)
で示されるシラン化合物である。As the silane coupling agent (or silicone crosslinking agent) used in the present invention, R n SiX 4-n (where n is an integer of 1 to 3, and R is alkyl, aryl, alkenyl or a combination thereof) representing a monovalent group, and these groups are halogen, amine, hydroxy, alkoxy, aryloxy, optionally .X have a functional group of the thiol such as -OH, -OR 2, -OAc, Represents a substituent such as -Cl, -Br, -I. Here, R 2 and R 3 represent the same as R described above, and R 2 and R 3 may be the same or different. Ac represents an acetyl group. )
Is a silane compound represented by
つまり本発明において有用なシリコーンゴムは、この
ようなシリコーン・ベースポリマーと、上記に挙げるよ
うなシリコーン架橋剤との縮合反応によって得られるも
のである。That is, the silicone rubber useful in the present invention is obtained by a condensation reaction of such a silicone base polymer with the above-mentioned silicone crosslinking agent.
本発明に用いられるシランカップリング剤の具体例と
しては、 HN[(CH2)3Si(OMe)3]2、ビニルトリエトキシ
シラン、Cl(CH2)3Si(OMe)3、CH3Si(OAc)3、HS
(CH2)3Si(OMe)3、ビニルトリス(メチルエチルケ
トオキシム)シラン等が挙げられる。Specific examples of the silane coupling agent used in the present invention, HN [(CH 2) 3 Si (OMe) 3] 2, vinyltriethoxysilane, Cl (CH 2) 3 Si (OMe) 3, CH 3 Si (OAc) 3 , HS
(CH 2 ) 3 Si (OMe) 3 , vinyltris (methylethylketoxime) silane and the like.
前記のシリコーンゴムは市販品としても入手でき、例
えば東芝シリコーン社製YE−3085等がある。またその他
の有用なシリコーンゴムは、前述の如きベース・ポリマ
ーと、次のような一般式[II]で示される繰り返し単位
を有するシリコーンオイルとの反応、あるいはRの3%
程度がビニル基であるシリコーンのベース・ポリマーと
の付加反応、あるいは該シリコーンオイル同士の反応に
よっても得ることができる。The silicone rubber is also available as a commercial product, for example, YE-3085 manufactured by Toshiba Silicone Co., Ltd. Another useful silicone rubber is a reaction of the base polymer as described above with a silicone oil having a repeating unit represented by the following general formula [II], or 3% of R
It can also be obtained by an addition reaction of a silicone having a vinyl group with a base polymer or a reaction between the silicone oils.
一般式[II] (式中、Rは一般式[I]で示されるポリマーの置換基
であるRと同義であり、mは2以上の整数、nは0また
は1以上の整数である。) このような架橋反応によってシリコーンゴムを得るた
めには、架橋反応を触媒を用いて行う。この触媒として
は、錫、亜鉛、コバルト、鉛、カルシウム、マンガン、
等の金属の有機カルボン酸塩、例えばラウリル酸ジブチ
ルスズ、スズ(II)オクトエート、ナフテン酸コバルト
等、あるいは塩化金酸等が用いられる。General formula [II] (In the formula, R has the same meaning as R which is a substituent of the polymer represented by the general formula [I], m is an integer of 2 or more, and n is 0 or an integer of 1 or more.) Such a crosslinking reaction In order to obtain a silicone rubber, a crosslinking reaction is carried out using a catalyst. This catalyst includes tin, zinc, cobalt, lead, calcium, manganese,
Organic carboxylate salts of metals such as dibutyltin laurate, tin (II) octoate, cobalt naphthenate, and chloroauric acid are used.
またシリコーンゴムの強度を向上させ、印刷作業中に
生じる摩擦力に耐えるシリコーンゴムを得るためには、
充填剤(フィラー)を混合することもできる。予めフィ
ラーの混合されたシリコーンゴムは、シリコーンゴムス
トック、あるいはシリコーンゴムディスバージョンとし
て市販されており、本発明のようにコーティングにより
シリコーンゴム膜を得ることが好ましい場合には、RTV
あるいはLTVシリコーンゴムのディスバージョンが好ん
で用いられる。このような例としては、トーレシリコー
ン社製Syl Off 23、SRX−257、SH237等のペーパーコー
ティング用シリコーンゴムディスバージョンがある。In order to improve the strength of silicone rubber and obtain silicone rubber that can withstand the frictional force generated during printing work,
Fillers can also be mixed. Silicone rubber premixed with a filler is commercially available as silicone rubber stock or silicone rubber dispersion.If it is preferable to obtain a silicone rubber film by coating as in the present invention, RTV is used.
Alternatively, a disversion of LTV silicone rubber is preferably used. Such examples include silicone rubber disversions for paper coating such as Syl Off 23, SRX-257, SH237 manufactured by Toray Silicone.
本発明においては、縮合架橋タイプのシリコーンゴム
を用いることが好ましい。In the present invention, it is preferable to use a condensation-crosslinking type silicone rubber.
シリコーンゴム層には、更に接着性を向上させるため
にアミノ基を有するシランカップリング剤を含有してい
ることが好ましい。It is preferable that the silicone rubber layer contains a silane coupling agent having an amino group in order to further improve the adhesiveness.
好ましいシランカップリング剤としては、例えば次の
ようなものがある。Preferred silane coupling agents include, for example, the following.
(a)H2NCH2CH2NH(CH2)3Si(OCH3)3 (b)H2NCE2CH2NH(CH2)3Si(OCH3)2(CH3) (c)H2N(CH2)3Si(OEt)3 本発明に用いられるシリコーンゴム層中には、更に光
増感剤を少量含有させることができる。(A) H 2 NCH 2 CH 2 NH (CH 2 ) 3 Si (OCH 3 ) 3 (b) H 2 NCE 2 CH 2 NH (CH 2 ) 3 Si (OCH 3 ) 2 (CH 3 ) (c) H 2 N (CH 2 ) 3 Si (OEt) 3 The silicone rubber layer used in the present invention may further contain a small amount of a photosensitizer.
本発明に用いられるシリコーンゴム層は、シリコーン
ゴムを適当な溶媒に溶解した後、感光層上に塗布、乾燥
する。The silicone rubber layer used in the present invention is obtained by dissolving the silicone rubber in a suitable solvent, and then coating and drying the photosensitive layer.
本発明の支持体としては、通常の平版印刷機にセット
できるたわみ性と印刷時に加わる荷重に耐えるものであ
ることが好ましく、例えばアルミニウム、亜鉛、銅、鋼
等の金属板、及びクロム、亜鉛、銅、ニッケル、アルミ
ニウム及び鉄等がメッキまたは蒸着された金属板、紙、
プラスチックフィルム及びガラス板、樹脂コート紙、ア
ルミニウム等の金属箔が張られた紙等が挙げられる。The support of the present invention is preferably a material that can be set in a normal lithographic printing machine and withstands a load applied during printing, such as aluminum, zinc, copper, a metal plate such as steel, and chromium, zinc, and the like. Copper, nickel, aluminum and iron plated or evaporated metal plate, paper,
Examples thereof include plastic films and glass plates, resin-coated paper, and paper on which metal foil such as aluminum is stretched.
これらのうち好ましいものはアルミニウム板である。 Of these, an aluminum plate is preferred.
上記接着性向上のための支持体自体に対する処理は特
に限定されるものではなく、各種粗面化処理等が含まれ
る。The treatment on the support itself for improving the adhesion is not particularly limited, and includes various surface roughening treatments and the like.
支持体にはプライマー層を有していてもよく、該プラ
イマー層には例えばポリエステル樹脂、塩化ビニル−酢
酸ビニル共重合体、アクリル樹脂、塩化ビニル樹脂、ポ
リアミド樹脂、ポリビニルブチラール樹脂、エポキシ樹
脂、アクリレート系共重合体、酢酸ビニル系共重合体、
フェノキシ樹脂、ポリウレタン樹脂、ポリカーボネート
樹脂、ポリアクリロニトリルブタジエン、ポリ酢酸ビニ
ル等が挙げられる。これらのプライマー層には、前記露
光により酸を発生する化合物及び酸により変色あるいは
褪色する染料を添加することができる。The support may have a primer layer, and the primer layer includes, for example, a polyester resin, a vinyl chloride-vinyl acetate copolymer, an acrylic resin, a vinyl chloride resin, a polyamide resin, a polyvinyl butyral resin, an epoxy resin, and an acrylate. Copolymer, vinyl acetate copolymer,
Phenoxy resin, polyurethane resin, polycarbonate resin, polyacrylonitrile butadiene, polyvinyl acetate and the like can be mentioned. To these primer layers, a compound capable of generating an acid upon exposure and a dye capable of discoloring or fading due to the acid can be added.
また上記プライマー層を構成するアンカー剤として
は、例えば前記シランカップリング剤、シリコーンプラ
イマー等を用いることができ、また有機チタネート等も
有効である。Further, as the anchor agent constituting the primer layer, for example, the above-mentioned silane coupling agent, silicone primer and the like can be used, and organic titanate is also effective.
本発明の版材を構成する各層の厚さは、以下の通りで
ある。即ち支持体は50〜400μm、好ましくは100〜300
μm、感光層は0.05〜10μm、好ましくは0.5〜5μ
m、シリコーンゴム層は0.1〜10μm、好ましくは0.5〜
2μmである。The thickness of each layer constituting the printing plate of the present invention is as follows. That is, the support is 50 to 400 μm, preferably 100 to 300 μm.
μm, photosensitive layer is 0.05-10 μm, preferably 0.5-5 μm
m, the silicone rubber layer is 0.1 to 10 μm, preferably 0.5 to 10 μm.
2 μm.
本発明において、シリコーンゴム層の上面には必要に
応じて保護層を有していてもよい。In the present invention, a protective layer may be provided on the upper surface of the silicone rubber layer, if necessary.
実施例−1 ジアゾ樹脂−1の合成 p−ジアゾジフェニルアミン硫酸塩14.5g(50ミリモ
ル)を氷冷下で40.9gの濃硫酸に溶解した。この反応液
に1.35g(45ミリモル)のパラホルムアルデヒドを反応
温度が10℃を超えないようにゆっくり添加した。Example 1 Synthesis of diazo resin-1 14.5 g (50 mmol) of p-diazodiphenylamine sulfate was dissolved in 40.9 g of concentrated sulfuric acid under ice-cooling. To this reaction solution, 1.35 g (45 mmol) of paraformaldehyde was slowly added so that the reaction temperature did not exceed 10 ° C.
この反応混合物の氷冷下、500mlのエタノールに滴下
し、生じた沈殿を濾過した。エタノールで洗浄後、この
沈殿物を100mlの純水に溶解し、この液に6.8gの塩化亜
鉛を溶解した冷濃厚水溶液を加えた。The reaction mixture was added dropwise to 500 ml of ethanol under ice cooling, and the resulting precipitate was filtered. After washing with ethanol, this precipitate was dissolved in 100 ml of pure water, and a cold concentrated aqueous solution in which 6.8 g of zinc chloride was dissolved was added to this solution.
生じた沈殿を濾過した後、エタノールで洗浄し、これ
を150mlの純水に溶解した。この液に8gのヘキサフルオ
ロリン酸アンモニウムを溶解して冷濃厚水溶液を加え
た。生じた沈殿を濾取し水洗した後、乾燥してジアゾ樹
脂−1を得た。The resulting precipitate was filtered, washed with ethanol, and dissolved in 150 ml of pure water. 8 g of ammonium hexafluorophosphate was dissolved in this solution, and a cold concentrated aqueous solution was added. The resulting precipitate was collected by filtration, washed with water, and dried to obtain diazo resin-1.
アルミニウム版aの製造 厚さ0.24mmのアルミニウム版を3%水酸化ナトリウム
水溶液に浸漬し水洗した後、32%硫酸水溶液において温
度30℃で5A/dm2の条件で10秒間、陽極酸化を行い、水洗
し、2%メタケイ酸ナトリウム水溶液に温度85℃で37秒
間浸漬し、更に温度90℃の水(pH8.5)に25秒間浸漬
し、水洗、乾燥して、アルミニウム板aを得た。Production of aluminum plate a An aluminum plate having a thickness of 0.24 mm is immersed in a 3% aqueous sodium hydroxide solution and washed with water, and then anodized in a 32% aqueous sulfuric acid solution at 30 ° C. and 5 A / dm 2 for 10 seconds. The plate was washed with water, immersed in a 2% sodium metasilicate aqueous solution at a temperature of 85 ° C. for 37 seconds, further immersed in water (pH 8.5) at a temperature of 90 ° C. for 25 seconds, washed with water and dried to obtain an aluminum plate a.
アルミニウム板aに下記の組成のプライマー層組成物
を塗布し、85℃で3分間乾燥した後、3KW超高圧水銀灯
を用いて1000mJ/cm2の全面露光を行った。更に100℃で
4分間乾燥して厚さ0.8μmのプライマー層を形成し
た。A primer layer composition having the following composition was applied to an aluminum plate a, dried at 85 ° C. for 3 minutes, and then subjected to a 1000 mJ / cm 2 entire surface exposure using a 3 KW ultra-high pressure mercury lamp. It was further dried at 100 ° C. for 4 minutes to form a 0.8 μm thick primer layer.
プライマー層組成物 (1)ジアゾ樹脂−1 8部 (2)2−ヒドロキシエチルメタクリレート、メタクリ
ル酸メチルのモル比34/64の共重合樹脂−1 82部 (3)HPC L−P(信越化学工業社製、ヒドロキシプ
ロピルセルロース) 20部 (4)メチルセロソルブ 900部 次に上記プライマー層上に下記の組成の感光性組成物
を塗布し、100℃で2分間乾燥して厚さ0.3μmの感光層
を形成した。Primer layer composition (1) diazo resin-18 parts (2) 2-hydroxyethyl methacrylate, methyl methacrylate copolymer resin with a molar ratio of 34/64-82 parts (3) HPC LP (Shin-Etsu Chemical Co., Ltd.) (4) Methyl cellosolve 900 parts Next, a photosensitive composition having the following composition was applied on the primer layer, and dried at 100 ° C. for 2 minutes to obtain a photosensitive layer having a thickness of 0.3 μm. Was formed.
(感光性組成物) (1)ジアゾ樹脂−1 50部 (2)2−ヒドロキシエチルメタクリレート、N−(4
−ヒドロキシフェニル)メタクリルアミド、メタクリル
酸のモル比40/57/3の供重合樹脂−1 50部 (3)ビクトリアピュアブルーBOH(保土ケ谷化学
(株)製、染料) 1部 (4)メチルセロソルブ 900部 次いで上記感光層上に下記シリコーンゴム組成物を乾
燥重量で1.8g/m2になるように塗布し、90℃で10分間乾
燥した。(Photosensitive composition) (1) 50 parts of diazo resin-1 (2) 2-hydroxyethyl methacrylate, N- (4
-Hydroxyphenyl) methacrylamide, methacrylic acid Resin having a molar ratio of 40/57/3-150 parts (3) Victoria Pure Blue BOH (manufactured by Hodogaya Chemical Co., Ltd., dye) 1 part (4) Methyl cellosolve 900 Next, the following silicone rubber composition was applied on the above-mentioned photosensitive layer so as to have a dry weight of 1.8 g / m 2 , and dried at 90 ° C. for 10 minutes.
(シリコーンゴム層組成物) (1)両末端に水酸基を有するジメチルポリシロキサン
(分子量82,000) 100部 (2)トリアセトキシメチルシラン 10部 (3)ジブチル錫ラウレート 0.8部 (4)アイソパーE(エッソ化学製) 900部 次に、上記シリコーンゴム層上に厚さ5μの片面マッ
ト化ポリプロピレンフィルムをラミネートし、水なし平
版を得た。(Silicone rubber layer composition) (1) Dimethylpolysiloxane having hydroxyl groups at both ends (molecular weight 82,000) 100 parts (2) Triacetoxymethylsilane 10 parts (3) Dibutyltin laurate 0.8 parts (4) Isopar E (Esso Chemical) Next, a 5 μm-thick, single-sided matted polypropylene film was laminated on the silicone rubber layer to obtain a waterless planographic plate.
上記の版材料の上面にポジフィルムを真空密着させた
後、光源としてメタルハライドランプを用いて露光し
た。次に、下記の現像液−1を第1図に示した自動現像
機に30仕込み、現像部のブラシで擦ることにより、未
露光部分のシリコーンゴム層と感光層が除去された。After the positive film was brought into close contact with the upper surface of the plate material in vacuum, exposure was performed using a metal halide lamp as a light source. Next, 30 parts of the following developer 1 were charged in the automatic developing machine shown in FIG. 1, and the silicone rubber layer and the photosensitive layer in the unexposed portions were removed by rubbing with a brush of a developing section.
更に、上記印刷版の画線部は下記組成の染色液を布に
つけ版上を軽くこすった後、水洗することにより鮮やか
に染色することができた。その結果網点が2〜98%まで
良好に再現され、しかもシリコーンゴム層に傷のない印
刷版が得られた。Furthermore, the image area of the printing plate could be vividly dyed by applying a dyeing solution having the following composition to a cloth, lightly rubbing the plate, and then washing with water. As a result, a printing plate in which halftone dots were well reproduced up to 2 to 98% and the silicone rubber layer was not damaged was obtained.
(現像液−1) プロピレングリコール 6.0部 メタケイ酸カリウム 8.0部 水 86.0部 (染色液) ソルフィット(クラレイソプレン化学(株)製溶材) 10部 レオドールTW−0120(花王(株)製、界面活性材) 0.5部 ベンジルアルコール 2.5部 ビクトリアピュアブルーBOH 0.5部 水 100部 また5日間作業を停止しても、現像部のブラシには白
い結晶物がわずかについただけで、しかもこの白い結晶
物は現像液がかかったときには容易に除去された。また
処理した印刷版のシリコーンゴム層には傷が見られなか
った。(Developer-1) Propylene glycol 6.0 parts Potassium metasilicate 8.0 parts Water 86.0 parts (Staining solution) Solfit (Kuraray Isoprene Chemical Co., Ltd.) 10 parts Leodol TW-0120 (Kao Corporation, surfactant) 0.5 parts Benzyl alcohol 2.5 parts Victoria Pure Blue BOH 0.5 parts Water 100 parts In addition, even if the operation is stopped for 5 days, only a few white crystals are found on the brush of the developing section. When removed, it was easily removed. No scratch was seen on the silicone rubber layer of the treated printing plate.
比較例−1 実施例−1で用いた現像液−1からプロピレングリコ
ールを除いた以外は、実施例と同様にして試験を行った
ところ、シリコーンゴム層にブラシの傷が付いており、
染色時にそれが汚れとなって現れた。網点再現性は3〜
97%であった。Comparative Example-1 A test was performed in the same manner as in Example 1 except that propylene glycol was removed from Developer-1 used in Example-1, and the silicone rubber layer was scratched by a brush.
It appeared as stain when dyeing. Halftone reproducibility is 3 ~
97%.
また5日間作業を停止したところ、自動現像機の現像
部のブラシに白い結晶物が付着していた。When the operation was stopped for 5 days, white crystals adhered to the brush in the developing section of the automatic developing machine.
その状態で現像処理を行ったところ、シリコーンゴム
層の傷は更に深く、かつ多く付着すると共に印刷で傷の
部分にインキが付き非常に汚れの多い印刷物となった。When development processing was performed in this state, the silicone rubber layer had deeper and more flaws, adhered more, and had ink on the flawed portions during printing, resulting in a very dirty printed matter.
実施例−2 ポジ型PS版の作製 厚さ0.24mmのJIS−1050のアルミニウム板を2%の水
酸化ナトリウム水溶液中に浸漬し、脱脂処理を行った
後、稀硝酸溶液中で電気化学的に粗面化し、よく洗浄し
た後に稀硫酸溶液中で陽極酸化処理を行って上記アルミ
ニウム板表面上に2.5g/m2の酸化被膜を形成させた。こ
のように処理されたアルミニウム板を水洗、乾燥後、下
記組成の感光液を乾燥重量2.5g/m2となるように塗布し
乾燥してポジ型PS版を得た。Example 2 Production of Positive PS Plate A 0.24 mm-thick JIS-1050 aluminum plate was immersed in a 2% aqueous sodium hydroxide solution, degreased, and then electrochemically treated in a dilute nitric acid solution. After roughening and washing well, anodizing treatment was performed in a dilute sulfuric acid solution to form an oxide film of 2.5 g / m 2 on the surface of the aluminum plate. The thus treated aluminum plate was washed with water, dried, coated with a photosensitive solution having the following composition so as to have a dry weight of 2.5 g / m 2, and dried to obtain a positive PS plate.
[感光性塗布液組成] ナフトキノン−(1,2)−ジアジド−(2)−5−スル
ホン酸クロライドとピロガロール・アセトン樹脂とのエ
ステル化合物(特開昭60−143345号公報の合成例2に記
載された化合物) 2重量部 フェノールとm−,p−混合クレゾールとホルムアルデヒ
ドとの共重合樹脂(合成時のフェノール、m−クレゾー
ル及びp−クレゾールの各々の仕込みモル比が20:48:3
2、重量平均分子量Mw=7400、数平均分子量Mw=1400)
6.5重量部 p−tert−オクチルフェノールとホルムアルデヒドより
合成されたノボラック樹脂とナフトキノン−(1,2)−
ジアジド−(2)−5−スルホン酸クロライドとのエス
テル化合物(縮合率:50モル%、Mw=1700) 0.1重量部 ビクトリアピュアブルーBOH(保土ヶ谷化学社製) 0.08重量部 エチルセロソルブ 80重量部 メチルセロソルブ 20重量部 水なし平版の作製 ジアゾ樹脂の合成 p−ジアゾジフェニルアミン硫酸塩14.5gを氷冷下で4
0.9gの濃硫酸に溶解した。この反応液に1.0gのパラホル
ムアルデヒドを反応温度が10℃を超えないようにゆっく
り添加した。[Composition of photosensitive coating solution] An ester compound of naphthoquinone- (1,2) -diazide- (2) -5-sulfonic acid chloride and pyrogallol-acetone resin (described in Synthesis Example 2 of JP-A-60-143345) 2 parts by weight Copolymer resin of phenol, m-, p-mixed cresol and formaldehyde (molar ratio of each of phenol, m-cresol and p-cresol at the time of synthesis was 20: 48: 3)
2, weight average molecular weight Mw = 7400, number average molecular weight Mw = 1400)
6.5 parts by weight Novolak resin synthesized from p-tert-octylphenol and formaldehyde and naphthoquinone- (1,2)-
Ester compound with diazide- (2) -5-sulfonic acid chloride (condensation ratio: 50 mol%, Mw = 1700) 0.1 parts by weight Victoria Pure Blue BOH (manufactured by Hodogaya Chemical Co., Ltd.) 0.08 parts by weight Ethyl cellosolve 80 parts by weight Methyl cellosolve 20 parts by weight Preparation of a waterless lithographic plate Synthesis of diazo resin 14.5 g of p-diazodiphenylamine sulfate was added under ice cooling to 4 g
Dissolved in 0.9 g of concentrated sulfuric acid. To this reaction solution, 1.0 g of paraformaldehyde was slowly added so that the reaction temperature did not exceed 10 ° C.
その後、2時間氷冷下で撹拌を続けた。この反応混合
物を氷冷下、500mlのエタノールに滴下し、生じた沈殿
を濾過した。エタノールで洗浄後、この沈殿物を100ml
の純水に溶解し、この液に6.8gの塩化亜鉛を溶解した冷
濃厚水溶液を加えた。Thereafter, stirring was continued for 2 hours under ice cooling. The reaction mixture was added dropwise to 500 ml of ethanol under ice cooling, and the resulting precipitate was filtered. After washing with ethanol, this precipitate is
Was dissolved in pure water, and a cold concentrated aqueous solution in which 6.8 g of zinc chloride was dissolved was added to this solution.
生じた沈殿を濾過した後、エタノールで洗浄し、これ
を150mlの純水に溶解した。この液に8gのヘキサフルオ
ロリン酸アンモニウムを溶解した冷濃厚水溶液を加え
た。生じた沈殿を濾取し水洗した後、30℃で一昼夜乾燥
してジアゾ樹脂−1を得た。The resulting precipitate was filtered, washed with ethanol, and dissolved in 150 ml of pure water. To this solution was added a cold concentrated aqueous solution in which 8 g of ammonium hexafluorophosphate was dissolved. The resulting precipitate was collected by filtration, washed with water, and dried at 30 ° C. overnight to obtain diazo resin-1.
β−ナフトールとのカップリング物をGPC法で測定し
た。該ジアゾ樹脂のスチレン換算の重量平均分子量(M
w)は1500、数平均分子量は500であった。The coupling product with β-naphthol was measured by the GPC method. Styrene-equivalent weight average molecular weight (M
w) was 1500 and the number average molecular weight was 500.
ポリマーの合成 2−ヒドロキシエチルメタクリレート150g、アクリロ
ニトリル60g、メチルメタクリレート79.5g、メタクリル
酸10.0(それぞれのモル比は37:35:24:4)を蒸留ジオキ
サン700gに溶解させ(トータルモノマー濃度:4.5モル/
)ベンゾイルパーオキシド15g(2モル%)を徐々に
投入し、窒素気流中、還流状態で8時間重合反応を行っ
た。反応終了後、ヒドロキノン0.5gを投入し、減圧下溶
媒を留去し粘度が上昇したところでステンレスプレート
上に流し出し真空乾燥を行い、270gの板状樹脂(ポリマ
ー1)を得た。該ポリマーのGPC測定値を以下に示す。Synthesis of polymer 150 g of 2-hydroxyethyl methacrylate, 60 g of acrylonitrile, 79.5 g of methyl methacrylate, and 10.0 of methacrylic acid (each molar ratio is 37: 35: 24: 4) are dissolved in 700 g of distilled dioxane (total monomer concentration: 4.5 mol /
) 15 g (2 mol%) of benzoyl peroxide was gradually added, and a polymerization reaction was carried out for 8 hours under a reflux state in a nitrogen stream. After completion of the reaction, 0.5 g of hydroquinone was added, the solvent was distilled off under reduced pressure, and when the viscosity increased, the mixture was poured on a stainless steel plate and vacuum dried to obtain 270 g of a plate-like resin (polymer 1). The GPC measurement of the polymer is shown below.
Mw:4.80×104、分散比:2.2 脱脂洗浄したアルミニウム板を40重量%硫酸水溶液
中、温度30℃、電流密度1.5A/dm2の条件で2分間陽極酸
化を行い、水洗いした後、1重量%ケイ酸ナトリウム水
溶液中で85℃、25秒の条件でケイ酸ソーダ処理し、次い
で水洗を行い基板を得た。Mw: 4.80 × 10 4 , dispersion ratio: 2.2 Anodizing was performed on the degreased and washed aluminum plate in a 40% by weight sulfuric acid aqueous solution at a temperature of 30 ° C. and a current density of 1.5 A / dm 2 for 2 minutes. A sodium silicate treatment was performed at 85 ° C. for 25 seconds in an aqueous solution of sodium silicate by weight, followed by washing with water to obtain a substrate.
この基板に下記組成のプライマー層組成物をホワラー
により5.5℃で塗布し、85℃で3分間乾燥させてプライ
マー層を設けた。乾燥膜厚は10mg/dm2であった。A primer layer composition having the following composition was applied to the substrate at 5.5 ° C. using a whitener and dried at 85 ° C. for 3 minutes to provide a primer layer. The dry film thickness was 10 mg / dm 2 .
プライマー層組成物 ポリマー(アルコール性水酸基含有ポリマー) 100重量部 ジアゾ樹脂(p−ジアゾジフェニルアミン・ホルムアル
デヒド樹脂) 20重量部 メチルセロソルブ 2400重量部 次に上記組成物を塗布したアルミニウム板に3KW超高
圧水銀灯を用いて100mJ/cm2の全面露光を行った。この
ようにして得られたプライマー層を塗設したアルミニウ
ム板は、感光層塗布用溶剤(メチルセロソルブ)や現像
液に浸漬しても溶解する事はなかった。Primer layer composition Polymer (alcoholic hydroxyl group-containing polymer) 100 parts by weight Diazo resin (p-diazodiphenylamine / formaldehyde resin) 20 parts by weight Methyl cellosolve 2400 parts by weight Next, a 3 KW ultra-high pressure mercury lamp is applied to an aluminum plate coated with the above composition. To perform 100 mJ / cm 2 overall exposure. The aluminum plate coated with the primer layer obtained in this manner did not dissolve even when immersed in a solvent for coating the photosensitive layer (methyl cellosolve) or a developing solution.
尚、日立分光計3200によりUV積分球を測定し、ジアゾ
の分解率を測定したところ、上記露光により378nmのジ
アゾ吸収部は完全に分解している事がわかった。The UV integrating sphere was measured with a Hitachi spectrometer 3200, and the decomposition ratio of diazo was measured. As a result, it was found that the diazo absorption portion at 378 nm was completely decomposed by the exposure.
上記プライマー層を塗設したアルミニウム板状に、下
記感光性組成物を乾燥重量で3mg/dm2になるように、55
℃でホワラー塗布し乾燥して感光層を設けた。The primer layer coated aluminum plate, so that the 3 mg / dm 2 The following photosensitive composition by dry weight, 55
It was then applied with a whiter at ℃ and dried to form a photosensitive layer.
[感光性組成物] ポリマー(アルコール性水酸基含有ポリマー) 100重量部 ジアゾ樹脂(p−ジアゾジフェニルアミン・ホルムアル
デヒド樹脂) 10重量部 ビクトリアブルーBOH 2重量部 メチルセロソルブ 2000重量部 エチルセロソルブ 1000重量部 次に、上記感光層上に下記シリコーンゴム組成物を乾
燥重量で15mg/dm2になるように55℃でホワラー塗布し乾
燥してシリコーンゴム層を設けた。[Photosensitive composition] 100 parts by weight of polymer (alcoholic hydroxyl group-containing polymer) 10 parts by weight of diazo resin (p-diazodiphenylamine / formaldehyde resin) 2 parts by weight of Victoria Blue BOH 2000 parts by weight of methyl cellosolve 1000 parts by weight of ethyl cellosolve A silicone rubber layer was provided on the above-mentioned photosensitive layer by applying a silicone rubber composition at a temperature of 55 ° C. to a dry weight of 15 mg / dm 2 at 55 ° C. and drying.
[シリコーンゴム組成物] 東芝シリコーン製YF−3057 100重量部 東芝シリコーン製TSL−8180 10重量部 アエロジルR−972(日本アエロジル社製) 3重量部 ジラウリル酸ジ−n−ブチル錫 0.8重量部 ヘキサン 1400重量部 得られたシリコーンゴム層の表面に厚さ5μの片面マ
ット化ポリプロピレンフィルムをラミネートし、水なし
感光性平版印刷版を得た。[Silicone Rubber Composition] Toshiba Silicone YF-3057 100 parts by weight Toshiba Silicone TSL-8180 10 parts by weight Aerosil R-972 (Nippon Aerosil Co., Ltd.) 3 parts by weight Di-n-butyltin dilaurate 0.8 parts by weight Hexane 1400 5 parts by weight A single-sided matte polypropylene film having a thickness of 5 μm was laminated on the surface of the obtained silicone rubber layer to obtain a waterless photosensitive lithographic printing plate.
[現像液−2] プロピレングリコール 10重量部 エマルゲン147(花王社製ノニオン活性剤) 0.1重量部 ケイ酸カリウム水溶液(SiO2:26重量%、K2O:14重量
%) 18重量部 水酸化カリウム 4重量部 水 70重量部 前記ポジ型PS版及び水なし平版にポジティブフィルム
を重ね3KWメタルハライドランプで70cmの距離から50秒
間露光した。また水なし平版は露光後ラミネートフィル
ムを剥離した。[Developer-2] Propylene glycol 10 parts by weight Emulgen 147 (nonionic activator manufactured by Kao Corporation) 0.1 part by weight Potassium silicate aqueous solution (SiO 2 : 26% by weight, K 2 O: 14% by weight) 18 parts by weight Potassium hydroxide 4 parts by weight Water 70 parts by weight A positive film was superimposed on the positive PS plate and the waterless planographic plate and exposed with a 3KW metal halide lamp from a distance of 70 cm for 50 seconds. Further, the lithographic plate without water peeled off the laminate film after exposure.
次に、第1図に示す現像処理槽で露光済のPS版及び水
なし平版を現像処理した。Next, the exposed PS plate and waterless lithographic plate were developed in the developing tank shown in FIG.
現像槽1には前記現像液2を30入れ、30℃に温度を
調節した。The developer 2 was placed in the developing tank 1 and the temperature was adjusted to 30 ° C.
処理時間はポジ型PS版は20秒、水なし平版は60秒とし
た。現像処理した各版をそれぞれ専用の印刷機にかけ印
刷したところ、水なし平版ではシリコーンゴム層に傷が
なく汚れのない良好な印刷物が得られ、またポジ型PS版
も汚れのない良好な印刷物が得られた。The processing time was 20 seconds for the positive PS plate and 60 seconds for the waterless planographic plate. Each of the developed plates was printed on a dedicated printing machine, and the lithographic plate without water gave good prints without damage to the silicone rubber layer and no stains.The positive PS plate also gave good prints without stains. Obtained.
[発明の効果] 本発明は、珪酸塩とポロピレングリコールを含む水系
現像液を用いているので、現像時にシリコーンゴム層に
対してブラシによる傷が付きにくく、またブラシに珪酸
塩の結晶が付着しにくいという効果がある。[Effect of the Invention] In the present invention, since the aqueous developer containing silicate and propylene glycol is used, the silicone rubber layer is hardly damaged by the brush during development, and silicate crystals adhere to the brush. There is an effect that it is difficult to do.
更に網点再現性に優れた平版印刷版が得られる水なし
感光性平版印刷版用現像液が提供される。Further, there is provided a waterless photosensitive lithographic printing plate developer capable of obtaining a lithographic printing plate excellent in dot reproducibility.
第1図は、本発明の現像液を使用する自動現像機を示す
断面図である。 主な符号の番号 1……現像槽、2、3……ローラー 4……ブラシ、5……シャワー 6……ポンプ、7……温度調節用ヒーターFIG. 1 is a sectional view showing an automatic developing machine using the developing solution of the present invention. Main code number 1 Developing tank 2, 3 Roller 4 Brush 5 Shower 6 Pump 7 Temperature control heater
フロントページの続き (56)参考文献 特開 昭60−28654(JP,A) 特開 昭63−317379(JP,A) 特開 平1−214839(JP,A) 特開 平3−122644(JP,A) 特開 昭60−133452(JP,A) 特開 平3−148665(JP,A) (58)調査した分野(Int.Cl.6,DB名) G03F 7/00,7/32Continuation of the front page (56) References JP-A-60-28654 (JP, A) JP-A-63-317379 (JP, A) JP-A 1-214839 (JP, A) JP-A-3-122644 (JP) JP-A-60-133452 (JP, A) JP-A-3-148665 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) G03F 7/00, 7/32
Claims (1)
及びシリコーンゴム層を順次有する水なし感光性平版印
刷版用現像液において、該現像液が珪酸塩、プロピレン
グリコール及び水を含むことを特徴とする水なし感光性
平版印刷版用現像液。1. A developer for a waterless photosensitive lithographic printing plate having a primer layer, a photocurable photosensitive layer and a silicone rubber layer on a support in order, wherein the developer contains silicate, propylene glycol and water. A developer for a water-free photosensitive lithographic printing plate, characterized by comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022098A JP2814279B2 (en) | 1990-02-02 | 1990-02-02 | Waterless photosensitive lithographic printing plate developer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022098A JP2814279B2 (en) | 1990-02-02 | 1990-02-02 | Waterless photosensitive lithographic printing plate developer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03228054A JPH03228054A (en) | 1991-10-09 |
| JP2814279B2 true JP2814279B2 (en) | 1998-10-22 |
Family
ID=12073408
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022098A Expired - Fee Related JP2814279B2 (en) | 1990-02-02 | 1990-02-02 | Waterless photosensitive lithographic printing plate developer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2814279B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2798309B2 (en) * | 1991-06-14 | 1998-09-17 | 富士写真フイルム株式会社 | Brushing structure and method of adjusting brushing of lithographic printing plate developing device without water |
| US5897985A (en) * | 1996-10-11 | 1999-04-27 | Kodak Polychrome Graphics, Llc | Potassium silicate developing composition and method of use to process lithographic printing plates |
| US5766826A (en) * | 1996-10-11 | 1998-06-16 | Eastman Kodak Company | Alkaline developing composition and method of use to process lithographic printing plates |
| US5811221A (en) * | 1997-05-30 | 1998-09-22 | Kodak Polychrome Graphics, Llc | Alkaline developing composition and method of use to process lithographic printing plates |
| US6083662A (en) * | 1997-05-30 | 2000-07-04 | Kodak Polychrome Graphics Llc | Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6028654A (en) * | 1983-07-27 | 1985-02-13 | Toray Ind Inc | Method for processing lithographic plate using no dampening water |
| JPS60133452A (en) * | 1983-12-21 | 1985-07-16 | Fuji Photo Film Co Ltd | Photosensitive lithographic printing plate requiring no dampening water |
| JPH0740134B2 (en) * | 1987-06-19 | 1995-05-01 | 東レ株式会社 | Waterless planographic processing solution |
| JP2626987B2 (en) * | 1988-02-23 | 1997-07-02 | 富士写真フイルム株式会社 | No fountain solution photosensitive lithographic printing plate |
| JPH03122644A (en) * | 1989-10-05 | 1991-05-24 | Fuji Photo Film Co Ltd | Damping-waterless photosensitive planographic printing plate |
-
1990
- 1990-02-02 JP JP2022098A patent/JP2814279B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03228054A (en) | 1991-10-09 |
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