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JP2820728B2 - Composite mold for optical parts molding - Google Patents
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JP2820728B2 - Composite mold for optical parts molding - Google Patents

Composite mold for optical parts molding

Info

Publication number
JP2820728B2
JP2820728B2 JP1219922A JP21992289A JP2820728B2 JP 2820728 B2 JP2820728 B2 JP 2820728B2 JP 1219922 A JP1219922 A JP 1219922A JP 21992289 A JP21992289 A JP 21992289A JP 2820728 B2 JP2820728 B2 JP 2820728B2
Authority
JP
Japan
Prior art keywords
coating layer
composite mold
molding
oxides
nitrides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1219922A
Other languages
Japanese (ja)
Other versions
JPH0383824A (en
Inventor
正樹 小林
昭嗣 今村
学 佐藤
Original Assignee
東芝タンガロイ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東芝タンガロイ株式会社 filed Critical 東芝タンガロイ株式会社
Priority to JP1219922A priority Critical patent/JP2820728B2/en
Publication of JPH0383824A publication Critical patent/JPH0383824A/en
Application granted granted Critical
Publication of JP2820728B2 publication Critical patent/JP2820728B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06Construction of plunger or mould
    • C03B11/08Construction of plunger or mould for making solid articles, e.g. lenses
    • C03B11/084Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
    • C03B11/086Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/14Die top coat materials, e.g. materials for the glass-contacting layers
    • C03B2215/20Oxide ceramics
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/14Die top coat materials, e.g. materials for the glass-contacting layers
    • C03B2215/26Mixtures of materials covered by more than one of the groups C03B2215/16 - C03B2215/24, e.g. C-SiC, Cr-Cr2O3, SIALON

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、カメラ,顕微鏡,望遠鏡などの光学測定
機,ビデオカメラ,ビデオムービー,ビデオディスクな
どの映像機器、音響機器、フアクシミリ,レーザビーム
プリンタ,複写機などの事務機器に代表される光学機器
の部品として用いられる、主としてレンズ,プリズム,
コンパクトディスク又は光磁気ディスクなどを成形する
のに適する光学部品成形用複合モールドに関するもので
ある。
DETAILED DESCRIPTION OF THE INVENTION (Industrial application field) The present invention relates to optical measuring instruments such as cameras, microscopes, and telescopes, video equipment such as video cameras, video movies, and video discs, audio equipment, facsimile machines, and laser beam printers. Used as parts of optical equipment such as office equipment such as copiers, mainly lenses, prisms,
The present invention relates to a composite mold for molding an optical component, which is suitable for molding a compact disk or a magneto-optical disk.

(従来の技術) 従来、ガラスやプラスチックを加熱軟化させた後、加
圧して所望形状の光学部品を成形するためのモールドと
しては、ダイス鋼,ステンレス鋼又は超硬合金などの材
料が用いられている。しかし、これらのモールドは、モ
ールドと加熱軟化した被加工材、特に高温で軟化するガ
ラスの場合における離型性又は成形後の光学部品の面精
度から短寿命であるという問題がある。この問題を解決
するための光学部品成形用モールドが多数提案されてお
り、その代表的なものに、特開昭60−118638号公報,特
開昭63−123822号公報及び特開昭63−297223号公報があ
る。
(Prior Art) Conventionally, materials such as die steel, stainless steel, and cemented carbide have been used as molds for forming optical parts having a desired shape by heating and softening glass or plastic and then applying pressure. I have. However, these molds have a problem in that they have a short life due to the mold releasability or the surface accuracy of the molded optical component in the case of a mold and a work material that has been softened by heating, particularly, a glass that softens at a high temperature. Many molds for molding optical parts for solving this problem have been proposed, representative of which are JP-A-60-118638, JP-A-63-123822 and JP-A-63-297223. There is an official gazette.

(発明が解決しようとする問題点) 特開昭60−118638号公報には基材の表面が0.5〜10μ
m厚さのTiC,TiN又はTi(C,N)からなる被覆層で形成さ
れたガラス成形用の金型が開示されている。また、特開
昭63−123822号公報には、クロムと炭素を主成分とする
被覆層により少なくとも成形面を形成してなる光学ガラ
ス素子成形用型が開示されている。さらに、特開昭63−
297223号公報には、基材の表面にホウ化物,炭化物,窒
化物,ケイ化物,酸化物を厚さ1〜10μmで、単層又は
複層に被覆してなる溶融ガラス成形用工具、具体的に
は、TiB2,TiC,TaC,TiN,TaN,Al2O3,ZrO2の被覆層からな
っている溶融ガラス成形用工具が開示されている。
(Problems to be solved by the invention) JP-A-60-118638 discloses that the surface of a substrate is 0.5 to 10 μm.
A mold for forming glass formed with a coating layer made of TiC, TiN or Ti (C, N) having a thickness of m is disclosed. JP-A-63-123822 discloses a mold for molding an optical glass element having at least a molding surface formed by a coating layer containing chromium and carbon as main components. Further, JP-A-63-
Japanese Patent No. 297223 discloses a molten glass forming tool in which a boride, carbide, nitride, silicide, or oxide is coated on a surface of a base material in a thickness of 1 to 10 μm in a single layer or a plurality of layers. Discloses a molten glass forming tool including a coating layer of TiB 2 , TiC, TaC, TiN, TaN, Al 2 O 3 , and ZrO 2 .

これらのガラス成形用工具又は型は、従来のステンレ
ス鋼及びクロム鋼に比べて、各種の被覆層を形成するこ
とにより、ガラスとの反応の防止、型の表面肌の荒れ制
御、及びガラスの離型性の向上を達成したすぐれたもの
であるけれども、繰り返し成形加工する場合に、成形加
工されたガラスが着色しやすいこと、特に鏡面研摩した
成形面の面精度を成形加工されたガラス面に転写するの
が困難になり、ガラスの面が荒れやすくなること、成形
加工後のガラスの離型性が低下することから寿命が短か
く実用化できないという問題がある。
Compared to conventional stainless steel and chromium steel, these glass forming tools or molds form various coating layers to prevent reaction with glass, control roughening of the surface of the mold, and separate glass. Although excellent in moldability, it is easy to color the molded glass when it is repeatedly molded, especially the surface accuracy of the mirror-polished molded surface is transferred to the molded glass surface And the glass surface is easily roughened, and the releasability of the glass after the molding process is reduced.

本発明は、上述のような問題点を解決したもので、具
体的には、セラミックス焼結体,サーメット,超硬合
金,高融点金属を主成分とする合金,耐熱鋼,超耐熱合
金などの基材の表面に酸化クロムを主成分とする単層又
は複層からなる被覆層を形成した光学部品成形用複合モ
ールドの提供を目的とするものである。
The present invention has solved the above-mentioned problems, and specifically includes ceramic sintered bodies, cermets, cemented carbides, alloys having a high melting point metal as a main component, heat-resistant steel, and super-heat-resistant alloys. It is an object of the present invention to provide a composite mold for molding optical components, in which a coating layer composed of a single layer or a plurality of layers containing chromium oxide as a main component is formed on the surface of a substrate.

(問題点を解決するための手段) 本発明者らの一人は、光学部品として各種の用途で用
いられるガラス、特に溶融状態のガラスに対する濡れ
性,発泡性,腐食性及び着色性の観点からガラス成形用
モールドについて検討し、クロムと酸素の含有したクロ
ム化合物を主成分とする焼結体がガラス成形モールド用
材料としてすぐれているという知見を得て、すでに特願
昭63−176535号(特許第1783120号、特公平4−74292
号)で提供している。この特願昭63−176535号の観点を
更に発展させて、実用上の強度,加工性,面精度及び工
業上の生産性などを検討した所、面精度の高い基材の少
なくとも成形面に酸化クロムを主成分とする被覆層を形
成させると実用化しやすく、寿命の向上が顕著であると
いう知見を得て、本発明を完成するに至ったものであ
る。
(Means for Solving the Problems) One of the present inventors is concerned with glass used in various applications as an optical component, particularly from the viewpoints of wettability, foamability, corrosiveness, and colorability with respect to molten glass. After examining molding molds and obtaining the knowledge that sintered bodies containing a chromium compound containing chromium and oxygen as a main component are excellent as glass molding mold materials, Japanese Patent Application No. 63-176535 (Patent No. No. 1783120, Tokuhei 4-74292
No.). By further developing the viewpoint of Japanese Patent Application No. 63-176535 and examining the practical strength, workability, surface accuracy, and industrial productivity, etc., at least the molding surface of a substrate with high surface accuracy was oxidized. The formation of a coating layer containing chromium as the main component facilitates practical application and has been found to significantly improve the life, and has completed the present invention.

すなわち、本発明の光学部品成形用複合モールドは、
基材の表面に被覆層の形成された複合モールドであっ
て、該複合モールドの少なくとも被加工材の成形加工さ
れる成形面が0.1μm以上〜100μm未満の厚さの被覆層
からなり、該被覆層が酸化クロムを主成分とする単層又
は複層でなることを特徴とするものである。
That is, the composite mold for optical component molding of the present invention is:
A composite mold having a coating layer formed on a surface of a base material, wherein at least a molding surface of the composite mold on which a material to be processed is formed is a coating layer having a thickness of 0.1 μm or more and less than 100 μm. It is characterized in that the layer is a single layer or a multilayer containing chromium oxide as a main component.

本発明の光学部品成形用複合モールドにおける基材
は、光学部品成形時の温度,圧力,加熱と冷却の繰り返
しによる熱衝撃性,変形性などに耐える材料、例えばAl
2O3系セラミックス,ZrO2系セラミックス,Cr2O3系セラミ
ックス,SiC系セラミックス,Si3N4系セラミックス,サイ
アロン系セラミックス,TiC系サーメット,TiC−TiN系サ
ーメット,Cr3C2系サーメット,Al2O3系サーメット,WC−C
o系超硬合金,WC−TiC−Ni系超硬合金,Cr,Mo,W,Ta,Nb,白
金族金属及びこれらを主成分とする合金などの高融点金
属,耐熱鋼,インコネルやワスパロイなどの超耐熱合金
を挙げることができる。この内、Al2O3系セラミックス
又はCr2O3系セラミックスは、耐熱性及び強度など諸特
性の他に、被覆層との相互拡散による接合が可能となる
こと及び熱膨張係数が近似していることから被覆層と基
材との熱膨張差による剥離が生じ難く、密着性にもすぐ
れるので、特に好ましいことである。また、超硬合金
は、比較的加工がしやすいこと、及び高面精度に仕上げ
るのが容易であることから化学蒸着法(CVD法)や物理
蒸着法(PVD法)により薄い被覆層を形成するための基
材として好ましいものである。
The base material of the composite mold for molding optical parts of the present invention is made of a material that withstands temperature, pressure, thermal shock, deformation due to repetition of heating and cooling during molding of optical parts, such as Al
2 O 3 ceramics, ZrO 2 ceramics, Cr 2 O 3 ceramics, SiC ceramics, Si 3 N 4 ceramics, Sialon ceramics, TiC cermet, TiC-TiN cermet, Cr 3 C 2 cermet, Al 2 O 3 cermet, WC-C
o-based cemented carbide, WC-TiC-Ni-based cemented carbide, high melting point metals such as Cr, Mo, W, Ta, Nb, platinum group metals and alloys containing these as main components, heat-resistant steel, Inconel and Waspaloy, etc. Of super heat-resistant alloys. Among them, Al 2 O 3 ceramics or Cr 2 O 3 ceramics, in addition to various properties such as heat resistance and strength, can be joined by mutual diffusion with the coating layer and have a similar thermal expansion coefficient. This is particularly preferable since the coating layer and the substrate hardly peel off due to a difference in thermal expansion and have excellent adhesion. In addition, since a cemented carbide is relatively easy to process and easy to finish with high surface accuracy, a thin coating layer is formed by chemical vapor deposition (CVD) or physical vapor deposition (PVD). Is preferred as a base material.

これらの基材の表面に形成するための被覆層は、具体
的には、例えばCrO,(主としてCr2O3)の酸化クロムか
らなる場合、又は酸化クロムを主成分とし、他にCr(C,
O),Cr(C,N),Cr(C,N,O)の中の少なくとも1種のク
ロム化合物を含有した単層又は複層であるものである。
この被覆層は、非化学量論組成又は化学量論組成でもよ
いけれども、特に酸化クロムが好ましく、他のクロム化
合物を含有する場合には、被覆層中の酸素がモル比で少
なくとも10%含有しているのが好ましく、さらに好まし
くは、少なくとも50%含有していることである。また、
被覆層は、上述の酸化クロムを少なくとも50vol%と、
残り周期律表4a,5a,6a族金属(Ti,Zr,Hf,V,Nb,Ta,Cr,M
o,W)の酸化物,炭化物,窒化物,ホウ化物、Si,Bの酸
化物,窒化物,炭化物、Alの酸化物,窒化物、アルカリ
土類金属(Be,Mg,Ca,Sr,Ba),希土類金属(Sc,Y,La,C
e,Pr,Nd,Sm,Eu,Gd,Tb,Dy,Ho,Er,Tm,Yb,Lu)の酸化物及
びこれらの相互固溶体の中の少なくとも1種の第1物質
とからなる場合は、高硬度で緻密,微細結晶からなる被
覆層が得られることから好ましいことである。さらに、
被覆層は、上述の酸化クロムを少なくとも50vol%と、
残りFe,Co,Ni,Cr,Mn,Mo,Ta,W,Ru,Rh,Pd,Re,Ir,Pt,Au及
びこれらの相互合金の中の少なくとも1種の第2物質と
からなる場合は、被覆層の面精度が向上すること、基材
の材質の種類により基材と被覆層との密着性の向上にな
ること、及び耐熱衝撃性にすぐれることから好ましいこ
とである。この被覆層は、酸化クロムと第1物質と第2
物質とからなる場合でもよく、酸化クロムが少なくとも
50vol%含有していることが好ましいことである。
The coating layer to be formed on the surface of these substrates is, for example, specifically composed of chromium oxide of CrO, (mainly Cr 2 O 3 ), or mainly composed of chromium oxide, and Cr (C ,
O), Cr (C, N), Cr (C, N, O), which is a single layer or a multilayer containing at least one chromium compound.
This coating layer may have a non-stoichiometric composition or a stoichiometric composition, but is particularly preferably chromium oxide, and when containing other chromium compounds, contains at least 10% by mole of oxygen in the coating layer in a molar ratio. Preferably, the content is at least 50%. Also,
The coating layer contains at least 50 vol% of the above chromium oxide,
Group 4a, 5a, 6a metals (Ti, Zr, Hf, V, Nb, Ta, Cr, M
o, W) oxides, carbides, nitrides, borides, Si, B oxides, nitrides, carbides, Al oxides, nitrides, alkaline earth metals (Be, Mg, Ca, Sr, Ba) ), Rare earth metals (Sc, Y, La, C
e, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu) and at least one first substance in a mutual solid solution thereof. This is preferable because a coating layer made of high hardness, dense and fine crystals can be obtained. further,
The coating layer contains at least 50 vol% of the above chromium oxide,
When the balance is composed of the remaining Fe, Co, Ni, Cr, Mn, Mo, Ta, W, Ru, Rh, Pd, Re, Ir, Pt, Au, and at least one of the second materials among these alloys This is preferable because the surface accuracy of the coating layer is improved, the adhesion between the substrate and the coating layer is improved depending on the type of the material of the substrate, and the thermal shock resistance is excellent. This coating layer comprises chromium oxide, the first substance and the second substance.
Chromium oxide may be at least
It is preferable to contain 50 vol%.

これらの被覆層の内、第1物質及び/又は第2物質の
含有してなる被覆層の場合は、被覆層中のCr元素が被覆
層の表面から基材に向って漸次減少した、所謂傾斜被覆
層にすると、被覆層の基材からの耐剥離性が向上するこ
と、及び被覆層の強度が向上することから好ましいこと
である。
Among these coating layers, in the case of the coating layer containing the first substance and / or the second substance, the so-called gradient in which the Cr element in the coating layer gradually decreases from the surface of the coating layer toward the substrate. The use of a coating layer is preferable because the peeling resistance of the coating layer from the base material is improved and the strength of the coating layer is improved.

これらの被覆層の厚さが0.1μm未満になると、成形
加工後のガラスの面が荒れやすくなること及び寿命が低
下し、逆に被覆層の厚さが100μm以上になると、被覆
層表面の粒成長が著しくなり、その結果被覆層の面精度
の低下となること、被覆層内にクラック,巣孔などの欠
陥が増大して光学部品成形用モルードとして実用し難く
なる。このために被覆層の厚さは、0.1μm以上〜100μ
m未満と定めたものである。特に、CVDやPVDにより形成
する場合には、被覆層の厚さは、0.1〜20μm、さらに
好ましくは0.5〜100μmでなることが好ましいことであ
る。
When the thickness of these coating layers is less than 0.1 μm, the surface of the glass after forming tends to be roughened and the life is shortened. Conversely, when the thickness of the coating layer is 100 μm or more, the particles on the surface of the coating layer are reduced. The growth becomes remarkable, and as a result, the surface accuracy of the coating layer is reduced, and defects such as cracks and pits are increased in the coating layer, so that it becomes difficult to practically use as a molding mold for optical parts. For this reason, the thickness of the coating layer is 0.1 μm or more to 100 μm.
m. In particular, when formed by CVD or PVD, the thickness of the coating layer is preferably from 0.1 to 20 μm, more preferably from 0.5 to 100 μm.

基材の材質の種類と被覆層の材質の種類との組合わせ
によっては、基材と被覆層との密着性又は付着強度が低
下する場合がある。このときは、基材と被覆層との間に
中間層を介在させることができる。この中間層として
は、例えばNi,Co,Cr,Ti,Cuなどの金属、Ti−Al,Ni−P,N
i−Al,Ti−Ni−Al,Ni−Si,などの合金、周期律表4a,5a,
6a族金属の炭化物,窒化物,酸化物,及びこれらの相互
固溶体などの化合物を挙げることができる。これらの中
間層の内、Cr,Ti,炭化チタン,炭窒化チタン,炭酸化チ
タン,炭窒酸化チタンの中の少なくとも1種からなる場
合が好ましく、特に超硬合金の基材の場合には、Cr,Ti,
炭化チタンの中間層からなる場合が好ましいことであ
る。この中間層は、基材と被覆層との付着強度を高める
ためのもので、特に0.05〜10μmの厚さであることが好
ましいことである。
Depending on the combination of the type of the material of the substrate and the type of the material of the coating layer, the adhesion or the adhesion strength between the substrate and the coating layer may be reduced. In this case, an intermediate layer can be interposed between the base material and the coating layer. As the intermediate layer, for example, a metal such as Ni, Co, Cr, Ti, Cu, Ti-Al, Ni-P, N
Alloys such as i-Al, Ti-Ni-Al, Ni-Si, etc., Periodic Table 4a, 5a,
Compounds such as carbides, nitrides, oxides, and mutual solid solutions of Group 6a metals can be given. Among these intermediate layers, it is preferable that the intermediate layer be made of at least one of Cr, Ti, titanium carbide, titanium carbonitride, titanium carbonate, and titanium carbonitride. Particularly, in the case of a cemented carbide substrate, Cr, Ti,
It is preferable that the intermediate layer be made of an intermediate layer of titanium carbide. This intermediate layer is for increasing the adhesive strength between the base material and the coating layer, and is particularly preferably 0.05 to 10 μm in thickness.

本発明の光学部品成形用複合モールドを作製するに
は、従来から用いられている前述の基材に、従来から行
われている各種の方法を応用して被覆層を形成すること
ができる。例えば、被覆層の厚さが0.1〜30μm程度の
薄層の場合には、PVD法又はCVD法により形成することが
好ましく、被覆層を厚くする場合には、基材の表面に被
覆層を形成するための粉末を載置し、加圧加熱する方法
又は溶射方法などにより形成することができる。
In order to produce the composite mold for optical component molding of the present invention, a coating layer can be formed on the above-mentioned base material used conventionally by applying various methods conventionally used. For example, when the coating layer is a thin layer having a thickness of about 0.1 to 30 μm, it is preferable to form the coating layer by a PVD method or a CVD method. The powder can be formed by a method of placing and heating under pressure and a method of thermal spraying or the like.

(作用) 本発明の光学部品成形用複合モールドは、被覆層が被
加工材、特にガラスとの反応,濡れ,溶着を阻止する作
用をし、その結果被加工材の変色,表面荒れが防止さ
れ、基材が被覆層を保持して、被覆層の強度をカバーす
る作用をしているものである。
(Operation) In the composite mold for molding optical parts of the present invention, the coating layer acts to prevent reaction, wetting, and welding with the work material, particularly glass, and as a result, discoloration and surface roughness of the work material are prevented. The base material holds the coating layer and acts to cover the strength of the coating layer.

また、本発明の光学部品成形用複合モールドにおい
て、中間層を介在させる場合は、この中間層が被覆層と
基材との溶着性及び付着強度性を高める作用をしている
ものである。
In the case where an intermediate layer is interposed in the composite mold for molding an optical component of the present invention, the intermediate layer functions to enhance the welding property and adhesion strength between the coating layer and the substrate.

実施例 基材として、市販の超硬合金、1μm以下の微粒アル
ミナ基焼結体を用いて、これらの基材を円柱状(10φ×
15mm寸法)に加工し、その一端面をRmax0.01μm以下の
面粗さでなる凹球面(半径15mm)に研削、研摩した。
Example A commercially available cemented carbide, 1 μm or less fine alumina-based sintered body was used as a base material, and these base materials were formed into a columnar shape (10φ ×
One end face was ground and polished into a concave spherical surface (radius 15 mm) having a surface roughness of Rmax 0.01 μm or less.

これらの基材の内、超硬合金の基材をスパッタリング
装置に設置し、被覆層の成分組成の混合粉末又は焼結体
をターゲットとして、アルゴンガス圧5×10-3Torr,RF5
00Wの条件でスパッターすることにより被覆層を基材の
表面に形成させて本発明品1,2,3,4を得た。
Of these substrates, a cemented carbide substrate was placed in a sputtering apparatus, and a mixed powder or a sintered body having the composition of the coating layer was targeted, and an argon gas pressure of 5 × 10 −3 Torr, RF5
A coating layer was formed on the surface of the substrate by sputtering under the condition of 00 W, to thereby obtain products 1, 2, 3, and 4 of the present invention.

また、超硬合金の基材をプラズマCVD装置に設置し、4
5℃に加熱したクロムカルボニル[Cr(CO)]をH2
スのキヤリアガスでもって反応容器内に導入し、反応容
器内に高周波電源によりプラズマを発生させ、圧力1.0T
orr,基材温度350℃,2時間保持の条件で基材表面に被覆
層を形成させて本発明品5を得た。
In addition, a cemented carbide substrate was placed in a plasma CVD device,
Chromium carbonyl [Cr (CO) 6 ] heated to 5 ° C. is introduced into the reaction vessel with a carrier gas of H 2 gas, and plasma is generated in the reaction vessel by a high-frequency power source, and the pressure is 1.0 T
A coating layer was formed on the surface of the substrate under the conditions of orr, substrate temperature of 350 ° C. and holding for 2 hours, to thereby obtain a product 5 of the present invention.

次に、アルミナ基焼結体の基材をCVD装置に設置し、
約200℃に加熱した四塩化ジルコニウム(ZrCl4)と40℃
に加熱した塩化クロミル(CrO2Cl2)をAr−1vol%H2Oの
キヤリアガスで導入した状態の反応炉内で、炉内圧力20
0Torr,基材温度850℃,3時間保持の条件により基材表面
に被覆層を形成させて本発明品6を得た。
Next, the base material of the alumina-based sintered body was set in a CVD device,
Zirconium tetrachloride (ZrCl 4 ) heated to about 200 ° C and 40 ° C
In a reactor in which chromyl chloride (CrO 2 Cl 2 ) heated to room temperature was introduced with a carrier gas of Ar-1 vol% H 2 O, a furnace pressure of 20
A coating layer was formed on the surface of the substrate under the conditions of 0 Torr, a substrate temperature of 850 ° C., and a holding time of 3 hours to obtain a product 6 of the present invention.

さらに、超硬合金の基材をCVD装置に設置し、Cr(O2C
5H7(キヤリアガスN2−1vol%H2O)の炉内雰囲気中
圧力780Torr,基材温度350℃,3時間保持の条件により基
材表面に被覆層を形成させて本発明品7を得た。
In addition, a cemented carbide base material is installed in a CVD system, and Cr (O 2 C
5 H 7) 3 (Kiyariagasu N 2 -1vol% H 2 O) in the furnace atmosphere pressure 780 torr, a substrate temperature of 350 ° C., to form a coating layer on the substrate surface under the conditions of 3 hours holding the present invention product 7 I got

次いで、アルミナ基焼結体の基材を高温炉内に設置
し、40℃の塩化クロミル液中でバブリングしたArガスを
炉内に導入しながら1300℃,1時間保持して基材表面に被
覆層を形成させて本発明品8を得た。
Next, the substrate of the alumina-based sintered body was placed in a high-temperature furnace, and Ar gas bubbled in a chromium chloride solution at 40 ° C was introduced into the furnace and held at 1300 ° C for 1 hour to coat the substrate surface. A layer was formed to obtain a product 8 of the present invention.

このようにして得た本発明品1〜8の他に、比較とし
て超硬合金の基材を用いて、CVD法でもってTiCの被覆層
を基材表面に形成させた比較品1,Al2O3の被覆層を基材
表面に形成させた比較品2,イオンプレーティング法でも
ってTiNの被覆層を形成させた比較品3,スパッター法で
もってPtの被覆層を基材表面に形成させた比較品4を得
た。
In addition to the inventive products 1 to 8 thus obtained, a comparative product 1, Al 2 having a TiC coating layer formed on the substrate surface by a CVD method using a cemented carbide substrate as a comparison. O 3 coating layer comparative product 2 was formed on the substrate surface, thereby forming an ion plating method with with with TiN coating layer formed comparative product 3 was the coating layer of Pt with at sputtering on the substrate surface Comparative product 4 was obtained.

これらの本発明品1〜8及び比較品1〜4のそれぞれ
の被覆層をX線回折,XMA分析,SEM観察により調べて、被
覆層の成分組成及び厚さ、並びに中間層の存在するもの
は、その成分及び厚さを第1表に示した。
X-ray diffraction, XMA analysis, and SEM observation of the coating layers of each of the present invention products 1 to 8 and comparative products 1 to 4 show that the component composition and thickness of the coating layer and the presence of the intermediate layer are as follows. , And the components and thicknesses are shown in Table 1.

こうして得た本発明品1〜8及び比較品1〜4を用い
て、下記のガラスレンズの成形に相当する実用試験を行
い、そのときの寿命と判断される成形回数を求めて、第
1表に併記した。
Using the thus obtained inventive products 1 to 8 and comparative products 1 to 4, a practical test corresponding to the molding of the following glass lens was performed, and the number of moldings determined to be the life at that time was obtained. It was also described in.

実用試験条件 ガラス材 :鉛ガラス(SF10相当) 加熱温度 :500℃ 加 圧 力:40kg 加圧時間 :20秒 使用雰囲気:N2−1vol%O2 評 価:1サイクル250回の連続成形を行い、成形
加工後のガラスの面粗さ及び離型性にて判断、1サイク
ル未満で寿命の場合はその成形回数を表示。
Practical test conditions Glass material: Lead glass (equivalent to SF10) Heating temperature: 500 ° C Pressing force: 40 kg Pressing time: 20 seconds Operating atmosphere: N 2 -1 vol% O 2 Evaluation: Continuous molding 250 times per cycle Judgment is made based on the surface roughness and releasability of the glass after molding, and if the life is shorter than one cycle, the number of moldings is displayed.

(発明の効果) 以上の結果、本発明の光学部品成形用複合モールド
は、従来被覆層を形成した複合モールドに比較して、ガ
ラスと反応し難く、ガラスと付着し難く、離型性にすぐ
れていること及びモールドの成形面並びに成形加工後の
ガラスの面の精度の低下が生じ難く、その結果実用時の
寿命が2倍〜100倍も向上するという効果がある。ま
た、本発明の光学部品成形用複合モールドは、特に酸化
クロムの被覆層でなる場合には大気中でも実用できると
いう効果がある。
(Effects of the Invention) As described above, the composite mold for molding an optical component of the present invention is less likely to react with glass, adheres to glass, and has excellent releasability, as compared with a composite mold having a conventional coating layer. In addition, the precision of the molding surface of the mold and the precision of the glass surface after the molding process are not easily reduced, and as a result, the service life in practical use is improved by 2 to 100 times. In addition, the composite mold for molding an optical component of the present invention has an effect that it can be practically used even in the air, particularly when it is made of a coating layer of chromium oxide.

フロントページの続き (56)参考文献 特開 昭63−123822(JP,A) 特開 平2−97431(JP,A) 特開 昭60−118638(JP,A) 特開 昭63−297223(JP,A) 特開 平2−26841(JP,A)Continuation of the front page (56) References JP-A-63-123822 (JP, A) JP-A-2-97431 (JP, A) JP-A-60-118638 (JP, A) JP-A-63-297223 (JP) , A) JP-A-2-26841 (JP, A)

Claims (9)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】基材の表面に被覆層の形成された複合モー
ルドにおいて、該複合モールドの少なくとも被加工材の
成形加工される成形面が0.1μm以上〜100μm未満の厚
さの被覆層からなり、該被覆層が酸化クロムを主成分と
する単層又は複層でなることを特徴とする光学部品成形
用複合モールド。
In a composite mold having a coating layer formed on the surface of a base material, at least a molding surface of the composite mold on which a material to be processed is formed of a coating layer having a thickness of 0.1 μm or more and less than 100 μm. And a composite mold for molding optical parts, wherein the coating layer is a single layer or a multilayer containing chromium oxide as a main component.
【請求項2】上記被覆層は、上記酸化クロムを少なくと
も50vol%と、残り周期律表の4a,5a,6a族金属の酸化
物,炭化物,窒化物,ホウ化物,Si,Bの酸化物,窒化
物,炭化物,Alの酸化物,窒化物,アルカリ土類金属,
希土類金属の酸化物及びこれらの相互固溶体の中の少な
くとも1種の第1物質とからなることを特徴とする請求
項1に記載の光学部品成形用複合モールド。
2. The coating layer according to claim 1, wherein said chromium oxide comprises at least 50 vol%, and oxides, carbides, nitrides, borides, oxides of Si, B of metals belonging to groups 4a, 5a, and 6a of the periodic table. Nitrides, carbides, oxides of Al, nitrides, alkaline earth metals,
The composite mold for optical component molding according to claim 1, comprising an oxide of a rare earth metal and at least one first substance in a mutual solid solution thereof.
【請求項3】上記被覆層は、上記酸化クロムを少なくと
も50vol%と、残りFe,Co,Ni,Cr,Mn,Mo,Ta,W,Ru,Rh,Pd,R
e,Ir,Pt,Au及びこれらの相互合金の中の少なくとも1種
の第2物質とからなることを特徴とする請求項1に記載
の光学部品成形用複合モールド。
3. The coating layer according to claim 1, wherein the chromium oxide contains at least 50 vol% and the remaining Fe, Co, Ni, Cr, Mn, Mo, Ta, W, Ru, Rh, Pd, R
The composite mold for molding an optical component according to claim 1, wherein the composite mold is made of at least one second material selected from e, Ir, Pt, Au and their mutual alloys.
【請求項4】上記被覆層は、上記酸化クロムを少なくと
も50vol%と、残り周期律表の4a,5a,6a族金属の酸化
物,炭化物,窒化物,ホウ化物,Si,Bの酸化物,窒化
物,炭化物,Alの酸化物,窒化物,アルカリ土類金属,
希土類金属の酸化物及びこれらの相互固溶体の中の少な
くとも1種の第1物質とFe,Co,Ni,Cr,Mn,Mo,Ta,W,Ru,R
h,Pd,Re,Ir,Pt,Au及びこれらの相互合金の中の少なくと
も1種の第2物質とからなることを特徴とす請求項1に
記載の光学部品成形用複合モールド。
4. The coating layer contains at least 50 vol% of the chromium oxide and oxides, carbides, nitrides, borides, oxides of Si, B of metals belonging to groups 4a, 5a and 6a of the periodic table. Nitrides, carbides, oxides of Al, nitrides, alkaline earth metals,
Rare earth metal oxides and at least one first substance in their mutual solid solution with Fe, Co, Ni, Cr, Mn, Mo, Ta, W, Ru, R
2. The composite mold for molding optical parts according to claim 1, wherein the composite mold comprises at least one second substance selected from the group consisting of h, Pd, Re, Ir, Pt, and Au and their mutual alloys.
【請求項5】上記被覆層は、0.5〜10μmの厚さでなる
ことを特徴とする請求項1〜4のうちのいずれか1項に
記載の光学部品成形用複合モールド。
5. The composite mold for molding optical parts according to claim 1, wherein said coating layer has a thickness of 0.5 to 10 μm.
【請求項6】上記被覆層は、該被覆層中のCr元素が該被
覆層の表面から上記基材に向かって減少していることを
特徴とする請求項1〜5のうちのいずれか1項に記載の
光学部品成形用複合モールド。
6. The coating layer according to claim 1, wherein the Cr element in the coating layer decreases from the surface of the coating layer toward the substrate. Item 7. The composite mold for molding optical parts according to Item 1.
【請求項7】基材の表面に被覆層の形成された複合モー
ルドにおいて、該複合モールドの少なくとも被加工材の
成形加工される成形面が0.1μm以上〜100μm未満の厚
さの被覆層からなり、該被覆層が酸化クロム,酸炭化ク
ロム,酸窒化クロム,酸炭窒化クロムの中の少なくとも
1種のクロム化合物を主成分とする単層又は複層からな
り、かつ該被覆層と該基材との間に中間層を介在させて
なることを特徴とする光学部品成形用複合モールド。
7. A composite mold having a coating layer formed on the surface of a substrate, wherein at least the molding surface of the composite mold on which a workpiece is formed is a coating layer having a thickness of 0.1 μm or more and less than 100 μm. The coating layer comprises a single layer or a plurality of layers mainly containing at least one chromium compound among chromium oxide, chromium oxycarbide, chromium oxynitride, and chromium oxycarbonitride; A composite mold for molding optical components, characterized by having an intermediate layer interposed between the composite mold and the composite mold.
【請求項8】上記中間層は、Cr,Ti,炭化チタン,炭窒化
チタン,炭酸化チタン,炭窒酸化チタンの中の少なくと
も1種からなることを特徴とする請求項7に記載の光学
部品成形用複合モールド。
8. The optical component according to claim 7, wherein the intermediate layer is made of at least one of Cr, Ti, titanium carbide, titanium carbonitride, titanium carbonate, and titanium carbonitride. Composite mold for molding.
【請求項9】上記中間層は、0.05〜10μmの厚さでなる
ことを特徴とする請求項7又は8に記載の光学部品成形
用複合モールド。
9. The composite mold for molding optical parts according to claim 7, wherein said intermediate layer has a thickness of 0.05 to 10 μm.
JP1219922A 1989-08-25 1989-08-25 Composite mold for optical parts molding Expired - Lifetime JP2820728B2 (en)

Priority Applications (1)

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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1219922A JP2820728B2 (en) 1989-08-25 1989-08-25 Composite mold for optical parts molding

Publications (2)

Publication Number Publication Date
JPH0383824A JPH0383824A (en) 1991-04-09
JP2820728B2 true JP2820728B2 (en) 1998-11-05

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